JPH06275930A - Electrodeposition substrate - Google Patents

Abstract

PURPOSE:To obtain an electrodeposition substrate enabling efficient attainment of a color filter of high resolution which is used for a flat display such as a liquid crystal display, an imager such as CCD, a color sensor, etc. CONSTITUTION:A polyimide resin layer 3 is formed on one surface of a stainless steel substrate 2 and electrodes 5 are formed in a prescribed pattern on this polyimide resin layer 3. Thereby a change in dimensions of an electrodeposition substrate 1 is reduced very much, and since the smoothness of the polyimide resin layer 3 is high, the smoothness of the electrodes 5 formed on this polyimide resin layer 3 is also high. Naturally, a colored layer formed on the electrodes 5 and transferred and formed on a transparent substrate has also a high smoothness and a high precision.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrodeposition substrate, and more particularly to an electrodeposition substrate capable of manufacturing a color filter used in a liquid crystal display or the like with high accuracy.

[0002]

2. Description of the Related Art There are various color display methods for liquid crystal color televisions and liquid crystal displays for computers, and as general color display means, there are red (R), green (G), blue (B) and the like. There is a method of using a color filter. This color filter can be manufactured by a dyeing method of dyeing a dyeable resist pattern, a pigment dispersion method of preliminarily dispersing a color pigment in a photosensitive resist and exposing / developing it, or a printing method of printing each color with a printing ink. Etc.
In products such as liquid crystal color televisions and liquid crystal displays for computers, which are required to be popular, quality and cost reduction are the most important problems, and therefore reduction in manufacturing cost is desired.

However, in the above dyeing method, the color quality of the color filter is good, but the heat resistance and the light resistance are inferior, and the manufacturing process is complicated, so that the manufacturing cost is high. Further, although the pigment dispersion method improves heat resistance and light resistance and can simplify the process somewhat, the production cost is limited because of the high material cost. Further, the printing method has been expected to reduce the manufacturing cost because the process is simple, but it cannot be used for a thin film transistor (TFT) type liquid crystal display due to its poor quality, and the yield of non-defective products at the time of manufacturing is low. The reduction in manufacturing cost was not obtained.

[0004]

In order to solve the above problems, color filter manufacturing using an electrodeposition method has been developed. As a method for producing a color filter using the electrodeposition method, an electrodeposition transfer method in which a colored pattern formed by electrodeposition on an electrodeposited substrate is transferred onto a transparent substrate to form a colored layer (Japanese Patent Laid-Open No. Sho 63-63).
-266482).

However, since the conventional electrodeposition substrate has a plastic film such as polyethylene terephthalate or polyimide as a base material and the electrodes are formed on the base material, the colored pattern formed by electrodeposition is formed on the transparent substrate. At the time of transfer, there is a problem that a dimensional change due to elongation of the base material occurs, the manufacturing yield of the high-precision color filter is low, and the manufacturing cost cannot be reduced.

The present invention has been made in view of the above circumstances, and efficiently obtains a high-resolution color filter used for a flat display such as a liquid crystal display, an imager such as a CCD, or a color sensor. It is an object of the present invention to provide an electrodeposition substrate that can be manufactured.

[0007]

In order to achieve such an object, the present invention provides a stainless steel substrate, a polyimide resin layer formed on one surface of the stainless steel substrate, and a predetermined polyimide resin layer on the polyimide resin layer. It was configured to include electrodes formed in a pattern.

[0008]

[Function] A stainless steel substrate is provided as a substrate, and a polyimide resin layer is formed on one surface of the stainless steel substrate.
Furthermore, electrodes are formed in a predetermined pattern on this polyimide resin layer, which makes the electrodeposition substrate extremely small in dimensional change, and because the polyimide resin layer has high smoothness, it is formed on this polyimide resin layer. The formed electrode also has high smoothness, and the colored layer that is inevitably formed on the electrode and transferred and formed on the transparent substrate also has high smoothness and high accuracy.

