JPH0661426A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

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Publication number
JPH0661426A
JPH0661426A JP20937092A JP20937092A JPH0661426A JP H0661426 A JPH0661426 A JP H0661426A JP 20937092 A JP20937092 A JP 20937092A JP 20937092 A JP20937092 A JP 20937092A JP H0661426 A JPH0661426 A JP H0661426A
Authority
JP
Japan
Prior art keywords
circuit
semiconductor integrated
integrated circuit
circuit group
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20937092A
Other languages
Japanese (ja)
Inventor
Mariko Okamoto
真理子 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP20937092A priority Critical patent/JPH0661426A/en
Publication of JPH0661426A publication Critical patent/JPH0661426A/en
Pending legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To provide a semiconductor integrated circuit wherein a diffused-layer fixed potential body is formed in a hybrid semiconductor integrated circuit as in a prior art, the influence of a noise between circuit groups is prevented and the performance and the reliability of the circuit groups are enhanced. CONSTITUTION:A hybrid semiconductor integrated circuit on which an analog circuit group 20 and another circuit group are mounted in a mixed manner is provided with a structure wherein a diffused-layer fixed potential body 2 is formed between the circuit groups and the diffused-layer fixed potential body 2 is connected to a substrate potential for a semiconductor substrate 1 by means of a metal interconnection connected to a subcontact 18. Thereby, it is possible to prevent the influence of a noise generated by the circuit groups, and the performance and the circuit reliability of each of the circuit groups.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体集積回路の構造
に関するものであり、特にアナログ回路群と、ディジタ
ル回路群等とが混載される半導体集積回路における各回
路群相互間で作用するノイズ等を防止する分離領域を有
する半導体集積回路に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a semiconductor integrated circuit, and more particularly to noise and the like acting between circuit groups in a semiconductor integrated circuit in which analog circuit groups and digital circuit groups are mixedly mounted. The present invention relates to a semiconductor integrated circuit having an isolation region for preventing the above.

【0002】[0002]

【従来の技術】近年、電子回路装置全体の小型化に伴っ
て、電子回路の集積度を高めるため、ディジタル信号処
理回路に隣接してアナログ回路群やメモリ回路群等が一
つのチップ内に混載される混成型の半導体集積回路の開
発が注目されている。
2. Description of the Related Art In recent years, with the miniaturization of electronic circuit devices as a whole, in order to increase the degree of integration of electronic circuits, analog circuit groups, memory circuit groups, etc. are mixedly mounted in one chip adjacent to a digital signal processing circuit. Attention has been paid to the development of hybrid molded semiconductor integrated circuits.

【0003】[0003]

【発明が解決しようとする課題】このような混成型の半
導体集積回路では、種類の異なる回路群間で回路動作に
伴う電磁誘導雑音等が隣接する回路群に干渉を与え、半
導体集積回路全体の特性に悪影響をおよぼすことがあ
る。例えば、ディジタル回路のみで構成されたLSIで
は、要求される性能を満たしていても、このディジタル
回路群に、アナログ回路、メモリ回路等の他の回路群を
混在させると、ディジタル回路群の回路動作によって発
生する電磁波等によって発生するノイズの影響で、アナ
ログ回路群の特性が劣化したり、メモリ回路群の動作が
おかしくなったりするという問題が生じている。
In such a hybrid type semiconductor integrated circuit, electromagnetic induction noise or the like caused by the circuit operation between different types of circuit groups interferes with adjacent circuit groups, and the entire semiconductor integrated circuit is affected. The characteristics may be adversely affected. For example, even if an LSI configured only with digital circuits satisfies the required performance, if other circuit groups such as analog circuits and memory circuits are mixed in this digital circuit group, the circuit operation of the digital circuit group There is a problem that the characteristics of the analog circuit group are deteriorated and the operation of the memory circuit group becomes abnormal due to the influence of noise generated by the electromagnetic waves generated by the electromagnetic wave.

【0004】また、ディジタル回路群の微細化および高
速化の要求が増大しており、これにともないノイズの発
生も増大するので、高性能の混成半導体集積回路実現が
困難になっていきている。
Further, there is an increasing demand for miniaturization and speeding up of the digital circuit group, and along with this increase in the generation of noise, it is becoming difficult to realize a high performance hybrid semiconductor integrated circuit.

