JPS63185579A - Polishing tape - Google Patents

Polishing tape

Info

Publication number
JPS63185579A
JPS63185579A JP1545587A JP1545587A JPS63185579A JP S63185579 A JPS63185579 A JP S63185579A JP 1545587 A JP1545587 A JP 1545587A JP 1545587 A JP1545587 A JP 1545587A JP S63185579 A JPS63185579 A JP S63185579A
Authority
JP
Japan
Prior art keywords
polishing
abrasive
polished
tape
magnetic head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1545587A
Other languages
Japanese (ja)
Other versions
JP2527320B2 (en
Inventor
Nobutaka Yamaguchi
信隆 山口
Masaaki Fujiyama
正昭 藤山
Hideaki Kosha
秀明 古謝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP62015455A priority Critical patent/JP2527320B2/en
Publication of JPS63185579A publication Critical patent/JPS63185579A/en
Application granted granted Critical
Publication of JP2527320B2 publication Critical patent/JP2527320B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To prevent the formation of scratch flaws on a polished surface by using the polycrystalline diamond as polishing agent. CONSTITUTION:The polished surface (tape sliding surface) of a polished article 4 is finely polished by the hard particulate polishing agent 3 projecting from a polishing layer 2. In this case, polycrystalline diamond is used as the polishing agent 3, and since the shape of the polycrystalline diamond is thickset, formation of scratch flaws on the polished surface is prevented, and the polished surface call be finishing-polished finely.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、磁気ヘッド等の研磨に用いる研磨テープに関
し、とくに仕上げ研磨用として好適な研磨テープに関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a polishing tape used for polishing magnetic heads, etc., and particularly to a polishing tape suitable for final polishing.

(従来の技術) 従来から研磨剤として酸化クロム、酸化アルミニウム、
炭化ケイ素等を使用した研磨テープが知られている。こ
のような研磨テープは、その研磨剤の硬度がモース硬度
8.5.9.9.5と硬く研磨能力に優れていることか
ら、例えば砥石で仕上げたビデオヘッドの粗研磨用や仕
上研磨用として好んで使用されている。
(Conventional technology) Chromium oxide, aluminum oxide,
Polishing tapes using silicon carbide or the like are known. This type of polishing tape has an abrasive agent with a hardness of 8.5.9.9.5 on the Mohs scale and has excellent polishing ability, so it is used for rough polishing and final polishing of video heads finished with a grindstone, for example. It is preferred to be used as

しかしながら、磁気ヘッドは各種の素材(例えばフェラ
イトとガラス、センダストとガラス)から一体として成
ったものであり、各素材の硬度が異なるため、研磨テー
プ中の研磨剤の各素材に対する研磨能力が異なることと
なる。このことによる弊害として各素材(以下部材と称
する)の境界部で凹凸の段差がつく場合がある。
However, magnetic heads are integrally made of various materials (for example, ferrite and glass, sendust and glass), and because each material has a different hardness, the polishing ability of the abrasive in the polishing tape for each material differs. becomes. This may cause an adverse effect that uneven steps may be formed at the boundaries between the materials (hereinafter referred to as members).

この対策として、研磨剤の硬度を上げて、研磨剤と被研
磨物との硬度差を大きくする方法がある。
As a countermeasure to this problem, there is a method of increasing the hardness of the abrasive to increase the difference in hardness between the abrasive and the object to be polished.

例えばやや高価となるが天然ダイアモンドを研磨剤とし
て使用するとこの点は解決される。しかしながらこの場
合は磁気ヘッドに傷がついてしまうという欠点がある。
For example, this problem can be solved by using natural diamond as an abrasive, although it is somewhat expensive. However, this case has the disadvantage that the magnetic head may be damaged.

そこで段差のつかない良好な性能を有すると共にそれら
の被研磨面に殆んど傷を付けることなく精密研磨が可能
な仕上げ研磨用の研磨テープが望まれている。
Therefore, there is a need for a polishing tape for final polishing that has good performance without forming any steps and is capable of precision polishing with almost no scratches on the surface to be polished.

