JPH0634701U - Concentrated liquid recovery structure in thin film vacuum evaporator - Google Patents

Concentrated liquid recovery structure in thin film vacuum evaporator

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Publication number
JPH0634701U
JPH0634701U JP7947592U JP7947592U JPH0634701U JP H0634701 U JPH0634701 U JP H0634701U JP 7947592 U JP7947592 U JP 7947592U JP 7947592 U JP7947592 U JP 7947592U JP H0634701 U JPH0634701 U JP H0634701U
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Japan
Prior art keywords
concentrated liquid
evaporation
liquid
rotor
film vacuum
Prior art date
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Pending
Application number
JP7947592U
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Japanese (ja)
Inventor
一之 遠藤
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Okawara Mfg Co Ltd
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Okawara Mfg Co Ltd
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Publication date
Application filed by Okawara Mfg Co Ltd filed Critical Okawara Mfg Co Ltd
Priority to JP7947592U priority Critical patent/JPH0634701U/en
Publication of JPH0634701U publication Critical patent/JPH0634701U/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【目的】 濃縮液の回収経路を変更することにより、バ
イパス管を廃し、これにより蒸発面への当接事故を防止
する。 【構成】 本考案の濃縮液回収構造20は前後方向に複
数の蒸発面11を連続形成して成る遠心式の薄膜真空蒸
発装置1に適用され、最も手前側の蒸発面11の最外周
部近傍に集液溝21を設け、この集液溝21に対しペア
リングチューブ18の先端が臨み、なお且つ蒸発面11
の最外周部側の境界部には排出口22が設けられ、この
排出口22と前記集液溝21との間は連絡通路23によ
って接続されていることを特徴としている。
(57) [Summary] [Purpose] By changing the recovery path of the concentrated liquid, the bypass pipe is abolished, thereby preventing accidental contact with the evaporation surface. [Structure] The concentrated liquid recovery structure 20 of the present invention is applied to a centrifugal thin-film vacuum evaporation apparatus 1 formed by continuously forming a plurality of evaporation surfaces 11 in the front-rear direction, and the vicinity of the outermost peripheral portion of the evaporation surface 11 on the front side A liquid collecting groove 21 is provided in the liquid collecting groove 21, and the tip of the pairing tube 18 faces the liquid collecting groove 21.
A discharge port 22 is provided at the boundary portion on the outermost peripheral side, and the discharge port 22 and the liquid collection groove 21 are connected by a communication passage 23.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【考案の目的】[The purpose of the device] 【産業上の利用分野】[Industrial applications]

本考案は熱変性を受けやすい物質の蒸発、濃縮等の加熱操作を低温で短時間に 処理するのに適した遠心式の薄膜真空蒸発装置に関するものであって、特に複数 の蒸発面を前後方向に連続形成して成る薄膜真空蒸発装置に適用される濃縮液の 回収経路構造に係るものである。 The present invention relates to a centrifugal thin-film vacuum evaporation device suitable for heating at high temperature in a short time at a heating operation such as evaporation and concentration of a substance which is susceptible to thermal denaturation. The present invention relates to a concentrated liquid recovery path structure applied to a thin film vacuum evaporation apparatus formed by continuously forming a thin film.

【0002】[0002]

【考案の背景】[Background of device]

熱変性を受けやすい物質の蒸発、濃縮等の加熱操作を低温、短時間で所定の熱 量を与えることにより行うことのできる遠心式の薄膜真空蒸発装置には、処理効 率を上げるため、蒸発面を複数設けたものとして図4に示す構造のものがある。 このものは図4に示すように前後方向に複数の蒸発面11′が蛇腹状に連続形成 されて成るものであり、更にその内部には奥部側に二面の蒸発面11′の最外周 側の境界部と、手前側蒸発面の最内周部とを結ぶバイパス管Bが設けられ、また 手前側蒸発面11´の最外周部近傍にはペアリングチューブ18′が臨むという 構成となっている。 Centrifugal thin-film vacuum evaporators, which can perform heating operations such as evaporation and concentration of substances that are susceptible to thermal denaturation by applying a predetermined amount of heat at low temperature for a short time, evaporate to increase the processing efficiency. As one having a plurality of surfaces, there is a structure shown in FIG. As shown in FIG. 4, this is composed of a plurality of evaporating surfaces 11 'continuously formed in a bellows shape in the front-rear direction, and further inside thereof, the outermost periphery of the evaporating surfaces 11' having two surfaces on the inner side. A bypass pipe B that connects the side boundary portion to the innermost peripheral portion of the front side evaporation surface is provided, and the pairing tube 18 ′ faces the outermost peripheral portion of the front side evaporation surface 11 ′. ing.

