JP2590568Y2 - Structure for preventing scattering of raw material liquid in thin film vacuum evaporator - Google Patents

Structure for preventing scattering of raw material liquid in thin film vacuum evaporator

Info

Publication number
JP2590568Y2
JP2590568Y2 JP1992071410U JP7141092U JP2590568Y2 JP 2590568 Y2 JP2590568 Y2 JP 2590568Y2 JP 1992071410 U JP1992071410 U JP 1992071410U JP 7141092 U JP7141092 U JP 7141092U JP 2590568 Y2 JP2590568 Y2 JP 2590568Y2
Authority
JP
Japan
Prior art keywords
raw material
material liquid
supply pipe
evaporation surface
film vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1992071410U
Other languages
Japanese (ja)
Other versions
JPH0629601U (en
Inventor
貴代志 土本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okawara Mfg Co Ltd
Original Assignee
Okawara Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Okawara Mfg Co Ltd filed Critical Okawara Mfg Co Ltd
Priority to JP1992071410U priority Critical patent/JP2590568Y2/en
Publication of JPH0629601U publication Critical patent/JPH0629601U/en
Application granted granted Critical
Publication of JP2590568Y2 publication Critical patent/JP2590568Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Description

【考案の詳細な説明】[Detailed description of the invention]

【0001】[0001]

【考案の目的】[Purpose of the invention]

【産業上の利用分野】本考案は熱変性を受けやすい物質
の蒸発、濃縮等の加熱操作を低温で短時間に処理するの
に適した遠心式薄膜真空蒸発装置に関し、特に原料液を
蒸発面に供給するためのパイプの構造に係るものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a centrifugal thin-film vacuum evaporator suitable for performing a heating operation such as evaporation and concentration of a substance susceptible to thermal denaturation at a low temperature in a short time. The present invention relates to a structure of a pipe for supplying to a pipe.

【0002】[0002]

【考案の背景】熱変性を受けやすい物質の蒸発、濃縮等
の加熱操作においては、低温で且つ短時間に所定の熱量
を与えて目的の操作を行なう必要がある。そこで今日で
はこのような操作を行なうため遠心式の薄膜真空蒸発装
置が使用され、特に図8に示すような装置は広く使用さ
れている。この装置は、ほぼ円筒状の外殻部材3' の内
部に回転軸9' を有する円錐状の回転体4' を具え、こ
の回転体4' の内部前方側に蒸発面11' を形成し、そ
の背面側には蒸発を助けるための加熱部13' を形成し
たものである。また蒸発面11' の回転軸9' 付近には
原料を供給するための原料液供給パイプ17' の先端が
臨み、一方蒸発面11' の最外周部付近には濃縮液を回
収するためのペアリングチューブ18' が臨んでいる。
BACKGROUND OF THE INVENTION In a heating operation such as evaporation and concentration of a substance which is susceptible to thermal denaturation, it is necessary to perform a desired operation by applying a predetermined amount of heat at a low temperature in a short time. Therefore, today, a centrifugal thin-film vacuum evaporator is used to perform such an operation, and in particular, an apparatus as shown in FIG. 8 is widely used. This device comprises a conical rotator 4 'having a rotation axis 9' inside a substantially cylindrical outer shell member 3 ', and an evaporating surface 11' is formed on the inner front side of the rotator 4 '. On the back side, a heating section 13 'for forming an evaporation is formed. A tip of a raw material supply pipe 17 'for supplying the raw material faces near the rotating shaft 9' of the evaporation surface 11 ', while a pair for collecting the concentrated liquid is provided near the outermost periphery of the evaporation surface 11'. A ring tube 18 'is facing.

