JPH0655259B2 - Method for decomposing nitrogen trifluoride - Google Patents
Method for decomposing nitrogen trifluorideInfo
- Publication number
- JPH0655259B2 JPH0655259B2 JP61116711A JP11671186A JPH0655259B2 JP H0655259 B2 JPH0655259 B2 JP H0655259B2 JP 61116711 A JP61116711 A JP 61116711A JP 11671186 A JP11671186 A JP 11671186A JP H0655259 B2 JPH0655259 B2 JP H0655259B2
- Authority
- JP
- Japan
- Prior art keywords
- nitrogen trifluoride
- alumina
- gas
- decomposing nitrogen
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は排ガス中に含まれる三フッ化窒素を分解する方
法に関するものである。The present invention relates to a method for decomposing nitrogen trifluoride contained in exhaust gas.
〔従来の技術および問題点〕 三フッ化窒素は常温では安定であり、水、アルカリ水溶
液、希硫酸、銀、水銀、ガラス、鋼などと反応しないが
温度を上昇させると酸化性が増し、種々の物質をフッ素
化する性質を有する。[Prior Art and Problems] Nitrogen trifluoride is stable at room temperature and does not react with water, aqueous alkaline solution, dilute sulfuric acid, silver, mercury, glass, steel, etc. It has the property of fluorinating the substance.
そのため、フッ素、フッ化ハロゲン等のフッ素化剤の輸
送や取り扱いが困難な場所ではフッ素化剤の代用として
用いられ、或いは三フッ化窒素独特の化学的性質を利用
してロケット燃料、金属溶接、高出力レーザー等に用い
られている。さらに最近ではドライエッチング剤や半導
体CVD（化学蒸着）装置のクリーニング剤としての需要
が高まっている。Therefore, it is used as a substitute for fluorinating agents in places where it is difficult to transport and handle fluorinating agents such as fluorine and halogen fluoride, or by utilizing the unique chemical properties of nitrogen trifluoride, rocket fuel, metal welding, It is used in high-power lasers. Furthermore, recently, demand for dry etching agents and cleaning agents for semiconductor CVD (chemical vapor deposition) devices has been increasing.
これら用途拡大に伴い排出される三フッ化窒素の毒性が
問題になって来る。そのため排出されるガス中に含まれ
る三フッ化窒素を除去或いは分解することにより無害化
する必要がある。しかし、三フッ化窒素は常温では安定
な化合物であり、高温ではフッ素と同様な化学的挙動を
示すために制御がむずかしく未だ効果的方法が開発され
ていないのが実情である。With the expansion of these applications, the toxicity of nitrogen trifluoride emitted becomes a problem. Therefore, it is necessary to remove or decompose nitrogen trifluoride contained in the discharged gas to render it harmless. However, nitrogen trifluoride is a stable compound at room temperature, and it has a chemical behavior similar to that of fluorine at high temperature, so that control is difficult and an effective method has not yet been developed.
本発明は斯かる問題点に鑑み案出されたもので、本発明
の目的は排ガス中に含まれる三フッ化窒素を分解し、無
害化することにある。The present invention has been devised in view of such problems, and an object of the present invention is to decompose nitrogen trifluoride contained in exhaust gas to render it harmless.
本発明者等は三フッ化窒素をより安定で無害な物質に分
解する方法について鋭意検討の結果、三フッ化窒素を含
ムガスと、還元性接触、アルミナ及びシリカの内の少な
くとも１種を主成分とする物質とを高温下で接触させる
と三フッ化窒素が分解することを見出し、本発明を完成
するに至った。As a result of intensive studies on the method of decomposing nitrogen trifluoride into a more stable and harmless substance, the present inventors have found that nitrogen trifluoride is mainly used for reducing gas, reducing contact, and at least one of alumina and silica. It was found that nitrogen trifluoride decomposes when it is brought into contact with a substance as a component at high temperature, and the present invention has been completed.
本発明に用いる還元性触媒としてはニッケル、鉄、コバ
ルト又は白金、ロジウム、パラジウム等の貴金属が挙げ
られ、通常ケイソウ土又はアルミナ等に含浸させて使用
する。又アルミナもしくはシリカを主成分とする物質と
してはシリカゲル、アルミナゲル、シリカアルミナゲル
及びゼオライト等を挙げることができる。Examples of the reducing catalyst used in the present invention include noble metals such as nickel, iron, cobalt or platinum, rhodium and palladium, which are usually used by impregnating them with diatomaceous earth or alumina. Examples of the substance containing alumina or silica as a main component include silica gel, alumina gel, silica-alumina gel and zeolite.
接触させる温度は処理するガス中の三フッ化窒素の濃
度、ガス流量によって変わるが200℃以上とすることが
好ましい。The contact temperature varies depending on the concentration of nitrogen trifluoride in the gas to be treated and the gas flow rate, but it is preferably 200 ° C. or higher.
以下実施例により本発明を詳細に説明する。 The present invention is described in detail below with reference to examples.
実施例１ 内径25mm長さ１ｍのニッケル製パイプにNi含浸硅ソウ土
（日揮化学社製N-111）を充填し、外部から300℃に加熱
した。Example 1 A nickel pipe having an inner diameter of 25 mm and a length of 1 m was filled with Ni-impregnated silica soil (N-111 manufactured by JGC Chemical Co., Ltd.) and heated to 300 ° C. from the outside.