【0003】 そしてこのような薄膜真空蒸発装置1′に原料液が供給されると、原料液は図 4中、矢印で示すように各蒸発面11′を伝わって遠心力によって蒸発面11′ の最外周部へ濃縮されながら移動する。そして奥部側二面の蒸発面11′の最外 周側境界部に至った濃縮液は、バイパス管B内に一旦回収され、手前側蒸発面1 1′の最内周部に供給される。そして手前側蒸発面11′の最内周部に供給され た濃縮液は、この蒸発面11′を伝わって、更に濃縮されながら遠心力によって 蒸発面11′の最外周部にまで至り、これに臨むペアリングチューブ18′によ って回収され、装置外部に排出される。When the raw material liquid is supplied to such a thin film vacuum evaporation apparatus 1 ′, the raw material liquid is transmitted to each evaporation surface 11 ′ as shown by an arrow in FIG. It moves to the outermost part while being concentrated. Then, the concentrated liquid that has reached the outermost peripheral side boundary portion of the two evaporation surfaces 11 ′ on the back side is once collected in the bypass pipe B and supplied to the innermost peripheral portion of the front side evaporation surface 11 ′. . Then, the concentrated liquid supplied to the innermost peripheral portion of the front side evaporation surface 11 'travels along the evaporation surface 11' and reaches the outermost peripheral portion of the evaporation surface 11 'by centrifugal force while being further concentrated. It is collected by the facing pairing tube 18 'and discharged to the outside of the device.

【0004】 しかしこの構造ではバイパス管Bの存在が不可欠であり、装置奥部側に位置す るこのバイパス管Bを支持するには、ロータ4′前方よりロータ4′の中心付近 を通ってロータ内部に至る支持杆Cによって固定する以外に支持方法がない。ま たバイパス管Bは図4(b)に示すように濃縮液の粘性抵抗により、バイパス管 Bの先端部に接線方向に大きなトルクを受けるから、ロータ4′の回転数が大き い場合や濃縮液が大流量となる場合にはバイパス管Bは支持杆Cと共に捩じられ 、また撓み変形することにより、バイパス管Bの先端部が蒸発面11′に当接す るおそれがある。従ってこのような構造の薄膜真空蒸発装置1′においては、バ イパス管B及びこれを支持する支持杆Cの固定を強固とすることが必要となるが 、ロータ4′の中心付近の狭い空間を利用しての補強部材の設置の困難さもあっ て、構造上その強度には限界がある。However, in this structure, the presence of the bypass pipe B is indispensable, and in order to support the bypass pipe B located on the inner side of the apparatus, the rotor 4'is passed from near the center of the rotor 4'to the rotor. There is no supporting method other than fixing by the supporting rod C reaching the inside. Further, as shown in FIG. 4 (b), the bypass pipe B receives a large tangential torque at the tip of the bypass pipe B due to the viscous resistance of the concentrated liquid. When the liquid has a large flow rate, the bypass pipe B may be twisted together with the support rod C and may be flexibly deformed, so that the tip portion of the bypass pipe B may come into contact with the evaporation surface 11 ′. Therefore, in the thin film vacuum evaporation apparatus 1'having such a structure, it is necessary to firmly fix the bypass pipe B and the supporting rod C supporting the bypass pipe B, but a narrow space near the center of the rotor 4'is required. There is a limit to the strength of the structure due to the difficulty of installing the reinforcing member.

【0005】[0005]

【開発を試みた技術的事項】[Technical items we tried to develop]

本考案はこのような背景からなされたものであって、濃縮液の回収経路を変更 することにより、バイパス管を廃し、もってロータへの当接の危険性を回避した 新規な薄膜真空蒸発装置における濃縮液回収構造の開発を試みたものである。 The present invention has been made in view of such a background, and by changing the recovery path of the concentrated liquid, the bypass pipe is abolished, and in a new thin film vacuum evaporation device avoiding the risk of contact with the rotor. This is an attempt to develop a concentrated liquid recovery structure.

【0006】[0006]

【考案の構成】[Constitution of device] 【目的達成の手段】[Means for achieving the purpose]

即ち本出願に係る第一の考案たる薄膜真空蒸発装置における濃縮液回収構造は 、ケーシング内部にほぼ円筒状のロータを具え、このロータの内部には、前後方 向に連続して複数の蒸発面を形成し、更にこれら蒸発面の最内周部近傍には原料 液供給パイプの先端を臨ませ、また最も手前側の蒸発面の最外周部近傍には濃縮 液排出用のペアリングチューブを臨ませて成る薄膜真空蒸発装置において、前記 最も手前側の蒸発面の最外周部近傍には、濃縮液を回収する集液溝が設けられ、 前記ペアリングチューブはこの集液溝に対しその先端を臨ませており、一方前後 方向に連続する蒸発面の最外周部側の境界部には濃縮液を外部に排出する排出口 が設けられ、この排出口と前記集液溝とは連絡通路によって接続されていること を特徴として成るものである。 That is, the concentrated liquid recovery structure in the thin film vacuum evaporator devised in the first aspect of the present application comprises a substantially cylindrical rotor inside the casing, and inside this rotor, a plurality of evaporation surfaces are continuously arranged in the front-rear direction. In addition, the tip of the raw material liquid supply pipe is exposed near the innermost periphery of these evaporation surfaces, and the pairing tube for discharging the concentrated liquid is disposed near the outermost circumference of the foremost evaporation surface. In a thin film vacuum evaporation device consisting of a single unit, a liquid collection groove for collecting the concentrated liquid is provided in the vicinity of the outermost peripheral portion of the foremost evaporation surface, and the pairing tube has a tip for the liquid collection groove. On the other hand, a discharge port for discharging the concentrated liquid to the outside is provided at the boundary portion on the outermost peripheral side of the evaporation surface continuous in the front-rear direction, and this discharge port and the liquid collection groove are connected by a communication passage. Is characterized by It is intended.

【0007】 また本出願に係る第二の考案たる薄膜真空蒸発装置における濃縮液回収構造は 、前記要件に加え、前記連絡通路はロータの奥部側から手前側にかけて外広がり 状となるよう傾斜して設けられていることを特徴として成るものである。 これら考案により前記目的を達成しようとするものである。In addition to the above requirements, the concentrated liquid recovery structure in the thin film vacuum evaporation apparatus according to the second invention of the present application is such that the communication passage is inclined so as to expand outward from the inner side to the front side of the rotor. It is characterized by being provided as. These ideas are intended to achieve the above object.

【0008】[0008]

【考案の作用】[Function of the device]

まず本出願に係る第一の考案では、連続形成される蒸発面の最外周部側の境界 部に、排出口が設けられているから、ロータ内に供給された原料液は、ロータの 回転によって生ずる遠心力により蒸発面上を濃縮されつつ移動し、前記排出口に 至り、そのまま外部に排出され、蒸発面外部の連絡通路を通って、集液溝及びペ アリングチューブを経て装置外に排出される。 First, in the first invention according to the present application, since the discharge port is provided at the boundary portion on the outermost peripheral side of the continuously formed evaporation surface, the raw material liquid supplied into the rotor is rotated by the rotation of the rotor. Due to the centrifugal force generated, it moves while being concentrated on the evaporation surface, reaches the discharge port, is discharged to the outside as it is, and is discharged to the outside of the device through the collection passage and the pairing tube through the communication passage outside the evaporation surface. It

【0009】 そして本出願に係る第二の考案では、連絡通路がロータの奥部側から手前側に かけて外広がり状に傾斜して設けられているから、排出口より外部に排出された 濃縮液はロータの回転によって生ずる遠心力により連絡通路をロータ手前側に向 けて移動する。In the second invention according to the present application, since the communication passage is provided so as to be inclined outward from the back side of the rotor toward the front side, the concentrated passage discharged to the outside through the discharge port. The liquid moves in the communication passage toward the front side of the rotor due to the centrifugal force generated by the rotation of the rotor.

【0010】[0010]

【実施例】【Example】

以下本考案の薄膜真空蒸発装置における濃縮液回収構造について図面に基づい て具体的に説明する。なお説明の順序としては、まず本考案を適用する薄膜真空 蒸発装置1についてその概要を説明し、次いで本考案の濃縮液回収構造の構造説 明及び作動状態説明の順で説明し、最後に他の実施例について言及する。 The concentrated liquid recovery structure in the thin film vacuum evaporation apparatus of the present invention will be specifically described below with reference to the drawings. Regarding the order of the description, first, the outline of the thin film vacuum evaporation apparatus 1 to which the present invention is applied will be described, followed by the structural explanation and the operation state explanation of the concentrated liquid recovery structure of the present invention, and finally the others. Examples of

【0011】 本考案を適用する薄膜真空蒸発装置1は、高速度で回転するロータの遠心力を 利用してロータ内に供給される原料を蒸発、濃縮等する遠心式の薄膜真空蒸発装 置に属し、更に複数の蒸発面をロータ内部に連続形成して成るタイプのものであ る。そしてその構造は、ほぼ円筒を横に倒した形態の装置本体2とこれに接続さ れる周辺部材とから構成される。装置本体2は、そのほぼ外形形状をなすケーシ ング3と、ほぼ円筒状のロータ4とから成っており、このうちケーシング3には 内部の様子を観察できるように前面側に監視窓5が設けられ、またケーシング3 の後方には蒸気排気管6が形成されている。The thin film vacuum evaporation apparatus 1 to which the present invention is applied is a centrifugal thin film vacuum evaporation apparatus that evaporates and concentrates the raw material supplied into the rotor by utilizing the centrifugal force of the rotor rotating at high speed. It is a type that is formed by continuously forming a plurality of evaporation surfaces inside the rotor. The structure is composed of a device body 2 in which a cylinder is laid down sideways and peripheral members connected to the device body 2. The apparatus main body 2 is composed of a casing 3 having a substantially outer shape and a substantially cylindrical rotor 4, of which the casing 3 is provided with a monitoring window 5 on the front side so that the inside can be observed. A steam exhaust pipe 6 is formed behind the casing 3.

【0012】 またロータ4はモータMの出力軸に連結される回転軸9と一体に設けられるも のであって、そのほぼ円筒状をしたロータ4の内部には図1に示すように前後方 向に蛇腹状に複数の蒸発面11が形成され、更にこれら蒸発面11の外方には外 覆板12が設けられている。またこれら蒸発面11と外覆板12との間には空間 が形成されていて、これを加熱部13とする。そして最も奥部側の蒸発面11後 方の加熱部13には凝縮液回収管16がその先端を当該加熱部13の最外周部付 近に臨ませて設けられており、加熱部13内に供給されたスチームは蒸発面11 での熱交換に伴い凝縮し、水液となってロータ4の回転に伴う遠心力により加熱 部13の最外周部に送られ、前記凝縮液回収管16により外部に排出される構成 となっている。The rotor 4 is integrally provided with a rotary shaft 9 connected to the output shaft of the motor M. Inside the rotor 4 having a substantially cylindrical shape, as shown in FIG. A plurality of evaporation surfaces 11 are formed in a bellows shape, and an outer cover plate 12 is provided outside the evaporation surfaces 11. A space is formed between the evaporation surface 11 and the outer cover plate 12, and this space is used as a heating unit 13. A condensate recovery pipe 16 is provided in the heating portion 13 behind the evaporation surface 11 on the innermost side, with its tip facing the outermost peripheral portion of the heating portion 13, and inside the heating portion 13. The supplied steam is condensed due to heat exchange on the evaporation surface 11, becomes water liquid, and is sent to the outermost peripheral portion of the heating unit 13 by the centrifugal force accompanying the rotation of the rotor 4, and is externally supplied by the condensate recovery pipe 16 to the outside. It is configured to be discharged to.

【0013】 またケーシング3の外部からロータ4の内部にかけては原料液供給パイプ17 が設けられており、その先端は各蒸発面11の最内周部近傍に臨んでいる。そし て最も手前側の蒸発面11の最外周部近傍には後述する本考案の濃縮液回収構造 20の一構成要素である集液溝21が設けられ、この集液溝21に対して濃縮液 を装置外部に排出するペアリングチューブ18の先端が臨んでいる。A raw material liquid supply pipe 17 is provided from the outside of the casing 3 to the inside of the rotor 4, and its tip faces the vicinity of the innermost peripheral portion of each evaporation surface 11. In the vicinity of the outermost peripheral portion of the foremost evaporation surface 11, there is provided a collecting groove 21 which is one component of a concentrated liquid recovery structure 20 of the present invention described later, and the concentrated liquid is supplied to the collecting groove 21. The front end of the pairing tube 18 that discharges the gas is exposed.

【0014】 なおこのペアリングチューブ18からの濃縮液の回収は、ロータ4の回転によ り生ずる遠心力により濃縮液が接線方向に一例として重力の200倍の加速度を 有するため、これを利用してペアリングチューブ18内への自然の流れ込みによ り行われる。The concentrated liquid is recovered from the pairing tube 18 because the concentrated liquid has an acceleration of 200 times gravity as an example in the tangential direction due to the centrifugal force generated by the rotation of the rotor 4. And the natural flow into the pairing tube 18.

【0015】 そして本考案の濃縮液回収構造20は前記集液溝21と、相隣接する蒸発面1 1の最外周側境界部に設けられる排出口22との間に設けられ、これらを含み更 にこれらを接続する連絡通路23とを具えて成っている。このうち排出口22は 図2に示すように一の境界部に対し一例として四カ所設けられていて、更にこの 排出口22の外方には外覆板12との奥部側付け根より前方に向かって外広がり テーパ状に周胴板24が設けられている。The concentrated liquid recovery structure 20 of the present invention is provided between the liquid collection groove 21 and the discharge port 22 provided at the boundary portion on the outermost peripheral side of the adjacent evaporation surfaces 11 and includes them. And a communication passage 23 connecting them to each other. Of these, as shown in FIG. 2, the discharge ports 22 are provided at four places with respect to one boundary part, and further outside the discharge ports 22, in front of the root of the outer cover plate 12 and the inner side. A peripheral body plate 24 is provided so as to expand outward and taper.

【0016】 そしてこの周胴板24が前記連絡通路23を構成するものであって、更にこの 前方側の端部は、内側に「ヘ」の字状に曲折されており、本実施例ではこの曲折 部が集液溝21となっている。The peripheral body plate 24 constitutes the communication passage 23, and the end portion on the front side is further bent inward in a “F” shape. The bent portion is the liquid collection groove 21.

【0017】 このような薄膜真空蒸発装置1に原料液が供給されると、まず原料液は原料液 供給パイプ17によって蒸発面11の最内周部近傍に送られる。すると原料液は ロータ4の回転による遠心力によって蒸発面11上を蒸発面11の最外周部に向 かって移動するようになる。なおこのとき原料液は蒸発面11による作用を受け て濃縮され、濃縮液となって移動するのである。When the raw material liquid is supplied to such a thin film vacuum evaporation apparatus 1, the raw material liquid is first sent to the vicinity of the innermost peripheral portion of the evaporation surface 11 by the raw material liquid supply pipe 17. Then, the raw material liquid moves on the evaporation surface 11 toward the outermost peripheral portion of the evaporation surface 11 due to the centrifugal force generated by the rotation of the rotor 4. At this time, the raw material liquid is concentrated by the action of the evaporation surface 11 and moves as a concentrated liquid.

【0018】 そしてこの濃縮液は蒸発面11の最外周部に至った後も、ロータ4の回転に伴 う遠心力によって、更に外方に向かって移動しようとするため、排出口22を通 って周胴板24の内周面にまで達する。そして周胴板24の内周面に達した濃縮 液はロータ4の回転に伴う遠心力によって外広がりテーパ状のこの内周面を伝わ って、その先端の集液溝21に回収されてペアリングチューブ18により装置外 部に排出されるのである。Even after the concentrated liquid reaches the outermost peripheral portion of the evaporation surface 11, the concentrated liquid tries to move further outward due to the centrifugal force caused by the rotation of the rotor 4, and therefore passes through the discharge port 22. Reaches the inner peripheral surface of the peripheral body plate 24. Then, the concentrated liquid which has reached the inner peripheral surface of the peripheral body plate 24 is propagated through the inner peripheral surface of the taper shape which spreads outward due to the centrifugal force accompanying the rotation of the rotor 4, and is collected in the liquid collecting groove 21 at the tip thereof to form a pair. It is discharged to the outside of the device by the ring tube 18.

