JPH06256966A - Surface treated copper foil - Google Patents

Surface treated copper foil

Info

Publication number
JPH06256966A
JPH06256966A JP5046934A JP4693493A JPH06256966A JP H06256966 A JPH06256966 A JP H06256966A JP 5046934 A JP5046934 A JP 5046934A JP 4693493 A JP4693493 A JP 4693493A JP H06256966 A JPH06256966 A JP H06256966A
Authority
JP
Japan
Prior art keywords
copper foil
resin
copper
substrate
rigid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5046934A
Other languages
Japanese (ja)
Inventor
Kazunari Nawa
一成 那和
Masakazu Okita
雅一 大北
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP5046934A priority Critical patent/JPH06256966A/en
Publication of JPH06256966A publication Critical patent/JPH06256966A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Parts Printed On Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To provide a surface treating method of a copper foil enabling to enhance adhesive strength between the copper foil and a substrate, in the case using a copper foil in a rigid copper clad lamination layer substrate in which a condensed polycyclic aromatic resin is an impregnated resin. CONSTITUTION:The copper foil is surface-treated with either an aromatic compound having at least two substituted groups selected from a hydroxymethyl group and a halomethyl group bonded to an aromatic ring or a chromate treating liquid.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、主として銅張積層基板
の製造に用いる銅箔材料に関し、具体的には樹脂との接
着性向上のために表面処理された銅箔材料に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper foil material mainly used for producing a copper clad laminated board, and more specifically to a copper foil material which has been surface-treated in order to improve adhesion with a resin.

【0002】[0002]

【従来の技術】各種の電気・電子機器において電子部品
の実装基板として用いられているプリント配線板は、絶
縁性の基板の片面または両面に銅箔を接合した銅張基板
に、イメージング、エッチング、金属めっき加工を施し
て配線機能を付与することにより製造されている。銅張
基板には、基板がプリプレグ(補強用基材に樹脂を含浸
させたもの)の積層成形により形成された硬質 (リジッ
ド)の積層基板であるリジッド銅張基板と、基板が軟質
のプラスチックフィルムから構成されたフレキシブル銅
張基板とがあり、これらから、それぞれリジッドプリン
ト配線板およびフレキシブルプリント配線板が製造され
る。前者は多層プリント配線板とすることも可能であ
り、後者は特に小型化が可能であるという特徴を有し、
用途に応じて使い分けられている。
2. Description of the Related Art A printed wiring board used as a mounting substrate for electronic parts in various electric and electronic devices is a copper-clad substrate in which a copper foil is bonded to one or both sides of an insulating substrate, and imaging, etching, It is manufactured by giving a wiring function by subjecting it to metal plating. The copper-clad substrate is a rigid copper-clad substrate that is a rigid laminated substrate formed by laminating and molding a prepreg (reinforcing base material impregnated with resin), and a plastic film with a soft substrate. And a flexible copper-clad substrate made of, from which a rigid printed wiring board and a flexible printed wiring board are manufactured, respectively. The former can be a multilayer printed wiring board, and the latter has a feature that it can be particularly downsized.
It is used properly according to the application.

【0003】リジッド積層基板の製造には、エポキシ樹
脂、フェノール樹脂、不飽和ポリエステル樹脂などの熱
硬化性樹脂が、フレキシブル基板の製造にはポリエステ
ル系樹脂が主に用いられてきた。
Thermosetting resins such as epoxy resins, phenolic resins and unsaturated polyester resins have been mainly used for manufacturing rigid laminated substrates, and polyester resins have been mainly used for manufacturing flexible substrates.

【0004】近年の配線の高密度化に伴い、プリント配
線板用基板には耐熱性と低誘電特性が要求されるように
なり、これらの要求を満たす材料としてポリイミド樹脂
が登場した。ポリイミド樹脂は、長期耐熱温度が約 200
℃、誘電率 (1 MHz での値、以下同じ) が単味では 3.5
〜3.7 と比較的低いという特徴を持ち、電子部品用の絶
縁材料として非常に優れている。この特徴を活かして、
ポリイミド樹脂は、フレキシブル基板と、ガラスクロス
に含浸させたリジッド基板のいずれの形態でも使用され
ている。ただし、ポリイミド樹脂を用いたリジッド基板
の誘電率は、ガラス繊維の充填率によっても異なるが、
4.5〜4.7 とフレキシブル基板に比べて高くなる。
With the recent increase in wiring density, printed wiring board substrates are required to have heat resistance and low dielectric properties, and polyimide resins have emerged as a material satisfying these requirements. Polyimide resin has a long-term heat resistance of about 200
℃, dielectric constant (value at 1 MHz, same below) is 3.5
It has a relatively low value of ~ 3.7 and is extremely excellent as an insulating material for electronic parts. Taking advantage of this feature,
Polyimide resin is used in both forms of a flexible substrate and a rigid substrate impregnated with glass cloth. However, the dielectric constant of a rigid substrate using a polyimide resin varies depending on the glass fiber filling rate,
It is 4.5 to 4.7, which is higher than that of flexible boards.