NF3 １％、He99％からなるガスを毎分200mlの速度で上
記パイプに流した。５時間経過後の排出ガスをガスクロ
マトグラフィーで分析した結果、N2以外の成分は検出さ
れなかった。A gas consisting of 1% NF 3 and 99% He was passed through the pipe at a rate of 200 ml / min. As a result of analyzing the exhaust gas after 5 hours by gas chromatography, no components other than N 2 were detected.
実施例２ 硅ソウ土の代わりに活性アルミナを用いた還元性物質
（日揮化学社製X104）を使用した他は実施例１と同様な
操作を行った。Example 2 The same operation as in Example 1 was performed except that a reducing substance (X104 manufactured by JGC Chemical Co., Ltd.) using activated alumina was used in place of the silica soil.
排ガス中にN2以外の成分は検出されなかった。No components other than N 2 were detected in the exhaust gas.
実施例３ 硅ソウ土の代わりに0.5％Ptアルミナ成型品（日揮化学
社製N1000）を使用した他は実施例１と同様な操作を行
った。Example 3 The same operation as in Example 1 was performed except that a 0.5% Pt alumina molded product (N1000 manufactured by JGC Chemical Co., Ltd.) was used in place of the silica soil.
排ガス中にN2以外の成分は検出されなった。No components other than N 2 were detected in the exhaust gas.
実施例４ 内径25mm長さ１ｍのニッケル製パイプにアルミナ（住友
化学製活性アルミナKHD-46を充填し、外部から500℃に
加熱した。NF3１％、N299％から成るガスを毎分200mlの
速度で上記パイプに流した。５時間経過後の排ガスをガ
スクロマトグラフィーで分析した結果、N2以外の成分は
検出されなかった。Example 4 A nickel pipe having an inner diameter of 25 mm and a length of 1 m was filled with alumina (activated alumina KHD-46 manufactured by Sumitomo Chemical Co., Ltd.) and externally heated to 500 ° C. A gas containing NF 3 1% and N 2 99% was supplied every minute. After flowing through the pipe at a rate of 200 ml, the exhaust gas after 5 hours was analyzed by gas chromatography and no components other than N 2 were detected.
実施例５ アルミナの代わりにゼオライト（富士デビソン製ゼオラ
イト5A）を使用した他は実施例４と同様な操作を行っ
た。Example 5 The same operation as in Example 4 was carried out except that zeolite (Zeolite 5A manufactured by Fuji Devison) was used instead of alumina.
排ガス中にN2以外の成分は検出されなかった。No components other than N 2 were detected in the exhaust gas.
以上実施例に示した如く、ガス中の三フッ化窒素は実質
的に全量分解しており、本発明の顕著な効果は明白であ
る。As shown in the above examples, substantially all nitrogen trifluoride in the gas is decomposed, and the remarkable effect of the present invention is clear.
Claims (3)
アルミナ及びシリカの内の少なくとも１種を主成分とす
る物質とを接触させることを特徴とする三フッ化窒素を
分解する方法。1. A gas containing nitrogen trifluoride, a reducing catalyst,
A method for decomposing nitrogen trifluoride, which comprises contacting with a substance containing at least one of alumina and silica as a main component.
浸させたニッケル、鉄、コバルト及び貴金属の内の１種
以上である特許請求の範囲第１項記載の方法。2. The method according to claim 1, wherein the reducing catalyst is one or more of nickel, iron, cobalt and a noble metal impregnated in diatomaceous earth or alumina.
範囲第１項記載の方法。3. The method according to claim 1, wherein the contact temperature is 200 ° C. or higher.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61116711A JPH0655259B2 (en) | 1986-05-21 | 1986-05-21 | Method for decomposing nitrogen trifluoride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61116711A JPH0655259B2 (en) | 1986-05-21 | 1986-05-21 | Method for decomposing nitrogen trifluoride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62273039A JPS62273039A (en) | 1987-11-27 |
| JPH0655259B2 true JPH0655259B2 (en) | 1994-07-27 |
Family
ID=14693921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61116711A Expired - Lifetime JPH0655259B2 (en) | 1986-05-21 | 1986-05-21 | Method for decomposing nitrogen trifluoride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0655259B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04250825A (en) * | 1990-12-27 | 1992-09-07 | Agency Of Ind Science & Technol | Treatment of gas containing halogen-containing organic compound |
| US20010001652A1 (en) | 1997-01-14 | 2001-05-24 | Shuichi Kanno | Process for treating flourine compound-containing gas |
| US6162957A (en) * | 1997-03-24 | 2000-12-19 | Showa Denko K.K. | Catalytic decomposition of perfluoro-compound |
| JP3593875B2 (en) * | 1997-03-24 | 2004-11-24 | 昭和電工株式会社 | Method for catalytic decomposition of perfluoro compounds |
| US5935540A (en) * | 1997-04-25 | 1999-08-10 | Japan Pionics Co., Ltd. | Cleaning process for harmful gas |
| EP1340533B1 (en) * | 1997-06-20 | 2010-06-16 | Hitachi, Ltd. | A method of treatment for decomposing fluorine compounds, and catalyst and apparatus therefor |
| CN104548927B (en) * | 2015-01-07 | 2017-01-25 | 黎明化工研究设计院有限责任公司 | Process for removing trace nitrogen trifluoride in carbon tetrafluoride |
-
1986
- 1986-05-21 JP JP61116711A patent/JPH0655259B2/en not_active Expired - Lifetime
Non-Patent Citations (1)
| Title |
|---|
| NITROGEN TRIFLUORIDE ITS CHEMISTRY TOXICITY AND SAFF HANDLING=1976 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62273039A (en) | 1987-11-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |