JPH06251741A - Automatic magnifying power setting method in scanning electron microscope - Google Patents

Automatic magnifying power setting method in scanning electron microscope

Info

Publication number
JPH06251741A
JPH06251741A JP5033206A JP3320693A JPH06251741A JP H06251741 A JPH06251741 A JP H06251741A JP 5033206 A JP5033206 A JP 5033206A JP 3320693 A JP3320693 A JP 3320693A JP H06251741 A JPH06251741 A JP H06251741A
Authority
JP
Japan
Prior art keywords
scanning
sample
electron beam
scanning width
computer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5033206A
Other languages
Japanese (ja)
Inventor
Akihiko Haraguchi
明彦 原口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON DENSHI TEKUNIKUSU KK
Jeol Ltd
Original Assignee
NIPPON DENSHI TEKUNIKUSU KK
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON DENSHI TEKUNIKUSU KK, Jeol Ltd filed Critical NIPPON DENSHI TEKUNIKUSU KK
Priority to JP5033206A priority Critical patent/JPH06251741A/en
Publication of JPH06251741A publication Critical patent/JPH06251741A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To provide an automatic magnifying power setting method in a scanning electron microscope by which observation magnifying power optimum for the size of an attention area of a sample or a recessed and projecting condition on a sample surface can be set automatically. CONSTITUTION:A computer 12 controls a scanning circuit 6 through a DA converter 13, and changes a scanning width of an electron beam on a sample 4 from the minimum to the maximum. A secondary electron generated according to scanning of the electron beam is detected by a detector 7, and the detecting signals are supplied to the computer 12 through a filter circuit 10 and an AD converter 11. The computer 12 integrates and stores the detecting signals during the single time two dimensional scanning on the sample 4. The computer 12 detects a scanning width when the maximum signal strength is obtained, and sets the scanning width of the electron beam in the value, and when an image is obtained in this scanning width, an attention area of the sample can be observed in the.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子ビームを試料上で
2次元的に走査し、この走査に基づいて得られた2次電
子や反射電子を検出し、この検出信号に基づいて試料の
走査像を得るようにした走査電子顕微鏡における自動倍
率設定方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention two-dimensionally scans an electron beam on a sample, detects secondary electrons and backscattered electrons obtained based on this scanning, and detects the sample based on this detection signal. The present invention relates to an automatic magnification setting method in a scanning electron microscope which obtains a scanning image.

【0002】[0002]

【従来の技術】走査電子顕微鏡では観察倍率は任意に設
定できるように構成されており、走査電子顕微鏡のオペ
レータは、試料の観察に先立って手動で所望の倍率を設
定するか、あるいは固定の倍率を用いて像の観察を行っ
ている。
2. Description of the Related Art A scanning electron microscope is constructed so that an observation magnification can be arbitrarily set, and an operator of the scanning electron microscope manually sets a desired magnification before observing a sample, or a fixed magnification. Is used to observe the image.

【0003】[0003]

【発明が解決しようとする課題】上記した走査像の観察
において、観察対象の試料の内、注目領域が最適に観察
できるように倍率を設定する必要がある。しかし、試料
の注目領域のサイズが既に分かっている場合にはそのサ
イズに最適な倍率を設定することができるが、試料の注
目領域のサイズは通常は事前に知ることが困難であるた
め、最適倍率を見出して設定することは面倒な作業であ
るばかりでなく、熟練も必要である。また、試料表面の
凹凸の状態(粗い凹凸か細かい凹凸か)により、適切な
倍率を設定しなければならないが、この倍率設定も観察
者の熟練によらなければならない。
In the observation of the above-mentioned scanning image, it is necessary to set the magnification so that the region of interest can be optimally observed in the sample to be observed. However, if the size of the region of interest of the sample is already known, it is possible to set the optimum magnification for that size, but it is usually difficult to know the size of the region of interest of the sample, so it is optimal. Finding and setting the magnification is not only a tedious task, but also requires skill. Further, an appropriate magnification must be set depending on the state of the unevenness of the sample surface (whether it is rough unevenness or fine unevenness), but this magnification setting must also depend on the skill of the observer.

