JPH06275755A - Manufacture of lead frame - Google Patents

Manufacture of lead frame

Info

Publication number
JPH06275755A
JPH06275755A JP5869293A JP5869293A JPH06275755A JP H06275755 A JPH06275755 A JP H06275755A JP 5869293 A JP5869293 A JP 5869293A JP 5869293 A JP5869293 A JP 5869293A JP H06275755 A JPH06275755 A JP H06275755A
Authority
JP
Japan
Prior art keywords
lead frame
lead
strain stress
press working
leads
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5869293A
Other languages
Japanese (ja)
Other versions
JP3209606B2 (en
Inventor
Yukio Takahashi
幸雄 高▲橋▼
Zenjiro Kawase
善次郎 川瀬
Yasuo Deura
康男 出浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chichibu Fuji Co Ltd
Original Assignee
Chichibu Fuji Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chichibu Fuji Co Ltd filed Critical Chichibu Fuji Co Ltd
Priority to JP05869293A priority Critical patent/JP3209606B2/en
Publication of JPH06275755A publication Critical patent/JPH06275755A/en
Application granted granted Critical
Publication of JP3209606B2 publication Critical patent/JP3209606B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To provide a novel manufacturing method of a lead frame which does not involve enlargement of a scale of a device and can reduce an operational time while maintaining strain stress removal operation which is equal to that of a conventional method wherein a thermal treatment process is adopted. CONSTITUTION:A lead frame 10 wherein a number of inside leads 11, a connection piece 12 for connecting an area near a tip part of the inside leads 11, a chip mounting pad 14, etc., are formed by press processing is mounted on a pedestal 60 and is transferred at a specified velocity. A polishing and cleaning material consisting of a number of glass particles of fine diameter are sprayed toward an inside lead 11 of each unit frame 10a in the lead frame 10 to remove strain stress, burr and lubricant remaining in the inside lead 11. The connection piece 12 is removed after the treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置用のリードフ
レームの製造方法、さらに詳しくは、42アロイ(鉄−N
i合金),Cu等からなる板状の基材に多数の内部リー
ドと連結片とをプレス加工によって形成した後に、それ
ら内部リードに生ずる歪み応力等を除去する処理工程に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a lead frame for a semiconductor device, and more particularly to a 42 alloy (iron-N).
(i alloy), Cu, etc., after forming a large number of internal leads and connecting pieces on a plate-shaped substrate by press working, the present invention relates to a processing step of removing strain stress and the like generated in these internal leads.

【0002】[0002]

【従来の技術】従来、この種リードフレームの製造方法
として、プレス加工を行った後の歪み応力等の除去に熱
処理工程を採用したものが知られている(例えば特開昭
59-72754号公報参照)。また内部リードと連結片の形成
については、基材の所定箇所をポンチで打抜く作業を繰
返し行うプレス加工が一般に採用されている。
2. Description of the Related Art Heretofore, as a method of manufacturing a lead frame of this type, there has been known a method of adopting a heat treatment step for removing strain stress and the like after press working (for example, Japanese Patent Laid-Open Publication No. Sho.
59-72754). Further, with respect to the formation of the inner lead and the connecting piece, a press work is generally adopted in which a work of punching a predetermined portion of the base material is repeatedly performed.

【0003】前述の従来周知なプレス加工を図9を参照
してより詳細に説明すれば、図中100 はダイ200 とスト
リッパー201 で移動不能に支持された基材、202 はダイ
200に開設した打抜き孔、203 はその打抜き孔202 と同
一の幅をもってストリッパー201 に開設した通孔、204
は該通孔203 に嵌挿可能な寸法を有するポンチで、該ポ
ンチ204 によって基材100 所定位置を打抜くことで、一
定のスペーシング101を保持しながら複数の内部リード1
02 を形成するようになっている。
The above-mentioned conventionally known press working will be described in more detail with reference to FIG. 9. In the drawing, 100 is a base material immovably supported by a die 200 and a stripper 201, and 202 is a die.
A punched hole opened in 200, 203 is a through hole opened in the stripper 201 with the same width as the punched hole 202, 204
Is a punch having a size that can be inserted into the through hole 203. By punching a predetermined position of the base material 100 with the punch 204, a plurality of inner leads 1 can be held while maintaining a constant spacing 101.
It is designed to form 02.