【0005】本発明の目的は、このような従来の問題点
である各回路群相互間の影響による性能や信頼性の劣化
などの問題を解決するため、拡散層固定電位体を形成し
て、回路群相互間の影響を防止し、各回路群の性能およ
び信頼性を向上させる半導体集積回路を提供する。
An object of the present invention is to form a diffusion layer fixed potential body in order to solve the problems such as the deterioration of the performance and reliability due to the influence between the respective circuit groups, which is the conventional problem. (EN) Provided is a semiconductor integrated circuit which prevents influence between circuit groups and improves performance and reliability of each circuit group.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するため
の本発明の第一の解決手段は、半導体基板上にアナログ
回路群とディジタル回路群とが混載される半導体集積回
路において、前記半導体基板直上で、しかも前記アナロ
グ回路群とディジタル回路群との間に形成され、前記半
導体基板の基板電位に金属配線で接続される拡散層固定
電位体を備えることを特徴とする。
A first solution of the present invention for solving the above problems is a semiconductor integrated circuit in which an analog circuit group and a digital circuit group are mixedly mounted on a semiconductor substrate. A diffusion layer fixed potential body is provided immediately above and between the analog circuit group and the digital circuit group and is connected to the substrate potential of the semiconductor substrate by a metal wiring.

【0007】上記課題を解決するための本発明の第二の
解決手段は、半導体基板上にアナログ回路群とディジタ
ル回路群とが混載される半導体集積回路において、前記
半導体基板直上で、しかも前記アナログ回路群またはデ
ィジタル回路群の周りを取り囲んで形成され、前記半導
体基板の基板電位に金属配線で接続される拡散層固定電
位体を備えることを特徴とする。
A second solution of the present invention for solving the above problems is a semiconductor integrated circuit in which an analog circuit group and a digital circuit group are mixedly mounted on a semiconductor substrate. A diffusion layer fixed potential body which is formed so as to surround the circuit group or the digital circuit group and is connected to the substrate potential of the semiconductor substrate by a metal wiring is characterized.

【0008】[0008]

【実施例】以下本発明について図面を参照して説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings.

【0009】図1は、本発明の一実施例に係る半導体集
積回路の断面図であって、分離領域19と、アナログ回
路群20に含まれる一つのトランジスタとの断面図を示
す。また、図2はアナログ回路群20とディジタル回路
21との混成半導体集積回路の上観図であり、図3は、
ディジタル回路21とその他の回路群22の混成半導体
集積回路上観図である。
FIG. 1 is a sectional view of a semiconductor integrated circuit according to an embodiment of the present invention, showing a sectional view of an isolation region 19 and one transistor included in an analog circuit group 20. 2 is a top view of a hybrid semiconductor integrated circuit including the analog circuit group 20 and the digital circuit 21, and FIG.
FIG. 3 is a top view of a hybrid semiconductor integrated circuit of a digital circuit 21 and another circuit group 22.

【0010】図1において、P- 型の半導体基板1にア
ナログ回路群20が形成されており、このアナログ回路
群20と隣り合う別種の回路群(図示せず)との間にあ
る分離領域19に、P+ 型の拡散層固定電位体2が形成
されている。アナログ回路群20内に形成される一つの
トランジスタは、N+ 型のコレクタ領域3と、P+ 型の
ベース領域4と、P+ 型のエミッタ領域5とで構成され
ており、これらコレクタ領域3、ベース領域4およびエ
ミッタ領域5それぞれの上にある酸化膜に孔をあけて金
属を蒸着させ、これによって、エミッタ領域5の上には
エミッタ電極15が、ベース領域4の上にはベース電極
14,16が、コレクタ領域3の上にはコレクタ電極1
7が形成される。また、半導体基板1上に形成される各
トランジスタは酸化膜8,12,13によって分離され
ており、この酸化膜8,12と半導体基板1との間には
信号の漏れを防ぐP+ 型のチャネルストッパ6,7が形
成されている。
In FIG. 1, an analog circuit group 20 is formed on a P type semiconductor substrate 1, and a separation region 19 is provided between the analog circuit group 20 and another type of circuit group (not shown) adjacent thereto. A P + -type diffusion layer fixed potential body 2 is formed on. One transistor formed in the analog circuit group 20 is composed of an N + type collector region 3, a P + type base region 4, and a P + type emitter region 5, and these collector regions 3 , Holes are made in the oxide film on the base region 4 and the emitter region 5, respectively, to deposit metal, whereby the emitter electrode 15 is formed on the emitter region 5 and the base electrode 14 is formed on the base region 4. , 16 have collector electrodes 1 on the collector region 3.
7 is formed. Further, the transistors formed on the semiconductor substrate 1 are separated by the oxide films 8, 12 and 13, and between the oxide films 8 and 12 and the semiconductor substrate 1 there is a P + type that prevents signal leakage. Channel stoppers 6 and 7 are formed.

