JPH0644896A - Manufacture of electron beam controlling electrode plate of plane-form display - Google Patents

Abstract

PURPOSE:To enhance the processing accuracy and reduce the costs by laminating conductive base boards and insulating substance layers alternately, joining them together by baking or pressure attachment, and applying a patterning process to the conductive boards. CONSTITUTION:A plurality of through holes 21 are formed by etching in a stainless steel plate 20 as a conductive base board. By punching, through holes in the same number and in the same arrangement as in the stainless steel plate 20 are formed in a glass sheet 30 as insulating layer and adhesive layer. A plurality of such stainless steel plates 20 and a plurality of such glass sheets 30 are laminated alternately and bonded by means of baking or pressure attachment. Using a sensitive dry film as an etching resist, an etching process is applied to the front and rear stainless steel surfaces of this laminate, and thereby a desired electrode pattern is formed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an electron beam control electrode plate for accelerating an electron beam emitted from an electron emission source or blocking its passage, which is used in a flat panel display device utilizing an electron beam. Regarding

[0002]

2. Description of the Related Art FIG. 6 is a perspective view showing a part of a conventional flat-panel display device. The surface of the substrate 1 is provided with a linear hot cathode 2 as an electron emission source that emits electrons when energized. When the hot cathode 2 is energized, electrons are emitted from the hot cathode 2.

On the other hand, on the back surface of the glass plate 3, there is provided a phosphor film 4 on which dot-shaped three kinds of phosphors which are excited by the collision of electrons and emit light of red, green and blue are applied.
An electron beam control electrode plate 10 is provided between the substrate 1 and the hot cathode 2 and the glass plate 3 and the phosphor film 4.
In this electron beam control electrode plate 10, a large number of first electron control electrodes 14 extending in the vertical direction in the figure are provided on both sides of the insulating substrate 12.
A large number of second electronic control electrodes 16 extending in the horizontal direction of the drawing are formed, a large number of small holes corresponding to each pixel are formed vertically and horizontally on the insulating substrate 12, and each first electrode 14 is formed in the vertical direction. Small holes 14a corresponding to the pixels arranged in a line are formed, and
The electrode plate 16 is provided with small holes corresponding to the pixels arranged in a row in the horizontal direction.

By energizing the hot electrode 2, the hot electrode 2
The electrons emitted from the glass head toward the glass plate 3,
By applying a predetermined voltage to each of the first and second electron control electrodes 14 and 16 of the electron beam control electrode plate 10, the electrons directed toward the glass plate 3 are temporarily made into a small hole corresponding to one pixel. After passing through only, the light enters the phosphor film 4, and the corresponding phosphor emits light of a predetermined color. An image is displayed on the glass plate 3 by sequentially performing this control for each pixel.

The electron beam control electrode plate 10 used in this surface type display device has conventionally been (1) a strip-shaped strip with through holes formed by punching or the like on both sides of an insulating substrate having a plurality of through holes. A metal foil is arranged and this metal foil is used as an electronic control electrode. (2) An electronic control electrode is formed on both surfaces of an insulating substrate having a plurality of through holes by printing and firing a paste, or by sputtering. It was manufactured by a method such as.

[0006]

However, in the conventional methods of (1) and (2), (a) in the case of the manufacturing method of (1), the processing accuracy of the metal foil is low, and the size is increased. However, it is difficult to manufacture an electron beam control electrode plate used for a highly accurate and fine flat display device. (B) In the case of the manufacturing method of (2), the electron beam control electrode needs to have a certain thickness (about 100 to 200 μm) in the electron beam traveling direction in order to effectively function, and therefore, Although it is necessary to uniformly metallize the inner wall of the through hole provided in the insulating substrate to a certain depth (about 100 to 200 μm), such uniform metallization of the inner wall of the hole is technically difficult and costly to implement. It takes. There was a problem.

An object of the present invention is to solve the above problems and to provide a method of manufacturing an electron beam control electrode which has high processing accuracy and is easy to manufacture.

[0008]

A method of manufacturing an electron beam control electrode plate for a flat panel display device according to the present invention which achieves the above object, comprises:
Three or more conductive substrates and two or more insulating substances as adhesive layers are alternately laminated so that the front and back surfaces become conductive substrates, and these three or more conductive substrates are bonded to each other by firing or pressure bonding. It is characterized in that a control electrode to which a passing electron control potential is applied is formed by bonding more than one insulating material layer and subjecting the conductive substrates on the front and back surfaces to a patterning process.

Here, the patterning method for performing the patterning is not limited to a specific method, and various processing methods such as etching, laser processing, or mechanical processing may be adopted. However, when an etching process is adopted as the patterning process, it is preferable to use a photosensitive dry film as an etching resist for this etching process.

[0010]

According to the method of manufacturing the electron beam control electrode plate of the flat display device of the present invention, a sheet-shaped glass, ceramic, or polyimide film is formed on a conductive substrate such as a metal plate having a thickness of about 100 to 200 μm. Since a plurality of conductive substrates are bonded by using an insulating material layer as an adhesive layer by printing or laminating an insulating material and then firing or press-bonding it, and then performing a patterning process to produce a control electrode. As compared with the conventional method of arranging the strip-shaped electrodes on the insulating substrate, the processing accuracy is dramatically improved, and it becomes easier to cope with the increase in size and definition. For example, when the electrodes are processed by etching, the processing accuracy depends largely on the resolution of the photosensitive dry film used as a resist, but the work size is 600 × 600 mm and the line spacing / line width =
Processing of 50/50 μm is possible.