【0004】ところで、このような加工手段によって内
部リード102 を形成した場合、打抜かれたスペーシング
101 の側面(即ち、内部リード102 の側面)上半部位10
3 が剪断面であるのに対し下半部位が破断面となり、該
破断面箇所がバリ110 となって残る。さらに、ポンチ20
4 の打抜き及び引抜き作動によって曲げモーメントがか
かり内部リード102 に傾きが生じると共に、内部リード
102 中に歪み応力が残留する。また前記ポンチ204 の打
抜き,引抜き作動が繰返し行われることから、隣接する
内部リード102 同士が相反する方向に傾くようになる。
By the way, when the inner lead 102 is formed by such a processing means, the punched spacing is
Upper half portion 10 of the side surface of 101 (that is, the side surface of the inner lead 102)
Whereas 3 is a sheared surface, the lower half portion becomes a fractured surface, and the fractured surface portion remains as a burr 110. In addition, punch 20
Bending moment is applied by the punching and drawing operations of 4 and the inner lead 102 is tilted, and
Strain stress remains in 102. Further, since the punching and pulling operations of the punch 204 are repeated, the adjacent inner leads 102 are inclined in opposite directions.

【0005】尚、上記したバリや傾き等の発生を抑える
加工手段として、図2〜5に示す分割上下打抜き方式も
従来から知られている。この方式によればバリや傾き等
の発生についてはほぼ抑えることが出来るが、歪み応力
の残留を完全に解消するまでには至らなかった。分割上
下打抜き方式のプレス加工手段については実施例の項で
詳述する。
As a processing means for suppressing the above-mentioned burrs and inclinations, the split vertical punching method shown in FIGS. 2 to 5 has been conventionally known. According to this method, the occurrence of burrs and inclinations can be almost suppressed, but residual strain stress has not been completely eliminated. The divisional upper and lower punching method will be described in detail in the section of Examples.

【発明が解決しようとする課題】[Problems to be Solved by the Invention]

【0006】上記プレス加工により生じるバリ,傾き,
残留歪み応力等は、内部リード102同士の接触による絶
縁不良やチップとのボンディング不良等の要因となる。
これら絶縁不良やボンディング不良の発生は、近年著し
い半導体装置における小型化及び多ピン化による内部リ
ード102 先端付近の過密化に伴って増大する傾向にあ
り、よって上記バリ,傾き,残留歪み応力等の除去がよ
り重要になるわけである。
Burr, tilt, and
The residual strain stress or the like becomes a factor such as insulation failure due to contact between the internal leads 102 or bonding failure with a chip.
Occurrences of these insulation defects and bonding defects tend to increase with the recent trend toward more compact semiconductor devices and increased pin count, resulting in increased density near the tips of the internal leads 102. Removal becomes more important.

【0007】しかし乍ら前述の熱処理工程を採用した従
来の応力除去手段においては、加熱処理のための炉や加
熱源を必要とすることから装置が大型化すると共に、加
熱のために相当の作業時間を費やすので生産性の低下を
招くという問題があった。
However, in the conventional stress relieving means adopting the above-mentioned heat treatment step, since the furnace and the heat source for the heat treatment are required, the apparatus becomes large in size and a considerable work is required for heating. There is a problem in that productivity is lowered because time is spent.

【0008】本発明はこのような従来事情に鑑みてなさ
れたものであり、その目的とするところは、熱処理工程
を採用する従来方法と同等の応力除去効果が得られ、し
かも装置の大型化を招く虞れがなく且つ作業時間の短縮
を図り得る、新規な製造方法を提供することにある。
The present invention has been made in view of such conventional circumstances, and an object thereof is to obtain a stress relieving effect equivalent to that of a conventional method employing a heat treatment process and to increase the size of the apparatus. It is an object of the present invention to provide a novel manufacturing method that is free from the risk of causing this and can shorten the working time.

【0009】[0009]

【課題を解決するための手段】前述の目的を達成するた
めに、本発明に係るリードフレームの製造方法は、半導
体チップと電気的導通をとるための多数の内部リード
と、それら内部リードの先端部付近をつなげるための連
結片とをプレス加工によって形成した後、前記内部リー
ド中に残留する歪み応力の除去処理を行い、該処理後に
前記連結片を除去する半導体装置用のリードフレームの
製造方法において、前記歪み応力の除去処理が、多数の
微小径ガラス粒子からなる研掃材を内部リードに低圧で
吹付ける工程であることを特徴とする。
In order to achieve the above-mentioned object, a method of manufacturing a lead frame according to the present invention is provided with a large number of internal leads for electrically connecting to a semiconductor chip and the tips of the internal leads. A method for manufacturing a lead frame for a semiconductor device, which comprises: forming a connecting piece for connecting portions near each other by press working, removing strain stress remaining in the internal lead, and removing the connecting piece after the treatment. In the above, the strain stress removing process is a process of spraying a polishing / cleaning material composed of a large number of fine glass particles onto the inner lead at a low pressure.

【0010】[0010]

【作用】上述の手段によれば、多数の微小径ガラス粒子
を低圧で吹付けることで得られるピーニング効果によっ
て、内部リードの傾き修正及び残留歪み応力の除去をリ
ード表面を傷付けることなく行って、従来の熱処理工程
と同等の効果を得る。微小径ガラス粒子の吹付けは例え
ば先端に噴射ノズルを備えた周知な吹付け装置を用いて
行うことができ、しかもその吹付けによる応力除去等は
極めて短時間で効果を得られる。また微小径ガラス粒子
の吹付けによって、プレス加工によって生じるバリの除
去、並びにプレス加工のために用いる潤滑剤の除去が同
時になされ、後工程としてのバリ除去工程,脱脂工程の
省略が可能になる。
According to the above-mentioned means, the inclination of the internal lead is corrected and residual strain stress is removed without damaging the lead surface by the peening effect obtained by spraying a large number of fine glass particles at a low pressure. The same effect as the conventional heat treatment process is obtained. The fine glass particles can be sprayed by using, for example, a well-known spraying device having an injection nozzle at the tip, and the stress removal by the spraying can be achieved in an extremely short time. Further, by spraying the fine glass particles, the burr generated by the press working and the lubricant used for the press working are removed at the same time, and the burr removing step and the degreasing step as a post step can be omitted.

【0011】[0011]

【実施例】以下、本発明に係るリードフレームの製造方
法の一実施例を説明する。まずリードフレーム10の基材
10’となる帯状の極薄金属板(例えば42アロイ板,Cu
板等)に、図1に示す如く多数の内部リード11と、それ
ら内部リード11の先端部付近をつなげるための連結片12
と、4本の脚片13で支持されるチップ搭載パッド14とを
残したリードフレーム形状になるよう、プレス加工を施
す。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the lead frame manufacturing method according to the present invention will be described below. First, the base material of the lead frame 10
Band-shaped ultra-thin metal plate that becomes 10 '(eg 42 alloy plate, Cu
1) and a plurality of internal leads 11 and a connecting piece 12 for connecting the vicinity of the tips of the internal leads 11 to a plate or the like).
Then, press working is performed so as to form a lead frame shape that leaves the chip mounting pads 14 supported by the four leg pieces 13.

