JPH06252281A - Cap for semiconductor device and its manufacture - Google Patents

Cap for semiconductor device and its manufacture

Info

Publication number
JPH06252281A
JPH06252281A JP30504793A JP30504793A JPH06252281A JP H06252281 A JPH06252281 A JP H06252281A JP 30504793 A JP30504793 A JP 30504793A JP 30504793 A JP30504793 A JP 30504793A JP H06252281 A JPH06252281 A JP H06252281A
Authority
JP
Japan
Prior art keywords
plating film
cap
cobalt
corrosion
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30504793A
Other languages
Japanese (ja)
Inventor
Takeshi Yoda
猛 依田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP30504793A priority Critical patent/JPH06252281A/en
Publication of JPH06252281A publication Critical patent/JPH06252281A/en
Pending legal-status Critical Current

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  • Light Receiving Elements (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

PURPOSE:To absorb reflected light and prevent stray light, by forming a corrosion-resistant base plating film on a cap main body, and forming a cobalt or cobalt alloy plating film so as to be almost black on the corrosion resistant base plating film. CONSTITUTION:A transmission hole 22 is formed on the upper surface of the cap main body 21, and a corrosion resistant base plating film 23 is formed on the surface of the transmission hole 22. A cobalt or cobalt alloy plating film 24 is formed on the film 23. By fusing low melting point glass 25, a light transmission window body 26 composed of rigid glass is fixed so as to cover the transmission hole 22. By heat treatment for about 30 minutes, the cobalt or cobalt alloy plating film 24 is oxidized to form a black oxide film. Thereby generation of stray light is prevented to the utmost, and malfunction can be prevented.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置用キャップ及
びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device cap and a method of manufacturing the cap.

【0002】[0002]

【従来の技術】LD(レーザーディスク)用の投受光装
置は、これが組み込まれる家電製品等が小型化すること
により、必然的に小型化の要請が強い。図3は上記の投
受光装置であり、ステム10の所要個所に投光用のレー
ザー素子11、受光用のレーザー素子12が搭載され、
これら素子を硬質ガラス等からなる光透過用窓体13を
有するキャップ14にて気密に封止している。15はレ
ーザ素子11、12に対応するモニター用素子である。
光透過用窓体13は低融点ガラス16にてキャップ本体
17の透孔18を覆って溶着されている。19はホログ
ラムガラスである。
2. Description of the Related Art A light emitting and receiving device for an LD (laser disk) is inevitably required to be downsized as home electric appliances and the like into which it is incorporated are downsized. FIG. 3 shows the above-mentioned light projecting / receiving device, in which a laser device 11 for projecting light and a laser device 12 for receiving light are mounted at required portions of the stem 10.
These elements are hermetically sealed by a cap 14 having a light transmitting window 13 made of hard glass or the like. Reference numeral 15 is a monitor element corresponding to the laser elements 11 and 12.
The light transmitting window body 13 is welded by a low melting point glass 16 covering the through hole 18 of the cap body 17. Reference numeral 19 is a hologram glass.

【0003】[0003]

【発明が解決しようとする課題】従来これらの装置は、
投光用、受光用がそれぞれ別個に設けられていたが、昨
今において、上記のように小型化の要請等から共通のス
テム上に素子を搭載した投受光兼用の装置が開発されて
いる。このように装置が小型化していること、また投受
光兼用のものになってきていることで最大の問題は、特
に受光の際の迷光による誤動作の問題である。なお、図
4は光透過用窓体13を有しないタイプのレーザ素子搭
載装置を示す。この装置ではホログラムガラス19を樹
脂系接着剤でキャップ本体17に接着している。このよ
うに光透過窓体を有しないタイプの製品の場合も上述し
たと同様に迷光による問題がある。
Conventionally, these devices have been
Although the light-transmitting device and the light-receiving device were separately provided, in recent years, a device for both light-transmitting and light-receiving has been developed in which an element is mounted on a common stem due to the demand for miniaturization as described above. The biggest problem with the downsizing of the device and the combined use of light emitting and receiving devices is a problem of malfunction due to stray light during light reception. FIG. 4 shows a laser element mounting device of a type that does not have the light transmitting window body 13. In this device, the hologram glass 19 is bonded to the cap body 17 with a resin adhesive. As described above, the product of the type that does not have the light transmitting window has a problem due to stray light.

