JPH06342014A - Measuring device for semiconductor chip - Google Patents

Measuring device for semiconductor chip

Info

Publication number
JPH06342014A
JPH06342014A JP13192993A JP13192993A JPH06342014A JP H06342014 A JPH06342014 A JP H06342014A JP 13192993 A JP13192993 A JP 13192993A JP 13192993 A JP13192993 A JP 13192993A JP H06342014 A JPH06342014 A JP H06342014A
Authority
JP
Japan
Prior art keywords
probe needle
semiconductor chip
tip
area
probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13192993A
Other languages
Japanese (ja)
Inventor
Shinji Motoi
伸二 本井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13192993A priority Critical patent/JPH06342014A/en
Publication of JPH06342014A publication Critical patent/JPH06342014A/en
Pending legal-status Critical Current

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  • Measuring Leads Or Probes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To prevent a probe for measurement, to which a large current is allowed to flow, from deteriorating by the generation of heat due to the current. CONSTITUTION:In measuring the electric characteristics of a semiconductor chip 10, first probes 12a and second probes 12b for coming into contact in its tips with bonding pads 11a and 11b, electrodes formed on the chip, are provided, and the second probes 12b to which large currents are allowed to flow are made thicker than the first probes 12a.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は半導体チップ用測定装
置に係り、特に半導体チップ内に設けられた電極と接触
する半導体チップ用測定装置のプローブ針に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a measuring device for a semiconductor chip, and more particularly to a probe needle of the measuring device for a semiconductor chip which comes into contact with an electrode provided in the semiconductor chip.

【0002】[0002]

【従来の技術】半導体チップの電気的特性を測定する装
置は、半導体チップ表面に設けられた金属電極(ボンデ
ィングパッド)にプローブ針を接触させて測定を行って
いる。図4および図5は半導体チップの上面図および図
4のA−B面での断面図の概略図で、1は表面が絶縁物
1aで覆われた半導体チップ、2はこの半導体チップ内
に設けられた導電体からなるボンディングパッドで、図
5に示すようにこのボンディングパッド2上で絶縁物1
aは開口しており、パッケージに封入される前にこの開
口部がリードピンと金属ワイヤにより接続され、このワ
イヤの径が25μmφのときボンディングパッドの開口部
のサイズは90μm×90μmとなっている。図6は上記半
導体チップ1と従来の半導体チップ用測定装置のプロー
ブカードの概略図である。図6において、3は全て同材
質、同じ太さで形成され、先端部が上記半導体チップ1
におけるボンディングパッド2と接触する金属製の測定
用プローブ針で、先端の径は50μm程度である。4はこ
のプローブ針3を固定支持するための絶縁物からなるド
ーナツ状の支持材で、上記測定用プローブ針3とでプロ
ーブカードを形成している。
2. Description of the Related Art An apparatus for measuring the electrical characteristics of a semiconductor chip measures by bringing a probe needle into contact with a metal electrode (bonding pad) provided on the surface of the semiconductor chip. 4 and 5 are schematic views of a top view of the semiconductor chip and a cross-sectional view taken along the line AB of FIG. 4, 1 is a semiconductor chip whose surface is covered with an insulator 1a, and 2 is provided in the semiconductor chip. A bonding pad made of a conductive material, and an insulator 1 is formed on the bonding pad 2 as shown in FIG.
A has an opening, and this opening is connected to a lead pin by a metal wire before being enclosed in a package. When the diameter of this wire is 25 μmφ, the size of the opening of the bonding pad is 90 μm × 90 μm. FIG. 6 is a schematic view of the semiconductor chip 1 and a probe card of a conventional semiconductor chip measuring device. In FIG. 6, all 3 are made of the same material and have the same thickness, and the tip portion is the semiconductor chip 1 described above.
In the measurement probe needle made of metal that comes into contact with the bonding pad 2 in, the diameter of the tip is about 50 μm. Reference numeral 4 is a doughnut-shaped supporting member made of an insulating material for fixedly supporting the probe needle 3, and forms a probe card with the measuring probe needle 3.

