JPH0630849Y2 - 化学気相生成装置 - Google Patents
化学気相生成装置Info
- Publication number
- JPH0630849Y2 JPH0630849Y2 JP1324989U JP1324989U JPH0630849Y2 JP H0630849 Y2 JPH0630849 Y2 JP H0630849Y2 JP 1324989 U JP1324989 U JP 1324989U JP 1324989 U JP1324989 U JP 1324989U JP H0630849 Y2 JPH0630849 Y2 JP H0630849Y2
- Authority
- JP
- Japan
- Prior art keywords
- quartz
- susceptor
- loop
- inert gas
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000126 substance Substances 0.000 title claims description 4
- 239000012808 vapor phase Substances 0.000 title claims description 3
- 239000010453 quartz Substances 0.000 claims description 68
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 68
- 239000011261 inert gas Substances 0.000 claims description 26
- 239000012495 reaction gas Substances 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 238000009423 ventilation Methods 0.000 description 4
- 230000002238 attenuated effect Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005380 borophosphosilicate glass Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1324989U JPH0630849Y2 (ja) | 1989-02-06 | 1989-02-06 | 化学気相生成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1324989U JPH0630849Y2 (ja) | 1989-02-06 | 1989-02-06 | 化学気相生成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02106460U JPH02106460U (enrdf_load_stackoverflow) | 1990-08-23 |
| JPH0630849Y2 true JPH0630849Y2 (ja) | 1994-08-17 |
Family
ID=31223394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1324989U Expired - Lifetime JPH0630849Y2 (ja) | 1989-02-06 | 1989-02-06 | 化学気相生成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0630849Y2 (enrdf_load_stackoverflow) |
-
1989
- 1989-02-06 JP JP1324989U patent/JPH0630849Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02106460U (enrdf_load_stackoverflow) | 1990-08-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |