JPH0588016A - Production of color filter - Google Patents

Abstract

PURPOSE:To provide the process for producing the color filter suitable for a color display of a high resolution with good productivity. CONSTITUTION:A conductive layer 2 or a transparent conductive layer is formed on a substrate 1 and a magnetic material pattern mask 3 is placed on the conductive layer 2. A magnet 4 is mounted on the rear surface to fix the mask and colored layers are formed on the conductive layer 2 by an electrodeposition coating method. The conductive layer 2 exposed between the colored layers is etched away and thereafter, only the colored layers or both of the colored layers and the transparent conductive layer are transferred to the transparent substrate 5 coated with an adhesive 6. Or, only the colored layers are transferred onto the transparent substrate 5 coated with the adhesive 6 without etching.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a method for producing a novel color filter.

[0002]

2. Description of the Related Art Various types of color filters for liquid crystal color display devices such as liquid crystal color televisions can be considered. Generally, a color filter is provided on or under a patterned transparent electrode. In some cases, a patterned colored layer is provided on a transparent substrate.

As a method of arranging the colored layers, there are a method of arranging the colored layers alternately in a stripe shape and a method of arranging a large number of independent polygonal colored layers in a specific arrangement pattern.

Generally, as a method for producing a color filter, a printing method such as screen printing or a photolithography method is used. But,
In the printing method, there is a limit to the miniaturization of patterns, and it has become difficult to cope with the recent high resolution of color display devices. On the other hand, the photolithography method can cope with the miniaturization of the pattern, but it is necessary to repeat the photography a large number of times in the manufacturing process of the color filter, and the dyeing method which is widely used requires the dye-resisting step. Therefore, the process is very complicated and the productivity and yield are low.

As a method for solving these drawbacks, various methods for producing a color filter by an electrodeposition coating method have been proposed.

As a method of applying the electrodeposition coating method, there are the following methods. (1) A transparent electrode is formed by patterning a transparent conductive film formed on a substrate, and only the portions of the patterned transparent electrode to be colored in the same color are connected to each other in a colored electrodeposition bath. Electrodeposition coating is performed to form a colored layer. Colored layers are similarly formed for other colors. The formed colored transparent electrode substrate is used as it is as a color filter. Further, the colored layer or the colored layer and the electrode of the colored electrode substrate formed by the same method are transferred to a transparent substrate to form a color filter. (2) A portion in which a transparent conductive film layer is formed on a substrate, a positive photosensitive resin composition film is formed on the transparent conductive film layer, exposed through a positive mask having a predetermined pattern, and then the exposed portion is removed by development. The patterned substrate is subjected to electrodeposition coating in a colored electrodeposition bath to form a colored layer on the exposed conductive film. Similarly, photolithography and electrodeposition coating are repeated to form a multicolored colored layer on the transparent electrode film, and then the entire surface of the substrate is exposed to light, development is performed to remove the resist film on the substrate and the exposed conductive film portion is removed by etching. Color filter. (3) As another method, electrodeposition coating is performed using the partially patterned conductive substrate as an electrode to form a colored layer at a predetermined position, and the colored layer is transferred to a transfer substrate. A method has been proposed in which similar operations are repeated for other colors, and then a transfer substrate having a colored layer is pressure-bonded to a transparent substrate to transfer the colored layer to form a color filter.

[0007]

However, the method (1) is difficult and unreliable because the finely patterned conductive electrode must be connected to a very fine portion during electrodeposition coating. In particular, when the colored electrodes are arranged as a large number of independent polygonal patterns, the number of connection points becomes very large, and eventually only a striped pattern is actually possible.

According to the method (2), the photoresist film may be formed only once, but it is necessary to repeat the exposure and the phenomenon for the number of colors in order to perform electrodeposition of each color. The etching process is required, and the process is still complicated, which is not preferable in terms of productivity and yield.

Further, in the method (3), patterning by photolithography is not required for each color, but the transfer step that requires precise alignment needs to be repeated once for the required number of colors plus 1, which complicates the process. It is not preferable in terms of productivity and yield. Furthermore, the partially patterned conductive substrate used as an electrodeposition mask is a photosensitive resin that forms the pattern, and is deformed due to peeling from the substrate, swelling, etc. due to many uses, causing defects. However, the accuracy is lowered, and the number of times of use is limited. Then, it becomes necessary to re-create the mask by performing patterning by photolithography every fixed number of times.

