JP2527367B2 - Polishing tape - Google Patents

Polishing tape

Info

Publication number
JP2527367B2
JP2527367B2 JP1146311A JP14631189A JP2527367B2 JP 2527367 B2 JP2527367 B2 JP 2527367B2 JP 1146311 A JP1146311 A JP 1146311A JP 14631189 A JP14631189 A JP 14631189A JP 2527367 B2 JP2527367 B2 JP 2527367B2
Authority
JP
Japan
Prior art keywords
abrasive
polishing
amount
tape
binder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1146311A
Other languages
Japanese (ja)
Other versions
JPH0310772A (en
Inventor
雅己 佐藤
明博 松藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP1146311A priority Critical patent/JP2527367B2/en
Publication of JPH0310772A publication Critical patent/JPH0310772A/en
Application granted granted Critical
Publication of JP2527367B2 publication Critical patent/JP2527367B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気ヘッド等の研磨に用いられる研磨テープ
に関し、特に粗研磨用テープに関するものである。
TECHNICAL FIELD The present invention relates to a polishing tape used for polishing a magnetic head or the like, and more particularly to a rough polishing tape.

(従来の技術) ビデオテープレコーダーや高級オーディオデッキ用の
磁気ヘッドは、可撓性支持体上に、研磨剤、結合剤、添
加剤等を含む研磨塗液を塗布し、乾燥させて研磨層が形
成されてなる研磨テープにより研磨されて製作されてい
る。
(Prior Art) Magnetic heads for video tape recorders and high-end audio decks have a polishing layer coated by applying an abrasive coating solution containing an abrasive, a binder, an additive, etc. onto a flexible support and drying it. It is manufactured by polishing with the formed polishing tape.

このような研磨テープは、一般には磁気ヘッドを挟む
2つのリール間を走行して被研磨面に接触し、該被研磨
面を研磨するようになっている。研磨テープは、可撓性
支持体を有しているため、研磨砥石に比べ、磁気ヘッド
等の曲面の研磨に適し、また、比研磨面の傷つきが少な
く精密研磨が可能であるため、仕上げ研磨には不可欠の
ものである。
Generally, such a polishing tape travels between two reels sandwiching a magnetic head, contacts the surface to be polished, and polishes the surface to be polished. Since the polishing tape has a flexible support, it is more suitable for polishing curved surfaces such as magnetic heads, etc. than a polishing grindstone. Also, since the specific polishing surface has few scratches and can be precisely polished, it is possible to finish polishing. Is essential to.

前記研磨テープによる磁気ヘッドの研磨は、周知のよ
うに磁気ヘッドの先端形状を作るための粗研磨工程と、
磁気ヘッド表面を円滑に仕上げるための仕上げ研磨工程
とからなる。それぞれの研磨工程では、目的にあった粗
研磨用テープおよび仕上げ研磨用テープが用いられる。
仕上げ研磨用テープとしては、例えば特公昭53−44174
号公報、特公昭62−10782号公報に開示されているよう
な研磨テープが利用されている。
The polishing of the magnetic head with the polishing tape includes a rough polishing step for forming the tip shape of the magnetic head as well known,
A final polishing step for smoothly finishing the surface of the magnetic head. In each polishing step, a rough polishing tape and a finish polishing tape suitable for the purpose are used.
As a tape for finish polishing, for example, Japanese Patent Publication No.
An abrasive tape as disclosed in Japanese Patent Publication No. 62-10782 is used.

(発明が解決しようとする課題) 磁気ヘッドの先端形状を作るために用いる粗研磨用テ
ープに要求される特性としては、研磨能力が高く、短
時間で磁気ヘッドの先端形状を作り上げる。粗研磨後
の磁気ヘッド表面に深い傷を残さないことがあげられ
る。
(Problems to be Solved by the Invention) The properties required for a rough polishing tape used to form the tip shape of a magnetic head are high polishing ability and the tip shape of the magnetic head is completed in a short time. It is possible to leave no deep scratches on the surface of the magnetic head after rough polishing.

粗研磨能力が低いと研磨時間が長くなり、生産性が悪
くなる。粗研磨後の磁気ヘッド表面に深い傷が残ると次
に続く仕上げ研磨工程で深い傷を除くのに長時間を要
し、生産性が悪くなるという問題がある。さらにまた、
粗研磨工程および仕上げ研磨工程での生産性が悪くなる
ばかりでなく、それぞれの工程で使用する研磨テープの
使用量も増大し、経済的な負荷が大きくなってしまう。
If the rough polishing ability is low, the polishing time will be long and the productivity will be poor. If deep scratches remain on the surface of the magnetic head after the rough polishing, it takes a long time to remove the deep scratches in the subsequent final polishing step, and there is a problem that productivity is deteriorated. Furthermore,
Not only the productivity in the rough polishing step and the finish polishing step deteriorates, but also the amount of the polishing tape used in each step increases and the economical load increases.

研磨能力を高くするためには、研磨層中の研磨剤の粒
子径を大きくすればよいが、一方、粗研磨後の磁気ヘッ
ド表面に深い傷を残さぬためには、研磨層中の研磨剤粒
子径を小さくした方が良い。従って上記2つの特性は相
反する関係にあり、どちらか一方を犠牲にするか、中間
的な特性に甘んじた粗研磨用テープを用いざるを得ず、
単に研磨剤の粒子径のコントロールだけでは十分な特性
の粗研磨テープを得られなかった。
In order to increase the polishing ability, the particle size of the polishing agent in the polishing layer may be increased. On the other hand, in order not to leave deep scratches on the surface of the magnetic head after rough polishing, the polishing agent in the polishing layer is required. It is better to reduce the particle size. Therefore, the above two characteristics are in a contradictory relationship, and either one of them has to be sacrificed, or a rough polishing tape that has an intermediate characteristic must be used.
It was not possible to obtain a rough polishing tape having sufficient characteristics simply by controlling the particle size of the abrasive.

前記特公昭62−10782号公報には硬いCr2O3研磨剤と、
軟らかいα−Fe2O3研磨剤を混合することにより、磁気
ヘッド表面の平滑性を向上させる方法が提示されてい
る。しかし、この方法では、軟らかいα−Fe2O3研磨剤
により、研磨能力が著しく低下するため、粗研磨用テー
プとしては適当ではない。
In Japanese Patent Publication No. 62-10782, a hard Cr 2 O 3 abrasive,
A method of improving the smoothness of the magnetic head surface by mixing a soft α-Fe 2 O 3 abrasive has been proposed. However, this method is not suitable as a rough polishing tape because the polishing ability is significantly reduced by the soft α-Fe 2 O 3 abrasive.