【0003】このような半導体チップ用測定装置におい
ては、図7に示すようにプローブ針3をボンディングパ
ッド2に接触させ、装置本体における電源電圧や電気信
号を与える端子をプローブ針3の所定部3aに接触さ
せ、プローブ針3を介して半導体チップ1に電源電圧を
与えたり電気信号の入出力を行い、例えば電気信号の入
出力レベルやタイミングなどの電気的特性を測定する。
In such a semiconductor chip measuring device, as shown in FIG. 7, the probe needle 3 is brought into contact with the bonding pad 2 and a terminal for supplying a power supply voltage or an electric signal in the main body of the device is provided with a predetermined portion 3a of the probe needle 3. To the semiconductor chip 1 through the probe needle 3 to input / output electric signals, and to measure the electric characteristics such as the input / output level and timing of the electric signals.

【0004】[0004]

【発明が解決しようとする課題】上記のような従来の半
導体チップ用測定装置においては、測定用のプローブ針
3の太さ、すなわち先端から所定距離での断面積が各プ
ローブ針3とも同じで先端から所定部3aまでの抵抗値
が同じなので、例えば電源電圧が印加されるプローブ針
3のような大電流が流れるプローブ針3は発熱により劣
化するという問題がある。そこで、プローブ針を同一パ
ッドに2本接触させ、先端から所定部3aまでの抵抗値
を半分にすることも考えられる。しかし、この場合は図
8に示すようにプローブ針3の先端がはみ出してしまう
ので図9に示すように2本のプローブ針3を収めるには
長方形のパッド2aを使用しなければならない。この長
方形のパッドが図10に示すように多数並ぶとチップ面
積が大きくなってしまうという問題がある。この発明は
上記した点に鑑み、大電流の流れるプローブ針3の先端
から所定部3aまでの抵抗値を小さくし、この電流によ
る発熱を抑制するとともに、パッドの一辺が長くなって
チップ面積が増加するのを抑制することを目的とする。
In the conventional measuring device for semiconductor chips as described above, the thickness of the probe needle 3 for measurement, that is, the cross-sectional area at a predetermined distance from the tip is the same for each probe needle 3. Since the resistance value from the tip to the predetermined portion 3a is the same, there is a problem that the probe needle 3 through which a large current flows, such as the probe needle 3 to which a power supply voltage is applied, deteriorates due to heat generation. Therefore, it is conceivable to bring two probe needles into contact with the same pad to halve the resistance value from the tip to the predetermined portion 3a. However, in this case, since the tip of the probe needle 3 protrudes as shown in FIG. 8, a rectangular pad 2a must be used to accommodate the two probe needles 3 as shown in FIG. If a large number of rectangular pads are arranged as shown in FIG. 10, there is a problem that the chip area becomes large. In view of the above points, the present invention reduces the resistance value from the tip of the probe needle 3 through which a large current flows to the predetermined portion 3a, suppresses heat generation due to this current, and lengthens one side of the pad to increase the chip area. The purpose is to suppress.

【0005】[0005]

【課題を解決するための手段】この発明の第1の発明に
係る半導体チップ用測定装置は、先端と所定部との間
の、先端からの任意の距離での断面が第1の所定面積を
有する第1のプローブ針、先端からの上記任意の距離で
の断面が上記第1の所定面積よりも大きい第2の所定面
積を有する第2のプローブ針を備えたものである。ま
た、この発明の第2の発明に係る半導体チップ用測定装
置は、半導体チップ表面に設けられた電位と所定面積に
て接触する先端部を有する第1のプローブ針、半導体チ
ップ表面に設けられた電極と接触し、その接触面積が上
記第1のプローブ針の先端部における接触面積より大き
い先端部を有する第2のプローブ針を備えたものであ
る。また、この発明の第3の発明に係る半導体チップ用
測定装置は、先端と所定部との間の、先端からの任意の
距離での断面が所定形状をなし、第1の所定面積を有す
る第1のプローブ針、先端からの上記任意の距離での断
面が上記所定形状と相似形をなし、上記第1の所定面積
よりも大きい第2の所定面積を有する第2のプローブ針
を備えたものである。
In a semiconductor chip measuring device according to a first aspect of the present invention, a cross section between the tip and a predetermined portion at an arbitrary distance from the tip has a first predetermined area. The first probe needle has a second probe needle having a second predetermined area whose cross section at the above-mentioned arbitrary distance from the tip is larger than the first predetermined area. The semiconductor chip measuring device according to the second aspect of the present invention is provided with a first probe needle having a tip portion that comes into contact with a potential provided on the semiconductor chip surface in a predetermined area, and is provided on the semiconductor chip surface. The second probe needle is provided in contact with the electrode, and the contact area of the second probe needle is larger than the contact area of the first probe needle. Further, according to a third aspect of the present invention, there is provided a semiconductor chip measuring device, wherein a cross section between the tip and a predetermined portion at a given distance from the tip has a predetermined shape and has a first predetermined area. 1. A probe needle having a second probe needle having a second predetermined area larger than the first predetermined area and having a cross section at a given distance from the tip similar to the predetermined shape. Is.

