JP2565386Y2 - Jig for cleaning and drying substrates - Google Patents

Description

[Detailed description of the invention]

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a tank type cleaning and drying explosion jig for a glass substrate for a photomask, a substrate for a liquid crystal display, or a wafer.

[0002]

2. Description of the Related Art Conventionally, for cleaning and drying of a substrate such as a photomask substrate or a wafer, holding pieces having a continuous V-shaped groove are provided on the lower side and on the left and right sides, and the photomask substrate and the like are V-shaped. It was held in a groove and washed and dried.

[0003]

However, in the conventional holder having a V-shaped groove, a solvent or water at the time of cleaning tends to remain particularly in a V-groove provided at a lower portion. If the substrate is dried while being pulled up from the substrate, there is a disadvantage that the substrate is stained by the remaining solvent or water and polishing and cleaning must be performed again.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a tank type cleaning and drying jig for a photomask substrate, a wafer or the like, which prevents surface contamination due to liquid residue in a substrate holding groove.

[Means for Solving the Problems]

Therefore, in a tank-type cleaning / drying jig for holding a substrate in a side surface and a lower V-shaped holding groove, an opening having a thickness smaller than the plate thickness of the material to be cleaned / dried is provided in the lower V-shaped holding groove. In the opening, the opening angle that spreads downward from 15 degrees to 1
By providing a triangular liquid escape groove of 40 degrees, the liquid was prevented from remaining in the V groove, and the substrate was not stained.

Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 is a front view of a part of the cleaning / drying jig of the present invention. A holding piece 1 is provided with a liquid escape groove 3 provided continuously from a lower part of a V-shaped holding groove 2 for holding an object 4 to be cleaned. have.

The lower part of the V-shaped holding groove is opened below the thickness of the object to be cleaned, and is connected to a triangular liquid escape groove 3 extending downward.

The opening with the liquid escape groove 3 is appropriately determined depending on various substrate thicknesses.

The shape of the liquid escape groove 3 is preferably a triangular shape extending downward from the opening, and the opening of the triangular shape is preferably from 15 to 140 degrees. If the angle is less than 15 degrees, the solution does not easily escape due to the surface tension. If the angle exceeds 140 degrees, it is not preferable in product processing.

FIG. 2 is a perspective view of a part of the holding piece of the present invention, in which a corner portion is chamfered and smoothed to prevent trouble due to contact with a substrate.

FIG. 3 shows an embodiment of the cleaning jig of the present invention, in which a holding piece 1 having a liquid escape groove is provided at a lower portion of a tank-type box-like body, and V-shaped holding pieces are provided on the left and right sides. is there. The positions of the holding pieces can be moved by the right and left counterbores, and the screwing position can be appropriately determined according to the size of the substrate to be cleaned.

The substrate is held by lower, left and right holding pieces,
By washing and drying, the liquid used for washing and drying flows out to the liquid escape groove, and the liquid at the lower portion of the substrate due to washing and drying can be prevented without leaving the liquid in the holding portion.

[0013]

According to the present invention, the liquid droplets remaining on the substrate holding piece can be escaped by using an inexpensive structure without using any special device, and the occurrence of stains during conventional washing and drying can be prevented.

[0014]

EXAMPLE In the cleaning jig shown in FIG. 3, the shape of the lower holding piece was changed as shown in Table 1, and the thickness of the ten holding pieces was changed to 0.1.
A 6 mm photomask substrate was held, washed with pure water, dried, and the occurrence of spots on the lower portion of the substrate was compared. As a result, as shown in Table 1, no stain occurred in the triangular shape, but in the Y type of Experimental Example 5, the liquid did not escape due to surface tension, and stain occurred. In addition, all of the circular shapes of Experimental Example 6 were stained.

[Table 1]

[Brief description of the drawings]

FIG. 1 is a front view of a part of a cleaning and drying jig of the present invention.

FIG. 2 is a perspective view of a part of the holding piece of the present invention.

FIG. 3 is a perspective view of one embodiment of the cleaning and drying jig of the present invention.

[Description of Signs] 1 holding piece 2 V-shaped holding groove 3 liquid escape groove 4 object to be cleaned 5 chamfer

Claims (1)

(57) [Scope of request for utility model registration] 1. A tank-type cleaning / drying jig for holding a substrate in a side surface and a lower V-shaped holding groove, wherein the lower V-shaped holding groove is provided with an opening having a thickness less than the thickness of the material to be cleaned / dried. In the opening, the opening angle that spreads downward from 15 degrees to 140 degrees
A substrate cleaning / drying jig with a triangular liquid escape groove.