[0010]

As a result of earnest research to solve the above problems, the present inventor has combined an electrodeposition coating method with a special mask to obtain a color filter, particularly a high resolution color display, in a simple process. The inventors have found a suitable method for efficiently producing a color filter in which independent minute polygonal colored layers required for an apparatus are arranged at specific positions, and have completed the present invention.

That is, according to the present invention, "1. (a) a magnetic mask having a predetermined pattern electrically insulated from the conductive layer is placed on a substrate having the conductive layer, and a magnet is attached to the back surface. And fix the mask,
(C) The substrate on which a mask is mounted is immersed in an electrodeposition paint bath of a predetermined color and a predetermined amount of electricity is applied between it and the counter electrode to form a colored layer on the exposed conductor on the substrate by the electrodeposition coating method. Then
(D) The steps of (b) and (c) are repeated to provide a colored layer of a predetermined color at a predetermined position on the conductive layer, (e) the exposed conductive layer between the colored layers is removed by etching, and (f) bonding is performed. A method for producing a color filter, which comprises transferring and fixing the multicolor coloring layer only onto a transparent substrate coated with an agent. 2. A conductive layer is formed on the substrate, and (b) to (1) above.
After forming the multicolored layer by the step (e), the transparent conductive layer remaining after etching and the multicolored layer on this conductive layer are transferred and fixed on the transparent substrate coated with the adhesive. Characteristic color filter manufacturing method. 3. The method for producing a color filter according to item 2, wherein a release layer is provided between the substrate and the transparent conductive layer. 4. (A) A magnetic mask having a predetermined pattern electrically insulated from the conductive layer is placed on a substrate having a conductive layer, and a magnet is attached to the back surface to fix the mask.
(C) The substrate on which a mask is mounted is immersed in an electrodeposition paint bath of a predetermined color and a predetermined amount of electricity is applied between it and the counter electrode to form a colored layer on the exposed conductor on the substrate by the electrodeposition coating method. Then
(D) Steps (b) and (c) are repeated to form a colored layer of a predetermined color at a predetermined position on the conductive layer, and (e) the multicolored layer is formed on a transparent substrate coated with an adhesive. A method for producing a color filter, which comprises transferring and fixing. Regarding

[0012]

The present invention will be described with reference to the drawings. FIG. 1 is a process drawing showing a manufacturing process in the manufacturing method according to the first aspect of the present invention.

The substrate itself is a conductor such as iron, nickel or copper, or a non-conductive substrate (hereinafter sometimes simply referred to as a substrate) 1 is coated with a gold layer foil as shown in FIG. The conductive film 2 is formed by laminating, vapor deposition of a gold layer, or spray coating or sputtering of indium oxide, tin oxide, or the like. Then, from FIG.
As shown in (d), a mask 3 made of an electrically insulating magnetic material having a predetermined pattern is placed on the conductive film, and a magnet 4 is attached and fixed from the back surface in a predetermined colored electrodeposition paint bath. By repeating the electrodeposition coating, a pattern composed of the colored layer is obtained. Then, as shown in FIG. 1 (e), the exposed conductive film is removed by etching using a known method, for example, ferric chloride solution, hydrogen bromide solution or the like, and then the adhesive 6 is applied on the colored pattern. The coated transparent substrate 5 is pressed to transfer only the colored layer to the transparent substrate to obtain a color filter.

FIG. 2 shows a manufacturing process in the second embodiment of the present invention. That is, as shown in FIG. 2 (a), a transparent conductive layer 2'of indium oxide, tin oxide or the like is formed on the substrate 1 by spray coating, sputtering, etc.
The transparent substrate 5 obtained by applying the adhesive 6 as shown in FIG. 2F to the colored layer on the conductive film remaining after etching as shown in FIG. A color filter is obtained by pressing and transferring the colored layer and the transparent conductive layer onto a transparent substrate.