【0005】ポリイミド樹脂は電子部品用の絶縁材料と
して好適であるが、高価な樹脂であるため、使用が制限
されることがある。また、ポリイミド樹脂は、吸水率が
3%程度と比較的高い。プリント配線板の一層の性能向
上、特に、信号処理速度の増大と高密度化を図るには、
ポリイミド樹脂と同程度の耐熱性を有し、誘電率、特に
リジッド基板とした時の誘電率がより低く、吸水率も低
い樹脂材料を用いたプリント配線板用基板が求められて
いた。
Polyimide resin is suitable as an insulating material for electronic parts, but its use is sometimes restricted because it is an expensive resin. Further, the polyimide resin has a relatively high water absorption rate of about 3%. In order to further improve the performance of the printed wiring board, especially to increase the signal processing speed and increase the density,
There has been a demand for a printed wiring board substrate that uses a resin material that has heat resistance comparable to that of a polyimide resin, has a lower dielectric constant, particularly when a rigid substrate is used, and has a low water absorption.

【0006】この要請に応える基板として、本発明者は
先に特願平5−9455号において、縮合多環系芳香族樹脂
を用いたリジッドおよびフレキシブル基板を提案した。
縮合多環系芳香族樹脂は、縮合多環芳香族化合物または
縮合多環芳香族化合物と単環芳香族化合物との混合物か
らなる原料物質と、少なくとも2個のヒドロキシメチル
基またはハロメチル基を有する芳香族化合物からなる架
橋剤とを、酸触媒の存在下で反応させて得られる樹脂の
ことである。
As a substrate which meets this demand, the present inventor previously proposed in Japanese Patent Application No. 5-9455 a rigid and flexible substrate using a condensed polycyclic aromatic resin.
The condensed polycyclic aromatic resin is a raw material composed of a condensed polycyclic aromatic compound or a mixture of a condensed polycyclic aromatic compound and a monocyclic aromatic compound, and an aromatic compound having at least two hydroxymethyl groups or halomethyl groups. It is a resin obtained by reacting with a cross-linking agent composed of a group compound in the presence of an acid catalyst.

【0007】この縮合多環系芳香族樹脂は、例えば、長
期耐熱温度が約260 ℃とポリイミド系樹脂よりも高い。
短期 (一次) 耐熱温度では、ポリイミド系樹脂は300 ℃
を超える非常に高い耐熱性を示すが、プリント配線板用
基板として必要な長期耐熱性では、耐熱温度が約200 ℃
程度と非常に低くなる。これに対して、縮合多環系芳香
族樹脂は、短期耐熱温度は約 260℃であるが、この耐熱
性が持続し、長期耐熱性ではポリイミド系樹脂より高い
耐熱温度を示す。しかも、この樹脂は誘電率が3.1 と低
く、またリジッド基板とした時の誘電率も3.5 程度で、
誘電率がほとんど高くならない上、吸水率もポリイミド
樹脂より低いといった、プリント配線板用基板材料に非
常に適した特性を有している。
The condensed polycyclic aromatic resin has a long-term heat resistance temperature of about 260 ° C., which is higher than that of the polyimide resin.
At short-term (primary) heat resistance temperature, polyimide resin is 300 ℃
It has a very high heat resistance of over 200 ° C, but the long-term heat resistance required for printed wiring board substrates is about 200 ° C.
Very low with the degree. On the other hand, the condensed polycyclic aromatic resin has a short-term heat resistance temperature of about 260 ° C., but this heat resistance continues, and the long-term heat resistance shows a higher heat resistance temperature than the polyimide resin. Moreover, this resin has a low dielectric constant of 3.1, and when it is used as a rigid substrate, it has a dielectric constant of about 3.5.
It has properties that are very suitable for printed wiring board materials, such as a dielectric constant that does not increase and water absorption that is lower than that of polyimide resin.

【0008】この縮合多環系芳香族樹脂は、ポリイミド
樹脂と同様に、単味で板状に成形してフレキシブル基板
を構成してもよく、或いは適当な補強用繊維 (例、ガラ
スクロス) に樹脂を含浸させてプリプレグを形成し、こ
のプリプレグを積層成形してリジット積層基板を構成す
ることもできる。それにより、現在の最高品質の基板で
あるポリイミド系基板と同等以上の性能を示す、高品質
のプリント配線板用基板が得られる。この基板に銅箔を
接合すると、銅張積層基板が得られる。
Like the polyimide resin, the condensed polycyclic aromatic resin may be simply molded into a plate shape to form a flexible substrate, or a suitable reinforcing fiber (eg, glass cloth) may be formed. It is also possible to impregnate a resin to form a prepreg, and laminate and mold the prepreg to form a rigid laminated substrate. As a result, it is possible to obtain a high-quality printed wiring board substrate exhibiting performance equal to or higher than that of the polyimide-based substrate, which is currently the highest quality substrate. When a copper foil is joined to this substrate, a copper clad laminated substrate is obtained.

