JPH06278039A - Abrasive film - Google Patents
Abrasive filmInfo
- Publication number
- JPH06278039A JPH06278039A JP9497193A JP9497193A JPH06278039A JP H06278039 A JPH06278039 A JP H06278039A JP 9497193 A JP9497193 A JP 9497193A JP 9497193 A JP9497193 A JP 9497193A JP H06278039 A JPH06278039 A JP H06278039A
- Authority
- JP
- Japan
- Prior art keywords
- abrasive
- polishing
- film
- polishing film
- roll
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】磁気ヘッドの表面研磨加工に使用
される研磨フィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing film used for polishing the surface of a magnetic head.
【0002】[0002]
【従来技術】磁気ヘッドは、記録再生時に記録メディア
と接触しているため、ヘッド形状及び仕上げ面精度が摺
動特性及び磁気特性に関与し、表面研磨加工が性能に大
きく寄与している。従来の磁気ヘッド用研磨フィルム
は、研磨精度を向上させるため、仕上げ工程において
は、通常、酸化アルミニウム、シリコンカーバイド等の
3μm以下の砥粒が用いられ、結合剤としてのバインダ
ー樹脂を選択し、これらの混合割合により研磨フィルム
の加工性能を制御している。2. Description of the Related Art Since a magnetic head is in contact with a recording medium at the time of recording and reproducing, the head shape and finish surface accuracy are involved in sliding characteristics and magnetic characteristics, and surface polishing processing greatly contributes to performance. In the conventional polishing film for magnetic head, in order to improve the polishing accuracy, in the finishing step, usually abrasive grains of 3 μm or less such as aluminum oxide and silicon carbide are used, and a binder resin as a binder is selected. The processing performance of the polishing film is controlled by the mixing ratio of.
【0003】[0003]
【発明が解決しようとする課題】磁気ヘッド用研磨フィ
ルムは、通常、ロール状で使用するため、スリット時の
巻き取りテンションにより、外周部と内周部でフィルム
に作用する圧力に差が生じ、内周側でバインダー樹脂中
に研磨材が沈み込み(目潰れ)、研磨フィルムの表面粗
さが低下し、ロール内周部で加工性能が変化する現象が
発生し、製造時における大きな問題となっていた。Since the polishing film for a magnetic head is usually used in the form of a roll, the pressure applied to the film at the outer peripheral portion and the inner peripheral portion differs due to the winding tension at the time of slitting. Abrasive material sinks into the binder resin on the inner circumference side (blinds), the surface roughness of the polishing film decreases, and the processing performance changes at the inner circumference of the roll, which is a major problem during manufacturing. Was there.
【0004】[0004]
【課題を解決するための手段】本発明により、従来の研
磨層に加工性能を低下させない為に、研磨材と同等かそ
れ以下の粒度からなる球状粒子を添加することによりロ
ール内外周で加工性能が変化しない研磨フィルムが構成
される。According to the present invention, in order to prevent the processing performance from deteriorating in a conventional polishing layer, by adding spherical particles having a particle size equal to or smaller than that of the polishing material, the processing performance at the inner and outer circumferences of the roll can be improved. A polishing film is formed that does not change.
【0005】すなわち、本発明はポリエステル基材上に
研磨層を形成してなる研磨フィルムにおいて、研磨層に
球状粒子が添加されたことを特徴とする磁気ヘッドの研
磨フィルムである。That is, the present invention is a polishing film for a magnetic head, wherein a polishing film is formed by forming a polishing layer on a polyester substrate, and spherical particles are added to the polishing layer.