本発明は上記の問題点に鑑みてなされたものであり、
研磨能力が高く、被研磨面に深い傷を残さない粗研磨用
の研磨テープを提供することを目的とするものである。
The present invention has been made in view of the above problems,
An object of the present invention is to provide a polishing tape for rough polishing, which has high polishing ability and does not leave deep scratches on the surface to be polished.

(課題を解決するための手段および作用) 本発明の前記目的は、研磨剤および結合剤を主体とす
る研磨層が、可撓性支持体上に形成されてなる研磨テー
プにおいて、前記研磨剤を、平均粒径4〜8μm、モー
ス硬度8以上で表面が曲面よりなる第1の研磨剤、およ
び、平均粒径6〜9μm、モース硬度8以上で表面に2
以上の平面がある角張った形状の第2の研磨剤から構成
し、第1の研磨剤と第2の研磨剤との合計量に対し第1
の研磨剤を5〜30重量%含み、また、前記結合剤とし
て、エポキシ基およびスルホン酸基含有塩化ビニル系樹
脂、スルホン酸基含有ポリウレタン樹脂、およびエチレ
ングリコール、ネオペンチルグリコール、フタル酸、ア
ジピン酸を主成分とする飽和熱可塑性ポリエステル樹脂
のうち少なくとも一つを含み、かつ硬化剤成分としてポ
リイソシアネートを含み、この結合剤量が第1の研磨剤
と前記第2の研磨剤の合計量に対し10〜50重量%である
ことを特徴とする研磨テープにより達成される。
(Means and Actions for Solving the Problems) The above object of the present invention is to provide a polishing tape having a polishing layer mainly composed of an abrasive and a binder formed on a flexible support. A first abrasive having an average particle diameter of 4 to 8 μm and a Mohs hardness of 8 or more and having a curved surface, and 2 having an average particle diameter of 6 to 9 μm and a Mohs hardness of 8 or more on the surface.
The above-mentioned flat surface is composed of a second abrasive having an angular shape, and the first abrasive is used with respect to the total amount of the first abrasive and the second abrasive.
5 to 30% by weight of the above abrasive, and as the binder, a vinyl chloride resin containing an epoxy group and a sulfonic acid group, a polyurethane resin containing a sulfonic acid group, and ethylene glycol, neopentyl glycol, phthalic acid, adipic acid Containing at least one of the saturated thermoplastic polyester resins containing as a main component, and containing polyisocyanate as a curing agent component, and the amount of the binder with respect to the total amount of the first abrasive and the second abrasive. Achieved with an abrasive tape characterized in that it is 10 to 50% by weight.

前記本発明の研磨テープにおいては、平均粒径が6〜
9μm、モース硬度が8以上、表面が2つ以上の平面よ
りなる、すなわち角を有する角張った形状の粒子よりな
る第2の研磨剤により研磨能力が高められるとともに、
平均粒径が4〜8μm、モース硬度が8以上の表面が曲
面よりなる丸い形状の粒子よりなる第1の研磨剤により
研磨能力の大きな低下をきたすことなく被研磨面の深い
傷付きが防止される。
In the polishing tape of the present invention, the average particle size is 6 to
9 μm, Mohs hardness is 8 or more, and the surface is composed of two or more planes, that is, the second abrasive composed of angular particles having an angle increases polishing ability, and
The first abrasive composed of round-shaped particles having an average particle diameter of 4 to 8 μm and a Mohs hardness of 8 or more has a curved surface, and prevents deep scratches on the surface to be polished without significantly lowering the polishing ability. It

前記第2の研磨剤は、原料インゴットを粉砕して得ら
れる2平面が交差してできる角がある表面を有する比較
的角張った形状の粒子(例えば、不二見研磨材工業株式
会社製WA#2000)である。一方、表面が曲面よりなる丸
い形状の前記第1の研磨剤とは、例えば、有機アルミニ
ウムを加水分解してできた水酸化アルミニウムを焼成す
る方法で得られた研磨剤(例えば、住友化学工業株式会
社製CAH−3020)のように、表面が全て曲面よりなる形
状の粒子である。
The second abrasive is a relatively angular particle having a surface having an angle formed by intersecting two planes obtained by crushing a raw material ingot (for example, WA # 2000 manufactured by Fujimi Abrasives Co., Ltd.). ). On the other hand, the round-shaped first abrasive having a curved surface is, for example, an abrasive obtained by a method of firing aluminum hydroxide formed by hydrolyzing organic aluminum (for example, Sumitomo Chemical Co., Ltd. CAH-3020 manufactured by the company) is a particle whose surface is entirely curved.

すなわち、前記第2の研磨剤は硬くて、角張っている
が故に研磨能力が高く、一方、前記第1の研磨剤はその
粒子の表面に角がなく丸い形状の故に前記第2の研磨剤
が付けた深い傷を平坦にならす効果を発揮していると考
えられる。
That is, since the second abrasive is hard and has a square shape, it has a high polishing ability. On the other hand, the first abrasive has a round shape with no corners on the surface of the particles, so that the second abrasive is It is considered to have the effect of flattening the deep scratches that were made.

さらに、前記第1の研磨剤をモース硬度8以上の硬い
ものとすることで、研磨能力の低下は軽微にとどめられ
る。
Further, by making the first abrasive hard with a Mohs hardness of 8 or more, the deterioration of the polishing ability can be suppressed only slightly.

また、第1の研磨剤量は、第1の研磨剤と第2の研磨
剤との合計量に対し5〜30重量%混合させる。5重量%
未満では被研磨面の深い傷付きを防止する効果が小さ
く、30重量%を越えると多少の研磨能力の低下が認めら
れる。
Further, the amount of the first abrasive is mixed in an amount of 5 to 30% by weight with respect to the total amount of the first abrasive and the second abrasive. 5% by weight
If it is less than 30%, the effect of preventing deep scratches on the surface to be polished is small, and if it exceeds 30% by weight, the polishing ability is slightly lowered.

前記第1の研磨剤および前記第2の研磨剤は、具体的
には、Cr2O3、Al2O3、SiC、ダイヤモンド等のモース硬
度8以上の硬い粒子である。
The first abrasive and the second abrasive are specifically hard particles having a Mohs hardness of 8 or more, such as Cr 2 O 3 , Al 2 O 3 , SiC, and diamond.

本発明の研磨テープの研磨層を構成する前記結合剤の
配合量は、前記第1の研磨剤と前記第2の研磨剤の合計
量に対して10〜50重量%であり、さらに好ましくは15〜
20重量%の範囲である。10重量%未満であると結合剤量
が不足するため、研磨剤粒子が研磨層から脱落するよう
になり好ましくない。また、研磨層用組成物の塗布液を
ドクターコート方式で塗布した場合、均質な塗布が困難
であり、塗布スジ等が発生しやすく製造安定性に欠け
る。また、結合剤量が50重量%を越えると、結合剤の中
に研磨剤粒子が埋没し、研磨能力が十分に発揮されなく
なる。研磨剤量に対して結合剤量が少ない場合は深い傷
が付きにくく、多い場合は深い傷が付きやすい傾向にあ
るが、前記範囲内であれば実用上問題はない。
The compounding amount of the binder constituting the polishing layer of the polishing tape of the present invention is 10 to 50% by weight, more preferably 15% by weight, based on the total amount of the first and second abrasives. ~
It is in the range of 20% by weight. If the amount is less than 10% by weight, the amount of the binder is insufficient, so that the abrasive particles come off from the polishing layer, which is not preferable. Further, when the coating solution of the composition for the polishing layer is applied by the doctor coat method, it is difficult to apply it uniformly, and coating streaks are likely to occur, resulting in lack of manufacturing stability. On the other hand, if the amount of the binder exceeds 50% by weight, the abrasive particles will be embedded in the binder and the polishing ability will not be sufficiently exhibited. When the amount of the binder is smaller than the amount of the abrasive, deep scratches are less likely to be formed, and when the amount is larger, the deep scratches tend to be formed, but within the above range, there is no practical problem.

さらに前記結合剤としては、エポキシ基およびスルホ
ン酸基含有塩化ビニル系樹脂、スルホン酸基含有ポリウ
レタン樹脂、およびエチレングリコール、ネオペンチル
グリコール、フタル酸、アジピン酸を主成分とする飽和
熱可塑性ポリエステル樹脂のうち少なくとも一つと、硬
化剤成分としてポリイソシアネートを用いる系が、研磨
剤粒子の分散性を良好にし、研磨層の耐久性を良好とす
る。
Furthermore, as the binder, an epoxy group- and sulfonic acid group-containing vinyl chloride resin, a sulfonic acid group-containing polyurethane resin, and a saturated thermoplastic polyester resin containing ethylene glycol, neopentyl glycol, phthalic acid, and adipic acid as main components A system using at least one of them and polyisocyanate as a curing agent component improves the dispersibility of the abrasive particles and the durability of the polishing layer.

本発明の研磨テープにおける研磨剤組成と結合剤組成
の組み合わせ効果により、高い研磨能力と被研磨面の深
い傷付きを防止する性能を同時に満足させ得ることは、
粗研磨用テープのみでなく、中間仕上げ研磨用テープお
よび仕上げ研磨用テープおいても応用可能であり、中間
仕上げ研磨用テープおよび仕上げ研磨用テープの場合に
は、それぞれに適当な平均粒子径の研磨剤粒子を選択す
ればよい。
By the combined effect of the abrasive composition and the binder composition in the polishing tape of the present invention, it is possible to simultaneously satisfy the high polishing ability and the performance of preventing deep scratches on the surface to be polished,
It can be applied not only to rough polishing tapes, but also to intermediate finish polishing tapes and finish polishing tapes. In the case of intermediate finish polishing tapes and finish polishing tapes, polishing with an appropriate average particle size is possible. The agent particles may be selected.

以下、本発明の実施態様について詳細に説明する。第
1図は本発明の研磨テープを用いた研磨装置の概略図で
ある。
Hereinafter, embodiments of the present invention will be described in detail. FIG. 1 is a schematic view of a polishing apparatus using the polishing tape of the present invention.

研磨テープ1は、テープ巻き取りリール7が矢印A方
向に回転することによりテープ送り出しリール6から図
中矢印方向に送り出される。この研磨テープ1はその走
行路においてパスロール8により所定のラップ角で被研
磨体である磁気ヘッド5に接触し、この磁気ヘッド5の
テープ摺動面の研磨を行う。研磨テープ1は、第2図に
示すように、ポリエチレンテレフタレート(PET)、ポ
リエチレン−2・6−ナフタレート等からなる可撓性を
有する可撓性支持体2上に研磨層3が塗設されてなるも
のである。この研磨層3が前記磁気ヘッド5に摺接する
ことにより研磨が行われる。
The polishing tape 1 is delivered from the tape delivery reel 6 in the direction of the arrow in the drawing as the tape take-up reel 7 rotates in the direction of arrow A. The polishing tape 1 is brought into contact with a magnetic head 5, which is an object to be polished, at a predetermined wrap angle by a pass roll 8 on the traveling path, and the tape sliding surface of the magnetic head 5 is polished. As shown in FIG. 2, the polishing tape 1 has a polishing support layer 2 coated on a flexible support 2 made of polyethylene terephthalate (PET), polyethylene-2,6-naphthalate or the like. It will be. Polishing is performed by slidingly contacting the polishing layer 3 with the magnetic head 5.

前記研磨層3には、平均粒子径が4〜8μm、モース
硬度8以上の曲面よりなる表面を有する丸い形状の第1
の研磨剤4Bと、平均粒径が6〜9μm、モース硬度8以
上の2以上の平面がある表面を有する角張った形状の第
2の研磨剤4Aが結合剤等とともに混練されて塗設されて
いる。
The polishing layer 3 has a round-shaped first surface having a curved surface with an average particle diameter of 4 to 8 μm and a Mohs hardness of 8 or more.
And the second abrasive 4A having an angular shape having a surface having two or more flat surfaces with an average particle size of 6 to 9 μm and a Mohs hardness of 8 or more are kneaded together with a binder and the like and applied. There is.

なお、前記結合剤は、前記2種類の研磨剤4A,4Bの粒
子をそれぞれ良好に分散させて研磨層3に結合させるた
め、分散性の高いものが好ましい。また研磨層3には前
記研磨剤4A,4Bと結合剤のほかに、研磨テープ1がとの
ような状態にあっても磁気ヘッド5との十分な潤滑性を
維持して走行安定性を良好に保つことができるように、
潤滑剤等の添加剤が含有されることが望ましい。
The binder is preferably one having high dispersibility in order to satisfactorily disperse the particles of the two types of abrasives 4A and 4B and bond them to the polishing layer 3. In addition to the above-mentioned abrasives 4A and 4B and the binder, the polishing layer 3 maintains sufficient lubricity with the magnetic head 5 even when the polishing tape 1 is in a state like that, and has good running stability. So that you can keep
It is desirable to include additives such as lubricants.

また、前記研磨層3と可撓性支持体2の好ましい厚さ
は、磁気ヘッド5の研磨形状によって異なるが、研磨テ
ープ1がS−VHS方式用の磁気ヘッド5の粗研磨を行う
ものである場合には、可撓性支持体2の厚さが一例とし
て30μmであれば研磨層3の厚さは12μm、可撓性支持
体2の厚さが一例として23μmであれば研磨層3の厚さ
は16μm程度であるのが好ましい。なお、研磨層3の厚
さが大きすぎると、磁気ヘッド5と研磨テープ1の接触
が悪くなるので、研磨層3の厚さは常に50μm以下にす
るのが好ましい。
The preferred thicknesses of the polishing layer 3 and the flexible support 2 vary depending on the polishing shape of the magnetic head 5, but the polishing tape 1 is for rough polishing the magnetic head 5 for the S-VHS system. In this case, if the thickness of the flexible support 2 is 30 μm, the thickness of the polishing layer 3 is 12 μm. If the thickness of the flexible support 2 is 23 μm, the thickness of the polishing layer 3 is 30 μm. The thickness is preferably about 16 μm. If the thickness of the polishing layer 3 is too large, the contact between the magnetic head 5 and the polishing tape 1 deteriorates. Therefore, it is preferable that the thickness of the polishing layer 3 is always 50 μm or less.

また、本発明の研磨テープ1は、前記のような高性能
な磁気ヘッド5の研磨に特に適したものであるが、第3
図および第4図に示すように、ハードディスク15の研磨
に用いてもよい。ハードディスク15を研磨する場合に
は、2つのゴムローラ18によりハードディスク15を挟
み、これらのゴムローラ18により2本の研磨テープ1の
研磨層3をハードディスク15の両面に押しつけ、この状
態でハードディスク15を矢印B方向に回転させればハー
ドディスク15の両面を同時に研磨することができる。な
お、この場合には、第1図および第2図に示す磁気ヘッ
ド5の研磨に比べて被研磨体(ハードディスク15)に強
い押圧力が加わるが、本発明の研磨テープ1は上述した
2種類の研磨剤4A,4Bおよび研磨面性を良好にしうる結
合剤を有するものであるので、被研磨面に深い傷を付け
る恐れはない。
The polishing tape 1 of the present invention is particularly suitable for polishing the high performance magnetic head 5 as described above.
As shown in FIG. 4 and FIG. 4, it may be used for polishing the hard disk 15. When the hard disk 15 is polished, the hard disk 15 is sandwiched by two rubber rollers 18, and the polishing layers 3 of the two polishing tapes 1 are pressed against both surfaces of the hard disk 15 by these rubber rollers 18, and in this state, the hard disk 15 is indicated by the arrow B. Both sides of the hard disk 15 can be polished at the same time by rotating in the direction. In this case, a strong pressing force is applied to the object to be polished (hard disk 15) as compared with the case of polishing the magnetic head 5 shown in FIGS. 1 and 2, but the polishing tape 1 of the present invention has the above-mentioned two types. Since it has the abrasives 4A, 4B and the binder capable of improving the polishing surface property, there is no fear of deep scratches on the surface to be polished.

(発明の効果) 上記のような本発明によれば、平均粒子径が4〜8μ
mで表面が曲面よりなる形状の粒子よりなる第1の研磨
剤と平均粒子径が6〜9μmで表面が角張った形状の粒
子よりなる第2の研磨剤との粒子サイズと形状が特定さ
れた2種の研磨剤を特定の配合比で使用するとともに、
また、特定の塩化ビニル系樹脂、ポリウレタン樹脂、ポ
リエステル樹脂のうち少なくとも一つを含み、かつ硬化
剤成分としてポリイソシアネートを含む結合剤を研磨剤
量に対し10〜50重量%配合してなる研磨層を有すること
により、研磨能力が高く、かつ被研磨面に深い傷をつけ
ることがない特に粗研磨用に好適な研磨テープを得るこ
とができる。
(Effect of the Invention) According to the present invention as described above, the average particle size is 4 to 8 μm.
The particle size and shape of the first abrasive composed of particles having a curved surface with m and the second abrasive composed of particles having an average particle diameter of 6 to 9 μm and having an angular surface were specified. While using two types of abrasives in a specific compounding ratio,
Further, a polishing layer containing a binder containing at least one of a specific vinyl chloride resin, a polyurethane resin and a polyester resin and containing polyisocyanate as a curing agent component in an amount of 10 to 50% by weight based on the amount of the abrasive. By having the above, it is possible to obtain a polishing tape which has a high polishing ability and does not cause deep scratches on the surface to be polished, which is particularly suitable for rough polishing.

本発明の前記効果を、以下の実施例および比較例によ
ってさらに明確にする。
The effects of the present invention will be further clarified by the following examples and comparative examples.

<実施例1> 厚さ23μmのポリエチレンテレフタレート(PET)に
よる可撓性支持体の上に、以下の組成物をボールミルで
分散して調整した研磨層塗布液を14μmの厚さで塗布
し、乾燥させて研磨層を形成した。その後、それを巻き
取り、これを1/2インチ幅にスリットして研磨テープを
作成した。なお、以下の説明において「部」とは全て
「重量部」のことである。
<Example 1> On a flexible support made of polyethylene terephthalate (PET) having a thickness of 23 μm, a polishing layer coating solution prepared by dispersing the following composition by a ball mill was applied to a thickness of 14 μm and dried. Then, a polishing layer was formed. After that, it was wound up and slit into a 1/2 inch width to prepare a polishing tape. In the following description, all “parts” mean “parts by weight”.

[塗布液組成] 第1の研磨剤 ……75 部 (Al2O3粒子、平均粒径7.3μm、モース硬度9.0、住友
化学工業株式会社製「CAH−3020」) 第2の研磨剤 ……675 部 (Al2O3粒子、平均粒径8.1μm、モース硬度9.0、不二
見研磨材工業株式会社製「WA#2000」) 結合材(塩化ビニル系樹脂) ……55.3部 (塩化ビニル87重量%、粒子平均分子量2.6×104、エポ
キシ基含有量3.5重量%、スルホン酸カリウム基含有量
0.5重量%、前記重量%は塩化ビニル系樹脂重量に対す
る重量%である。) 結合剤(スルホン酸基含有ポリウレタン樹脂……32.7部 (分子量25000…SO3Na 1つあたりの分子量が25000) 結合剤(ポリイソシアネート) ……60 部 (3モルの2・4−トリレンジイソシアネート化合物と
1モルのトリメチロールプロパンの反応生成物の75重量
%酢酸エチル溶液) 溶剤(メチルエチルケトン) ……100 部 溶剤(シクロヘキサン) ……100 部 <実施例2> 第1の研磨剤の粒径を変更した実施例で、実施例1の
第1の研磨剤「CAH−3020」を、モース硬度9.0、平均粒
径4.0μm、住友化学工業株式会社製「CAH−3000」のAl
2O3粒子に代えて第1の研磨剤とした以外は、全て実施
例1と同じ条件で研磨テープを作成した。
[Coating liquid composition] First abrasive …… 75 parts (Al 2 O 3 particles, average particle size 7.3 μm, Mohs hardness 9.0, “CAH-3020” manufactured by Sumitomo Chemical Co., Ltd.) Second abrasive …… 675 parts (Al 2 O 3 particles, average particle size 8.1 μm, Mohs hardness 9.0, “WA # 2000” manufactured by Fujimi Abrasives Co., Ltd.) Binder (vinyl chloride resin) …… 55.3 parts (87 parts vinyl chloride) %, Particle average molecular weight 2.6 × 10 4 , epoxy group content 3.5% by weight, potassium sulfonate group content
0.5% by weight, said weight% is the weight% with respect to the vinyl chloride resin weight. ) Binder (sulphonic acid group-containing polyurethane resin ... 32.7 parts (molecular weight 25000 ... Molecular weight per SO 3 Na is 25000) Binder (polyisocyanate) ...... 60 parts (3 mol of 2,4-tolylene diisocyanate) 75 wt% ethyl acetate solution of the reaction product of the compound and 1 mol of trimethylolpropane) Solvent (methyl ethyl ketone) ...... 100 parts Solvent (cyclohexane) ...... 100 parts <Example 2> The particle size of the first abrasive In a modified example, the first abrasive “CAH-3020” of Example 1 was used to obtain a Mohs hardness of 9.0, an average particle size of 4.0 μm, and an Al of “CAH-3000” manufactured by Sumitomo Chemical Co., Ltd.
An abrasive tape was prepared under the same conditions as in Example 1, except that the first abrasive was used instead of the 2 O 3 particles.

<実施例3> 結合剤の樹脂を変更した実施例で、実施例1の塩化ビ
ニル系樹脂とスルホン酸基含有ポリウレタン樹脂を、エ
チレングリコール/ネオペンチルグリコール/フタル酸
アジピン酸=0.6/0.5/1.0/0.2モル比である飽和熱可塑
性ポリエステル樹脂(東洋紡績株式会社製「バイロン10
3」)に代え、他の条件は全て実施例1と同じ条件で研
磨テープを作成した。
<Example 3> In an example in which the binder resin was changed, the vinyl chloride resin and the sulfonic acid group-containing polyurethane resin of Example 1 were replaced by ethylene glycol / neopentyl glycol / adipic acid phthalate = 0.6 / 0.5 / 1.0. Saturated thermoplastic polyester resin with a /0.2 molar ratio (“Byron 10 manufactured by Toyobo Co., Ltd.
3 ”), and other conditions were all the same as in Example 1 to prepare a polishing tape.

<比較例1> 第1および第2の研磨剤の粒径が小さい比較例で、実
施例1の第1の研磨剤「CAH−3020」を、モース硬度9.
0、平均粒径4.0μm、住友化学工業株式会社製「CAH−3
000」のAl2O3粒子に代えて第1の研磨剤とし、第2の研
磨剤「WA#2000」を、モース硬度9.0、平均粒径3.0μ
m、不二見研磨材工業株式会社製「WA#4000」のAl2O3
粒子に代えて第2の研磨材とした以外は、全て実施例1
と同じ条件で研磨テープを作成した。
<Comparative Example 1> In a comparative example in which the particle diameters of the first and second abrasives are small, the first abrasive "CAH-3020" of Example 1 was used with a Mohs hardness of 9.
0, average particle size 4.0 μm, Sumitomo Chemical Co., Ltd. “CAH-3
000 "Al 2 O 3 particles as the first abrasive, and the second abrasive" WA # 2000 "with a Mohs hardness of 9.0 and an average particle diameter of 3.0μ.
m, "WA # 4000" manufactured by Fujimi Abrasives Co., Ltd. Al 2 O 3
Example 1 except that the second abrasive was used instead of the particles.
A polishing tape was prepared under the same conditions as above.

<比較例2> 第2の研磨剤のみによる比較例で、実施例1の第1の
研磨剤「CAH−3020」の添加量を0部とし、第2の研磨
剤「WA#2000」をその分増量した以外は、全て実施例1
と同じ条件で研磨テープを作成した。
Comparative Example 2 In a comparative example using only the second abrasive, the addition amount of the first abrasive “CAH-3020” of Example 1 was set to 0 part, and the second abrasive “WA # 2000” was added. Example 1 except that the amount was increased
A polishing tape was prepared under the same conditions as above.

<比較例3> 第1の研磨剤のみによる比較例で、実施例1の第2の
研磨剤「WA#2000」の添加量を0部とし、第1の研磨剤
「CAH−3020」をその分増量した以外は、全て実施例1
と同じ条件で研磨テープを作成した。
Comparative Example 3 In a comparative example using only the first abrasive, the addition amount of the second abrasive “WA # 2000” of Example 1 was set to 0 part, and the first abrasive “CAH-3020” was added. Example 1 except that the amount was increased
A polishing tape was prepared under the same conditions as above.

<比較例4> 第1の研磨剤のみによる比較例で、比較例1の第2の
研磨剤「WA#4000」の添加量を0部とし、第1の研磨剤
「CAH−3000」をその分増量した以外は、全て実施例1
と同じ条件で研磨テープを作成した。
Comparative Example 4 In a comparative example using only the first abrasive, the addition amount of the second abrasive “WA # 4000” in Comparative Example 1 was set to 0 part, and the first abrasive “CAH-3000” was added. Example 1 except that the amount was increased
A polishing tape was prepared under the same conditions as above.

<比較例5> 第2の研磨剤のみによる比較例で、比較例1の第1の
研磨剤「「CAH−3000」の添加量を0部とし、第1の研
磨剤「WA#4000」をその分増量した以外は、全て比較例
1と同じ条件で研磨テープを作成した。
<Comparative Example 5> In a comparative example using only the second polishing agent, the addition amount of the first polishing agent "CAH-3000" of Comparative Example 1 was set to 0 part, and the first polishing agent "WA # 4000" was used. A polishing tape was prepared under the same conditions as in Comparative Example 1 except that the amount was increased by that amount.