【0004】そこで、本発明は上記問題点を解決すべく
なされたものであり、その目的とするところは、反射光
を吸収し、迷光を防止できる半導体装置用キャップ及び
その製造方法を提供するにある。
Therefore, the present invention has been made to solve the above problems, and an object of the present invention is to provide a cap for a semiconductor device capable of absorbing reflected light and preventing stray light, and a method for manufacturing the same. is there.

【0005】[0005]

【課題を解決するための手段】本発明は上記目的を達成
するため次の構成を備える。すなわち、半導体装置用キ
ャップにおいて、キャップ本体に耐蝕下地めっき皮膜が
形成され、該耐蝕下地めっき皮膜上にコバルトまたはコ
バルト合金のめっき皮膜がほぼ黒色に形成されているこ
とを特徴とする。また、前記キャップ本体に光透過用窓
体が気密に封止されている半導体装置用キャップにおい
て、前記キャップ本体に耐蝕下地めっき皮膜が形成さ
れ、該耐蝕下地めっき皮膜上にコバルトまたはコバルト
合金のめっき皮膜がほぼ黒色に形成されていることを特
徴とする。また、半導体装置用キャップの製造方法にお
いて、前記キャップ本体に電解ニッケルめっき、無電解
ニッケルめっき等の耐蝕下地めっきを施し、該耐蝕下地
めっき皮膜上にコバルトまたはコバルト合金のめっき皮
膜を形成し、該めっき皮膜を加熱処理によりほぼ黒色に
形成することを特徴とする。また、キャップ本体に光透
過用窓体が気密に封止されている半導体装置用キャップ
の製造方法において、前記キャップ本体に電解ニッケル
めっき、無電解ニッケルめっき等の耐蝕下地めっきを施
し、該耐蝕下地めっき皮膜上にコバルトまたはコバルト
合金のめっき皮膜を形成し、該めっき皮膜上に前記光透
過用窓体を低融点ガラスを用いて加熱溶着することを特
徴とする。また、めっき皮膜を加熱処理によりほぼ黒色
に形成した後、該めっき皮膜上に前記光透過用窓体を低
融点ガラスを用いて加熱溶着することを特徴とする。
The present invention has the following constitution in order to achieve the above object. That is, in the semiconductor device cap, a corrosion-resistant undercoat plating film is formed on the cap body, and a cobalt or cobalt alloy plating film is formed on the corrosion-resistant undercoat plating film in a substantially black color. Further, in a cap for a semiconductor device in which a window for light transmission is hermetically sealed in the cap body, a corrosion-resistant undercoat plating film is formed on the cap body, and cobalt or cobalt alloy plating is performed on the corrosion-resistant undercoat plating film. It is characterized in that the film is formed almost black. In the method for manufacturing a cap for a semiconductor device, electrolytic nickel plating, electroless nickel plating, or other corrosion-resistant undercoat plating is applied to the cap body, and a cobalt or cobalt alloy plating film is formed on the corrosion-resistant undercoat plating film. It is characterized in that the plating film is formed to be almost black by heat treatment. Further, in the method for manufacturing a cap for a semiconductor device in which a light-transmitting window is hermetically sealed in the cap body, the cap body is subjected to corrosion-resistant base plating such as electrolytic nickel plating and electroless nickel plating, It is characterized in that a cobalt or cobalt alloy plating film is formed on the plating film, and the light-transmitting window body is heat-welded on the plating film by using a low melting point glass. Further, the present invention is characterized in that after the plating film is formed into a substantially black color by heat treatment, the light transmitting window body is heat-welded onto the plating film by using a low melting point glass.

