JPH0661257B2 - Incubator - Google Patents
IncubatorInfo
- Publication number
- JPH0661257B2 JPH0661257B2 JP14957490A JP14957490A JPH0661257B2 JP H0661257 B2 JPH0661257 B2 JP H0661257B2 JP 14957490 A JP14957490 A JP 14957490A JP 14957490 A JP14957490 A JP 14957490A JP H0661257 B2 JPH0661257 B2 JP H0661257B2
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- JP
- Japan
- Prior art keywords
- gas
- carbon dioxide
- concentration
- gas concentration
- culture chamber
- Prior art date
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- Apparatus Associated With Microorganisms And Enzymes (AREA)
Description
【発明の詳細な説明】 （イ）産業上の利用分野 本発明は室内のガス環境を制御し、細胞等の培養を行う
ための培養装置に関する。TECHNICAL FIELD The present invention relates to a culture device for controlling a gas environment in a room and culturing cells and the like.
（ロ）従来の技術 従来この種培養装置は、癌細胞等の細胞組織を培養する
ため特開昭６０−１４１２７９号公報に示される如く、
室内の温度、湿度環境のほかに、二酸化炭素や酸素等の
ガス濃度を制御できるように構成されている。(B) Conventional Technology As described in Japanese Patent Application Laid-Open No. 60-141279, Japanese Patent Application Laid-Open No. 60-141279 discloses a conventional culture apparatus for culturing cell tissues such as cancer cells.
In addition to the indoor temperature and humidity environment, the concentration of gases such as carbon dioxide and oxygen can be controlled.
（ハ）発明が解決しようとする課題 ここで、上記各ガスの濃度はそれぞれ別々のガスボンベ
に封入された二酸化炭素ガス、窒素ガス及び酸素ガス等
を培養室に導入し、この導入経路を各ガスの種類に対応
したバルブを所定の制御装置によって開閉することによ
り制御している。(C) Problems to be Solved by the Invention Here, the concentration of each of the above gases is introduced into the culture chamber by introducing carbon dioxide gas, nitrogen gas, oxygen gas, etc., which are enclosed in different gas cylinders, and the introduction path is used for each gas. The valve is controlled by opening and closing a valve corresponding to the type by a predetermined control device.
従って、バルブに誤った種類のガスボンベが接続される
と、培養室内のガス濃度制御は不能となり、結果的に培
養細胞の死滅を招くことになる。Therefore, if the wrong type of gas cylinder is connected to the valve, the gas concentration control in the culture chamber becomes impossible, resulting in the death of the cultured cells.
従来の培養装置は、係る間違いを報知する手段を有さ
ず、使用者側で注意する以外になかった。The conventional culture device has no means for reporting such an error, and the user has to be careful.
本発明は係る課題を解決するために成されたものであ
る。The present invention has been made to solve the above problems.
（ニ）課題を解決するための手段 本発明は、培養室と、この培養室に所定のガスを供給す
るためのガス供給源と、このガス供給源からのガスの供
給を制御するための流通制御手段と、前記培養室内のガ
ス濃度を検出するセンサーと、このセンサーの出力が入
力され前記流通制御手段の制御出力を発生する制御装置
と、警告手段とを準備し、前記制御装置は前記センサー
の出力に基づいて制御出力を発生し、培養室内のガス濃
度を制御すると共に、センサーの出力変化と制御出力の
状態に基づいて誤ったガス供給源か否かを検知し、前記
警告手段を動作させると共に、流通制御手段を閉じるよ
うにしたものである。(D) Means for Solving the Problems The present invention provides a culture chamber, a gas supply source for supplying a predetermined gas to the culture chamber, and a distribution for controlling gas supply from the gas supply source. A control means, a sensor for detecting a gas concentration in the culture chamber, a control device for receiving an output of the sensor to generate a control output of the flow control means, and a warning means are prepared, and the control device includes the sensor. Generates a control output based on the output of the control chamber, controls the gas concentration in the culture chamber, detects the wrong gas supply source based on the output change of the sensor and the state of the control output, and operates the warning means. In addition to this, the distribution control means is closed.
