JPH06247981A - Production of tetrakis (pentafluorophenyl) borate derivative using pentafluorophenyl alkali metal salt prepared from pentafluorobenzene - Google Patents

Production of tetrakis (pentafluorophenyl) borate derivative using pentafluorophenyl alkali metal salt prepared from pentafluorobenzene

Info

Publication number
JPH06247981A
JPH06247981A JP34245993A JP34245993A JPH06247981A JP H06247981 A JPH06247981 A JP H06247981A JP 34245993 A JP34245993 A JP 34245993A JP 34245993 A JP34245993 A JP 34245993A JP H06247981 A JPH06247981 A JP H06247981A
Authority
JP
Japan
Prior art keywords
pentafluorophenyl
formula
tetrakis
pentafluorobenzene
alkali metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP34245993A
Other languages
Japanese (ja)
Other versions
JP2790606B2 (en
Inventor
Yoshihiko Ikeda
喜彦 池田
Takeo Yamane
猛夫 山根
Eiichi Kachi
栄一 加地
Kenji Ishimaru
研二 石丸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Finechem Corp
Original Assignee
Tosoh Finechem Corp
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Abstract

PURPOSE:To produce a tetrakis(pentafluorophenyl)borate derivative as an important intermediate of cocatalyst in preparing a cation complex polymerization catalyst in high yield from inexpensive pentafluorobenzene. CONSTITUTION:Pentafluorobenzene expressed by the formula C6HF5 in an amount of 1 equivalent is made to react with 0.5-1.5 equivalent organometallic compound expressed by the general formula RM in an ether-based solvent, a hydrocarbon-based solvent or a mixed solvent of this ether-based solvent with the hydrocarbon-based solvent at -120 to 80 deg.C to afford a pentafluorophenyl alkali metal salt expressed by the formula C6H5M and 1 equivalent boron compound expressed by the formula BX3 is made to react with >=3.7 equivalent of the pentafluorophenyl metal compound expressed by the formula C6H5M to produce the objective tetrakis(pentafluorophenyl)borate derivative expressed by the formula (C6F5)4BM.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はペンタフルオロベンゼン
を用いたテトラキス(ペンタフルオロフェニル)ボレー
ト誘導体の新規な製造方法に関する。本発明で得られる
ホウ素誘導体はカチオン錯体重合の助触媒の中間体とし
て極めて有用な物質である。
FIELD OF THE INVENTION The present invention relates to a novel method for producing a tetrakis (pentafluorophenyl) borate derivative using pentafluorobenzene. The boron derivative obtained in the present invention is a very useful substance as an intermediate of a cocatalyst for cationic complex polymerization.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】近年、
テトラキス(ペンタフルオロフェニル)ボレート誘導体
とシクロペンタジエニル遷移金属錯体いわゆるメタロセ
ン誘導体を使用してカチオン錯体を発生させ、これを触
媒とした重合反応の研究の学術文献あるいは特許が著し
く増えている。例えば、Macromol. Chem. Rapid Commu
n., , p.p. 663〜667 (1991)等がある。しかし従来
テトラキス(ペンタフルオロフェニル)ボレート誘導体
の製造にはペンタフルオロフェニル基源の出発物質とし
て比較的高価な臭化ペンタフルオロベンゼンが使用され
ていた。
2. Description of the Related Art In recent years,
The number of academic literatures or patents for the study of polymerization reactions using a tetrakis (pentafluorophenyl) borate derivative and a cyclopentadienyl transition metal complex, a so-called metallocene derivative, to generate a cation complex and catalyzing this has been remarkably increasing. For example, Macromol. Chem. Rapid Commu
n., 2 , pp 663-667 (1991). However, in the conventional production of tetrakis (pentafluorophenyl) borate derivatives, relatively expensive pentafluorobenzene bromide has been used as a starting material for the source of pentafluorophenyl group.

【0003】その方法は臭化ペンタフルオロベンゼンを
ブチルリチウム等の有機金属化合物を用いて臭素−金属
交換反応をさせペンタフルオロフェニルリチウムを発生
させホウ素源の出発原料として三塩化ホウ素あるいは三
フッ化ホウ素等と反応させ直接合成するかペンタフルオ
ロブロモベンゼンをマグネシウムと反応させ臭化ペンタ
フルオロフェニルマグネシウム等のグリニャール反応剤
を発生させ同じくホウ素源の出発原料として三塩化ホウ
素あるいは三フッ化ホウ素等と反応させることによりト
リス(ペンタフルオロフェニル)ボランを合成した後さ
らにペンタフルオロフェニルリチウムと反応させること
によりテトラキス(ペンタフルオロフェニル)ボレート
誘導体の製造を行なっていた(J. Organometallic Che
m.,,245-250 (1964))。
According to the method, pentafluorobenzene bromide is subjected to a bromine-metal exchange reaction using an organometallic compound such as butyllithium to generate pentafluorophenyllithium, and boron trichloride or boron trifluoride is used as a starting material for a boron source. Etc. to synthesize directly or to react pentafluorobromobenzene with magnesium to generate a Grignard reagent such as pentafluorophenylmagnesium bromide and similarly react with boron trichloride or boron trifluoride as a starting material for the boron source. Then, tris (pentafluorophenyl) borane was synthesized and then reacted with pentafluorophenyllithium to produce tetrakis (pentafluorophenyl) borate derivative (J. Organometallic Che).
m., 2 , 245-250 (1964)).

【0004】臭化ペンタフルオロベンゼンはペンタフル
オロベンゼンを臭素化することによって得られるが、ペ
ンタフルオロベンゼンから直接テトラキス(ペンタフル
オロフェニル)ボレート誘導体が製造できれば製造工程
を1工程削減することができるので入手も容易となりか
つ出発原料の価格も下がる。またペンタフルオロベンゼ
ンを出発原料としてペンタフルオロフェニルリチウムあ
るいは臭化ペンタフルオロフェニルマグネシウムを発生
させて反応させる文献は既に発表されているが(J. Che
m. Soc., 166 (1959) 、Synthesis of Fluoroorganic C
ompounds p.141、J. Org. Chem., 29, 2385 (1964)及び
ibid, 31, 4229 (1966))、テトラキス(ペンタフルオロ
フェニル)ボレート誘導体の製造への応用はなされてい
ない。
Pentafluorobenzene bromide can be obtained by brominating pentafluorobenzene, but if the tetrakis (pentafluorophenyl) borate derivative can be produced directly from pentafluorobenzene, the production process can be reduced by one step, and therefore it is available. It becomes easier and the price of the starting material is reduced. In addition, there are already published documents in which pentafluorobenzene is used as a starting material to generate and react pentafluorophenyllithium or pentafluorophenylmagnesium bromide (J. Che.
m. Soc., 166 (1959), Synthesis of Fluoroorganic C
ompounds p.141, J. Org. Chem., 29, 2385 (1964) and
ibid, 31 , 4229 (1966)), and no application to the production of tetrakis (pentafluorophenyl) borate derivatives.

【0005】[0005]

【課題を解決するための手段】本発明者らは上記の状況
に鑑み、テトラキス(ペンタフルオロフェニル)ボレー
ト誘導体の製造に出発物質として臭化ペンタフルオロベ
ンゼンが使用されていたものをペンタフルオロベンゼン
に変更することにより、ペンタフルオロベンゼンの臭素
化工程を削除することにより比較的高価な臭化ペンタフ
ルオロベンゼンを出発原料として用いずに合成する方法
を種々検討することによって本発明に到達した。
SUMMARY OF THE INVENTION In view of the above situation, the present inventors have changed pentafluorobenzene from pentafluorobenzene bromide used as a starting material to the production of a tetrakis (pentafluorophenyl) borate derivative to pentafluorobenzene. By changing the method, the present invention has been reached by examining various methods for synthesizing the relatively expensive pentafluorobenzene bromide as a starting material by eliminating the bromination step of pentafluorobenzene.

