JPH0631720Y2 - Semiconductor manufacturing equipment - Google Patents

Semiconductor manufacturing equipment

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Publication number
JPH0631720Y2
JPH0631720Y2 JP1855987U JP1855987U JPH0631720Y2 JP H0631720 Y2 JPH0631720 Y2 JP H0631720Y2 JP 1855987 U JP1855987 U JP 1855987U JP 1855987 U JP1855987 U JP 1855987U JP H0631720 Y2 JPH0631720 Y2 JP H0631720Y2
Authority
JP
Japan
Prior art keywords
suction table
semiconductor wafer
slider
wafer
suction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1855987U
Other languages
Japanese (ja)
Other versions
JPS63174443U (en
Inventor
晴城 坂口
Original Assignee
関西日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西日本電気株式会社 filed Critical 関西日本電気株式会社
Priority to JP1855987U priority Critical patent/JPH0631720Y2/en
Publication of JPS63174443U publication Critical patent/JPS63174443U/ja
Application granted granted Critical
Publication of JPH0631720Y2 publication Critical patent/JPH0631720Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【考案の詳細な説明】 産業上の利用分野 本考案は、半導体ウェーハを吸着してフォトレジストを
塗布したり、現像、エッチング、洗浄等の液処理やスク
ラブ等を行う吸着台に半導体ウェーハを搬送又は吸着台
より搬出する半導体製造装置に関するものである。
[Detailed Description of the Invention] Industrial Field of the Invention The present invention is to adsorb a semiconductor wafer to apply a photoresist, and to transfer the semiconductor wafer to an adsorption table for performing liquid treatment such as development, etching and cleaning, and scrubbing. Alternatively, the present invention relates to a semiconductor manufacturing apparatus which is carried out from the suction table.

従来の技術 半導体ウェーハの製造工程中、表面にフォトレジスト液
を塗布したり、エッチング液等を噴射して液処理した
り、スクラブしたりする際、第4図に示すスピンナと呼
ばれる回転吸着台(1)を用いたものがあり、この処理
装置によれば、まずロード側搬送ベルト(2)より吸着
台(1)に半導体ウェーハ(3)を搬送して真空吸着す
る。そして、吸着台(1)を回転させながらウェーハの
表面にフォトレジスト液やエッチング液等の処理液
(4)を滴下また噴射する。そうすると、処理液(4)
が遠心力でウェーハ表面全体に拡がって所定の処理が行
われ、その後、半導体ウェーハ(3)を吸着台(1)よ
りアンロード側搬送ベルト(5)へ搬出して次工程に送
る。
2. Description of the Related Art During a semiconductor wafer manufacturing process, when a photoresist solution is applied to the surface, or an etching solution or the like is sprayed to perform a liquid treatment or scrubbing, a rotary suction table called a spinner shown in FIG. According to this processing apparatus, the semiconductor wafer (3) is first transferred from the load side transfer belt (2) to the suction table (1) and vacuum-sucked. Then, the treatment liquid (4) such as a photoresist liquid or an etching liquid is dropped or sprayed onto the surface of the wafer while rotating the suction table (1). Then, the processing liquid (4)
Is subjected to a predetermined process by being spread over the entire surface of the wafer by centrifugal force, and then the semiconductor wafer (3) is unloaded from the suction table (1) to the unloading side transfer belt (5) and sent to the next step.

この時、半導体ウェーハ(3)の搬送ベルト(2)から
吸着台(1)への搬送及び吸着台(1)から搬送ベルト
(5)への搬出には、第5図に示すスライダ(6)と呼
ばれる搬送治具が用いられる。上記スライダ(6)は、
同図に示すように、2個の棒状支持体(7a)(7b)及び
(8a)(8b)を階段状に一体化してなる載せ台(7)
(8)を吸着台(1)よりやや幅広、かつ水平に平行連
結して上段支持体(7a)(8a)及び下段支持体(7b)
(8b)に半導体ウェーハ(3)の周縁部を載せると共に
下段側段差部付近に送りピン(9)を植設したものであ
る。そして、載せ台(7)(8)の連結板(10)に取付
けた取付板(11)(12)を第11図に示すスライダ保持軸
(15)に保持させて水平駆動され、半導体ウェーハ
(3)を吸着台(1)に搬送又はそれより搬出する。
At this time, when the semiconductor wafer (3) is transported from the transport belt (2) to the suction platform (1) and is unloaded from the suction platform (1) to the transport belt (5), the slider (6) shown in FIG. 5 is used. A transfer jig called is used. The slider (6) is
As shown in the figure, a mounting base (7) formed by integrating two rod-shaped supports (7a) (7b) and (8a) (8b) in a stepwise manner.
The upper support (7a) (8a) and the lower support (7b) are formed by connecting (8) a little wider than the suction table (1) and horizontally connecting them in parallel.
The peripheral edge of the semiconductor wafer (3) is placed on (8b), and the feed pin (9) is planted near the lower step. Then, the mounting plates (11) and (12) mounted on the connecting plates (10) of the mounting bases (7) and (8) are held horizontally by the slider holding shaft (15) shown in FIG. 3) is conveyed to or taken out from the adsorption table (1).

