TW322530B - Manufacturing method of electro deposition transfer plates - Google Patents

Manufacturing method of electro deposition transfer plates Download PDF

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Publication number
TW322530B
TW322530B TW84106356A TW84106356A TW322530B TW 322530 B TW322530 B TW 322530B TW 84106356 A TW84106356 A TW 84106356A TW 84106356 A TW84106356 A TW 84106356A TW 322530 B TW322530 B TW 322530B
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Taiwan
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item
layer
patent application
film
conductive
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TW84106356A
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Chinese (zh)
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Bao-Ru Shieh
Shean-Guang Lin
Jiin-Chyuan Shieh
Jau-Wenn Niou
Wenn-Ru Lin
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Ind Tech Res Inst
Chi Mei Optoelectronics Corp
Toppoly Optoelectronics Corp
Prime View Int Corp Ltd
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Priority to TW84106356A priority Critical patent/TW322530B/en
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Publication of TW322530B publication Critical patent/TW322530B/en

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Abstract

A manufacturing method for electro deposition transfer plates includes: a. adhere a metal film on a plain base plate with glue A; b. produce lots of metal exposed elements in rows and columns and separates them with insulated films; c. dip a metal layer on those elements for pixel patterns; d. paint a photosensitive insulated film for all and make a conductive join on each; e. paint a layer of conductive metal film on the photosensitive insulated film; f. use the metal film to produce three insulated electro wires on each column; g. adhere the plate after f. process to the transfer base plate with glue B; h. get rid of the base plate of a., glue A and metal film and accomplish the product.

