JPH06258608A - Glass substrate cleaning and holding device - Google Patents

Glass substrate cleaning and holding device

Info

Publication number
JPH06258608A
JPH06258608A JP4510893A JP4510893A JPH06258608A JP H06258608 A JPH06258608 A JP H06258608A JP 4510893 A JP4510893 A JP 4510893A JP 4510893 A JP4510893 A JP 4510893A JP H06258608 A JPH06258608 A JP H06258608A
Authority
JP
Japan
Prior art keywords
glass substrate
cleaning
holding
holding device
held
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4510893A
Other languages
Japanese (ja)
Inventor
Shigeru Uchida
茂 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Seimaku KK
Original Assignee
Ulvac Seimaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Seimaku KK filed Critical Ulvac Seimaku KK
Priority to JP4510893A priority Critical patent/JPH06258608A/en
Publication of JPH06258608A publication Critical patent/JPH06258608A/en
Pending legal-status Critical Current

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Landscapes

  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning In General (AREA)

Abstract

PURPOSE:To provide the cleaning and holding device for cleaning a more precise glass substrate which has no residue. CONSTITUTION:Three cleaning shafts 11 where V-shaped grooves for holding the glass substrate 12 are formed at plural places in the length direction, are arranged in an inverted triangular shape and both the end parts are fixed to a side plate 13. While the glass substrate 12 are mounted in the groove parts of the cleaning shafts 11 and held, both the upper and lower end surfaces of the glass substrate 12 are slanted at an angle theta. Multi-stage angled parts are formed in the grooves of the cleaning shafts 11. The glass substrate 11 which is held slantingly, is dipped in a cleaning liquid or vapor tank, and cleaning liquid sticking on the glass substrate end part after the glass substrate is lifted, becomes easy to flow along the slanting end surface and decreases in sticking amount, so cleaning of high quality is enabled.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、マスク基板及びLCD
(液晶デバイス)等電子材料用ガラス基板の精密洗浄工
程に使用するガラス基板洗浄保持装置(治具)に関す
る。
FIELD OF THE INVENTION The present invention relates to a mask substrate and an LCD.
The present invention relates to a glass substrate cleaning / holding device (jig) used in a precision cleaning process of glass substrates for electronic materials such as (liquid crystal devices).

【0002】[0002]

【従来の技術】従来のガラス基板洗浄保持装置(以下、
略して洗浄保持装置という。)は、図7(a)(b)に
示すように、中心部1aに金属(SUS)を用い、周辺
部1bに主に4ふっ化エチレン(PTFE)を用いて構
成された洗浄シャフト1を、図8に示すように、垂直状
態のガラス基板2の周面に沿って複数個(図で6個)配
置し、該洗浄シャフト1の周面に形成されたほぼ90°
の角度θ1 を有する溝部3に、ガラス基板2を乗せるよ
うにして保持し、これらの複数個の洗浄シャフト1は、
両端部を樹脂又はSUS(ステンレス鋼)等の金属で作
られた図示しない側板によって固定されている。
2. Description of the Related Art A conventional glass substrate cleaning and holding device (hereinafter, referred to as
It is called a cleaning and holding device for short. ), As shown in FIGS. 7 (a) and 7 (b), shows a cleaning shaft 1 composed of metal (SUS) in the central portion 1a and ethylene tetrafluoride (PTFE) in the peripheral portion 1b. As shown in FIG. 8, a plurality of (six in the figure) are arranged along the peripheral surface of the glass substrate 2 in a vertical state, and the cleaning shaft 1 is formed on the peripheral surface of approximately 90 °.
The glass substrate 2 is held so as to be placed in the groove portion 3 having the angle θ 1 of
Both ends are fixed by side plates (not shown) made of resin or metal such as SUS (stainless steel).

【0003】従来のガラス基板の洗浄は、上記した図8
に示すような状態で、ガラス基板2を洗浄シャフト1に
よって保持し、図示しない洗浄液槽又は蒸気槽に浸漬
し、これを1〜複数回繰り返し洗浄を行なっていた。こ
の時の洗浄液としては、主に純水、超純水及び界面活性
剤を用いた洗剤、酸溶液、アルカリ溶液溶剤がある。ま
た、蒸気槽としては、主に超純水、溶剤を用いたものが
あり、洗浄の目的・品質によりこれらを組み合わせて用
いている。
The conventional cleaning of the glass substrate is performed by the above-mentioned FIG.
In the state as shown in (1), the glass substrate 2 was held by the cleaning shaft 1 and immersed in a cleaning liquid tank or a steam tank (not shown), and this was repeated 1 to several times for cleaning. As the cleaning liquid at this time, there are mainly pure water, ultrapure water, a detergent using a surfactant, an acid solution, and an alkaline solution solvent. Some steam tanks mainly use ultrapure water and a solvent, which are used in combination depending on the purpose and quality of cleaning.