【0006】[0006]

【作用】この発明の第1から第3の発明においては、第
2のプローブ針を第1のプローブ針よりも太くして抵抗
を小さくしたので、大電流の流れるパッドにはこの抵抗
が小さい第2のプローブ針を接触させることで、細井プ
ローブ針を接触させるよりもプローブ針に発生する熱を
押さえることができ、プローブ針の劣化を抑制できる。
また、第2のプローブ針を太くしたことで、細いプロー
ブ針2本を並べてパッドに接触させるときよりも、パッ
ドの一辺を短くでき、これによりチップの面積が増える
ことを抑制できる。
In the first to third aspects of the present invention, since the second probe needle is made thicker than the first probe needle to reduce the resistance, the resistance of the pad through which a large current flows is small. By contacting the second probe needle, the heat generated in the probe needle can be suppressed more than in contact with the Hosoi probe needle, and deterioration of the probe needle can be suppressed.
Also, by making the second probe needle thicker, one side of the pad can be made shorter than when two thin probe needles are arranged side by side and brought into contact with the pad, which can suppress an increase in chip area.

【0007】[0007]

【実施例】【Example】

実施例1.以下、この発明の実施例について図1から図
3に基づき説明する。図1はこの発明における半導体チ
ップ用測定装置のプローブカードおよび半導体チップの
概略図で、10は表面が絶縁物で覆われた半導体チッ
プ、11はこの半導体チップ内に設けられた電極である
ボンディングパッドで、ボンディングパッド11上で絶
縁物は開口しており、パッド11aは従来の大きさで、
開口部が90μm×90μmの面積をもち、大きな電流の流
れるパッド11bは広く形成され、開口部が110.7 μm
×110.7 μmの面積をもつ(図2)。
Example 1. An embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a schematic view of a probe card and a semiconductor chip of a semiconductor chip measuring device according to the present invention. 10 is a semiconductor chip whose surface is covered with an insulating material, and 11 is a bonding pad which is an electrode provided in the semiconductor chip. Then, the insulator is opened on the bonding pad 11, and the pad 11a has the conventional size.
The opening has an area of 90 μm × 90 μm, the pad 11b through which a large current flows is wide, and the opening is 110.7 μm.
It has an area of × 110.7 μm (Fig. 2).

【0008】12aは先端部が上記半導体チップ10内
に形成されたパッド11aと接触する金属製の測定用の
第1のプローブ針で、先端から後端に向けて太くなって
おり、断面形状は円で先端の径は従来どおり50μmであ
る。12bは上記第1のプローブ針12aよりも大きな
電流が流れ、第1のプローブ針よりも太い、すなわち先
端からの任意の距離での断面積が第1のプローブ針12
aにおける先端からの上記任意の距離での断面積よりも
大きな第2のプローブ針で、先端から後端に向けて第1
のプローブ針と同じ割合で太くなっており、断面形状は
円で、先端の径が50μmの第1のプローブ針2本分とボ
ンディングパッドとの接触面積(2・π(25μm)2
1250πμm2 )が同じになるように先端の径が70.7μm
となっている。13は第1のプローブ針12aおよび第
2のプローブ針12bを固定支持するための絶縁物から
なるドーナツ状の支持材で、第1のプローブ針12aお
よび第2のプローブ針12bとでプローブカードを形成
している。
Reference numeral 12a designates a first probe needle made of metal for contacting with a pad 11a formed in the semiconductor chip 10 at its tip portion, which is thicker from the tip end to the rear end and has a sectional shape. The diameter of the tip of the circle is 50 μm as before. 12b has a larger current than that of the first probe needle 12a, and is thicker than the first probe needle 12, that is, the cross-sectional area at an arbitrary distance from the tip is the first probe needle 12a.
a second probe needle having a cross-sectional area larger than the above-mentioned arbitrary distance from the front end in a.
Is thicker at the same rate as that of the probe needles, and the cross-sectional shape is circular, and the contact area between the two first probe needles with a tip diameter of 50 μm and the bonding pad (2π (25 μm) 2 =
The diameter of the tip is 70.7μm so that 1250πμm 2 ) is the same.
Has become. Reference numeral 13 is a doughnut-shaped support member made of an insulating material for fixedly supporting the first probe needle 12a and the second probe needle 12b. The first probe needle 12a and the second probe needle 12b together form a probe card. Is forming.