Description

A7 B7 322530 五、發明説明(i ) 發明背景 隨資訊科技之快速發展,顯示器技術亦不斷創新突破。體積小的 平面顯示器(flat panel display-FPD)已有逐漸取代傳統陰極射線映像管 之勢’而液晶顯示器(liquid crystal display-LCD)又居平面顯示器之領 導地位,因其具有重量輕,厚度薄、驅動電壓及耗電低等優點,且發 展迅速,近年更由於薄膜電晶體(thin film transistor) LCD的開發成 功’能提供高性能全彩色顯示,未來發展更不可限量。 多彩色(multi-cotor)或全彩色(fUllc〇t〇r)LCD需有色相及明暗兩 種控制機構、此等機構由高灰階黑白LCD、彩色濾光膜及背光 (backlighting)材料所控制,其中,彩色濾光膜更是控制色彩最重要的 技術。 目前製作彩色濾光膜已商品化之方法有以下五種: (1) 染色法(dyeing) (2) 触刻法(etching) (3) 顏料分散法(pigment deposition) (4) 電著法(electro deposition) (5) 印刷法(printing) 染色法及蚀刻法皆以染料爲主要技術。染料的種類多,色相均勻, 染色力高,且與樹脂搭配色彩濃度及穿透度均好,故向爲製作彩色濾 光膜用樹脂之主要著色料美國專利4 82〇 619及4 837 〇98即用染色 法。惟因染料耐光性及耐熱性均不佳,現已漸爲以顏料爲主要技術之 顏料耐分散法及電著法取代。後兩者可説是目前最熱門之方法。顏料 熱性較佳,其粒子分散於樹脂中,顆粒大小控制於0.2um以下,有優 良著色力。美國專利5,〇85,973、4,786,148及曰本專利申請公開昭 60-129739即用顏料分散法。此法用感光性光硬化型樹脂塗料,利用 本紙張尺度適用中國國宏拔A f u /___________ _________ 83. 3.10,( (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部中央揉準局貝工消費合作社印装 經濟部中央樣準局負工消費合作社印裝 322530 五、發明説明(2 ) 微影(lithography)製作TFT LCD用彩色濾光膜,解析度高、畫素(pixei pattern)配列方便靈活;但製程複雜,至少需三個光罩,必須重複精 準對位,偶一不愼,即影響良率,且樹脂硬化時有自由基反應,必須 覆蓋一層保護膜以隔絶空氣等爲其缺點。 電著法係將分散於水中之高分子及顏料等以電氣泳動方式附著 於圖案化的ITO(indium tin oxide)透明電極上以製成畫素。此法之優 點爲所製彩色濾光膜膜厚均勻,膜面平坦,適於製作細線路,且成本 方面亦較顏料分散法爲低。惟因電著法電著極板之設計,一般僅能用 於條紋(stripe)囷案之IT0透明電極,故僅適於製作STN LCD用彩 色濾光膜》 印刷法雖爲所有製法中成本最低者,但因其尺寸精度、平坦度及 可靠性均不佳,高級電子產品方面接受程度較低。 爲利用顏料分散法及電著法之優點並克服其缺點,日本油墨 (Nippon Paint)首先發展出電著微影轉印法(eD。美國專利 5,214,541即用此法。此法結合電著與微影二工程,利用一有三種以上 不同透光度區域的光罩,只需曝光一次即可得到不同程度的曝光區 域,再以不同顯影液將各光阻--剝除,並於其間依序電著紅、綠、 藍二畫素,最後再將完成之彩色濾光膜轉印至另一透明基板。此法優 點可歸納如下:(1)僅需曝光一次,只需一個光罩,不需重複精確對位 工程;(2)結合光阻工程可得較電著法更精細圖案;(3)畫素圖案配列自 由度大’條紋或非條紋圖案均可製作;(4)如同電著法,所得彩色遽光 膜膜厚均一、膜面平坦;(5)不需透明導電層,透光度不損失。但因剥 除光阻至少需用三種不同濃度之顯影液,操作條件較窄,光阻選擇較 難,且光阻和電著液之搭配亦受限制。同時,此法所製彩色濾光膜僅 能用一次,不論成敗,轉印一次後即不能再用、必須再從頭做起,故 本紙張尺度適用中國國家標準(CNS ) A々現格(21〇χ297公釐) 83. 3.10,000 (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部中央樣準局貝工消費合作社印製 322530 at --- - B7 五、發明説明(3 ) 微影、電著及轉印等各步驟必須L、並皆保持極高良率方能製 成品質良好的彩色濾光膜。 大曰本印刷株式會社之曰本公開專利申請平5-127010及平5-164913 ’根据上述之轉印特性發展出一種僅需一次精確製作即可重複 用以製作彩色濾光膜之電著轉印板,其突破性之電路設計可自由配列 畫素圖案’極適合製作TFT LCD所需之彩色濾光膜,惟缺點爲製程 繁雜’尤以用光半導體層做爲導通構件之製程包括曝光、電解還原等 步骤在整個製程中最爲複雜。光半導體層爲一有氧化鋅散佈其中之感 光樹脂層。光半導體層經曝光後才得暫時導電之特性,如使永久導 電,尚需將氧化鋅還原爲鋅金屬。於製程中,首先要利用一層圖案化 的光阻區隔導電及絶緣部份,再曝光,電解使還原爲黑色的鋅,再將 光阻除去方完成此一導電接績步驟,繁雜且麻煩。 此外,光半導體之製程尚有以下之考量:1.氧化鋅之渡度太高,則 導電接續層之強度不佳;太低,則解析度不佳、故常需漆加増感劑; 2.氧化鋅及樹脂之膨脹係數必須選擇相近者,以免引起尺寸變化致無 法導電之問題。 另外,大日本印刷之電著轉印板,其畫素與電著基板間需良好填 缝技術,且需抛光或磨平以合乎平坦之要求。不過,最大問題厥爲光 半導體層之技術,目前其解析度僅爲240 - 300 dpi(dots per inch),如 欲滿足目前彩色濾光膜之要求(20mm),恐尚有很長的路要走。 創作一種適用於製造STN或TFTLCD彩色濾光膜且製程較簡單 之製法實有必要。 本紙張尺度適用中國國家標準(CNS ) ΑΊ規格(21 〇 X 297公釐) 83. 3. !0,〇〇〇 (請先閲讀背面之注意事項再填寫本頁) 訂· --%· 322530 A7 _ B7 五、發明説明(4 ) 發明目的 本發明人因鑒於目前液晶顯示器用彩色濾光膜用電著轉印板之 製法之各項缺點,經長時間實驗研究,乃發明一改良之製法。 緣是’本發明之主要目的在發明一種可用以製作彩色濾光膜的電 著轉印板製程簡單之製造方法。 本發明之次一目的在創作一種製作彩色濾光膜用電著轉印板之 製造方法,所製轉印板可自由配列畫素圖案,適於製作STN或TFT LCD. 本發明之再一目的在創作一種製作彩色濾光膜用電著轉印板之 製造方法,可直接利用積醴電路(1C)微影技術,製作導通構件,解析 度可完全配合彩色濾光膜之要求。 本發明之又一目的在創作一種製作彩色濾光膜用電著轉印板之 製造方法,電著轉印板可重複使用,可大面積化、成本低廉。 本發明之詳細説明 爲使貴審查委員能更加了解本發明之實體内容、特徵及功效, 茲配合所附圖式詳細説明如后: (一)圖式部份 經濟部中央標準局貞工消費合作社印装 圖1.本發明之電著轉印板之製法之電著及轉印流程圖 圖2.本發明之電著轉印板製法之金屬皮膜裸露圖案 圖3.本發明之電著轉印板製法之導通點之圖案,即畫素圖案 圖4.本發明之電著轉印板製法之電著線路圖 ㈡圖號部份A7 B7 322530 V. Description of the invention (i) Background of the invention With the rapid development of information technology, the display technology has also continued to innovate and break through. The small flat panel display (FPD) has gradually replaced the trend of the traditional cathode ray tube, and the liquid crystal display (LCD) is the leader of the flat panel display because of its light weight and thin thickness. It has the advantages of low driving voltage and low power consumption, and has developed rapidly. In recent years, due to the successful development of thin film transistor LCDs, it can provide high-performance full-color displays, and the future development is even more limitless. Multi-color (multi-cotor) or full-color (fUllc〇t〇r) LCD needs to have two control mechanisms of hue and light and dark, these mechanisms are controlled by high grayscale black and white LCD, color filter and backlighting (backlighting) materials Among them, the color filter is the most important technology to control color. At present, there are five methods for making color filter films that have been commercialized: (1) dyeing (2) etching (3) pigment deposition (4) pigment deposition (4) electrowriting ( electro deposition) (5) Printing Dyeing and etching are based on dyes. There are many types of dyes, uniform hue, high dyeing power, and good color density and penetration with the resin. Therefore, the main coloring materials for resins used in making color filter films are US Patent Nos. 4 82〇619 and 4 837 〇98 Dyeing method is used. However, due to the poor light resistance and heat resistance of dyes, pigments are now gradually replaced by pigment dispersion methods and electro-authoring methods that use pigments as the main technology. The latter two are arguably the most popular method at present. Pigment has better thermal property, its particles are dispersed in resin, the particle size is controlled below 0.2um, and it has excellent color rendering power. U.S. Patent Nos. 5, 〇85,973, 4,786,148 and Japanese Patent Application disclose the ready-to-use pigment dispersion method of Sho 60-129739. This method uses a photosensitive photocurable resin coating, and the paper size is applicable to China Guohong A Fu / ___________ _________ 83. 3.10, ((Please read the precautions on the back before filling out this page). Industrial and consumer cooperative printing and printing 322530 printed by the Ministry of Economic Affairs Central Sample Bureau of the Consumer Labor Cooperative V. Description of the invention (2) Lithography to produce color filter films for TFT LCD with high resolution and arrangement of pixels (pixei pattern) Convenient and flexible; but the process is complicated, at least three masks are required, and it must be repeatedly and accurately aligned, occasionally, it affects the yield, and the resin has free radical reaction when it hardens, and it must be covered with a protective film to isolate the air from it. Disadvantages. The electro-authoring method is to attach polymers and pigments dispersed in water to the patterned ITO (indium tin oxide) transparent electrode by electrophoresis to make pixels. The advantage of this method is the color filter The film thickness is uniform, the film surface is flat, suitable for making thin circuits, and the cost is also lower than the pigment dispersion method. However, due to the design of the electric plate, the electric plate is generally only used for stripe (stripe) IT0 transparent electrode, so it is only suitable for making STN LCD color filter film. Although the printing method is the lowest cost among all manufacturing methods, but because of its poor dimensional accuracy, flatness and