【0003】このような遠心式の薄膜真空蒸発装置で
は、発泡性の強い原料液を蒸発面11' に供給しようと
すると、原料液供給パイプ17' から出た途端に発泡
し、蒸発面11' から蒸発した蒸気の気流に乗って飛散
し、蒸留液側に流出してしまう。この場合、大型の装置
では、図8のように原料液の供給部を囲うようにディス
トリビュータDを設けて発泡した原料液の飛散を防止す
ることができるが、小型の装置ではスペースがないた
め、このようなディストリビュータを設けることは無理
があり、またディストリビュータを設けたとしても精密
性に欠けることから、他の飛散防止手段の開発が望まれ
ていた。
In such a centrifugal thin-film vacuum evaporator, when a raw material liquid having a strong foaming property is to be supplied to the evaporation surface 11 ', the raw material liquid is foamed as soon as it comes out of the raw material liquid supply pipe 17', and the evaporation surface 11 ''It is scattered by the vapor flow of the vapor evaporated from, and flows out to the distillate side. In this case, in a large-sized apparatus, a distributor D is provided so as to surround a supply section of the raw material liquid as shown in FIG. 8, so that the foamed raw material liquid can be prevented from scattering. However, in a small-sized apparatus, there is no space. It is impossible to provide such a distributor, and even if a distributor is provided, the precision is lacking. Therefore, the development of other scattering prevention means has been desired.

【0004】[0004]

【開発を試みた技術的事項】本考案はこのような背景に
鑑みなされたものであって、小型の薄膜真空蒸発装置で
も発泡した原料液の飛散を有効に防止できるように原料
液供給パイプの改良を試みたものである。
[Technical matters attempted to be developed] The present invention has been made in view of such a background, and a raw material supply pipe is provided so that even a small thin film vacuum evaporator can effectively prevent scattering of foamed raw material liquid. An attempt was made to improve it.

【0005】[0005]

【考案の構成】[Structure of the device]

【目的達成の手段】即ち本出願に係る考案たる薄膜真空
蒸発装置における原料液飛散防止構造は、外殻部材内部
に回転軸を有する中空円錐状の回転体を具え、この回転
体の内部には蒸発面を形成し、また蒸発面の回転軸付近
には原料液供給パイプの先端を臨ませ、一方蒸発面の最
外周部付近には濃縮液排出用のペアリングチューブを臨
ませて成る薄膜真空蒸発装置において、前記原料液供給
パイプの先端付近にはフランジ状に飛散防止板を設けた
ことを特徴として成るものであり、もって前記目的を達
成せんとする。
Means for Achieving the Object In the thin film vacuum evaporating apparatus according to the present invention, the material liquid scattering prevention structure comprises a hollow conical rotating body having a rotating shaft inside the outer shell member, and the inside of the rotating body is A thin-film vacuum that forms an evaporation surface and faces the tip of the raw material supply pipe near the rotation axis of the evaporation surface, and faces a pairing tube for discharging concentrated liquid near the outermost periphery of the evaporation surface. The evaporating apparatus is characterized in that a scattering prevention plate is provided in the form of a flange near the tip of the raw material liquid supply pipe, thereby achieving the object.

【0006】[0006]

【考案の作用】本考案では原料液供給パイプの先端付近
にフランジ状に飛散防止板を設けたから、発泡した原料
液が飛散防止板に遮られて、飛散することなく蒸発面に
移行する。
In the present invention, since the scattering prevention plate is provided in the form of a flange near the tip of the raw material liquid supply pipe, the foamed raw material liquid is interrupted by the scattering prevention plate and moves to the evaporation surface without scattering.

【0007】[0007]

【実施例】以下本考案を図示の実施例に基づいて具体的
に説明する。符号1は本考案を適用した遠心式の薄膜真
空蒸発装置であって、このものはほぼ円筒を横に倒した
形態の装置本体2と、これに接続される周辺部材とから
構成される。装置本体2は、そのほぼ外形形状をなす外
殻部材3と円錐状の回転体4とから成る。外殻部材3に
は、内部の様子を観察できるように監視窓5が設けら
れ、また外殻部材3の側方には蒸気排気管6が形成され
る。尚、図2、4では蒸気排気管6を外殻部材3から上
方に向けて描いているが、これは図面の理解を容易にす
るための便宜上のものである。尚また、監視窓5の設け
られる側を前側と定義する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below based on the illustrated embodiment. Reference numeral 1 denotes a centrifugal thin-film vacuum evaporator to which the present invention is applied, which is composed of an apparatus main body 2 having a substantially cylindrical shape and a peripheral member connected thereto. The apparatus main body 2 includes an outer shell member 3 having a substantially outer shape and a conical rotating body 4. The outer shell member 3 is provided with a monitoring window 5 so that the inside can be observed, and a steam exhaust pipe 6 is formed on the side of the outer shell member 3. 2 and 4, the steam exhaust pipe 6 is drawn upward from the outer shell member 3, but this is for the sake of convenience for easy understanding of the drawings. The side on which the monitoring window 5 is provided is defined as the front side.