【0012】プレス加工は図2に示す1次工程、図3に
示す2次工程、図4に示す3次工程からなる。図2(1
次工程)において、10’はダイ20とストリッパー30で移
動不能に支持された基材、21はダイ20に開設した食込み
孔、31はその食込み孔21よりも大寸な幅をもってストリ
ッパー30に開設した通孔、40は該通孔31に嵌挿可能な寸
法を有するポンチで、該ポンチ40の下降によって基材1
0’におけるスペーシング15打抜き位置の上半側に凹部1
6を形成し、且つ同下半側を前記凹部16よりも小寸な幅
寸法をもって下方へ突出させ食込み孔21内に食込ませ
る。この時、ポンチ40の下降限は図2に示す位置までと
して、前記凹部16の側面を剪断面とする。ポンチ40を引
き抜きストリッパー30を取除いた後、食込み孔21に連絡
せしめた加圧手段50から供給される圧縮エアーによって
前記突出部分17を食込み孔21から押し出す。
The pressing process includes a primary process shown in FIG. 2, a secondary process shown in FIG. 3, and a tertiary process shown in FIG. 2 (1
In the next step), 10 'is a base material that is immovably supported by the die 20 and the stripper 30, 21 is a bite hole formed in the die 20, and 31 is a hole wider than the bite hole 21 in the stripper 30. The through hole 40 is a punch having a size that can be fitted into the through hole 31, and the substrate 1 is lowered by lowering the punch 40.
Spacing at 0'15 Recess on upper half of punching position 1
6 is formed, and the lower half side thereof is projected downward with a width dimension smaller than that of the recess 16 so as to be bitten into the biting hole 21. At this time, the lower limit of the punch 40 is set to the position shown in FIG. After the punch 40 is pulled out and the stripper 30 is removed, the projecting portion 17 is pushed out from the bite hole 21 by the compressed air supplied from the pressurizing means 50 which is connected to the bite hole 21.

【0013】図3(2次工程)においては、同図(a)
の如く前記の形状に加工された基材10’を食込み孔を備
えない別のダイ22上に載置してフラットなポンチ32によ
り厚さ方向に押圧し、同図(b)の如く前述の突出部分
17を凹部16方向へ押し込む。この時、突出部分17と凹部
16との間の部分の左右両側で剪断が生じ、スクラップ18
を残した状態でスペーシング15が形成される。尚、前述
の1次工程及び2次工程における剪断部分の端部はダレ
18a となってスペーシング15の側面(即ち、内部リード
11の側面)に残るが、その周面が球面状であることから
後々悪影響を及ぼす虞れはない。
In FIG. 3 (second process), FIG.
The base material 10 'processed into the above shape as described above is placed on another die 22 having no bite hole and pressed in the thickness direction by a flat punch 32, as shown in FIG. Protruding part
Push 17 in the direction of recess 16. At this time, the protruding portion 17 and the recess
Shear on both the left and right sides of the part between 16 and scrap 18
The spacing 15 is formed in the state in which is left. In addition, the ends of the sheared portions in the above-mentioned primary process and secondary process are sagged.
18a, which is the side of spacing 15 (ie, the inner lead).
11 side surface), but since the peripheral surface is spherical, there is no risk of adverse effects later.

【0014】図4(3次工程)においては、前記のよう
に加工された基材10’をダイ23とストリッパー33間に挟
持し、ダイ23に設けた通孔24に連絡せしめた加圧手段51
から供給される圧縮エアーによって、スペーシング15内
に残ったスクラップ18を型外へ押し出す。
In FIG. 4 (third step), the pressurizing means in which the substrate 10 'processed as described above is sandwiched between the die 23 and the stripper 33 and communicated with the through hole 24 provided in the die 23. 51
The scrap 18 remaining in the spacing 15 is pushed out of the mold by the compressed air supplied from.

【0015】以上の1〜3次工程を繰り返し行って、図
5に示す如く所定幅寸法の内部リード11を一定のスペー
シング15を維持しながら並列状に多数本形成し、同様に
してそれら内部リード11の先端部付近をつなげるための
連結片12を形成して、図1に示す単位フレーム10a を複
数並設したリードフレーム10を作製する。
By repeating the above first to third steps, a large number of internal leads 11 having a predetermined width are formed in parallel while maintaining a constant spacing 15, as shown in FIG. A connecting piece 12 for connecting the vicinity of the tip of the lead 11 is formed, and a lead frame 10 in which a plurality of unit frames 10a shown in FIG.

【0016】尚、このようなプレス加工方法によれば1
次工程において上側から、2次工程において下側から夫
々分割してプレス圧が加えられるので、形成された内部
リード11はその側面が剪断面となってバリの発生がほぼ
完全に抑えられる。しかも内部リード11にかかる曲げモ
ーメントが上下均一になって傾きの発生もほぼ抑えら
れ、リード11中に残留する歪み応力も極めて小さいもの
になる。
According to such a press working method,
Pressing pressure is applied separately from the upper side in the next step and from the lower side in the secondary step, so that the formed internal leads 11 have a sheared surface on their side surfaces, and the occurrence of burrs is almost completely suppressed. Moreover, the bending moment applied to the inner lead 11 becomes uniform in the vertical direction, the occurrence of tilt is almost suppressed, and the strain stress remaining in the lead 11 becomes extremely small.

【0017】次に、前述のプレス加工により作製された
リードフレーム10の各単位フレーム10a における内部リ
ード11中の残留歪み応力の除去を行う。この工程は図
6,7に示すように、その前工程で作製したリードフレ
ーム10を載置した受け台60を移動させて長さ方向へ移送
すると共に、移送されるリードフレーム10における単位
フレーム10a の内部リード11に向けて多数の微小径ガラ
ス粒子からなる研掃材70を低圧で吹付けるもので、これ
により得られるピーニング効果によって、リード11表面
を傷付けることなく従来の熱処理工程と同等の歪み応力
除去効果を得る。
Next, the residual strain stress in the inner lead 11 in each unit frame 10a of the lead frame 10 manufactured by the above-mentioned press working is removed. In this step, as shown in FIGS. 6 and 7, the pedestal 60 on which the lead frame 10 manufactured in the previous step is moved and moved in the length direction, and the unit frame 10a in the lead frame 10 to be transferred is moved. The abrasive cleaning material 70 consisting of a large number of fine glass particles is sprayed at low pressure toward the internal leads 11 of the, and the peening effect obtained by this results in the same strain as the conventional heat treatment process without scratching the surface of the leads 11. Get the stress relief effect.

【0018】リードフレーム10の移送スピードの具体例
を挙げれば20〜70mm/sec程度、また、多数の微小径ガラ
ス粒子の吹付け圧は1kg/cm2 以下で、詳しくは0.3 〜
0.6kg/cm2 程度の低圧で行う。また受け台60における
リードフレーム10の載置面にはゴム等の緩衝材からなる
衝撃吸収シート61を敷設して、リードフレーム10の下面
を保護する。
A specific example of the transfer speed of the lead frame 10 is about 20 to 70 mm / sec, and the spraying pressure of a large number of fine glass particles is 1 kg / cm 2 or less.
Perform at a low pressure of about 0.6 kg / cm 2 . Further, a shock absorbing sheet 61 made of a cushioning material such as rubber is laid on the mounting surface of the lead frame 10 on the receiving table 60 to protect the lower surface of the lead frame 10.

【0019】微小径ガラス粒子の吹付けは先端に噴射ノ
ズル80を備えた周知な吹付け装置を用いて行う。噴射ノ
ズル80は単位フレーム10a における内部リード11形成区
域全域に微小径ガラス粒子を吹付け可能な噴射角度
θ1 ,θ2 、高さh1 ,h2 をもって、必要であれば複
数本設置する。
The fine glass particles are sprayed by using a well-known spraying device having a spray nozzle 80 at the tip. A plurality of injection nozzles 80 are installed, if necessary, with injection angles θ 1 and θ 2 and heights h 1 and h 2 that can spray fine glass particles over the entire area where the internal leads 11 are formed in the unit frame 10a.

【0020】このような微小径ガラス粒子の低圧での吹
付けによる歪み応力の除去は極めて短時間、即ち、リー
ドフレーム10の1回の移送で効果を得られ、同時にプレ
ス加工のために用いる潤滑剤の除去がなされる。また、
従来技術の項で説明した図9示のプレス加工によって生
じるバリの除去や傾きの修正も、微小径ガラス粒子の吹
付けを数回、即ち、リードフレーム10の移送を2〜3回
繰返し行うことで効果を得られる。
Removal of the strain stress by spraying such fine glass particles at a low pressure can be achieved in an extremely short time, that is, by moving the lead frame 10 once, and at the same time, lubrication used for press working. The agent is removed. Also,
The removal of burrs and the correction of inclination caused by the press working shown in FIG. 9 described in the section of the prior art are also performed by spraying fine glass particles several times, that is, the transfer of the lead frame 10 is repeated 2-3 times. The effect can be obtained with.