(発明の目的) 本発明は、上記事情に鑑み、磁気ヘッドを形成している
各部材を均一に研磨し、各部材間の境界部に凹凸の段差
がなく、かつその磁気ヘッド面に殆んど償をつけること
なく精密研磨可能な仕上げ研磨用の研磨テープの提供を
目的とするものである。
(Object of the Invention) In view of the above circumstances, the present invention has been developed by uniformly polishing each member forming a magnetic head, so that there is no unevenness step at the boundary between each member, and the magnetic head surface has almost no unevenness. The object of the present invention is to provide a polishing tape for final polishing that allows precision polishing without any cost.

(発明の構成) 本発明による研磨テープは、多結晶ダイアモンドを研磨
剤として含んで成ることを特徴とする。
(Structure of the Invention) The polishing tape according to the present invention is characterized in that it contains polycrystalline diamond as an abrasive.

この多結晶ダイアモンドは微細な結晶子が固く結合され
ており、全体に鋭利な角を持たず、ずんぐりした形であ
り、被研磨物にスリ傷がつきにくい。また、モース硬度
が10と極めて硬いので被研磨物との硬度差を大きくと
ることができ、被研磨物、例えば磁気ヘッドを形成して
いる各種部材の境界部に凹凸の段差がつかない。
This polycrystalline diamond has fine crystallites that are tightly bound together, and has a stubby shape with no sharp edges throughout, making it difficult to scratch the polished object. Furthermore, since it has a Mohs hardness of 10, which is extremely hard, it can have a large difference in hardness from the object to be polished, and does not form uneven steps at the boundaries between various members forming the object to be polished, for example, a magnetic head.

尚、ここでいう研磨テープとは、テープ状のものの他、
ディスク状のもの等を広く含むものとする。
In addition, the polishing tape mentioned here refers to tape-shaped ones as well as
This includes a wide range of disk-shaped objects.

(実 施 態 様) 以下、本発明の実施態様について詳細に説明する。(Implementation mode) Embodiments of the present invention will be described in detail below.

本発明の実施態様による研磨テープは、第1図に示すよ
うに可撓性を有する支持体1と、この支持体1上に形成
された研磨層2から構成されている。研磨層2は研磨剤
3と、結合剤(バインダ)と潤滑剤等を含む添加剤とを
混合して形成したものである。
A polishing tape according to an embodiment of the present invention is composed of a flexible support 1 and a polishing layer 2 formed on the support 1, as shown in FIG. The polishing layer 2 is formed by mixing the polishing agent 3 and additives including a binder, a lubricant, and the like.

かかる研磨テープは、その研磨層2を磁気ヘッド等の研
磨対象物の被研磨面に活動させることにより、該研磨層
2から突出した硬い粒子状の研磨剤3によって被研磨面
を平滑に研磨するものである。研磨態様の一例を第2図
に示す。図示のものは磁気ヘッド4のテープ摺動面を研
磨する場合であり、磁気ヘッド4を挾む2つの位置に配
されたリール(図示せず)の一方から他方へこの研磨テ
ープを定速で走行させて磁気ヘッド4に研磨112を摺
動させ、研磨層2表面から突出した硬い粒子状の研磨剤
3により、第3図に示す磁気へラド4のテープ摺動面(
被研磨面)を平滑に研磨する。
Such an abrasive tape polishes the abrasive layer 2 smoothly on the surface of an object to be polished, such as a magnetic head, using the hard particulate abrasive 3 protruding from the abrasive layer 2. It is something. An example of the polishing mode is shown in FIG. The illustrated case is for polishing the tape sliding surface of the magnetic head 4, and the polishing tape is moved at a constant speed from one reel (not shown) placed at two positions sandwiching the magnetic head 4 to the other. The abrasive 112 is caused to slide on the magnetic head 4 by running, and the hard particulate abrasive 3 protruding from the surface of the abrasive layer 2 polishes the tape sliding surface of the magnetic helad 4 shown in FIG.
(Surface to be polished) is polished smooth.