【0008】また装置本体2の外には、回転体4で原料
液が濃縮される過程で蒸発した蒸気を冷却するためのコ
ンデンサ7が設けられ、このコンデンサ7には蒸気を吸
引するための真空ポンプP1 が設けられるとともに、そ
の出口側には遠心サイホンポンプ8を介して蒸留液タン
クT0 が設けられる。
A condenser 7 is provided outside the apparatus main body 2 for cooling the vapor evaporated in the process of concentrating the raw material liquid by the rotating body 4, and the condenser 7 has a vacuum for sucking the vapor. together with the pump P 1 is provided, distillate tank T 0 is provided through the centrifugal siphon pump 8 to the outlet side.

【0009】また回転体4は、モータMが連結された回
転軸9の回りにほぼ傘状のジャケット構造を有する回転
部10を形成したものである。この回転部10は、前側
に形成される傘状の蒸発面11と、後側に形成される外
覆板12との間に中空の加熱部13を形成して成り、回
転軸9の回りの蒸発面11には、回転軸9と垂直な原料
液供給面11aが形成される。尚、本実施例では回転軸
9と垂直な平面を原料液供給面11aとしたが、原料液
を供給する面は特にこのような平面である必要はなく、
蒸発面11の一部であったり、曲面であってもかまわな
い。
Further, the rotating body 4 has a rotating portion 10 having a substantially umbrella-shaped jacket structure formed around a rotating shaft 9 to which the motor M is connected. The rotating part 10 is formed by forming a hollow heating part 13 between an umbrella-shaped evaporation surface 11 formed on the front side and an outer cover plate 12 formed on the rear side. A source liquid supply surface 11 a perpendicular to the rotation axis 9 is formed on the evaporation surface 11. In this embodiment, the plane perpendicular to the rotation axis 9 is the raw material liquid supply surface 11a, but the surface for supplying the raw material liquid is not particularly required to be such a plane.
It may be a part of the evaporation surface 11 or a curved surface.

【0010】また外覆板12が外殻部材3から出たとこ
ろには、加熱部13内にスチームを供給するためのスチ
ーム供給口14と、真空ポンプP2 を接続するための接
続穴15が形成される。尚、スチームは蒸発面での熱交
換により凝縮するが、凝縮した水滴は遠心力により加熱
部13の最外周に移動し、凝縮液回収管16の先端から
排出されるようになっている。
[0010] where the outer cover plate 12 exits from the outer shell member 3 is provided with a steam supply port 14 for supplying steam into the heating portion 13, the connecting hole 15 for connecting a vacuum pump P 2 It is formed. The steam is condensed by heat exchange on the evaporation surface, and the condensed water drops move to the outermost periphery of the heating unit 13 by centrifugal force and are discharged from the tip of the condensed liquid recovery pipe 16.

【0011】次に外殻部材3の外側から内側へかけて原
料液供給パイプ17が延び、その先端部が回転軸9近傍
の蒸発面11に臨んでいる。そして原料液供給パイプ1
7の基部側は、装置本体2の外部にある原料液タンクT
1 に接続され、その途中には原料液を原料液供給パイプ
17側へ供給するための供給ポンプP3 が設けられる。
また原料液供給パイプ17の先端付近には、原料液供給
パイプ17の先端部より少しだけ内側の位置に、本考案
の特徴的構成たる飛散防止板Sが設けられる。
Next, a raw material liquid supply pipe 17 extends from the outside to the inside of the outer shell member 3, and the tip thereof faces the evaporation surface 11 near the rotating shaft 9. And raw material liquid supply pipe 1
7 has a raw material liquid tank T outside the apparatus main body 2.
Connected to one, the supply pump P 3 for supplying the raw material liquid to the raw material solution supply pipe 17 side is provided on the way.
A scattering prevention plate S, which is a characteristic configuration of the present invention, is provided near the tip of the raw material liquid supply pipe 17 and at a position slightly inside the tip of the raw material liquid supply pipe 17.

