JPH0652982U - Substrate cleaning / drying jig - Google Patents

Substrate cleaning / drying jig

Info

Publication number
JPH0652982U
JPH0652982U JP9777691U JP9777691U JPH0652982U JP H0652982 U JPH0652982 U JP H0652982U JP 9777691 U JP9777691 U JP 9777691U JP 9777691 U JP9777691 U JP 9777691U JP H0652982 U JPH0652982 U JP H0652982U
Authority
JP
Japan
Prior art keywords
substrate
cleaning
holding
groove
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9777691U
Other languages
Japanese (ja)
Other versions
JP2565386Y2 (en
Inventor
一志 熊谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
COTEC CORPORATION
Original Assignee
COTEC CORPORATION
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by COTEC CORPORATION filed Critical COTEC CORPORATION
Priority to JP1991097776U priority Critical patent/JP2565386Y2/en
Publication of JPH0652982U publication Critical patent/JPH0652982U/en
Application granted granted Critical
Publication of JP2565386Y2 publication Critical patent/JP2565386Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

(57)【要約】 【目的】 フォトマスク基板、ウエハー等の基板の洗浄
・乾燥時に基板保持溝の液残りによる表面汚れを防止し
た槽式基板洗浄・乾燥用治具を提供する。 【構成】 基板をV型保持溝で保持する槽式洗浄用治具
において、V型保持溝下部を被洗浄物の板厚未満に開口
し、かつ開口部が液逃溝と連設してなる保持片を有して
なる基板洗浄用治具。
(57) [Summary] [Object] To provide a tank-type substrate cleaning / drying jig capable of preventing surface contamination due to residual liquid in a substrate holding groove when cleaning / drying a substrate such as a photomask substrate or a wafer. In a tank-type cleaning jig for holding a substrate in a V-shaped holding groove, a lower portion of the V-shaped holding groove is opened to a thickness less than the thickness of the object to be cleaned, and the opening is connected to a liquid escape groove. A substrate cleaning jig having a holding piece.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は、フォトマスク用ガラス基板、液晶ディスプレイ用基板、あるいはウ エハー等の槽式基板洗浄・乾燥用治具に関する。 The present invention relates to a glass substrate for photomasks, a substrate for liquid crystal displays, or a tank-type substrate cleaning / drying jig such as a wafer.

【0002】[0002]

【従来の技術】[Prior art]

従来より、フォトマスク基板やウエハー等の基板の洗浄・乾燥は、連続したV 型溝を有する保持片を下部及び左右側に設け、フォトマスク基板等をこれら3片 のV型溝に保持させ洗浄・乾燥していた。 Conventionally, for cleaning and drying substrates such as photomask substrates and wafers, holding pieces having continuous V-shaped grooves are provided on the lower and left and right sides, and the photomask substrate is held in these three V-shaped grooves for cleaning. -It was dry.

【0003】[0003]

【考案が解決しょうとする課題】[Issues to be solved by the device]

しかし、従来のV型溝を有した保持具では、特に下部に設けたV溝に洗浄時の 溶剤や水が残りやすく、これをそのまま蒸気乾燥、或いはすすぎ槽から引き上げ ながら乾燥した場合、残った溶剤あるいは水のため基板にシミがつき、再度の研 磨・洗浄が必要になる欠点がある。 However, in the conventional holder having the V-shaped groove, the solvent and water during cleaning tend to remain particularly in the V-groove provided at the lower part, and when the solvent or water is directly vapor-dried or dried while being pulled up from the rinse tank, it remains. The solvent or water causes stains on the substrate, which necessitates re-polishing and cleaning.

【0004】 本考案は、基板保持溝の液残りによる表面汚れを防止したフォトマスク基板、 ウエハー等の槽式基板洗浄・乾燥用治具を提供することを目的とする。An object of the present invention is to provide a bath-type substrate cleaning / drying jig for photomask substrates, wafers, etc., in which surface contamination due to liquid remaining in the substrate holding groove is prevented.