【0006】研磨材としては、研磨精度を上げるために
平均粒径0.4〜3μmのものを使用する。研磨材の材
料は、アルミナ、シリコンカーバイド、ダイヤモンド、
ジルコニア、酸化鉄、酸化クロム粉等から選択できる。
一方、球状粒子は、研磨材の粒度と同等以下の粒度のも
のを使用する。余り大きいと研磨不良を生じる。余り小
さいとロール内周部で目潰れを生じる。球状粒子の添加
量は研磨材に対し3〜5wt%の範囲で使用すれば十分
に所期の効果を得ることができる。余り少ないと効果が
なく、多過ぎると研磨材の量が減少して研磨不良とな
る。球状粒子の材料としては、セラミックス、ガラス、
ポリマービーズから選択する。これらの研磨材と球状粒
子は熱可塑性樹脂或いは熱硬化性樹脂等のバインダ樹脂
と混合し、ポリエステルフィルムに塗布される。研磨層
の厚さが10〜20μmの範囲が適当である。As the polishing material, one having an average particle diameter of 0.4 to 3 μm is used in order to improve polishing accuracy. Abrasive materials are alumina, silicon carbide, diamond,
It can be selected from zirconia, iron oxide, chromium oxide powder and the like.
On the other hand, the spherical particles have a particle size equal to or smaller than the particle size of the abrasive. If it is too large, polishing failure will occur. If it is too small, the inner circumference of the roll will be crushed. If the addition amount of the spherical particles is within the range of 3 to 5 wt% with respect to the abrasive, the desired effect can be sufficiently obtained. If it is too small, there is no effect, and if it is too large, the amount of abrasive material decreases, resulting in poor polishing. Materials for spherical particles include ceramics, glass,
Select from polymer beads. These abrasives and spherical particles are mixed with a binder resin such as a thermoplastic resin or a thermosetting resin and applied to a polyester film. It is suitable that the polishing layer has a thickness of 10 to 20 μm.
【0007】[0007]
【作用】研磨層のバインダー樹脂中の粉体の比率を球状
粒子の添加により増加させると、ロール内周部でのバイ
ンダー樹脂中への研磨材の沈み込み(目潰れ)を回避
し、ロール内で均一な加工性能が得られることが確認さ
れた。When the ratio of the powder in the binder resin in the polishing layer is increased by adding the spherical particles, sinking (blinding) of the abrasive into the binder resin at the inner peripheral portion of the roll is avoided and the inside of the roll is prevented. It was confirmed that uniform processing performance could be obtained.
【0008】[0008]
【実施例】以下に本発明の実施例について説明する。 実施例1 平均粒径2μmのAl2 O3 、SiC(昭和電工(株)
製)、ポリマービーズ平均粒径0.4μm(日本触媒
(株)製)、熱可塑性樹脂及び溶剤をサンドミルにより
均一に分散し塗料化し、ポリエステル基材上に研磨層が
10〜20μmになる様に塗布厚を調整し、多層均一構
造の研磨層を有する研磨フィルムを得た。 研磨塗料組成 研磨材 100重量部 バインダー樹脂 29重量部 ポリマービーズ 3重量部 溶剤 100重量部EXAMPLES Examples of the present invention will be described below. Example 1 Al 2 O 3 and SiC (Showa Denko KK) having an average particle size of 2 μm
Manufactured by Nippon Shokubai Co., Ltd., a thermoplastic resin and a solvent are uniformly dispersed in a sand mill to form a paint, so that the polishing layer has a thickness of 10 to 20 μm on the polyester substrate. The coating thickness was adjusted to obtain a polishing film having a polishing layer having a multi-layered uniform structure. Abrasive coating composition Abrasive material 100 parts by weight Binder resin 29 parts by weight Polymer beads 3 parts by weight Solvent 100 parts by weight
【0009】実施例2 実施例1と同様の操作でAl2 O3 (平均粒径2μm)
に対し、ポリマービーズが1,5,10wt%となる様
に塗料を調整し、塗布厚10〜20μmの多層均一構造
の研磨フィルムを得た。 研磨塗料組成 研磨材 100重量部 バインダー樹脂 29重量部 ポリマービーズ 1,5,10重量部 溶剤 100重量部Example 2 Al 2 O 3 (average particle size 2 μm) was prepared in the same manner as in Example 1.
On the other hand, the coating material was adjusted so that the polymer beads were 1, 5, 10 wt% to obtain a polishing film having a multi-layered uniform structure with a coating thickness of 10 to 20 μm. Abrasive coating composition Abrasive material 100 parts by weight Binder resin 29 parts by weight Polymer beads 1,5,10 parts by weight Solvent 100 parts by weight
【0010】実施例3 実施例2と同様の操作で、Al2 O3 (平均粒径2μ
m)に対し、平均粒径2.5μmのポリマービーズを重
量比で3wt%になるように添加し、添加粒子粒度の異
なる多層均一構造の研磨フィルムを得た。Example 3 By the same operation as in Example 2, Al 2 O 3 (average particle size 2 μm
m), polymer beads having an average particle diameter of 2.5 μm were added so as to have a weight ratio of 3 wt%, to obtain a polishing film having a multi-layered uniform structure having different added particle sizes.
【0011】実施例4 実施例1,2,3で得られた研磨フィルムを12.7m
m幅、長さ200mにスリット加工し、ロール状の研磨
フィルムを作製した。この研磨フィルムを室温放置で9
0日放置したもの及び卓上型温湿度試験器(ジュニア−
JTH型 ETAC ENGNEERRING.CO.
LTD.)50℃90%の条件で5,10,15日間温
湿度試験を実施し(但し、実施例3については、15日
のみとした)、研磨フィルムの外周部、中心部(100
m)及び内周部をサンプリングし、走査型電子顕微鏡
(日立製作所製、S−570型)により、研磨層表面状
態の測定を行って、表1の結果を得た。Example 4 The polishing films obtained in Examples 1, 2 and 3 were used for 12.7 m.
Slit processing was performed to a width of m and a length of 200 m to produce a roll-shaped polishing film. Leave this polishing film at room temperature for 9
One left for 0 days and tabletop temperature and humidity tester (Junior-
JTH type ETAC ENGENERING. CO.
LTD. ) A temperature / humidity test was carried out at 50 ° C. and 90% for 5, 10 and 15 days (however, in Example 3, only 15 days), and the outer peripheral portion and the central portion (100
m) and the inner peripheral portion were sampled, and the surface state of the polishing layer was measured with a scanning electron microscope (S-570, manufactured by Hitachi Ltd.) to obtain the results shown in Table 1.
【0012】[0012]
【表1】 [Table 1]
【0013】実施例5 実施例1,2,3で室温放置90日後のロール状(1
2.7mm幅、200m長さ)の研磨フィルムでフレキ
シブルディスクヘッド加工実験を実施し、被研磨物の表
面形状評価を行って、表2の結果を得た。Example 5 In Examples 1, 2 and 3, rolls (1
A flexible disk head processing experiment was carried out with a polishing film having a width of 2.7 mm and a length of 200 m, and the surface shape of the object to be polished was evaluated.
【0014】[0014]
【表2】 [Table 2]
【0015】比較例 平均粒径2μmのAl2 O3 、SiC(昭和電工(株)
製)の研磨材を球状粒子を添加しない系で同一組成で分
散、塗布し、幅12.7mm、長さ200mのサンプル
テープを作成した。これを実施例4と同一の温湿度試験
を実施し、走査型電子顕微鏡にて研磨層表面観察を行っ
た。表3の結果を得た。Comparative Example Al 2 O 3 and SiC (Showa Denko KK) with an average particle size of 2 μm
The abrasives of No. 1) were dispersed and applied with the same composition in a system in which spherical particles were not added to prepare a sample tape having a width of 12.7 mm and a length of 200 m. This was subjected to the same temperature and humidity test as in Example 4, and the polishing layer surface was observed with a scanning electron microscope. The results shown in Table 3 were obtained.
【0016】[0016]
【表3】 [Table 3]
【0017】[0017]
【発明の効果】上記表1、表2、表3の結果より、本発
明で得られた磁気ヘッドの加工用研磨フィルムにおい
て、球状粒子を研磨材に対して少量、好ましくは3〜5
wt%添加することによって、ロール内周部で目潰れ、
目詰まりを発生させることなく、ロール内で表面性が均
一に制御され、加工性能のバラツキを無くすことを可能
にした。From the results of Table 1, Table 2 and Table 3 above, in the polishing film for processing a magnetic head obtained in the present invention, a small amount of spherical particles, preferably 3 to 5 relative to the abrasive is used.
