JPH06337642A - Liquid crystal display device - Google Patents

Liquid crystal display device

Info

Publication number
JPH06337642A
JPH06337642A JP12573393A JP12573393A JPH06337642A JP H06337642 A JPH06337642 A JP H06337642A JP 12573393 A JP12573393 A JP 12573393A JP 12573393 A JP12573393 A JP 12573393A JP H06337642 A JPH06337642 A JP H06337642A
Authority
JP
Japan
Prior art keywords
electrode wiring
auxiliary electrode
wiring
liquid crystal
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12573393A
Other languages
Japanese (ja)
Inventor
Hideyuki Imura
秀之 井村
Hiroshi Maeda
宏 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12573393A priority Critical patent/JPH06337642A/en
Publication of JPH06337642A publication Critical patent/JPH06337642A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a liquid crystal display device having a high yield characteristic, high reliability, and high display quality, though relieving for discontinuity is performed. CONSTITUTION:In an active matrix substrate having auxiliary wiring for relieving a defect, two or more auxiliary electrode wiring 9, 11 are arranged crossing and holding an insulator 17 between them, while marks indicating working positions are provided at a crossing section of auxiliary electrode wiring and a crossing section of signal electrode lines and auxiliary electrode lines and their peripheral parts.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、欠陥救済用の補助電極
線を持つ液晶表示デバイスに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device having a defect relief auxiliary electrode line.

【0002】[0002]

【従来の技術】近年、液晶表示装置は特に画像表示に代
表される大容量表示に向けてのアプローチが活発であ
り、低価格デバイスが実現できるディスプレイとして最
も注目されている。
2. Description of the Related Art In recent years, liquid crystal display devices have been actively approached for large-capacity display typified by image display, and have attracted the most attention as displays capable of realizing low-priced devices.

【0003】図7は従来のアクティブマトリックス液晶
表示デバイスの電気的模式図である。アクティブマトリ
ックス基板1はゲート電極配線2とソース電極配線4が
互いに交差し、ゲート電極配線2とソース電極配線4の
交点に薄膜トランジスタからなるスイッチング素子6と
インジュウム・錫酸化物からなる画素電極7により画像
表示領域8が構成され、その周囲にはソース電極配線4
と交差する補助電極線7を有する。スイッチング素子6
としては、金属−絶縁物−金属構造またはダイオード構
造など2端子回路からなるものを用いてもよい。
FIG. 7 is an electrical schematic diagram of a conventional active matrix liquid crystal display device. In the active matrix substrate 1, the gate electrode wiring 2 and the source electrode wiring 4 intersect with each other, and at the intersection of the gate electrode wiring 2 and the source electrode wiring 4, a switching element 6 made of a thin film transistor and a pixel electrode 7 made of indium tin oxide are formed. A display area 8 is formed, and the source electrode wiring 4 is formed around the display area 8.
The auxiliary electrode line 7 intersects with. Switching element 6
For example, a metal-insulator-metal structure or a diode structure having a two-terminal circuit may be used.

【0004】このような電気的配線を施したアクティブ
マトリックス基板1と、図示されない透明共通電極と遮
光層とを有した透明な絶縁基板からなる対向基板にガラ
スファイバーまたは樹脂微粒子からなるスペーサーを設
け、画素電極7と透明共通電極を対向させて樹脂接着剤
にて貼合わせ、スペーサーにより形成された間隙に液晶
組成物を充填して液晶パネルを形成する。
A spacer made of glass fibers or resin fine particles is provided on a counter substrate made of an active matrix substrate 1 having such electrical wiring and a transparent insulating substrate having a transparent common electrode and a light shielding layer (not shown). The pixel electrode 7 and the transparent common electrode are opposed to each other and bonded with a resin adhesive, and the gap formed by the spacer is filled with the liquid crystal composition to form a liquid crystal panel.

【0005】図8は図7におけるソース電極配線4と1
次補助電極配線9,9′との交差部分15a,15bの
拡大平面図を示している。ソース電極配線4と1次補助
電極配線9,9′の交差部分15a,15bは、それぞ
れの電極配線が直線となっている。
FIG. 8 shows the source electrode wirings 4 and 1 in FIG.
An enlarged plan view of intersections 15a and 15b with the next auxiliary electrode wirings 9 and 9'is shown. At the intersections 15a and 15b of the source electrode wiring 4 and the primary auxiliary electrode wirings 9 and 9 ', the respective electrode wirings are straight lines.