Further, since a conductive substrate such as a metal plate having a thickness of 100 to 200 μm is processed and used as a control electrode, a thickness effective for electron beam control can be obtained as compared with metalizing by printing a conductive material or sputtering. The electrodes that it has can be easily formed, thus reducing the cost. Further, since the present invention is to manufacture an electron beam control electrode plate having a structure in which at least one or more conductive substrates such as metal plates are sandwiched by an insulating material, a conductive substrate sandwiched by an insulating material is A structurally strong electron beam control electrode is produced which acts as a reinforcing material.

[0012]

EXAMPLES Examples of the present invention will be described below. Figure 1
Shows the surface shape of the stainless steel plate to be the electron beam control electrode, and FIG. 2 is a partially enlarged view thereof. First, 300 × 20
0 mm, 100 μm thick stainless steel plate 20 (SUS3
04) By etching, three through holes 21 having a diameter of 400 μm are formed with 320 centers × 800 with a center interval of 800 μm.
Individually formed. After that, two glass sheets 30 as an insulating layer and an adhesive layer were alternately interposed, and laminated as shown in FIG. The glass sheet 30 is Na ₂ O—BaO—Si.
A slurry prepared by adding 10 parts by weight of PVB resin and 5 parts by weight of DOP resin to 100 parts by weight of O ₂ -based glass powder was molded into a thickness of 100 μm by a doctor blade method, and a through hole of 450 μm was formed. Center spacing is 800 μm
It is formed by punching out 320 × 200 pieces and then cut into 300 × 200 mm.

Next, the organic resin component of the glass sheet 30 is volatilized by holding it in an electric furnace at 500 ° C. for 10 minutes,
After that, it was held at 900 ° C. for 20 minutes, whereby the glass sheet 30 was fired and the stainless steel plate 20 was joined. Next, a dry film (Alfo 111Y38, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) was pressure-bonded to the front and back surfaces of the integrated stainless steel plate 20, the photosensitive resist paste was applied to the side surfaces, and the front and back surfaces were respectively formed with FIG. The pattern shown in FIG. 5 was exposed, and the entire side surface was exposed. In FIGS. 4 and 5, the holes shown in FIGS. 1 to 3 are omitted in order to avoid complication. After that, a phenomenon occurred and the resist in the shaded portion was removed.

Finally, after etching the whole to form a desired electrode pattern, the resist was peeled off. As a result, a precise electron beam control electrode plate was easily manufactured. Further, as shown in this Example, the structure in which the stainless steel plate 20 and the like are sandwiched between the glass sheets 30 produced a structurally strong electron beam control electrode plate.

Although not shown in the above embodiment, the insulating layer can be formed by printing a glass paste instead of using the glass sheet. Further, in the above-mentioned embodiment, a stainless plate having a through hole formed in advance was used, but an insulating glass layer having acid resistance (SiO ₂ -A
It is also possible to simultaneously form through-holes in the stainless steel plate in the etching process by using a 1 ₂ O ₃ —BaO—ZnO system or the like.

[0016]

As described above, according to the method of manufacturing the electron beam control electrode plate of the flat panel display device of the present invention, the conductive substrate and the insulating material layer are laminated, and these are joined by firing or pressure bonding, After that, since the control electrode is formed by performing patterning processing on the conductive substrate, a control electrode with high processing accuracy can be easily obtained, and it is possible to meet the demand for large size and high definition at low cost. Become.

[Brief description of drawings]

FIG. 1 is a diagram showing a surface shape of a stainless plate to be an electron beam control electrode.

FIG. 2 is a partially enlarged view of the stainless steel plate shown in FIG.

FIG. 3 is a perspective view showing a state in which a stainless plate and a glass sheet are laminated.

FIG. 4 is a diagram showing a resist pattern on the surface.

FIG. 5 is a diagram showing a resist pattern on the back surface.

FIG. 6 is a perspective view showing a part of a conventional flat-panel display device.

[Explanation of symbols]

 20 Stainless steel plate 21 Hole 30 Glass sheet

Front page continuation (72) Inventor Koji Kitamura 2270 Yokose, Yokose-cho, Chichibu-gun, Saitama Sanryo Materials Co., Ltd.

Claims (2)

[Claims] 1. A laminate of three or more conductive substrates and two or more insulating materials as an adhesive layer are alternately laminated so that the front and back surfaces are conductive substrates, and these three or more conductive substrates are baked or pressure-bonded. A flat type display characterized by forming a control electrode to which a passing electron control potential is applied by joining a conductive substrate and two or more insulating material layers and subjecting the conductive substrates on the front and back surfaces to a patterning process. Method for manufacturing electron beam control electrode plate of device. 2. The electron beam control electrode plate of a flat panel display according to claim 1, wherein the patterning process is an etching process, and the photosensitive dry film is used as an etching resist in the etching process. Production method.