【0006】即ち本発明の要旨とするところは式[I]
で表されるペンタフルオロベンゼン1当量に対して、
0.5〜1.5 当量の式[II]で表される有機金属化合物を
エーテル系溶媒、炭化水素系溶媒あるいはエーテル系溶
媒と炭化水素系溶媒の混合溶媒中で−120 〜80℃で反応
させることにより、式[III] で表されるペンタフルオロ
フェニルアルカリ金属塩を発生させて式[IV]で表され
るホウ素化合物を1当量に対し、 3.7当量以上の式[II
I] で表されるペンタフルオロフェニル金属化合物を反
応させ式[VII] で表されるテトラキス(ペンタフルオロ
フェニル)ボレート誘導体を製造する方法あるいは式
[I]で表されるペンタフルオロベンゼン1当量に対し
て 0.5〜1.5 当量の式[II]で表される有機金属化合物
をエーテル系溶媒、炭化水素系溶媒あるいはエーテル系
溶媒と炭化水素系溶媒の混合溶媒中で−120 〜80℃で反
応させることにより、式[III] で表されるペンタフルオ
ロフェニルアルカリ金属塩を発生させて式[VIII]で表さ
れるトリスペンタフルオロフェニルボラン1当量に対
し、 0.8当量以上の式[III] で表されるペンタフルオロ
フェニル金属化合物を反応させ式[VIII]で表されるテト
ラキス(ペンタフルオロフェニル)ボレート誘導体を製
造する方法に関する。
That is, the gist of the present invention lies in the formula [I]
With respect to 1 equivalent of pentafluorobenzene represented by
By reacting 0.5 to 1.5 equivalents of the organometallic compound represented by the formula [II] at −120 to 80 ° C. in an ether solvent, a hydrocarbon solvent or a mixed solvent of an ether solvent and a hydrocarbon solvent, A pentafluorophenyl alkali metal salt represented by the formula [III] is generated to produce 3.7 equivalents or more of the boron compound represented by the formula [IV] per 1 equivalent.
[I] a method for producing a tetrakis (pentafluorophenyl) borate derivative represented by the formula [VII] by reacting a pentafluorophenyl metal compound represented by the formula [VII], or 1 equivalent of pentafluorobenzene represented by the formula [I] By reacting 0.5 to 1.5 equivalents of the organometallic compound represented by the formula [II] in an ether solvent, a hydrocarbon solvent or a mixed solvent of an ether solvent and a hydrocarbon solvent at -120 to 80 ° C. The pentafluorophenyl alkali metal salt represented by the formula [III] is generated to generate 0.8 equivalent or more of the pentafluorophenylborane represented by the formula [VIII]. The present invention relates to a method for producing a tetrakis (pentafluorophenyl) borate derivative represented by the formula [VIII] by reacting a fluorophenyl metal compound.

【0007】[0007]

【作用】以下に本発明を具体的に説明する。本発明でい
うエーテル系溶媒とはジエチルエーテル、ジプロピルエ
ーテル、ジイソプロピルエーテル、ジブチルエーテル、
ジイソアミルエーテル、1,2−ジメトキシエタン、
1,2−ジエトキシエタン、ジ−2−メトキシエチルエ
ーテル、テトラヒドロフラン、テトラヒドロピラン、
1,4−ジオキサン等を示す。
The present invention will be described in detail below. The ether solvent referred to in the present invention is diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether,
Diisoamyl ether, 1,2-dimethoxyethane,
1,2-diethoxyethane, di-2-methoxyethyl ether, tetrahydrofuran, tetrahydropyran,
1,4-dioxane and the like are shown.

【0008】次に、本発明でいう炭化水素系溶媒とはペ
ンタン、イソペンタン、ヘキサン、シクロヘキサン、ヘ
プタン、オクタン、ノナン、デカン、ウンデカン、ドデ
カン、トリデカン、テトラデカン、ペンタデカン、ヘキ
サデカン、n−パラフィンあるいは石油エーテル等の飽
和炭化水素とベンゼン、トルエン、o−キシレン、m−
キシレン、p−キシレン、1,2,3−トリメチルベン
ゼン、1,2,4−トリメチルベンゼン、1,2,5−
トリメチルベンゼン、1,3,5−トリメチルベンゼ
ン、エチルベンゼン、プロピルベンゼンあるいはブチル
ベンゼン等の芳香族系炭化水素とこれらの混合物を示
す。
The hydrocarbon solvent used in the present invention is pentane, isopentane, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane, n-paraffin or petroleum ether. Saturated hydrocarbons such as benzene, toluene, o-xylene, m-
Xylene, p-xylene, 1,2,3-trimethylbenzene, 1,2,4-trimethylbenzene, 1,2,5-
Aromatic hydrocarbons such as trimethylbenzene, 1,3,5-trimethylbenzene, ethylbenzene, propylbenzene and butylbenzene, and mixtures thereof are shown.

【0009】次に、この発明でいう式[II]の中で反応
に影響を及ぼさない官能基とは、メチル基、エチル基、
プロピル基、イソプロピル基、プロペニル基、2−イソ
プロペニル基、アリル基、ブチル基、 sec−ブチル基、
tert−ブチル基、イソブチル基、ペンチル基、 sec−ペ
ンチル基、tert−ペンチル基、 neo−ペンチル基、イソ
ペンチル基、 sec−イソペンチル基、ヘキシル基、 sec
−ヘキシル基、イソヘキシル基、 sec−イソヘキシル
基、シクロヘキシル基、フェニル基、ベンジル基、o−
トリル基、m−トリル基、p−トリル基、メトキシメチ
ル基、メチルチオメチル基、2−ジメチルアミノエチル
基、o−アニス基、m−アニス基、p−アニス基、トリ
メチルシリルメチル基等を示し、式[II]で表される有
機金属化合物の例としてメチルリチウム、エチルリチウ
ム、プロピルリチウム、イソプロピルリチウム、ブチル
リチウム、イソブチルリチウム、 sec−ブチルリチウ
ム、tert−ブチルリチウム、ペンチルリチウム、イソペ
ンチルリチウム、 sec−ペンチルリチウム、tert−ペン
チルリチウム、 sec−イソペンチルリチウム、ヘキシル
リチウム、イソヘキシルリチウム、 sec−ヘキシルリチ
ウム、シクロヘキシルリチウム、フェニルリチウム、o
−トリルリチウム、m−トリルリチウム、p−トリルリ
チウム、トルメチルシリルリチウム、フェニルナトリウ
ム、o−トリルナトリウム、m−トリルナトリウム、p
−トリルナトリウム、ブチルリチウム/カリウムtert−
ブトキシドあるいはブチルリチウム/ナトリウムtert−
ブトキシド等があり、望ましくは、塩基性が強く、反応
に影響を及ぼしにくいイソプロピルリチウム、 sec−ブ
チルリチウム、tert−ブチルリチウム、 sec−ペンチル
リチウム、tert−ペンチルリチウム、 sec−イソペンチ
ルリチウム、 sec−ヘキシルリチウムあるいはシクロヘ
キシルリチウム等である。
Next, in the formula [II] of the present invention, the functional groups which do not influence the reaction include a methyl group, an ethyl group,
Propyl group, isopropyl group, propenyl group, 2-isopropenyl group, allyl group, butyl group, sec-butyl group,
tert-butyl group, isobutyl group, pentyl group, sec-pentyl group, tert-pentyl group, neo-pentyl group, isopentyl group, sec-isopentyl group, hexyl group, sec
-Hexyl group, isohexyl group, sec-isohexyl group, cyclohexyl group, phenyl group, benzyl group, o-
A tolyl group, m-tolyl group, p-tolyl group, methoxymethyl group, methylthiomethyl group, 2-dimethylaminoethyl group, o-anis group, m-anis group, p-anis group, trimethylsilylmethyl group, etc., Examples of the organometallic compound represented by the formula [II] include methyllithium, ethyllithium, propyllithium, isopropyllithium, butyllithium, isobutyllithium, sec-butyllithium, tert-butyllithium, pentyllithium, isopentyllithium, sec. -Pentyl lithium, tert-pentyl lithium, sec-isopentyl lithium, hexyl lithium, isohexyl lithium, sec-hexyl lithium, cyclohexyl lithium, phenyl lithium, o
-Tolyllithium, m-tolyllithium, p-tolyllithium, trimethylsilyllithium, phenylsodium, o-tolylsodium, m-tolylsodium, p
-Tolyl sodium, butyl lithium / potassium tert-
Butoxide or butyl lithium / sodium tert-
Butoxide and the like are preferable, and isopropyllithium, sec-butyllithium, tert-butyllithium, sec-pentyllithium, tert-pentyllithium, sec-isopentyllithium, sec- having strong basicity and hardly affecting the reaction Examples include hexyl lithium and cyclohexyl lithium.