【0006】[0006]

【作用】本発明によれば、コバルトまたはコバルト合金
めっき皮膜の酸化により、キャップ表面に黒色皮膜が形
成されるので、反射光を吸収して迷光の発生を極力防止
できる半導体装置用キャップを提供しうる。またキャッ
プ本体にコバルトまたはコバルト合金めっき皮膜の酸化
膜が形成されることで低融点ガラスとキャップ本体との
密着性を向上させることができる。さらに本発明方法に
よれば、キャップ内面に容易に黒色皮膜を形成すること
ができ、また、光透過用窓体を溶着する前工程でめっき
工程が済んでしまい、低融点ガラスがウェット工程を経
ることがないので、めっき液による浸食等により低融点
ガラスが劣化するという事態を解消できる。
According to the present invention, a black film is formed on the surface of the cap by the oxidation of the cobalt or cobalt alloy plating film. Therefore, a cap for a semiconductor device capable of absorbing reflected light and preventing stray light from being generated is provided. sell. Further, by forming an oxide film of a cobalt or cobalt alloy plating film on the cap body, it is possible to improve the adhesion between the low melting point glass and the cap body. Further, according to the method of the present invention, a black film can be easily formed on the inner surface of the cap, and the plating step is completed in the step before welding the light transmitting window body, and the low melting point glass undergoes the wet step. Since it does not occur, it is possible to eliminate the situation that the low melting point glass deteriorates due to erosion by the plating solution.

【0007】[0007]

【実施例】以下、本発明の好適な実施例を添付図面に基
づいて詳細に説明する。図1はレーザ素子搭載装置用キ
ャップ20の一例を示す。21はキャップ本体で、鉄−
ニッケル合金等の金属からなる。キャップ本体21の上
面には透孔22が形成されている。キャップ本体21に
は、まずその表面に耐蝕下地めっき皮膜23が形成され
る。耐蝕下地めっきとしては電解ニッケルめっきあるい
は無電解ニッケルめっきが好適である。耐蝕下地めっき
皮膜23の厚さは特に限定されないが、2〜7μm程度
が好適である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 shows an example of a laser device mounting device cap 20. 21 is a cap body, which is iron-
It is made of metal such as nickel alloy. A through hole 22 is formed in the upper surface of the cap body 21. On the surface of the cap body 21, first, a corrosion-resistant base plating film 23 is formed. Electrolytic nickel plating or electroless nickel plating is suitable as the corrosion-resistant base plating. The thickness of the corrosion-resistant base plating film 23 is not particularly limited, but is preferably about 2 to 7 μm.

【0008】耐蝕下地めっき皮膜23上にはコバルトま
たはコバルト合金めっき皮膜24が形成される。コバル
ト合金めっきとしては、Ni−Co、Sn−Ni−C
o、Sn−Co、Cr−Co合金めっきなどが可能であ
る。コバルトまたはコバルト合金めっき皮膜24は、こ
の後に酸化処理されて酸化膜が形成されることから、あ
まり厚い酸化膜になると後工程でのステムへのレーザー
溶接等によるキャッピング工程での障害となるので、そ
れ程厚くせず、0.5〜3μm、好適には1.5〜2μ
m程度とする。
A cobalt or cobalt alloy plating film 24 is formed on the corrosion-resistant base plating film 23. For cobalt alloy plating, Ni-Co, Sn-Ni-C
O, Sn-Co, Cr-Co alloy plating and the like are possible. Since the cobalt or cobalt alloy plating film 24 is subsequently subjected to an oxidation treatment to form an oxide film, if the oxide film is too thick, it will be an obstacle in the capping process such as laser welding to the stem in a subsequent process. Do not make it so thick, 0.5-3 μm, preferably 1.5-2 μm
It is about m.

【0009】次に、低融点ガラス25にて硬質ガラスか
らなる光透過用窓体26をキャップ本体21の透孔22
を覆って溶着する。低融点ガラス25は粉末ガラスをリ
ング状に成形したタブレットを用い、上記のようにめっ
き処理を施したキャップ本体21、タブレット、光透過
用窓体26を治具(図示せず)に装填し、炉中にいれて
酸化雰囲気中450〜500℃にて約30分の熱処理を
行う。これにより低融点ガラス25が溶けて光透過用窓
体26をキャップ本体21に溶着できる。その際上記の
熱処理によりコバルトまたはコバルト合金めっき皮膜2
4が酸化され、黒色の酸化皮膜となる。この酸化皮膜
は、タブレットが溶解する際に同時に形成されて、低融
点ガラスとの密着性が向上し、光透過用窓体26のキャ
ップ本体21への固定強度が増大する作用も呈する。
Next, a low-melting glass 25 is used to form a light-transmitting window body 26 made of hard glass into the through hole 22 of the cap body 21.
Cover and weld. As the low melting point glass 25, a tablet formed by molding powder glass into a ring shape is used, and the cap main body 21, the tablet, and the light transmitting window body 26 plated as described above are loaded into a jig (not shown), Heat treatment is performed in an oven at 450 to 500 ° C. for about 30 minutes in an oxidizing atmosphere. As a result, the low melting point glass 25 is melted, and the light transmitting window body 26 can be welded to the cap body 21. At that time, the cobalt or cobalt alloy plating film 2 is formed by the above heat treatment.
4 is oxidized to form a black oxide film. This oxide film is formed at the same time as the tablet is melted, and the adhesiveness with the low melting point glass is improved, and the fixing strength of the light transmitting window body 26 to the cap body 21 also increases.

【0010】なお、光透過用窓体26を低融点ガラス2
5にて溶着する前に、コバルトまたはコバルト合金めっ
き皮膜24を加熱処理により黒化させ、しかる後に低融
点ガラス25により光透過用窓体26を溶着するように
してもよい。上記のようにして得られたレーザ素子搭載
装置用キャップ20をレーザー素子を搭載したステムに
レーザー溶接により固定し、投受光特性を調べたとこ
ろ、特に受光の際、入光された光の反射光がキャップ本
体21の黒化処理された内面にて吸収され、迷光の発生
を防止できた。
In addition, the light transmitting window 26 is formed of the low melting point glass 2
The cobalt or cobalt alloy plating film 24 may be blackened by heat treatment before being welded at 5, and then the light transmitting window 26 may be welded by the low melting point glass 25. When the laser element mounting device cap 20 obtained as described above was fixed to the stem on which the laser element was mounted by laser welding and the light emitting and receiving characteristics were examined, particularly when receiving light, the reflected light of the light received was reflected. Was absorbed by the blackened inner surface of the cap body 21, and the generation of stray light could be prevented.

【0011】図2はレーザ素子搭載装置用キャップで光
透過用窓体13を有しないタイプの実施例を示す。この
実施例ではまず、キャップ本体12に電解ニッケルめっ
き等の耐蝕下地めっきを施し、次に耐蝕下地めっき皮膜
23上にコバルトまたはコバルト合金めっき皮膜24を
設けた後、炉中に入れ、酸化雰囲気で熱処理を施して黒
化処理を施す。得られた製品は上記実施例と同様にキャ
ップ表面に黒色皮膜が形成され、迷光を防止して好適な
レーザ素子搭載装置用キャップとして使用することがで
きた。
FIG. 2 shows an embodiment of a type which is a cap for a laser device mounting apparatus and which does not have a window 13 for transmitting light. In this embodiment, first, the cap body 12 is subjected to corrosion resistant undercoating such as electrolytic nickel plating, and then the cobalt or cobalt alloy plating film 24 is provided on the corrosion resistant undercoating film 23, and then the cap body 12 is placed in a furnace and exposed to an oxidizing atmosphere. A blackening process is performed by heat treatment. The obtained product had a black film formed on the surface of the cap, as in the above-mentioned Examples, and was able to prevent stray light and could be used as a suitable cap for a laser device mounting apparatus.

【0012】なお、上記実施例のレーザ素子搭載装置用
キャップ20は投受光兼用の装置にばかりでなく、投光
用、受光用専用の装置にも用いることができることはも
ちろんである。またキャップ本体21の内面は鏡面でな
く、梨地加工等を施しておくことにより、さらに光の吸
収性を向上させることができる。
Of course, the laser element mounting device cap 20 of the above embodiment can be used not only as a device for both projecting and receiving light, but also as a device for projecting and receiving light. In addition, the inner surface of the cap body 21 is not a mirror surface, but by performing satin finish or the like, it is possible to further improve light absorption.

【0013】[0013]

【発明の効果】本発明に係る半導体装置用キャップによ
れば、コバルトまたはコバルト合金めっき皮膜の酸化に
より、黒色皮膜が形成されるので、迷光の発生を極力防
止して誤動作等を防止することができる。また、光透過
用窓体を取り付けた製品では、キャップ本体にコバルト
またはコバルト合金めっき皮膜の酸化膜が形成されるこ
とで低融点ガラスとキャップ本体との密着性を向上させ
ることができる。また、本発明方法によれば、キャップ
内面に容易に黒色皮膜を形成することができ、また、光
透過用窓体を溶着する前工程でめっき工程が済んでしま
い、低融点ガラスがウェット工程を経ることがないの
で、めっき液による浸食等により低融点ガラスが劣化す
るという事態を解消できる等の著効を奏する。
According to the cap for a semiconductor device of the present invention, a black film is formed by the oxidation of the cobalt or cobalt alloy plating film, so that it is possible to prevent the occurrence of stray light as much as possible and prevent malfunctions. it can. In addition, in the product having the window body for transmitting light, the oxide film of the cobalt or cobalt alloy plating film is formed on the cap body, so that the adhesion between the low melting point glass and the cap body can be improved. Further, according to the method of the present invention, it is possible to easily form a black film on the inner surface of the cap, and the plating step is completed in the previous step of welding the window body for light transmission, and the low melting point glass is wet. Since it does not pass through, it has a remarkable effect that it can solve the situation that the low melting point glass is deteriorated due to erosion by the plating solution.

【図面の簡単な説明】[Brief description of drawings]

【図1】レーザ素子搭載装置用キャップの実施例を示す
断面図である。
FIG. 1 is a cross-sectional view showing an embodiment of a cap for a laser device mounting apparatus.

【図2】レーザ素子搭載装置用キャップの実施例を示す
断面図である。
FIG. 2 is a cross-sectional view showing an example of a cap for a laser device mounting apparatus.

【図3】従来のレーザ素子搭載装置の断面図である。FIG. 3 is a sectional view of a conventional laser device mounting apparatus.

【図4】従来のレーザ素子搭載装置の断面図である。FIG. 4 is a cross-sectional view of a conventional laser element mounting device.

【符号の説明】[Explanation of symbols]

20 レーザ素子搭載装置用キャップ 21 キャップ本体 22 透孔 23 耐蝕下地めっき皮膜 24 コバルトまたはコバルト合金めっき皮膜 25 低融点ガラス 26 光透過用窓体 20 Cap for Laser Device Mounting Device 21 Cap Main Body 22 Through Hole 23 Corrosion Resistant Undercoat Plating Film 24 Cobalt or Cobalt Alloy Plating Film 25 Low Melting Glass 26 Light Transmitting Window

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 31/12 J 7210−4M ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location H01L 31/12 J 7210-4M

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 キャップ本体に耐蝕下地めっき皮膜が形
成され、該耐蝕下地めっき皮膜上にコバルトまたはコバ
ルト合金のめっき皮膜がほぼ黒色に形成されていること
を特徴とする半導体装置用キャップ。
1. A cap for a semiconductor device, wherein a corrosion-resistant underlayer plating film is formed on a cap body, and a cobalt or cobalt alloy plating film is formed on the corrosion-resistant underlayer plating film in a substantially black color.
【請求項2】 キャップ本体に光透過用窓体が気密に封
止されている半導体装置用キャップにおいて、 前記キャップ本体に耐蝕下地めっき皮膜が形成され、該
耐蝕下地めっき皮膜上にコバルトまたはコバルト合金の
めっき皮膜がほぼ黒色に形成されていることを特徴とす
る半導体装置用キャップ。
2. A cap for a semiconductor device in which a window for light transmission is hermetically sealed in a cap body, wherein a corrosion-resistant underlayer plating film is formed on the cap body, and cobalt or cobalt alloy is formed on the corrosion-resistant underlayer plating film. The cap for semiconductor device is characterized in that the plating film of is formed almost black.
【請求項3】 半導体装置用キャップの製造方法におい
て、 前記キャップ本体に電解ニッケルめっき、無電解ニッケ
ルめっき等の耐蝕下地めっきを施し、 該耐蝕下地めっき皮膜上にコバルトまたはコバルト合金
のめっき皮膜を形成し、 該めっき皮膜を加熱処理によりほぼ黒色に形成すること
を特徴とする半導体装置用キャップの製造方法。
3. A method for manufacturing a cap for a semiconductor device, wherein the cap body is subjected to corrosion resistant undercoating such as electrolytic nickel plating or electroless nickel plating, and a plating film of cobalt or cobalt alloy is formed on the corrosion resistant undercoat plating film. Then, the method for producing a cap for a semiconductor device, wherein the plating film is formed into a substantially black color by a heat treatment.
【請求項4】 キャップ本体に光透過用窓体が気密に封
止されている半導体装置用キャップの製造方法におい
て、 前記キャップ本体に電解ニッケルめっき、無電解ニッケ
ルめっき等の耐蝕下地めっきを施し、 該耐蝕下地めっき皮膜上にコバルトまたはコバルト合金
のめっき皮膜を形成し、 該めっき皮膜上に前記光透過用窓体を低融点ガラスを用
いて加熱溶着することを特徴とする半導体装置用キャッ
プの製造方法。
4. A method of manufacturing a cap for a semiconductor device, in which a window for light transmission is hermetically sealed in a cap body, wherein the cap body is subjected to corrosion-resistant base plating such as electrolytic nickel plating or electroless nickel plating, Manufacturing of a cap for a semiconductor device, characterized in that a cobalt or cobalt alloy plating film is formed on the corrosion-resistant undercoating film, and the light-transmitting window body is heat-welded to the plating film by using a low melting point glass. Method.
【請求項5】 めっき皮膜を加熱処理によりほぼ黒色に
形成した後、該めっき皮膜上に前記光透過用窓体を低融
点ガラスを用いて加熱溶着することを特徴とする請求項
4記載の半導体装置用キャップの製造方法。
5. The semiconductor according to claim 4, wherein after the plating film is formed into a substantially black color by heat treatment, the window for light transmission is heat-welded on the plating film by using a low melting point glass. Method for manufacturing device cap.
JP30504793A 1992-12-28 1993-12-06 Cap for semiconductor device and its manufacture Pending JPH06252281A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30504793A JPH06252281A (en) 1992-12-28 1993-12-06 Cap for semiconductor device and its manufacture