【0006】図9は図8におけるB−B′での断面図を
示している。ガラス基板19の上にソース電極配線4と
1次補助電極配線9が絶縁物17を挟んで立体的に交差
している。
FIG. 9 is a sectional view taken along line BB 'in FIG. The source electrode wiring 4 and the primary auxiliary electrode wiring 9 are three-dimensionally crossed on the glass substrate 19 with the insulator 17 interposed therebetween.

【0007】図7において、例えばソース電極配線4′
上に欠陥箇所16があり、断線が生じた場合、この断線
を救済するために、図8に示すようにソース電極配線
4′と1次補助電極配線9,9′の交差部分15a,1
5bの任意のポイント20にレーザー光線を照射し、ソ
ース電極配線4′と1次補助電極配線9,9′を電気的
に接続する。これにより画像として必要な正規の信号
が、欠陥が生じたソース電極配線4′に供給される。こ
のようにして、アクティブマトリックス基板に発生した
線欠陥を救済することができる。
In FIG. 7, for example, the source electrode wiring 4 '
When there is a defect 16 on the upper side and a disconnection occurs, in order to relieve the disconnection, as shown in FIG. 8, the intersections 15a, 1 of the source electrode wiring 4'and the primary auxiliary electrode wirings 9, 9'are crossed.
A laser beam is applied to an arbitrary point 20 of 5b to electrically connect the source electrode wiring 4'and the primary auxiliary electrode wirings 9 and 9 '. As a result, a normal signal required as an image is supplied to the defective source electrode wiring 4 '. In this way, the line defect generated in the active matrix substrate can be repaired.

【0008】[0008]

【発明が解決しようとする課題】ところがこのような欠
陥救済用補助配線をもつ液晶表示デバイスでは、欠陥救
済用配線とソース電極配線とが交差する部分で製造プロ
セス中に層間短絡が起きることがある。例えば図10に
示すように、この層間短絡がソース電極配線4a,4b
と1次補助電極配線9,9′との交差部15b,15c
に発生すると、ソース電極配線4a,4bが補助配線を
通して電気的に短絡してしまい、正規の画像表示が不可
能となる問題があった。さらに図11のように1次補助
電極配線A(9),1次補助電極配線A′(9′)及び
ソース電極配線4′に断線(16a〜16c)が有る場
合は、配線の構造により修正が不可能となる問題があっ
た。
However, in a liquid crystal display device having such a defect relief auxiliary wiring, an interlayer short circuit may occur during the manufacturing process at the intersection of the defect relief wiring and the source electrode wiring. . For example, as shown in FIG. 10, this interlayer short circuit causes the source electrode wirings 4a and 4b.
15b and 15c between the first and second auxiliary electrode wirings 9 and 9 '
If this occurs, there is a problem that the source electrode wirings 4a and 4b are electrically short-circuited through the auxiliary wiring, making it impossible to display a normal image. Further, as shown in FIG. 11, when the primary auxiliary electrode wiring A (9), the primary auxiliary electrode wiring A '(9') and the source electrode wiring 4'have disconnections (16a to 16c), they are corrected by the wiring structure. There was a problem that became impossible.