上記研磨剤3としては多結晶ダイアモンドが用いられて
いる。この研磨剤のサイズは仕上研磨用テープ用として
は3ミクロン以下にすると効果的で、好ましくは1ミク
ロン以下、また0、5〜0.01ミクロンとするのがさ
らに好ましい。この多結晶ダイアモンドは爆発法により
合成され、一定の方向性をもたない微細な結晶子が固く
結合されており、どの方向に対しても同じ強度を有する
。粒子はずんぐりとした形状であり、被研磨物の表面に
スリ傷がつきにくい。
As the polishing agent 3, polycrystalline diamond is used. The size of this abrasive is effectively 3 microns or less for final polishing tapes, preferably 1 micron or less, and more preferably 0.5 to 0.01 microns. This polycrystalline diamond is synthesized by the explosive method, and has fine crystallites that have no fixed directionality and are tightly bound together, so it has the same strength in any direction. The particles have a stubby shape and are less likely to scratch the surface of the object to be polished.

前記研磨剤3を結合させる結合剤は研磨剤を分散させる
効果の高いもの(例えばニトロセルロース、塩化ビニル
系樹脂等)や支持体への密着ノコの強いもの(例えばポ
リエステル樹脂)が好ましい。
The binder for binding the abrasive 3 is preferably one that is highly effective in dispersing the abrasive (for example, nitrocellulose, vinyl chloride resin, etc.) or one that has strong adhesion to the support (for example, polyester resin).

研磨剤は十分に分散する必要があり、分子I1mとしで
はアトライター、ボールミル、サンドグラインダー等が
好適であるが、加圧ニーダ−、オープン    ′ニー
ダー1三本ロール等の混練機を併用するとさらによい。
The abrasive must be sufficiently dispersed, and for molecular I1m, attritor, ball mill, sand grinder, etc. are suitable, but it is even better to use a kneader such as pressure kneader, open kneader, 13 rolls, etc. .

また、前記結合剤のほか、研磨層2の潤滑性をよくする
潤滑剤や、分散剤、帯電防止剤等の添加剤を必要に応じ
て使用することができる。
In addition to the binder, additives such as a lubricant, a dispersant, and an antistatic agent that improve the lubricity of the polishing layer 2 can be used as necessary.

研磨剤としては本発明に使用する多結晶ダイアモンド以
外に他のものを合わせて含めることができる。それらは
モース硬度6以上のもので、酸化クロム、酸化アルミニ
ウム、炭化ケイ素が中でも好ましい。
In addition to the polycrystalline diamond used in the present invention, other abrasives may be included as the abrasive. They have a Mohs hardness of 6 or more, and chromium oxide, aluminum oxide, and silicon carbide are particularly preferred.

全研磨剤中の多結晶ダイアモンドの混合割合は重量で3
%〜100%と広い領域で使用できる。その割合が小さ
いと研削効果が小となる。またコストを重視する場合に
はその特性要求を満足する限りに於て、多結晶ダイアモ
ンドの使用量を少なくするこ、とができる。
The mixing ratio of polycrystalline diamond in the total polishing agent is 3 by weight.
It can be used in a wide range from % to 100%. If the ratio is small, the grinding effect will be small. Furthermore, when cost is important, the amount of polycrystalline diamond used can be reduced as long as the characteristics requirements are satisfied.

研磨剤100部に対する結合剤の合計量は5〜200部
、好ましくは10〜100部、特に好ましくは20〜8
0部である。これより小だと研磨剤の脱粒がおこりやす
く、大だと研磨能力が低下する。
The total amount of binder relative to 100 parts of abrasive is 5 to 200 parts, preferably 10 to 100 parts, particularly preferably 20 to 8 parts.
It is 0 copies. If it is smaller than this, the abrasive particles will easily come off, and if it is larger, the polishing ability will decrease.