By adding wt%, the inner circumference of the roll is crushed,
The surface property is uniformly controlled within the roll without causing clogging, and it has become possible to eliminate variations in processing performance.
Claims (7)
ルムにおいて研磨層に球状粒子が添加されたことを特徴
とする研磨フィルム。1. A polishing film having a polishing layer formed on a substrate, wherein spherical particles are added to the polishing layer.
状粒子粒度は、研磨材の粒度と同等かそれ以下の請求項
1の研磨フィルム。2. The polishing film according to claim 1, wherein the abrasive has an average particle size of 0.4 to 3 μm and the spherical particle size is equal to or smaller than the particle size of the abrasive.
ド、ダイヤモンド、ジルコニア、酸化鉄、酸化クロム粉
等からなる請求項1からなる研磨フィルム。3. The polishing film according to claim 1, wherein the polishing material is alumina, silicon carbide, diamond, zirconia, iron oxide, chromium oxide powder or the like.
ある請求項1の研磨フィルム。4. The polishing film according to claim 1, wherein the thickness of the polishing layer is in the range of 10 to 20 μm.
硬化性樹脂である請求項1の研磨フィルム。5. The polishing film according to claim 1, wherein the binder resin is a thermoplastic resin or a thermosetting resin.
リマービーズからなる請求項1の研磨フィルム。6. The polishing film according to claim 1, wherein the spherical particles are made of ceramics, glass or polymer beads.
〜5wt%の範囲の請求項1の研磨フィルム。7. The amount of spherical particles added is 3 with respect to the abrasive.
The polishing film according to claim 1, which is in the range of ˜5 wt%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP09497193A JP3201870B2 (en) | 1993-03-31 | 1993-03-31 | Polishing film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP09497193A JP3201870B2 (en) | 1993-03-31 | 1993-03-31 | Polishing film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06278039A true JPH06278039A (en) | 1994-10-04 |
JP3201870B2 JP3201870B2 (en) | 2001-08-27 |
Family
ID=14124806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP09497193A Expired - Lifetime JP3201870B2 (en) | 1993-03-31 | 1993-03-31 | Polishing film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3201870B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001353662A (en) * | 2000-06-09 | 2001-12-25 | Xebec Technology Co Ltd | Polishing material, and method of polishing surface of multilayer wiring board using this polishing material |
JP2002254323A (en) * | 2001-02-26 | 2002-09-10 | Dainippon Printing Co Ltd | Abrasive film and manufacturing method therefor |
JP5084504B2 (en) * | 2005-05-11 | 2012-11-28 | 株式会社松風 | Dental abrasive containing spherical resin particles |
JP2018506380A (en) * | 2015-02-27 | 2018-03-08 | スリーエム イノベイティブ プロパティズ カンパニー | Washing articles for consumption having ceramic fine particles and method for producing the same |
-
1993
- 1993-03-31 JP JP09497193A patent/JP3201870B2/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001353662A (en) * | 2000-06-09 | 2001-12-25 | Xebec Technology Co Ltd | Polishing material, and method of polishing surface of multilayer wiring board using this polishing material |
JP2002254323A (en) * | 2001-02-26 | 2002-09-10 | Dainippon Printing Co Ltd | Abrasive film and manufacturing method therefor |
JP5084504B2 (en) * | 2005-05-11 | 2012-11-28 | 株式会社松風 | Dental abrasive containing spherical resin particles |
JP2018506380A (en) * | 2015-02-27 | 2018-03-08 | スリーエム イノベイティブ プロパティズ カンパニー | Washing articles for consumption having ceramic fine particles and method for producing the same |
Also Published As
Publication number | Publication date |
---|---|
JP3201870B2 (en) | 2001-08-27 |
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