【0009】また、図8,9において1次補助電極配線
9とソース電極配線4の交差部では、レーザー照射によ
る層間短絡加工を行うとき、必ず前記2つの配線の交差
部にレーザーを照射する必要がある。しかしながらアク
ティブマトリックス基板の裏面より加工部を見たとき、
1次補助電極配線9はソース電極配線4により隠れてし
まい、交差部全体を知ることができない。このとき交差
部の面積を大きくとると、1次補助電極配線9とソース
電極配線4の交差面積、すなわちソース電極配線4の付
加容量が増加するため、むやみに交差部面積を大きくす
ることはできない。すなわち、正確な加工位置を知るこ
とができないため、1交差部の限られた面積内に複数の
加工を行えないという問題があった。
Further, at the intersection of the primary auxiliary electrode wiring 9 and the source electrode wiring 4 in FIGS. 8 and 9, it is necessary to irradiate the laser at the intersection of the two wirings when performing the interlayer short-circuit processing by laser irradiation. There is. However, when looking at the processed part from the back surface of the active matrix substrate,
The primary auxiliary electrode wiring 9 is hidden by the source electrode wiring 4, and the entire intersection cannot be known. At this time, if the area of the crossing portion is increased, the crossing area of the primary auxiliary electrode wiring 9 and the source electrode wiring 4, that is, the additional capacitance of the source electrode wiring 4 increases, so that the crossing area cannot be unnecessarily increased. . That is, since it is not possible to know the exact machining position, there is a problem that a plurality of machining operations cannot be performed within the limited area of one intersection.

【0010】そこで本発明は、断線の救済を行いつつ、
上記の課題を解消し表示品位の優れた液晶表示デバイス
を提供することを目的とするものである。
Therefore, the present invention provides relief from disconnection while
It is an object of the present invention to solve the above problems and provide a liquid crystal display device having excellent display quality.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するため
に本発明は、欠陥救済用補助配線をもつ液晶表示デバイ
スのアクティブマトリックス基板上において補助電極線
を第1,第2の2つにわけ、それぞれが絶縁層を介して
交差するように配置し、また、前記2つの補助はいせん
の交差する部分とソース電極配線と補助配線とが交差す
る部分またはその周辺に加工位置を示すマークが配置さ
れている構成とするものである。
In order to achieve the above object, the present invention divides auxiliary electrode lines into two, first and second, on an active matrix substrate of a liquid crystal display device having auxiliary wiring for defect relief. , Are arranged so as to intersect each other through an insulating layer, and a mark indicating a processing position is arranged at a portion where the two auxiliary insulators intersect, a source electrode wiring and an auxiliary wiring, or a periphery thereof. It is configured as described above.

【0012】[0012]

【作用】上記構成の液晶表示デバイスでは、従来より加
工位置の精度が向上し、交差部面積の同じアクティブマ
トリックス基板においても加工点数を増やすことがで
き、加工部の信頼性が大幅に向上する。
In the liquid crystal display device having the above-mentioned structure, the accuracy of the processing position is improved as compared with the conventional one, and the number of processing points can be increased even in the active matrix substrate having the same crossing area, and the reliability of the processing part is greatly improved.

【0013】[0013]

【実施例】以下本発明の実施例について説明する。図1
は本発明の第1の実施例の液晶表示デバイスの電気的模
式図である。図2は同実施例における液晶表示デバイス
のソース電極配線と1次補助電極配線の交差する部分の
拡大平面図である。
EXAMPLES Examples of the present invention will be described below. Figure 1
FIG. 3 is an electrical schematic diagram of the liquid crystal display device of the first embodiment of the present invention. FIG. 2 is an enlarged plan view of a portion where the source electrode wiring and the primary auxiliary electrode wiring of the liquid crystal display device in the same embodiment intersect.

【0014】アクティブマトリックス基板1上の画像表
示領域8の周囲には、ソース電極配線4と絶縁物を介し
て交差する1次補助電極線(第1の補助電極配線)9,
10と、この1次補助電極線9,10と絶縁物を介して
交差する2次補助電極線(第2の補助電極配線)11,
12を有する。
Around the image display region 8 on the active matrix substrate 1, a primary auxiliary electrode line (first auxiliary electrode line) 9, which intersects with the source electrode line 4 via an insulator,
10, a secondary auxiliary electrode wire (second auxiliary electrode wiring) 11, which intersects with the primary auxiliary electrode wires 9 and 10 via an insulator,
Have twelve.

