JPH06342752A - Rotary treatment device for square substrate - Google Patents

Abstract

PURPOSE:To lessen the generation of an air stream and to prevent adhesion of dust by a method wherein the rotary treatment device is composed of a disc-shaped stage provided with four sets of substrate retaining means, a motor with which the stage is rotated, and a chamber with exhaust holes. CONSTITUTION:Pins 2a to 2d, which support the lower surface of a photomask, and pins 3a to 3h, which retain the corner thereof, are fixed to a disc-shaped stage 1. In a device with which the photo-mask is washed, circular arc holes 5a to 5d are provided on the inner circumference of the disc-shaped stage 1. The circular arc holes 5a to 5d are formed in such a manner that washing liquid can be jetted out, namely above 10mm for example. The disc-shaped stage 1 is rotated by a motor 5 with the width 4 as the center point. A chamber 6 has a circular side wall to prevent the scattering of a chemical, at least three exhaust holes 7a are provided on the lower surface, and the chemical is exhausted from an exhaust port 8. Clean air is taken in from the upper part of the chamber. As the chamber 6 is circularly formed, there is no wind noise, air stream is not generated, and evils are small.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor, a liquid crystal panel, and a photomask equiangular rotation processing apparatus for them.

[0002]

2. Description of the Related Art A semiconductor photomask will be described as an example. The semiconductor photomask is 127 mm square and has a thickness of 2.
Approximately 1000 angstrom chrome film is sputtered on a 3 mm glass substrate, resist is applied on it, and a pattern is drawn by a drawing device. Then, resist development processing, chrome film etching processing, and resist stripping are performed in order to complete. To do.

The present invention will be described with respect to the resist developing process. First, the photomask after exposure is placed horizontally on the stage of the developing device, and while rotating at a low speed, the alkaline aqueous solution is sprayed to remove the resist in the exposed area, and then the pure water is sprayed and washed, and finally. Rotate the stage at high speed to dry.

Since the photomask is an original plate for IC manufacturing,
Very high quality processing is required.

FIG. 3a is a perspective view of a conventional stage, and FIG.
A plan view in which a photomask is mounted on a conventional stage is shown in FIG. Pins 12a to 12d that support the lower surface of the photomask 15 and pins 13a to 13h that hold the corners of the photomask 15 are fixed to the cross-shaped stage 11.

Further, since the photomask is as heavy as 325 grams, a chemical resistant resin such as vinyl chloride having a thickness of the stage 11 of about 10 mm is used. When the stage 11 rotates about the shaft 14, especially 1500 to dry
When rotating at a high speed of 2000 RPM, there was a defect that air currents were generated due to wind scratches on the side surface (thickness) of the stage 11 and dust in the chamber flew up, which adhered to the photomask 15 and deteriorated in quality.

[0007]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a rotation processing apparatus for a rectangular substrate in which the generation of air flow is small due to the rotation of the stage and dust does not adhere to the substrate.

[0008]

The present invention is characterized in that it comprises a disk-shaped stage having four sets of substrate holding means, a motor for rotating the stage, and a chamber having an exhaust hole.

[0009]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings. Figure 1
2 is a vertical sectional view of a square substrate rotation processing apparatus of the present invention, and FIG. 2 is a perspective view of the stage thereof.

Pins 2a to 2d for supporting the lower surface of the photomask and pins 3a to 3h for holding the corners of the photomask are fixed to the disc type stage 1. Since the stage 1 is a disc type, there is no scratching and the generation of air flow is reduced.

In the apparatus for cleaning the back surface of the photomask, arcuate holes 5a to 5d are provided on the inner circumference of the disc type stage 1. The radial width of each of the arcuate holes 5a to 5d may be such that the cleaning liquid can be ejected, for example, about 10 mm, so that there is little adverse effect of wind scratching.

The disk type stage 1 has a motor 5 centered on an axis 4.
To rotate by. The chamber 6 is a circular side wall that prevents the chemical liquid from splashing, and has at least three exhaust holes 7 on its lower surface.
a to 7c (7c is not shown) is provided, and exhaust is performed from the exhaust port 8. Normally, clean air is sent from the upper part of the chamber.

In the above description, the case where the substrate is a semiconductor photomask has been described. However, the present invention is not limited to this, and a rectangular substrate can be realized in exactly the same manner.

[0014]

As described above, the present invention has the following effects. It is possible to realize a rotation processing device for a rectangular substrate that generates a small amount of airflow even when rotating at high speed and that processes a high-quality substrate without dust adhering to the substrate.

[Brief description of drawings]

FIG. 1 is a vertical cross-sectional view of a square substrate rotation processing apparatus of the present invention.

2 is a perspective view of the stage of FIG. 1. FIG.

FIG. 3a is a perspective view of a conventional stage.

FIG. 3b is a plan view in which a photomask is placed on a conventional stage.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Disc type stage, 2a-2d ... Pins which support the lower surface of a photomask, 3a-3h ... Pins which hold the corners of a photomask, 4 ... Axis, 5a-5d ... Arc-shaped hole, 6 ... Chamber, 7a-7c ... Exhaust holes, 8 ... Exhaust ports, 11 ... Stage, 12a-12d ... Pins that support the lower surface of the photomask, 13a-13h ... Pins that hold the corners of the photomask, 14 ... Shaft, 15 ... Photomask.

Claims (2)

[Claims] 1. A device for horizontally mounting and rotating a rectangular substrate, which comprises a disc-shaped stage having four sets of substrate holding means, a motor for rotating the stage, and a chamber having an exhaust hole. A square substrate rotation processing device characterized by the above. 2. The rotation processing apparatus for a rectangular substrate according to claim 1, wherein the disk-shaped stage is provided with an arcuate hole.