JPH0656850B2 - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0656850B2
JPH0656850B2 JP59179327A JP17932784A JPH0656850B2 JP H0656850 B2 JPH0656850 B2 JP H0656850B2 JP 59179327 A JP59179327 A JP 59179327A JP 17932784 A JP17932784 A JP 17932784A JP H0656850 B2 JPH0656850 B2 JP H0656850B2
Authority
JP
Japan
Prior art keywords
region
collector
type semiconductor
overvoltage
pnp transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP59179327A
Other languages
Japanese (ja)
Other versions
JPS6159766A (en
Inventor
宏 榎本
康 保田
正雄 熊谷
昭紀 田原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59179327A priority Critical patent/JPH0656850B2/en
Publication of JPS6159766A publication Critical patent/JPS6159766A/en
Publication of JPH0656850B2 publication Critical patent/JPH0656850B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は過電圧が印加される可能性のある半導体回路に
過電圧破壊防止素子を付加した半導体装置に関する。
The present invention relates to a semiconductor device in which an overvoltage breakdown preventing element is added to a semiconductor circuit to which an overvoltage may be applied.

〔従来の技術〕[Conventional technology]

従来の半導体回路では、特開昭56-79463の例で見られる
ようにトランジスタと抵抗で形成されており、本発明よ
り構造が複雑である。
The conventional semiconductor circuit is formed of a transistor and a resistor as seen in the example of Japanese Patent Laid-Open No. 56-79463, and its structure is more complicated than that of the present invention.

〔発明が解決すべき問題点〕[Problems to be solved by the invention]

従って、従来の過電圧破壊防止素子には、構造が複雑な
為、配線及び拡散工程の欠陥等の影響を受け易く、不良
率が高くしかも特性のバラツキが大きいという問題があ
る。
Therefore, the conventional overvoltage breakdown preventing element has a problem that it has a complicated structure and is easily affected by defects in the wiring and diffusion process, and has a high defect rate and a large variation in characteristics.

過電圧破壊防止素子を半導体回路に付加しないと、半導
体回路の外部入力端子と電源線との間、あるいは外部入
力端子と接地線との間に、静電気や雷等の影響で過電圧
が印加されると、内部の素子が破壊されるという問題が
ある。
If an overvoltage destruction prevention element is not added to the semiconductor circuit, if an overvoltage is applied between the external input terminal of the semiconductor circuit and the power supply line or between the external input terminal and the ground line due to static electricity or lightning, etc. However, there is a problem that internal elements are destroyed.

〔問題点を解決する手段〕[Means for solving problems]

上記の問題点を解決するために、本発明に係る半導体装
置は、外部端子と正電源線と接地線を有するTTL回路
と、過電圧破壊防止用のマルチコレクタ型PNPトラン
ジスタとを具備し、 該マルチコレクタ型PNPトランジスタは、p型半導体
基板の上に形成され且つベース領域として機能するn型
半導体領域と、該n型半導体領域内に形成され且つエミ
ッタ領域として機能するp型半導体領域と、前記n型半
導体領域内に形成され且つ第1のコレクタ領域として機
能するp型半導体領域と、前記n型半導体領域を他の素
子から分離するように形成され且つ第2のコレクタ領域
として機能するp型半導体領域とを有し、 前記第1のコレクタ領域を前記TTL回路の正電源線に
接続し、前記第2のコレクタ領域を前記p型半導体基板
を介して前記TTL回路の接地線に接続し、前記エミッ
タ領域を前記TTL回路の外部端子に接続し、前記ベー
ス領域をオープン状態としたことを特徴とする。
In order to solve the above problems, a semiconductor device according to the present invention comprises a TTL circuit having an external terminal, a positive power supply line and a ground line, and a multi-collector type PNP transistor for preventing overvoltage breakdown. The collector-type PNP transistor is formed on a p-type semiconductor substrate and functions as a base region, an n-type semiconductor region formed in the n-type semiconductor region and functioning as an emitter region, and the n-type semiconductor region. A p-type semiconductor region formed in the type semiconductor region and functioning as a first collector region, and a p-type semiconductor formed so as to separate the n-type semiconductor region from other elements and functioning as a second collector region. A region, the first collector region is connected to a positive power supply line of the TTL circuit, and the second collector region is provided via the p-type semiconductor substrate. Connected to the ground line of the serial TTL circuit, connecting the emitter region to an external terminal of said TTL circuit, characterized in that the said base region and an open state.

〔作用〕[Action]

TTL回路の通常動作中は、マルチコレクタ型PNPト
ランジスタのベースはオープン状態になっているので、
過電圧が外部端子に印加されない定常時には該PNPト
ランジスタに電流は流れないが、外部端子に静電気等に
より過電圧が印加されると該PNPトランジスタのエミ
ッタ・ベース間接合は導通し、これによって該PNPト
ランジスタはオンとなり、外部端子からエミッタ及び第
1のコレクタを通って正電源線に過電圧電荷が放電され
ると共に、外部端子からエミッタ及び第2のコレクタを
通って接地線にも過電圧電荷が放電される。過電圧電荷
が多い場合には、PNPトランジスタのエミッタ・コレ
クタ間がブレークダウンして放電を完了する。
During normal operation of the TTL circuit, the base of the multi-collector type PNP transistor is in an open state.
When the overvoltage is not applied to the external terminal, the current does not flow in the PNP transistor in a steady state, but when the overvoltage is applied to the external terminal due to static electricity or the like, the emitter-base junction of the PNP transistor becomes conductive, whereby the PNP transistor becomes It is turned on, and the overvoltage charge is discharged from the external terminal to the positive power supply line through the emitter and the first collector, and the overvoltage charge is also discharged to the ground line from the external terminal through the emitter and the second collector. When there is a large amount of overvoltage charge, breakdown occurs between the emitter and collector of the PNP transistor and discharge is completed.

一方、TTL回路の製造中においては、フローティング
状態にある正電源線及び接地線上に過電圧電荷が印加さ
れることがある。この時、外部端子が接地されると、従
来はTTL回路内部を通って過電圧電荷が外部端子に放
電されていたが、本発明によれば、TTL回路内部を通
らずにマルチコレクタ型PNPトランジスタにより過電
圧電荷は正電源線及び接地線にそれぞれ接続されている
第1及び第2のコレクタからエミッタを通って外部端子
に放電される。この場合、PNPトランジスタのコレク
タはエミッタとして働き、エミッタはコレクタとして働
く。このようにして、TTL回路の内部素子の過電圧破
壊は防止される。
On the other hand, during the manufacture of the TTL circuit, overvoltage charges may be applied to the positive power supply line and the ground line in the floating state. At this time, if the external terminal is grounded, the overvoltage charge is conventionally discharged to the external terminal through the inside of the TTL circuit. However, according to the present invention, the multi-collector PNP transistor is used without passing through the inside of the TTL circuit. The overvoltage charge is discharged from the first and second collectors, which are respectively connected to the positive power supply line and the ground line, through the emitter to the external terminal. In this case, the collector of the PNP transistor acts as the emitter and the emitter acts as the collector. In this way, overvoltage breakdown of the internal elements of the TTL circuit is prevented.

また、PNPトランジスタは一般的に、順方向トランジ
スタ特性と逆方向トランジスタ特性を近づけることが容
易であり、コレクタとエミッタを逆に使用してもトラン
ジスタとしての特性を維持できるという特徴を持ってい
る。従って、素子の複合化を容易に行うことができ、そ
れによって保護素子としてのPNPトランジスタの専有
面積を小さくすることができる。
In addition, the PNP transistor is generally characterized in that it is easy to bring the forward transistor characteristic and the reverse transistor characteristic close to each other, and the characteristics as a transistor can be maintained even if the collector and the emitter are used in reverse. Therefore, it is possible to easily combine the elements, thereby reducing the area occupied by the PNP transistor as the protection element.