【課題を解決するための手段】[Means for Solving the Problems]

【0005】 そこで、本考案者は、前記目的を解決するため鋭意研究をおこなった結果、基 板をV型保持溝で保持する槽式洗浄用治具において、V型保持溝下部を被洗浄物 の板厚未満に開口し、かつ開口部が液逃溝と連設してなる保持片を有する構造に すれば前記目的が達成できるとの知見を得て本考案を完成した。Therefore, as a result of intensive research to solve the above-mentioned object, the present inventor has found that in a tank-type cleaning jig for holding a substrate in a V-shaped holding groove, the lower portion of the V-shaped holding groove is to be cleaned. The present invention has been completed based on the finding that the above object can be achieved by using a structure having a holding piece having an opening less than the plate thickness and the opening being connected to the liquid escape groove.

【0006】 以下、図面に基づいて本考案を詳細に説明する。 図1は、本考案の洗浄・乾燥用治具の一部の正面図を示し、保持片1は、被洗 浄物4が保持されるV型保持溝2の下部から連設した液逃溝3を有している。Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 shows a front view of a part of the cleaning / drying jig of the present invention, in which a holding piece 1 is a liquid escape groove continuously provided from a lower portion of a V-shaped holding groove 2 in which an object to be cleaned 4 is held. Have three.

【0007】 V型保持溝下部は、被洗浄物の板厚未満に開口され、下方に向かって広がる三 角形状をなした液逃溝3と連設されている。The lower portion of the V-shaped holding groove is connected to a liquid escape groove 3 having a triangular shape which is opened below the plate thickness of the object to be cleaned and which spreads downward.

【0008】 液逃溝3との開口部は、各種基板厚により適宜決定される。The opening of the liquid escape groove 3 is appropriately determined according to various substrate thicknesses.

【0009】 また液逃溝3の形状は、開口部より下方に向かって広がる三角形状であること が好ましく、三角形状の開口度は、15度から140度が好ましい。15度未満 では表面張力により溶液の液逃げが起きずらく、また140度を越えると製品加 工上好ましくない。Further, the shape of the liquid escape groove 3 is preferably a triangular shape that spreads downward from the opening, and the opening degree of the triangular shape is preferably 15 degrees to 140 degrees. If it is less than 15 degrees, it is difficult for the solution to escape due to the surface tension, and if it exceeds 140 degrees, it is not preferable in terms of product processing.

【0010】 図2は、本考案の保持片の一部の斜視図であり、角部を面取してなめらかにす ることによって、基板との接触によるトラブルを防止したものである。FIG. 2 is a perspective view of a part of the holding piece of the present invention, in which troubles due to contact with the substrate are prevented by chamfering and smoothing the corners.

【0011】 図3は、本考案の洗浄治具の一実施態様で、槽式箱状体の下部に液逃溝を有し た保持片1を設け、かつ左右側にV型保持片を設けてある。また、それぞれの保 持片は左右のサグリにより、それぞれ位置が移動可能で被洗浄物である基板の大 きさによりネジ止め位置が適宜決定できる。FIG. 3 shows an embodiment of the cleaning jig of the present invention, in which a holding piece 1 having a liquid escape groove is provided at the bottom of a tank-type box-like body, and V-shaped holding pieces are provided on the left and right sides. There is. Further, the respective holding pieces can be moved by the counterbore on the left and right, and the screwing position can be appropriately determined depending on the size of the substrate to be cleaned.

【0012】 基板を下部、左右側面の保持片で保持し、洗浄・乾燥すれば、洗浄・乾燥に用 いる液体が液逃溝に流出し保持部に液が残存することなく洗浄・乾燥による基板 下部のシミを防止することができる。If the substrate is held by the holding pieces on the lower side and the left and right side surfaces and washed and dried, the liquid used for washing and drying does not flow out to the liquid escape groove and the liquid does not remain in the holding portion. It is possible to prevent stains at the bottom.

【0013】[0013]

【考案の効果】[Effect of device]

本考案によれば、特別な装置を用いることなく安価な構造により、基板保持片 に残る液滴を逃し、従来の洗浄・乾燥時のシミの発生を防止することができる。 According to the present invention, it is possible to prevent droplets remaining on the substrate holding piece and prevent the generation of spots during conventional cleaning and drying with an inexpensive structure without using a special device.