[0009]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic sectional view showing an electrodeposition substrate of the present invention. In FIG. 1, the electrodeposited substrate 1 is a stainless steel substrate 2
And a polyimide resin layer 3 formed on one surface of the stainless steel substrate 2, and an electrode 5 formed on the polyimide resin layer 3 in a predetermined pattern.

Such an electrodeposited substrate 1 can usually be manufactured as follows. First, a polyimide resin is applied to the surface of the stainless steel substrate 2 by a known means such as a spin coating method or a blade coating method and cured to form a polyimide resin layer 3 (FIG. 2A). Next, a transparent conductive film 4 such as indium tin oxide (ITO) is formed on the polyimide resin layer 3 by a sputtering method, a vapor deposition method or the like, and a photosensitive resist 6 is applied on the transparent conductive film 4. (FIG. 2 (B)). After that, the photosensitive resist 6 is passed through a photomask having a positive pattern of the colored layer.
Is exposed and developed to form a resist pattern on the transparent conductive film 4 (FIG. 2C). Then, the transparent conductive film 4 is etched through the resist pattern to form the electrode 5
Are formed (FIG. 2D).

Stainless substrate 2 used in the present invention
, SUS-301, SUS-304, SUS-
316, SUS-430, SUS-436, SUS-4
44, SUS-410, SUS-420 and the like. The thickness of the stainless steel substrate 2 used is
It is preferably about 100 to 300 μm.

The polyimide resin layer 3 formed on one surface of the stainless steel substrate 2 is for imparting high surface smoothness to the electrodeposited substrate and for preventing conduction between the electrodes 5. The polyimide resin layer 3 has a thickness of 0.
It is preferably about 5 to 1 μm.

The electrode 5 is made of indium tin oxide (I
In addition to TO, it may be made of a transparent conductive material such as tin dioxide (SnO ₂ ) or may be made of a metal such as gold (Au) copper (Cu).

Next, an example of manufacturing a color filter using such an electrodeposited substrate 1 will be described with reference to FIG. First, the above electrodeposition substrate 1 is immersed in an electrodeposition bath in which a red pigment is dispersed, and a DC voltage is selectively applied only to the electrode 5 forming the red colored layer among the electrodes 5 to cause red electrodeposition. The material is deposited, washed sufficiently with water and then dried to form a pinhole-free red colored pattern 8R. Similarly, a green colored pattern 8G and a blue colored pattern 8 are formed on the electrode 5.
B is formed (FIG. 3A).

Next, the glass substrate 11 having the UV primer layer 12 on the surface is colored with the colored pattern 8 on the electrodeposited substrate 1.
It is pressure-bonded onto R, 8G, and 8B, and ultraviolet rays are irradiated from the glass substrate 11 side to cure the UV primer layer 12 and adhere it to the colored patterns 8R, 8G, and 8B (FIG. 3B). Then, the colored pattern 8 is formed by peeling off the electrodeposited substrate 1.
R, 8G, and 8B are transferred onto the glass substrate 11 to form colored layers.

The glass substrate 11 is made of rigid material such as quartz glass, Pyrex glass, synthetic quartz plate, or the like, or flexible material such as transparent resin film or optical resin plate. Can be used. Among them, Corning 7059 glass is a material with a small coefficient of thermal expansion, has excellent dimensional stability and workability in high-temperature heat treatment, and is a non-alkali glass that does not contain an alkali component in the glass. It is suitable for a matrix type LCD color filter.

A black matrix may be formed by inserting a black line at the boundary between the colored patterns 8R, 8G and 8B that are transferred onto the glass substrate 11 and form the colored layer as described above. By forming the black matrix, the alignment accuracy required for each colored pattern is slightly relaxed, and the display contrast can be improved.

The formation of such a black matrix can be carried out by electrodeposition of a black material, electrodeposition of a metal, metal plating, electroless plating or the like as in the formation of the colored pattern.

Further, in order to improve the peelability between the electrode 5 and the colored patterns 8R, 8G, 8B formed on the electrode 5, before the electrodeposition operation, the conductivity of the electrode 5 is not impaired. It is preferable that the electrode 5 is previously subjected to a peeling treatment. This peeling treatment may be a general peeling treatment with a surfactant, silicone or the like.

Instead of or in combination with the above-described peeling treatment, a peelable substance may be electrodeposited on the electrode 5 in advance, and then a colored pattern may be electrodeposited. Then, the peeling substance may be transferred together with the colored pattern onto the glass substrate 11, and then only the peeling substance may be dissolved and removed. Examples of the peelable substance include Ni, Cu, Ag,
Examples of the material include metals such as Sn and alloys.

The electrodeposited substrate 1 after the colored patterns 8R, 8G, 8B are transferred onto the glass substrate 11 to form the colored layer as described above can be used again. Therefore, once the electrodeposited substrate 1 is prepared like a printing plate, a series of operations including electrodeposition and peeling transfer can be repeatedly performed.

Next, the present invention will be described in more detail with reference to experimental examples. (Experimental example) A 100 μm thick stainless steel substrate (SUS304, H0.10 manufactured by Fujita Metal Co., Ltd.) was coated with a polyimide resin (Photo Nice manufactured by Toray Co., Ltd.) by a spin coating method and cured by heating (400 ° C.). To form a polyimide resin layer (thickness 0.8 μm).

Next, indium tin oxide (ITO) was deposited on the polyimide resin layer by a sputtering method to form a transparent conductive film having a thickness of 0.13 μm. Further, a photosensitive resist is applied on the transparent conductive film, and a transparent electrode (electrode width = 100 μm, electrode width = 100 μm, Electrode gap = 50
μm) was formed to obtain an electrodeposited substrate of the present invention.

For comparison, a polyester film (T coat SA40 manufactured by Teijin Ltd.) was used instead of the stainless steel substrate.
An electrodeposited substrate as a comparative example was obtained in the same manner as above except that ITO (thickness = 0.1 μm) was used as the conductive layer on the surface of −125, thickness = 125 μm).

On the other hand, an anion type electrodeposition material (Oligo-ED manufactured by Nippon Petrochemical Co., Ltd.) was diluted with pure water so that the residual solid content was 13.5% by weight, and 5% by weight of red pigment Pigment Red was added. % To prepare an electrodeposition solution for red pattern. Then, in the electrodeposition liquid, the transparent electrode was used as an anode and the platinum electrode was used as a cathode, and each of the above electrodeposition substrates was immersed so that the electrode interval was 30 mm. Only 10 selectively
A constant current of mA was applied for 60 seconds to carry out electrodeposition. Next, after washing the substrate taken out from the electrodeposition solution thoroughly with water,
It was dried for 10 minutes to form a red colored pattern having good transparency.

Next, an electrodeposition solution for green coloring pattern was prepared in the same manner as the above-mentioned electrodeposition solution for red coloring pattern except that green pigment phthalocyanine green was used in place of the red pigment. Then, the electrodeposition liquid for this green colored pattern was used to perform electrodeposition under the same conditions as the above-mentioned formation of the red colored pattern. Next, the substrate taken out from the electrodeposition liquid was thoroughly washed with water and then dried at 80 ° C. for 10 minutes to form a green colored pattern having good transparency.

Furthermore, a blue pigment phthalocyanine blue was used in place of the red pigment, and an electrodeposition solution for blue coloring pattern was prepared in the same manner as the above-mentioned electrodeposition solution for red coloring pattern. Then, electrodeposition was carried out using this electrodeposition liquid for blue colored pattern under the same conditions as the formation of the above red colored pattern. Next, the substrate taken out from the electrodeposition liquid was thoroughly washed with water and then dried at 80 ° C. for 10 minutes to form a blue colored pattern having good transparency.

Then, "I" was placed on a glass plate having a thickness of 1.1 mm.
NC-100 "(manufactured by Nippon Kayaku Co., Ltd.) and isobonyl acrylate (manufactured by Somar Co.) were mixed at a ratio of 1: 1 and a photoinitiator and a sensitizer were added in an amount of 2% by weight.
UV-curable primer with excellent glass adhesion film thickness 2
The spinner coating method was applied so that the thickness became μm. In the state where the primer surface of this glass substrate and the colored pattern of the electrodeposition substrate are in close contact with each other, ultraviolet rays are irradiated from the glass substrate side to cure the ultraviolet curable primer, and the electrodeposition substrate is peeled off, thereby performing electrodeposition. A colored pattern was transferred from the substrate onto the glass substrate to form a colored layer.

The accuracy of this colored pattern (change in the total pitch of the pattern with respect to the mask) is 1 μm or less in the case of using the electrodeposited substrate of the present invention, and 6 to 20 μm in the case of using the electrodeposited substrate for comparison. It was

Next, a photosensitive resist having the following composition was applied on the glass substrate on which the colored pattern was formed by the spin coating method (rotation speed = 1500 rpm), and then at 70 ° C.
After drying for 5 minutes, the photosensitive resist layer (thickness = 1μ
m) was formed. (Composition of photosensitive resist) -Polyvinyl alcohol 10% aqueous solution (Nippon Gosei Chemical's Gohsenal T-330) ... 20 parts by weight-Diazo resin 10% aqueous solution (Shinko Giken D-011) ... 20 parts by weight-Water ... 15 parts by weight Next, the photosensitive resist layer was exposed through a photomask for black matrix (line width = 50 μm). The light source for exposure was a super high pressure mercury lamp of 2 kW and 10
Irradiated for 2 seconds. Then, spray development was performed using water at room temperature and air drying was performed to form a relief for the black matrix between the colored layers.

Next, this glass substrate was placed at 150 ° C. and 30 ° C.
After heat treatment for 1 minute, an aqueous palladium chloride solution (Nippon Kanigen's Red Schumer) was spray-coated on the relief, washed with water and drained to give the relief as a catalyst-containing relief.

Thereafter, the transparent substrate is immersed in a nickel plating solution (nickel plating solution Top Chemialoy B-1 manufactured by Okuno Seiyaku Co., Ltd.) at 30 ° C. containing a boron-based reducing agent for 5 minutes, washed with water and dried to form a black matrix. I got a color filter.

Further, a liquid crystal display (LCD) was prepared using the obtained color filter and a color image was displayed. As a result, a good color image without color shift or bleeding was displayed.

[0034]

As described above in detail, according to the present invention, since the electrodeposition substrate is provided with the stainless substrate, the size of the electrodeposition substrate when the colored pattern formed by electrodeposition is transferred onto the transparent substrate. There is almost no change, and because the polyimide resin layer formed on one surface of the stainless steel substrate has high smoothness, the electrode formed on this polyimide resin layer also has high smoothness, which is highly accurate and highly smooth. It is possible to efficiently obtain a color filter.

[Brief description of drawings]

FIG. 1 is a schematic sectional view showing an electrodeposition substrate of the present invention.

FIG. 2 is a diagram for explaining an example of manufacturing the electrodeposition substrate of the present invention. It is a schematic sectional drawing of the liquid crystal display shown by FIG.

FIG. 3 is a diagram for explaining a transfer step in manufacturing a color filter using the electrodeposition substrate of the present invention.

[Explanation of symbols]

 1 ... Electrodeposited substrate 2 ... Stainless steel substrate 3 ... Polyimide resin layer 5 ... Electrode

Claims (1)

[Claims] 1. An electrodeposition comprising a stainless steel substrate, a polyimide resin layer formed on one surface of the stainless steel substrate, and an electrode formed in a predetermined pattern on the polyimide resin layer. substrate.