【0009】一般に、フレキシブル基板と銅箔との接合
は接着剤により行われるが、リジッド基板(積層基板)
の場合には、接着剤を使用せずに、プリプレグの積層成
形時に銅箔も重ねて熱プレスすることによって、積層と
同時にプリプレグの含浸樹脂により銅箔と基板との接合
も行われる。従って、使用する樹脂には銅箔との接着性
も要求され、また銅箔の接着強度 (剥離強度) を高める
ために、銅箔の接着面に種々の表面処理を施すことも行
われてきた。
Generally, a flexible substrate and a copper foil are joined by an adhesive, but a rigid substrate (laminated substrate)
In this case, without using an adhesive, the copper foil is also laminated and hot pressed at the time of laminating and forming the prepreg, so that the copper foil and the substrate are joined by the impregnating resin of the prepreg simultaneously with the laminating. Therefore, the resin used is also required to have adhesiveness with copper foil, and in order to enhance the adhesive strength (peeling strength) of copper foil, various surface treatments have been performed on the adhesive surface of copper foil. .

【0010】[0010]

【発明が解決しようとする課題】上述した縮合多環系芳
香族樹脂を含浸させたプリプレグを用いたリジッド銅張
積層基板の製造においては、銅箔と樹脂との接着性を高
めるための適当な銅箔の表面処理手段が見出されておら
ず、現状では未処理の電解銅箔をそのまま使用してい
る。そのため、積層基板と銅箔との接着強度が十分では
なく、銅箔の剥離強度は約0.3 kgf/cmと低水準にとどま
っていた。
In the production of a rigid copper clad laminate using a prepreg impregnated with the above-mentioned condensed polycyclic aromatic resin, it is suitable to increase the adhesion between the copper foil and the resin. No means for surface treatment of copper foil has been found, and at present, untreated electrolytic copper foil is used as it is. Therefore, the adhesive strength between the laminated substrate and the copper foil was not sufficient, and the peel strength of the copper foil remained at a low level of about 0.3 kgf / cm.

【0011】本発明の目的は、特に上記縮合多環系芳香
族樹脂を含浸樹脂とする銅張積層基板の製造に有用な、
樹脂との接着強度が改善された、表面処理された銅箔を
提供することである。
The object of the present invention is particularly useful for producing a copper-clad laminated substrate containing the above condensed polycyclic aromatic resin as an impregnating resin,
It is intended to provide a surface-treated copper foil having an improved adhesive strength with a resin.

【0012】[0012]

【課題を解決するための手段】本発明者は、上記縮合多
環系芳香族樹脂の製造において架橋剤として用いられる
原料物質である、少なくとも2個のヒドロキシメチル基
またはハロメチル基を有する芳香族化合物が、積層基板
との接着性を高めるための銅箔の表面処理剤として最適
であること、また同様の接着性の改善はクロメート処理
液による銅箔の表面処理によっても得られることを知
り、本発明を完成した。
The present inventors have found that the aromatic compound having at least two hydroxymethyl groups or halomethyl groups, which is a raw material used as a cross-linking agent in the production of the above condensed polycyclic aromatic resin. However, we found that it is the most suitable as a surface treatment agent for copper foil to enhance the adhesiveness to a laminated substrate, and that similar improvement in adhesiveness can also be obtained by surface treatment of a copper foil with a chromate treatment liquid. Completed the invention.

【0013】ここに、本発明の要旨は、ヒドロキシメ
チル基およびハロメチル基から選ばれた少なくとも2個
の置換基を有する芳香族化合物、またはクロメート処
理液、により表面処理された、銅張積層基板製造用の銅
箔にある。
Here, the gist of the present invention is to produce a copper clad laminated substrate which has been surface-treated with an aromatic compound having at least two substituents selected from a hydroxymethyl group and a halomethyl group or a chromate treatment liquid. It is on copper foil.

【0014】本発明により上記の芳香族化合物で表面
処理された銅箔は、上記縮合多環系芳香族樹脂を用いた
銅張積層基板の製造に特に適しているが、ポリイミド樹
脂、フェノール樹脂、エポキシ樹脂などを含浸樹脂とし
て用いた銅張積層基板の製造にも利用でき、そのような
場合にも銅箔の接着強度を高めることができる。また、
のクロメート処理液で表面処理された銅箔は、上記各
種の銅張積層基板の製造に利用できる。
The copper foil surface-treated with the above aromatic compound according to the present invention is particularly suitable for producing a copper clad laminate using the above condensed polycyclic aromatic resin, but a polyimide resin, a phenol resin, It can also be used to manufacture a copper clad laminate using an epoxy resin or the like as an impregnating resin, and in such a case, the adhesive strength of the copper foil can be increased. Also,
The copper foil surface-treated with the chromate treatment liquid can be used for manufacturing the above various copper clad laminated substrates.

【0015】[0015]

【作用】縮合多環系芳香族樹脂は、縮合多環芳香族化合
物または縮合多環芳香族化合物と単環芳香族化合物との
混合物からなる原料物質 (例、ナフタレン、またはナフ
タレンとフェノールとの混合物) と、少なくとも2個の
ヒドロキシメチル基またはハロメチル基を有する芳香族
化合物からなる架橋剤 [例、ジヒドロキシメチルベンゼ
ン (別名:キシリレングリコール)]とを、酸触媒 (例、
原料または架橋剤と反応性または水不溶性のスルホン酸
化合物) の存在下で反応させることにより得られる熱硬
化性樹脂である。この反応は、溶融状態でも、また溶液
状もしくは分散液状で実施することもできる。
The condensed polycyclic aromatic resin is a raw material composed of a condensed polycyclic aromatic compound or a mixture of a condensed polycyclic aromatic compound and a monocyclic aromatic compound (eg, naphthalene, or a mixture of naphthalene and phenol). ) And a crosslinking agent composed of an aromatic compound having at least two hydroxymethyl groups or halomethyl groups [eg, dihydroxymethylbenzene (also known as xylylene glycol)], and an acid catalyst (eg,
It is a thermosetting resin obtained by reacting a raw material or a crosslinking agent in the presence of a reactive or water-insoluble sulfonic acid compound). This reaction can be carried out in the molten state, or in the form of a solution or dispersion.

【0016】リジッド型の積層基板を製造するには、上
記反応で生成した熱硬化性樹脂 (Bステージ樹脂) を補
強用繊維に含浸させてプリプレグを製造する。プリプレ
グの製造は、溶剤法とホットメルト法のいずれの方法で
も実施できる。溶剤法は、樹脂を適当な有機溶媒に溶解
した樹脂溶液(ワニス)を補強用繊維に含浸させ、加熱
により脱溶媒してプリプレグを得る方法である。ホット
メルト法は、少なくとも一方に加熱溶融した樹脂を塗工
した2枚の離型紙の間に補強用繊維を挟み、これを加熱
ロールの間に通して樹脂を溶融させ、繊維に含浸させる
方法である。
In order to manufacture a rigid type laminated substrate, a reinforcing fiber is impregnated with the thermosetting resin (B stage resin) produced by the above reaction to manufacture a prepreg. The prepreg can be manufactured by either a solvent method or a hot melt method. The solvent method is a method of impregnating a reinforcing fiber with a resin solution (varnish) in which a resin is dissolved in an appropriate organic solvent, and removing the solvent by heating to obtain a prepreg. The hot melt method is a method of sandwiching a reinforcing fiber between two release papers coated with a resin which is heated and melted on at least one side, and passing the reinforcing fiber between heating rolls to melt the resin and impregnate the fiber. is there.

【0017】補強用繊維としては、従来より積層基板の
製造に用いられている任意の絶縁性繊維が使用できる
が、通常はガラス繊維である。特に、低誘電率のガラス
繊維を使用することが好ましい。その形態は、クロス、
マット、テープなどが可能であるが、最も普通にはガラ
スクロスである。プリプレグ中の樹脂含有率は20〜60重
量%の範囲内が適当である。プリプレグ中には、縮合多
環系芳香族樹脂と補強用繊維のほかに、難燃剤、カップ
リング処理剤などの公知の各種の添加剤の1種もしくは
2種以上を含有させることもできる。
As the reinforcing fiber, any insulating fiber conventionally used for manufacturing a laminated substrate can be used, but it is usually glass fiber. Particularly, it is preferable to use glass fibers having a low dielectric constant. The form is cross,
Mats, tapes, etc. are possible, but most commonly glass cloth. The resin content in the prepreg is appropriately in the range of 20 to 60% by weight. The prepreg may contain, in addition to the condensed polycyclic aromatic resin and the reinforcing fiber, one or more kinds of various known additives such as a flame retardant and a coupling treatment agent.

【0018】このプリプレグを5〜20枚程度積層し、熱
プレス法により積層体を熱圧着させると同時に樹脂を所
望の程度まで硬化させることにより積層成形すると、リ
ジッド型の積層基板が得られる。適当な熱プレス条件
は、温度 120〜230 ℃、加圧力25〜100 kgf/cm2 、保持
時間10〜120 分間である。この熱プレスは、通常は積層
体を2枚の銅箔の間に挟み込んでから行う。それにより
リジッド銅張積層基板が直接製造される。その後、銅箔
表面にイメージング、エッチング、金属めっき加工を施
すと、リジッド型プリント配線板が製造される。含浸樹
脂がポリイミド樹脂などの他の熱硬化性樹脂である場合
も、樹脂を変える以外は同様の方法でリジッド銅張積層
基板を製造することができる。
By laminating about 5 to 20 sheets of the prepreg and thermocompressing the laminated body by a hot pressing method, and at the same time laminating and molding the resin to a desired degree, a rigid type laminated substrate is obtained. Suitable heat pressing conditions are a temperature of 120 to 230 ° C., a pressing force of 25 to 100 kgf / cm 2 , and a holding time of 10 to 120 minutes. This hot pressing is usually performed after sandwiching the laminate between two copper foils. As a result, the rigid copper clad laminated board is directly manufactured. Thereafter, the surface of the copper foil is subjected to imaging, etching, and metal plating processing to manufacture a rigid printed wiring board. Even when the impregnating resin is another thermosetting resin such as a polyimide resin, the rigid copper-clad laminated substrate can be manufactured by the same method except that the resin is changed.

【0019】本発明によれば、このようなリジッド銅張
積層基板の製造に有用な銅箔が提供される。この銅箔
は、前述したように、表面処理剤として、ヒドロキシ
メチル基およびハロメチル基から選ばれた少なくとも2
個の置換基を有する芳香族化合物と、クロメート処理
液、のいずれかを使用して、表面処理されたものであ
る。使用する銅箔は、電解銅箔、圧延銅箔のいずれでも
よいが、通常は電解銅箔である。
According to the present invention, there is provided a copper foil useful for manufacturing such a rigid copper clad laminated board. As described above, this copper foil has a surface treatment agent of at least 2 selected from hydroxymethyl group and halomethyl group.
The surface treatment is performed using either an aromatic compound having one substituent or a chromate treatment liquid. The copper foil used may be either an electrolytic copper foil or a rolled copper foil, but is usually an electrolytic copper foil.