【0004】本発明は、このような点に鑑みてなされた
もので、その目的は、試料の注目領域のサイズや試料表
面の凹凸の状態に最適な観察倍率を自動的に設定するこ
とができる走査電子顕微鏡における自動倍率設定方法を
実現するにある。
The present invention has been made in view of the above points, and an object thereof is to be able to automatically set an optimum observation magnification for the size of the region of interest of the sample and the unevenness of the sample surface. It is to realize an automatic magnification setting method in a scanning electron microscope.

【0005】[0005]

【課題を解決するための手段】本発明に基づく走査電子
顕微鏡における自動倍率設定方法は、試料上に電子ビー
ムを細く集束すると共に試料上で電子ビームを2次元的
に走査し、試料から得られた情報に基づいて試料の走査
像を得るようにした走査電子顕微鏡において、試料上の
電子ビームの走査幅を徐々に変化させ、各走査幅ごとに
試料から得られた信号の強度を記憶し、記憶された各走
査幅ごとの信号強度の最大値の時の走査幅を検出し、こ
の走査幅により電子ビームの走査を行い、試料の走査像
を得るようにしたことを特徴としている。
An automatic magnification setting method in a scanning electron microscope based on the present invention is obtained from a sample by finely focusing the electron beam on the sample and scanning the electron beam two-dimensionally on the sample. In a scanning electron microscope configured to obtain a scanning image of a sample based on the information obtained, the scanning width of the electron beam on the sample is gradually changed, and the intensity of the signal obtained from the sample is stored for each scanning width, It is characterized in that the scanning width at the maximum value of the stored signal intensity for each scanning width is detected and the electron beam is scanned by this scanning width to obtain a scanned image of the sample.

【0006】[0006]

【作用】本発明に基づく走査電子顕微鏡における自動倍
率設定方法は、試料上の電子ビームの走査幅を徐々に変
化させ、各走査幅ごとに試料から得られた信号の強度を
記憶し、記憶された各走査幅ごとの信号強度の最大値の
時の走査幅を検出し、この走査幅に基づく倍率に設定し
て像の観察を行う。
The automatic magnification setting method in the scanning electron microscope according to the present invention gradually changes the scanning width of the electron beam on the sample, stores the intensity of the signal obtained from the sample for each scanning width, and stores it. The scanning width at the maximum value of the signal intensity for each scanning width is detected, and the image is observed by setting the magnification based on this scanning width.

【0007】[0007]

【実施例】以下、図面を参照して本発明の一実施例を詳
細に説明する。図1は本発明に基づく自動倍率設定方法
を実施するための走査電子顕微鏡の一例を示しており、
1は電子銃である。電子銃1から発生し加速された電子
ビームEBは集束レンズ2,対物レンズ3によって試料
4上に集束される。また、電子ビームEBは、偏向器5
によって偏向され,試料4上で2次元的に走査される。
偏向器5には走査回路6から走査信号が供給される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 1 shows an example of a scanning electron microscope for carrying out the automatic magnification setting method according to the present invention.
1 is an electron gun. The electron beam EB generated and accelerated by the electron gun 1 is focused on the sample 4 by the focusing lens 2 and the objective lens 3. Further, the electron beam EB is transmitted to the deflector 5
The sample 4 is deflected, and the sample 4 is two-dimensionally scanned.
A scanning signal is supplied to the deflector 5 from the scanning circuit 6.

【0008】試料4への電子ビームの照射に基づいて発
生した2次電子は、2次電子検出器7によって検出され
る。検出器7の検出信号は、増幅器8によって増幅され
た後、陰極線管9に供給されると共に、フィルター回路
10に供給される。フィルター回路10の出力信号は、
AD変換器11を介してコンピュータ12に供給され
る。コンピュータ12はDA変換器13を介して走査回
路6を制御すると共に、DA変換器14を介してフィル
ター回路10を制御する。このような構成の動作を次に
説明する。
Secondary electrons generated by the irradiation of the sample 4 with the electron beam are detected by the secondary electron detector 7. The detection signal of the detector 7 is amplified by the amplifier 8 and then supplied to the cathode ray tube 9 and the filter circuit 10. The output signal of the filter circuit 10 is
It is supplied to the computer 12 via the AD converter 11. The computer 12 controls the scanning circuit 6 via the DA converter 13 and controls the filter circuit 10 via the DA converter 14. The operation of such a configuration will be described below.