【0012】この飛散防止板Sは、原料液供給パイプ1
7に対してほぼフランジ状に設けられるものであって、
その形状は、ほぼ長方形をなすが二つの長辺は回転軸9
の曲率に合わせるようにカーブしている。また原料液供
給パイプ17が所定の位置にセットされた状態では、飛
散防止板Sは、原料液供給パイプ17の先端が臨んでい
る原料液供給面11aとほぼ平行になるように対面し、
両者の間隔はほぼ8〜10mm以下に設定される。尚、
原料液供給面11aと飛散防止板Sとの間隔は、原料液
の種類によって適宜決定される。
The scattering prevention plate S is connected to the raw material liquid supply pipe 1.
7 is provided in a substantially flange shape,
Its shape is almost rectangular, but its two long sides are
It is curved to match the curvature of. Further, in a state where the raw material liquid supply pipe 17 is set at a predetermined position, the scattering prevention plate S faces so as to be substantially parallel to the raw material liquid supply surface 11a on which the tip of the raw material liquid supply pipe 17 faces,
The distance between the two is set to approximately 8 to 10 mm or less. still,
The distance between the raw material liquid supply surface 11a and the scattering prevention plate S is appropriately determined depending on the type of the raw material liquid.

【0013】また飛散防止板Sの形成態様は、原料液供
給パイプ17が図7(a)のようにほぼ蒸発面11と平
行に配設され、その先端が原料液供給面11aに対して
斜めに臨んでいる場合には、飛散防止板Sを原料液供給
面11aと平行に設けるために、原料液供給パイプ17
に対して斜めに設けられることになるが、一方図7
(b)のように原料液供給パイプ17の端部付近を折り
曲げて、先端を原料液供給面11aに対して垂直方向か
ら臨ませる場合には、飛散防止板Sは原料液供給パイプ
17に対して垂直に形成することができる。更に飛散防
止板Sの形状は、実施例のような形状の他、原料液供給
面11aの形成態様や原料液供給パイプ17の原料液供
給面11aへの臨む方向等に応じて、円形、楕円形ある
いは矩形であってもよい。
The scattering prevention plate S is formed in such a manner that the raw material liquid supply pipe 17 is disposed substantially in parallel with the evaporation surface 11 as shown in FIG. In order to provide the scattering prevention plate S in parallel with the raw material liquid supply surface 11a,
7 in FIG.
In the case where the vicinity of the end of the raw material liquid supply pipe 17 is bent as shown in (b) so that the front end faces perpendicularly to the raw material liquid supply surface 11a, the scattering prevention plate S And can be formed vertically. Further, the shape of the scattering prevention plate S may be circular or elliptical depending on the shape of the raw material liquid supply surface 11a, the direction of the raw material liquid supply pipe 17 facing the raw material liquid supply surface 11a, or the like, in addition to the shape as in the embodiment. It may be shaped or rectangular.

【0014】要するに飛散防止板Sの形成態様と形状と
は、原料液供給パイプ17が原料液供給面11aへ臨む
方向や原料液供給面11aの形成態様によって、原料液
の飛散を最も効率的に防止できるように選択される。
In short, the formation form and shape of the scattering prevention plate S are the most efficient for the scattering of the raw material liquid depending on the direction in which the raw material liquid supply pipe 17 faces the raw material liquid supply surface 11a and the form of formation of the raw material liquid supply surface 11a. It is selected so that it can be prevented.

【0015】次に蒸発面11の最外周部付近には濃縮液
を回収するためのペアリングチューブ18が、その先端
を回転体4の回転方向の接線方向に開口するようにして
設けられる。そしてこのペアリングチューブ18は、こ
れに接続する濃縮液回収パイプ19を介して濃縮液タン
クT2 に接続され、その途中には濃縮液を排出するため
の濃縮液排出ポンプP4 が設けられる。
Next, a pairing tube 18 for recovering the concentrated liquid is provided near the outermost peripheral portion of the evaporation surface 11 so that its tip is opened in the tangential direction of the rotation direction of the rotating body 4. And this pairing tube 18 is connected to the concentrate tank T 2 through the concentrated solution recovery pipe 19 connected thereto, concentrate exhaust pump P 4 is provided for discharging the concentrated solution in the middle.