FIG. 3 shows a manufacturing process in the third embodiment of the present invention. The third aspect is essentially the same as the second aspect except that a peeling layer 7 is provided between the substrate and the conductive film to facilitate transfer. Of course, it is not necessary to provide the peeling layer 7 if the transfer is smoothly performed without the peeling layer.
A silicone thin film or the like is usually useful as the release layer 7.

FIG. 4 shows a manufacturing process in the fourth embodiment of the present invention. In the case of the fourth aspect, the steps of FIGS. 4A to 4D are the same as the steps of FIGS. 1A to 1D in the first aspect. Thus, a multicolored coloring layer is obtained on the conductive film as shown in FIG. Then, the transparent substrate 5 having the adhesive 6 applied thereon is pressed onto the multicolor layer to obtain a color filter having a colored layer transferred thereto as shown in FIG.

The substrate used in the present invention is not particularly limited, and it may be transparent or opaque, but the film thickness is 50 to 50 with the conductive layer formed in view of easy transfer work.
A flexible material having a thickness of about 500 μm is preferable.

In the mask used in the present invention, at least the side of the substrate surface which is in contact with the conductive layer is an electrical insulator, and the entire mask is made of a magnetic material. The pattern may be one in which an opening is provided only in the portion where the colored layer is formed by electrodeposition coating, or one in which the opening is provided in the portion where the colored layer is formed and the portion where the colored layer is already formed. In the former case, the mask is slightly apart from the substrate surface (corresponding to the thickness of the coloring layer) as shown in FIG. 1C, but it is necessary and sufficient because the mask thickness is thicker than the thickness of the coloring layer. It is preferable because a high resolution can be obtained and the patterning of the mask is easy.

The method of manufacturing the mask is not particularly limited as long as it satisfies the above-mentioned conditions. For example, (1) patterning of a magnetic thin plate of iron, magnetic iron oxide, nickel or the like by photolithography or the like, After forming an opening at a predetermined position by etching treatment, an organic resin, an organic-inorganic composite resin, an inorganic resin, or the like is applied to one or both surfaces of the mask to form an inorganic coating such as an organic resin or SiO _2. The electrical insulating film is formed by means of vapor deposition, sputtering, or the like, or by means of forming an organic polymer or organic-inorganic composite resin film by CVD or the like. (2) Applying a coating material containing the above-mentioned magnetic powder, laminating a magnetic thin film, or coating a magnetic material on one surface of an organic resin laminated plate containing an organic resin film, glass fiber, an inorganic filler, etc. A ferromagnetic film is formed by vapor deposition or sputtering. Next, an opening is provided at a predetermined position by means such as drilling or laser abrasion.
Further, if necessary, an insulating film may be provided on one surface or both surfaces thereof by the method described in (1). (3) In the method of (2), the opening is provided before forming the ferromagnetic film. And the like. Examples of the above-mentioned coating method include a brush coating method, a spray method, a roll coating method, a printing method, a spin coating method, and an electrodeposition method.

The thickness of the mask base material is not particularly limited, but it is preferably about 15 to 500 μm in view of ease of processing, ease of handling the mask, and durability against repeated use. The thickness of the entire mask is 15 to 1 for the same reason.
About 000 μm is preferable. The electrically insulating material is not particularly limited as long as its volume resistivity is about 10 ⁶ Ωcm or more. The mask thus obtained has high durability and can be used semipermanently. The advantage of using such a magnetic mask is that (1) the mask can be attached to the substrate when the colored layer pattern is formed by simply applying a magnet from the back surface of the substrate and fixing it, and the attachment and detachment is extremely easy. (2) Since the mask can be easily replaced, the pattern having the desired shape and arrangement can be easily obtained. (3) Therefore, it is not necessary to repeat the transfer to obtain the multicolor layer pattern. ..

By providing the adhesive layer on the transparent substrate, the transfer operation can be performed more easily and reliably, and the productivity in the color filter production can be greatly improved.

The adhesive that can be used is not particularly limited, and conventionally known thermoplastic, thermosetting, photocurable, pressure-sensitive adhesive and the like can be used. The adhesive is applied on the transparent substrate by a spray method, a roll coater method, a printing method, a spin coater method or the like to have a thickness of about 0.1 to 3 μm.