前述した可撓性支持体1としては、例えばポリエチレン
テレフタレート(PET)、ポリエチレン−2,6−ナ
フタレート等から成る非磁性支持体が好適に使用される
As the above-mentioned flexible support 1, a non-magnetic support made of polyethylene terephthalate (PET), polyethylene-2,6-naphthalate or the like is preferably used.

研磨層2の厚みは、研磨対象物の形状、材質等に応じて
適宜に決定ずれば良いが、例えば研磨対象物が第2図の
如き磁気ヘッドの場合は、この厚みが厚すぎると磁気ヘ
ッド4と研磨テープとの接触が悪くなるので50μm以
下にするのがよく、好ましくは1〜10μm1より好ま
しくは2〜5μmである。
The thickness of the polishing layer 2 may be determined appropriately depending on the shape, material, etc. of the object to be polished. For example, if the object to be polished is a magnetic head as shown in Fig. 2, if the thickness is too thick, the magnetic head will Since the contact between the polishing tape and the polishing tape becomes poor, the thickness is preferably 50 μm or less, preferably 1 to 10 μm, more preferably 2 to 5 μm.

また、この研磨テープにおいては、研磨12の表面粗さ
Raすなわち中心線平均粗さが0.01〜0.20であ
るのが好ましく、0.03〜0.15ざらには00OS
〜0.10であれば仕上研磨用としてより好ましい。R
aが0.01より小であると研磨能力が不充分となり、
0.20より大であると傷が付きやすくなるからである
。なお、上記Raはカットオフ (cut Off )
  0.8am、触針半径2μmR1触針スピード0.
3m/Secを条件としたときの数値である。
In addition, in this polishing tape, it is preferable that the surface roughness Ra of polishing 12, that is, the center line average roughness, is 0.01 to 0.20, more preferably 0.03 to 0.15, and 00OS
~0.10 is more preferable for final polishing. R
If a is smaller than 0.01, the polishing ability will be insufficient,
This is because if it is larger than 0.20, scratches will easily occur. In addition, the above Ra is cut off (cut Off)
0.8 am, stylus radius 2 μm R1 stylus speed 0.
This value is based on the condition of 3m/Sec.

つぎに実施例を挙げてさらに詳細に説明する。Next, a more detailed explanation will be given with reference to examples.

(実施例1) スチールボール1/4インチφを分散メディアとするア
トライターを使用して8時間分散させ1μmフィルター
でヂ過した下記組成の塗布液を12ミクロン厚のポリエ
ステルフィルム上に4ミクロン厚に塗布し、その後約1
.3CIR(1/ 2インチ)にスリットして研磨テー
プとなした。なお重ω部は、すべて固形分組成であられ
す。
(Example 1) A coating solution with the following composition, which was dispersed for 8 hours using an attritor with a 1/4 inch diameter steel ball as the dispersion media and passed through a 1 μm filter, was spread on a 12 μm thick polyester film with a thickness of 4 μm. and then about 1
.. It was slit into 3CIR (1/2 inch) to make an abrasive tape. The heavy ω part is all solid content.

塗布液組成 (比較例1) 前記実施例に対する比較例として、前記実施例1におい
て研磨剤を下記のように変更し、他は前記実施例1と同
様の方法で研磨テープを作った。
Coating Liquid Composition (Comparative Example 1) As a comparative example to the above example, an abrasive tape was prepared in the same manner as in Example 1 except that the abrasive was changed as shown below.

天然単結晶ダイアモンド(゛サイズ0.25ミクロン、
モース硬度10)         ・・・・・・30
0部(比較例2) 前記実施例に対する比較例として、前記実施例1におい
て研磨剤を下記のように変更し、他は前記実施例1と同
様の方法で研磨テープを作った。
Natural single crystal diamond (size 0.25 micron,
Mohs hardness 10) ...30
0 parts (Comparative Example 2) As a comparative example to the above example, an abrasive tape was prepared in the same manner as in Example 1 except that the abrasive was changed as shown below.