【0016】尚、 ペアリングチューブ18からの濃縮液
の回収は、回転体4の回転により生ずる遠心力により濃
縮液が接線方向に一例として重力の200倍の加速度を
有するため、これを利用してペアリングチューブ18内
への自然の流れ込みにより行われる。
The concentrated liquid is recovered from the pairing tube 18 by utilizing the centrifugal force generated by the rotation of the rotating body 4 because the concentrated liquid has a tangential direction, for example, 200 times the acceleration of gravity. This is performed by natural inflow into the pairing tube 18.

【0017】薄膜真空蒸発装置1は以上述べたような構
造を有するものであって、以下この装置の作動状態につ
いて説明する。まずモータMを駆動して回転体4を回転
させるとともに、真空ポンプP1 を駆動させて外殻部材
3内を減圧し、コンデンサ7には冷却水を連続的に供給
する。因みに、外殻部材3内を減圧することにより、原
料液の沸点が下がり低温度下でも容易に蒸発する状態と
なる。またスチーム供給口14からスチームを加熱部1
3内に供給して蒸発面11を加熱状態とし、一方真空ポ
ンプP2 を駆動させて凝縮した水滴を排出できるように
しておく。更に濃縮液排出ポンプP4 の駆動により濃縮
液を濃縮液回収タンクT2 内に回収できる状態とする。
The thin-film vacuum evaporator 1 has the above-described structure, and the operation of the device will be described below. First, the motor M is driven to rotate the rotating body 4, and the vacuum pump P 1 is driven to reduce the pressure in the outer shell member 3, and the cooling water is continuously supplied to the condenser 7. Incidentally, by reducing the pressure in the outer shell member 3, the boiling point of the raw material liquid is lowered, so that the raw material liquid is easily evaporated even at a low temperature. Steam is supplied from the steam supply port 14 to the heating unit 1.
Is supplied to the 3 the evaporation surface 11 and the heating state, whereas previously to allow discharge the condensed water droplets by driving the vacuum pump P 2. Further ready for recovering the concentrated solution to the concentrate collection tank T in 2 by driving the concentrate exhaust pump P 4.

【0018】このような状態で供給ポンプP3 を駆動
し、原料液を原料液供給パイプ17から蒸発面11上に
供給する。これにより原料液は回転体4の回転による遠
心力により蒸発面11上に押し広げられ、蒸発面11上
にほぼ0.1mm程度の極めて薄い液膜の流れを生ず
る。このとき原料液が蛋白やサポニン等を含んでいる
と、原料液が原料液供給パイプ17から出た瞬間に発泡
を生じることが多いが、発泡した原料液は、飛散防止板
Sに遮られて飛散することなく蒸発面11上に移行し、
遠心力の作用で消泡する。
In this state, the supply pump P 3 is driven to supply the raw material liquid from the raw material liquid supply pipe 17 onto the evaporation surface 11. As a result, the raw material liquid is pushed and spread on the evaporation surface 11 by centrifugal force due to the rotation of the rotating body 4, and a very thin liquid film of about 0.1 mm flows on the evaporation surface 11. At this time, if the raw material liquid contains protein, saponin, or the like, foaming often occurs when the raw material liquid comes out of the raw material liquid supply pipe 17, but the foamed raw material liquid is blocked by the scattering prevention plate S. It moves onto the evaporation surface 11 without being scattered,
Defoams by the action of centrifugal force.