reliability, the acceptance of advanced electronic products Low. In order to take advantage of the pigment dispersion method and the electro-authoring method and overcome its shortcomings, Japan Ink (Nippon Paint) first developed the electrophotographic lithography transfer method (eD. US Patent 5,214,541 uses this method. This method combines In the second project, the use of a photomask with three or more different light transmittance areas, only need to be exposed once to get different exposure areas, and then use different developer to remove each photoresist-strip, and in During this period, red, green and blue pixels are sequentially printed, and finally the completed color filter is transferred to another transparent substrate. The advantages of this method can be summarized as follows: (1) Only one exposure is required, only one light is required The cover does not need to repeat the precise alignment project; (2) combined with the photoresist project can obtain a finer pattern than the electrographic method; (3) the pixel pattern can be arranged with a large degree of freedom, either striped or non-striped patterns; (4) Just like the electronic writing, the color is light The film thickness is uniform and the film surface is flat; (5) No transparent conductive layer is needed, and the light transmittance is not lost. However, at least three developer solutions with different concentrations are required for stripping the photoresist, the operating conditions are narrow, and the photoresist selection is difficult. In addition, the combination of photoresist and electro-hydraulic fluid is also limited. At the same time, the color filter made by this method can only be used once, regardless of success or failure, it can not be used again after transfer once, and it must be started from scratch. Applicable to China National Standard (CNS) A々 present grid (21〇297297) 83. 3.10,000 (please read the precautions on the back before filling out this page) Printed by the Ministry of Economic Affairs Central Bureau of Samples and Printing 322530 at ----B7 V. Description of the invention (3) Each step of lithography, electrophotography and transfer must be L and maintain a very high yield to make a good quality color filter. Based on the transfer characteristics described above, Yoshimoto Printing Co., Ltd. published the patent applications Hei 5-127010 and Hei 5-164913 'of the Yoshimoto Printing Co., Ltd. to develop an electrical transfer process that can be used repeatedly to make color filters Printed circuit board, its breakthrough circuit design can freely arrange pixel patterns, which is very suitable for making color filter film required for TFT LCD, but the disadvantage is the complicated process. Especially the process of using the optical semiconductor layer as the conductive member includes exposure, Steps such as electrolytic reduction are the most complicated in the entire process. The optical semiconductor layer is a photosensitive resin layer with zinc oxide dispersed therein. The photo-semiconductor layer is only temporarily conductive after being exposed. For permanent conductivity, zinc oxide needs to be reduced to zinc metal. In the manufacturing process, first use a layer of patterned photoresist to separate the conductive and insulating parts, then expose, electrolyze to reduce to black zinc, and then remove the photoresist to complete this conductive succession step, which is complicated and cumbersome. In addition, the process of optical semiconductors still has the following considerations: 1. Too high zinc oxide, the strength of the conductive connection layer is not good; too low, the resolution is not good, so often need to add lacquer sensitizer; 2. Oxidation The expansion coefficients of zinc and resin must be selected to avoid the problem of non-conduction due to dimensional changes. In addition, the electroprinting plate printed by Dainippon needs good sealing technology between the pixels and the substrate of the electrowork, and it needs to be polished or smoothed to meet the requirements of flatness. However, the biggest problem is the technology of the photo-semiconductor layer. Its resolution is currently only 240-300 dpi (dots per inch). If you want to meet the requirements of the current color filter (20mm), there is still a long way to go go. It is necessary to create a method that is suitable for manufacturing STN or TFTLCD color filters and has a relatively simple process. This paper scale is applicable to the Chinese National Standard (CNS) ΑΊ specification (21 〇X 297 mm) 83. 3.! 0, 〇〇〇 (please read the precautions on the back before filling out this page) Order ·-% · 322530 A7 _ B7 V. Description of the invention (4) Purpose of the invention The present inventors have invented an improved manufacturing method after a long period of experimental research in view of the shortcomings of the current manufacturing method of the electrotransfer printing plate for color filters for liquid crystal displays . Fate is' The main purpose of the present invention is to invent a manufacturing method that can be used to make a color filter film with a simple manufacturing process. The second object of the present invention is to create a method for manufacturing a color filter film electrotransfer transfer plate, the transfer plate can be freely arranged pixel patterns, suitable for making STN or TFT LCD. Another object of the present invention In the creation of a manufacturing method for the production of electrophotographic transfer plates for color filter films, the lithography technology of the integrated circuit (1C) can be directly used to produce the conducting member, and the resolution can fully meet the requirements of the color filter film. Another object of the present invention is to create a method for manufacturing an electrographic transfer plate for color filter films. The electrographic transfer plate can be reused, can be enlarged in size, and has low cost. The detailed description of the present invention is to enable your reviewing committee to better understand the physical content, features and effects of the present invention. The detailed descriptions are as follows in conjunction with the attached drawings: (1) Part of the drawing Printed Figure 1. Electric copying and transfer flow chart of the method of the present invention for electric transfer printing plate Figure 2. Exposed pattern of the metal film of the electric transfer plate manufacturing method of the present invention Figure 3. The electric transfer of the present invention The pattern of the conduction point of the board manufacturing method, that is, the pixel pattern. Figure 4. The circuit diagram (part number) of the electric work of the electric book transfer method of the invention