（ホ）作用 本発明によれば、ガスの流通を制御する流通制御手段に
誤ったガス供給源が接続されると、それをガス濃度の変
化と流通制御手段の状態から検知し、警告を発してガス
の流入を停止できる。(E) Action According to the present invention, when an incorrect gas supply source is connected to the flow control means for controlling the flow of gas, it is detected from the change in gas concentration and the state of the flow control means, and a warning is issued. The inflow of gas can be stopped.
（ヘ）実施例 次に本発明の実施例を説明する。第１図は本発明の培養
装置１の構成図を示す。培養装置１の培養室２内は断熱
材にて断熱されており、例えば二酸化炭素を封入したガ
スボンベ３と、窒素を封入したガスボンベ４とが別々の
経路５，６にてそれぞれ培養室２と連通せられる形とな
っている。各経路５及び６にはボンベからのガスの圧力
を一定にするための圧力調整器７、８、塵埃除去用のフ
ィルター９、１０、二方弁から成るバルブ１１、１２が
それぞれ順次介設されている。(F) Example Next, an example of the present invention will be described. FIG. 1 shows a block diagram of a culture device 1 of the present invention. The inside of the culture chamber 2 of the culture device 1 is insulated by a heat insulating material, and, for example, a gas cylinder 3 filled with carbon dioxide and a gas cylinder 4 filled with nitrogen are connected to the culture chamber 2 through separate paths 5 and 6, respectively. It is a form that can be passed. In each of the paths 5 and 6, pressure regulators 7 and 8 for keeping the pressure of the gas from the cylinder constant, filters 9 and 10 for removing dust, and valves 11 and 12 composed of two-way valves are sequentially installed. ing.
１３は資料ガス経路であり、ここにエアポンプ１４と、
二酸化炭素ガス濃度センサー１５及び酸素ガス濃度セン
サー１６が介設され、エアポンプ１４は培養室２内の雰
囲気を資料ガスとして吸引し、各センサー１５及び１６
に流通させた後、再び培養室２内に戻すよう動作する。
二酸化炭素ガス濃度センサー１５は赤外線検知方式のガ
スセンサー、酸素ガス濃度センサー１６は電気伝導度を
検知する方式のガスセンサーであり、各センサー１５及
び１６の出力はマイクロコンピュータにて構成される制
御装置１７に入力される。制御装置１７は各ボンベ３、
４に対応したバルブ１１及び１２の制御出力をそれぞれ
発生し、且つブザー、ランプ及び又は文字表示パネル等
から成る警告手段１８の動作を制御する。Reference numeral 13 is a reference gas passage, and an air pump 14 and
A carbon dioxide gas concentration sensor 15 and an oxygen gas concentration sensor 16 are interposed, and the air pump 14 sucks the atmosphere in the culture chamber 2 as a reference gas, and the sensors 15 and 16 are provided.
After the liquid is circulated in the culture chamber 2, it is returned to the culture chamber 2 again.
The carbon dioxide gas concentration sensor 15 is an infrared detection type gas sensor, the oxygen gas concentration sensor 16 is a gas sensor of a type that detects electrical conductivity, and the outputs of the sensors 15 and 16 are control devices configured by a microcomputer. 17 is input. The control device 17 is for each cylinder 3,
The control outputs of the valves 11 and 12 corresponding to No. 4 are generated, respectively, and the operation of the warning means 18 including a buzzer, a lamp, and / or a character display panel is controlled.
次に第２図乃至第７図を利用して制御装置１７の動作を
説明する。一般にこの種培養装置は二酸化炭素ガス濃度
５％、酸素ガス濃度５％における用途が多く、また、酸
素ガス濃度の制御に窒素ガスを用いており、これは大気
中の酸素濃度が約２１％であるので、５％で使用する場
合は窒素ガスによって培養室２内の酸素ガス濃度を下げ
る必要があるからである。Next, the operation of the control device 17 will be described with reference to FIGS. Generally, this seed culture device has many applications at a carbon dioxide gas concentration of 5% and an oxygen gas concentration of 5%, and nitrogen gas is used to control the oxygen gas concentration. This is because the oxygen concentration in the atmosphere is about 21%. This is because, when used at 5%, it is necessary to lower the oxygen gas concentration in the culture chamber 2 with nitrogen gas.