【0019】そして蒸発面11上に広げられた液膜は、
蒸発面11から熱を受けて蒸発し濃縮液となり、蒸発面
11の最外周部に到ったところでペアリングチューブ1
8から回収され、濃縮液回収タンクT2 内に貯留され
る。尚、蒸発面11で蒸発した蒸気は、蒸気排気管6を
通ってコンデンサ7で冷却凝縮し蒸留液タンクT0 に溜
まる。
The liquid film spread on the evaporation surface 11 is
Upon receiving heat from the evaporating surface 11, the concentrated liquid evaporates and reaches the outermost peripheral portion of the evaporating surface 11.
8 is recovered from, and is stored in concentrated solution recovery tank T 2. Note that vapor evaporated by the evaporation surface 11 is accumulated in through the steam exhaust pipe 6 is cooled condensed in condenser 7 distillate tank T 0.

【0020】[0020]

【考案の効果】本考案では、原料液供給パイプの先端付
近にフランジ状に飛散防止板を設けたから、発泡性の強
い原料液を原料液供給パイプから供給しても、発泡した
原料は飛散防止板に遮られて飛散せず、蒸留液側に原料
液が混じることがない。従って、発泡性の強い原料液の
濃縮も効率的に行なうことができる。
[Effects of the Invention] In the present invention, since the scattering prevention plate is provided in the form of a flange near the tip of the raw material liquid supply pipe, even if a highly foamable raw material liquid is supplied from the raw material liquid supply pipe, the foamed raw material is prevented from scattering. It is not scattered by the plate and does not mix with the raw material liquid on the distillate side. Therefore, the concentration of the raw material liquid having a strong foaming property can be efficiently performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本考案を適用した薄膜真空蒸発装置を示す分解
斜視図である。
FIG. 1 is an exploded perspective view showing a thin-film vacuum evaporator to which the present invention is applied.

【図2】同上側面図である。FIG. 2 is a side view of the same.

【図3】同上正面図である。FIG. 3 is a front view of the same.

【図4】同上縦断側面図である。FIG. 4 is a vertical sectional side view of the same.

【図5】同上飛散防止板取付部位を拡大して示す正面図
である。
FIG. 5 is an enlarged front view showing a portion where the anti-scattering plate is attached.

【図6】飛散防止板を拡大して示す正面図並びに側面図
である。
FIG. 6 is an enlarged front view and a side view showing a scattering prevention plate.

【図7】原料液供給パイプの形態に応じた飛散防止板の
取付態様を示す説明図である。
FIG. 7 is an explanatory diagram showing an attachment mode of a scattering prevention plate according to a form of a raw material liquid supply pipe.

【図8】従来の原料液飛散防止構造を具えた薄膜真空蒸
発装置を示す骨格的側面図である。
FIG. 8 is a skeletal side view showing a conventional thin film vacuum evaporation apparatus provided with a raw material liquid scattering prevention structure.

【符号の説明】[Explanation of symbols]

1 薄膜真空蒸発装置 2 装置本体 3 外殻部材 4 回転体 5 監視窓 6 蒸気排気管 7 コンデンサ 8 遠心サイホンポンプ 9 回転軸 10 回転部 11 蒸発面 11a 原料液供給面 12 外覆板 13 加熱部 14 スチーム供給口 15 接続穴 16 凝縮液回収管 17 原料液供給パイプ 18 ペアリングチューブ 19 濃縮液回収パイプ M モータ T0 蒸留液タンク T1 原料液タンク T2 濃縮液タンク P1 真空ポンプ P2 真空ポンプ P3 供給ポンプ P4 濃縮液排出ポンプ S 飛散防止板DESCRIPTION OF SYMBOLS 1 Thin-film vacuum evaporation apparatus 2 Device main body 3 Outer shell member 4 Rotating body 5 Monitoring window 6 Steam exhaust pipe 7 Condenser 8 Centrifugal siphon pump 9 Rotating shaft 10 Rotating part 11 Evaporation surface 11a Raw material liquid supply surface 12 Outer plate 13 Heating part 14 Steam supply port 15 Connection hole 16 Condensate recovery pipe 17 Raw material supply pipe 18 Pairing tube 19 Concentrate recovery pipe M Motor T 0 Distillate tank T 1 Raw material tank T 2 Concentrate tank P 1 Vacuum pump P 2 Vacuum pump P 3 feed pump P 4 concentrate exhaust pump S shatterproof plate