【0021】最後に、周知な切断工程によって連結片を
除去して、図8に示す単位フレーム10b を複数並設した
リードフレーム10が得られる。
Finally, the connecting piece is removed by a known cutting process to obtain a lead frame 10 in which a plurality of unit frames 10b shown in FIG. 8 are arranged in parallel.

【0022】尚、本発明製造方法で作製するリードフレ
ームの寸法関係について1例を挙げれば、w(内部リー
ド幅)=e(リード間のスペーシング)=t(板厚)×
αとなり、αは1.2 〜0.7 の範囲内で一般には1.0 程度
とする。また、図2に示すt1 (プレス加工の1次工程
におけるポンチの下降限)は、t(板厚)×1/3 程度、
同図中に示すc(凹部16と突出部分17との寸法差)はt
(板厚)の4〜6%程度とする。さらに、研掃材におけ
る各微小径ガラス粒子の径は、w(内部リード幅)×1/
2 〜1/4 程度とする。
Incidentally, as an example of the dimensional relationship of the lead frame manufactured by the manufacturing method of the present invention, w (internal lead width) = e (spacing between leads) = t (plate thickness) ×
It becomes α, and α is generally set to about 1.0 within the range of 1.2 to 0.7. Further, t 1 shown in FIG. 2 (the lower limit of the punch in the primary step of press working) is t (plate thickness) × 1/3,
C (dimension difference between the concave portion 16 and the protruding portion 17) shown in FIG.
It is about 4 to 6% of (plate thickness). Furthermore, the diameter of each fine glass particle in the abrasive material is w (internal lead width) x 1 /
Approximately 2 to 1/4.

【0023】よって、t(板厚)が0.15mmの基材を用い
た場合、w(内部リード幅)及びe(リード間のスペー
シング)はo.15mm〜0.12mm程度、t1 (プレス加工の1
次工程におけるポンチの下降限)は0.05mm程度、c(凹
部16と突出部分17との寸法差)は0.006 〜0.009mm 程
度、各微小径ガラス粒子の径は0.03〜0.05mm(30〜50μ
m)程度である。
Therefore, when a substrate having a t (thickness) of 0.15 mm is used, w (internal lead width) and e (spacing between leads) are about 15 mm to 0.12 mm and t 1 (press working). Of 1
The punch lowering limit in the next step) is about 0.05 mm, c (the size difference between the concave portion 16 and the protruding portion 17) is about 0.006 to 0.009 mm, and the diameter of each fine glass particle is 0.03 to 0.05 mm (30 to 50 μm).
m).

【0024】尚、プレス加工工程は図2〜5に示す分割
上下打抜き方式に限定されず、従来技術の項で説明した
より一般的なプレス方式を採用しても良い。本実施例で
は分割上下打抜き方式を採用してバリ,傾きの発生を防
ぐと共に歪み応力の残留度合いを極力抑えることで、研
掃材の吹付けによる歪み応力の除去を極めて短時間、即
ち、図6に示すリードフレーム10の移送を1回行うこと
でなし得る。また前記一般的なプレス方式を採用した場
合はリードフレーム10の移送を2〜3回繰り返すように
なるが、この場合においても初期の目的は十分達成され
る。
The pressing process is not limited to the split top and bottom punching method shown in FIGS. 2 to 5, and a more general pressing method described in the section of the prior art may be adopted. In this embodiment, the split vertical punching method is adopted to prevent burrs and tilts from occurring, and the residual degree of the strain stress is suppressed as much as possible, so that the strain stress can be removed by spraying the polishing and cleaning material in a very short time, that is, This can be done by carrying out the transfer of the lead frame 10 shown in 6 once. In addition, when the general pressing method is adopted, the transfer of the lead frame 10 is repeated 2-3 times, but in this case, the initial purpose is sufficiently achieved.