〔実施例〕〔Example〕

以下、本発明の実施例を図面によって説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第1図は本発明の一実施例による半導体装置の回路図で
ある。本実施例では、半導体回路の一例としてTTL(Tran
sistor Transistor Logic)回路を採用している。同図に
おいて、過電圧破壊防止素子P,P,P及びP
がそれぞれ、入力端子Iと電源線Vccとの間、入力端子
Iと接地線GNDとの間、出力端子Oと電源線Vccとの
間、及び出力端子Oと接地線GNDとの間に接続されてい
る。各過電圧破壊防止素子はPNPトランジスタQからな
っており、そのエミッタは入力端子I又は出力端子Oに
接続され、コレクタは電源線Vcc又は接地線GNDに接続
され、ベースはオープンとなっている。
FIG. 1 is a circuit diagram of a semiconductor device according to an embodiment of the present invention. In this embodiment, as an example of a semiconductor circuit, a TTL (Tran
sistor Transistor Logic) circuit is adopted. In the figure, overvoltage breakdown preventing elements P 1 , P 2 , P 3 and P 4
Are respectively connected between the input terminal I and the power supply line Vcc, between the input terminal I and the ground line GND, between the output terminal O and the power supply line Vcc, and between the output terminal O and the ground line GND. ing. Each overvoltage breakdown prevention element is composed of a PNP transistor Q, the emitter of which is connected to the input terminal I or the output terminal O, the collector of which is connected to the power supply line Vcc or the ground line GND, and the base of which is open.

入力端子I又は出力端子Oに静電気や雷等による急峻な
立上りで振幅の大きいパルスが印加されると、PNPトラ
ンジスタQのエミッタ−ベース間にベースをチャージア
ップするための電流が流れ、これがPNPトランジスタQ
のベース電流となるので、PNPトランジスタQはオンと
なる。このPNPトランジスタのオン電流により、入力端
子I又は出力端子O上の過電圧の電荷は電源線Vcc又は
接地線GNDに放電されるので、TTL回路の内部素子、図に
おいては、入力ダイオードD,クランプダイオードD
,出力トランジスタT等が過電圧破壊から防止され
る。
When a pulse with a large amplitude due to a sharp rise due to static electricity or lightning is applied to the input terminal I or the output terminal O, a current for charging up the base flows between the emitter and base of the PNP transistor Q, and this is the PNP transistor. Q
, The PNP transistor Q is turned on. Due to the ON current of the PNP transistor, the overvoltage charge on the input terminal I or the output terminal O is discharged to the power supply line Vcc or the ground line GND. Therefore, the internal element of the TTL circuit, in the figure, the input diode D 1 , the clamp Diode D
2. The output transistor T 1 and the like are prevented from being damaged by overvoltage.

なお、通常の使用状態では、入力端子I又は出力端子O
と電源線Vccとの間に図示の如き過電圧破壊防止素子P
,Pを設ける迄もなく、過電圧の電荷は過電圧破壊
防止素子P,Pを介して接地線GNDに放電される
が、TTL回路の製造中は接地線、電源線共に電気的にフ
ローティング状態にあるので、電源線Vccへの放電も考
慮して過電圧破壊防止素子P,Pを設けた。
In the normal use state, the input terminal I or the output terminal O
Between the power line Vcc and the power line Vcc as shown in the figure.
Before the provision of 1 and P 3 , the overvoltage charge is discharged to the ground line GND through the overvoltage destruction prevention elements P 2 and P 4 , but during the manufacture of the TTL circuit, both the ground line and the power line are electrically connected. Since it is in the floating state, the overvoltage breakdown preventing elements P 1 and P 3 are provided in consideration of the discharge to the power supply line Vcc.