Claims (1)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】 外殻部材内部に回転軸を有する中空円錐
状の回転体を具え、この回転体の内部には蒸発面を形成
し、また蒸発面の回転軸付近には原料液供給パイプの先
端を臨ませ、一方蒸発面の最外周部付近には濃縮液排出
用のペアリングチューブを臨ませて成る薄膜真空蒸発装
置において、前記原料液供給パイプの先端付近にはフラ
ンジ状に飛散防止板を設けたことを特徴とする薄膜真空
蒸発装置における原料液飛散防止構造。
1. A rotary body having a hollow conical shape having a rotation axis inside an outer shell member, an evaporation surface is formed inside the rotation body, and a raw material supply pipe is provided near the rotation axis of the evaporation surface. In a thin-film vacuum evaporator having a front end facing a pairing tube for discharging a concentrated liquid in the vicinity of the outermost periphery of the evaporation surface, a flange-like scattering prevention plate is provided near the front end of the raw material liquid supply pipe. A material liquid scattering prevention structure in a thin-film vacuum evaporator, comprising:
JP1992071410U 1992-09-18 1992-09-18 Structure for preventing scattering of raw material liquid in thin film vacuum evaporator Expired - Lifetime JP2590568Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1992071410U JP2590568Y2 (en) 1992-09-18 1992-09-18 Structure for preventing scattering of raw material liquid in thin film vacuum evaporator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1992071410U JP2590568Y2 (en) 1992-09-18 1992-09-18 Structure for preventing scattering of raw material liquid in thin film vacuum evaporator

Publications (2)

Publication Number Publication Date
JPH0629601U JPH0629601U (en) 1994-04-19
JP2590568Y2 true JP2590568Y2 (en) 1999-02-17

Family

ID=13459722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1992071410U Expired - Lifetime JP2590568Y2 (en) 1992-09-18 1992-09-18 Structure for preventing scattering of raw material liquid in thin film vacuum evaporator

Country Status (1)

Country Link
JP (1) JP2590568Y2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101234257B (en) * 2007-02-01 2011-07-27 发泰(天津)科技有限公司 Microwave rotating thin film concentrator
JP5806473B2 (en) * 2011-02-07 2015-11-10 株式会社大川原製作所 Concentrating device provided with centrifugal thin film vacuum evaporator and method of operating the same
JP6429270B2 (en) * 2014-10-08 2018-11-28 株式会社日立プラントメカニクス Horizontal centrifugal thin film evaporator

Also Published As

Publication number Publication date
JPH0629601U (en) 1994-04-19

Similar Documents

Publication Publication Date Title
CN209348138U (en) A kind of thin film evaporator for Fluoxastrobin synthesis
JPS62183802A (en) Distillation type desalting apparatus
TW201634099A (en) Atomizing separation method and atomizing separation device
JP2590568Y2 (en) Structure for preventing scattering of raw material liquid in thin film vacuum evaporator
JPH0592101A (en) Evaporating device provided with solvent recovery structure
JP2016073961A (en) Concentration system
US3317405A (en) Distillation apparatus with ultrasonic frequency agitation
RU2102674C1 (en) Heat exchanger
JP4330308B2 (en) High speed swivel evaporator
JPH0463101A (en) Structure for recovering hold-up liquid in vacuum thin film evaporator
JP2005111319A (en) Method and apparatus for concentrating liquid raw material
JPS607921B2 (en) Centrifugal vacuum concentrator
JPH01284302A (en) Centrifugal film vacuum evaporator
JPH05301001A (en) Evaporator
JP3230015B2 (en) Test tube evaporator
SU1678406A1 (en) Arrangement for concentrating solutions
KR200257841Y1 (en) Honey concentrator
CN210278296U (en) Concentration evaporator for secondary steam
JPS6274402A (en) Drainage device for centrifugal thin film evaporator
GB1139875A (en) Horizontal-type vacuum film evaporator for highly viscous solutions
CN218980500U (en) Liquid concentration crystallization machine
JPH01180201A (en) Centrifugal thin film evaporator
JPH0722644B2 (en) Evaporator
SU1526715A1 (en) Rotary thin-film evaporator
CN108905241A (en) A kind of brine concentration and concentration regulator

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term