【0015】ソース電極配線4と2次補助電極配線1
1,11′,12,12′は、200nmの膜厚のアル
ミニウムから構成され、1次補助電極配線9,10と交
差する部分に3つの凸と2つの凹を繰り返した形状をパ
ターン化した。層間絶縁物17にプラズマCVDによっ
て成膜された400nmの膜厚をもつ窒化珪素を使用し
た。さらに、1次補助電極配線9,9′,10,10′
として、膜厚200nmのアルミニウムをスパッタによ
って形成した。なお、本実施例の液晶表示デバイスの補
助電極配線以外の全体構成は従来例と同じである。
Source electrode wiring 4 and secondary auxiliary electrode wiring 1
1, 11 ', 12, 12' are made of aluminum having a film thickness of 200 nm, and a pattern in which three convex portions and two concave portions are repeated is patterned at a portion intersecting with the primary auxiliary electrode wirings 9, 10. Silicon nitride having a film thickness of 400 nm formed by plasma CVD was used for the interlayer insulator 17. Further, the primary auxiliary electrode wirings 9, 9 ', 10, 10'
As a result, aluminum having a film thickness of 200 nm was formed by sputtering. The entire structure of the liquid crystal display device of this embodiment other than the auxiliary electrode wiring is the same as that of the conventional example.

【0016】図3は、図2における液晶表示デバイスの
ソース電極はいせんと補助電極配線の交差する部分のA
−A′断面図である。ソース電極配線4と1次補助電極
配線9は、前述する層間絶縁物17であるところの窒化
珪素膜を挟んで通常は絶縁を保っている。なお、この構
造は1次補助電極線と2次補助電極線との交差部におい
ても同様であり、そのときは図2中のソース電極配線4
が2次補助電極線に対応する。
FIG. 3 is a cross sectional view of the source electrode of the liquid crystal display device shown in FIG.
It is a -A 'sectional view. The source electrode wiring 4 and the primary auxiliary electrode wiring 9 are normally kept insulated by sandwiching the silicon nitride film which is the above-mentioned interlayer insulator 17. This structure is the same at the intersection of the primary auxiliary electrode line and the secondary auxiliary electrode line, and in that case, the source electrode wiring 4 in FIG.
Corresponds to the secondary auxiliary electrode line.

【0017】本実施例では、レーザー照射によって、ソ
ース電極配線4と1次あるいは2次の補助電極配線を電
気的に接続する際に、凹凸の部分に照射した。
In this example, when the source electrode wiring 4 and the primary or secondary auxiliary electrode wiring were electrically connected by laser irradiation, the uneven portion was irradiated.

【0018】図1において、例えばソース電極配線4′
上に欠陥箇所16があり、断線が生じた場合、この断線
を救済するために、図2に示すようにソース電極配線
4′と1次補助電極配線9の交差部分15aのポイント
20にレーザー光線を照射し、ソース電極配線4′と1
次補助電極配線9を電気的に接続する。同様の加工を1
5b,13a,13eにも行うことにより、画像として
必要な正規の信号が欠陥の生じたソース電極配線4′に
供給される。このようにして、アクティブマトリックス
基板1に発生した線欠陥16を救済することができる。
なお、ポイント20は基板上にパターンニングされたも
のではない。
In FIG. 1, for example, the source electrode wiring 4 '
If there is a defect 16 on the upper side and a disconnection occurs, in order to remedy this disconnection, a laser beam is applied to the point 20 at the intersection 15a between the source electrode wiring 4'and the primary auxiliary electrode wiring 9 as shown in FIG. Irradiate and source electrode wiring 4'and 1
The next auxiliary electrode wiring 9 is electrically connected. Similar processing 1
By performing steps 5b, 13a, and 13e as well, a normal signal required for an image is supplied to the source electrode wiring 4'in which a defect has occurred. In this way, the line defect 16 generated in the active matrix substrate 1 can be repaired.
Note that the points 20 are not patterned on the substrate.

【0019】次に本発明の他の実施例を図4,図5,図
6に示す。図4,図5,図6において、加工位置を示す
マークはパターンニングにより膜厚100nmのクロム
を用いた。ソース電極配線4,1次補助電極配線9,層
間絶縁物17は図2と同様の構成である。図4において
層間短絡加工は、中央の十字マークに沿って行うものと
する。図5において層間短絡加工は、矢印の先端に合わ
せて行うものとする。図6において層間短絡加工は、交
差部にある四角形のマーク内にて行うものとする。
Next, another embodiment of the present invention is shown in FIGS. 4, FIG. 5, and FIG. 6, the mark indicating the processing position is made of chromium having a film thickness of 100 nm by patterning. The source electrode wiring 4, the primary auxiliary electrode wiring 9, and the interlayer insulator 17 have the same structure as that of FIG. In FIG. 4, the interlayer short-circuit processing is performed along the cross mark in the center. In FIG. 5, the interlayer short-circuit processing is performed according to the tip of the arrow. In FIG. 6, the interlayer short-circuit processing is performed within the rectangular mark at the intersection.