When a heat or photocurable adhesive is used, the transparent substrate and the multicolored layer are pressure-bonded to each other, and then heated or cured by being irradiated with light from the rear surface of the transparent electrode to ensure transfer. It is also possible to improve the durability of the colored layer by curing it by the method described above after the completion of transfer.

The electrodeposition coating material for forming the colored layer is an aqueous coating material in which a coating material or a pigment for coloring to a required color is dissolved or dispersed in an electrodeposition vehicle. The polymer resin used as the vehicle component of the electrodeposition bath may be either cationic or anionic, and conventionally known ones such as acrylic resin, urethane resin, epoxy resin, polyamide resin, polyimide resin or precursor thereof. resin,
Examples thereof include polyester resins. Further, these resins may themselves be thermosetting and / or photocurable, or may be thermosetting and / or photocurable by adding a curing agent, a polymerizable monomer or the like. .. When the vehicle is curable, the durability of the colored layer can be improved by heating and / or irradiating light after forming the colored layer to cure the vehicle.

It is necessary to select the pigment and dye in consideration of transparency, durability, electrodeposition coating characteristics, bath stability and the like. From this point, the pigment is preferably a phthalocyanine-based pigment, a quinacridone-based pigment, a slene-based pigment, or an oxide inorganic pigment-based pigment, and the dye is preferably an oil-soluble or dispersible dye. Pigments and dyes include black and white.

The conditions for electrodeposition coating vary depending on the type of paint and the type of pattern. When applying by the constant voltage method, the applied voltage is 10 to 150 V for 10 to 180 seconds, and in the constant current method, the current density is 25 to 150 mA. / Dm ² is generally about 10 to 180 seconds. The thickness of the formed colored layer is 0.5 to
It is 5 μm.

[0023]

EXAMPLES The present invention will be described in more detail by way of examples, but the present invention is not limited to these examples.

A. Production of Resin for Electrodeposition Coating Production Example 1 Methyl methacrylate 30 parts by weight n-butyl acrylate 25 parts by weight n-butyl methacrylate 19.5 parts by weight N-butoxymethyl acrylamide 10 parts by weight 2-hydroxyethyl acrylate 10 parts by weight Acrylic acid 5 0.5 parts by weight t-butylperoxyoctoate 1.5 parts by weight The above monomer mixture was copolymerized in 50 parts by weight of methoxypropanol to prepare a resin solution having a weight average molecular weight of about 40,000 and a resin acid value of 42 (solid content: 66. 7% by weight).

Production Example 2 2-hydroxyethyl acrylate 15 parts by weight methyl methacrylate 30 parts by weight n-butyl acrylate 20 parts by weight n-butyl methacrylate 30 parts by weight dimethylaminoethyl methacrylate 15 parts by weight azobisisobutyronitrile 2.5 parts by weight Parts The above monomer mixture was copolymerized in 50 parts by weight of methoxypropanol to obtain a resin solution (solid content: 66.7% by weight) having a weight average molecular weight of about 25,000 and a resin amine value of 54.

Production Example 3 100 parts by weight of isophthalic acid 44 parts by weight of phthalic anhydride 44 parts by weight of trimellitic anhydride 29 parts by weight of neopentyl glycol 83 parts by weight of trimethylolpropane 27 parts by weight of the above mixture to obtain a polyester having an acid value of 47. It was To this, add 75 parts by weight of 2-butoxyethanol and add 7
A 7% by weight resin solution was obtained. The viscosity was Z ₃ (Gardner foam viscometer 25 ° C.).

Production Example 4 2-Ethylhexyl acrylate 95 parts by weight 2-Hydroxyethyl acrylate 5 parts by weight Azobisisobutyronitrile 0.3 parts by weight The above mixture was bulk polymerized to give a weight average molecular weight of about 2,500.
00 copolymer was obtained. To this, 50 parts by weight of xylene, 40 parts by weight of isopropanol, and 30 parts by weight of ethyl acetate were added to obtain a 45.5% by weight resin solution.