合成単結晶ダイアモンド(サイズ0.25ミクロン)モ
ース硬度10          ・・・・・・300
部(比較例3) 前記実施例に対する比較例として、前記実施例1におい
て研磨剤を下記のように変更し、他は実施例1と同様の
方法で研磨テープを作った。
Synthetic single crystal diamond (size 0.25 microns) Mohs hardness 10...300
Part (Comparative Example 3) As a comparative example to the above example, an abrasive tape was made in the same manner as in Example 1 except that the abrasive was changed as shown below.

CrzO3(サイズ0.25ミクロン)モース硬度8.
5          ・・−・・・300部(実施例
2) 前記実施例1において1ill磨剤を下記のように変更
し、他は前記実施例1と同様の方法で研磨テープを作っ
た。
CrzO3 (size 0.25 microns) Mohs hardness 8.
5...300 parts (Example 2) An abrasive tape was made in the same manner as in Example 1 except that the 1ill abrasive was changed as follows.

Cr2O3(サイズ0.25ミクロン)モース硬度8.
5          ・・・・・・270部多結晶ダ
イアモンド(サイズ0.25ミクロン、モース硬度10
)            ・・・・・・10部(実施
例3) 下記組成Aを加圧ニーダ−にて1時間混練したペースト
に、Cを加えて、アトライターで8時間分散処理した。
Cr2O3 (size 0.25 microns) Mohs hardness 8.
5...270 parts polycrystalline diamond (size 0.25 microns, Mohs hardness 10)
)...10 parts (Example 3) C was added to a paste prepared by kneading the following composition A in a pressure kneader for 1 hour, and the mixture was dispersed in an attritor for 8 hours.

そこへ硬化剤Bを加え1μmフィルターで5濾過した下
記組成の□□□布液を使用し、他は前記実施例1と同様
の方法で研磨テープを作った。
A polishing tape was prepared in the same manner as in Example 1 except that a cloth solution having the following composition, which had been prepared by adding curing agent B and filtering through a 1 μm filter, was used.

塗布液組成 各研磨テープを用いて第3図に示すようなフェライト5
とガラス6からなる表面を有するビデオ用磁気ヘッド4
を研磨し、研磨後におけるフェライトとガラス境界部7
の段差および表面傷を調べた。なお、この研磨試験は粒
子サイズ8μmの酸化アルミニウムを研磨剤とする研磨
テープを用いて粗研磨した後の磁気ヘッドを上記各研磨
テープで研磨したものである。また、上記各研磨テープ
について前述した条件における研磨層表面粗さRaを調
べた。それらの結果を第1表にまとめる。
Coating liquid composition Using each polishing tape, ferrite 5 as shown in Fig. 3 was applied.
A video magnetic head 4 having a surface made of glass 6 and
ferrite and glass boundary part 7 after polishing
The steps and surface scratches were investigated. In this polishing test, a magnetic head was roughly polished using a polishing tape containing aluminum oxide having a particle size of 8 μm as an abrasive, and then the magnetic head was polished with each of the above polishing tapes. Furthermore, the polishing layer surface roughness Ra of each of the above polishing tapes was examined under the conditions described above. The results are summarized in Table 1.

なお研磨時間は5秒間を基本としたが、比較例3は研磨
能力が劣るため60秒とした。実施例2は15秒で飽和
に達したため、15秒で実施した。
The polishing time was basically 5 seconds, but in Comparative Example 3, it was set to 60 seconds because the polishing ability was inferior. In Example 2, saturation was reached in 15 seconds, so the test was carried out in 15 seconds.

第  1  表 前記第1表において、段差については干渉顕微鏡でフェ
ライトとガラス境界部の干渉縞より、ON、OFF的に
有無と評価した。また磁気ヘッド表面の傷の本数は研磨
後の磁気ヘッド表面を顕微鏡で見て確認された幅2μm
以上の傷の本数(IW2μm以上の傷の本数10.5履
)である。
Table 1 In Table 1, the difference in level was evaluated as ON or OFF based on interference fringes at the boundary between ferrite and glass using an interference microscope. The number of scratches on the surface of the magnetic head is 2 μm in width, which was confirmed by looking at the surface of the magnetic head after polishing using a microscope.
The number of scratches is as follows (the number of scratches with an IW of 2 μm or more is 10.5 shoes).