尚、大気中の二酸化炭素濃度は約０．０３％である。ま
た、酸素ガス濃度が高い状態で制御する場合は、ガスボ
ンベとしては酸素ガスを封入したものが用いられる。The carbon dioxide concentration in the atmosphere is about 0.03%. When controlling in a state where the oxygen gas concentration is high, a gas cylinder filled with oxygen gas is used.
二酸化炭素のガスボンベ３と窒素のガスボンベ４が夫々
に対応した経路５及び６にそれぞれ正常に接続されてい
る場合は、培養装置１の設置後電源を投入すると培養室
２内の二酸化炭素ガス濃度は大気の０．０３％であるか
ら、制御装置１７は制御出力を発生してバルブ１１を開
き、ボンベ３から二酸化炭素ガスを培養室２内に導入す
る。これによって培養室２内の二酸化炭素ガス濃度は、
第２図のように大気の二酸化炭素ガス濃度０．０３％か
ら上昇して行く。When the carbon dioxide gas cylinder 3 and the nitrogen gas cylinder 4 are normally connected to the corresponding paths 5 and 6, respectively, when the culture device 1 is installed and the power is turned on, the carbon dioxide gas concentration in the culture chamber 2 is reduced. Since it is 0.03% of the atmosphere, the control device 17 generates a control output to open the valve 11 and introduce carbon dioxide gas into the culture chamber 2 from the cylinder 3. As a result, the concentration of carbon dioxide gas in the culture chamber 2 is
As shown in Fig. 2, the concentration of carbon dioxide gas in the atmosphere rises from 0.03%.
また、培養室２内の酸素ガス濃度は大気中の濃度である
２１％であるから、制御装置１７は制御出力を発生して
バルブ１２を開き、ボンベ４から窒素ガスを培養室２内
に導入し、酸素追い出して希釈させて行く。これによっ
て培養室２内の酸素ガス濃度は、第３図のように大気の
酸素濃度２１％から降下して行く。Further, since the oxygen gas concentration in the culture chamber 2 is 21% which is the concentration in the atmosphere, the control device 17 generates a control output to open the valve 12 and introduce nitrogen gas into the culture chamber 2 from the cylinder 4. Then, drive out oxygen and dilute it. As a result, the oxygen gas concentration in the culture chamber 2 drops from the atmospheric oxygen concentration of 21% as shown in FIG.
その後、二酸化炭素ガス濃度（以下Ｅ１と称する）が前
記５％の設定値ＳＶの上に設定した上限値ＥＨに到達す
ると制御装置１７は制御出力を発生してバルブ１１を閉
じる。それによって二酸化炭素ガス濃度が低下し、設定
値ＳＶの下に設定した下限値ＥＬまで低下すると、制御
装置１７は再びバルブ１１を開く。以下これを繰り返
し、培養室２内の二酸化炭素ガス濃度を平均して設定値
ＳＶに制御する。After that, when the carbon dioxide gas concentration (hereinafter referred to as E1) reaches the upper limit value EH set above the set value SV of 5%, the control device 17 generates a control output and closes the valve 11. As a result, the carbon dioxide gas concentration decreases, and when it decreases to the lower limit value EL set below the set value SV, the control device 17 opens the valve 11 again. This is repeated thereafter, and the carbon dioxide gas concentration in the culture chamber 2 is averaged to control the set value SV.
また、酸素ガス濃度（以下Ｅ２と称する）が前記５％の
設定値ＳＶの下に設定した下限値ＥＬに到達すると制御
装置１７は制御出力を発生してバルブ１２を閉じる。そ
れによって酸素ガス濃度が上昇し、設定値ＳＶの上に設
定した上限値ＥＨまで上昇すると、制御装置１７は再び
バルブ１２を開く。以下これを繰り返し、培養室２内の
酸素ガス濃度を平均して設定値ＳＶに制御する。When the oxygen gas concentration (hereinafter referred to as E2) reaches the lower limit value EL set below the set value SV of 5%, the controller 17 generates a control output and closes the valve 12. As a result, the oxygen gas concentration increases, and when it reaches the upper limit value EH set above the set value SV, the control device 17 opens the valve 12 again. This is repeated thereafter, and the oxygen gas concentration in the culture chamber 2 is averaged to control the set value SV.