【0025】また、リードフレーム10における単位フレ
ームの形状や寸法関係、噴射ノズルの設置本数や位置、
リードフレーム10の移送手段等は上記説明のものに限定
されず、例えばリードフレームが連結片12をチップ搭載
パッド14と一体に形成した形状であったり、噴射ノズル
80をチップ搭載パッド14の外周縁に沿って移動可能に設
ける等、周知な範囲内での変更は任意であることはいう
までもない。
Further, the shape and dimensional relationship of the unit frames in the lead frame 10, the number and position of the jet nozzles installed,
The transfer means of the lead frame 10 and the like are not limited to those described above. For example, the lead frame has a shape in which the connecting piece 12 is formed integrally with the chip mounting pad 14, or the injection nozzle.
It goes without saying that changes within a well-known range, such as providing 80 so as to be movable along the outer peripheral edge of the chip mounting pad 14, are optional.

【0026】[0026]

【発明の効果】本発明に係るリードフレームの製造方法
は以上説明したように構成したので、その前工程である
プレス加工で生じた内部リード中の残留歪み応力を、噴
射ノズルを備えた周知な装置を用いて、極めて短時間
で、従来の熱処理工程と同等に除去し得る。従って、熱
処理工程を採用する従来方法と同等の歪み応力除去作用
を維持しつつ、装置の大型化を招く虞れがなく且つ作業
時間の短縮を図り得る、新規な製造方法を提供できた。
Since the method of manufacturing the lead frame according to the present invention is configured as described above, the residual strain stress in the inner lead generated by the press working which is a pre-process thereof is well known by the injection nozzle. Using the apparatus, it can be removed in an extremely short period of time in the same manner as the conventional heat treatment process. Therefore, it is possible to provide a novel manufacturing method which is capable of reducing the working time while maintaining the strain stress removing action equivalent to that of the conventional method which employs the heat treatment step, without causing the size of the apparatus to increase.

【0027】加えて、微小径ガラス粒子の吹付けによっ
て、プレス加工によって生じるバリの除去、並びにプレ
ス加工のために用いる潤滑剤の除去が同時になされ、後
工程としてのバリ除去工程,脱脂工程を不要として、装
置の小型化及び作業時間のさらなる短縮を図れる等、多
くの効果を奏する。
In addition, by spraying fine glass particles, the burrs generated by the press working and the lubricant used for the press working are removed at the same time, which eliminates the need for a burr removing step and a degreasing step as a post-step. As a result, there are many effects such as downsizing of the device and further shortening of working time.

【図面の簡単な説明】[Brief description of drawings]

【図1】リードフレーム形状の一例を示す平面図で、連
結片の切断前の状態を示す。
FIG. 1 is a plan view showing an example of a lead frame shape, showing a state before cutting a connecting piece.

【図2】プレス加工の1次工程を示す縦断面図。FIG. 2 is a vertical sectional view showing a primary step of press working.

【図3】プレス加工の2次工程を示す縦断面図。FIG. 3 is a vertical sectional view showing a secondary step of press working.

【図4】プレス加工の3次工程を示す縦断面図。FIG. 4 is a vertical cross-sectional view showing a third step of press working.

【図5】プレス加工の繰返しによる内部リードの形成を
過程を示す縦断面図。
FIG. 5 is a vertical cross-sectional view showing a process of forming internal leads by repeating press working.

【図6】微小径ガラス粒子吹付ける工程を示す斜視図。FIG. 6 is a perspective view showing a step of spraying fine glass particles.

【図7】同縦断正面図。FIG. 7 is a front view of the same section.

【図8】リードフレーム形状の一例を示す平面図で、連
結片の切断後の状態を示す。
FIG. 8 is a plan view showing an example of a lead frame shape, showing a state after cutting the connecting piece.

【図9】従来周知の一般的なプレス加工を示す縦断面
図。
FIG. 9 is a vertical cross-sectional view showing a conventionally known general press working.