【0004】[0004]

【発明が解決しようとする課題】上記した従来の洗浄保
持装置は、図8に示すように、被洗浄物であるガラス基
板2の上下端面が水平状態で搬送され、このため洗浄液
槽又は蒸気槽に漬け、引き上げた後の上下端面2a部
に、図9に示すように、洗浄液の付着4が多くなり、精
密洗浄する上で、微粒子イオンからなる残渣が洗浄品質
に悪影響を及ぼしているという問題点があった。
In the conventional cleaning / holding device described above, as shown in FIG. 8, the upper and lower end surfaces of the glass substrate 2 as the object to be cleaned are conveyed horizontally, and therefore the cleaning liquid tank or the steam tank. As shown in FIG. 9, the cleaning liquid adheres to the upper and lower end surfaces 2a of the upper and lower end surfaces 2a after being soaked in the solution and the residue composed of fine particle ions adversely affects the cleaning quality in precision cleaning. There was a point.

【0005】また一方、従来の洗浄保持装置では、図7
に示す洗浄シャフト1の溝3とガラス基板2との接触部
に、図10に示すような洗浄液の付着5が生じ、精密洗
浄する上で、この残渣が洗浄品質に悪影響を及ぼしてい
るという問題点があった。
On the other hand, in the conventional cleaning and holding device, as shown in FIG.
The problem that the cleaning liquid adheres 5 as shown in FIG. 10 to the contact portion between the groove 3 of the cleaning shaft 1 and the glass substrate 2 shown in FIG. 10 and this residue adversely affects the cleaning quality in precision cleaning. There was a point.

【0006】本発明は、上記した従来技術の問題点を解
決するもので、残渣のないより精密なガラス基板の洗浄
をするための洗浄保持装置を提供することを目的として
いる。
The present invention solves the above-mentioned problems of the prior art, and an object of the present invention is to provide a cleaning / holding device for cleaning a glass substrate more precisely without residues.

【0007】[0007]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明は、ガラス基板を保持する洗浄シャフト
を、ガラス基板の上下端面を傾けて保持するように、ガ
ラス基板の端面の複数個所に当接して配置したことを特
徴としている。
In order to achieve the above object, the present invention provides a plurality of end surfaces of a glass substrate so that a cleaning shaft for holding the glass substrate is held by inclining the upper and lower end surfaces of the glass substrate. It is characterized by being placed in contact with a point.

【0008】また、ガラス基板を保持する洗浄シャフト
に設けられる溝部に、多段角度の段部を形成したことを
特徴とし、更に、ガラス基板を保持する洗浄シャフトの
表面材質に、4ふっ化エチレンパーフロロアルコキシエ
チレン(PFA)を用いたことを特徴としている。
Further, the cleaning shaft for holding the glass substrate is characterized in that a step portion having a multi-step angle is formed in the groove portion, and further, the surface material of the cleaning shaft for holding the glass substrate is made of tetrafluoroethylene perfluoride. It is characterized by using fluoroalkoxyethylene (PFA).

【0009】[0009]

【作用】上記のように構成されているので、本発明の洗
浄保持装置にガラス基板をセットすると、垂直状態に保
持されたガラス基板に傾きが生じ、この状態で洗浄シャ
フトと共にガラス基板を洗浄液又は蒸気槽に漬け、引き
上げた後のガラス基板の端面部に付着した洗浄液は、図
3に示すように、端面に沿って流れ落ち易くなり、付着
量が減少するようになる。
With the above construction, when the glass substrate is set in the cleaning and holding apparatus of the present invention, the glass substrate held in the vertical state is tilted, and in this state, the glass substrate is washed with the cleaning liquid or the cleaning liquid. As shown in FIG. 3, the cleaning liquid adhered to the end surface portion of the glass substrate after being immersed in the steam tank and pulled up easily flows down along the end surface, and the adhered amount decreases.