ここで、誤って各ガスボンベ３、４の接続を間違えた場
合、即ち、ガスボンベ３を経路６に、ガスボンベ４を経
路５に接続したとすると、各ガス濃度の制御は第６図及
び第７図のようになる。Here, when the gas cylinders 3 and 4 are erroneously connected, that is, when the gas cylinder 3 is connected to the path 6 and the gas cylinder 4 is connected to the path 5, the control of each gas concentration is performed as shown in FIGS. 6 and 7. become that way.
即ち、前述同様電源投入から制御装置１７はバルブ１１
及び１２を開き、培養室２内に二酸化炭素ガスと酸素ガ
スを導入して行く。そして二酸化炭素ガス濃度Ｅ１が前
述のＥＨに達すると、バルブ１１を閉じるが、そこを流
れるのは窒素ガスであるから第７図の如く、窒素ガス濃
度Ｅ２の減少が緩慢となり、二酸化炭素ガス濃度Ｅ１は
第６図の如く上昇し続ける。That is, the control device 17 controls the valve 11 after the power is turned on as described above.
Open 12 and 12, and introduce carbon dioxide gas and oxygen gas into the culture chamber 2. When the carbon dioxide gas concentration E1 reaches the above-mentioned EH, the valve 11 is closed, but since nitrogen gas flows through the valve 11, the nitrogen gas concentration E2 decreases slowly as shown in FIG. E1 continues to rise as shown in FIG.
やがて二酸化炭素ガスにより酸素ガスが押し出されてＥ
Ｌに達すると、制御装置１７はバルブ１２を閉じるの
で、二酸化炭素ガスの供給は停止するが、この時二酸化
炭素ガス濃度Ｅ１は実験では７６％にも達し、５％で培
養する必要がある細胞は全て死滅してしまう。Oxygen gas was eventually pushed out by carbon dioxide gas and E
When it reaches L, the control device 17 closes the valve 12, so the supply of carbon dioxide gas is stopped, but at this time, the carbon dioxide gas concentration E1 reaches 76% in the experiment, and it is necessary to culture at 5%. All die.
そこで、本発明の制御装置１７は、第４図及び第５図の
如く定期的（例えば１分間隔Ｓ１〜Ｓｎ）にセンサー１
５或るいは１６から入力する二酸化炭素ガス濃度Ｅ１と
酸素ガス濃度Ｅ２をサンプリングして、濃度Ｅ１の変化
量ｅ１及び濃度Ｅ２の変化量ｅ２を逐次算出している。Therefore, the control device 17 of the present invention uses the sensor 1 at regular intervals (for example, 1-minute intervals S 1 to S n ) as shown in FIGS. 4 and 5.
The carbon dioxide gas concentration E1 and the oxygen gas concentration E2 input from 5 or 16 are sampled, and the change amount e 1 of the concentration E1 and the change amount e 2 of the concentration E2 are sequentially calculated.
第４図において、二酸化炭素ガス濃度Ｅ１が上限値ＥＨ
を越えてバルブ１１を閉じても、それまでのｅ１とＥＨ
を越えた後の変化量ｅ１０があまり変わらなければ、二
酸化炭素のガスボンベ３が経路６に接続されていること
になる。何故ならば、正常に接続されていれば第２図の
如くｅ１０は減少或いは負の方向に転じなければならな
いからである。In FIG. 4, the carbon dioxide gas concentration E1 is the upper limit value EH.
Even if the valve 11 is closed beyond the threshold, e 1 and EH
If the amount of change e 10 after passing over 10 does not change much, the carbon dioxide gas cylinder 3 is connected to the path 6. This is because e 10 must decrease or turn to the negative direction as shown in FIG. 2 if the connection is normal.