上記半導体ウェーハー(3)の搬送及び搬出動作を第6
図乃至第10図を参照して次に示す。上記搬送及び搬出動
作は、通常、同時に行われ、第6図に示すように、ロー
ド側搬送ベルト(2)より半導体ウェーハ(3a)が送ら
れてくると共に吸着台(1)上にも処理後の半導体ウェ
ーハ(3b)があるものとする。そして、まず第6図に示
すように、スライダ(6)を上段支持体(7a)(8a)を
搬送ベルト側に向けると共に搬送面よりやや低い位置に
してその付近まで水平移動させておいて、搬送ベルト
(2)の駆動により半導体ウェーハ(3a)を上段支持体
(7a)(8a)上に落とし込む。次に、吸着台(1)のウ
ェーハ吸着面を上段支持体(7a)(8a)の載せ面よりや
や低く、かつ、下段支持体(7b)(8b)の載せ面よりや
や高くしておいて、第7図に示すように、載せ台(7)
(8)の間を吸着台(1)が通過するようにスライダ
(6)を吸着台(1)側(X方向)に水平移動する。そ
うすると、スライダ(6)の水平移動に伴って吸着台
(1)上の半導体ウェーハ(3b)が送りピン(9)によ
って係止され吸着台(1)より押し出されていきなが
ら、第8図に示すように、下段支持体(7b)(8b)上に
落ち込んでいき、同時に上段支持体(7a)(8a)上の半
導体ウェーハ(3a)が吸着台(1)上方に位置する。そ
こで、搬出側で下段支持体(7b)(8b)の下方よりリフ
タ(13)を支持体間を通って上昇させると、半導体ウェ
ーハ(3b)が下段支持体(7b)(8b)からリフタ(13)
に載せ替えられる。同時に、搬送側で上段支持体(7a)
(8a)の間を通ってストッパ(14)を上昇させて吸着台
(1)上方に位置する半導体ウェーハ(3a)の周側縁を
係止する。そして、第9図に示すように、半導体ウェー
ハ(3a)は真空吸着しながらスライダ(6)を水平に復
帰させると、半導体ウェーハ(3a)はストッパ(14)に
係止されてスライダ(6)より吸着台(1)上に載せ替
えられると共にリフタ(13)を下降させると、第10図に
示すように、吸着台(1)に半導体ウェーハ(3a)が吸
着され、かつ、図示しないが、アンロード側搬送ベルト
(5)上に半導体ウェーハ(3b)が搬出される。この
時、スライダ(6)は元のロード側搬送ベルト(5)付
近に戻っているため、上記同様、半導体ウェーハ(3)
の吸着台(1)への搬送とそれよりの搬出を繰り返す。
The sixth operation for carrying and carrying out the semiconductor wafer (3)
The following will be made with reference to FIGS. The above-mentioned carrying and carrying-out operations are usually carried out simultaneously, and as shown in FIG. 6, after the semiconductor wafer (3a) is sent from the load side carrying belt (2), it is also processed on the suction table (1). There is a semiconductor wafer (3b). Then, as shown in FIG. 6, first, the slider (6) is directed to the upper support bodies (7a) and (8a) toward the conveyor belt, and is moved to a position slightly lower than the conveyor surface and horizontally moved to the vicinity thereof. The semiconductor wafer (3a) is dropped onto the upper stage supports (7a) and (8a) by driving the transport belt (2). Next, the wafer suction surface of the suction table (1) is slightly lower than the mounting surface of the upper support (7a) (8a) and slightly higher than the mounting surface of the lower support (7b) (8b). , As shown in FIG. 7, the platform (7)
The slider (6) is horizontally moved to the suction table (1) side (X direction) so that the suction table (1) passes between (8). Then, as the slider (6) moves horizontally, the semiconductor wafer (3b) on the suction table (1) is locked by the feed pin (9) and pushed out from the suction table (1), as shown in FIG. As shown, the semiconductor wafer (3a) on the lower supports (7b) and (8b) falls on the upper supports (7a) and (8a) at the same time as being located above the suction table (1). Therefore, when the lifter (13) is lifted from below the lower supports (7b) (8b) on the carry-out side through the spaces between the supports, the semiconductor wafer (3b) is lifted from the lower supports (7b) (8b) to the lifter (7). 13)
Can be replaced. At the same time, the upper support (7a) on the transport side
The stopper (14) is raised through the space (8a) to lock the peripheral side edge of the semiconductor wafer (3a) located above the suction platform (1). Then, as shown in FIG. 9, when the slider (6) is returned horizontally while vacuum adsorbing the semiconductor wafer (3a), the semiconductor wafer (3a) is locked by the stopper (14) and the slider (6). When the lifter (13) is moved down and the lifter (13) is lowered, the semiconductor wafer (3a) is sucked onto the suction table (1) as shown in FIG. The semiconductor wafer (3b) is unloaded on the unloading side transfer belt (5). At this time, since the slider (6) has returned to the vicinity of the original load-side transfer belt (5), the semiconductor wafer (3) is returned in the same manner as above.
Transporting the same to the suction table (1) and carrying it out from it are repeated.