【0010】また、本発明の洗浄シャフトに形成された
溝段部の底辺側の角度を大きくすることにより、図4に
示すように、ガラス基板との接触角を大きくすることが
でき、このため、上記同様の洗浄液の付着が減少するよ
うになる。
Further, by increasing the angle on the bottom side of the groove step formed in the cleaning shaft of the present invention, the contact angle with the glass substrate can be increased as shown in FIG. The adhesion of the cleaning liquid similar to the above is reduced.

【0011】一方、溝段部の上辺側の角度を小さくする
ことにより、当該洗浄保持装置によってガラス基板を保
持する際の安定性を良くし、また位置精度を高めること
ができる。
On the other hand, by reducing the angle of the upper side of the groove step portion, it is possible to improve the stability when holding the glass substrate by the cleaning and holding device and to improve the position accuracy.

【0012】更に、ガラス基板を保持する洗浄シャフト
の表面材質に、4ふっ化エチレンパーフロロアルコキシ
エチレン(PFA)を用いたことにより、該洗浄シャフ
トとガラス基板との摩擦係数が大きくなり、従ってガラ
ス基板の保持の安定性をより一層良くすることができ
る。
Further, by using tetrafluoroethylene perfluoroalkoxyethylene (PFA) as the surface material of the cleaning shaft for holding the glass substrate, the coefficient of friction between the cleaning shaft and the glass substrate is increased, and therefore the glass is The stability of holding the substrate can be further improved.

【0013】[0013]

【実施例】次に、本発明の実施例を図面と共に説明す
る。図1は、本発明の洗浄保持装置の一実施例の側面図
で、ガラス基板を保持した状態を示している。
Embodiments of the present invention will now be described with reference to the drawings. FIG. 1 is a side view of an embodiment of the cleaning and holding apparatus of the present invention, showing a state in which a glass substrate is held.

【0014】図において、洗浄保持装置10は、3本の
洗浄シャフト11を逆三角形状に配置することによっ
て、ガラス基板12を、その上下端面が水平より角度θ
傾くようにして保持しており、これらの各洗浄シャフト
11は、両端に配置された樹脂又はSUS等の金属から
なる側板13によって固定されている。
In the figure, the cleaning and holding device 10 arranges three cleaning shafts 11 in an inverted triangular shape so that the upper and lower end surfaces of the glass substrate 12 are at an angle θ with respect to the horizontal.
The cleaning shafts 11 are held so as to be inclined, and the respective cleaning shafts 11 are fixed by side plates 13 made of resin or metal such as SUS disposed at both ends.

【0015】図2(a)は、本発明の洗浄シャフト11
の一実施例を示す側面図、同図(b)は、同図(a)の
A部の要部拡大断面図である。
FIG. 2A shows the cleaning shaft 11 of the present invention.
FIG. 1B is an enlarged cross-sectional view of a main part of a portion A of FIG.

【0016】図において、洗浄シャフト11は、中心部
11aに金属(SUS)を用い、周辺部11bの表面材
質に4ふっ化エチレンパーフロロアルコキシエチレン
(PFA)を用いて構成され、長手方向の適当個所にガ
ラス基板を保持するための複数個の溝14が形成されて
いる。上記溝14は、同図(b)に示すように、多段角
度の段部が形成され、底辺側段部14aの角度θ2 が大
きく、上辺側段部14bの角度θ3 が小さくなるように
形成されており、これらの溝角度は、θ2 >従来の角度
θ1 >θ3 となっている。
In the figure, the cleaning shaft 11 is constructed by using metal (SUS) for the central portion 11a and using tetrafluoroethylene perfluoroalkoxyethylene (PFA) for the surface material of the peripheral portion 11b. A plurality of grooves 14 for holding the glass substrate are formed at the points. As shown in FIG. 3B, the groove 14 is formed with a step portion having a multi-step angle so that the angle θ 2 of the bottom side step portion 14a is large and the angle θ 3 of the top side step portion 14b is small. They are formed, and these groove angles are θ 2 > conventional angle θ 1 > θ 3 .