第2図は第1図の回路中のPNPトランジスタQの1つの
断面構造の1例を示す図である。第2図において、濃度
がP-のP形基板1上に濃度n-のエピタキシャル層2が
形成されており、エピタキシャル層2内に濃度P+の拡
散層3が形成されており、エピタキシャル層2は濃度P
+の分離領域4によって他の素子と分離されている。エ
ピタキシャル層2はPNPトランジスタのベース領域であ
り、P+拡散層3はエミッタ領域であり、P+分離領域4
はコレクタ領域である。分離領域4はP-形基板1を介
して接地されているので、第2図の構造は第1図の素子
及びPにのみ適用可能である。
FIG. 2 is a diagram showing an example of one sectional structure of the PNP transistor Q in the circuit of FIG. In FIG. 2, an epitaxial layer 2 having a concentration of n is formed on a P-type substrate 1 having a concentration of P , and a diffusion layer 3 having a concentration of P + is formed in the epitaxial layer 2. Is the concentration P
It is isolated from other elements by the + isolation region 4. The epitaxial layer 2 is the base region of the PNP transistor, the P + diffusion layer 3 is the emitter region, and the P + isolation region 4
Is a collector region. Since the isolation region 4 is grounded via the P − type substrate 1, the structure of FIG. 2 is applicable only to the devices P 2 and P 4 of FIG.

第3図は第1図の素子P及びPに適用可能な素子の
断面構造を示す図である。第3図においては、エピタキ
シャル層2内にP+形拡散層31及び32が設けられて
おり、他の構造は第2図と同様である。第3図の構造に
すれば、PNPトランジスタのエミッタ領域がP+形拡散領
域31、コレクタ領域がP+形拡散領域32となり、接
地されている基板とコレクタ領域が電気的に分離されて
いるので、コレクタを電源線Vccに接続できる。
FIG. 3 is a diagram showing a sectional structure of an element applicable to the elements P 1 and P 3 of FIG. In FIG. 3, P + type diffusion layers 31 and 32 are provided in the epitaxial layer 2, and the other structure is the same as that in FIG. 2. According to the structure shown in FIG. 3, the emitter region of the PNP transistor is the P + type diffusion region 31, the collector region is the P + type diffusion region 32, and the grounded substrate and the collector region are electrically separated. , The collector can be connected to the power line Vcc.

第4図は本発明の他の実施例による過電破壊防止素子と
してのPNPトランジスタの回路図である。第4図におい
ては、マルチコレクタPNPトランジスタQが採用され
ており、これが第1図の過電圧破壊防止素子P〜P
の替りに用いられ得る。
FIG. 4 is a circuit diagram of a PNP transistor as an overcurrent breakdown preventing element according to another embodiment of the present invention. In FIG. 4, a multi-collector PNP transistor Q 1 is adopted, which is an overvoltage breakdown preventing element P 1 to P 4 of FIG.
Can be used instead of.

第5図は第4図の素子の断面構造を示す図である。第5
図においては、エピタキシャル層2内にP+形拡散層3
4及び35を設けてあり、他の構造は第2図と同様であ
る。第5図の構造により、PNPトランジスタQの第1
コレクタはP+形分離領域4及びP-形基板を介して接地
され、P+形拡散層34はエミッタ領域となり、P+形拡
散層35は第2コレクタ領域となり、n-形エピタキシ
ャル層2はベース領域となる。
FIG. 5 is a diagram showing a cross-sectional structure of the device of FIG. Fifth
In the figure, the P + -type diffusion layer 3 is formed in the epitaxial layer 2.
4 and 35 are provided, and other structures are the same as those in FIG. With the structure shown in FIG. 5, the first of the PNP transistor Q 1 is
The collector is grounded via the P + -type isolation region 4 and the P -type substrate, the P + -type diffusion layer 34 becomes the emitter region, the P + -type diffusion layer 35 becomes the second collector region, and the n -type epitaxial layer 2 becomes It becomes the base area.