【0010】次にこの発明でいう式[V]で表されるホ
ウ素化合物の例として、三フッ化ホウ素、三塩化ホウ
素、三臭化ホウ素、三ヨウ化ホウ素、トリメチルホウ
酸、トリエチルホウ酸、トリプロピルホウ酸、トリイソ
プロピルホウ酸、トリブチルホウ酸、トリメチレンボレ
ート、トリス(ジメチルアミノ)ホウ素、トリス(ジエ
チルアミノ)ホウ素、トリピロリジノホウ素、トリピペ
リジノホウ素あるいはトリモルホリノホウ素等が挙げら
れる。更に三フッ化ホウ素ジエチルエーテル錯体、三フ
ッ化ホウ素ジブチルエーテル錯体、三フッ化ホウ素ジメ
チルスルフィド錯体、三塩化ホウ素ジエチルエーテル錯
体あるいは三塩化ホウ素ジブチルエーテル錯体等の錯体
もこの範疇に入る。
Next, examples of the boron compound represented by the formula [V] in the present invention include boron trifluoride, boron trichloride, boron tribromide, boron triiodide, trimethylboric acid, triethylboric acid, Examples thereof include tripropyl boric acid, triisopropyl boric acid, tributyl boric acid, trimethylene borate, tris (dimethylamino) boron, tris (diethylamino) boron, tripyrrolidinoboron, tripiperidinoboron and trimorpholinoboron. Further, a complex such as a boron trifluoride diethyl ether complex, a boron trifluoride dibutyl ether complex, a boron trifluoride dimethyl sulfide complex, a boron trichloride diethyl ether complex or a boron trichloride dibutyl ether complex is also included in this category.

【0011】製造の具体的な方法として以下順次説明す
る。式[I]で表されるペンタフルオロベンゼンをエー
テル系溶媒、炭化水素系溶媒あるいはこれらの混合溶媒
に溶解する。この溶液にペンタフルオロベンゼン1当量
に対して 0.5〜1.5 当量の式[II]で表される有機金属
化合物を−120 〜80℃の範囲で反応させる。
A specific manufacturing method will be sequentially described below. The pentafluorobenzene represented by the formula [I] is dissolved in an ether solvent, a hydrocarbon solvent or a mixed solvent thereof. 0.5 to 1.5 equivalents of the organometallic compound represented by the formula [II] is reacted with this solution in the range of -120 to 80 ° C with respect to 1 equivalent of pentafluorobenzene.

【0012】この反応では式[III] で表されるペンタフ
ルオロフェニルアルカリ金属塩を発生させる際に、式
[I]で表されるペンタフルオロベンゼンより式[II]
で表される有機金属化合物が少なすぎると未反応のペン
タフルオロベンゼンが大量に残ってしまい、過剰に使用
すると生成する式[III] で表されるペンタフルオロフェ
ニル金属塩のフッ素ともハロゲン−金属交換反応する恐
れがあるため 0.8〜1.20当量の式[II]で表される有機
金属化合物を使用するのが望ましく、反応温度は−80℃
より低すぎると反応の進行が極めて遅く、0℃より高す
ぎると副反応の進行が極めて速くなりいずれの場合も収
率が非常に低くなる。そのため−80〜0℃の範囲で反応
させるのが望ましい。反応混合物は、同温度で5分から
120分間反応させることにより式[III] で表されるペン
タフルオロフェニルアルカリ金属塩を調製する。。
In this reaction, when the pentafluorophenyl alkali metal salt represented by the formula [III] is generated, the pentafluorobenzene represented by the formula [I] is used to generate the formula [II].
If the amount of the organometallic compound represented by is too small, a large amount of unreacted pentafluorobenzene remains, and if it is used in excess, it is produced by the halogen-metal exchange with the fluorine of the pentafluorophenyl metal salt represented by the formula [III]. It is desirable to use 0.8 to 1.20 equivalents of the organometallic compound represented by the formula [II] because it may react, and the reaction temperature is -80 ° C.
If it is too low, the reaction progresses very slowly, and if it is higher than 0 ° C., the side reaction progresses extremely fast, and in any case, the yield becomes very low. Therefore, it is desirable to react in the range of -80 to 0 ° C. The reaction mixture starts at 5 minutes at the same temperature.
A pentafluorophenyl alkali metal salt represented by the formula [III] is prepared by reacting for 120 minutes. .

【0013】ここで生成する式[III] で表されるペンタ
フルオロフェニルアルカリ金属塩は、C6 5 Li、C
6 5 Na、C6 5 Kである。
The pentafluorophenyl alkali metal salt represented by the formula [III] produced here is C 6 F 5 Li, C
6 F 5 Na, a C 6 F 5 K.

【0014】ペンタフルオロフェニルアルカリ金属塩の
使用量は、式[IV]で表されるホウ素化合物を反応に用
いる場合理論量としては4当量であるがここに示した
3.7当量未満の場合テトラキス(ペンタフルオロフェニ
ル)ボレード誘導体の収率の低下が顕著なため 3.7当量
以上の使用が望ましい。
The amount of the pentafluorophenyl alkali metal salt used is 4 equivalent as the theoretical amount when the boron compound represented by the formula [IV] is used in the reaction, but it is shown here.
If the amount is less than 3.7 equivalents, the yield of the tetrakis (pentafluorophenyl) borate derivative is remarkably reduced, so use of 3.7 equivalents or more is desirable.

【0015】また、トリス(ペンタフルオロフェニル)
ボランをホウ素化合物として反応に用いる場合理論量と
しては1当量であるがここに示した 0.7当量未満の場合
テトラキス(ペンタフルオロフェニル)ボレート誘導体
の収率の低下が顕著なため0.7 当量以上の使用が望まし
い。
Further, tris (pentafluorophenyl)
When borane is used as a boron compound in the reaction, the theoretical amount is 1 equivalent, but when the amount is less than 0.7 equivalent shown here, the yield of the tetrakis (pentafluorophenyl) borate derivative is remarkably reduced, so use of 0.7 equivalent or more is recommended. desirable.

【0016】ペンタフルオロフェニルアルカリ金属塩と
ホウ素化合物の混合温度は−100 ℃より低い温度では反
応の進行が極めて遅くなるためこれ以上の温度が望まし
く、0℃より高すぎると副反応の進行が極めて速くなり
いずれの場合も収率が非常に低くなるためこれ以下の温
度が望ましい。
When the temperature for mixing the pentafluorophenyl alkali metal salt and the boron compound is lower than −100 ° C., the reaction progresses extremely slowly, and therefore a temperature higher than this is desirable, and when it is higher than 0 ° C., the side reaction progresses extremely. Since it becomes faster and the yield becomes very low in any case, a temperature below this is desirable.

【0017】また、反応温度は−100 ℃より低いと反応
の進行が極めて遅く0℃より高いと未反応のペンタフル
オロフェニルアルカリ金属塩が分解するため−100 〜0
℃で反応させるのが望ましい。
If the reaction temperature is lower than -100 ° C, the reaction progresses very slowly, and if it is higher than 0 ° C, unreacted pentafluorophenyl alkali metal salt is decomposed, so that -100 to 0 ° C.
It is desirable to react at ℃.

【0018】[0018]

【発明の効果】【The invention's effect】

【発明の効果】本発明は、カチオン錯体重合触媒を調製
する際の助触媒の重要な中間体であるテトラキス(ペン
タフルオロフェニル)ボレート誘導体を臭化ペンタフル
オロベンゼンでなくより安価なペンタフルオロベンゼン
よりペンタフルオロフェニルアルカリ金属塩を経てテト
ラキス(ペンタフルオロフェニル)ボレート誘導体を高
収率で製造する方法を提供できる点で発明の効果は甚大
である。
INDUSTRIAL APPLICABILITY According to the present invention, a tetrakis (pentafluorophenyl) borate derivative, which is an important intermediate of a co-catalyst in preparing a cationic complex polymerization catalyst, is prepared from a cheaper pentafluorobenzene instead of pentafluorobenzene bromide. The effect of the present invention is great in that it can provide a method for producing a tetrakis (pentafluorophenyl) borate derivative in a high yield via a pentafluorophenyl alkali metal salt.

【0019】[0019]

【実施例】以下実施例を挙げて本発明を更に詳細に説明
するが本発明はその要旨を越えないがきり、以下の実施
例により何等の限定も受けるものでなはい。
EXAMPLES The present invention will be described in more detail with reference to the following examples, but the present invention does not exceed the gist thereof, and the following examples do not impose any limitation.

【0020】反応の収率は、ペンタフルオロトルエンを
内部標準物質として生成したテトラキス(ペンタフルオ
ロフェニル)ボレート誘導体の量を19F−NMRによっ
て定量するかあるいは塩化N,N−ジメチルアニリニウ
ムあるいは塩化トリブチルアンモニウムによって対陽イ
オン交換してN,N−ジメチルアニリニウムあるいはト
リブチルアンモニウムテトラキス(ペンタフルオロフェ
ニル)ボレートに誘導した後、結晶の乾燥重量を基に算
出し、ペンタフルオロトルエンを内部標準物質として19
F−NMRによって純度を測定した。
The reaction yield is determined by 19 F-NMR for the amount of tetrakis (pentafluorophenyl) borate derivative produced using pentafluorotoluene as an internal standard substance, or N, N-dimethylanilinium chloride or tributyl chloride. after induction by exchanging pair cation of N, N- dimethylanilinium or tributylammonium tetrakis (pentafluorophenyl) borate with ammonium, calculated based on the dry weight of the crystals, pentafluorotoluene as an internal standard 19
Purity was measured by F-NMR.

【0021】(実施例1)100ml のガラス製三ツ口フラ
スコに、50mlガラス製滴下ロート、温度抵抗体及びセプ
タムラバーを装着し、系内を十分窒素置換する。フラス
コ内にペンタフルオロベンゼン5g(29.8mmol)とジエ
チルエーテル30mlを装入し溶液を−65℃に冷却する。そ
の後、滴下ロートに装入した16.1wt%のtert−ブチルリ
チウムのペンタン溶液(12.3g,29.8mmol)を内温が−
55℃を越えないようにしながら滴下する。滴下終了後−
65〜−55℃で攪拌しペンタフルオロフェニルリチウムを
調製する。調製したペンタフルオロフェニルリチウムの
溶液に−65〜−55℃で1mol/L の三塩化ホウ素のヘキサ
ン溶液(7.45mL,7.45mmol)を加え、同温度で30分攪拌
した後室温まで昇温し反応混合物よりジエチルエーテル
を蒸留して除去し有機層を20mLの水で3回水洗する。水
層を合わせた後、水層にホウ素源に対し 1.1当量の塩化
N,N−ジメチルアニリニウムの水溶液を反応させると
白色結晶が析出する。得られた結晶を濾過・水洗した後
に真空乾燥することによりN,N−ジメチルアニリニウ
ムテトラキス(ペンタフルオロフェニル)ボレートを収
率92.3%で得た。 1H及び19F−NMRでペンタフルオ
ロトルエンを内部標準物質として純度を測定したところ
98wt%以上だった。
Example 1 A 100 ml glass three-necked flask was equipped with a 50 ml glass dropping funnel, a temperature resistor and a septum rubber, and the system was sufficiently replaced with nitrogen. The flask is charged with 5 g (29.8 mmol) of pentafluorobenzene and 30 ml of diethyl ether, and the solution is cooled to -65 ° C. Then, the internal temperature of a 16.1 wt% tert-butyllithium pentane solution (12.3 g, 29.8 mmol) charged in a dropping funnel was adjusted to −
Add dropwise while keeping the temperature below 55 ° C. After completion of dropping
Stir at 65 to -55 ° C to prepare pentafluorophenyllithium. To the prepared solution of pentafluorophenyl lithium was added 1 mol / L hexane solution of boron trichloride (7.45 mL, 7.45 mmol) at -65 to -55 ° C, stirred at the same temperature for 30 minutes, and then warmed to room temperature and reacted. Diethyl ether was distilled off from the mixture, and the organic layer was washed with 20 mL of water three times. After combining the aqueous layers, 1.1 equivalents of an aqueous solution of N, N-dimethylanilinium chloride with respect to the boron source is reacted with the aqueous layer to precipitate white crystals. The obtained crystals were filtered, washed with water and then vacuum dried to obtain N, N-dimethylanilinium tetrakis (pentafluorophenyl) borate in a yield of 92.3%. The purity was measured by 1 H and 19 F-NMR using pentafluorotoluene as an internal standard substance.
It was over 98wt%.

【0022】(実施例2)ペンタフルオロベンゼン(4.
40g,26.2mmol)とジエチルエーテル(50ml)の溶液に
20wt%のtert−ブチルリチウム/ペンタン溶液(7.98
g,25.0mmol)を反応液の温度を−55〜−65℃に保ちな
がら滴下し、滴下終了後反応液の温度を−25〜−50℃に
保ちながら約 0.5時間攪拌する。その後、20.0wt%のト
リス(ペンタフルオロフェニル)ボラン/トルエン溶液
(63.8g,25.0mmol)を反応液の温度を−25〜−40℃に
保ちながら混合し同温度で30分攪拌した後室温まで昇温
し得られたリチウムテトラキス(ペンタフルオロフェニ
ル)ボレートの溶液よりジエチルエーテルを蒸留して除
去し有機層を20mLの水で3回水洗する。水層を合わせた
後、水層にホウ素源に対し 1.1当量の塩化N,N−ジメ
チルアニリニウムの水溶液を反応させると白色結晶が析
出する。得られた結晶を濾過・水洗した後に真空乾燥す
ることによりN,N−ジメチルアニリニウムテトラキス
(ペンタフルオロフェニル)ボレートを収率97.3%で得
た。 1H及び19F−NMRでペンタフルオロトルエンを
内部標準物質として純度を測定したところ98wt%以上だ
った。
Example 2 Pentafluorobenzene (4.
40g, 26.2mmol) and a solution of diethyl ether (50ml)
20 wt% tert-butyllithium / pentane solution (7.98
g, 25.0 mmol) while the temperature of the reaction solution is kept at -55 to -65 ° C, and after completion of the dropwise addition, the reaction solution is stirred for about 0.5 hour while keeping the temperature at -25 to -50 ° C. Then, a 20.0 wt% tris (pentafluorophenyl) borane / toluene solution (63.8 g, 25.0 mmol) was mixed while maintaining the temperature of the reaction solution at -25 to -40 ° C, and the mixture was stirred at the same temperature for 30 minutes, and then allowed to reach room temperature. Diethyl ether was distilled off from the solution of lithium tetrakis (pentafluorophenyl) borate obtained by heating, and the organic layer was washed with 20 mL of water three times. After combining the aqueous layers, 1.1 equivalents of an aqueous solution of N, N-dimethylanilinium chloride with respect to the boron source is reacted with the aqueous layer to precipitate white crystals. The obtained crystals were filtered, washed with water and then vacuum dried to obtain N, N-dimethylanilinium tetrakis (pentafluorophenyl) borate in a yield of 97.3%. The purity was measured by 1 H and 19 F-NMR using pentafluorotoluene as an internal standard substance and found to be 98 wt% or more.

【0023】(実施例3)ペンタフルオロベンゼン(4.
40g,26.2mmol)とジエチルエーテル(50ml)の溶液に
20wt%の sec−ブチルリチウム/ヘキサン溶液(7.98
g,25.0mmol)を反応液の温度を−55〜−65℃に保ちな
がら滴下し、滴下終了後反応液の温度を−25〜−50℃に
保ちながら約 0.5時間攪拌する。その後、20.0wt%のト
リス(ペンタフルオロフェニル)ボラン/トルエン溶液
(63.8g,25.0mmol)を反応液の温度を−25〜−40℃に
保ちながら混合し同温度で30分攪拌した後室温まで昇温
し得られたリチウムテトラキス(ペンタフルオロフェニ
ル)ボレートの溶液よりジエチルエーテルを蒸留して除
去し有機層を20mLの水で3回水洗する。水層を合わせた
後、水層にホウ素源に対し 1.1当量の塩化N,N−ジメ
チルアニリニウムの水溶液を反応させると白色結晶が析
出する。得られた結晶を濾過・水洗した後に真空乾燥す
ることによりN,N−ジメチルアニリニウムテトラキス
(ペンタフルオロフェニル)ボレートを収率96.1%で得
た。 1H及び19F−NMRでペンタフルオロトルエンを
内部標準物質として用いて純度を測定したところ98wt%
以上であった。
(Example 3) Pentafluorobenzene (4.
40g, 26.2mmol) and a solution of diethyl ether (50ml)
20 wt% sec-butyllithium / hexane solution (7.98
g, 25.0 mmol) while the temperature of the reaction solution is kept at -55 to -65 ° C, and after completion of the dropwise addition, the reaction solution is stirred for about 0.5 hour while keeping the temperature at -25 to -50 ° C. Then, a 20.0 wt% tris (pentafluorophenyl) borane / toluene solution (63.8 g, 25.0 mmol) was mixed while maintaining the temperature of the reaction solution at -25 to -40 ° C, and the mixture was stirred at the same temperature for 30 minutes, and then allowed to reach room temperature. Diethyl ether was distilled off from the solution of lithium tetrakis (pentafluorophenyl) borate obtained by heating, and the organic layer was washed with 20 mL of water three times. After combining the aqueous layers, 1.1 equivalents of an aqueous solution of N, N-dimethylanilinium chloride with respect to the boron source is reacted with the aqueous layer to precipitate white crystals. The obtained crystals were filtered, washed with water and then vacuum dried to obtain N, N-dimethylanilinium tetrakis (pentafluorophenyl) borate in a yield of 96.1%. The purity was measured by 1 H and 19 F-NMR using pentafluorotoluene as an internal standard substance.
That was all.

【0024】(実施例4)100ml のガラス製三ツ口フラ
スコに、50mlガラス製滴下ロート、温度抵抗体及びセプ
タムラバーを装着し、系内を十分窒素置換する。フラス
コ内にペンタフルオロベンゼン5g(29.8mmol)とジエ
チルエーテル30mlを装入し溶液を−65℃に冷却する。そ
の後、滴下ロートに装入した16.1wt%のtert−ブチルリ
チウムのペンタン溶液(12.3g,29.8mmol)の内温が−
55℃を越えないようにしながら滴下する。滴下終了後−
65〜−55℃で攪拌しペンタフルオロフェニルリチウムを
調製する。調製したペンタフルオロフェニルリチウムの
溶液に−65〜−55℃で1mol/L の三塩化ホウ素のヘキサ
ン溶液(7.45mL,7.45mmol)を加え、同温度で30分攪拌
した後室温まで昇温し副生した塩化リチウムを濾過した
後、得られたリチウムテトラキス(ペンタフルオロフェ
ニル)ボレートの溶液を19F−NMRでペンタフルオロ
トルエンを内部標準物質として定量した収率は94.3%で
あった。
Example 4 A 100 ml glass three-necked flask was equipped with a 50 ml glass dropping funnel, a temperature resistor and a septum rubber, and the system was sufficiently replaced with nitrogen. The flask is charged with 5 g (29.8 mmol) of pentafluorobenzene and 30 ml of diethyl ether, and the solution is cooled to -65 ° C. Thereafter, the internal temperature of the 16.1 wt% tert-butyllithium pentane solution (12.3 g, 29.8 mmol) charged in the dropping funnel was −
Add dropwise while keeping the temperature below 55 ° C. After completion of dropping
Stir at 65 to -55 ° C to prepare pentafluorophenyllithium. To the prepared solution of pentafluorophenyl lithium was added 1 mol / L hexane solution of boron trichloride (7.45 mL, 7.45 mmol) at -65 to -55 ° C, and the mixture was stirred at the same temperature for 30 minutes and then warmed to room temperature. After filtering the produced lithium chloride, the yield of the solution of the obtained lithium tetrakis (pentafluorophenyl) borate determined by 19 F-NMR using pentafluorotoluene as an internal standard substance was 94.3%.

【0025】(実施例5)ペンタフルオロベンゼン(1
5.8g,100.0mmol)とジエチルエーテル(100ml)の溶液
を−40℃に冷却後、25wt%のtert−ブチルリチウム/ペ
ンタン溶液(22.5g,88.0mmol)を加えて−30〜−40℃
で22時間攪拌する。その後、1.0mol/Lの三塩化ホウ素/
ヘキサン溶液(21.0ml,21.0mmol)を−40℃で加え2時
間かけて室温に昇温する。得られたリチウムテトラキス
(ペンタフルオロフェニル)ボレートの溶液よりジエチ
ルエーテルを蒸留して除去し有機層を30mLの水で3回水
洗する。水層を合わせた後、水層にホウ素源に対し 1.1
当量の塩化トリブチルアンモニウムの水溶液を反応させ
ると白色結晶が析出する。得られた結晶を濾過・水洗し
た後に真空乾燥することによりトリブチルアンモニウム
テトラキス(ペンタフルオロフェニル)ボレートを収率
95.2%で得た。 1H及び19F−NMRでペンタフルオロ
トルエンを内部標準物質として用いて純度を測定しとこ
ろ98wt%以上であった。
(Example 5) Pentafluorobenzene (1
After cooling a solution of 5.8 g, 100.0 mmol) and diethyl ether (100 ml) to −40 ° C., 25 wt% tert-butyllithium / pentane solution (22.5 g, 88.0 mmol) was added at −30 to −40 ° C.
Stir for 22 hours. After that, 1.0 mol / L boron trichloride /
Add a hexane solution (21.0 ml, 21.0 mmol) at -40 ° C and warm to room temperature over 2 hours. Diethyl ether was distilled off from the obtained solution of lithium tetrakis (pentafluorophenyl) borate, and the organic layer was washed with 30 mL of water three times. After combining the water layers, add 1.1 to the boron source in the water layer.
When an equivalent amount of an aqueous solution of tributylammonium chloride is reacted, white crystals are precipitated. The crystals obtained were filtered, washed with water, and then vacuum dried to obtain tributylammonium tetrakis (pentafluorophenyl) borate.
Obtained in 95.2%. The purity was measured by 1 H and 19 F-NMR using pentafluorotoluene as an internal standard substance and found to be 98 wt% or more.