考案が解決しようとする問題点 ところで、上述したスライダ(6)により半導体ウェー
ハ(3)を吸着台(1)より搬出する際、吸着台(1)
に載置されている半導体ウェーハ(3)を送りピン
(9)によって係止して吸着台(1)より押し出してい
る。そのため、半導体ウェーハ(3)は吸着台(1)か
ら離れるまで吸着面上を摺動していることになり、ウェ
ーハ裏面にゴミや汚れ、更に傷が付き、特に裏面にレジ
スト膜等が形成されていると、それらに傷が付いて歩留
まりを低下させる。
Problems to be Solved by the Invention By the way, when the semiconductor wafer (3) is carried out from the suction table (1) by the slider (6) described above, the suction table (1)
The semiconductor wafer (3) mounted on the substrate is locked by the feed pin (9) and pushed out from the suction table (1). Therefore, the semiconductor wafer (3) slides on the suction surface until it is separated from the suction table (1), and the back surface of the wafer has dust, dirt, and scratches, and in particular, a resist film or the like is formed on the back surface. If they are, they will be scratched and the yield will be reduced.

問題点を解決するための手段 本考案は、半導体ウェーハを吸着し、半導体ウェーハよ
り径小な吸着台と、段階状に上段下段を有する載せ台2
台を上記吸着台よりやや幅広に間隔を有し、かつ水平に
平行連結して上下段にそれぞれ半導体ウェーハ周縁部を
支持するスライダとを具備し、該スライダはその載せ台
を上記吸着台に平行保持した姿勢で、吸着台に対し一定
の角度だけ上下斜め方向に傾斜動し、上方斜め動時に下
段の支持部は前記吸着台上のウェーハを下方よりすくい
上げるように支持して搬出するとともに上段の支持部は
次のウェーハを前記吸着台の上方まで搬送することを特
徴とする。
MEANS FOR SOLVING PROBLEMS The present invention is directed to a suction table for sucking a semiconductor wafer and having a diameter smaller than that of the semiconductor wafer, and a mounting table 2 having upper and lower stages in a stepwise manner.
The slider is provided with a space slightly wider than the suction table, and the sliders are horizontally connected in parallel and support the peripheral portions of the semiconductor wafers in the upper and lower stages, respectively. In the held posture, the wafer tilts up and down diagonally with respect to the suction table by a certain angle, and when tilted upward, the lower support section supports the wafer on the suction table so that it is picked up from below and carries it out. The support unit conveys the next wafer to above the suction table.

作用 吸着台に半導体ウェーハを吸着し、スライダをその載せ
台の間を吸着台が通過するように上下斜め方向に傾斜駆
動すると、吸着台上を半導体ウェーハが摺動することな
く吸着台から離れて載せ台に載せ替えられる。
Function When a semiconductor wafer is sucked onto the suction table and the slider is tilted vertically and vertically so that the suction table passes between the mounting tables, the semiconductor wafer moves away from the suction table without sliding on the suction table. It can be transferred to the platform.