【0020】[0020]

【発明の効果】以上のように本発明によれば、従来の補
助電極配線の層間短絡による不良品のほとんどを良品と
して扱える。またレーザー照射による層間短絡加工の位
置が認識し易いため加工位置への移動が正確に行える。
その結果加工部が重なったり、配線の交差部を外すこと
なく加工を行うことができ、交差部の面積が従来の同じ
ものでも安定した接続抵抗が得られる。また1交差部の
層間短絡加工成功率は100%を確保でき、同時に1交
差部の接続加工の信頼性を大幅に向上することができ
る。これによって、液晶表示デバイスの歩留り,表示性
能を飛躍的に向上することが確認できた。
As described above, according to the present invention, most of the conventional defective products due to the interlayer short circuit of the auxiliary electrode wiring can be treated as good products. Further, since the position of the inter-layer short circuit processing by laser irradiation is easy to recognize, it is possible to accurately move to the processing position.
As a result, it is possible to perform processing without overlapping the processed parts or removing the intersecting part of the wiring, and a stable connection resistance can be obtained even if the area of the intersecting part is the same as the conventional one. In addition, the success rate of interlayer short-circuit processing at one intersection can be maintained at 100%, and at the same time, the reliability of connection processing at one intersection can be significantly improved. As a result, it was confirmed that the yield and display performance of liquid crystal display devices were dramatically improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例の液晶表示デバイスの電
気的模式図
FIG. 1 is an electrical schematic diagram of a liquid crystal display device according to a first embodiment of the present invention.

【図2】同実施例の拡大平面図FIG. 2 is an enlarged plan view of the same embodiment.

【図3】図2におけるA−A′断面図FIG. 3 is a sectional view taken along the line AA ′ in FIG.

【図4】本発明の他の実施例の液晶表示デバイスのソー
ス電極配線と1次補助電極配線の交差する部分のガラス
基板側から見た拡大平面図
FIG. 4 is an enlarged plan view of a crossing portion of a source electrode wiring and a primary auxiliary electrode wiring of a liquid crystal display device according to another embodiment of the present invention viewed from the glass substrate side.

【図5】本発明の他の実施例の液晶表示デバイスのソー
ス電極配線と1次補助電極配線の交差する部分のガラス
基板側から見た拡大平面図
FIG. 5 is an enlarged plan view of a crossing portion of a source electrode wiring and a primary auxiliary electrode wiring of a liquid crystal display device according to another embodiment of the present invention viewed from the glass substrate side.

【図6】本発明の他の実施例の液晶表示デバイスのソー
ス電極配線と1次補助電極配線の交差する部分のガラス
基板側から見た拡大平面図
FIG. 6 is an enlarged plan view of a portion where a source electrode wiring and a primary auxiliary electrode wiring intersect in a liquid crystal display device according to another embodiment of the present invention as seen from the glass substrate side.

【図7】従来のアクティブマトリックス液晶表示デバイ
スの電気的模式図
FIG. 7 is an electrical schematic diagram of a conventional active matrix liquid crystal display device.

【図8】同従来例の拡大平面図FIG. 8 is an enlarged plan view of the conventional example.

【図9】図8におけるB−B′断面図9 is a sectional view taken along line BB ′ in FIG.

【図10】従来の液晶表示デバイスの欠陥不良による1
例を示す電気的模式図
FIG. 10: 1 due to defect defect of conventional liquid crystal display device
Electrical schematic showing an example

【図11】同他の不良例を示す電気的模式図FIG. 11 is an electrical schematic diagram showing another defect example.