【0009】図2は上記半導体チップ10の拡大概略図
で、上記したように大電流の流れるパッド11bはパッ
ド11aに比べ大きくなっている。ところで、第2のプ
ローブ針12bの先端の径は70.7μmであるから、従来
どおりの開口部が90μm×90μmのパッドにも収まる
ので、別にパッドの面積を大きくする必要はない。しか
し、ここではプローブ針に対して20μmのマージンを
持たせた図10に比べ、チップ面積の増加がどれくらい
抑制されるか比較するために図3に示すように20μmの
マージンをもたせた例を示した。
FIG. 2 is an enlarged schematic view of the semiconductor chip 10. As described above, the pad 11b through which a large current flows is larger than the pad 11a. By the way, since the diameter of the tip of the second probe needle 12b is 70.7 μm, it is not necessary to separately increase the area of the pad because the opening can be accommodated in a pad of 90 μm × 90 μm as usual. However, here, in order to compare how much the increase in the chip area is suppressed, as compared with FIG. 10 in which the probe needle has a margin of 20 μm, an example in which a margin of 20 μm is provided as shown in FIG. It was

【0010】このような半導体チップ用測定装置におい
ては、図7に示された従来の測定方法と同様にプローブ
針12aおよび12bを半導体チップ10に形成された
パッド11aおよび11bに接触させ、装置本体におけ
る電源電圧や電気信号を与える端子をプローブ針12a
および12bの所定部12cに接触させ、プローブ針1
2aおよび12bを介して半導体チップ10に電源電圧
を与えたり電気信号の入出力を行い、電気信号の入出力
レベルやタイミングなどの電気的特性を測定する。上記
したこの発明の実施例1においては、大きな電流の流れ
る第2のプローブ針12bを太くして先端から所定部1
2cまでの抵抗値を小さくしたので、この第2のプロー
ブ針12bを流れる電流による発熱が抑制され、発熱に
よる劣化を防ぐことができる。また、図2と図10を比
較するとわかるように、先端が50μmの径の細さのプロ
ーブ針2本で測定するときよりも、パッドとの接触面積
が先端50μmの径の細さのプローブ針2本と同じ接触面
積をもつ1本の太いプローブ針を用いたほうがチップ面
積の増加を抑制できる。
In such a semiconductor chip measuring apparatus, the probe needles 12a and 12b are brought into contact with the pads 11a and 11b formed on the semiconductor chip 10 as in the conventional measuring method shown in FIG. The probe needle 12a is a terminal for supplying a power supply voltage and an electric signal.
And a predetermined portion 12c of the probe needle 12b, and the probe needle 1
A power supply voltage is applied to the semiconductor chip 10 via 2a and 12b, an electric signal is input / output, and electric characteristics such as an input / output level and timing of the electric signal are measured. In the above-described first embodiment of the present invention, the second probe needle 12b through which a large current flows is thickened so that the predetermined portion 1 extends from the tip.
Since the resistance value up to 2c is reduced, heat generation due to the current flowing through the second probe needle 12b is suppressed, and deterioration due to heat generation can be prevented. Further, as can be seen by comparing FIG. 2 and FIG. 10, the contact area with the pad is 50 μm in diameter, and the probe needle whose diameter is 50 μm in diameter is smaller than in the case of measuring with two probe needles whose diameter is 50 μm in diameter. Using one thick probe needle having the same contact area as two can suppress the increase of the chip area.

【0011】[0011]

【発明の効果】以上のようにこの発明によれば、大きな
電流が流れることによる発熱によりプローブ針が劣化す
るのを防ぐことができ、かつ、チップ面積の増加を抑制
することができる。
As described above, according to the present invention, it is possible to prevent the probe needle from deteriorating due to heat generation due to the flow of a large current, and it is possible to suppress an increase in the chip area.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の実施例1を示す平面図である。FIG. 1 is a plan view showing a first embodiment of the present invention.

【図2】この発明の実施例1における半導体チップの平
面図である。
FIG. 2 is a plan view of the semiconductor chip according to the first embodiment of the present invention.