実施例 本考案の一実施例を第1図乃至第3図を参照して以下説
明する。第4図乃至第10図と同一参照符号は同一物を示
し、(1)は吸着台、(3)は半導体ウェーハ、(6)
はスライダ、(7b)(8b)はスライダ(6)の下段支持
体、(9)は送りピンで、第11図の鎖線で示すように、
スライダ(6)を駆動するスライダ駆動部(16)は下段
支持体(7b)(8b)を吸着台(1)に平行な姿勢を保持
した状態で吸着台(1)に対し一定の角度だけ上下斜め
方向(A)に移動するように改造される。
Embodiment An embodiment of the present invention will be described below with reference to FIGS. The same reference numerals as those in FIGS. 4 to 10 indicate the same things, (1) is a suction table, (3) is a semiconductor wafer, and (6)
Is a slider, (7b) and (8b) are lower supports of the slider (6), and (9) is a feed pin, as shown by a chain line in FIG.
The slider drive unit (16) for driving the slider (6) moves up and down by a certain angle with respect to the suction table (1) with the lower supports (7b) and (8b) held in a posture parallel to the suction table (1). It is remodeled to move diagonally (A).

上記構成に基づき本考案の動作を次に示す。まず、第1
図に示すように、吸着台(1)に半導体ウェーハ(3)
を吸着して処理した後、スライダ(6)にて半導体ウェ
ーハ(3)を吸着台(1)からアンロード側搬送ベルト
へ搬出する際、スライダ(6)を吸着台(1)の下方よ
り斜め上方の(A)方向に傾斜駆動して吸着台(1)に
近付ける。そうすると、スライダ(6)の下段支持体
(7b)(8b)の間を吸着台(1)が通り、更に傾斜駆動
させると、第2図に示すように、下段支持体(7b)(8
b)に半導体ウェーハ(3)が近付く。そして、スライ
ダ(6)が(A)方向に引き続いて傾斜移動すると、第
3図に示すように、吸着面上を半導体ウェーハ(3)が
摺動することなく、下段支持体(7b)(8b)に乗り移
り、吸着台(1)から離れていく。そして、この時、半
導体ウェーハ(3)のスライダ(6)からアンロード側
搬送ベルトへの載せ替え及びスライダ(6)によるロー
ド側搬送ベルトから吸着台(1)への半導体ウェーハ
(3)の搬送は従来と同じ動作にて行われる。
The operation of the present invention based on the above configuration will be described below. First, the first
As shown in the figure, the semiconductor wafer (3) is attached to the suction table (1).
When the semiconductor wafer (3) is carried out by the slider (6) from the suction table (1) to the unloading side transfer belt after the suction is processed, the slider (6) is slanted from below the suction table (1). It is tilted in the upper direction (A) to approach the suction table (1). Then, when the suction table (1) passes between the lower supports (7b) and (8b) of the slider (6) and is further tilt-driven, as shown in FIG. 2, the lower supports (7b) and (8b) are
The semiconductor wafer (3) approaches b). When the slider (6) subsequently tilts in the (A) direction, as shown in FIG. 3, the semiconductor wafer (3) does not slide on the suction surface, and the lower support (7b) (8b) does not slide. ) And move away from the suction table (1). Then, at this time, the semiconductor wafer (3) is transferred from the slider (6) to the unload-side transfer belt and the semiconductor wafer (3) is transferred from the load-side transfer belt to the suction platform (1) by the slider (6). Is performed by the same operation as the conventional one.

なお、本考案の実施においては従来の装置第11図におい
て、スライダ保持軸(15)を二点鎖線で示す保持軸(1
6)のように搬出側を若干上方にずらすだけで改造でき
る。それにともない吸着台(2)及び搬送ベルト
(2),(5)の高さの調整、リフタ(13)のストロー
ク調整は必要である。さらに場合によってスライダ
(6)の載せ台(7),(8)の段差の変更を必要とす
ることもある。
In the implementation of the present invention, the slider holding shaft (15) shown in FIG.
It can be remodeled by slightly shifting the unloading side upwards as in 6). Along with this, it is necessary to adjust the height of the suction table (2) and the conveyor belts (2) and (5) and the stroke of the lifter (13). Further, in some cases, it may be necessary to change the steps of the mounts (7) and (8) of the slider (6).