【符号の説明】[Explanation of symbols]

10:リードフレーム 11:内部リード 12:連
結片 14:チップ搭載パッド 15:スペーシング 60:受け台 70:多数の微小径ガラス粒子
からなる研掃材 80:噴射ノズル
10: Lead frame 11: Inner lead 12: Connection piece 14: Chip mounting pad 15: Spacing 60: Cradle 70: Abrasive cleaning material consisting of many small glass particles 80: Jet nozzle

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 半導体チップと電気的導通をとるための
多数の内部リードと、それら内部リードの先端部付近を
つなげるための連結片とをプレス加工によって形成した
後、前記内部リード中に残留する歪み応力の除去処理を
行い、該処理後に前記連結片を除去する半導体装置用の
リードフレームの製造方法において、前記歪み応力の除
去処理が、多数の微小径ガラス粒子からなる研掃材を内
部リードに低圧で吹付ける工程であることを特徴とする
リードフレームの製造方法。
1. A large number of internal leads for establishing electrical continuity with a semiconductor chip and a connecting piece for connecting the vicinity of the tips of the internal leads are formed by press working and then remain in the internal leads. In a method for manufacturing a lead frame for a semiconductor device, which comprises removing strain stress and removing the connecting piece after the treatment, the strain stress removing process is performed by using an internal lead made of a large number of fine glass particles. A method of manufacturing a lead frame, characterized in that the step of spraying the lead frame at a low pressure.
JP05869293A 1993-03-18 1993-03-18 Method for manufacturing lead frame for semiconductor device Expired - Lifetime JP3209606B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05869293A JP3209606B2 (en) 1993-03-18 1993-03-18 Method for manufacturing lead frame for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05869293A JP3209606B2 (en) 1993-03-18 1993-03-18 Method for manufacturing lead frame for semiconductor device

Publications (2)

Publication Number Publication Date
JPH06275755A true JPH06275755A (en) 1994-09-30
JP3209606B2 JP3209606B2 (en) 2001-09-17

Family

ID=13091604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05869293A Expired - Lifetime JP3209606B2 (en) 1993-03-18 1993-03-18 Method for manufacturing lead frame for semiconductor device

Country Status (1)

Country Link
JP (1) JP3209606B2 (en)

Also Published As

Publication number Publication date
JP3209606B2 (en) 2001-09-17

Similar Documents

Publication Publication Date Title
JP2001002438A (en) Glass scriber
US5558267A (en) Moat for die pad cavity in bond station heater block
JP4903205B2 (en) Flip-chip packaged semiconductor device and method for packaging a semiconductor die
JPH06275755A (en) Manufacture of lead frame
JP2785513B2 (en) Hole punch type
JP2937954B2 (en) Wire bonding equipment
JPH05183084A (en) Pressing method and press for lead terminal
JP2003124417A (en) Method and device for manufacturing semiconductor package
JP4183313B2 (en) Break groove machining method and machine
JPH0787945B2 (en) Terminal processing device
JP2502765Y2 (en) Forged product manufacturing equipment
JP4013129B2 (en) Press machine
JP2959492B2 (en) Semiconductor device lead processing apparatus and lead processing method
JP3478675B2 (en) Electronic component lead processing method and apparatus
JPH0828453B2 (en) Lead forming method for semiconductor device
JP2000135522A (en) Skim rise prevention punching method and skim rise prevention punching die device
JPH11188478A (en) Shape correcting method for diecast product, and correcting tool thereof
KR200160429Y1 (en) Metal mold for chamfering leadframe pad
JP2000158059A (en) Scrap floating prevention die device
JPH0976244A (en) Mold for manufacturing lead frame
JP2000158056A (en) Method and device for scrap floating preventive punching
JPS63281452A (en) Equipment for shaping lead of ic
JP2566873B2 (en) Stripper plate of progressive die
JPH06234028A (en) Stamping die for mass production
JPH01225144A (en) Lead processing machine

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20070713

Year of fee payment: 6

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080713

Year of fee payment: 7

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090713

Year of fee payment: 8

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100713

Year of fee payment: 9

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100713

Year of fee payment: 9

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 10

Free format text: PAYMENT UNTIL: 20110713

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 11

Free format text: PAYMENT UNTIL: 20120713

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 11

Free format text: PAYMENT UNTIL: 20120713

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130713

Year of fee payment: 12