<比較例6> 研磨剤中の第1の研磨剤の配合量が少ない比較例で、
実施例1の第1の研磨剤「CAH−3020」の添加量75部を2
0.9部に変え、他の条件は全て実施例1と同じ条件で研
磨テープを作成した。
<Comparative Example 6> In a comparative example in which the amount of the first abrasive contained in the abrasive was small,
Add 75 parts of the first abrasive "CAH-3020" of Example 1 to 2 parts.
The polishing tape was prepared under the same conditions as in Example 1 except that the content was changed to 0.9 parts.

<実施例4> 研磨剤中の第1の研磨剤の配合量が多い実施例で、実
施例1の第1の研磨剤「CAH−3020」の添加量75部を28
9.2部に変え、他の条件は全て実施例1と同じ条件で研
磨テープを作成した。
<Example 4> In an example in which the first abrasive was mixed in a large amount in the abrasive, the addition amount of the first abrasive "CAH-3020" in Example 1 was changed to 75 parts.
The polishing tape was prepared under the same conditions as in Example 1 except that the number was changed to 9.2 parts.

<比較例7> 研磨剤中の第1の研磨剤の配合量が多い実施例で、実
施例1の第1の研磨剤「CAH−3020」の添加量75部を450
部に変え、他の条件は全て実施例1と同じ条件で研磨テ
ープを作成した。
<Comparative Example 7> In an example in which the first abrasive was mixed in a large amount in the abrasive, 75 parts of the first abrasive "CAH-3020" in Example 1 was added to 450 parts.
The polishing tape was prepared under the same conditions as in Example 1 except for the parts.

<比較例8> 結合剤の樹脂を変更した比較例で、実施例1の塩化ビ
ニル系樹脂を、塩化ビニル−酢酸ビニル共重合体(共重
合比87:13、重合度350)に代えて、スルホン酸基含有ポ
リウレタン樹脂を、ポリエステルポリオール(アジピン
酸1モルとジエチレングリコール1モルとトリメチロー
ルプロパン0.06モルの反応生成物)に代え、他の条件は
全て実施例1と同じ条件で研磨テープを作成した。
Comparative Example 8 In a comparative example in which the binder resin was changed, the vinyl chloride resin of Example 1 was replaced with a vinyl chloride-vinyl acetate copolymer (copolymerization ratio 87:13, degree of polymerization 350), The sulfonic acid group-containing polyurethane resin was replaced with polyester polyol (a reaction product of 1 mol of adipic acid, 1 mol of diethylene glycol and 0.06 mol of trimethylolpropane), and the other conditions were the same as in Example 1 to prepare a polishing tape. .

<実施例5> 第2の研磨剤の材質を変更した実施例で、実施例1の
第2の研磨剤「WA#2000」を、モース硬度9.5、平均粒
径8.0μm、不二見研磨材工業株式会社製のSiC研磨材
「GC#2000」の角張った形状の粒子に代え、他の条件は
全て実施例1と同じ条件で研磨テープを作成した。
<Example 5> In the example in which the material of the second abrasive was changed, the second abrasive "WA # 2000" of Example 1 was used, and the Mohs hardness was 9.5, the average particle size was 8.0 µm, and the Fujimi abrasive industry was used. A polishing tape was prepared under the same conditions as in Example 1 except for the square-shaped particles of SiC abrasive "GC # 2000" manufactured by Co., Ltd.

<比較例9> 研磨剤に対する結合剤量が少ない比較例で、実施例1
の塩化ビニル系樹脂55.3部を15.0部に、スルホン酸基含
有ポリウレタン樹脂32.7部を9.2部に、ポリイソシアネ
ート60部を16.9部にそれぞれ量を変え、他の条件は全て
実施例1と同じ条件で研磨テープを作成した。
<Comparative Example 9> Comparative Example 9 in which the amount of the binder with respect to the polishing agent was small,
The amount of the vinyl chloride resin 55.3 parts to 15.0 parts, the sulfonic acid group-containing polyurethane resin 32.7 parts to 9.2 parts, and the polyisocyanate 60 parts to 16.9 parts were changed, and all other conditions were the same as in Example 1. An abrasive tape was created.

<比較例10> 研磨剤に対する結合剤量が多い比較例で、実施例1の
塩化ビニル系樹脂55.3部を17.6部に、スルホン酸基含有
ポリウレタン樹脂32.7部を9.2部に、ポリイソシアネー
ト60部を16.9部にそれぞれ変え、他の条件は全て実施例
1と同じ条件で研磨テープを作成した。
<Comparative Example 10> In a comparative example in which the amount of the binder with respect to the abrasive was large, 55.3 parts of the vinyl chloride resin of Example 1 was added to 17.6 parts, 32.7 parts of the sulfonic acid group-containing polyurethane resin was added to 9.2 parts, and 60 parts of polyisocyanate was added. The polishing tape was prepared under the same conditions as in Example 1 except that the amount was changed to 16.9 parts.

上記のような各実施例1〜5および比較例1〜10によ
り作成された研磨テープの研磨層組成をまとめて第1表
に示す。
Table 1 shows the composition of the polishing layers of the polishing tapes prepared in Examples 1 to 5 and Comparative Examples 1 to 10 as described above.

前記実施例および比較例により作成された粗研磨用テ
ープをそれぞれ研磨装置に装填し、フェライト製ビデオ
ヘッド(磁気ヘッド)の粗研磨を行い、磁気ヘッドの研
磨量を測定した。磁気ヘッドの粗研磨量は、全ての研磨
テープのテストにおいて同一研磨条件で行い、研磨前と
研磨後の磁気ヘッドの高さの差(μm)より求めた。そ
の後、粗研磨による磁気ヘッド表面の傷の深さを調べる
ため、特開昭60−232503号公報の実施例1に開示された
仕上げ研磨テープにより仕上げ研磨時間20秒間で仕上げ
研磨を行い、仕上げ研磨で取り切れない粗研磨の深い傷
の残り具合を調べた。上記深い傷の残り具合は、磁気ヘ
ッド表面を顕微鏡で見て確認された幅0.5μm以上の傷
の本数である。
The rough polishing tapes prepared in the above-mentioned Examples and Comparative Examples were respectively loaded into a polishing device, the ferrite video head (magnetic head) was roughly polished, and the polishing amount of the magnetic head was measured. The rough polishing amount of the magnetic head was determined under the same polishing conditions in all the polishing tape tests, and was determined from the difference (μm) in height between the magnetic heads before and after polishing. Then, in order to examine the depth of scratches on the surface of the magnetic head due to the rough polishing, the finish polishing was performed with the finish polishing tape disclosed in Example 1 of JP-A-60-232503 for 20 seconds. The state of deep scratches remaining in the rough polishing that could not be removed with was examined. The depth of the deep scratches is the number of scratches having a width of 0.5 μm or more, which is confirmed by observing the surface of the magnetic head with a microscope.

上記粗研磨による磁気ヘッドの研磨量と、仕上げ研磨
後に磁気ヘッド表面に残る粗研磨の深い傷の数について
測定した結果を第2表に示す。
Table 2 shows the measurement results of the polishing amount of the magnetic head by the rough polishing and the number of deep scratches of the rough polishing remaining on the surface of the magnetic head after the final polishing.

第2表から実施例1〜実施例5の研磨テープは、磁気
ヘッドの研磨量が大きく、研磨した磁気ヘッドの表面に
深い傷を残さないので、粗研磨用テープとして好適であ
ることが分かった。つまり、本発明研磨テープは、第1
の研磨剤と第2の研磨剤の両方を適当量含むため、第2
の研磨剤による大きな研磨能力と、第1の研磨剤による
深い傷付きを防止する能力の両方を備えていることが分
かった。
From Table 2, it is found that the polishing tapes of Examples 1 to 5 have a large polishing amount of the magnetic head and do not leave deep scratches on the surface of the polished magnetic head, and thus are suitable as a rough polishing tape. . That is, the polishing tape of the present invention is the first
Second abrasive because it contains both the first abrasive and the second abrasive in appropriate amounts.
It was found that it has both a large polishing ability with the first abrasive and an ability to prevent deep scratches with the first abrasive.

まず、第2の研磨剤を含まない比較例3,4との比較に
おいて、実施例1〜4では平均粒径8.1μm、モース硬
度9.0の角張った形状のAl2O3研磨剤を第2の研磨剤とし
て含むため、大きな磁気ヘッド研磨量が得られる。ま
た、第1の研磨剤を含まない比較例2との比較におい
て、実施例1〜5では平均粒径4.0〜7.3μm、モース硬
度9.0の丸い形状のAl2O3研磨剤を含むため、磁気ヘッド
表面に深い傷を残さないことが分かる。
First, in comparison with Comparative Examples 3 and 4 not containing the second abrasive, in Examples 1 to 4, the Al 2 O 3 abrasive having a square shape with an average particle size of 8.1 μm and a Mohs hardness of 9.0 was used as the second abrasive. Since it is contained as an abrasive, a large polishing amount of the magnetic head can be obtained. Further, in comparison with Comparative Example 2 containing no first abrasive, Examples 1 to 5 contained a round Al 2 O 3 abrasive having an average particle size of 4.0 to 7.3 μm and a Mohs hardness of 9.0, and thus magnetic It can be seen that no deep scratches are left on the head surface.

また、実施例1,4、比較例6,7の比較において、丸い形
状の第1の研磨剤の全研磨量に対する配合量は、配合量
の少ない比較例6では傷が多く、配合量の多い比較例7
では研磨量が低下しており、この配合量は5〜30%の範
囲が、磁気ヘッド表面に深い傷を残さない適正な範囲で
あることが分かる。
In addition, in the comparison between Examples 1 and 4 and Comparative Examples 6 and 7, the compounding amount of the round-shaped first abrasive with respect to the total polishing amount is large in Comparative Example 6 where the compounding amount is small and the compounding amount is large. Comparative Example 7
Shows that the amount of polishing is reduced, and that the range of this compounding amount is 5 to 30% is an appropriate range that does not leave deep scratches on the magnetic head surface.

さらに、結合剤を組成が異なる比較例8との比較にお
いて、上記実施例によるものでは磁気ヘッド表面に深い
傷を残さないことが分かる。これは実施例で使用してい
る結合剤がAl2O3研磨剤を良好に分散させ、深い傷を付
ける原因となるAl2O3研磨剤の凝集を発生させにくいた
めであると考えられる。
Further, in comparison with Comparative Example 8 in which the binder has a different composition, it can be seen that the one according to the above example does not leave deep scratches on the surface of the magnetic head. This binder is used in embodiment is favorably dispersed Al 2 O 3 abrasives, presumably because less likely to generate the aggregation of deep scratches cause attaching a Al 2 O 3 abrasive.

研磨剤の材質については、実施例1と実施例5との比
較で、第2の研磨剤としてSiC研磨剤を使用しても、平
均粒径が8.0μm、モース硬度9.5の角張った形状の粒子
であることで、磁気ヘッドの研磨量は大きく、この研磨
剤種による大きな変化はない。さらに、比較例1,5との
比較においても、丸い形状のAl2O3研磨剤研磨剤が第1
の研磨剤として混入されることにより、磁気ヘッド表面
に深い傷が残るのが大幅に改善されることが分かる。
Regarding the material of the polishing agent, a comparison between Example 1 and Example 5 shows that even if a SiC polishing agent is used as the second polishing agent, the particles having an average particle size of 8.0 μm and a square shape with a Mohs hardness of 9.5 are used. Therefore, the polishing amount of the magnetic head is large, and there is no great change due to the abrasive type. Further, in comparison with Comparative Examples 1 and 5, the round-shaped Al 2 O 3 abrasive was the first abrasive.
It can be seen that the presence of deep scratches on the surface of the magnetic head is remarkably improved by being mixed as the polishing agent.

実施例1と比較例9,10の比較において、全結合剤量/
全研磨剤量の重量割 合が10%未満の5%の場合(比較例9)は、結合剤量が
不足し、研磨剤粒子の研磨層からの脱落が発生しやすく
なり、研磨したビデオヘッド表面に深い傷を付けている
ものと考えられる。また、50%を越えた55%の場合(比
較例10)、結合剤の中に研磨剤粒子が埋没し、研磨能力
が十分に発揮されないため磁気ヘッドの研磨量が小さく
なっているものと考えられる。
In the comparison between Example 1 and Comparative Examples 9 and 10, the total amount of binder /
Weight percent of total abrasive When the content is less than 10% and 5% (Comparative Example 9), the amount of the binder is insufficient, the abrasive particles are likely to fall off from the polishing layer, and the polished video head surface is deeply scratched. It is believed that Also, in the case of more than 50% and 55% (Comparative Example 10), it is considered that the polishing amount of the magnetic head is small because the abrasive particles are buried in the binder and the polishing ability is not fully exhibited. To be

上記実施例の粗研磨テープによれば、磁気ヘッド表面
に深い傷を残さないため、仕上げ研磨に要する仕上げ研
磨テープの使用量および仕上げ研磨時間を大幅に減らせ
る。また、このような粗研磨テープは深い傷を残さない
とともに、脱粒した研磨剤粒子が被研磨面に埋め込まれ
ることを防止する作用も発揮する。
According to the rough polishing tape of the above embodiment, since no deep scratch is left on the surface of the magnetic head, the amount of finish polishing tape used for finish polishing and the finish polishing time can be greatly reduced. Further, such a rough polishing tape does not leave deep scratches, and also exerts an action of preventing the abrasive particles that have been shattered from being embedded in the surface to be polished.

さらに上記実施例の粗研磨テープで磁気ヘッドを粗研
磨し、その後仕上げ研磨して完成させた磁気ヘッドの電
磁変換特性は、比較例で粗研磨し、仕上げ研磨した磁気
ヘッドの電磁変換特性より優れるという利点もあること
が分かった。これは電磁変換特性に大きな影響を与える
磁気ヘッド表面近傍の加工変質層ができにくいためと考
えられる。
Further, the magnetic conversion characteristics of the magnetic head that was completed by rough polishing the magnetic head with the rough polishing tape of the above example and then finish polishing were superior to the electromagnetic conversion characteristics of the magnetic head that was rough polished and finish polished in the comparative example. It turns out that there is also an advantage. It is considered that this is because it is difficult to form a work-affected layer near the surface of the magnetic head that greatly affects the electromagnetic conversion characteristics.

なお、比較例1の研磨テープは、第2の研磨剤の粒径
が小さい以外は実施例1と同様の組成であり、研磨量は
実施例より少ないが傷の発生はなく、中間仕上げ用また
は仕上げ研磨用の研磨テープとして使用可能である。
The polishing tape of Comparative Example 1 had the same composition as that of Example 1 except that the particle size of the second abrasive was small, and the polishing amount was smaller than that of the example, but no scratches were generated. It can be used as a polishing tape for finish polishing.

本発明はその要旨を越えない範囲において種々変形可
能であり、上記実施例に限定されるものではない。また
本発明に係る研磨テープは、実施例に示した細長いテー
プ状のものに限らず、薄い円形支持体上に研磨層を形成
したディスク状のものも含むものである。
The present invention can be variously modified without departing from the scope of the invention and is not limited to the above embodiments. Further, the polishing tape according to the present invention is not limited to the elongated tape shape shown in the examples, but includes a disk shape in which a polishing layer is formed on a thin circular support.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の研磨テープを用いた研磨装置の概略
図、 第2図は上記研磨テープと磁気ヘッドの拡大図、 第3図は他の研磨装置の概略斜視図、 第4図はその断面図である。 1……研磨テープ、2……可撓性支持体、3……研磨層 4A……第1の研磨剤、4B……第2の研磨剤、5……磁気
ヘッド
FIG. 1 is a schematic view of a polishing apparatus using the polishing tape of the present invention, FIG. 2 is an enlarged view of the polishing tape and a magnetic head, FIG. 3 is a schematic perspective view of another polishing apparatus, and FIG. It is sectional drawing. 1 ... Abrasive tape, 2 ... Flexible support, 3 ... Abrasive layer 4A ... First abrasive, 4B ... Second abrasive, 5 ... Magnetic head

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】研磨剤および結合剤を主体とする研磨層
が、可撓性支持体上に形成されてなる研磨テープにおい
て、 前記研磨剤が、平均粒径4〜8μm、モース硬度8以上
で表面が曲面よりなる第1の研磨剤、および、平均粒径
6〜9μm、モース硬度8以上で表面に2以上の平面が
ある角張った形状の第2の研磨剤から構成され、 前記第1の研磨剤と前記第2の研磨剤の合計量に対し、
前記第1の研磨剤を5〜30重量%含み、 前記結合剤として、エポキシ基およびスルホン酸基含有
塩化ビニル系樹脂、スルホン酸基含有ポリウレタン樹
脂、およびエチレングリコール、ネオペンチルグリコー
ル、フタル酸、アジピン酸を主成分とする飽和熱可塑性
ポリエステル樹脂のうち少なくとも一つを含み、かつ硬
化剤成分としてポリイソシアネートを含み、 前記結合剤量が、前記第1の研磨剤と前記第2の研磨剤
の合計量に対し10〜50重量%であることを特徴とする研
磨テープ。
1. A polishing tape comprising a flexible support and a polishing layer mainly comprising an abrasive and a binder, wherein the abrasive has an average particle size of 4 to 8 μm and a Mohs hardness of 8 or more. The first abrasive having a curved surface, and the second abrasive having an angular shape having an average particle size of 6 to 9 μm, a Mohs hardness of 8 or more, and two or more flat surfaces on the surface thereof. With respect to the total amount of the abrasive and the second abrasive,
The first abrasive is contained in an amount of 5 to 30% by weight, and as the binder, an epoxy group- and sulfonic acid group-containing vinyl chloride resin, a sulfonic acid group-containing polyurethane resin, and ethylene glycol, neopentyl glycol, phthalic acid, adipine It contains at least one of saturated thermoplastic polyester resin containing acid as a main component, and contains polyisocyanate as a curing agent component, and the amount of the binder is the sum of the first abrasive and the second abrasive. A polishing tape characterized by being 10 to 50% by weight based on the amount.
JP1146311A 1989-06-08 1989-06-08 Polishing tape Expired - Lifetime JP2527367B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1146311A JP2527367B2 (en) 1989-06-08 1989-06-08 Polishing tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1146311A JP2527367B2 (en) 1989-06-08 1989-06-08 Polishing tape

Publications (2)

Publication Number Publication Date
JPH0310772A JPH0310772A (en) 1991-01-18
JP2527367B2 true JP2527367B2 (en) 1996-08-21

Family

ID=15404809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1146311A Expired - Lifetime JP2527367B2 (en) 1989-06-08 1989-06-08 Polishing tape

Country Status (1)

Country Link
JP (1) JP2527367B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108883518B (en) * 2016-03-25 2020-01-07 阪东化学株式会社 Grinding material

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1266569A (en) * 1984-05-09 1990-03-13 Minnesota Mining And Manufacturing Company Coated abrasive product incorporating selective mineral substitution
JPS6316979A (en) * 1986-07-04 1988-01-23 Fuji Photo Film Co Ltd Polishing tape
JPH0616989B2 (en) * 1987-09-29 1994-03-09 富士写真フイルム株式会社 Polishing tape
JPH0160867U (en) * 1987-10-14 1989-04-18

Also Published As

Publication number Publication date
JPH0310772A (en) 1991-01-18

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