考案の効果 本考案によれば、半導体ウェーハを吸着して処理を行う
吸着台より半導体ウェーハを搬出する際、半導体ウェー
ハが吸着面上を摺動することなく搬出するようにしたか
ら、ウェーハ裏面に付くゴミや汚れ、そして傷等を防止
でき歩留まり向上を図ることができる。
Advantageous Effects of Invention According to the present invention, when a semiconductor wafer is carried out from a suction table that sucks and processes the semiconductor wafer, the semiconductor wafer is carried out without sliding on the suction surface. It is possible to prevent attached dust, dirt, scratches, etc. and improve the yield.

【図面の簡単な説明】[Brief description of drawings]

第1図乃至第3図は本考案に係る半導体製造装置の一実
施例を示す動作順の各要部側面図、第4図はスピンナを
用いた半導体ウェーハの処理装置を示す概略側面図、第
5図は第4図の処理装置に含まれるスライダの斜視図、
第6図乃至第10図は第5図のスライダによる半導体ウェ
ーハの搬送及び搬出動作の動作順の各要部側面図、第11
図はスライダ駆動部の斜視図である。 (1)……吸着台、(3)……半導体ウェーハ、 (6)……スライダ、(7)(8)……載せ台、 (7a)(8a)……上段支持体、 (7b)(8b)……下段支持体、 (9)……送りピン。
1 to 3 are side views of main parts in the order of operation showing one embodiment of a semiconductor manufacturing apparatus according to the present invention, and FIG. 4 is a schematic side view showing a semiconductor wafer processing apparatus using a spinner. 5 is a perspective view of a slider included in the processing apparatus of FIG. 4,
6 to 10 are side views of essential parts in the order of operation of carrying and carrying out the semiconductor wafer by the slider of FIG.
The figure is a perspective view of the slider drive unit. (1) …… Suction table, (3) …… Semiconductor wafer, (6) …… Slider, (7) (8) …… Platform, (7a) (8a) …… Upper support, (7b) ( 8b) …… Lower support, (9) …… Feed pin.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】半導体ウェーハを吸着し、半導体ウェーハ
より径小な吸着台と、 階段状に上段下段を有する載せ台2台を上記吸着台より
やや幅広に間隔を有して、かつ、水平に平行連結して上
下段にそれぞれ半導体ウェーハ周縁部を支持するスライ
ダとを具備し、 該スライダはその載せ台を上記吸着台に平行保持した姿
勢で吸着台に対し一定角度だけ上下斜め方向に傾斜動
し、上方斜め動時に下段の支持部は前期吸着台上のウェ
ーハを下方よりすくい上げるように支持して搬出すると
ともに上段の支持部は次のウェーハを前記吸着台上方ま
で搬送することを特徴とする半導体製造装置。
1. A suction table for sucking a semiconductor wafer and having a diameter smaller than that of the semiconductor wafer, and two mounting tables having upper and lower steps in a staircase pattern, which are slightly wider than the suction table and horizontally. A slider is provided which is connected in parallel and supports the peripheral portions of the semiconductor wafers in the upper and lower stages, respectively, and the slider tilts vertically and obliquely at a certain angle with respect to the suction table in a posture in which the mounting table is held in parallel with the suction table. However, the upper supporting section carries out the wafer while supporting it so that the wafer on the suction table is picked up from below at the time of diagonally moving upward, and the upper supporting section carries the next wafer to above the suction table. Semiconductor manufacturing equipment.
JP1855987U 1987-02-10 1987-02-10 Semiconductor manufacturing equipment Expired - Lifetime JPH0631720Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1855987U JPH0631720Y2 (en) 1987-02-10 1987-02-10 Semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1855987U JPH0631720Y2 (en) 1987-02-10 1987-02-10 Semiconductor manufacturing equipment

Publications (2)

Publication Number Publication Date
JPS63174443U JPS63174443U (en) 1988-11-11
JPH0631720Y2 true JPH0631720Y2 (en) 1994-08-22

Family

ID=30812342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1855987U Expired - Lifetime JPH0631720Y2 (en) 1987-02-10 1987-02-10 Semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JPH0631720Y2 (en)

Also Published As

Publication number Publication date
JPS63174443U (en) 1988-11-11

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