【0011】また、アナログ回路群20に隣り合う他の
回路群との間には、酸化膜12,13に囲まれるP+
の拡散層固定電位体2を備える分離領域19が形成され
ている。さらにこの拡散層固定電位体2の上にある酸化
膜に孔を開けた後、金属が蒸着されてサブコンタクト1
8が形成される。そしてもし必要ならこのサブコンタク
ト18を金属配線によって半導体基板1の基板電位に接
続する。この基板電位はアナログ回路群20等何れの回
路群の基板電位にも接続されていない。この分離領域1
9によってアナログ回路群20は、隣り合うディジタル
回路群等で発生する電磁波障害等のノイズの影響が防止
される。つまり、拡散層固定電位体2は他回路群からの
ノイズに対するアナログ回路群20のシールドの役目を
果している。
An isolation region 19 having a P + type diffusion layer fixed potential body 2 surrounded by oxide films 12 and 13 is formed between the analog circuit group 20 and another circuit group adjacent thereto. . Further, after forming a hole in the oxide film on the diffusion layer fixed potential body 2, metal is vapor-deposited and the sub-contact 1 is formed.
8 is formed. Then, if necessary, this sub-contact 18 is connected to the substrate potential of the semiconductor substrate 1 by a metal wiring. This substrate potential is not connected to the substrate potential of any circuit group such as the analog circuit group 20. This separation area 1
9 prevents the analog circuit group 20 from being affected by noise such as electromagnetic interference generated in adjacent digital circuit groups. In other words, the diffusion layer fixed potential body 2 serves as a shield of the analog circuit group 20 against noise from other circuit groups.

【0012】このように形成される分離領域19の他の
回路群との半導体集積回路上から見た相対的位置関係を
図2,3,4に示す。図2においては、アナログ回路群
20の周囲に分離領域19が設けられている。また、図
3においてはディジタル回路21の周囲に分離領域19
を設けた様子を示す。なお、図2および3で、分離領域
19を回路群20,21周囲の一部に設けてもよいが、
少なくとも回路群間の境界を含めた部分に分離領域19
を形成する必要がある。図4は、3種類以上の回路群が
一つのチップ内に混載された混成半導体集積回路であ
る。この図3において、アナログ回路群20、ディジタ
ル回路21およびその他回路群22それぞれで挟まれる
領域に分離領域19を設けられている。また、図2,3
のように、それぞれの回路群の周囲に分離領域19を設
けるようにしてもよい。上記実施例では、P- 型の半導
体基板1について示したがN- 型の半導体基板について
もN+ 型の拡散層固定電位体を用いることによって同様
の効果が得られることは明らかである。
2, 3 and 4 show the relative positional relationship of another circuit group in the isolation region 19 formed in this way as seen from above the semiconductor integrated circuit. In FIG. 2, a separation region 19 is provided around the analog circuit group 20. Further, in FIG. 3, a separation region 19 is provided around the digital circuit 21.
The state in which is provided is shown. 2 and 3, the isolation region 19 may be provided in a part of the periphery of the circuit groups 20 and 21,
The isolation region 19 is included in at least a portion including the boundary between the circuit groups.
Need to be formed. FIG. 4 shows a hybrid semiconductor integrated circuit in which three or more types of circuit groups are mixedly mounted in one chip. In FIG. 3, a separation region 19 is provided in a region sandwiched between the analog circuit group 20, the digital circuit 21 and the other circuit group 22. Also, FIGS.
As described above, the isolation region 19 may be provided around each circuit group. In the above embodiment, the P type semiconductor substrate 1 is shown, but it is clear that the same effect can be obtained also for the N type semiconductor substrate by using the N + type diffusion layer fixed potential body.

【0013】[0013]

【発明の効果】以上説明したように、本発明の半導体集
積回路によれば、アナログ回路群とその他のメモリ回路
およびディジタル回路等とが混在された混成の半導体集
積回路で、各回路群相互間に拡散層固定電位体を設け、
基板電位に接続することにより、互いの回路群の影響を
防止することができ、各回路群間の持つ性能および信頼
性の向上が可能になる。
As described above, according to the semiconductor integrated circuit of the present invention, it is a hybrid semiconductor integrated circuit in which analog circuit groups and other memory circuits, digital circuits and the like are mixed, and between the circuit groups. A diffusion layer fixed potential body is provided in
By connecting to the substrate potential, it is possible to prevent the influence of the circuit groups from each other, and it is possible to improve the performance and reliability of each circuit group.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例に関するものであり、その混
成型の半導体集積回路の断面図である。
FIG. 1 is a cross-sectional view of a hybrid semiconductor integrated circuit according to an embodiment of the present invention.

【図2】図1に示す混成型の半導体集積回路のパターン
配置を概略的に示す図である。
FIG. 2 is a diagram schematically showing a pattern arrangement of the hybrid molding semiconductor integrated circuit shown in FIG.

【図3】本発明の他の実施例の混成型の半導体集積回路
のパターン配置を概略的に示す図である。
FIG. 3 is a diagram schematically showing a pattern arrangement of a hybrid-molded semiconductor integrated circuit according to another embodiment of the present invention.

【図4】本発明の他の実施例の混成型の半導体集積回路
のパターン配置を概略的に示す図である。
FIG. 4 is a diagram schematically showing a pattern layout of a hybrid-molded semiconductor integrated circuit according to another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 半導体基板 2 拡散層固定電位体 3 コレクタ領域 4 ベース領域 5 エミッタ領域 6,7 チャネルストッパ 8〜13 酸化膜 14,16 ベース電極 15 エミッタ電極 17 コレクタ電極 18 サブコンタクト 19 分離領域 20 アナログ回路群 21 ディジタル回路 22 その他の回路群 1 semiconductor substrate 2 diffusion layer fixed potential body 3 collector region 4 base region 5 emitter region 6, 7 channel stopper 8 to 13 oxide film 14, 16 base electrode 15 emitter electrode 17 collector electrode 18 sub-contact 19 separation region 20 analog circuit group 21 Digital circuit 22 Other circuit groups

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】半導体基板上にアナログ回路群とディジタ
ル回路群とが混載される半導体集積回路において、 前記半導体基板直上で、しかも前記アナログ回路群とデ
ィジタル回路群との間に形成され、前記半導体基板の基
板電位に金属配線で接続される拡散層固定電位体を備え
ることを特徴とする半導体集積回路。
1. A semiconductor integrated circuit in which an analog circuit group and a digital circuit group are mixedly mounted on a semiconductor substrate, the semiconductor integrated circuit being formed directly on the semiconductor substrate and between the analog circuit group and the digital circuit group. A semiconductor integrated circuit comprising a diffusion layer fixed potential body connected to a substrate potential of a substrate by a metal wiring.
【請求項2】半導体基板上にアナログ回路群とディジタ
ル回路群とが混載される半導体集積回路において、 前記半導体基板直上で、しかも前記アナログ回路群また
はディジタル回路群の周りを取り囲んで形成され、前記
半導体基板の基板電位に金属配線で接続される拡散層固
定電位体を備えることを特徴とする半導体集積回路。
2. A semiconductor integrated circuit in which an analog circuit group and a digital circuit group are mixedly mounted on a semiconductor substrate, the semiconductor integrated circuit being formed directly on the semiconductor substrate and surrounding the analog circuit group or the digital circuit group. A semiconductor integrated circuit comprising a diffusion layer fixed potential body connected to a substrate potential of a semiconductor substrate by a metal wiring.
JP20937092A 1992-08-06 1992-08-06 Semiconductor integrated circuit Pending JPH0661426A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20937092A JPH0661426A (en) 1992-08-06 1992-08-06 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20937092A JPH0661426A (en) 1992-08-06 1992-08-06 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH0661426A true JPH0661426A (en) 1994-03-04

Family

ID=16571810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20937092A Pending JPH0661426A (en) 1992-08-06 1992-08-06 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH0661426A (en)

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