【0020】この表面処理の具体的な処理方法は特に制
限されないが、の場合には、上記芳香族化合物を適当
な溶媒 (例、メタノールなどの低級アルコール、シクロ
ヘキサノンなど) に溶解した溶液を調製し、この溶液を
噴霧、浸漬などの手段で銅箔に塗布し、溶媒を除去する
ことにより実施できる。使用可能な芳香族化合物の例に
は、o-、m-またはp-ジヒドロキシメチルベンゼン (別
名:o-、m-またはp-キシリレングリコール) 、ジヒドロ
キシメチルキシレン類、トリヒドロキシメチルベンゼン
類、o-、m-またはp-ジクロロメチルベンゼンなどがあ
る。このうち好ましいは、o-、m-またはp-ジヒドロキシ
メチルベンゼンである。
The specific treatment method of this surface treatment is not particularly limited, but in the case of, a solution is prepared by dissolving the above aromatic compound in a suitable solvent (eg, lower alcohol such as methanol, cyclohexanone, etc.). It can be carried out by applying this solution to a copper foil by means such as spraying or dipping, and removing the solvent. Examples of aromatic compounds that can be used are o-, m- or p-dihydroxymethylbenzene (also known as o-, m- or p-xylylene glycol), dihydroxymethylxylenes, trihydroxymethylbenzenes, o -, M- or p-dichloromethylbenzene. Of these, preferred is o-, m- or p-dihydroxymethylbenzene.

【0021】塗布後、銅箔を加熱して、溶媒の除去と同
時に、銅箔と上記芳香族化合物との間の結合を生じさせ
る。この加熱は、例えば、大気中でにおいて80〜100 ℃
の温度で 0.5〜2時間程度行えばよい。この処理におけ
る芳香族化合物の付着量 (即ち、溶液濃度と処理時間)
は特に制限されず、前述した目的が達成されるように実
験により適当に選択すればよい。
After coating, the copper foil is heated to remove the solvent and simultaneously form a bond between the copper foil and the aromatic compound. This heating is performed, for example, in the air at 80 to 100 ° C.
The temperature may be about 0.5 to 2 hours. Amount of aromatic compounds deposited during this treatment (ie solution concentration and treatment time)
Is not particularly limited, and may be appropriately selected by experiments so that the above-mentioned object is achieved.

【0022】一方、のクロメート処理液による処理
も、上記と同様に、クロメート処理液を噴霧または浸漬
により銅箔に塗布し、次いで加熱して溶媒の水を除去す
ることにより実施できる。使用するクロメート処理液は
特に制限されず、塗布型および反応型のいずれのクロメ
ート処理液でもよい。クロメート処理液は、Cr6+ (通常
は無水クロム酸) と還元剤とを含有する処理液である
が、本発明で用いるクロメート処理液は、他に少なくと
もコロイダルシリカを含有する塗布型クロメート処理液
を用いることが好ましい。処理液はさらにその他の添加
剤を含有するものでもよい。
On the other hand, the treatment with the chromate treatment liquid can also be carried out by spraying or dipping the chromate treatment liquid on the copper foil and then heating to remove water as a solvent, as in the above. The chromate treatment liquid to be used is not particularly limited and may be either a coating type or a reaction type chromate treatment liquid. The chromate treatment liquid is a treatment liquid containing Cr 6+ (usually chromic anhydride) and a reducing agent, but the chromate treatment liquid used in the present invention is a coating type chromate treatment liquid containing at least colloidal silica. Is preferably used. The treatment liquid may further contain other additives.

【0023】このクロメート処理によるクロムの付着量
(即ち、クロメート処理条件) も、積層基板と銅箔との
接着力の改善という目的が達成されるように実験により
選択すればよいが、被処理金属材料の表面に防食皮膜を
形成することが目的である通常のクロメート処理に比べ
れば、本発明でのクロメート処理でのクロム付着量は比
較的少量でよい。従って、例えば、より低濃度のクロメ
ート処理液を使用したり、クロメート処理液の噴霧量を
少なくすることができる。クロメート処理の場合も、塗
布後に銅箔を加熱するが、この加熱は、通常のクロメー
ト処理とは異なり、Cr6+をCr3+に完全に還元することは
必要なく、溶媒を蒸発させる程度とすることが好まし
い。この加熱は、例えば50〜80℃で2〜30分程度が適当
である。
Chromium adhesion amount by this chromate treatment
(That is, the chromate treatment condition) may be selected by experiment so that the purpose of improving the adhesion between the laminated substrate and the copper foil can be achieved, but it is possible to form an anticorrosion film on the surface of the metal material to be treated. Compared to the intended ordinary chromate treatment, the chromium deposition amount in the chromate treatment of the present invention may be relatively small. Therefore, for example, it is possible to use a lower concentration chromate treatment liquid or to reduce the spray amount of the chromate treatment liquid. Also in the case of chromate treatment, the copper foil is heated after coating, but unlike the usual chromate treatment, it is not necessary to completely reduce Cr 6+ to Cr 3+ , and only to evaporate the solvent. Preferably. This heating is suitable at, for example, 50 to 80 ° C. for about 2 to 30 minutes.

【0024】本発明の表面処理された銅箔を使用してリ
ジッド銅張積層基板を製造すると、銅箔の接着性 (剥離
強度) が高まる理由は、完全には解明されていないが、
次のように考えられる。
The reason why the adhesiveness (peeling strength) of the copper foil is increased when a rigid copper clad laminate is manufactured using the surface-treated copper foil of the present invention is not completely understood.
It can be considered as follows.

【0025】一般に銅箔は、空気中との酸素の反応によ
り生じた酸化銅、塩基性酸化銅などの薄い皮膜を表面に
有しており、従って銅箔表面には、水酸基や酸素原子が
存在している。
Generally, a copper foil has a thin film of copper oxide, basic copper oxide, or the like formed on the surface thereof by the reaction of oxygen with the air, and therefore, a hydroxyl group or an oxygen atom exists on the surface of the copper foil. is doing.

【0026】の芳香族化合物で表面処理された銅箔の
場合、この表面処理時の加熱や積層成形時の加熱によ
り、芳香族化合物のヒドロキシメチルまたはハロメチル
官能基が銅箔表面の水酸基や酸素原子と脱水反応する
か、または水素結合を形成することによって、銅箔と芳
香族化合物との間に強固な結合が生成する。一方、表面
処理された銅箔の間にプリプレグの積層体を挟んで熱プ
レスする積層成形時にも、表面処理剤の芳香族化合物は
もともと樹脂中に架橋剤として使用されている成分であ
って、表面処理剤中に残留するヒドロキシメチル基また
はハロメチル基は、樹脂中の原料物質に含まれる水酸基
や芳香族水素原子と縮合反応 (脱水または脱ハロゲン化
水素反応) することができる。結果として、銅箔の表面
処理剤である芳香族化合物が銅箔と積層基板の硬化樹脂
の両者と強固に結合し、その間を架橋することによって
強固な接着力を発現する。
In the case of the copper foil surface-treated with the aromatic compound, the hydroxymethyl or halomethyl functional group of the aromatic compound is converted into a hydroxyl group or an oxygen atom on the surface of the copper foil by the heating during the surface treatment or the heating during the laminating and molding. A strong bond is generated between the copper foil and the aromatic compound by a dehydration reaction with or by forming a hydrogen bond. On the other hand, even during lamination molding in which a laminate of prepreg is sandwiched between surface-treated copper foils and hot pressed, the aromatic compound of the surface treatment agent is a component originally used as a crosslinking agent in the resin, The hydroxymethyl group or halomethyl group remaining in the surface treatment agent can undergo a condensation reaction (dehydration or dehydrohalogenation reaction) with a hydroxyl group or an aromatic hydrogen atom contained in the raw material in the resin. As a result, the aromatic compound, which is the surface treatment agent for the copper foil, is firmly bonded to both the copper foil and the cured resin of the laminated substrate, and a strong adhesive force is exhibited by crosslinking between the two.

【0027】一方、のクロメート処理液で表面処理さ
れた銅箔の場合、この処理中の加熱や積層成形中の加熱
により、Cr6+がCr3+に還元され、生成したクロメート皮
膜中にCr−O−Crというエーテル結合が生成する。この
エーテル基と銅表面の水酸基とが水素結合して、銅箔と
表面処理剤とが強固に結合する。また、積層成形中の加
熱時に、クロメート皮膜中に残留するCr6+が、自身はCr
3+に還元される間に、樹脂に対して酸化作用を及ぼし、
樹脂骨格中にカルボニル結合 (>C=O) を形成し、こ
の樹脂中のカルボニル結合の炭素原子とクロメート皮膜
中の上記エーテル基 (Cr−O−Crの酸素原子) との間に
ファンデルワールス結合が形成されて、表面処理剤は樹
脂とも結合する。それにより、樹脂と銅箔との間に強固
な接着力が発現される。
On the other hand, in the case of the copper foil surface-treated with the chromate treatment liquid, Cr 6+ is reduced to Cr 3+ by heating during this treatment and heating during lamination molding, and Cr in the formed chromate film. An ether bond of —O—Cr is formed. The ether group and the hydroxyl group on the copper surface are hydrogen-bonded to firmly bond the copper foil and the surface treatment agent. Also, when heating during lamination molding, the Cr 6+ remaining in the chromate film is
While being reduced to 3+ , exerts an oxidizing effect on the resin,
A carbonyl bond (> C = O) is formed in the resin skeleton, and van der Waals is formed between the carbon atom of the carbonyl bond in the resin and the ether group (oxygen atom of Cr-O-Cr) in the chromate film. A bond is formed and the surface treatment agent also bonds with the resin. Thereby, a strong adhesive force is developed between the resin and the copper foil.

【0028】上に述べた樹脂との接着作用は、樹脂が上
記縮合多環系芳香族樹脂である場合に特に顕著である
が、他の樹脂 (例、フェノール樹脂、エポキシ樹脂) の
場合にも類似の機構で樹脂と表面処理剤との接着力の発
現は起こりうる。
The above-mentioned adhesive action with the resin is particularly remarkable when the resin is the above-mentioned condensed polycyclic aromatic resin, but also in the case of other resins (eg phenol resin, epoxy resin). The development of the adhesive force between the resin and the surface treatment agent can occur by a similar mechanism.