【0019】 次に本考案の濃縮回収構造20の他の実施例について図3に基づいて説明する 。すなわちこの図3に示す実施例は、前記図1、2に示す実施例と連絡通路23 の構成を異にする。具体的には各排出口22には外広がりテーパ状に設けられる 連絡管25が接続され、排出口22に至った濃縮液は、前記図1、2に示す実施 例における周胴板24と同様の作用によって、この連絡管25内をロータ4の前 方に向かって移動するのである。Next, another embodiment of the concentration and recovery structure 20 of the present invention will be described with reference to FIG. That is, the embodiment shown in FIG. 3 differs from the embodiment shown in FIGS. Specifically, each discharge port 22 is connected to a connecting pipe 25 which is provided in a tapered shape so that the concentrated liquid reaching the discharge port 22 is the same as the peripheral body plate 24 in the embodiment shown in FIGS. By this action, the inside of the connecting pipe 25 is moved toward the front of the rotor 4.

【0020】[0020]

【考案の効果】[Effect of device]

本考案の濃縮液回収構造20は以上述べたような構成を有するものであって、 このような構成を有することによって、以下のような効果を発揮する。 まず本出願に係る第一の考案では、連続形成される蒸発面11の最外周部側の 境界部に排出口22が設けられ、これにより濃縮液の連絡通路23は蒸発面11 の外部に設けられている。従って蒸発面11の内側に図4に示すようなバイパス 管Bを設ける必要もなく、バイパス管Bを設ける際に必要となる支持杆Cの補強 についても全く気をつかう必要はない。その結果、ロータ4の回転数を大きくし たり、濃縮液の流量を多くすることができるため、大量濃縮が可能となる。 The concentrated liquid recovery structure 20 of the present invention has the structure described above, and by having such a structure, the following effects are exhibited. First, in the first invention according to the present application, the discharge port 22 is provided at the boundary portion on the outermost peripheral side of the evaporation surface 11 that is continuously formed, whereby the communication passage 23 for the concentrated liquid is provided outside the evaporation surface 11. Has been. Therefore, it is not necessary to provide the bypass pipe B as shown in FIG. 4 inside the evaporation surface 11, and it is not necessary to pay attention to the reinforcement of the support rod C required when the bypass pipe B is provided. As a result, the number of revolutions of the rotor 4 can be increased and the flow rate of the concentrated liquid can be increased, so that large-scale concentration can be performed.

【0021】 また本出願に係る第二の考案では連絡通路23を外広がりテーパ状に設けてい る。従ってロータ4の回転に伴う遠心力によって排出口22より連絡通路23内 に排出された濃縮液は、別途移送手段を設けなくてもこの遠心力の作用によって 前方集液溝21側に移動するのである。よってこの点も機構の簡素化、軽量化に 寄与するものである。Further, in the second invention according to the present application, the communication passage 23 is provided in a taper shape that expands outward. Therefore, the concentrated liquid discharged from the discharge port 22 into the communication passage 23 by the centrifugal force caused by the rotation of the rotor 4 moves to the front liquid collecting groove 21 side by the action of the centrifugal force without providing a separate transfer means. is there. Therefore, this point also contributes to simplification and weight reduction of the mechanism.

【図面の簡単な説明】[Brief description of drawings]

【図1】本考案を適用した薄膜真空蒸発装置における装
置本体部を破断して示す縦断側面図である。
FIG. 1 is a vertical sectional side view showing an apparatus main body section in a thin film vacuum evaporation apparatus to which the present invention is applied.

【図2】同上骨格的横断面図である。FIG. 2 is a skeletal transverse sectional view of the same.

【図3】同上他の実施例を示す骨格的縦断側面図であ
る。
FIG. 3 is a skeletal vertical sectional side view showing another embodiment of the same.

【図4】従来の濃縮液回収構造を示す骨格的縦断側面図
並びにその問題点を示す説明図である。
FIG. 4 is a skeletal vertical sectional side view showing a conventional concentrated liquid recovery structure and an explanatory view showing its problems.

【符号の説明】[Explanation of symbols]

1 薄膜真空蒸発装置 2 装置本体 3 ケーシング 4 ロータ 5 監視窓 6 蒸気排気管 9 回転軸 11 蒸発面 12 外覆板 13 加熱部 16 凝縮液回収管 17 原料液供給パイプ 18 ペアリングチューブ 20 濃縮液回収構造 21 集液溝 22 排出口 23 連絡通路 24 周胴板 25 連絡管 B バイパス管 C 支持杆 M モータ 1 Thin Film Vacuum Evaporator 2 Device Main Body 3 Casing 4 Rotor 5 Monitoring Window 6 Steam Exhaust Pipe 9 Rotating Shaft 11 Evaporation Surface 12 Outer Cover Plate 13 Heating Part 16 Condensate Recovery Pipe 17 Raw Material Liquid Supply Pipe 18 Pairing Tube 20 Concentrated Liquid Recovery Structure 21 Liquid collecting groove 22 Discharge port 23 Communication passage 24 Circumferential body plate 25 Communication pipe B Bypass pipe C Support rod M Motor

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 ケーシング内部にほぼ円筒状のロータを
具え、このロータの内部には、前後方向に連続して複数
の蒸発面を形成し、更にこれら蒸発面の最内周部近傍に
は原料液供給パイプの先端を臨ませ、また最も手前側の
蒸発面の最外周部近傍には濃縮液排出用のペアリングチ
ューブを臨ませて成る薄膜真空蒸発装置において、前記
最も手前側の蒸発面の最外周部近傍には、濃縮液を回収
する集液溝が設けられ、前記ペアリングチューブはこの
集液溝に対しその先端を臨ませており、一方前後方向に
連続する蒸発面の最外周部側の境界部には濃縮液を外部
に排出する排出口が設けられ、この排出口と前記集液溝
とは連絡通路によって接続されていることを特徴とする
薄膜真空蒸発装置における濃縮液回収構造。
1. A substantially cylindrical rotor is provided inside a casing, and a plurality of evaporation surfaces are formed continuously in the front-rear direction inside the rotor, and a raw material is provided in the vicinity of the innermost peripheral portion of these evaporation surfaces. In a thin-film vacuum evaporation system in which the tip of the liquid supply pipe is faced and a pairing tube for discharging the concentrated liquid is faced in the vicinity of the outermost periphery of the foremost evaporation surface, the evaporation surface of the foremost evaporation surface is A liquid collecting groove for collecting the concentrated liquid is provided near the outermost peripheral portion, and the pairing tube has its tip facing the liquid collecting groove, while the outermost peripheral portion of the evaporation surface continuous in the front-rear direction. A concentrated liquid recovery structure in a thin film vacuum evaporation device, characterized in that a discharge port for discharging the concentrated liquid to the outside is provided at the side boundary portion, and the discharge port and the liquid collection groove are connected by a communication passage. .
【請求項2】 前記連絡通路はロータの奥部側から手前
側にかけて外広がり状となるよう傾斜して設けられてい
ることを特徴とする請求項1記載の薄膜真空蒸発装置に
おける濃縮液回収構造。
2. The concentrated liquid recovery structure in the thin film vacuum evaporator according to claim 1, wherein the communication passage is provided so as to be inclined outward from the inner side of the rotor toward the front side thereof. .
JP7947592U 1992-10-22 1992-10-22 Concentrated liquid recovery structure in thin film vacuum evaporator Pending JPH0634701U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7947592U JPH0634701U (en) 1992-10-22 1992-10-22 Concentrated liquid recovery structure in thin film vacuum evaporator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7947592U JPH0634701U (en) 1992-10-22 1992-10-22 Concentrated liquid recovery structure in thin film vacuum evaporator

Publications (1)

Publication Number Publication Date
JPH0634701U true JPH0634701U (en) 1994-05-10

Family

ID=13690922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7947592U Pending JPH0634701U (en) 1992-10-22 1992-10-22 Concentrated liquid recovery structure in thin film vacuum evaporator

Country Status (1)

Country Link
JP (1) JPH0634701U (en)

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