【0017】次に、上記洗浄装置10を用いたガラス基
板12の洗浄の態様を、図6によって説明すると、3本
の洗浄シャフト11によって垂直状態において上下端面
を傾けて保持されたガラス基板12は、先ず、洗剤15
aを収容した水槽15に浸漬され、ガラス基板表面に付
着した汚れを除去し、次に、純水15bを収容した水槽
15内にてガラス基板表面に付着した洗剤を除去し、更
に、超純水15cを収容した水槽15にてガラス基板表
面のすべてのイオン、不純物を除去する。この時、ガラ
ス基板表面の付着物をより良く落すために、各水槽15
の底部に超音波振動子16が取付けられている。
Next, the manner of cleaning the glass substrate 12 using the cleaning device 10 will be described with reference to FIG. 6. The glass substrate 12 held by the three cleaning shafts 11 with its upper and lower end surfaces tilted in the vertical state is shown in FIG. First, the detergent 15
It is immersed in the water tank 15 containing a to remove the dirt adhering to the glass substrate surface, and then the water tank 15 containing pure water 15b is cleaned to remove the detergent adhering to the glass substrate surface. All the ions and impurities on the glass substrate surface are removed in a water tank 15 containing water 15c. At this time, in order to remove the deposits on the surface of the glass substrate better, each water tank 15
An ultrasonic transducer 16 is attached to the bottom of the.

【0018】上記した各洗浄工程において、ガラス基板
12を水槽15より引き上げる時、ガラス基板11の端
面部に付着した洗浄液は、図3の矢印aに示すように、
端面に沿って流れ落ち易くなっているので、付着量が減
少する。また、洗浄シャフト11の溝14の底辺側の段
部14aの角度θ2 が大きく形成されているので、図4
に示すように、ガラス基板12との接触角を大きくする
ことができ、それによって洗浄液の付着5が減少するの
で、次槽の汚染を防ぎ、更に洗浄乾燥時の残渣を減少さ
せ、高品質の洗浄を可能にしている。
In each of the above cleaning steps, when the glass substrate 12 is pulled up from the water tank 15, the cleaning liquid attached to the end surface of the glass substrate 11 is, as shown by the arrow a in FIG.
Since it easily flows down along the end face, the adhesion amount decreases. Moreover, since the angle θ 2 of the step portion 14a on the bottom side of the groove 14 of the cleaning shaft 11 is formed to be large,
As shown in FIG. 4, the contact angle with the glass substrate 12 can be increased, and the adhesion 5 of the cleaning liquid is reduced, so that the contamination of the next tank is prevented, and the residue at the time of cleaning and drying is reduced, so that high quality It enables cleaning.

【0019】また一方、溝14の上辺側段部14bの角
度θ3 が小さく形成されているので、該洗浄シャフト1
1によりガラス基板12を保持する際の安定性がよくな
り、また位置精度を高めることができる。
On the other hand, since the angle θ 3 of the upper side step 14b of the groove 14 is formed small, the cleaning shaft 1
1 improves the stability when holding the glass substrate 12, and improves the position accuracy.

【0020】更に、洗浄シャフト11の表面材質に、4
ふっ化エチレンパーフロロアルコキシエチレン(PF
A)を用いたことにより、洗浄シャフト11とガラス基
板12との摩擦係数が大きくなり、ガラス基板12の保
持の安定性を一層よくすることができる。
Furthermore, the surface material of the cleaning shaft 11 is 4
Fluorinated ethylene Perfluoroalkoxy ethylene (PF
By using A), the coefficient of friction between the cleaning shaft 11 and the glass substrate 12 is increased, and the stability of holding the glass substrate 12 can be further improved.

【0021】上記した図1に示す実施例において、洗浄
シャフト11を3本設けた構造について説明したが、ガ
ラス基板12を保持する際の安定性をより一層良くする
ために該洗浄シャフト11を3本以上設けてもよい。ま
た、洗浄シャフト11の溝14の形状として、図5
(a)に示すように、溝段部の角度を3段階以上にし、
また、溝形状を、同図(b)に示すように、円弧又は曲
線にしてもよい。
In the embodiment shown in FIG. 1 described above, the structure in which the three cleaning shafts 11 are provided has been described. However, in order to further improve the stability when holding the glass substrate 12, the cleaning shaft 11 is replaced by three cleaning shafts. More than one book may be provided. Further, as the shape of the groove 14 of the cleaning shaft 11, FIG.
As shown in (a), the groove step angle is set to three or more levels,
Further, the groove shape may be an arc or a curve as shown in FIG.