第2図、第3図及び第5図に示した断面構造から明らか
なように、PNPトランジスタQ及びQは動作上、エミ
ッタがコレクタとして動作し、コレクタがエミッタとし
て動作することも可能である。従って、第1図及び第4
図に示したPNPトランジスタQ及びQのコレクタをエ
ミッタと表示し、エミッタをコレクタと表示しても、本
発明の範囲に含まれる。
As is clear from the cross-sectional structures shown in FIGS. 2, 3, and 5, the PNP transistors Q and Q 1 can have their emitters acting as collectors and their collectors acting as emitters. . Therefore, FIGS. 1 and 4
Even if the collectors of the PNP transistors Q and Q 1 shown in the figure are designated as emitters and the emitters are designated as collectors, they are within the scope of the present invention.

〔発明の効果〕〔The invention's effect〕

以上説明したように、本発明によれば過電圧破壊防止素
子としてPNPトランジスタのベースをオープンにしたこ
とにより、過電圧が印加されない定常時には過電圧破壊
防止素子に電流は流れないので、電力が無駄に消費され
ないという効果が得られ、且つ、静電気等による過電圧
が半導体回路の外部端子に印加された場合は過電圧を生
ずる電荷が過電圧破壊防止素子を通って電源線又は接地
線に放電するので、半導体回路の内部素子の過電圧によ
る破壊を防止することができる。
As described above, according to the present invention, since the base of the PNP transistor is opened as the overvoltage destruction prevention element, the current does not flow to the overvoltage destruction prevention element in the steady state where the overvoltage is not applied, so that the power is not wasted. If the overvoltage due to static electricity is applied to the external terminal of the semiconductor circuit, the charge that causes the overvoltage is discharged to the power supply line or the ground line through the overvoltage destruction prevention element. It is possible to prevent destruction of the element due to overvoltage.

また、PNPトランジスタは、その素子構造から明らか
なように、コレクタとエミッタを逆に使用してもトラン
ジスタとしての特性を維持できるという特徴、言い換え
ると、順方向トランジスタ特性と逆方向トランジスタ特
性が似ているという特徴を有しているので、素子の複合
化が容易となり、それによって保護回路(つまり保護素
子としてのPNPトランジスタ)の専有面積を小さくす
ることができる。
Further, as is clear from the element structure, the PNP transistor has a characteristic that the characteristics as a transistor can be maintained even if the collector and the emitter are used in reverse, in other words, the forward direction transistor characteristic and the reverse direction transistor characteristic are similar. Since it has the feature that it is easy to combine the elements, it is possible to reduce the area occupied by the protection circuit (that is, the PNP transistor as the protection element).

