JPH06280037A - Surface treating device - Google Patents

Surface treating device

Info

Publication number
JPH06280037A
JPH06280037A JP9366893A JP9366893A JPH06280037A JP H06280037 A JPH06280037 A JP H06280037A JP 9366893 A JP9366893 A JP 9366893A JP 9366893 A JP9366893 A JP 9366893A JP H06280037 A JPH06280037 A JP H06280037A
Authority
JP
Japan
Prior art keywords
support shaft
holding plate
treated
rotation holding
rotary holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9366893A
Other languages
Japanese (ja)
Other versions
JP2877218B2 (en
Inventor
Genichi Nakanishi
玄一 中西
Takeshi Wada
健史 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Light Metal Co Ltd
Original Assignee
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Light Metal Co Ltd filed Critical Nippon Light Metal Co Ltd
Priority to JP9366893A priority Critical patent/JP2877218B2/en
Publication of JPH06280037A publication Critical patent/JPH06280037A/en
Application granted granted Critical
Publication of JP2877218B2 publication Critical patent/JP2877218B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemically Coating (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To improve the treating efficiency of a material to be treated, to reduce the stcking of impurity, etc., to the material to be treated and to improve the yield. CONSTITUTION:Rotary holding plates 7 are arranged so as to be rotatable to the facing surfaces of oppositely faced hanging members 2 and a first supporting shafts 18 circumscribing the materials D to be treated are supported so as to be rotatable at the inner peripheral sides of the rotary holding plates 7. Shaft receiving grooves 21 opened to the outer part in the diameter direction holding a second supporting shafts 19 circumscribing the outer side of the materials D to be treated are arranged on the outer peripheral sides of the rotary holding plate 7 and guides 23 for preventing the drop of the second supporting shaft 19 are arranged at least near the outer periphery of lower parts of the rotary holding plates 7. A fixed wheel 26 is arranged at the rotary center part of the rotary holding plate 7, and a driven wheel 27 rotated by contacting with the fixed wheel 26 is arranged in the first supporting shaft 18. By this method, the second supporting shaft 19 is inserted into the shaft receiving groove 21 of the rotary holding plate 7 and the materials D to be treated can easily be set between the first and the second supporting shafts 18, 19. After setting, while auto-rotating the material D to be treated in treating liquid 4 accompanying the rotation of the rotary holding plate 7, the material D is revolved and the uniform surface treatment is quickly executed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は表面処理装置に関する
もので、更に詳細には、例えば磁気ディスク等の被処理
体を無電解メッキ処理する表面処理装置に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment apparatus, and more particularly to a surface treatment apparatus for subjecting an object to be treated such as a magnetic disk to electroless plating.

【0002】[0002]