【0029】[0029]

【実施例】以下、実施例により本発明をさらに具体的に
説明する。実施例において、部および%は、特に指定の
ない限り、重量部および重量%である。
EXAMPLES The present invention will be described in more detail below with reference to examples. In the examples, parts and% are parts by weight and% by weight, unless otherwise specified.

【0030】実施例1 p-キシリレングリコールのエタノール溶液 (10モル%濃
度) を調製し、この溶液を電解銅箔 (厚さ35μm、重量
305 g/m2) に噴霧し (噴霧量100 g/m2) 、次いで80℃に
1時間加熱して、表面処理を完了した。この表面処理後
の銅箔の表面外観は淡い赤銅色であった。
Example 1 An ethanol solution of p-xylylene glycol (10 mol% concentration) was prepared, and this solution was used as an electrolytic copper foil (thickness 35 μm, weight).
305 g / m 2 ) (spray amount 100 g / m 2 ), and then heated to 80 ° C. for 1 hour to complete the surface treatment. The surface appearance of the copper foil after this surface treatment was a pale red copper color.

【0031】一方、下記の方法でプリプレグを製造し
た。ナフタレン100 部、p-キシリレングリコール173
部、および触媒のβ−ナフタレンスルホン酸 8.3部から
なる混合物を、110 ℃で3時間加熱・攪拌することによ
り付加縮合反応させて、Bステージ状態の縮合多環系芳
香族樹脂を得た。この樹脂は外観が褐色透明であり、70
℃における溶融粘度が16,500 cps、数平均分子量が580
であった。この樹脂をテトラヒドロフランに溶解して、
樹脂固形分50%、常温粘度が50cps の樹脂ワニスを調製
した。この樹脂ワニスにTガラスクロス(平織り、厚み
0.1 mm、嵩密度104.5 g/m2) を通過させることにより、
ガラス繊維に樹脂を含浸させた。その後、ガラスクロス
を60℃で1時間乾燥して溶媒を除去し、樹脂含有量約30
%のガラスクロスプリプレグを作製した。
On the other hand, a prepreg was manufactured by the following method. Naphthalene 100 parts, p-xylylene glycol 173
Part and a mixture of 8.3 parts of β-naphthalenesulfonic acid as a catalyst were subjected to an addition condensation reaction by heating and stirring at 110 ° C. for 3 hours to obtain a condensed polycyclic aromatic resin in a B stage state. This resin has a brown transparent appearance and is 70
Melt viscosity at ℃ 16,500 cps, number average molecular weight 580
Met. Dissolve this resin in tetrahydrofuran,
A resin varnish having a resin solid content of 50% and a room temperature viscosity of 50 cps was prepared. T-glass cloth (plain weave, thickness
0.1 mm, bulk density 104.5 g / m 2 )
The glass fiber was impregnated with resin. Then, the glass cloth was dried at 60 ° C for 1 hour to remove the solvent, and the resin content of about 30
% Glass cloth prepreg was prepared.

【0032】このガラスクロスプリプレグを、1.6 mm厚
の成形体が得られる枚数だけ重ね合わせ、上記のように
表面処理された2枚の銅箔の間に挟み込み、100 kgf/cm
2 の圧力下、230 ℃で60分間熱プレスして積層成形する
ことにより、厚さ約1.6 mmのリジッド銅張積層基板を得
た。
The glass cloth prepregs were superposed on each other in such a number that a molded product having a thickness of 1.6 mm was obtained, and sandwiched between the two surface-treated copper foils as described above to obtain 100 kgf / cm.
By heat pressing at 230 ° C. for 60 minutes under the pressure of 2 to perform lamination molding, a rigid copper clad laminate having a thickness of about 1.6 mm was obtained.

【0033】得られた銅張積層基板の銅箔の接着力を調
査するために、JIS C6481 に従って銅箔の剥離強度を測
定したところ、1.0 kgf/cmであった。一方、表面処理し
ていない銅箔を用いて同様に製造したリジッド銅張積層
基板(従来材) の場合の銅箔の剥離強度は0.3 kgf/cmで
あったので、本発明の表面処理された銅箔を使用するこ
とによって、接着力が3倍以上に増大した。
In order to investigate the adhesive strength of the copper foil of the obtained copper-clad laminated substrate, the peel strength of the copper foil was measured according to JIS C6481 and found to be 1.0 kgf / cm. On the other hand, the peel strength of the copper foil in the case of a rigid copper-clad laminated substrate (conventional material) produced in the same manner using a copper foil that was not surface-treated was 0.3 kgf / cm, so the surface treatment of the present invention was performed. The use of copper foil increased the adhesive force more than 3 times.

【0034】実施例2 実施例1で用いた電解銅箔に、塗布型クロメート処理液
(関西ペイント社製、コスマー100)を水で10倍に希釈し
た液を噴霧 (噴霧量100 g/m2) した後、80℃に1時間加
熱して溶媒を蒸発させた。
Example 2 The electrolytic copper foil used in Example 1 was coated with a coating type chromate treatment liquid.
(Kansai Paint Co., Ltd., Cosmer 100) was sprayed with a 10-fold diluted solution with water (spray amount 100 g / m 2 ), and then the solvent was evaporated by heating to 80 ° C. for 1 hour.