一方、バルブ１の閉鎖により窒素ガスの供給は停止する
ので変化量ｅ２０は減少する。On the other hand, since the nitrogen gas supply is stopped by closing the valve 1, the change amount e 20 decreases.
制御装置１７はバルブ１１を閉じても二酸化炭素ガス濃
度Ｅ１の変化量ｅ１が異常な場合は、二酸化炭素のガス
ボンベ３が経路６に接続されているものと判断し、警告
手段１８を動作せしめて警報を発し、使用者にボンベの
接続間違いを報知する。更に、バルブ１２を閉じて二酸
化炭素ガスの流入を停止する。これによって第４図の如
く二酸化炭素ガス濃度Ｅ１の上昇は食い止められるの
で、培養物の被害を防止することができる。この時の窒
素ガス濃度Ｅ２は第５図の如く推移する。If the change amount e 1 of the carbon dioxide gas concentration E1 is abnormal even when the valve 11 is closed, the control device 17 determines that the carbon dioxide gas cylinder 3 is connected to the route 6 and operates the warning means 18. Alerts the user of a cylinder connection error. Further, the valve 12 is closed to stop the inflow of carbon dioxide gas. As a result, the increase in the carbon dioxide gas concentration E1 can be stopped as shown in FIG. 4, and damage to the culture can be prevented. At this time, the nitrogen gas concentration E2 changes as shown in FIG.
一方、バルブ１２を閉じても酸素ガス濃度Ｅ２が減少を
し続ける場合は、制御装置１７は経路６に二酸化炭素の
ガスボンベ３が誤って接続されているものと判断し、バ
ルブ１１を閉じて警告手段１８を動作させる。On the other hand, if the oxygen gas concentration E2 continues to decrease even if the valve 12 is closed, the controller 17 determines that the carbon dioxide gas cylinder 3 is erroneously connected to the path 6, closes the valve 11, and outputs a warning. The means 18 is operated.
また、バルブ１２を開くと、酸素ガス濃度Ｅ２が上昇す
る場合は、制御装置１７は経路６に酸素ガスのボンベが
誤って接続されていると判断し、バルブ１２を閉じて警
告手段１８を動作させる。When the oxygen gas concentration E2 rises when the valve 12 is opened, the control device 17 determines that the oxygen gas cylinder is erroneously connected to the path 6, closes the valve 12, and operates the warning means 18. Let
尚、上記実施例では酸素ガス濃度を５％に設定した場合
について述べたが、２１％以上で使用する場合は、酸素
ガスのボンベが経路６に接続されることになる。In the above embodiment, the case where the oxygen gas concentration is set to 5% has been described, but when used at 21% or more, the oxygen gas cylinder is connected to the path 6.
その場合、制御装置１７はバルブ１１を閉じても二酸化
炭素ガス濃度Ｅ１が上昇する場合は、経路６にボンベ３
が誤って接続されていると、バルブ１２を閉じても酸素
ガス濃度Ｅ２が上昇する場合は、経路５に酸素ガスのボ
ンベが接続されていると、更に、バルブ１２を開くと酸
素ガス濃度Ｅ２が下がる場合は、経路６に窒素ガスのボ
ンベ４が誤って接続されているものとそれぞれ判断して
上述同様の動作を実行する。In that case, if the carbon dioxide gas concentration E1 rises even if the control device 17 closes the valve 11, the control device 17 may use the cylinder 3 in the path 6.
If the oxygen gas concentration E2 rises even if the valve 12 is closed, the oxygen gas concentration E2 will increase when the valve 12 is opened. If the nitrogen gas level decreases, it is determined that the nitrogen gas cylinder 4 is erroneously connected to the path 6 and the same operation as described above is executed.
（ト）発明の効果 本発明によれば、ガスの流通を制御する流通制御手段に
誤ったガス供給源が接続されると、それをガス濃度の変
化と流通制御手段の状態から検知し、警告を発して誤っ
たガスの流入を停止できるので、使用者の単純な誤りか
ら培養者の被害を未然に防止することができる。(G) Effect of the Invention According to the present invention, when an erroneous gas supply source is connected to the flow control means for controlling the flow of gas, it is detected from the change in gas concentration and the state of the flow control means, and a warning is issued. Since the erroneous gas can be emitted to stop the inflow of erroneous gas, it is possible to prevent damage to the culture person from a simple mistake by the user.
第１図は本発明の培養装置の構成図、第２図は二酸化炭
素ガス濃度の時間推移を示す図、第３図は酸素ガス濃度
の時間推移を示す図、第４図及び第５図は誤ったガスボ
ンベを接続した場合の制御装置の動作を説明する図、第
６図及び第７図は誤ったガスボンベを接続した場合の二
酸化炭素ガス濃度と酸素ガス濃度の時間推移を示す図で
ある。 １……培養装置、２……培養室、３、４……ガスボン
ベ、５、６……経路、１１、１２……バルブ、１５……
二酸化炭素ガス濃度センサー、１６……酸素ガス濃度セ
ンサー、１７……制御装置、１８……警告手段。FIG. 1 is a block diagram of the culture apparatus of the present invention, FIG. 2 is a diagram showing the time transition of the carbon dioxide gas concentration, FIG. 3 is a diagram showing the time transition of the oxygen gas concentration, and FIGS. 4 and 5 are FIGS. 6 and 7 are diagrams for explaining the operation of the control device when the wrong gas cylinder is connected, and FIGS. 6 and 7 are diagrams showing the time transition of the carbon dioxide gas concentration and the oxygen gas concentration when the wrong gas cylinder is connected. 1 ... Incubator, 2 ... Incubator, 3, 4 ... Gas cylinder, 5, 6 ... Path, 11, 12 ... Valve, 15 ...
Carbon dioxide gas concentration sensor, 16 ... Oxygen gas concentration sensor, 17 ... Control device, 18 ... Warning means.
Claims (1)
るためのガス供給源と、該ガス供給源からのガスの供給
を制御するための流通制御手段と、前記培養室内のガス
濃度を検出するセンサーと、該センサーの出力が入力さ
れ前記流通制御手段の制御出力を発生する制御装置と、
警告手段とから成り、前記制御装置は前記センサーの出
力に基づいて前記制御出力を発生し、前記培養室内のガ
ス濃度を制御すると共に、前記センサーの出力変化と前
記制御出力の状態に基づいて誤ったガス供給源か否かを
検知し、前記警告手段を動作させると共に、前記流通制
御手段を閉じることを特徴とする培養装置。1. A culture chamber, a gas supply source for supplying a predetermined gas to the culture chamber, a flow control means for controlling the supply of gas from the gas supply source, and a gas in the culture chamber. A sensor that detects the concentration, and a control device that receives the output of the sensor and generates the control output of the flow control means,
The control device generates the control output based on the output of the sensor, controls the gas concentration in the culture chamber, and makes an error based on the output change of the sensor and the state of the control output. A culture device which detects whether or not it is a gas supply source, operates the warning means, and closes the flow control means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14957490A JPH0661257B2 (en) | 1990-06-07 | 1990-06-07 | Incubator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14957490A JPH0661257B2 (en) | 1990-06-07 | 1990-06-07 | Incubator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0440886A JPH0440886A (en) | 1992-02-12 |
| JPH0661257B2 true JPH0661257B2 (en) | 1994-08-17 |
Family
ID=15478170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14957490A Expired - Fee Related JPH0661257B2 (en) | 1990-06-07 | 1990-06-07 | Incubator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0661257B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010058898A1 (en) * | 2008-11-19 | 2010-05-27 | 전북대학교 산학협력단 | Incubator for cell culture |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5164292B2 (en) * | 2011-08-12 | 2013-03-21 | 株式会社 資生堂 | Water-in-oil skin whitening cosmetic |
-
1990
- 1990-06-07 JP JP14957490A patent/JPH0661257B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010058898A1 (en) * | 2008-11-19 | 2010-05-27 | 전북대학교 산학협력단 | Incubator for cell culture |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0440886A (en) | 1992-02-12 |
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