【従来の技術】従来、アルミニウム製の磁気ディスクの
表面に例えばニッケル燐を被覆する場合、図4に示すよ
うに、被処理体であるディスク基板D(以下にディスク
という)を適宜間隔をおいて支持軸1に垂直状に支持
し、この支持軸1を対峙する吊持部材2間に横架させ、
そして、吊持部材2を下降させて処理槽であるメッキ槽
3内のメッキ液4にディスクDを浸漬して、ディスクD
の表面にメッキ処理を施している。このような表面処理
によれば、一度に多数枚のディスクDを同時に表面処理
することができる。なお、この例では中心に穴を有する
ドーナツ状のディスクを対象とする表面処理装置が示さ
れているが、中心に穴を有しないディスクの場合は、デ
ィスクを外接する複数本の支持軸によって支持すること
になる。
2. Description of the Related Art Conventionally, when a surface of a magnetic disk made of aluminum is coated with, for example, nickel phosphorus, a disk substrate D (hereinafter referred to as a disk) which is an object to be processed is appropriately spaced as shown in FIG. The support shaft 1 is vertically supported, and the support shaft 1 is laterally suspended between the suspension members 2 facing each other.
Then, the suspension member 2 is lowered to immerse the disk D in the plating solution 4 in the plating tank 3 which is a processing tank.
The surface of is plated. According to such surface treatment, a large number of disks D can be surface-treated at the same time. In this example, a surface treatment device for a donut-shaped disc having a hole in the center is shown, but in the case of a disc having no hole in the center, the disc is supported by a plurality of support shafts circumscribing. Will be done.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、従来の
この種の表面処理装置においては、支持軸1を対峙する
吊持部材2の対向する取付面に設けられた軸受5にスプ
リング6を介在させて取付けるか、あるいは、吊持部材
2の一方に保持孔を設け、支持軸1の端部を一旦保持孔
に嵌挿した後、支持軸1の他端を軸受5に係合させるな
どの方法で支持軸1を吊持部材2間に横架していた。し
たがって、支持軸1及びディスクDのセットが面倒であ
るという問題があった。また、メッキ処理中にスプリン
グ6や保持孔等にもメッキされるため、繰返して表面処
理を行う間にスプリング6等のメッキ部が剥離して粒子
状不純物(パーティクル)が発生し、この不純物がディ
スクDに付着して化学反応(ケミカルコンタミネーショ
ン)を起こして、磁気ディスクの特性や歩留まりの悪化
を招くという問題もあった。更に、ディスクDがメッキ
液4中に静止されているため、ディスク表面に均一なメ
ッキ膜を迅速に形成することが困難であった。
However, in the conventional surface treatment apparatus of this type, the spring 6 is interposed between the bearings 5 provided on the opposing mounting surfaces of the suspension member 2 facing the support shaft 1. By attaching it, or by providing a holding hole in one of the suspension members 2, inserting the end of the support shaft 1 into the holding hole once, and then engaging the other end of the support shaft 1 with the bearing 5. The support shaft 1 was laid horizontally between the suspension members 2. Therefore, there is a problem that setting the support shaft 1 and the disk D is troublesome. In addition, since the spring 6 and the holding hole are also plated during the plating process, the plated portion of the spring 6 and the like peels off during the repeated surface treatment to generate particulate impurities (particles). There is also a problem that it adheres to the disk D and causes a chemical reaction (chemical contamination), resulting in deterioration of the characteristics and yield of the magnetic disk. Furthermore, since the disk D is stationary in the plating solution 4, it is difficult to quickly form a uniform plating film on the disk surface.

【0004】この発明は上記事情に鑑みなされたもの
で、被処理体のセットが容易で、被処理体の表面に均一
な処理を迅速に施すことができ、かつ被処理体への不純
物等の付着を低減して歩留まりの向上が図れるようにし
た表面処理装置を提供することを目的とするものであ
る。
The present invention has been made in view of the above circumstances. The object to be processed can be easily set, the surface of the object to be processed can be uniformly processed rapidly, and impurities such as impurities in the object to be processed can be quickly processed. An object of the present invention is to provide a surface treatment apparatus capable of reducing adhesion and improving yield.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
に、この発明の表面処理装置は、対峙する吊持部材間に
支持軸を横架し、その軸方向に複数の被処理体を間隔を
おいて垂直状に支持して処理液内に浸漬することによ
り、上記被処理体の表面を処理する表面処理装置を前提
とし、上記吊持部材の対向する面に回転保持板を回転可
能に設け、上記回転保持板の内周側に被処理体と外接す
る第一支持軸を回転可能に支持すると共に、上記回転保
持板の外周側に被処理体と外接する第二支持軸を保持す
る径方向外方に開口した軸受溝を設け、上記回転保持板
の少なくとも下部外周近傍に上記第二支持軸の落下防止
用ガイドを配設し、上記回転保持板の回転中心部に固定
車を設けると共に、上記第一支持軸に上記固定車と接し
て回転する従動車を設けたことを特徴とするものであ
る。
In order to achieve the above object, in the surface treatment apparatus of the present invention, a support shaft is horizontally installed between facing suspension members, and a plurality of objects to be processed are spaced in the axial direction. Assuming a surface treatment device for treating the surface of the object to be treated by supporting it vertically and immersing it in the treatment liquid, the rotation holding plate can be rotated on the opposite surface of the hanging member. A rotatably supported first support shaft circumscribing the object to be processed is provided on the inner peripheral side of the rotation holding plate, and a second support shaft circumscribing the object to be processed is retained on the outer peripheral side of the rotation holding plate. A bearing groove opened radially outward is provided, a drop prevention guide for the second support shaft is provided at least near the outer periphery of the lower portion of the rotation holding plate, and a fixed wheel is provided at the center of rotation of the rotation holding plate. At the same time, a driven wheel that rotates in contact with the fixed wheel is attached to the first support shaft. It is characterized in that the digits.

【0006】[0006]

【作用】上記のように構成されるこの発明の表面処理装
置によれば、回転保持板の軸受溝に外側支持軸を入れる
ことにより第一支持軸との間に被処理体を容易にセット
することができる。第二支持軸は回転保持板の回転に伴
って落下防止用ガイドによって案内され、被処理体は固
定車と接して回転する従動車及び第一支持軸を介して自
転しつつ公転して処理液中を移動することにより被処理
体の表面に均一な処理が迅速に施される。
According to the surface treatment apparatus of the present invention constructed as described above, the object to be treated is easily set between the first support shaft and the outer support shaft by inserting it into the bearing groove of the rotation holding plate. be able to. The second support shaft is guided by the fall prevention guide as the rotation holding plate rotates, and the object to be processed revolves around the driven wheel rotating in contact with the fixed wheel and the first support shaft while revolving around. By moving inside, the surface of the object to be processed can be uniformly processed quickly.

【0007】[0007]

【実施例】以下、この発明の一実施例を添付図面に基づ
いて詳述する。ここでは、この発明の表面処理装置をア
ルミニウム製磁気ディスクの無電解メッキ装置に適用し
た場合について説明する。また、従来の表面処理装置と
同じ部分には同一符号を付して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the accompanying drawings. Here, a case where the surface treatment apparatus of the present invention is applied to an electroless plating apparatus for an aluminum magnetic disk will be described. Further, the same parts as those of the conventional surface treatment apparatus will be described with the same reference numerals.

【0008】図1はこの発明の方面処理装置の第一実施
例の断面図、図2は図1のA−A断面図が示されてい
る。
FIG. 1 is a sectional view of a first embodiment of a surface treatment apparatus of the present invention, and FIG. 2 is a sectional view taken along the line AA of FIG.

【0009】この表面処理装置は、図示しない搬送機構
から垂下されて対峙する一対の吊持部材2を有し、両吊
持部材2の対向する面には回転保持板7が支軸8を介し
て垂直方向に回転可能に取付けられている。上記支軸8
の吊持部材2に嵌合する部分8aは断面矩形に形成さ
れ、固定部材9を介して吊持部材2に固定されている。
なお、支軸8をその矩形部分8aの角部が下方に向くよ
うに取付ければ、メッキ槽3から引き上げる際のメッキ
液の液切れを良好にすることができる。回転保持板7の
中心部には上記支軸8に滑り軸受10を介して回転可能
に嵌合する中心孔11が形成され、回転保持板7の外周
部には歯部12が設けられている。上記回転保持板7を
回転駆動するために、上記吊持部材2には上記回転保持
板7の歯部12と噛合する伝達歯車13が軸14を介し
て回転可能に取付けられ、この伝達歯車13には駆動モ
ータ15の駆動軸16に装着した駆動歯車17が噛合さ
れている。
This surface treatment apparatus has a pair of suspension members 2 that are hung from a conveyance mechanism (not shown) and face each other. Rotation holding plates 7 are provided on opposite surfaces of both suspension members 2 via a spindle 8. It is mounted so that it can rotate vertically. Support shaft 8
The portion 8a fitted to the suspension member 2 has a rectangular cross section and is fixed to the suspension member 2 via a fixing member 9.
If the support shaft 8 is attached so that the corners of the rectangular portion 8a face downward, the drainage of the plating liquid when the support shaft 8 is pulled up from the plating bath 3 can be improved. A central hole 11 is formed at the center of the rotation holding plate 7 so as to be rotatably fitted to the support shaft 8 via a slide bearing 10, and a tooth portion 12 is provided at the outer peripheral portion of the rotation holding plate 7. . In order to drive the rotation holding plate 7 to rotate, a transmission gear 13 meshing with a tooth portion 12 of the rotation holding plate 7 is rotatably attached to the suspension member 2 via a shaft 14, and the transmission gear 13 is rotated. A drive gear 17 mounted on the drive shaft 16 of the drive motor 15 is meshed with the drive gear 17.

【0010】上記対向する回転保持板7間に被処理体で
ある中心に穴を有しない複数枚のディスクDを間隔をお
いて回転可能に支持するために、回転保持板7間にはそ
の内周側に位置してディスクDと外接する第一支持軸1
8と、外周側に位置してディスクDと外接する第二支軸
19とが横架されて回転可能に支持されている。この場
合、第一支持軸18は回転保持板7の周方向に所定間隔
で複数本(実施例では4本)配置され、第二支持軸19
は隣り合う第一支持軸18の中間に位置するように回転
保持板7の周方向に所定間隔で複数本(図示例では4
本)配置されており、隣り合う2本の第一支持軸18と
その中間に位置する1本の第二支持軸19とによりディ
スクDが回転可能に支持されている。これら第一及び第
二支持軸18,19には軸方向に適宜間隔で複数枚のデ
ィスクDを垂直状に配列するための環状溝20が形成さ
れている。
In order to rotatably support a plurality of disks D having no hole at the center, which is an object to be processed, between the rotation holding plates 7 facing each other, the rotation holding plates 7 are rotatably supported between them. First support shaft 1 located on the circumferential side and circumscribing the disc D
8 and a second support shaft 19 located on the outer peripheral side and circumscribing the disk D are laterally supported rotatably. In this case, a plurality of first support shafts 18 (four in the embodiment) are arranged at a predetermined interval in the circumferential direction of the rotation holding plate 7, and a second support shaft 19 is provided.
Is a plurality (4 in the illustrated example) at a predetermined interval in the circumferential direction of the rotary holding plate 7 so as to be positioned between the adjacent first support shafts 18.
This is arranged, and the disc D is rotatably supported by two adjacent first support shafts 18 and one second support shaft 19 located in the middle thereof. An annular groove 20 for vertically arranging a plurality of disks D is formed on the first and second support shafts 18 and 19 at appropriate intervals in the axial direction.

【0011】また、ディスクDのセットを容易にするた
めに、両回転保持板7の対向する面の外周側には第二支
持軸19の端部を着脱可能に保持するための径方向外方
に開口した軸受溝21が設けられている。なお、実施例
では軸受溝21を有する軸受片22を回転保持板7の内
面に取付けて構成されているが、回転保持板7の内面に
周方向に沿った外周面を有する凸状部を形成し、この凸
状部に軸受溝21を形成するようにしてもよい。
Further, in order to facilitate the setting of the disk D, the outer sides of the opposite surfaces of the both rotation holding plates 7 are radially outwardly arranged to detachably hold the ends of the second support shafts 19. A bearing groove 21 having an opening is provided. In the embodiment, the bearing piece 22 having the bearing groove 21 is attached to the inner surface of the rotation holding plate 7, but the inner surface of the rotation holding plate 7 is formed with a convex portion having an outer circumferential surface along the circumferential direction. However, the bearing groove 21 may be formed in this convex portion.

【0012】上記回転保持板7の外周近傍には軸受溝2
1からの上記第二支持軸19の落下を防止するための環
状の脱落防止用ガイド23が軸受溝21の外側を囲繞す
るように配設され、このガイド23には斜め上方から軸
受溝21に対して第二支持軸19を出し入れするための
出入口24が形成されている。このガイド23は吊持部
材2に固定ピン25をもって固定されている。なお、ガ
イド23は少なくとも回転保持板7の下方部に配置され
ていればよく、その場合には回転保持板7の上方部広範
囲で支持軸21に対する第2支持軸19の出入れが可能
となる。また、上記斜め上方に開口する出入口24はガ
イド23の反対側にも形成してもよく、その場合一方を
入口とし、他方を出口としてもよい。
A bearing groove 2 is provided in the vicinity of the outer circumference of the rotation holding plate 7.
An annular drop-out prevention guide 23 for preventing the second support shaft 19 from falling from 1 is arranged so as to surround the outer side of the bearing groove 21, and the guide 23 extends from diagonally above to the bearing groove 21. On the other hand, an inlet / outlet 24 for inserting / removing the second support shaft 19 is formed. The guide 23 is fixed to the suspension member 2 with a fixing pin 25. It is sufficient that the guide 23 is disposed at least in the lower part of the rotation holding plate 7, and in that case, the second support shaft 19 can be inserted into and removed from the support shaft 21 in a wide range of the upper part of the rotation holding plate 7. . Further, the entrance / exit 24 that opens obliquely upward may be formed on the opposite side of the guide 23, and in that case, one may be the entrance and the other may be the exit.

【0013】一方、上記回転保持板7の回転中心部には
固定車26が設けられ、上記第一支持軸18には上記固
定車26と接して回転する従動車27が設けられてい
る。この場合、固定車26として上記一方の支軸8の内
端部には固定歯車が一体形成され、従動車27として第
一支持軸18には固定歯車と噛合する従動歯車が装着さ
れている。したがって、回転保持板7が回転すると、従
動歯車27が固定歯車26の外周を転動して第一支持軸
18が回転し、その第一支持軸18の回転がディスクD
に伝達され、ディスクDが自転しつつ公転することにな
る。なお、固定車26及び従動車27は必ずしも歯車で
ある必要はなく、例えば摩擦車であってもよい。
On the other hand, a fixed wheel 26 is provided at the center of rotation of the rotation holding plate 7, and a driven wheel 27 that rotates in contact with the fixed wheel 26 is provided on the first support shaft 18. In this case, as the fixed wheel 26, a fixed gear is integrally formed on the inner end portion of the one support shaft 8, and as the driven wheel 27, the first support shaft 18 is equipped with the driven gear that meshes with the fixed gear. Therefore, when the rotation holding plate 7 rotates, the driven gear 27 rolls on the outer circumference of the fixed gear 26 to rotate the first support shaft 18, and the rotation of the first support shaft 18 causes the disk D to rotate.
And the disk D revolves around its own axis. The fixed wheel 26 and the driven wheel 27 do not necessarily have to be gears, but may be, for example, friction wheels.

【0014】次に、以上のように構成された表面処理装
置の動作態様について説明する。まず、回転保持板7上
の軸受溝21をガイド23の出入口24に位置させて隣
り合う第一支持軸18上にディスクDを並べて載置し、
第2支持軸19をガイド23の出入口24から上記軸受
溝21に落し込むように入れる。回転保持板7を所定角
度(90°)回転しては上記のようにディスクDと第二
支持軸19のセットを行う。
Next, an operation mode of the surface treatment apparatus configured as described above will be described. First, the bearing groove 21 on the rotation holding plate 7 is located at the entrance / exit 24 of the guide 23, and the disks D are placed side by side on the adjacent first support shafts 18,
The second support shaft 19 is inserted from the inlet / outlet 24 of the guide 23 into the bearing groove 21. After rotating the rotary holding plate 7 by a predetermined angle (90 °), the disk D and the second support shaft 19 are set as described above.

【0015】このようにしてディスクDをセットしたも
のを図示しない搬送機構によって洗浄槽あるいは所定の
薬品槽に浸漬して前処理を行った後、メッキ槽3の上方
へ移動する。そして、吊持部材2を下降させてディスク
Dをメッキ槽3内のメッキ液4中に浸漬した後、駆動モ
ータ15を駆動すると、その回転が伝達歯車13を介し
て回転保持板7に伝達され、回転保持板7が垂直方向に
回転する。この回転保持板7の回転に伴って固定歯車2
6上を転動する従動歯車27を介して第一支持軸18が
回転し、第一支持軸18の回転によりディスクDが回転
する。したがって、ディスクDは自転しつつ公転してメ
ッキ液4中を移動するので、ディスクDの表面に均一な
膜厚のメッキを迅速に施すことができる。なお、ディス
クDの公転中、ディスクDが第一支持軸18の下方に位
置したときには第一支持軸18とディスクDとの間に隙
間が生じてディスクDが一時的に自転し難くなるが、処
理上問題はない。
The disk D thus set is immersed in a cleaning tank or a predetermined chemical tank by a transport mechanism (not shown) for pretreatment, and then moved above the plating tank 3. Then, when the drive motor 15 is driven after the suspension member 2 is lowered to immerse the disk D in the plating solution 4 in the plating tank 3, the rotation is transmitted to the rotation holding plate 7 via the transmission gear 13. The rotation holding plate 7 rotates in the vertical direction. As the rotation holding plate 7 rotates, the fixed gear 2
The first support shaft 18 rotates via the driven gear 27 that rolls on the drive shaft 6, and the rotation of the first support shaft 18 causes the disk D to rotate. Therefore, since the disk D revolves around and revolves in the plating solution 4, the surface of the disk D can be rapidly plated with a uniform film thickness. While the disk D is revolving, when the disk D is positioned below the first support shaft 18, a gap is created between the first support shaft 18 and the disk D, so that the disk D is temporarily hard to rotate. There is no problem in processing.

【0016】このようにして、メッキ処理が行われた
後、吊持部材2がメッキ槽3から引き上げられ、次の処
理工程へ搬送される。なおこの際、吊持部材2の下端面
に設けられた傾斜面2aによってメッキ槽3から吊持部
材が引き上げられるときのメッキ液の液切れを良好にす
ることができる。そして、最終処理が施された後、上述
した手順とは逆の手順で第二支持軸19及びディスクD
が取外される。
After the plating process is performed in this manner, the suspension member 2 is pulled up from the plating tank 3 and conveyed to the next processing step. At this time, the slanted surface 2a provided on the lower end surface of the suspension member 2 can make the plating solution drain well when the suspension member is pulled up from the plating tank 3. Then, after the final processing is performed, the second support shaft 19 and the disk D are reversed by the procedure reverse to the above-mentioned procedure.
Is removed.

【0017】図3はこの発明の第二実施例を示してい
る。この第二実施例の表面処理装置は、上記第一実施例
のディスクよりも直径の小さいディスクDをセットする
ように構成されている。すなわち、上記第一実施例では
第二支持軸19が隣り合う第一支持軸18の中間に配置
されているのに対し、この第二実施例では第二支持軸1
9が第一支持軸18と半径方向で対向する位置に配置さ
れている。したがって、その第二支持軸19の位置に軸
受溝21が配設されている(図示省略)。
FIG. 3 shows a second embodiment of the present invention. The surface treatment apparatus of the second embodiment is configured to set a disc D having a diameter smaller than that of the disc of the first embodiment. That is, in the first embodiment, the second support shaft 19 is arranged in the middle of the adjacent first support shafts 18, whereas in the second embodiment, the second support shaft 1 is provided.
9 is arranged at a position facing the first support shaft 18 in the radial direction. Therefore, the bearing groove 21 is arranged at the position of the second support shaft 19 (not shown).

【0018】また、両回転保持板7間には第一及び第二
支持軸18,19間に支持されるディスクDの両側部を
支持するように第三支持軸28が横架されて回転可能に
支持されており、上記第一実施例ではディスクが3点で
支持されているのに対してこの第二実施例ではディスク
Dが4点で支持されている。なお、第二実施例におい
て、その他の部部は上記第一実施例と同じであるので、
同一部分に同一符号を付してその説明は省略する。
A third support shaft 28 is horizontally mounted between both rotation holding plates 7 so as to support both sides of the disk D supported between the first and second support shafts 18 and 19 and is rotatable. The disk is supported at three points in the first embodiment, whereas the disk D is supported at four points in the second embodiment. In the second embodiment, the other parts are the same as those in the first embodiment,
The same parts are designated by the same reference numerals and the description thereof will be omitted.

【0019】なお、上記実施例では、駆動モータ15か
ら歯車機構を介して回転保持板7に回転を伝達する場合
について説明したが、その手段は必ずしも歯車伝達機構
である必要はなく、例えばワイヤ等の索条を用いて回転
を行うようにしてもよい。また、上記実施例では、この
発明の表面処理装置を中心に穴を有しない円盤状の磁気
ディスクの無電解メッキ処理の場合について説明した
が、被処理体は必ずしも円盤状の磁気ディスクである必
要はなく、中心に穴を有するドーナツ状であってもよ
い。また、磁気ディスク以外のLDあるいはCD等の被
処理体のメッキ処理あるいはメッキ以外の表面処理にお
いても適用できることは勿論である。
In the above embodiment, the case where the rotation is transmitted from the drive motor 15 to the rotation holding plate 7 via the gear mechanism has been described. However, the means is not necessarily a gear transmission mechanism, for example, a wire or the like. You may make it rotate using the cord of. Further, in the above embodiment, the case of the electroless plating treatment of the disk-shaped magnetic disk having no hole centering on the surface treatment apparatus of the present invention has been described, but the object to be processed is not necessarily a disk-shaped magnetic disk. Alternatively, it may have a donut shape having a hole in the center. Further, it is needless to say that the present invention can be applied to plating treatment of an object to be treated such as LD or CD other than the magnetic disk or surface treatment other than plating.

【0020】[0020]

【発明の効果】以上に説明したように、この発明の表面
処理装置によれば、上記のように構成されているので、
以下のような効果が得られる。
As described above, according to the surface treatment apparatus of the present invention, which is configured as described above,
The following effects can be obtained.

【0021】1)対峙する吊持部材の対向する面に回転
保持板を回転可能に設け、その回転保持板の内周側に被
処理体と外接する第一支持軸を設け、回転保持板の外周
側に径方向外方に開口して設けられた軸受溝に第2支持
軸を入れて上記第一支持軸と第二支持軸との間で被処理
体を支持するようにしたので、多数枚の被処理体のセッ
トを容易に行うことができる。
1) A rotation holding plate is rotatably provided on the facing surfaces of the facing suspension members, and a first support shaft circumscribing the object to be processed is provided on the inner peripheral side of the rotation holding plate. Since the second support shaft is inserted in the bearing groove provided radially outward on the outer peripheral side to support the object to be processed between the first support shaft and the second support shaft, a large number are provided. It is possible to easily set the objects to be processed.

【0022】2)回転保持板の回転中心部に固定車を設
け、第一支持軸に上記固定車と接して回転する従動車を
設けたので、回転保持板の回転に伴って被処理体が処理
液中を自転しつつ公転移動するようになり、被処理体の
表面に均一な処理を迅速に施すことができ、処理能力の
向上が図れる。
2) Since the fixed wheel is provided at the center of rotation of the rotation holding plate and the driven wheel that rotates in contact with the fixed wheel is provided on the first support shaft, the object to be processed is rotated as the rotation holding plate rotates. As it revolves around the processing liquid while rotating, it is possible to rapidly perform uniform processing on the surface of the object to be processed and improve the processing capacity.

【0023】3)回転保持板の外周側に径方向外方に開
口して設けられた軸受溝で第2支持軸を受けて回転保持
板の少なくとも下部外周近傍に配設された落下防止用ガ
イドで第二支持軸を案内するようにしたので、スプリン
グで支持軸を保持するものと異なり、パーティクル等の
不純物の発生が少なく、被処理体への不純物の付着を減
少でき、歩留まりの向上が図れる。
3) A fall prevention guide disposed at least in the vicinity of the outer periphery of the lower portion of the rotary holding plate by receiving the second support shaft in a bearing groove provided on the outer peripheral side of the rotary holding plate and opening radially outward. Since the second support shaft is guided by means of, unlike the case where the support shaft is held by the spring, the generation of impurities such as particles is small, the adhesion of impurities to the object to be processed can be reduced, and the yield can be improved. .

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の表面処理装置の第一実施例の断面図
である。
FIG. 1 is a sectional view of a first embodiment of a surface treatment apparatus of the present invention.

【図2】図1のA−A断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】この発明の表面処理装置の第二実施例の断面図
である。
FIG. 3 is a sectional view of a second embodiment of the surface treatment apparatus of the present invention.

【図4】従来の表面処理装置の一例を示す概略断面図で
ある。
FIG. 4 is a schematic sectional view showing an example of a conventional surface treatment apparatus.

【符号の説明】[Explanation of symbols]

D ディスク(被処理体) 2 吊持部材 4 メッキ液(処理液) 7 回転保持板 18 第一支持軸 19 第二支持軸 21 軸受溝 23 落下防止用ガイド 26 固定車 27 従動車 D disk (object to be treated) 2 suspension member 4 plating liquid (treatment liquid) 7 rotation holding plate 18 first support shaft 19 second support shaft 21 bearing groove 23 fall prevention guide 26 fixed wheel 27 driven vehicle

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 対峙する吊持部材間に支持軸を横架し、
その軸方向に複数の被処理体を間隔をおいて垂直状に支
持して処理液内に浸漬することにより、上記被処理体の
表面を処理する表面処理装置において、 上記吊持部材の対向する面に回転保持板を回転可能に設
け、 上記回転保持板の内周側に被処理体と外接する第一支持
軸を回転可能に支持すると共に、 上記回転保持板の外周側に被処理体と外接する第二支持
軸を保持する径方向外方に開口した軸受溝を設け、 上記回転保持板の少なくとも下部外周近傍に上記第二支
持軸の落下防止用ガイドを配設し、 上記回転保持板の回転中心部に固定車を設けると共に、 上記第一支持軸に上記固定車と接して回転する従動車を
設けたことを特徴とする表面処理装置。
1. A support shaft is laterally mounted between facing suspension members,
In a surface treatment apparatus for treating the surface of the object to be treated by vertically supporting a plurality of objects to be treated in the axial direction at intervals and immersing the object in the treatment liquid, the suspension members face each other. A rotation holding plate is rotatably provided on the surface, and a first support shaft circumscribing the object to be processed is rotatably supported on the inner peripheral side of the rotation holding plate, and the object to be processed is provided on the outer peripheral side of the rotation holding plate. A bearing groove is provided which is open outward in the radial direction to hold the circumscribing second support shaft, and a fall prevention guide for the second support shaft is provided at least near the lower outer periphery of the rotation holding plate. A surface treatment apparatus, wherein a fixed wheel is provided at the center of rotation of the vehicle, and a driven wheel that rotates in contact with the fixed wheel is provided on the first support shaft.
JP9366893A 1993-03-29 1993-03-29 Surface treatment equipment Expired - Lifetime JP2877218B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9366893A JP2877218B2 (en) 1993-03-29 1993-03-29 Surface treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9366893A JP2877218B2 (en) 1993-03-29 1993-03-29 Surface treatment equipment

Publications (2)

Publication Number Publication Date
JPH06280037A true JPH06280037A (en) 1994-10-04
JP2877218B2 JP2877218B2 (en) 1999-03-31

Family

ID=14088786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9366893A Expired - Lifetime JP2877218B2 (en) 1993-03-29 1993-03-29 Surface treatment equipment

Country Status (1)

Country Link
JP (1) JP2877218B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005336612A (en) * 2004-05-26 2005-12-08 Komag Inc Method and apparatus for applying voltage to substrate during plating
CN100355936C (en) * 1998-10-02 2007-12-19 株式会社新王磁材 Surface treatment method and surface treatment apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100355936C (en) * 1998-10-02 2007-12-19 株式会社新王磁材 Surface treatment method and surface treatment apparatus
JP2005336612A (en) * 2004-05-26 2005-12-08 Komag Inc Method and apparatus for applying voltage to substrate during plating

Also Published As

Publication number Publication date
JP2877218B2 (en) 1999-03-31

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