【0026】(実施例6)ペンタフルオロベンゼン(1
4.8g,88.0mmol)とジエチルエーテル(100ml)の溶液
を−40℃に冷却後、20wt%のブチルリチウム/ヘキサン
溶液(28.1g,87.7mmol)を加えて−30〜−40℃で10時
間攪拌する。その後、三フッ化ホウ素ジエチルエーテル
錯体(2.84g,20.0mmol)を−40℃で加え2時間かけて
室温に昇温する。室温で一晩攪拌後トルエン(200ml)を
加えた後、ジエチルエーテル及びヘキサンを加熱留去後
更にトルエンも投入した量の約30%を回収する程度に加
熱留去する。沈殿したフッ化リチウムを濾過した後にト
ルエンを濃縮乾固するとリチウムテトラキス(ペンタフ
ルオロフェニル)ボレートが収率51%で得られた。
(Example 6) Pentafluorobenzene (1
After cooling the solution of 4.8 g, 88.0 mmol) and diethyl ether (100 ml) to -40 ℃, add 20 wt% butyllithium / hexane solution (28.1 g, 87.7 mmol) and stir at -30 to -40 ℃ for 10 hours. To do. Then, boron trifluoride diethyl ether complex (2.84 g, 20.0 mmol) is added at -40 ° C, and the temperature is raised to room temperature over 2 hours. After stirring at room temperature overnight, toluene (200 ml) is added, and then diethyl ether and hexane are distilled off by heating, and toluene is also distilled off by heating to an extent of recovering about 30% of the charged amount. After filtering the precipitated lithium fluoride and concentrating and drying toluene, lithium tetrakis (pentafluorophenyl) borate was obtained with a yield of 51%.

【0027】(実施例7)ペンタフルオロベンゼン(1
4.8g,88.0mmol)とジエチルエーテル(100ml)の溶液
を−40℃に冷却後、24wt%のtert−ブチルリチウム/ペ
ンタン溶液(23.4g,87.7mmol)を加えて−30〜−40℃
で10時間攪拌する。その後、三フッ化ホウ素ジエチルエ
ーテル錯体(2.84g,20.0mmol)を−40℃で加え2時間
かけて室温に昇温する。室温で一晩攪拌後トルエン(20
0ml)を加えて、ジエチルエーテル及びヘキサンを加熱留
去後更にトルエンも投入した量の約30%を回収する程度
に加熱留去する。沈殿したフッ化リチウムを濾過した後
にトルエンを濃縮乾固するとリチウムテトラキス(ペン
タフルオロフェニル)ボレートが収率68%で得られた。
Example 7 Pentafluorobenzene (1
After cooling a solution of 4.8 g, 88.0 mmol) and diethyl ether (100 ml) to −40 ° C., 24 wt% tert-butyllithium / pentane solution (23.4 g, 87.7 mmol) was added to −30 to −40 ° C.
Stir for 10 hours. Then, boron trifluoride diethyl ether complex (2.84 g, 20.0 mmol) is added at -40 ° C, and the temperature is raised to room temperature over 2 hours. After stirring overnight at room temperature, toluene (20
(0 ml) is added, and diethyl ether and hexane are distilled off by heating, and then toluene is further distilled off by heating to the extent that about 30% of the charged amount is recovered. The precipitated lithium fluoride was filtered and then toluene was concentrated to dryness to obtain lithium tetrakis (pentafluorophenyl) borate in a yield of 68%.

【0028】(実施例8)ペンタフルオロベンゼン(1
5.1g,90.0mmol)とジエチルエーテル(100ml)の溶液
を−40℃に冷却後、20wt%の sec−ブチルリチウム/ヘ
キサン溶液(28.2g,88.0mmol)を加えて−30〜−40℃
で10時間攪拌する。その後、三フッ化ホウ素ジエチルエ
ーテル錯体(2.84g,20.0mmol)を−40℃で加え2時間
かけて室温に昇温する。室温で一晩攪拌後トルエン(20
0ml)を加えて、ジエチルエーテル及びヘキサンを加熱留
去後更にトルエンも投入した量の約30%を回収する程度
に加熱留去する。沈殿したフッ化リチウムを濾過した後
にトルエンを濃縮乾固するとリチウムテトラキス(ペン
タフルオロフェニル)ボレートが収率65%で得られた。
Example 8 Pentafluorobenzene (1
After cooling the solution of 5.1 g, 90.0 mmol) and diethyl ether (100 ml) to −40 ° C., 20 wt% sec-butyllithium / hexane solution (28.2 g, 88.0 mmol) was added to −30 to −40 ° C.
Stir for 10 hours. Then, boron trifluoride diethyl ether complex (2.84 g, 20.0 mmol) is added at -40 ° C, and the temperature is raised to room temperature over 2 hours. After stirring overnight at room temperature, toluene (20
(0 ml) is added, and diethyl ether and hexane are distilled off by heating, and then toluene is further distilled off by heating to the extent that about 30% of the charged amount is recovered. After filtering the precipitated lithium fluoride and concentrating toluene to dryness, lithium tetrakis (pentafluorophenyl) borate was obtained with a yield of 65%.

【0029】(実施例9)ペンタフルオロベンゼン(1
4.8g,88.0mmol)とジエチルエーテル(100ml)の溶液
を−40℃に冷却後、15wt%のブチルナトリウム/ヘキサ
ン溶液(47.0g,88.0mmol)を加えて−30〜−40℃で1
時間攪拌する。その後、三フッ化ホウ素ジエチルエーテ
ル錯体(2.84g,20.0mmol)を−40℃で加え2時間かけ
て室温に昇温する。得られたナトリウムテトラキス(ペ
ンタフルオロフェニル)ボレートの溶液よりジエチルエ
ーテルを蒸留して除去し有機層20mLの水で3回水洗す
る。水層を合わせた後、水層にホウ素源に対し 1.1当量
の塩化N,N−ジメチルアニリニウムの水溶液を反応さ
せると白色結晶が析出する。得られた結晶を濾過・水洗
した後に真空乾燥することによりN,N−ジメチルアニ
リニウムテトラキス(ペンタフルオロフェニル)ボレー
トを収率86.1%で得た。 1H及び19F−NMRでペンタ
フルオロトルエンを内部標準物質として用いて純度を測
定したところ98wt%以上であった。
Example 9 Pentafluorobenzene (1
A solution of 4.8 g, 88.0 mmol) and diethyl ether (100 ml) was cooled to -40 ° C, and a 15 wt% butyl sodium / hexane solution (47.0 g, 88.0 mmol) was added to the mixture at -30 to -40 ° C for 1 hour.
Stir for hours. Then, boron trifluoride diethyl ether complex (2.84 g, 20.0 mmol) is added at -40 ° C, and the temperature is raised to room temperature over 2 hours. Diethyl ether was distilled off from the obtained sodium tetrakis (pentafluorophenyl) borate solution, and the organic layer was washed with 20 mL of water three times. After combining the aqueous layers, 1.1 equivalents of an aqueous solution of N, N-dimethylanilinium chloride with respect to the boron source is reacted with the aqueous layer to precipitate white crystals. The obtained crystals were filtered, washed with water and then vacuum dried to obtain N, N-dimethylanilinium tetrakis (pentafluorophenyl) borate in a yield of 86.1%. The purity was measured by 1 H and 19 F-NMR using pentafluorotoluene as an internal standard substance and found to be 98 wt% or more.