Production Example 5 100 parts by weight of the resin solution of Production Example 4 5 parts by weight pentaerythritol pentaacrylate 5 parts by weight benzoin ethyl ether 2.5 parts by weight Iropropyl alcohol 200 parts by weight Ethyl acetate 200 parts by weight The above composition was mixed to form an adhesive. Obtained.

B. Preparation of Electrodeposition Paint Bath Paint Example 1 Triethylamine 2 was added to 100 parts by weight of the resin solution of Production Example 1.
To 102 parts by weight of the varnish neutralized by adding parts by weight, 7 parts by weight of phthalocyanine blue (paint 1B), 7 parts by weight of phthalocyanine green (paint 1G) and azo metal salt red pigment 7
After 1 part by weight (paint 1R) was added separately and dispersed, 628 parts by weight of deionized water was added to each to obtain 3 kinds of electrodeposition paint baths having a solid content of 10% by weight.

Paint Example 2 Resin solution of Production Example 1 100 parts by weight Triethylamine 2 parts by weight Trimethylolpropane triacrylate 12 parts by weight 2,2-dimethoxy-2-phenylacetophenone 3.5 parts by weight The above composition was mixed and neutralized. To 114 parts by weight of the resulting varnish, 12 parts by weight of phthalocyanine blue (paint 2B), 12 parts by weight of phthalocyanine green (paint 2G), 12 parts by weight of azo metal salt red pigment (paint 2R) were added and dispersed, and then deionized. 793 parts by weight of water was added to obtain 3 kinds of electrodeposition coating baths having a solid content of 10% by weight.

Paint Example 3 Resin solution of Production Example 2 100 parts by weight Blocked isocyanate 10 parts by weight Acetic acid 1.3 parts by weight 111.3 parts by weight of a varnish obtained by mixing and neutralizing the above composition and 5 parts by weight of phthalocyanine blue ( Paint 3B) Phthalocyanine green 5 parts by weight (paint 3G) Azo metal salt red pigment 5 parts by weight (paint 3R) are added separately and dispersed, and then 561 parts by weight of deionized water is added to perform electrodeposition at a solid content of 10% by weight. Three types of paint baths were obtained.

Coating Example 4 100 parts by weight of the resin solution of Production Example 3 20 parts by weight of hexamethoxymethylmelamine 1.7 parts by weight of dimethylaminoethanol 1.7 parts by weight of varnish obtained by mixing and neutralizing the above composition with phthalocyanine blue 20 parts by weight (Paint 4B) Phthalocyanine Green 20 parts by weight (Paint 4G) Quinacridone Red 20 parts by weight (Paint 4R) are added separately and dispersed, and then 1028 parts by weight of deionized water is added to obtain a solid content of 10% by weight. Three types of coating baths were obtained.

C. Mask Manufacturing Example 1 Mask Manufacturing Example 1 A 100 μm thick nickel plate having openings of 100 μm × 100 μm provided only in a region where coloring is required so that the colored layers are arranged as shown in FIG. When the three colors are finally matched, each opening has 30μ
The SiO ₂ film was applied to both sides of 1000 Å by sputtering to form a mask. Created one each for red, green and blue. In the figure, R indicates red, G indicates green, and B indicates blue.

Mask Manufacturing Example 2 A thickness of 150 μm (nickel layer 50 μm, polyimide layer 100 μm) with 100 μm × 100 μm openings provided only in the areas where coloring is required so that the colored layers are arranged as shown in FIG. Single-sided nickel-clad polyimide film (when each opening and opening are finally matched in three colors,
The coating 1B of the coating material example 1 was electrodeposited so that the dry film thickness was 5 μm, and baked at 140 ° C. for 30 minutes to form a mask. Created one each for red, green and blue. In the figure, R. G.
B. Indicates red, green, and blue, respectively.

Example 1 100 μm thick polyethylene terephthalate (PE
T) A transparent conductive layer made of indium tin oxide (ITO) is formed on the film by a spraying method, and the red mask obtained in Mask Production Example 1 is applied to the transparent conductive layer by applying a magnet to the back surface of the substrate to give a predetermined pattern. Fixed in position. Then, after immersing in the electrodeposition bath of coating material 1R of coating material example 1 and energizing the transparent conductive layer as an anode at a current density of 80 mA / dm ² for 20 seconds, the mask was removed, washed with water, and dried at 80 ° C. for 10 minutes to form a film. A red colored layer having a thickness of 1.8 μm was formed. Next, similarly, a predetermined color mask and a predetermined paint (1B
And 1G) to form each colored layer, and then the exposed ITO layer was removed using an aqueous solution of hydrogen bromide. On the other hand, an adhesive having a solid content of 5% by weight of the varnish of Production Example 4 with isopropanol was applied on a transparent substrate so as to have a dry film thickness of 0.5 μm, and dried at 100 ° C. for 5 minutes. The adhesive layer side of the transparent substrate coated with this adhesive is pressure-bonded to the colored layer so that air bubbles do not enter, the colored layer and the transparent conductive layer are transferred, and then heated at 140 ° C. for 30 minutes to display device color filter. Got

Example 2 A nickel layer having a thickness of 25 μm was formed to a thickness of 10 by electroless plating.
The red mask obtained in Mask Production Example 2 was fixed onto a substrate formed on a 0 μm polyethylene terephthalate (PET) film at a predetermined position on the nickel surface by applying a magnet to the back surface of the substrate. Then, it is immersed in the electrodeposition bath of the paint 2R of the paint example 2 and the nickel surface is used as the anode for 80V.
After applying the voltage for 50 seconds, the mask was removed, washed with water, and dried at 80 ° C. for 10 minutes to form a red colored layer having a film thickness of 2.1 μm. Next, in the same manner, after forming each colored layer using a predetermined mask and a predetermined paint (2B and 2G), the colored substrate is coated with the adhesive of Production Example 5 to have a dry film thickness of 0.3 μm. On the transparent substrate thus coated, pressure was applied so that no bubbles were introduced between them, and 200 mj / cm ² ultraviolet rays were irradiated from the transparent substrate side by an ultrahigh pressure mercury lamp. Then, the nickel-plated PET film was peeled off from the transparent substrate to transfer the coloring layer onto the transparent substrate, and then 140 ° C.
After heating for 30 minutes, a color filter for a display device was obtained.

Example 3 A multicolored coloring layer was formed in the same manner as in Example 1 except that a substrate having 25 μm of copper plated on a 100 μm thick polyimide film was used and the exposed copper film was removed with cupric chloride. After being formed, the colored substrate was pressure-bonded onto the transparent substrate so that air bubbles did not enter. Then, the copper-plated polyimide film substrate is peeled off, the colored layer is transferred to the transparent substrate, and the temperature is set to 140 ° C. for 3 minutes.
After heating for 0 minutes, a color filter for a display device was obtained.

Example 4 After forming a polyorganosiloxane film having a thickness of 1 μm on a polyimide film having a thickness of 100 μm, an ITO transparent electric layer was formed by sputtering, and the ITO transparent electric layer obtained in Mask Production Example 2, for example, for red The mask was fixed in place by applying a magnet from the back side of the substrate. Then, it was immersed in the electrodeposition bath of the coating material 4R obtained in the coating material example 4 and 60 mA / dm ²
After the current was applied at a current density of 30 seconds for 30 seconds with the transparent electrode layer serving as an anode, the magnet was removed, washed with water, and drained and dried at 60 ° C. for 10 minutes to form a red colored layer having a thickness of 1.9 μm. Next, similarly, a colored layer is formed using a predetermined color mask and predetermined paints (4B and 4G), and then the exposed IT0 layer is removed using a ferric chloride aqueous solution. Then, it was pressure-bonded onto the transparent substrate so as not to contain air bubbles, the polyimide film was peeled off to transfer the colored layer and the transparent conductive layer, and heated at 190 ° C. for 60 minutes to obtain a color filter for a display device.