1.PET平面基板 2.黏膠A 83.3.10,000 (請先聞讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 5 經濟部_央揉準局負工消費合作社印製1. PET flat substrate 2. Adhesive A 83.3.10,000 (please read the precautions on the back and then fill out this page) This paper size is applicable to China National Standard (CNS) A4 specification (210X297mm) 5 Ministry of Economic Affairs_Central Printed by the quasi-bureau consumer labor cooperative

322530 五、發明説明(5 ) 2.金屬皮膜 5.金屬皮裸露膜面 7.感光絶緣層 9·金屬膜層 11.黏膠B 13.離型劑 17.黏膠C A7 B7 4.光阻 6.電著極板 8.導電接點小孔洞 10.導線 12.轉印基板 14.15.16.電著之畫素 18.玻璃板 本發明製作彩色濾光膜之電著轉印板製造方法包括下列步驟: 1. 於一平面基板(1)上以一熱熔膠黏膠A(2)黏附一層金屬皮膜(3)。平3 基板材質爲聚對苯二平酸乙二g旨(poly ethylene terephthalate-PET); 金屬皮膜爲銅箔、鋁箔或錫箔。 2. 於金屬皮膜上塗以光阻劑⑷並顯影開階,以製出眾多行列整齊並相 露該金屬皮膜之小裸露面(5)如圖1②及圖2所示。 3. 於該等小裸露面(5)上電鍍一層與金屬皮膜(3)不同之金屬⑹,如寿 或其合金,此等電鍍金屬層係爲電著極板(畫素)(pixel pattem(6 用)。選擇不同之電著金屬在防止於最後將金屬皮膜除去時,亦將成 電鍍金屬除去。 4. 於電著極板及留下之光阻部份上,以旋轉塗佈法(Spinc〇ating)或滚 筒塗佈法(roller coating)全面塗佈一層均勻的感光絶緣層⑺再經曝 光及顯像以於每一電著極板面上製出一小孔洞(8),洞底爲裸露之電 著極板面(6),此等小孔洞將做爲將於感光絶緣層⑺上製作之導線 (1〇)與電著極板(6)間之導電接點⑻(via hole) 〇此等導電接點可在該 等電著極板(6)較長一方之左、中、或右部,且同一行或同一列之電 著極板之導電接點之位置依序在電著極板之左、中及右部,週而復 始如,圖1④及圖3所示。 本紙張从適财關家鮮(⑽)A4^ (21Qx297公着) f----.--------------、玎------線' (請先閲讀背面之注意事項再填寫本頁) 83. 3.1〇,〇〇〇 322530 A7 B7 五、發明説明(6 ) ' ~~~~~~~~ 5. 於感光絶緣層⑺上全面塗佈一金屬膜層(9)。可以化學沉積法塗佈線 或銅,或以蒸鍍法或濺鍍法塗佈金、銅、鉻或鎳等。此層金屬膜可 直接用以蝕刻導線(10),或爲增加導電性,亦可於其上再塗佈以第 二層金屬膜,第二層金屬膜可以電鍍法塗佈之》 6. 於金屬膜層上塗佈一層光阻劑,再經曝光顯影,並以蚀刻液蚀去多 餘的金屬部份,僅於每一電著極板(6)下留下三條抗蝕刻的導線 (10) ’此三條導線中有一條導通一電著極板之導電接點⑻,如圖4 及圖1所示。此三條導線爲一組電著用導線回路,至此,立體配線 完成。導線上之光阻可除去,亦可不必除去。 7. 以黏膠B(ll)將PET平面基板⑴連同導線(1〇)等黏貼於一轉印基板 (12)。轉印基板(12)可爲PET或不銹鋼片;黏膠B爲熱硬化型。黏 貼好之轉印基板(12)以熱烤硬化使結合之。再將熱熔膠a (2)溶掉並 將平面基板(1)除去。並將殘留之黏膠以溶劑去掉。 8. 以蝕刻液將金屬皮膜除去,露出一表面平整之電著轉印基板,此時 電著轉印板已完成。 9. 於電著轉印板上先塗一層離型劑,再進行紅、綠、藍三色電著(14, 15,16)。一般電著條件:電壓:l〇-i〇〇v ;時間:5-180秒,可鍍出 1-3 um膜厚。電著液之組成以水溶性陰離子型樹脂爲例含:陰離子 型樹脂、中和劑、少量溶劑及分散其中之顏料如pigmentred 177, Blue 15:3及Green 7。電著完畢之電著轉印板直接與塗有光硬化型 樹脂(黏膠C)(17)之玻璃(18)板黏合。 10. 將電著轉印板及玻璃板壓合,以紫外線曝光硬化後將轉印板剝離 後、紅、綠、藍三色(14、15、16)轉印即完成。黏膠C之曝光能 量約爲100 mJ/cm2,厚度在lum左右。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之拄意事If再镇寫本耳j -T . 、-0 經濟部中央標準局貝工消費合作社印装 83. 3.10,000 A7 ______ B7 五、發明説明(7 ) 實施例 在一 3〇0 X 3〇Omm,厚4 mil之PET平面基板⑴上,以熱熔膠 黏膠A(2)將一同大之銅箔(3)黏壓。再以負型光阻劑塗佈其上,經光罩 曝光顚影,以製出畫素圖案,將部份銅面棵露,於此等裸露銅面(畫素 圖案)上電鍍鎳作爲轉印用之電著極板⑹,極板大小爲3〇〇 X 1〇〇脚。 於將光阻層剝除後,旋轉塗佈一層感光性壓克力樹脂做爲感光絶緣 膜,膜厚25 am。經曝光顯影於每一電著極板面上製出一導電接點 ⑻。再以化學沉積法於感光絶緣層⑺上全面塗佈一金屬鎳薄膜,次於 此鎳膜上電鍍以銅,另於此銅膜上塗佈一層光阻劑,再蚀刻出電著用 導線迴路(10)。以氧化鐵溶液蚀去導線以外之銅及鎳部份,立體配線 即完成。以一熱硬化型黏膠將PET平面基板(1)連同導線(10)等黏貼於 -PET轉印基板(12)上,以200 1〇烤20分鐘,黏膠B受熱固化,轉 印基板(12)黏貼牢固’黏膠A(2)則受熱熔化,PET板(1)可輕易剝除。 再以二氣甲燒溶劑洗去殘餘熱黏膠A(2),最後再以過硫酸納溶液蝕去 銅箔(3),即呈現一表面平整之電著轉印基板。 (請先閲讀背面之注意事項再填寫本頁)322530 V. Description of the invention (5) 2. Metal film 5. Bare metal film surface 7. Photosensitive insulating layer 9. Metal film 11. Adhesive B 13. Release agent 17. Adhesive C A7 B7 4. Photoresist 6. Electrode electrode plate 8. Small holes of conductive contacts 10. Wire 12. Transfer substrate 14.15.16. Pixels of electrowork 18. Glass plate The manufacturing method of the electrotransfer plate for making color filter in the present invention includes The following steps: 1. Adhere a layer of metal film (3) on a flat substrate (1) with a hot-melt adhesive A (2). Flat 3 The substrate material is poly terephthalate-PET (polyethylene terephthalate-PET); the metal film is copper foil, aluminum foil or tin foil. 2. Apply photoresist ⑷ on the metal film and develop it to develop a series of small exposed surfaces (5) as shown in Fig. 1② and Fig. 2 in order to expose the metal film. 3. Plating a layer of metal different from the metal film (3) on these small exposed surfaces (5), such as Shou or its alloys, these electroplated metal layers are electroplated plates (pixels) (pixel pattem (pixel) 6). Choose different electroplating metals to prevent the electroplated metal from being removed when the metal film is finally removed. 4. Spin coating method is applied on the electroplating electrode plate and the left photoresist part ( Spincoating) or roller coating (roller coating) coating a uniform layer of photosensitive insulating layer ⑺ and then exposed and developed to make a small hole (8) on the surface of each electrode plate, the bottom of the hole is The exposed electrode plate surface (6), these small holes will be used as conductive contacts ⑻ (via hole) between the wire (1〇) to be made on the photosensitive insulating layer ⑺ and the electrode plate (6) 〇These conductive contacts can be in the left, middle, or right part of the longer side of the electric plates (6), and the positions of the conductive contacts of the electric plates in the same row or column The left, center, and right parts of the plate are repeated, as shown in Figure 1④ and Figure 3. This paper is from Shicaiguanjiaxian (⑽) A4 ^ (21Qx297 public) f ----.---- ----------,玎 ------ 线 '(Please read the precautions on the back before filling in this page) 83. 3.1〇, 〇〇〇322530 A7 B7 V. Description of the invention (6)' ~~~~~~~~ 5 . A metal film layer (9) is coated on the photosensitive insulating layer ⑺. The wire or copper can be coated by chemical deposition, or gold, copper, chromium or nickel can be coated by evaporation or sputtering. This layer The metal film can be used to etch the wire (10) directly, or to increase the conductivity, it can also be coated with a second metal film on it. The second metal film can be coated by electroplating. 6. On the metal film A layer of photoresist is coated on the layer, and then exposed and developed, and the excess metal part is etched away with an etching solution, leaving only three anti-etching wires (10) under each electric plate (6). One of the three conductors leads to a conductive contact ⑻ of an electric plate, as shown in Figure 4 and Figure 1. The three wires are a group of wire loops for electric writing, and the three-dimensional wiring is completed. The photoresist on the wire can be It is not necessary to remove it. 7. Use PET B (11) to stick the PET flat substrate (1) together with the wires (10) to a transfer substrate (12). The transfer substrate (12) can be PET or stainless steel sheet ; Adhesive B is a thermosetting type. The transferred transfer substrate (12) is bonded by heat baking and hardening. Then dissolve the hot melt adhesive a (2) and remove the flat substrate (1). The adhesive is removed with a solvent. 8. Remove the metal film with an etching solution to expose a flat surface electrotransfer substrate. The electrotransfer substrate is now complete. 9. Apply a layer of paint to the electrotransfer substrate Forming agent, and then red, green, and blue three-color electric writing (14, 15, 16). General electric writing conditions: voltage: l〇-i〇〇v; time: 5-180 seconds, can be plated 1-3 um film thickness. The composition of the electro-hydraulic fluid is based on water-soluble anionic resin as an example: anionic resin, neutralizing agent, a small amount of solvent and pigments dispersed therein such as pigmentred 177, Blue 15: 3 and Green 7. The electrotransfer transfer plate after electro-composition is directly bonded to the glass (18) plate coated with light-curing resin (adhesive C) (17). 10. Press the transfer plate and glass plate together, peel off the transfer plate after UV exposure and hardening, and then transfer the red, green, and blue colors (14, 15, 16). The exposure energy of adhesive C is about 100 mJ / cm2, and the thickness is about lum. This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the back of the matter first and then write the ear j -T., -0 Printed by Beigong Consumer Cooperative, Central Bureau of Standards, Ministry of Economic Affairs 83 . 3.10,000 A7 ______ B7 5. Description of the invention (7) The embodiment is on a PET flat substrate 1300 × 300 mm, thickness 4 mil, with hot-melt adhesive A (2). The copper foil (3) is pressed. Then it is coated on it with a negative photoresist, and the shadow is exposed through a photomask to produce a pixel pattern, and part of the copper surface is exposed. On these bare copper surfaces (painting) Element pattern) is electroplated with nickel as the transfer electrode plate ⑹, the size of the electrode plate is 300 × 100 feet. After the photoresist layer is stripped off, a layer of photosensitive acrylic resin is spin coated It is a photosensitive insulating film with a thickness of 25 am. After exposure and development, a conductive contact ⑻ is made on the surface of each electrode plate. Then a metal nickel film is coated on the photosensitive insulating layer ⑺ by chemical deposition, second The nickel film is electroplated with copper, and a layer of photoresist is coated on the copper film, and then the electric wire circuit (10) is etched. The iron oxide solution is used to etch away For other copper and nickel parts, the three-dimensional wiring is completed. Use a thermosetting adhesive to stick the PET flat substrate (1) together with the wires (10) and the like to the -PET transfer substrate (12) and bake at 200 1〇 After 20 minutes, the adhesive B is cured by heat, and the transfer substrate (12) is firmly adhered. The adhesive A (2) is heated and melted, and the PET board (1) can be easily peeled off. Then the residual thermal adhesion is washed away with a two-gas solvent. Glue A (2), and finally etch away the copper foil (3) with sodium persulfate solution, which presents a flat surface of the electro-transfer substrate. (Please read the precautions on the back before filling this page)

,tT 經濟部中央樣準局貝工消費合作社印裝 本例所用之各種材料及其組成配方如下: (1)熱熔膠A —重量平均分子量約爲3〇〇〇的壓克力樹脂 單體 重量比例 Acrylic acid 13 Butyl acrylate 60 Methyl methacrylate 27 Methyl ethyl Ketone 67 (2)光阻一壓克力負型光阻 組成物 重量比例 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 83. 3.10,000 322530 五、發明説明(8) Novolac epoxy acrylate A* 100 1,6、Hexadiol diacrylate 30 (曰本化學株式會社) Irgacure-651 (Ciba-Geigy Inc.) 10 Cellosolve acetate 60 *爲酚醛環氧樹脂(ECN I2",Ciba-Geigy產品),與丙稀酸 (acrylic acid)及酸Sf(phthalic anhydride)之合成產物,三者舍 量比爲 1:1.05:0.60 (3)感光絶緣膜一感光性壓克力樹脂組成物 經濟部中央標準局負工消費合作社印製 組成物 重量比例 Novolac epoxy acrylate 100 1,6-Hexadiol diacrylate 20 (曰本化蔡株式會社) Irgacure-907 10 (Ciba-Geigy Inc 產品) Epon 82.8 20 BaSo4 50 Cellosolve acetate 47 黏膠B —熱硬化型樹脂組成物 組成物 重量比例 EPON 828 100 Tetra Hydrophthalic Anhydride 10 Dimethyl benzylamine 2 硬化條件:150 eC,30分鐘;厚度:25um (5)電鍍液之配製 本紙張尺度逋用中國國家標準(CNS ) A4说格(210X297公釐) 83* 3. !0,〇〇〇 L---^---.-----------訂------線 / {請先閲讀背面之注項再填寫本頁) A7 B7 五、發明説明(9 ) 鎳電鍍液組成物g/e 銅電鍍液組成物! NiSo4.6H2〇 330 CuS04 · 51^0 NiCl2.6H2〇 45 邱04 H3BO3 38 H20 電鍍條件 陽極 Ni/Cu 極板距離 10cm 電流 3A 電壓 1.8v 時間 5-10分鐘 240 35 (請先閲讀背面之注意事項再填寫本頁) (6)化學沉積鎳一按預活化、活化、加速及沉積(還原)等4步驟,各 溶液配製如下: (1) 預活化 組成 彳-1 PD-472 240g (Electrochemicals,Inc.產品) HC^ 35c.c. D.I.H2〇 操作條件:25-50 1C,2分鐘 (2) 活化 組成 c-473 40C.C. (ElectrochemicalSjInc.) PD-472 240g 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 10 訂 線f 經濟部中央標準局員工消費合作社印裝 83. 3.10,000 A7 B7 822530_ 五、發明説明(〗〇 ) HCl 35c.c, tT The Ministry of Economic Affairs, Central Bureau of Standards, Pui Kong Consumer Cooperative printed the various materials used in this example and their composition formulas are as follows: (1) Hot melt adhesive A-acrylic resin monomer with a weight average molecular weight of about 3,000 Weight ratio Acrylic acid 13 Butyl acrylate 60 Methyl methacrylate 27 Methyl ethyl Ketone 67 (2) Weight ratio of photoresist-acrylic negative photoresist composition This paper scale is applicable to China National Standard (CNS) A4 specification (210X297mm) 83 3.10,000 322530 V. Description of the invention (8) Novolac epoxy acrylate A * 100 1,6, Hexadiol diacrylate 30 (Nippon Chemical Co., Ltd.) Irgacure-651 (Ciba-Geigy Inc.) 10 Cellosolve acetate 60 * It is a phenolic ring Oxygen resin (ECN I2 ", product of Ciba-Geigy), synthetic product with acrylic acid and acid Sf (phthalic anhydride), the ratio of the three is 1: 1.05: 0.60 (3) photosensitive insulating film 1 Photosensitive acrylic resin composition The weight ratio of the composition printed by the Consumer Labor Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs Novolac epoxy acrylate 100 1,6-Hexadiol diacrylate 20 (Nippon Chemical Co., Ltd.) Irgacure-907 10 (product of Ciba-Geigy Inc) Epon 82.8 20 BaSo4 50 Cellosolve acetate 47 Viscose B—weight ratio of thermosetting resin composition EPON 828 100 Tetra Hydrophthalic Anhydride 10 Dimethyl benzylamine 2 Hardening conditions: 150 eC, 30 Min; Thickness: 25um (5) Preparation of electroplating solution This paper scale uses the Chinese National Standard (CNS) A4 said grid (210X297mm) 83 * 3.! 0, 〇〇〇L --- ^ ---. ----------- order ------ line / (please read the notes on the back before filling in this page) A7 B7 5. Description of the invention (9) Nickel plating solution composition g / e Copper plating solution composition! NiSo4.6H2〇330 CuS04 · 51 ^ 0 NiCl2.6H2〇45 Qiu 04 H3BO3 38 H20 Electroplating conditions anode Ni / Cu plate distance 10cm current 3A voltage 1.8v time 5-10 minutes 240 35 (please Read the precautions on the back and then fill out this page) (6) Electroless nickel deposits are pre-activated, activated, accelerated and deposited (reduced) in 4 steps. Each solution is prepared as follows: (1) Pre-activated composition 彳 -1 PD- 472 240g (Electrochemicals, Inc. product) HC ^ 35c.c. DIH2〇 Operating conditions: 25-50 1 C, 2 minutes (2) Activated composition c-473 40C.C. (ElectrochemicalSjInc.) PD-472 240g The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 10 Threading f Ministry of Economic Affairs Central Standards Bureau Printed by employee consumer cooperatives 83. 3.10,000 A7 B7 822530_ V. Description of invention (〗 〇) HCl 35c.c