第1表から、実施例1における磁気ヘッド表面傷は比較
例1〜2に比べて優れていることが分かる。また実施例
1に対して実施例3は分散を強化したためRaが小さく
研磨層表面が平滑的であることが認められ、表面傷もよ
り一層改良されている。また実施例2はダイアモンドの
使用量が少ないため、実施例1.3、比較例1.2に比
べて安価であり、段差の点で比較例3より優れている。
From Table 1, it can be seen that the magnetic head surface scratches in Example 1 are superior to those in Comparative Examples 1 and 2. Further, in comparison with Example 1, Example 3 had enhanced dispersion, so it was found that Ra was small and the surface of the polishing layer was smooth, and surface scratches were further improved. Further, since the amount of diamond used in Example 2 is small, it is cheaper than Example 1.3 and Comparative Example 1.2, and is superior to Comparative Example 3 in terms of level difference.

(発明の効果) 本発明による研磨テープは、酸化クロム、酸化アルミニ
ウム炭化ケイ素より硬いモース硬度10の多結晶ダイア
モンドを含んで成る研磨剤が研磨層に含有されているた
め、上記の結果から明らかなように、研削後の被研磨面
を構成する複数の素材間の段差がなくなる。またその形
状が、微細な結晶が固く結合され、ずんぐりとした形状
をしており、被研磨面へスリ傷をつけることがないとい
う特長を有する。よって粗研磨後に使用する仕上げ研磨
用研磨テープとして好適に使用することができる。
(Effects of the Invention) The polishing tape according to the present invention has an abrasive layer containing polycrystalline diamond, which has a Mohs hardness of 10 and is harder than chromium oxide and aluminum oxide silicon carbide. As a result, there are no differences in level between the plurality of materials that make up the surface to be polished after grinding. In addition, its shape is stubby, with fine crystals tightly bound together, and it has the feature of not scratching the surface to be polished. Therefore, it can be suitably used as a polishing tape for final polishing to be used after rough polishing.

【図面の簡単な説明】 第1図は本発明に係る研磨テープの一実施態様の断面図
、第2図は第1図に示す研磨テープを用いた磁気ヘッド
の研磨態様を示す図、第3図は磁気ヘッドのヘッドギャ
ップ近傍の表面部の構造を示す一部正面図である。 1・・・可撓性支持体 2・・・研  磨  層 3・・・研 磨 剤 4・・・磁気ヘッド 5・・・フェライト 6・・・ガラス 7・・・フェライト/ガラス境界 8・・・ヘッドギャップ
[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a sectional view of an embodiment of the abrasive tape according to the present invention, FIG. 2 is a diagram showing a mode of polishing a magnetic head using the abrasive tape shown in FIG. The figure is a partial front view showing the structure of the surface portion of the magnetic head near the head gap. 1... Flexible support 2... Polishing layer 3... Polishing agent 4... Magnetic head 5... Ferrite 6... Glass 7... Ferrite/glass boundary 8...・Head gap

Claims (1)

【特許請求の範囲】 1)研磨剤および結合剤を含む研磨層を可撓性支持体上
に塗設してなる研磨テープにおいて、前記研磨剤が多結
晶ダイアモンドを含むことを特徴とする研磨テープ。 2)前記研磨層表面の表面粗さが0.01〜0.20で
あることを特徴とする特許請求の範囲第1項記載の研磨
テープ。
[Scope of Claims] 1) An abrasive tape comprising an abrasive layer containing an abrasive and a binder coated on a flexible support, wherein the abrasive contains polycrystalline diamond. . 2) The polishing tape according to claim 1, wherein the polishing layer has a surface roughness of 0.01 to 0.20.
JP62015455A 1987-01-26 1987-01-26 Polishing tape Expired - Lifetime JP2527320B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62015455A JP2527320B2 (en) 1987-01-26 1987-01-26 Polishing tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62015455A JP2527320B2 (en) 1987-01-26 1987-01-26 Polishing tape