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4-360178 1992-12-28
JP36017892 1992-12-28
JP30504793A JPH06252281A (en) 1992-12-28 1993-12-06 Cap for semiconductor device and its manufacture

Publications (1)

Publication Number Publication Date
JPH06252281A true JPH06252281A (en) 1994-09-09

Family

ID=26564143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30504793A Pending JPH06252281A (en) 1992-12-28 1993-12-06 Cap for semiconductor device and its manufacture

Country Status (1)

Country Link
JP (1) JPH06252281A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100464763B1 (en) * 1995-06-19 2005-06-23 소니 가부시끼 가이샤 Optical pick-up and light deflecting cover therefor
US7448861B2 (en) 2003-06-26 2008-11-11 Nec Electronics Corporation Resin molded semiconductor device and mold
WO2013168528A1 (en) * 2012-05-09 2013-11-14 奥野製薬工業株式会社 BLACKENING TREATMENT SOLUTION FOR BLACK Cr-Co ALLOY PLATING FILM
JP2018133381A (en) * 2017-02-14 2018-08-23 古河電気工業株式会社 Optical module

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100464763B1 (en) * 1995-06-19 2005-06-23 소니 가부시끼 가이샤 Optical pick-up and light deflecting cover therefor
US7448861B2 (en) 2003-06-26 2008-11-11 Nec Electronics Corporation Resin molded semiconductor device and mold
WO2013168528A1 (en) * 2012-05-09 2013-11-14 奥野製薬工業株式会社 BLACKENING TREATMENT SOLUTION FOR BLACK Cr-Co ALLOY PLATING FILM
CN104254642A (en) * 2012-05-09 2014-12-31 奥野制药工业株式会社 Blackening treatment solution for black cr-co alloy plating film
KR20150009966A (en) * 2012-05-09 2015-01-27 오꾸노 케미칼 인더스트리즈 컴파니,리미티드 BLACKENING TREATMENT SOLUTION FOR BLACK Cr-Co ALLOY PLATING FILM
JPWO2013168528A1 (en) * 2012-05-09 2016-01-07 奥野製薬工業株式会社 Blackening solution for black Cr-Co alloy plating film
US9920416B2 (en) 2012-05-09 2018-03-20 Okuno Chemical Industries Co., Ltd. Blackening treatment solution for black Cr—Co alloy plating film
JP2018133381A (en) * 2017-02-14 2018-08-23 古河電気工業株式会社 Optical module

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