D.I.I^O 操作條件:25-50 eC 6.5分鐘 3)加速 A-474 (Electrochemicals Inc.產品)70C.C.配成 Η 之水洛 液,靜置4分鐘D.I.I ^ O Operating conditions: 25-50 eC 6.5 minutes 3) Accelerate A-474 (Electrochemicals Inc. product) 70C.C. formulated as a hydrochloride solution of Η and let stand for 4 minutes

4)沉積 組成物 Φ 檸檬酸納 11.25 次亞鱗酸鈉 6 NiCl2 · 61^0 5.25 NH4C1 7.5 操作時,pH値應控制於8-9間 ,溫度 30-40 eC 實施例2 與實施例1所用材料相同。於一 300 X 300mm之PET板上,以 黏膠A將銅箔平整黏貼。以光阻及蝕刻棵露出相同之電著極板(畫素) 圖案,再於其上電鍍鎳做爲轉印板之電著極板,再上一層感光絶緣 膜,同樣做出導電接點。然後全面濺鍍一層金薄膜,再於其上電鍍一 層銅金屬膜。次以光阻作爲抗蚀刻劑以製作導線,再以過硫酸鈉蝕刻 掉導線以外之銅膜;金層則用硝酸及鹽酸(丨/3)之混合溶液蝕刻掉。最 後’亦以黏膠B將PET平面基板連同導線等黏貼於一不銹鋼片,以 200 "C熱熔化黏膠A剝除PET平面基板,並將殘留之黏膠A洗去, 再以過硫酸鈉嫁液將表面之銅箔蚀去,一張表面平整之電著轉印基板 即完成。 ( CNS ) A4^f^- ( 21〇ν?〇7Λ\«-、 --------- (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部中央標準局貝工消費合作社印裝 83. 3.10,000 A7 B7 五、發明説明(1 1 應用例1 應用電著轉印板製作彩色濾光膜 利用實施例1及2製得之電著轉印板,依下列步骤製作彩色遽光 膜 r-> 電 著 清 洗 烘 乾4) Deposition composition Φ sodium citrate 11.25 times sodium squamous sodium 6 NiCl2 · 61 ^ 0 5.25 NH4C1 7.5 During operation, the pH value should be controlled between 8-9, the temperature 30-40 eC used in Example 2 and Example 1 The material is the same. On a 300 X 300mm PET board, use adhesive A to flatly paste the copper foil. Using photoresist and etching to expose the same pattern of the electroplating plate (pixel), then electroplating nickel on it as the electroplating plate of the transfer plate, and then applying a layer of photosensitive insulating film to make conductive contacts. Then, a layer of gold film was sputtered all over, and then a layer of copper metal film was plated on it. The photoresist is used as an anti-etching agent to make the wire, and then the copper film other than the wire is etched with sodium persulfate; the gold layer is etched with a mixed solution of nitric acid and hydrochloric acid (丨 / 3). Finally, the PET flat substrate together with the wires and the like are adhered to a stainless steel sheet with adhesive B, and the PET flat substrate is peeled off with 200 " C hot melt adhesive A, and the residual adhesive A is washed away, and then persulfated The sodium doping solution etched away the copper foil on the surface, and a flat surface electrotransfer substrate was completed. (CNS) A4 ^ f ^-(21〇ν? 〇7Λ \ «-, --------- (please read the precautions on the back before filling out this page) Order the consumption of shellfish by the Central Bureau of Standards of the Ministry of Economic Affairs Cooperative printing 83. 3.10,000 A7 B7 V. Description of the invention (1 1 Application example 1 Application of electro-transfer transfer plate to make color filter film The electro-transfer transfer plate made in Examples 1 and 2 is produced according to the following steps Color Yunguang film r- > Electric washing and drying

黏膠C 黏 合 曝 光 轉 印 熱烤 重複二次以電著紅綠藍三次 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央橾準局貞工消費合作社印裂 以陰離子型電著液爲例,紅綠藍三色之電著液組成如下單位:克) 組成物 紅 綠 藍 電著條件 Anionic binder** 100 100 100 電流1A Triethylamine (80%的中和量) 電壓20V EP828 20 20 20 時間120秒 Butyl Cellosolve 60 60 60 厚度2 n-butanol 40 40 40 D.I. water C.I.pigment Red 177 60 C.I.pigment Green 7 70 C.I.pigment Blue 15:3 50 ^Anionic binder爲一種陰離子壓克力樹脂,其成份爲: Methyl Methacrylate 20 Acrylic acid 20 Hydroxy ethyl acrylate 30 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) 線ί 83. 3.10,000 A7 B7 30 五、發明説明(1 2 ) Ethyl acrylate Cellosolve acetate 先將電著基板塗一層非常薄的離型劑 ,KF-96(日本信越公司產 品),再經對應之導線將紅、綠、藍三色電著於電著轉印基板上,然後 使此轉印基板與塗有光硬化型樹脂(黏膠c)之玻璃片(300 X 300 X 1.1mm)密合接著,經曝光硬化後,將電著基板剝離,轉印即完成,黏 膠C組成爲: 組成物 重量比例 Novolac epoxy acrylate A 100 1.6-Hexandiol diacrylate (曰本化藥株式會社產品) 30 Irgacure-651 10 (Ciba-Geigylnc.產品) Epon 828 30 曝光能量约爲100mJ/cm2,厚度爲lmm左右。 (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部中央標準局M3;工消費合作社印製 鑒於上述,本發明之彩色濾光膜用電著轉印板之製法製程簡單 不用光半導體改用普通金屬做導通構件(等線及導電接點)減少很多步 驟’且製作基板時’先從轉印板面著手,板面較平整,幾乎不需磨光, 更不用以環氧樹脂填缝,且同樣可自由配列電著極板(畫素)圖案,極 適合STN及TFT LCD所需之彩色滅;光膜。以本發明製法製作之電著 轉印板僅需一次精準製作,即可無限次用以重複製作彩色濾光膜,具 有實用償値,合於發明專利之條件,爰提出申請。 又有待言者,凡依本發明申請專利範固之特徵及精神所做之各種 變化及修飾皆應仍屬本發明涵蓋之範園。 線/ 匕紙張尺度適用中國國家標準(CNS ) A4規格(210X297公董) 13 83. 3.10,000Adhesive C, adhesive exposure, heat transfer, baking twice, red, green and blue three times (please read the precautions on the back before filling this page). For example, the red, green, and blue electro-hydraulic composition is as follows: g) Composition red-green-blue electro-hydraulic conditions Anionic binder ** 100 100 100 Current 1A Triethylamine (80% neutralization amount) Voltage 20V EP828 20 20 20 Time 120 seconds Butyl Cellosolve 60 60 60 Thickness 2 n-butanol 40 40 40 DI water CIpigment Red 177 60 CIpigment Green 7 70 CIpigment Blue 15: 3 50 ^ Anionic binder is an anionic acrylic resin, its composition is: Methyl Methacrylate 20 Acrylic acid 20 Hydroxy ethyl acrylate 30 This paper scale is applicable to the Chinese National Standard (CNS) Α4 specification (210Χ297mm) Line 83. 3.10,000 A7 B7 30 V. Description of invention (1 2) Ethyl acrylate Cellosolve acetate First Apply a very thin layer of release agent, KF-96 (product of Shin-Etsu Corporation, Japan) to the electric substrate, and then turn the red, , Blue tri-color electro-coated on the electro-transfer transfer substrate, and then the transfer substrate and the glass plate (300 X 300 X 1.1mm) coated with photo-curable resin (adhesive c) are closely adhered and then cured by exposure After that, the substrate is peeled off and the transfer is completed. The composition of adhesive C is: Composition weight ratio Novolac epoxy acrylate A 100 1.6-Hexandiol diacrylate (product of Yoshimoto Chemical Co., Ltd.) 30 Irgacure-651 10 (Ciba-Geigylnc . Product) Epon 828 30 exposure energy is about 100mJ / cm2, thickness is about lmm. (Please read the precautions on the back and then fill out this page) Order M3 of the Central Bureau of Standards of the Ministry of Economic Affairs; printed by the Industrial and Consumer Cooperative Society Using ordinary metal as the conducting member (isoline and conductive contacts) reduces many steps 'and when making the substrate', start with the transfer plate surface, the plate surface is smooth, almost no polishing, and no need to fill the gap with epoxy resin , And can also freely arrange the electric plate (pixel) pattern, which is very suitable for the color extinction and light film required by STN and TFT LCD. The electrographic transfer plate produced by the manufacturing method of the present invention only needs to be accurately manufactured once, and can be used to repeatedly make color filter films infinitely. It has practical compensation and meets the conditions of the invention patent. It remains to be said that all changes and modifications made according to the characteristics and spirit of the patent application of the present invention should still fall within the scope of the invention. The line / dagger paper scale applies the Chinese National Standard (CNS) A4 specification (210X297 company director) 13 83. 3.10,000

Claims (1)