なお、前述の実施例においてはTTL回路を採用したが、
本発明はこれに限られず任意の半導体回路に適用可能で
ある。例えばECL回路に適用する場合は、過電圧電荷はO
Vの電源線及び負電圧の電源線に放電される。
Although the TTL circuit is adopted in the above-mentioned embodiment,
The present invention is not limited to this, and can be applied to any semiconductor circuit. For example, when applied to an ECL circuit, the overvoltage charge is O
It is discharged to the V power line and the negative voltage power line.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例による半導体装置の回路図、
第2図は第1図の回路中のPNPトランジスタの1つの断
面構造の1例を示す図、第3図は第1図の回路中のPNP
トランジスタの1つの断面構造の他の1例を示す図、第
4図は本発明の他の実施例による過電圧破壊防止素子と
してのPNPトランジスタの回路図、第5図は第4図の素
子の断面構造を示す図である。 Q……PNPトランジスタ、I……入力端子、O……出力
端子、P,P,P,P……過電圧破壊防止素
子、Vcc……電源線、GND……接地線。
FIG. 1 is a circuit diagram of a semiconductor device according to an embodiment of the present invention,
FIG. 2 is a diagram showing an example of one sectional structure of the PNP transistor in the circuit of FIG. 1, and FIG. 3 is a PNP in the circuit of FIG.
FIG. 4 is a diagram showing another example of one sectional structure of a transistor, FIG. 4 is a circuit diagram of a PNP transistor as an overvoltage breakdown preventing element according to another embodiment of the present invention, and FIG. 5 is a sectional view of the element of FIG. It is a figure which shows a structure. Q ...... PNP transistor, I ...... input terminal, O ...... output terminals, P 1, P 2, P 3, P 4 ...... overvoltage breakdown prevention device, Vcc ...... power supply line, GND ...... ground line.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田原 昭紀 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (56)参考文献 特開 昭56−79463(JP,A) 特開 昭58−159370(JP,A) 特開 昭53−58777(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akinori Tahara 1015 Kamiodanaka, Nakahara-ku, Kawasaki-shi, Kanagawa Within Fujitsu Limited (56) References JP-A-56-79463 (JP, A) JP-A-58-159370 (JP, A) JP-A-53-58777 (JP, A)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】外部端子(I,O)と正電源線(Vcc)と
接地線(GND)を有するTTL回路と、過電圧破壊防
止用のマルチコレクタ型PNPトランジスタ(Q)と
を具備し、 該マルチコレクタ型PNPトランジスタは、p型半導体
基板(1)の上に形成され且つベース領域として機能す
るn型半導体領域(2)と、該n型半導体領域内に形成
され且つエミッタ領域として機能するp型半導体領域
(34)と、前記n型半導体領域内に形成され且つ第1
のコレクタ領域として機能するp型半導体領域(35)
と、前記n型半導体領域を他の素子から分離するように
形成され且つ第2のコレクタ領域として機能するp型半
導体領域(4)とを有し、 前記第1のコレクタ領域(35)を前記TTL回路の正
電源線に接続し、前記第2のコレクタ領域(4)を前記
p型半導体基板を介して前記TTL回路の接地線に接続
し、前記エミッタ領域(34)を前記TTL回路の外部
端子に接続し、前記ベース領域(2)をオープン状態と
したことを特徴とする半導体装置。
1. A TTL circuit having an external terminal (I, O), a positive power supply line (Vcc) and a ground line (GND), and a multi-collector type PNP transistor (Q 1 ) for preventing overvoltage breakdown, The multi-collector PNP transistor is formed on a p-type semiconductor substrate (1) and functions as a base region, and an n-type semiconductor region (2), and is formed in the n-type semiconductor region and functions as an emitter region. a p-type semiconductor region (34) and a first formed in the n-type semiconductor region.
P-type semiconductor region (35) functioning as a collector region of
And a p-type semiconductor region (4) formed so as to separate the n-type semiconductor region from other elements and functioning as a second collector region, and the first collector region (35) is included in the first collector region (35). The second collector region (4) is connected to the ground line of the TTL circuit via the p-type semiconductor substrate, and the emitter region (34) is connected to the outside of the TTL circuit. A semiconductor device, characterized in that it is connected to a terminal and the base region (2) is opened.
JP59179327A 1984-08-30 1984-08-30 Semiconductor device Expired - Fee Related JPH0656850B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59179327A JPH0656850B2 (en) 1984-08-30 1984-08-30 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59179327A JPH0656850B2 (en) 1984-08-30 1984-08-30 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS6159766A JPS6159766A (en) 1986-03-27
JPH0656850B2 true JPH0656850B2 (en) 1994-07-27

Family

ID=16063898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59179327A Expired - Fee Related JPH0656850B2 (en) 1984-08-30 1984-08-30 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH0656850B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02119262A (en) * 1988-10-28 1990-05-07 Toshiba Corp Semiconductor device
JPH06188377A (en) * 1992-12-18 1994-07-08 Matsushita Electric Ind Co Ltd Input/output protective device
JPH07122715A (en) * 1994-04-27 1995-05-12 Toshiba Corp Semiconductor device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5358777A (en) * 1976-11-06 1978-05-26 Mitsubishi Electric Corp Semiconductor device
JPS5679463A (en) * 1979-12-03 1981-06-30 Matsushita Electronics Corp Semiconductor integrated circuit
JPS58159370A (en) * 1982-03-18 1983-09-21 Nec Corp Monolithic integrated circuit

Also Published As

Publication number Publication date
JPS6159766A (en) 1986-03-27

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