【0009】まず、通常の2次電子像を観察する場合、
走査回路6から偏向器5には試料4上の所望領域を電子
ビームが2次元的に走査するための走査信号が供給され
る。この試料4上の電子ビームの走査に基づいて発生し
た2次電子は、検出器7によって検出される。検出器7
の検出信号は電子ビームの2次元走査と同期した陰極線
管9に輝度変調信号として供給されることから、陰極線
管9には試料の2次電子像が表示される。
First, when observing a normal secondary electron image,
From the scanning circuit 6, the deflector 5 is supplied with a scanning signal for two-dimensionally scanning a desired region on the sample 4 with an electron beam. Secondary electrons generated based on the scanning of the electron beam on the sample 4 are detected by the detector 7. Detector 7
The detection signal of is supplied as a brightness modulation signal to the cathode ray tube 9 synchronized with the two-dimensional scanning of the electron beam, so that the secondary electron image of the sample is displayed on the cathode ray tube 9.

【0010】次に、試料4上の注目領域に最適な倍率を
設定する方法を図2のフローチャートを参照しながら説
明する。まず、コンピュータ12に自動倍率設定機能の
スタートを指示すると、コンピュータ12はDA変換器
13を介して走査回路6を制御し、試料4上の電子ビー
ムの走査幅が最小となる走査信号を発生させる。これに
より、電子ビームは試料4上で最も小さな領域の2次元
走査を行う。すなわち、最も倍率の高い状態での電子ビ
ームの走査を行う。
Next, a method of setting the optimum magnification in the region of interest on the sample 4 will be described with reference to the flowchart of FIG. First, when the computer 12 is instructed to start the automatic magnification setting function, the computer 12 controls the scanning circuit 6 via the DA converter 13 to generate a scanning signal that minimizes the scanning width of the electron beam on the sample 4. . As a result, the electron beam performs two-dimensional scanning of the smallest area on the sample 4. That is, the electron beam is scanned in the highest magnification state.

【0011】この電子ビームの走査に基づいて発生した
2次電子は、検出器7によって検出され、その検出信号
はフィルター回路10に供給される。このフィルター回
路10は帯域通過フィルターであり、電子ビームの走査
幅によって決まる電子ビームの走査速度に応じた周波数
帯域の信号を通過させる。このフィルター回路10の通
過周波数帯域は、コンピュータ12からその時の走査幅
に応じた試料上の電子ビームの走査速度に基づいて制御
される。フィルター回路10の出力信号は、AD変換器
11によってディジタル信号に変換された後、コンピュ
ータ12に供給される。コンピュータ12はAD変換器
11から供給された信号を試料4上の1回の2次元走査
の間積算し、記憶する。
Secondary electrons generated by the scanning of the electron beam are detected by the detector 7, and the detection signal is supplied to the filter circuit 10. The filter circuit 10 is a band-pass filter and passes a signal in a frequency band corresponding to the scanning speed of the electron beam, which is determined by the scanning width of the electron beam. The pass frequency band of the filter circuit 10 is controlled by the computer 12 based on the scanning speed of the electron beam on the sample according to the scanning width at that time. The output signal of the filter circuit 10 is converted into a digital signal by the AD converter 11 and then supplied to the computer 12. The computer 12 integrates the signals supplied from the AD converter 11 during one two-dimensional scanning on the sample 4 and stores it.

【0012】次に、電子ビームの試料4上の走査幅を一
定長さ広げ(走査幅アップ)、上記した電子ビームの試
料上の2次元走査と検出信号の積算および記憶を行う。
この走査幅を変化させながらの信号強度の積算と記憶を
電子ビームの走査幅の最大値まで繰り返し行う。すなわ
ち、最も倍率の高い状態から最も倍率の低い状態まで1
フレームごとの検出信号の積算値を求める。図3はこの
ようにして求められた電子ビームの走査幅と信号強度と
の関係を示している。図の横軸が走査幅(周波数)、縦
軸が信号強度の積算値である。
Next, the scanning width of the electron beam on the sample 4 is expanded by a certain length (scanning width is increased), and the two-dimensional scanning of the electron beam on the sample and the integration and storage of the detection signals are performed.
The integration and storage of the signal intensity while changing the scanning width is repeatedly performed up to the maximum value of the scanning width of the electron beam. That is, from the highest magnification to the lowest magnification, 1
Calculate the integrated value of the detection signal for each frame. FIG. 3 shows the relationship between the scanning width of the electron beam and the signal intensity thus obtained. The horizontal axis of the figure is the scanning width (frequency), and the vertical axis is the integrated value of the signal intensity.

【0013】この図3の関係において、最大の信号強度
が得られたときの走査幅Dを検出し、その値に電子ビー
ムの走査幅(倍率)を設定し、像を得れば試料の注目領
域を最適な状態で観察することができる。すなわち、平
滑な試料面の中に部分的に注目領域が存在する場合に
は、その注目領域が電子ビームの走査領域中に効率良く
含まれたときに信号強度が最大となり、その信号強度が
最大の走査幅で電子ビームの走査を行い、像を得れば、
注目領域が画面全体に表示されることになる。なお、こ
の場合、事前に注目領域が光軸上に配置されるようにす
ることが望ましい。
In the relationship of FIG. 3, the scanning width D when the maximum signal intensity is obtained is detected, and the scanning width (magnification) of the electron beam is set to that value, and if the image is obtained, the sample is noticed. The area can be observed in the optimum condition. In other words, when the region of interest partially exists in the smooth sample surface, the signal intensity becomes maximum when the region of interest is efficiently included in the scanning region of the electron beam, and the signal intensity becomes maximum. If the image is obtained by scanning the electron beam with the scanning width of
The attention area is displayed on the entire screen. In this case, it is desirable that the attention area is arranged on the optical axis in advance.

【0014】また、試料面上一様に凹凸が存在する場
合、走査幅を変化させて信号強度の最大の走査幅を検出
し、その最大信号強度の走査幅で電子ビームの2次元走
査を行い、像を得れば、その凹凸が最も明瞭に表示され
ることになる。
Further, when unevenness exists uniformly on the sample surface, the scanning width is changed to detect the maximum scanning width of the signal intensity, and the electron beam is two-dimensionally scanned with the scanning width of the maximum signal intensity. When the image is obtained, the unevenness is most clearly displayed.

【0015】以上本発明の実施例を説明したが、本発明
はこの実施例に限定されない。例えば、2次電子を検出
するようにしたが、反射電子を検出するようにしても同
様な結果が得られる。また、走査幅を変化させる際、倍
率の高い状態から低い状態に変化させたが、逆に、倍率
の低い状態から高い状態に変化させても良い。更に、本
発明に基づく自動倍率調整動作を自動焦点機能、コント
ラスト,輝度などの自動画質調整機能あるいは自動非点
補正機能と併用することもできる。
Although the embodiment of the present invention has been described above, the present invention is not limited to this embodiment. For example, although secondary electrons are detected, similar results can be obtained by detecting reflected electrons. Further, when the scanning width is changed, the state of high magnification is changed to the state of low magnification, but conversely, the state of low magnification may be changed to the state of high magnification. Further, the automatic magnification adjusting operation based on the present invention can be used together with the automatic focusing function, the automatic image quality adjusting function such as contrast and brightness, or the automatic astigmatism correcting function.

【0016】[0016]

【発明の効果】以上説明したように、本発明に基づく走
査電子顕微鏡における自動倍率設定方法は、試料上の電
子ビームの走査幅を徐々に変化させ、各走査幅ごとに試
料から得られた信号の強度を記憶し、記憶された各走査
幅ごとの信号強度の最大値の時の走査幅を検出し、この
走査幅に基づく倍率に設定して像の観察を行うようにし
たので、試料の注目領域のサイズや試料表面の凹凸の状
態に最適な観察倍率を自動的に設定することができる。
As described above, the automatic magnification setting method in the scanning electron microscope according to the present invention gradually changes the scanning width of the electron beam on the sample, and the signal obtained from the sample for each scanning width. Of the sample, the scanning width at the time of the maximum value of the signal strength for each scanning width stored was detected, and the image was observed by setting the magnification based on this scanning width. The optimum observation magnification can be automatically set according to the size of the region of interest or the unevenness of the sample surface.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に基づく方法を実施するための走査電子
顕微鏡の一例を示す図である。
FIG. 1 shows an example of a scanning electron microscope for carrying out the method according to the invention.

【図2】本発明の一実施例のフローチャートである。FIG. 2 is a flowchart of an embodiment of the present invention.

【図3】電子ビームの走査幅に対応した2次電子検出信
号強度の関係を示す図である。
FIG. 3 is a diagram showing a relationship between secondary electron detection signal strengths corresponding to electron beam scanning widths.

【符号の説明】[Explanation of symbols]

1 電子銃 2 集束レンズ 3 対物レンズ 4 試料 5 偏向器 6 走査回路 7 2次電子検出器 8 増幅器 9 陰極線管 10 フィルター回路 11 AD変換器 12 コンピュータ 13,14 DA変換器 DESCRIPTION OF SYMBOLS 1 Electron gun 2 Focusing lens 3 Objective lens 4 Sample 5 Deflector 6 Scanning circuit 7 Secondary electron detector 8 Amplifier 9 Cathode ray tube 10 Filter circuit 11 AD converter 12 Computer 13,14 DA converter

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 試料上に電子ビームを細く集束すると共
に試料上で電子ビームを2次元的に走査し、試料から得
られた情報に基づいて試料の走査像を得るようにした走
査電子顕微鏡において、試料上の電子ビームの走査幅を
徐々に変化させ、各走査幅ごとに試料から得られた信号
の強度を記憶し、記憶された各走査幅ごとの信号強度の
最大値の時の走査幅を検出し、この走査幅により電子ビ
ームの走査を行い、試料の走査像を得るようにした走査
電子顕微鏡における自動倍率設定方法。
1. A scanning electron microscope in which an electron beam is finely focused on a sample, the electron beam is two-dimensionally scanned on the sample, and a scan image of the sample is obtained based on information obtained from the sample. , The scanning width of the electron beam on the sample is gradually changed, the intensity of the signal obtained from the sample is stored for each scanning width, and the scanning width at the time of the maximum value of the signal intensity stored for each scanning width Is detected and the electron beam is scanned by this scanning width to obtain a scan image of the sample.
JP5033206A 1993-02-23 1993-02-23 Automatic magnifying power setting method in scanning electron microscope Withdrawn JPH06251741A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5033206A JPH06251741A (en) 1993-02-23 1993-02-23 Automatic magnifying power setting method in scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5033206A JPH06251741A (en) 1993-02-23 1993-02-23 Automatic magnifying power setting method in scanning electron microscope

Publications (1)

Publication Number Publication Date
JPH06251741A true JPH06251741A (en) 1994-09-09

Family

ID=12379995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5033206A Withdrawn JPH06251741A (en) 1993-02-23 1993-02-23 Automatic magnifying power setting method in scanning electron microscope

Country Status (1)

Country Link
JP (1) JPH06251741A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008226508A (en) * 2007-03-09 2008-09-25 Hitachi High-Technologies Corp Imaging magnification adjusting method, and charged particle beam device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008226508A (en) * 2007-03-09 2008-09-25 Hitachi High-Technologies Corp Imaging magnification adjusting method, and charged particle beam device

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