【0014】[0014]

【実施例】【Example】

図3に示す洗浄用治具において、下部保持片の形状を表1に示すように変化さ せ、10枚の板厚0.6mmのフォトマスク基板を保持し、純水で洗浄した後、 乾燥を行い基板下部のシミの発生を比較した。その結果、表1に示すように、三 角形状のものはシミが発生しなかったが、実験例5のY型では、表面張力により 液が逃げずシミが発生した。また実験例6の円形状の形状もすべてしみが発生し た。 In the cleaning jig shown in FIG. 3, the shape of the lower holding piece was changed as shown in Table 1, and ten photomask substrates having a plate thickness of 0.6 mm were held, washed with pure water, and then dried. Then, the generation of stains on the lower part of the substrate was compared. As a result, as shown in Table 1, the triangular shape did not generate stains, but in the Y type of Experimental Example 5, the liquid did not escape due to the surface tension and stains occurred. Further, all the circular shapes of Experimental Example 6 also had spots.

【表1】 [Table 1]

【図面の簡単な説明】[Brief description of drawings]

【図1】本考案の洗浄・乾燥用治具の一部の正面図。FIG. 1 is a front view of a part of a cleaning / drying jig of the present invention.

【図2】本考案の保持片の一部の斜視図。FIG. 2 is a partial perspective view of a holding piece of the present invention.

【図3】本考案の洗浄・乾燥用治具の一実施態様の斜視
図。
FIG. 3 is a perspective view of an embodiment of a cleaning / drying jig of the present invention.

【符号の説明】[Explanation of symbols]

1 保持片 2 V型保持溝 3 液逃溝 4 被洗浄物 5 面取部 1 Holding piece 2 V type holding groove 3 Liquid escape groove 4 Cleaning target 5 Chamfer

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 基板をV型保持溝で保持する槽式洗浄用
治具において、V型保持溝下部を被洗浄物の板厚未満に
開口し、かつ開口部が液逃溝と連設してなる保持片を有
してなる基板洗浄用治具。
1. A tank-type cleaning jig for holding a substrate in a V-shaped holding groove, wherein the lower portion of the V-shaped holding groove is opened to a thickness less than the thickness of the object to be cleaned, and the opening is connected to the liquid escape groove. A substrate cleaning jig having a holding piece made of
【請求項2】 基板をV型保持溝で保持する槽式洗浄用
治具において、V型保持溝下部を被洗浄物の板厚未満に
開口し、かつ開口部が下方に向かって広がる三角形状を
なした液逃溝と連設してなる保持片を有してなる基板洗
浄用治具。
2. A tank-type cleaning jig for holding a substrate in a V-shaped holding groove, wherein the lower portion of the V-shaped holding groove is opened to a thickness less than the thickness of the object to be cleaned, and the opening is widened downward. A jig for cleaning a substrate, comprising a holding piece formed in series with the liquid escape groove formed as described above.
JP1991097776U 1991-11-01 1991-11-01 Jig for cleaning and drying substrates Expired - Lifetime JP2565386Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1991097776U JP2565386Y2 (en) 1991-11-01 1991-11-01 Jig for cleaning and drying substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1991097776U JP2565386Y2 (en) 1991-11-01 1991-11-01 Jig for cleaning and drying substrates

Publications (2)

Publication Number Publication Date
JPH0652982U true JPH0652982U (en) 1994-07-19
JP2565386Y2 JP2565386Y2 (en) 1998-03-18

Family

ID=14201240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1991097776U Expired - Lifetime JP2565386Y2 (en) 1991-11-01 1991-11-01 Jig for cleaning and drying substrates

Country Status (1)

Country Link
JP (1) JP2565386Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014056865A (en) * 2012-09-11 2014-03-27 Dainippon Screen Mfg Co Ltd Substrate holding member and substrate processing apparatus including the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6020476U (en) * 1983-07-20 1985-02-13 三菱自動車工業株式会社 Vehicle body vibration damping structure
JPS60168580A (en) * 1984-02-10 1985-09-02 呉船産業株式会社 Glass substrate cleaning apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6020476U (en) * 1983-07-20 1985-02-13 三菱自動車工業株式会社 Vehicle body vibration damping structure
JPS60168580A (en) * 1984-02-10 1985-09-02 呉船産業株式会社 Glass substrate cleaning apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014056865A (en) * 2012-09-11 2014-03-27 Dainippon Screen Mfg Co Ltd Substrate holding member and substrate processing apparatus including the same

Also Published As

Publication number Publication date
JP2565386Y2 (en) 1998-03-18

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