JPS5917088A - Decompressing orifice - Google Patents
Decompressing orificeInfo
- Publication number
- JPS5917088A JPS5917088A JP12564082A JP12564082A JPS5917088A JP S5917088 A JPS5917088 A JP S5917088A JP 12564082 A JP12564082 A JP 12564082A JP 12564082 A JP12564082 A JP 12564082A JP S5917088 A JPS5917088 A JP S5917088A
- Authority
- JP
- Japan
- Prior art keywords
- orifice
- hole
- orifice plate
- fluid
- chamfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Pipe Accessories (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 本発明は、減圧オリフィスに関する。[Detailed description of the invention] The present invention relates to vacuum orifices.
第１図および第２図に、従来の減圧オリフィスを示す。1 and 2 show conventional vacuum orifices.
その第１図に示されるものは、管１内に第１゜第２のオ
リフィスプレート２，３が取り付けられ、第１．第２の
オリフィスプレート２，３に、少なくとも１個ずつ、互
いに位置をずらせて孔４．５が設けられている。The one shown in FIG. 1 has first and second orifice plates 2 and 3 installed in the tube 1, and the first and second orifice plates 2 and 3 are installed inside the tube 1. At least one hole 4.5 is provided in each of the second orifice plates 2, 3, offset from each other.
また、第２図に示されるものは、管１１内に第１、第２
のオリフィスプレート１２．１３が取り付けられ、第１
．第２のオリフィスプレート１２゜１３にそれぞれ複数
個の孔１４．１５が設けられ、第１のオリフィスプレー
ト１２に設けられた孔と第２オリフイスプレート１３に
設けられた孔１５とは、互いに位置をずらせて配置され
ている。In addition, in the case shown in FIG.
orifice plate 12.13 is installed and the first orifice plate 12.13 is installed.
．． A plurality of holes 14 and 15 are provided in each of the second orifice plates 12 and 13, and the holes provided in the first orifice plate 12 and the holes 15 provided in the second orifice plate 13 are located at mutually aligned positions. They are staggered.
ところで、前記従来の減圧オリフィスの問題点は、孔の
流体流入部の仕上げ状態が悪いと、つまりわずかなパリ
や疵がついていると、著しく性能が変化することであり
、また長期使用により孔の流体流入部が摩耗するにつれ
、性能が変化することである。By the way, the problem with the conventional decompression orifice is that if the finish of the fluid inlet part of the hole is poor, that is, if there are slight cracks or scratches, the performance will change significantly, and the hole will deteriorate after long-term use. As the fluid inlet wears, performance changes.
前述の性能変化を防止する方法として、従来、孔の流体
流入部を４半円に仕上げる方法があるが、小径孔のもの
では加工が困難であった。A conventional method for preventing the above-mentioned change in performance is to finish the fluid inflow portion of the hole into a four-semicircle shape, but this is difficult to process when the hole has a small diameter.
本発明の目的は、孔の流体流入部の仕上げ状態および長
期使用に伴う孔の流体流入部の摩耗による性能変化を防
止でき、しかも小径孔に対しても適用できる減圧オリフ
ィスを提供するにある。An object of the present invention is to provide a depressurizing orifice that can prevent changes in performance due to the finished state of the fluid inlet portion of the hole and wear of the fluid inlet portion of the hole over long-term use, and can also be applied to small-diameter holes.
本発明の特徴は、孔の流体流入部に、〔面取り／孔半径
）＝０．１２５以上の面取りを施したところにあり、こ
の構成により、前記目的を総て達成することかできたも
のである。A feature of the present invention is that the fluid inflow portion of the hole is chamfered to a value of [chamfer/hole radius) = 0.125 or more, and with this configuration, all of the above objects can be achieved. be.
以下、本発明を図面に基づいて説明する。Hereinafter, the present invention will be explained based on the drawings.
第３図は本発明の第１の実施例を示すもので、オリフィ
スプレート保持用の管１内に第１．第２のオリフィスプ
レート２，３が溶接により固定されており、その溶接部
を符号１０で示す。FIG. 3 shows a first embodiment of the present invention, in which a first orifice plate is installed in the tube 1 for holding the orifice plate. The second orifice plates 2, 3 are fixed by welding, the welded portion being designated by the reference numeral 10.
前記第１のオリフィスプレー）２には、少なくとも１個
の孔４と、１個の円筒形の拡流部６とが設けられ、第２
のオリフィスプレート３には、少なくとも１個の孔５と
、１個の円筒形の拡流部７とが設けられており、前記第
１．第２のオリフィスグレート２，３に設けられた孔４
．５は互いに位置をずらせて配置されている。The first orifice spray 2 is provided with at least one hole 4 and one cylindrical widening part 6, and the second
The orifice plate 3 of the first orifice is provided with at least one hole 5 and one cylindrical flow expansion part 7. Hole 4 provided in second orifice grate 2, 3
．． 5 are arranged with their positions shifted from each other.
前記名札４．５の流体流入部には、面取り８・９が施さ
れている。The fluid inflow portion of the name tag 4.5 is chamfered 8 and 9.
実験の結果を、第５図において縦軸に抵抗係数ｆ、横軸
に面取り値ｃ／ｒ、すなわち〔面取り／孔半径〕をとり
、グラフに示すように、はじめは面取り値ｃ ／ ｒが
増大するにつれ、抵抗係数ｆが低下し、面取り値ｃ ／
ｒが０．１２５以上になると、抵抗係数ｆが安定し、
流量変化が起こらなくなることに基づき、本発明では孔
４．５に施す而取り値ｃ ／ ｒ ＝ ０．１２５以上
としている。The experimental results are shown in Fig. 5, where the vertical axis shows the resistance coefficient f and the horizontal axis shows the chamfer value c/r, that is, [chamfer/hole radius].As shown in the graph, at first the chamfer value c/r increases. As the resistance coefficient f decreases, the chamfer value c/
When r becomes 0.125 or more, the resistance coefficient f becomes stable,
Based on the fact that no change in flow rate occurs, in the present invention, the value c/r applied to the hole 4.5 is set to be equal to or greater than 0.125.
この第１の実施例の減圧オリフィスでは、該減圧オリフ
ィスの上流側に高圧の流体が供給され、その流体は第１
のオリフィスプレート２に設けられた孔４→同拡流部６
→第２のオリフィスグレート３に設けられた孔５→同拡
流部７を通過し、その間に、縮流→拡流→縮流→拡流が
繰り返し行われ、流体は所定の圧力に減圧される。In the vacuum orifice of this first embodiment, high pressure fluid is supplied to the upstream side of the vacuum orifice, and the fluid is supplied to the first embodiment.
Hole 4 provided in orifice plate 2 → Flow expansion part 6
→The hole 5 provided in the second orifice grate 3→The fluid passes through the flow expansion part 7, during which flow contraction → expansion → contraction → flow expansion is repeated, and the fluid is reduced to a predetermined pressure. Ru.
そして、名札４，５の流体流入部に、面取り値ｃ ／
ｒ ＝ ０．１２５以上の面取り８．９を施している結
果、孔４，５の流体流入部の抵抗が著しく減少するとと
もに、抵抗係数ｆを一定に保ち得るので、孔４．５の流
体流入部にパリや疵が生じていたり、長期使用により孔
４．５の流体流入部が摩耗した場合であっても、性能変
化を確実に防止することができる。Then, a chamfer value c /
As a result of chamfering 8.9 with r = 0.125 or more, the resistance of the fluid inflow portion of holes 4 and 5 is significantly reduced, and the resistance coefficient f can be kept constant, so that the fluid inflow of hole 4.5 is Even if there are cracks or flaws in the part or the fluid inlet part of the hole 4.5 is worn out due to long-term use, changes in performance can be reliably prevented.
次に１第４図は本発明の第２の実施例を示すもので、こ
の実施例では管１１内に、第１．第２のオリフィスプレ
ート１２．１３が溶接により固定されており、その溶接
部を符号２０で示す。Next, FIG. 1 shows a second embodiment of the present invention, in which a first . A second orifice plate 12.13 is secured by welding, the weld being designated 20.
第１のオリフィスプレート１２には、複数個の孔１４と
、１個の円錐形の拡流部１６とが設けられ、第２のオリ
フィスプレート１３には、複数個の孔１５と、１個の円
錐形の拡流部１７とが設けられている。そして、前記第
１のオリフィスプレート１２に設けられ名札１４と、第
２のオリフイ各
スプレート１３に設けられた。ＪＬ ｔ ５とは、互い
に位置をずらせて配置されている。The first orifice plate 12 is provided with a plurality of holes 14 and one conical widening section 16, and the second orifice plate 13 is provided with a plurality of holes 15 and one conical widening section 16. A conical widening section 17 is provided. A name tag 14 was provided on the first orifice plate 12, and a name tag 14 was provided on the second orifice plate 13. JL t 5 are arranged with their positions shifted from each other.
前記名札１４．１５の流体流入部には、面取り値ｃ ／
ｒ ＝ ０．１２５以上の面取りが施されている。The fluid inlet of the name plate 14.15 has a chamfer value c/
A chamfer of r = 0.125 or more is applied.
なお、この第２の実施例のものは、第１．第２のオリフ
ィスプレー）１２．１３にそれぞれ複数個の孔１４．１
５が設けられており、また拡流部１６．１７が円錐形に
形成されている外は前記第１の実施例と同様であり、作
用についても同様である。Note that this second embodiment is similar to the first embodiment. a plurality of holes 14.1 in each of the second orifice spray) 12.13;
The second embodiment is the same as the first embodiment except that the flow expansion portions 16 and 17 are formed in a conical shape, and the operation is also the same.
また、本発明ではオリフィスプレート保持用の管内に取
り付けるオリフィスプレートは、図示の２個に限らず、
さらにオリフィスプレートの固定も図示の溶接に限らず
、ボルト等の固着手段を用いてもよい。In addition, in the present invention, the number of orifice plates installed in the pipe for holding the orifice plate is not limited to two as shown in the figure.
Furthermore, the fixing of the orifice plate is not limited to the illustrated welding, but fixing means such as bolts may also be used.
なお、従来の減圧オリフィスを示す第１図、第２図と、
本発明の第１．第２の実施例を示す第３図、第４図とで
同一部材には同一符号を付して説明している。In addition, FIGS. 1 and 2 showing conventional decompression orifices,
The first aspect of the present invention. In FIGS. 3 and 4 showing the second embodiment, the same members are given the same reference numerals and explained.
本発明は、以上説明した構成１作用のもので、本発明に
よれば、オリフィスプレートに設けられた孔の流体流入
前処１面取り値ｃ ／ ｒ ＝ ０．１２５以上の面取
りを施したことにより、孔の流体流入部の抵抗を著しく
減少でき、しかも抵抗係数ｆを一定に保ち得るので、孔
の加工状態によって流体流入部にパリや疵が生じていた
り、あるいは長期使用により孔の流体流入部が摩耗した
場合であっても、性能変化を確実に防止し得る効果があ
る。The present invention has the above-described configuration 1, and according to the present invention, the fluid inlet pre-chamfer of the hole provided in the orifice plate is chamfered with a chamfer value c/r = 0.125 or more. , the resistance of the fluid inflow part of the hole can be significantly reduced, and the resistance coefficient f can be kept constant. This has the effect of reliably preventing changes in performance even if the parts are worn out.
さらに、小径の孔にも簡単に面取り加工を施し得るので
、本発明は小径孔の減圧オリフィスにも適用し得る効果
がある。Furthermore, since chamfering can be easily performed on small-diameter holes, the present invention can also be applied to vacuum orifices with small-diameter holes.
＄１図、第２図はそれぞれ従来のイ威圧オリフィスの縦
断面図、第３図、第４図はそれぞれ本発明の第１．第２
の実施例を示す縦断面図、第５図は孔の流体流入部の抵
抗係数と面取シ値との関係を表わすグラフである。
１・・・オリフィスプレート保持用の管、２，３・・・
第１、第２のオリフィスグレート、４．５・・・第１゜
第２のオリフィスグレートに設けられた孔、６゜７・・
・拡流部、８，９・・・孔の流体流入部に施された面取
り、１１・・・オリフィスグレート保持用の管、１２．
１３・・・第１．第２のオリフィスプレート、１４．１
５・・・第１．第２のオリフィスプレートに設けられた
孔、１６．１７・・・拡流部、１８．１９・・・孔の流
体流入部に施した面取り、ｃ／ｒ・・・面取り値、ｆ・
・・孔の流体流入部の抵抗係数。
代理人 弁理士 薄田利、幸Figures 1 and 2 are longitudinal sectional views of the conventional coercive orifice, and Figures 3 and 4 are the 1. Second
FIG. 5 is a graph showing the relationship between the resistance coefficient of the fluid inflow portion of the hole and the chamfer value. 1... Orifice plate holding tube, 2, 3...
First and second orifice grates, 4.5... Holes provided in the 1st and second orifice grates, 6° and 7...
- Flow expansion part, 8, 9... Chamfered on the fluid inflow part of the hole, 11... Pipe for holding the orifice grate, 12.
13...1st. Second orifice plate, 14.1
5... 1st. Hole provided in the second orifice plate, 16.17... Flow widening part, 18.19... Chamfering made on the fluid inflow part of the hole, c/r... Chamfer value, f.
...Resistance coefficient of the fluid inlet part of the hole. Agent Patent Attorney Toshiyuki Usuda
Claims (1)
孔を有するオリフィスプレートを取り付けてなる減圧オ
リフィスにおいて、前記孔の流体流入部Ｋ、〔面取り／
孔半径）＝０．１２５以上の面取りを施したことを特徴
とする減圧オリフィス。[Claims] In a depressurizing orifice in which an orifice plate having at least one hole is attached in a tube for holding the orifice plate, the fluid inlet part K of the hole is [chamfered/
A decompression orifice characterized by being chamfered with a hole radius of 0.125 or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12564082A JPS5917088A (en) | 1982-07-21 | 1982-07-21 | Decompressing orifice |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12564082A JPS5917088A (en) | 1982-07-21 | 1982-07-21 | Decompressing orifice |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5917088A true JPS5917088A (en) | 1984-01-28 |
Family
ID=14915025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12564082A Pending JPS5917088A (en) | 1982-07-21 | 1982-07-21 | Decompressing orifice |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5917088A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0479250U (en) * | 1990-11-22 | 1992-07-10 | ||
| WO2016152383A1 (en) * | 2015-03-20 | 2016-09-29 | 愛三工業 株式会社 | Supply passage structure of gaseous fuel |
-
1982
- 1982-07-21 JP JP12564082A patent/JPS5917088A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0479250U (en) * | 1990-11-22 | 1992-07-10 | ||
| WO2016152383A1 (en) * | 2015-03-20 | 2016-09-29 | 愛三工業 株式会社 | Supply passage structure of gaseous fuel |
| JP2016176438A (en) * | 2015-03-20 | 2016-10-06 | 愛三工業株式会社 | Supply passage structure for gas fuel |
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