Α8 322530 塁 六、申請專利範圍 申請專利範園: 1. 一種製作彩色濾光膜用電著轉印板之製法,包括下列步骤: a. 於一平面基板上,以黏膠A黏附一層金屬皮膜; b. 於該金屬皮膜上製作眾多行列整齊之該金屬小裸露面,各該小棵 露面間皆以絶緣膜間隔開; c. 於該等小裸露面上電鍍一層金屬作爲電著極板用; d. 全部塗佈一層感光绝緣膜,並於每一電著極板上製作一裸露該電 鍍金屬層之導電接點; e. 於該感光絶緣膜上塗佈一導電金屬層; f·利用該導電金屬層,於每一行電著極板上製作三條彼此絶緣之電 著用導線; g. 將上述已完成電著用導線之板子以黏膠B黏貼於一轉印基板上; 及 h. 將a之平面基板、黏膠A及金屬皮膜除去,即得一彩色濾光膜用 .電著轉印板。 2. 如申請專利範固1所述之製法,其中,a項中該平面基板之材質爲 聚對苯二甲酸乙二酯。 3. 如申請專利範圍1所述之製法,其中,a項中該黏膠A爲一種熱熔 膠。 4·如申請專利範園1所述之製法,其中,a項中該金屬皮膜可爲銅箔、 鋁箔或錫箔。 5_如申請專利範圍1所述之製法,其中,b項所述之眾多小棵露面係 於該金屬皮膜上塗以光阻再顯影而成。 6.如申請專利範圍1所述之製法,其中,c項所述之電鍍金屬可爲鎳 或其合金。 本紙張尺度適用中囷國家揉準(CNS ) Α4规格(21〇X297公釐) 14 (請先閲讀背面之注意事項再填寫本頁) -β 經濟部中央標準局貝工消費合作社印裝 經濟部中央標準局爲工消費合作社印裝 32253 __ 、、:碕專利範園 申請專圍1所述之製法,其中,d項所述每-電著極板上之 δ電接點,係將該感光絶緣膜曝光並顯影而裸露得之。 如申請專固丨所述之製法,其中,d項所述之感光绝緣膜爲壓 克力樹脂組成物,負型,膜厚20_40um。 如申請專利範81 1所述之製法’其中,e項所述電鍍之金屬屠與a $所述之金屬皮膜爲不同之金屬。 〇.如申請專利範g〗酿之製法,其中,0舰之導電金屬層爲利 用化學沉積法的無電銅或無電鎳。 L如申請專利顧1所述之製法,其中,e項所述之導電金屬層包含 二層’第-層爲化學沉積之金屬層,第二層爲電鍵之金屬層。 12·如申請專利侧1所述之導電金騎,其中,第—層爲銅或鎳,第 =層爲銅。 13. 如申請專利侧丨所述之製法,其中,e項所述之導電金屬層係以 蒸鍍或滅鍍方法製成。 14. 和申請柄範園1所述之方法,其巾導電金騎細、金路或鍊。 15. 如申請專利範園丨所述之方法,其中,e項所述之導電層包含二 層,第一層爲濺鍍金屬層,如銅、金、鉻或鎳;第二層爲電鍍銅。 16. 如申請專利範園1鱗之方法,其中,d;^之感光絶緣膜係以 旋轉塗佈法或滾筒塗佈法塗佈於電著極板上。 17. 如申請專範固1所述之方法,其中,d項之該電著極板爲長方形, 該導電接點可在該電著極板較長一方之左、中、或右部、且同一行 或同一列之電著極板之導電接點之位置依序在電著極板之左、中或 右部’週而復始。 18. 如申請專利範園1所述之方法,其中,f項所述之電著用導線係於 該導電金屬層上塗一層光阻後再顯影及触刻而成。 匕紙張尺度適用中國國家標準(€呢)八4規格(210><297公釐) 15 .-----:--,--------訂------線一. (請先閱讀背面之注意事項再填寫本I) r^53〇_ ί 、' 範圍 ~^ . ~^ 19·如申請專利範固i所述之方法’其中,f項所述之三條電著用導線 分别連通同一行電著極板之左、中、或右部之導電接點。. 冰如申請專利範圍1S所述之方法,其中,關後遺留之光阻可除去, 亦可不除去。 ’ 21.如申請專利軸5或18所述之方法,其中,·之光阻爲負型, 膜厚爲10-30mn。 迕如申請專目丨_之方法,其巾,g項触之轉B爲熱硬 化型接著劑。 23.如申請專利範圍i所述之方、法,其中,g項所述之轉祕板可爲聚 對苯二甲酸乙二醏(PET)或不銹鋼板。 (請先閲讀背面之注意事項再填离本頁) 訂 線ί 經濟部中央標率局員工消費合作社印製 一張 -紙 本 適 準 榡 ί家 一规 一釐 公 7 9 2Α8 322530 塁 六. The scope of the patent application for the patent fan garden: 1. A method for making a color filter film electrotransfer transfer board, including the following steps: a. On a flat substrate, a layer of metal film is adhered with adhesive A B. On the metal film, many small rows of small exposed surfaces of the metal are neatly arranged, and each exposed surface of the small tree is separated by an insulating film; c. A layer of metal is electroplated on the small exposed surfaces as an electrode plate D. Coat a layer of photosensitive insulating film all over, and make a conductive contact exposing the electroplated metal layer on each electrode plate; e. Coat a conductive metal layer on the photosensitive insulating film; f · Using this conductive metal layer, three electrically insulated wires that are insulated from each other are produced on each row of electrically-charged electrode plates; g. The board on which the electrically-charged wires have been completed is adhered to a transfer substrate with adhesive B; and h .Remove the flat substrate of a, adhesive A and metal film to obtain a color filter film. Electric transfer plate. 2. The manufacturing method as described in patent application Fan Gu 1, wherein the material of the planar substrate in item a is polyethylene terephthalate. 3. The manufacturing method as described in patent application scope 1, wherein the adhesive A in item a is a hot melt adhesive. 4. The method as described in Patent Application Park 1, wherein the metal film in item a may be copper foil, aluminum foil or tin foil. 5_ The manufacturing method as described in patent application scope 1, wherein many small trees exposed in item b are coated on the metal film with photoresist and then developed. 6. The manufacturing method as described in patent application scope 1, wherein the electroplated metal described in item c may be nickel or its alloy. The size of this paper is applicable to China National Standard (CNS) Α4 specification (21〇X297mm) 14 (Please read the precautions on the back before filling out this page) -β Ministry of Economy Central Standards Bureau Beigong Consumer Cooperative Printing and Printing Ministry The Central Bureau of Standards printed 32253 __ for the Industrial and Consumer Cooperatives, and the application method described in Chapter 1 of the Japanese Patent Fan Garden, where the delta electrical contact on the electro-electrode plate described in item d refers to the photosensitive The insulating film is exposed and developed and exposed. According to the manufacturing method described in Application Specific, the photosensitive insulating film described in item d is an acrylic resin composition, negative type, and the film thickness is 20-40 μm. As described in Patent Application Model 81 1 'where the metal plating described in item e and the metal coating described in a $ are different metals. 〇. For example, the method of making a patent application, in which the conductive metal layer of ship 0 is electroless copper or electroless nickel by chemical deposition. L. The manufacturing method described in patent application Gu 1, wherein the conductive metal layer described in item e includes two layers. The first layer is a chemically deposited metal layer, and the second layer is a metal layer for electrical bonding. 12. The conductive Jinqi as described in patent application side 1, wherein the first layer is copper or nickel, and the third layer is copper. 13. The manufacturing method as described in the patent application side, wherein the conductive metal layer described in item e is made by evaporation or quenching. 14. The method as described in the application for Shan Fanyuan 1, whose towels are conductive gold, thin, gold or chain. 15. The method as described in Patent Application Park, wherein the conductive layer described in item e contains two layers, the first layer is a sputtered metal layer, such as copper, gold, chromium or nickel; the second layer is electroplated copper . 16. For example, the method of applying the patent Fanyuan 1 scale, in which the photosensitive insulating film of d; ^ is coated on the electro-electrode plate by a spin coating method or a roller coating method. 17. The method as described in application specific model 1, wherein the electric plate of item d is rectangular, and the conductive contact may be on the left, middle, or right side of the longer side of the electric plate, and The positions of the conductive contacts of the electric writing plates in the same row or the same row are repeated in the left, middle or right part of the electric writing plates in sequence. 18. The method as described in Patent Application Park 1, wherein the electrical wire described in item f is formed by applying a layer of photoresist on the conductive metal layer, and then developing and engraving. The scale of the dagger paper is in accordance with the Chinese National Standard (€?) 84 specifications (210 > < 297mm) 15 .-----:-, -------- order ------ line 1. (Please read the precautions on the back before filling in this I) r ^ 53〇_ ί, 'Scope ~ ^. ~ ^ 19 · The method as described in the patent application Fan Gui', among the three mentioned in item f The electric leads are connected to the conductive contacts of the left, middle, or right part of the same row of electric writing plates respectively. . Bing as described in the patent application scope 1S, in which the photoresist left after closing can be removed or not. 21. The method according to claim 5 or 18, wherein the photoresist is negative and the film thickness is 10-30mn. According to the method of applying for the special item _, the towel, switch B in item g is a thermosetting adhesive. 23. The method and method as described in patent application scope i, wherein the conversion board described in item g may be polyethylene terephthalate (PET) or stainless steel plate. (Please read the precautions on the back before filling out this page) Bookmark and print 1 copy printed by the Staff Consumer Cooperative of the Central Standardization Bureau of the Ministry of Economic Affairs-paper copy suitable 握 家 one rule one centimeter 7 7 2
TW84106356A 1995-06-19 1995-06-19 Manufacturing method of electro deposition transfer plates TW322530B (en)

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