Example 5 By using a substrate in which a palladium layer was formed by sputtering on a polyimide film having a thickness of 100 μm, for example, the red mask obtained in Mask Production Example 2 was applied with a magnet from the back surface at a predetermined position on the palladium surface. Fixed Then, the paint 3R of Paint Example 3 was immersed in an electrodeposition bath, and the palladium surface was used as a cathode for 80 V for 40 seconds, then the mask was removed, washed with water, dried at 80 ° C. for 10 minutes, and dried to a film thickness of 1.9 μm. A red colored layer was obtained. Next, after a colored layer was obtained using a predetermined color mask and a predetermined paint (3G, 3B), bubbles were introduced into the transparent substrate coated with the adhesive of 0.7 μm used in Example 1. Then, the polyimide film with a palladium layer was peeled off from the transparent substrate, the colored layer was transferred onto the transparent substrate, and heated at 160 ° C. for 20 minutes to obtain a color filter for a display device.

[0038]

As described above, according to the method of the present invention, it is not necessary to repeat the exposure and development of the resist to form the colored layer pattern as in the above-mentioned prior art (2), and the process is simplified, and the productivity is improved. The yield can be greatly improved. Further, as described above, in the prior art (1), the colored layer can be formed substantially only in the stripe pattern, but according to the present invention, the patterns to be colored in the same color before the electrodeposition coating are formed in the prior art (1). Since it is not necessary to connect to each other as shown in), it is possible to easily obtain a color filter having a desired pattern shape and arrangement regardless of the shape of the pattern.
In addition, unlike the prior art (3), it is not necessary to perform the transfer many times, and the mask has high durability and can be used semipermanently. Therefore, a color filter suitable for a high-resolution color display device can be provided. It can be manufactured with good productivity and economically. Further, according to the fourth aspect, the substrate after transfer can be repeatedly used many times, and the economical efficiency can be further improved.

[Brief description of drawings]

FIG. 1 is a process drawing showing the first embodiment of the present invention.

FIG. 2 is a process drawing showing the second embodiment of the present invention.

FIG. 3 is a process drawing showing the third aspect of the present invention.

FIG. 4 is a process drawing showing the fourth aspect of the present invention.

FIG. 5 is a diagram showing an arrangement of colored layers in Mask Production Example 1 of the present invention.

FIG. 6 is a view showing an arrangement of colored layers in Mask Manufacturing Example 2 of the present invention.

[Explanation of symbols]

 1 Substrate 2 Conductive Layer 2'Transparent Conductive Layer 3 Magnetic Mask 4 Magnet 5 Transfer Target Transparent Substrate 6 Adhesive 7 Release Layer

Claims (4)

[Claims] 1. A magnetic mask having a predetermined pattern which is electrically insulated from the conductive layer is placed on a substrate having the conductive layer, and a magnet is attached to the back surface to fix the mask. (C) The substrate on which the mask is mounted is immersed in an electrodeposition paint bath of a predetermined color and a predetermined amount of electricity is applied between it and the counter electrode to form a colored layer on the exposed conductor on the substrate by the electrodeposition coating method. (D) The steps of (b) and (c) are repeated to form a colored layer of a predetermined color at a predetermined position on the conductive layer, and (e) the exposed conductive layer between the colored layers is removed by etching. f) A method for producing a color filter, which comprises transferring and fixing only the multicolor coloring layer on a transparent substrate coated with an adhesive. 2. A transparent conductive layer formed by forming a conductive layer on a substrate, forming a multicolored colored layer by the steps (b) to (e) of claim 1, and then etching the remaining transparent conductive layer and the conductive layer. Transfer the multicolored layer on the transparent substrate coated with adhesive,
A method for producing a color filter for a color display device, which comprises fixing. 3. The method for producing a color filter according to claim 2, wherein a peeling layer is provided between the substrate and the transparent conductive layer. 4. A magnetic mask having a predetermined pattern electrically insulated from said conductive layer is placed on (a) a substrate having said conductive layer, and a magnet is attached to the back surface to fix the mask. (C) The substrate on which the mask is mounted is immersed in an electrodeposition paint bath of a predetermined color and a predetermined amount of electricity is applied between it and the counter electrode to form a colored layer on the exposed conductor on the substrate by the electrodeposition coating method. And (d) repeating the steps of (b) and (c) to form a colored layer of a predetermined color at a predetermined position on the conductive layer, and (e) transparent coating of the multicolored layer with an adhesive. A method for manufacturing a color filter, which comprises transferring and fixing the color filter onto a substrate.