Publications (2)

Publication Number Publication Date
JPS63185579A true JPS63185579A (en) 1988-08-01
JP2527320B2 JP2527320B2 (en) 1996-08-21

Family

ID=11889276

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62015455A Expired - Lifetime JP2527320B2 (en) 1987-01-26 1987-01-26 Polishing tape

Country Status (1)

Country Link
JP (1) JP2527320B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04250979A (en) * 1991-01-09 1992-09-07 Fuji Photo Film Co Ltd Polishing tape and polishing method fro magnetic head
WO1998029217A1 (en) * 1997-01-03 1998-07-09 Minnesota Mining And Manufacturing Company Method and article for the production of optical quality surfaces on glass
US5888119A (en) * 1997-03-07 1999-03-30 Minnesota Mining And Manufacturing Company Method for providing a clear surface finish on glass
US5910471A (en) * 1997-03-07 1999-06-08 Minnesota Mining And Manufacturing Company Abrasive article for providing a clear surface finish on glass
US6231629B1 (en) 1997-03-07 2001-05-15 3M Innovative Properties Company Abrasive article for providing a clear surface finish on glass
JP2015151661A (en) * 2014-02-13 2015-08-24 ビジョン開発株式会社 Method for producing composite fiber for polishing, and composite fiber for polishing

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129924A (en) * 1979-03-26 1980-10-08 Hitachi Maxell Ltd Cleaning tape
JPS6076964A (en) * 1983-08-29 1985-05-01 ジ−テイ−イ−・ベイルロン・コ−ポレ−シヨン Polycrystal grinding grid
JPS6136112A (en) * 1984-07-26 1986-02-20 Sumitomo Electric Ind Ltd Preparation of whetstone granule of poly-crystalline diamond

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129924A (en) * 1979-03-26 1980-10-08 Hitachi Maxell Ltd Cleaning tape
JPS6076964A (en) * 1983-08-29 1985-05-01 ジ−テイ−イ−・ベイルロン・コ−ポレ−シヨン Polycrystal grinding grid
JPS6136112A (en) * 1984-07-26 1986-02-20 Sumitomo Electric Ind Ltd Preparation of whetstone granule of poly-crystalline diamond

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04250979A (en) * 1991-01-09 1992-09-07 Fuji Photo Film Co Ltd Polishing tape and polishing method fro magnetic head
WO1998029217A1 (en) * 1997-01-03 1998-07-09 Minnesota Mining And Manufacturing Company Method and article for the production of optical quality surfaces on glass
US5876268A (en) * 1997-01-03 1999-03-02 Minnesota Mining And Manufacturing Company Method and article for the production of optical quality surfaces on glass
US5989111A (en) * 1997-01-03 1999-11-23 3M Innovative Properties Company Method and article for the production of optical quality surfaces on glass
US6155910A (en) * 1997-01-03 2000-12-05 3M Innovative Properties Company Method and article for the production of optical quality surfaces on glass
US5888119A (en) * 1997-03-07 1999-03-30 Minnesota Mining And Manufacturing Company Method for providing a clear surface finish on glass
US5910471A (en) * 1997-03-07 1999-06-08 Minnesota Mining And Manufacturing Company Abrasive article for providing a clear surface finish on glass
US6110015A (en) * 1997-03-07 2000-08-29 3M Innovative Properties Company Method for providing a clear surface finish on glass
US6231629B1 (en) 1997-03-07 2001-05-15 3M Innovative Properties Company Abrasive article for providing a clear surface finish on glass
JP2015151661A (en) * 2014-02-13 2015-08-24 ビジョン開発株式会社 Method for producing composite fiber for polishing, and composite fiber for polishing

Also Published As

Publication number Publication date
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