【符号の説明】[Explanation of symbols]

1 アクティブマトリックス基板 7 画素電極 8 画像表示領域 9 1次補助電極配線A 9′ 1次補助電極配線A′ 10 1次補助電極配線B 10′ 1次補助電極配線B′ 11 2次補助電極配線A 11′ 2次補助電極配線A′ 12 2次補助電極配線B 12′ 2次補助電極配線B′ 13a〜13h 1次補助電極配線−2次補助電極配線
交差部分 15a〜15c ソース電極配線−1次補助電極配線交
差部分 16 欠陥箇所 17 層間絶縁物 22a,22b 3次補助電極配線 20 加工を行うポイント 21 加工位置を示すマーク
1 Active Matrix Substrate 7 Pixel Electrode 8 Image Display Area 9 Primary Auxiliary Electrode Wiring A 9 'Primary Auxiliary Electrode Wiring A'10 Primary Auxiliary Electrode Wiring B 10' Primary Auxiliary Electrode Wiring B'11 Secondary Auxiliary Electrode Wiring A 11 'Secondary auxiliary electrode wiring A'12 Secondary auxiliary electrode wiring B 12' Secondary auxiliary electrode wiring B'13a to 13h Primary auxiliary electrode wiring-Secondary auxiliary electrode wiring intersection 15a to 15c Source electrode wiring-Primary Auxiliary electrode wiring intersection 16 Defects 17 Interlayer insulators 22a, 22b Tertiary auxiliary electrode wiring 20 Processing points 21 Marks indicating processing positions

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 欠陥救済用の第1,第2の補助電極配線
を有し、前記第1の補助電極配線が信号電極配線と交差
するとともに、前記2次補助電極配線と絶縁物を介して
交差するように配置されていることを特徴とした液晶表
示デバイス。
1. Defect relief first and second auxiliary electrode wirings are provided, the first auxiliary electrode wiring intersects the signal electrode wiring, and the secondary auxiliary electrode wiring is interposed via an insulator. A liquid crystal display device characterized by being arranged so as to intersect.
【請求項2】 アクティブマトリックス基板上に、複数
本のゲート信号電極配線と前記ゲート信号電極配線と交
差する複数本のソース信号電極配線と、前記ゲート信号
電極配線とソース信号電極配線の交点毎に一組のスイッ
チング素子と画素電極からなる画像表示領域と、前記ゲ
ートあるいはソースの一方の信号電極配線と交差する欠
陥救済用の補助電極配線とを有し、前記補助電極配線が
前記信号電極配線と絶縁物を挟んで交差する部分あるい
はその近傍に加工位置を示すマークを備えていることを
特徴とする液晶表示デバイス。
2. A plurality of gate signal electrode wirings, a plurality of source signal electrode wirings intersecting the gate signal electrode wirings, and an intersection of the gate signal electrode wirings and the source signal electrode wirings on an active matrix substrate. An image display region including a pair of switching elements and a pixel electrode, and an auxiliary electrode wiring for defect relief that intersects the signal electrode wiring of one of the gate and the source, and the auxiliary electrode wiring is the signal electrode wiring. A liquid crystal display device, characterized in that a mark indicating a processing position is provided in a portion intersecting with an insulator or in the vicinity thereof.
JP12573393A 1993-05-27 1993-05-27 Liquid crystal display device Pending JPH06337642A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12573393A JPH06337642A (en) 1993-05-27 1993-05-27 Liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12573393A JPH06337642A (en) 1993-05-27 1993-05-27 Liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH06337642A true JPH06337642A (en) 1994-12-06

Family

ID=14917448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12573393A Pending JPH06337642A (en) 1993-05-27 1993-05-27 Liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH06337642A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6856374B1 (en) 1999-11-19 2005-02-15 Fujitsu Display Technologies Corporation Display and method for repairing defects thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6856374B1 (en) 1999-11-19 2005-02-15 Fujitsu Display Technologies Corporation Display and method for repairing defects thereof
US7187423B2 (en) 1999-11-19 2007-03-06 Sharp Kabushiki Kaisha Display and method for repairing defects thereof
KR100765926B1 (en) * 1999-11-19 2007-10-11 샤프 가부시키가이샤 Display device and method of reparing defect of the same

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