【0035】こうしてクロメート処理液で表面処理され
た銅箔を使用して、実施例1と同様にリジッド銅張積層
基板を作製した。この銅張基板の銅箔の剥離強度は、や
はり1.0 kgf/cmであり、従来材に比べて接着力は著しく
増大していた。
A rigid copper clad laminate was prepared in the same manner as in Example 1, using the copper foil surface-treated with the chromate treatment solution in this manner. The peel strength of the copper foil of this copper-clad substrate was still 1.0 kgf / cm, and the adhesive strength was remarkably increased as compared with the conventional material.

【0036】[0036]

【発明の効果】実施例にも示すように、本発明により上
記芳香族化合物またはクロメート処理液で表面処理され
た銅箔は、処理液がいずれの種類であっても、これを用
いてリジッド銅張積層基板を作製した時に、銅箔と積層
基板との間の接着力を著しく高めることができる。その
結果、この基板から製造されたプリント配線板の性能、
特に信頼性が改善される。本発明は、特に縮合多環系芳
香族樹脂を含浸樹脂とするリジッド積層基板の銅張りに
有用であり、これまで適切な表面処理方法が確立されて
いなったこの積層基板用の銅箔の表面処理として最適の
ものである。
As shown in the examples, the copper foil surface-treated with the above-mentioned aromatic compound or chromate treatment liquid according to the present invention can be used with any kind of treatment liquid to prepare rigid copper. The adhesive force between the copper foil and the laminated substrate can be significantly increased when the stretched laminated substrate is manufactured. As a result, the performance of printed wiring boards manufactured from this board,
Especially, the reliability is improved. INDUSTRIAL APPLICABILITY The present invention is particularly useful for copper-clad rigid laminated substrates containing condensed polycyclic aromatic resin as an impregnating resin, and the surface of a copper foil for this laminated substrate for which a suitable surface treatment method has not been established until now. This is the optimum processing.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ヒドロキシメチル基およびハロメチル基
から選ばれた少なくとも2個の置換基を有する芳香族化
合物により表面処理された、銅張積層基板製造用の銅
箔。
1. A copper foil for producing a copper-clad laminate, which is surface-treated with an aromatic compound having at least two substituents selected from a hydroxymethyl group and a halomethyl group.
【請求項2】 クロメート処理液により表面処理され
た、銅張積層基板製造用の銅箔。
2. A copper foil for producing a copper-clad laminated substrate, the surface of which is treated with a chromate treatment liquid.
JP5046934A 1993-03-08 1993-03-08 Surface treated copper foil Withdrawn JPH06256966A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5046934A JPH06256966A (en) 1993-03-08 1993-03-08 Surface treated copper foil

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5046934A JPH06256966A (en) 1993-03-08 1993-03-08 Surface treated copper foil

Publications (1)

Publication Number Publication Date
JPH06256966A true JPH06256966A (en) 1994-09-13

Family

ID=12761152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5046934A Withdrawn JPH06256966A (en) 1993-03-08 1993-03-08 Surface treated copper foil

Country Status (1)

Country Link
JP (1) JPH06256966A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001277427A (en) * 2000-04-04 2001-10-09 Risho Kogyo Co Ltd Copper clad laminated sheet
WO2003102277A1 (en) * 2002-06-04 2003-12-11 Mitsui Mining & Smelting Co.,Ltd. Surface treatment copper foil for low dielectric substrate, copper clad laminate including the same and printed wiring board
US10391558B2 (en) 2013-12-20 2019-08-27 Posco Powder manufacturing apparatus and powder forming method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56156138A (en) * 1980-04-30 1981-12-02 Matsushita Electric Works Ltd Pulse detecting sensor
JPS63100007U (en) * 1986-12-19 1988-06-29
JPS63102402U (en) * 1986-12-23 1988-07-04
JPH01135329A (en) * 1987-10-08 1989-05-29 Critikon Inc Pulse oximeter sensor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56156138A (en) * 1980-04-30 1981-12-02 Matsushita Electric Works Ltd Pulse detecting sensor
JPS63100007U (en) * 1986-12-19 1988-06-29
JPS63102402U (en) * 1986-12-23 1988-07-04
JPH01135329A (en) * 1987-10-08 1989-05-29 Critikon Inc Pulse oximeter sensor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001277427A (en) * 2000-04-04 2001-10-09 Risho Kogyo Co Ltd Copper clad laminated sheet
WO2003102277A1 (en) * 2002-06-04 2003-12-11 Mitsui Mining & Smelting Co.,Ltd. Surface treatment copper foil for low dielectric substrate, copper clad laminate including the same and printed wiring board
US6969557B2 (en) 2002-06-04 2005-11-29 Mitsui Mining & Smelting Co., Ltd. Surface-treated copper foil low-dielectric substrate and copper-clad laminate and printed wiring board using the same
CN1316066C (en) * 2002-06-04 2007-05-16 三井金属矿业株式会社 Surface treatment copper foil for low dielectric substrate, copper clad laminate including the same and printed wiring board
US10391558B2 (en) 2013-12-20 2019-08-27 Posco Powder manufacturing apparatus and powder forming method

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