【0030】(実施例10)ペンタフルオロベンゼン(1
6.8g,100.0mmol)とジブチルエーテル(100ml)の溶液
を−40℃に冷却後、20wt%の sec−ブチルリチウム/ヘ
キサン溶液(28.2g,88.0mmol)を加えて−30〜−40℃
で2時間攪拌する。その後、三フッ化ホウ素ジエチルエ
ーテル錯体(2.84g,20.0mmol)を−40℃で加え2時間
かけて室温に昇温する。室温で一晩攪拌後オクタン(200
ml) を加えて、ジエチルエーテル及びヘキサンを加熱留
去後更にオクタンも投入した量の約30%を回収する程度
に加熱留去する。沈殿したフッ化リチウムを濾過した後
にオクタンを濃縮乾固するとリチウムテトラキス(ペン
タフルオロフェニル)ボレートが収率67.3%で得られ
た。
(Example 10) Pentafluorobenzene (1
After cooling a solution of 6.8 g, 100.0 mmol) and dibutyl ether (100 ml) to -40 ° C, a 20 wt% sec-butyllithium / hexane solution (28.2 g, 88.0 mmol) was added to -30 to -40 ° C.
Stir for 2 hours. Then, boron trifluoride diethyl ether complex (2.84 g, 20.0 mmol) is added at -40 ° C, and the temperature is raised to room temperature over 2 hours. After stirring overnight at room temperature, octane (200
ml) is added, and diethyl ether and hexane are distilled off by heating, and then octane is further distilled off by heating until about 30% of the charged amount is recovered. After filtering the precipitated lithium fluoride and concentrating and drying octane, lithium tetrakis (pentafluorophenyl) borate was obtained with a yield of 67.3%.

【0031】(実施例11)ペンタフルオロベンゼン(1
4.8g,88.0mmol)とジイソプロピルエーテル(100ml)
の溶液を−40℃に冷却後、18wt%の sec−ブチルリチウ
ム/ヘキサン溶液(31.3g,88.0mmol)を加えて−30℃
から−40℃で 0.5時間攪拌する。その後、1mol/L の三
塩化ホウ素/ヘキサン溶液(20mL,20.0mmol)を−40℃
で加え2時間かけて室温に昇温する。得られたリチウム
テトラキス(ペンタフルオロフェニル)ボレートの溶液
よりジイソプロピルエーテルを蒸留して除去し有機層を
20mLの水で3回水洗する。水層を合わせた後、水層にホ
ウ素源に対し 1.1当量の塩化N,N−ジメチルアニリニ
ウムの水溶液を反応させると白色結晶が析出する。得ら
れた結晶を濾過・水洗した後に真空乾燥することにより
N,N−ジメチルアニリニウムテトラキス(ペンタフル
オロフェニル)ボレートを収率95.1%で得た。 1H及び
19F−NMRでペンタフルオロトルエンを内部標準物質
として用いて純度を測定したところ98wt%以上であっ
た。
(Example 11) Pentafluorobenzene (1
4.8g, 88.0mmol) and diisopropyl ether (100ml)
Solution was cooled to -40 ℃, then 18wt% sec-butyllithium / hexane solution (31.3g, 88.0mmol) was added at -30 ℃.
Stir at -40 ℃ for 0.5 hours. Then, add 1mol / L boron trichloride / hexane solution (20mL, 20.0mmol) to -40 ℃.
The temperature is raised to room temperature over 2 hours. Diisopropyl ether was distilled off from the obtained solution of lithium tetrakis (pentafluorophenyl) borate to remove the organic layer.
Wash 3 times with 20 mL of water. After combining the aqueous layers, 1.1 equivalents of an aqueous solution of N, N-dimethylanilinium chloride with respect to the boron source is reacted with the aqueous layer to precipitate white crystals. The obtained crystals were filtered, washed with water and then vacuum dried to obtain N, N-dimethylanilinium tetrakis (pentafluorophenyl) borate in a yield of 95.1%. 1 H and
The purity was measured by 19 F-NMR using pentafluorotoluene as an internal standard substance and found to be 98 wt% or more.

【0032】(実施例12)ペンタフルオロベンゼン(1
4.8g,88.0mmol)とジエチルエーテル(100ml)の溶液
を−40℃に冷却後、15wt%のtert−ブチルリチウム/ペ
ンタン溶液を加えて−30〜−40℃で30時間攪拌する。そ
の後、トリメチルホウ酸(2.08g,20.0mmol)を−40℃
で加え2時間かけて室温に昇温する。室温で一晩攪拌後
オクタン(200ml) 加えた後、ジエチルエーテルを蒸留し
て除去し有機層を20mLの水で3回水洗する。水層を合わ
せた後、水層にホウ素源に対し 1.1当量の塩化N,N−
ジメチルアニリニウムの水溶液を反応させると白色結晶
が析出する。得られた結晶を濾過・水洗した後に真空乾
燥することによりN,N−ジメチルアニリニウムテトラ
キス(ペンタフルオロフェニル)ボレートを収率83.2%
で得た。 1H及び19F−NMRでペンタフルオロトルエ
ンを内部標準物質として用いて純度を測定したところ98
wt%以上であった。
(Example 12) Pentafluorobenzene (1
A solution of 4.8 g, 88.0 mmol) and diethyl ether (100 ml) was cooled to -40 ° C, 15 wt% tert-butyllithium / pentane solution was added, and the mixture was stirred at -30 to -40 ° C for 30 hr. Then, trimethylboric acid (2.08g, 20.0mmol) was added to -40 ° C.
The temperature is raised to room temperature over 2 hours. After stirring overnight at room temperature, octane (200 ml) was added, diethyl ether was distilled off, and the organic layer was washed 3 times with 20 mL of water. After combining the water layers, add 1.1 equivalents of N, N-chloride to the boron source in the water layer.
White crystals are precipitated when an aqueous solution of dimethylanilinium is reacted. The obtained crystals were filtered, washed with water, and then vacuum dried to obtain N, N-dimethylanilinium tetrakis (pentafluorophenyl) borate in a yield of 83.2%.
Got with. Purity was measured by 1 H and 19 F-NMR using pentafluorotoluene as an internal standard substance.
It was more than wt%.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 加地 栄一 山口県新南陽市宮の前1丁目1番地31号 一心寮 (72)発明者 石丸 研二 山口県新南陽市宮の前1丁目1番地31号 一心寮 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Eiichi Kaji 1-1-1, 31, Miyanoe, Shinnanyo-shi, Yamaguchi Prefecture Ishinshin Dormitory (72) Kenji Ishimaru 1-1-1, 31, Shinnanyo, Yamaguchi Prefecture Ishinshin Dormitory