【0022】[0022]

【発明の効果】以上説明したように、本発明によれば、
ガラス基板を精密ウエット洗浄する際に使用する洗浄保
持装置において、ガラス基板を保持する洗浄シャフト
を、ガラス基板の上下端面を傾けて保持するように、ガ
ラス基板の端面の複数個所に当接して配置したことによ
り、ガラス基板の精密洗浄において、ガラス基板を洗浄
液又は蒸気槽に浸漬し、引き上げる時にガラス基板の上
端面部及び下端面部に付着する洗浄液をより少なくする
ことができるので、この付着した洗浄液残渣によるガラ
ス基板の洗浄品質の低下を防ぎ、洗浄品質を極めて高く
することが可能になる。
As described above, according to the present invention,
In a cleaning and holding device used for precision wet cleaning of a glass substrate, a cleaning shaft for holding the glass substrate is arranged in contact with a plurality of end surfaces of the glass substrate so that the upper and lower end surfaces of the glass substrate are inclined and held. By doing so, in the precision cleaning of the glass substrate, it is possible to dip the glass substrate in the cleaning liquid or the vapor tank and to reduce the cleaning liquid attached to the upper end surface portion and the lower end surface portion of the glass substrate when the glass substrate is pulled up. It is possible to prevent the deterioration of the cleaning quality of the glass substrate due to, and to make the cleaning quality extremely high.

【0023】また、ガラス基板を保持する洗浄シャフト
が最低3本で足りるので、保持部に付着する洗浄液を少
なくすることができる。
Further, since at least three cleaning shafts for holding the glass substrate are sufficient, it is possible to reduce the cleaning liquid adhering to the holding portion.

【0024】また、洗浄シャフトに設けられるガラス基
板を保持するための溝部に、多段角度の段部を形成した
ことにより、該洗浄シャフトの溝部のガラス基板との底
辺側の接触角を大きくして該部に付着する洗浄液をより
少なくすることができ、また、上辺側の接触角を小さく
してガラス基板を保持する際の安定性を良くし、また位
置精度を高めることができる。
In addition, since the groove portion for holding the glass substrate provided on the cleaning shaft is formed with the step portion having a multi-step angle, the contact angle of the groove portion of the cleaning shaft with the glass substrate on the bottom side is increased. It is possible to reduce the amount of cleaning liquid that adheres to the portion, reduce the contact angle on the upper side, improve the stability when holding the glass substrate, and improve the position accuracy.

【0025】更に、洗浄シャフトの表面材質に4ふっ化
エチレンパーフロロアルコキシエチレン(PFA)を用
いたことにより、洗浄シャフトとガラス基板との摩擦係
数を大きくできるので、該ガラス基板の保持の安定性を
より一層良好にすることができる。
Further, by using tetrafluoroethylene perfluoroalkoxyethylene (PFA) as the surface material of the cleaning shaft, the coefficient of friction between the cleaning shaft and the glass substrate can be increased, so that the stability of holding of the glass substrate is improved. Can be further improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す洗浄保持装置のガラス
基板を保持した状態の側面図である。
FIG. 1 is a side view showing a state in which a glass substrate of a cleaning and holding device according to an embodiment of the present invention is held.

【図2】本発明の洗浄保持装置を構成する洗浄シャフト
の一実施例を示し、(a)は側面図、(b)は図(a)
のA部の要部拡大断面図である。
2A and 2B show an embodiment of a cleaning shaft that constitutes the cleaning and holding apparatus of the present invention, in which FIG. 2A is a side view and FIG.
It is a principal part expanded sectional view of the A section.

【図3】ガラス基板に付着した洗浄液の流れを示す説明
図である。
FIG. 3 is an explanatory diagram showing a flow of a cleaning liquid attached to a glass substrate.

【図4】本発明の洗浄シャフトのガラス基板保持部の洗
浄液付着状態を示す説明図である。
FIG. 4 is an explanatory view showing a cleaning liquid adhesion state of a glass substrate holding portion of the cleaning shaft of the present invention.

【図5】(a)(b)は本発明の異った実施例を示す洗
浄シャフトの要部側面図である。
5 (a) and 5 (b) are side views of essential parts of a cleaning shaft showing another embodiment of the present invention.

【図6】本発明のガラス基板の洗浄例を示す工程説明図
である。
FIG. 6 is a process explanatory view showing an example of cleaning the glass substrate of the present invention.

【図7】従来例を示し、(a)は洗浄シャフトの側面
図、(b)は図(a)のA部の要部拡大図である。
7A shows a conventional example, FIG. 7A is a side view of a cleaning shaft, and FIG. 7B is an enlarged view of a main part of a portion A in FIG.

【図8】従来の洗浄保持装置のガラス基板を保持した状
態を示す側面図である。
FIG. 8 is a side view showing a state in which a glass substrate of a conventional cleaning and holding device is held.