【図3】この発明の実施例1のパッドのマージンを示す
図である。
FIG. 3 is a diagram showing a pad margin according to the first embodiment of the present invention.

【図4】従来の半導体チップを示す平面図である。FIG. 4 is a plan view showing a conventional semiconductor chip.

【図5】図4に示された従来の半導体チップのA−B面
断面図である。
5 is a cross-sectional view taken along the line AB of the conventional semiconductor chip shown in FIG.

【図6】従来の半導体チップ用測定装置を示す平面図で
ある。
FIG. 6 is a plan view showing a conventional measuring device for semiconductor chips.

【図7】従来の半導体チップ用測定装置のプローブ針と
ボンディングパッドとの接触部分の断面図である。
FIG. 7 is a sectional view of a contact portion between a probe needle and a bonding pad of a conventional semiconductor chip measuring device.

【図8】従来の半導体チップのパッドに2本のプローブ
針を接触させたときの接触部の平面図である。
FIG. 8 is a plan view of a contact portion when two probe needles are brought into contact with a pad of a conventional semiconductor chip.

【図9】従来の半導体チップの長方形のパッドに2本の
プローブ針を接触させたときの平面図である。
FIG. 9 is a plan view when two probe needles are brought into contact with a rectangular pad of a conventional semiconductor chip.

【図10】従来の半導体チップに長方形のパッドが並ぶ
ときの平面図である。
FIG. 10 is a plan view when rectangular pads are arranged on a conventional semiconductor chip.

【符号の説明】[Explanation of symbols]

10 半導体チップ 11a ボンディングパッド 11b ボンディングパッド 12a 第1のプローブ針 12b 第2のプローブ針 12c 所定部 10 Semiconductor Chip 11a Bonding Pad 11b Bonding Pad 12a First Probe Needle 12b Second Probe Needle 12c Predetermined Part

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 先端と所定部との間の、先端からの任意
の距離での断面が第1の所定面積を有する第1のプロー
ブ針、 先端からの上記任意の距離での断面が上記第1の所定面
積よりも大きい第2の所定面積を有する第2のプローブ
針を備えた半導体チップ用測定装置。
1. A first probe needle having a cross section at a given distance from the tip having a first given area between the tip and a given portion, and a cross section at the given distance from the tip being the first 1. A measuring device for semiconductor chips, comprising a second probe needle having a second predetermined area larger than the first predetermined area.
【請求項2】 半導体チップ表面に設けられた電位と所
定面積にて接触する先端部を有する第1のプローブ針、 半導体チップ表面に設けられた電極と接触し、その接触
面積が上記第1のプローブ針の先端部における接触面積
より大きい先端部を有する第2のプローブ針を備えた半
導体チップ用測定装置。
2. A first probe needle having a tip portion which comes into contact with a potential provided on a surface of a semiconductor chip at a predetermined area, and a first probe needle which comes into contact with an electrode provided on a surface of the semiconductor chip and has a contact area of the first A semiconductor chip measuring device comprising a second probe needle having a tip portion larger than the contact area at the tip portion of the probe needle.
【請求項3】 先端と所定部との間の、先端からの任意
の距離での断面が所定形状をなし、第1の所定面積を有
する第1のプローブ針、 先端からの上記任意の距離での断面が上記所定形状と相
似形をなし、上記第1の所定面積よりも大きい第2の所
定面積を有する第2のプローブ針を備えた半導体チップ
用測定装置。
3. A first probe needle having a predetermined cross-section at a given distance from the tip between the tip and the given portion, the first probe needle having a first given area, and at the above given distance from the tip. The semiconductor chip measuring device is provided with a second probe needle whose cross section is similar to the predetermined shape and has a second predetermined area larger than the first predetermined area.
JP13192993A 1993-06-02 1993-06-02 Measuring device for semiconductor chip Pending JPH06342014A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13192993A JPH06342014A (en) 1993-06-02 1993-06-02 Measuring device for semiconductor chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13192993A JPH06342014A (en) 1993-06-02 1993-06-02 Measuring device for semiconductor chip

Publications (1)

Publication Number Publication Date
JPH06342014A true JPH06342014A (en) 1994-12-13

Family

ID=15069512

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13192993A Pending JPH06342014A (en) 1993-06-02 1993-06-02 Measuring device for semiconductor chip

Country Status (1)

Country Link
JP (1) JPH06342014A (en)

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