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 次の式[I] C6 HF5 [I] で表されるペンタフルオロベンゼン1当量に対して、
0.5〜1.5 当量の一般式[II] RM [II] (式中、Mはアルカリ金属イオンを示し、Rは炭素数が
1から10の炭化水素基を示し、該炭化水素基には反応に
影響を及ぼさない官能基を含んでいても良い。)で表さ
れる有機金属化合物をエーテル系溶媒、炭化水素系溶媒
あるいはエーテル系溶媒と炭化水素系溶媒の混合溶媒中
で−120 〜80℃で反応させることにより、次の一般式[I
II] C6 5 M [III] (式中、Mはアルカリ金属イオンを示す。)で表される
ペンタフルオロフェニルアルカリ金属塩を発生させて次
の一般式[IV] BX3 [IV] [式中、Xはハロゲンあるいは次の一般式[V] OR [V] (式中、Rは炭素数が1〜10の炭化水素基を示し、該炭
化水素基には反応に影響を及ぼさない官能基を含んでい
ても良い。)で表される置換基かあるいは次の一般式
[VI] NRR′ [VI] (式中、R及びR′は同一のあるいは相異なる水素ある
いは炭素数が1〜20の炭化水素基を示し、該炭化水素基
には反応に影響を及ぼさない官能基を含んでいても良
く、R及びR′がそれぞれ結合して環を形成していても
良い。)で表される置換基を示し、エーテル系溶媒との
1対1の錯体を形成していても良い。]で表されるホウ
素化合物を1当量に対し、 3.7当量以上の式[III] で表
されるペンタフルオロフェニル金属化合物を反応させ次
の一般式[VII] (C6 5 4 BM [VII] (式中、Mはアルカリ金属イオンを示す。)で表される
テトラキス(ペンタフルオロフェニル)ボレート誘導体
を製造する方法。
1. With respect to 1 equivalent of pentafluorobenzene represented by the following formula [I] C 6 HF 5 [I],
0.5 to 1.5 equivalents of the general formula [II] RM [II] (wherein M represents an alkali metal ion, R represents a hydrocarbon group having 1 to 10 carbon atoms, and the hydrocarbon group influences the reaction. Reacting in an ether solvent, a hydrocarbon solvent or a mixed solvent of an ether solvent and a hydrocarbon solvent at -120 to 80 ° C. The following general formula [I
II] C 6 F 5 M [III] (wherein M represents an alkali metal ion) to generate a pentafluorophenyl alkali metal salt, and the following general formula [IV] BX 3 [IV] [ In the formula, X is halogen or the following general formula [V] OR [V] (In the formula, R represents a hydrocarbon group having 1 to 10 carbon atoms, and the hydrocarbon group has a function not affecting the reaction. Or a group represented by the following general formula [VI] NRR ′ [VI] (wherein R and R ′ are the same or different hydrogen or have 1 to 10 carbon atoms). 20 hydrocarbon groups, which may include a functional group that does not influence the reaction, and R and R ′ may be bonded to each other to form a ring). And may form a 1: 1 complex with an ether solvent. ] With respect to 1 equivalent of the boron compound represented by the formula, 3.7 equivalent or more of the pentafluorophenyl metal compound represented by the formula [III] is reacted to give the following general formula [VII] (C 6 F 5 ) 4 BM [VII ] (In formula, M shows an alkali metal ion.) The method of manufacturing the tetrakis (pentafluorophenyl) borate derivative represented by this.
【請求項2】 請求項1記載の方法と同様にして式[II
I] で表されるペンタフルオロフェニルアルカリ金属塩
を発生させて次の式[VIII] (C6 5 3 B [VIII] で表されるトリスペンタフルオロフェニルボラン1当量
に対し、 0.8当量以上の式[III] て表されるペンタフル
オロフェニル金属化合物を反応させ式[VII] (C6 5 4 BM [VII] で表されるテトラキス(ペンタフルオロフェニル)ボレ
ート誘導体を製造する方法。
2. A method of formula [II] in the same manner as in the method of claim 1.
I] of the pentafluorophenyl alkali metal salt is generated to produce 0.8 equivalents or more of 1 equivalent of trispentafluorophenylborane represented by the following formula [VIII] (C 6 F 5 ) 3 B [VIII]. A method for producing a tetrakis (pentafluorophenyl) borate derivative represented by the formula [VII] (C 6 F 5 ) 4 BM [VII] by reacting a pentafluorophenyl metal compound represented by the formula [III].
JP34245993A 1992-12-28 1993-12-14 Method for producing tetrakis (pentafluorophenyl) borate derivative using pentafluorophenyl alkali metal salt prepared from pentafluorobenzene Expired - Fee Related JP2790606B2 (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998028343A1 (en) * 1996-12-20 1998-07-02 Sumitomo Chemical Company, Limited Method for feeding boron compounds, fine particles of boron compounds, catalyst components for the polymerization of olefins comprising them, and processes for the production of the particles
WO1998034938A1 (en) * 1997-02-06 1998-08-13 Showa Denko K.K. Process for producing boron compounds
WO1998040389A1 (en) * 1997-03-10 1998-09-17 Nippon Shokubai Co., Ltd. Method for purifying tetrakis(fluoroaryl) borate/magnesium halide, tetrakis(fluoroaryl) borate/ether complex and process for preparing the same, and process for preparing tetrakis(fluoroaryl) borate derivative
WO1999064427A1 (en) * 1998-06-12 1999-12-16 Asahi Glass Company, Ltd. Process for producing tris (pentafluorophenyl) borane
US6281389B1 (en) 1998-09-07 2001-08-28 Nippon Shokubai Co., Ltd. Method for purifying tetrakis(fluoroaryl)borate compounds or tris(fluoroaryl)borate compounds

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998028343A1 (en) * 1996-12-20 1998-07-02 Sumitomo Chemical Company, Limited Method for feeding boron compounds, fine particles of boron compounds, catalyst components for the polymerization of olefins comprising them, and processes for the production of the particles
WO1998034938A1 (en) * 1997-02-06 1998-08-13 Showa Denko K.K. Process for producing boron compounds
WO1998040389A1 (en) * 1997-03-10 1998-09-17 Nippon Shokubai Co., Ltd. Method for purifying tetrakis(fluoroaryl) borate/magnesium halide, tetrakis(fluoroaryl) borate/ether complex and process for preparing the same, and process for preparing tetrakis(fluoroaryl) borate derivative
US6215025B1 (en) * 1997-03-10 2001-04-10 Nippon Shokubai Co., Ltd. Method for purifying tetrakis (fluoroaryl) borate/magnesium halide, tetrakis (fluoroaryl) borate/ether complex and process for preparing the same, and process for preparing tetrakis (fluoroaryl) borate derivative
US6380435B2 (en) 1997-03-10 2002-04-30 Nippon Shokubai Co., Ltd. Purifying process of tetrakis(fluoroaryl)borate.magnesium halide, tetrakis(fluoroaryl)borate·ether complex and producing process of the same, and producing process of tetrakis(fluoroaryl)borate derivative
US6624329B2 (en) 1997-03-10 2003-09-23 Nippon Shokubai Co., Ltd. Purifying process of tetrakis (fluoroaryl) borate·magnesium halide, tetrakis (fluoroaryl) borate·ether complex and producing process of the same, and producing process of tetrakis (fluoroaryl) borate derivative
WO1999064427A1 (en) * 1998-06-12 1999-12-16 Asahi Glass Company, Ltd. Process for producing tris (pentafluorophenyl) borane
US6281389B1 (en) 1998-09-07 2001-08-28 Nippon Shokubai Co., Ltd. Method for purifying tetrakis(fluoroaryl)borate compounds or tris(fluoroaryl)borate compounds

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