【図9】従来のガラス基板洗浄時における上部端面部の
洗浄液付着断面図である。
FIG. 9 is a cross-sectional view of the cleaning liquid deposition on the upper end surface portion during the conventional glass substrate cleaning.

【図10】従来のガラス基板洗浄時におけるガラス基板
保持部の洗浄液付着断面図である。
FIG. 10 is a cross-sectional view of a cleaning liquid deposition on a glass substrate holding part during conventional glass substrate cleaning.

【符号の説明】[Explanation of symbols]

4 洗浄液の付着 5 洗浄液の付着 10 ガラス基板洗浄保持装置 11 洗浄シャフト 12 ガラス基板 13 側板 14 溝 14a 底辺側段部 14b 上辺側段部 15 水槽 15a 洗剤 15b 純水 15c 超純水 16 超音波振動子 4 Adhesion of cleaning liquid 5 Adhesion of cleaning liquid 10 Glass substrate cleaning / holding device 11 Cleaning shaft 12 Glass substrate 13 Side plate 14 Groove 14a Bottom side step 14b Top side step 15 Water tank 15a Detergent 15b Pure water 15c Ultrapure water 16 Ultrasonic transducer

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ガラス基板を精密ウエット洗浄する際に
使用する洗浄保持装置において、ガラス基板を保持する
洗浄シャフトを、ガラス基板の上下端面を傾けて保持す
るように、ガラス基板の端面の複数個所に当接して配置
したことを特徴とするガラス基板洗浄保持装置。
1. A cleaning and holding apparatus used for precision wet cleaning of a glass substrate, wherein a cleaning shaft for holding the glass substrate is held at a plurality of positions on the end surface of the glass substrate so that the upper and lower end surfaces of the glass substrate are tilted and held. An apparatus for cleaning and holding a glass substrate, which is placed in contact with a glass substrate.
【請求項2】 ガラス基板を保持する洗浄シャフトに設
けられる溝部に、多段角度の段部を形成したことを特徴
とする請求項1記載のガラス基板洗浄保持装置。
2. The glass substrate cleaning / holding apparatus according to claim 1, wherein a groove portion provided in a cleaning shaft for holding the glass substrate is provided with step portions having multi-step angles.
【請求項3】 ガラス基板を保持する洗浄シャフトの表
面材質に、4ふっ化エチレンパーフロロアルコキシエチ
レンを用いたことを特徴とする請求項1記載のガラス基
板洗浄保持装置。
3. The glass substrate cleaning / holding apparatus according to claim 1, wherein the surface material of the cleaning shaft for holding the glass substrate is ethylene tetrafluoride perfluoroalkoxyethylene.
JP4510893A 1993-03-05 1993-03-05 Glass substrate cleaning and holding device Pending JPH06258608A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4510893A JPH06258608A (en) 1993-03-05 1993-03-05 Glass substrate cleaning and holding device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4510893A JPH06258608A (en) 1993-03-05 1993-03-05 Glass substrate cleaning and holding device

Publications (1)

Publication Number Publication Date
JPH06258608A true JPH06258608A (en) 1994-09-16

Family

ID=12710081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4510893A Pending JPH06258608A (en) 1993-03-05 1993-03-05 Glass substrate cleaning and holding device

Country Status (1)

Country Link
JP (1) JPH06258608A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103157640A (en) * 2011-12-09 2013-06-19 龙焱能源科技(杭州)有限公司 Glass washing flower basket
CN103406321A (en) * 2013-07-09 2013-11-27 深圳市科利德光电材料股份有限公司 Glass substrate cleaning supporting frame
JP2016087570A (en) * 2014-11-07 2016-05-23 日本電気硝子株式会社 Glass plate housing jig
JP2020076982A (en) * 2018-11-01 2020-05-21 日本電気硝子株式会社 Method for manufacturing polarization glass plate and basket for polarization glass plate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103157640A (en) * 2011-12-09 2013-06-19 龙焱能源科技(杭州)有限公司 Glass washing flower basket
CN103406321A (en) * 2013-07-09 2013-11-27 深圳市科利德光电材料股份有限公司 Glass substrate cleaning supporting frame
JP2016087570A (en) * 2014-11-07 2016-05-23 日本電気硝子株式会社 Glass plate housing jig
JP2020076982A (en) * 2018-11-01 2020-05-21 日本電気硝子株式会社 Method for manufacturing polarization glass plate and basket for polarization glass plate

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