JPH06247730A - Method for slowly cooling sheet glass - Google Patents
Method for slowly cooling sheet glassInfo
- Publication number
- JPH06247730A JPH06247730A JP5515093A JP5515093A JPH06247730A JP H06247730 A JPH06247730 A JP H06247730A JP 5515093 A JP5515093 A JP 5515093A JP 5515093 A JP5515093 A JP 5515093A JP H06247730 A JPH06247730 A JP H06247730A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- plate glass
- cooling
- sheet glass
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は板ガラスの徐冷法、特に
熱的寸法の安定性および平坦度の高い高品質の板ガラス
を得るための徐冷法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gradual cooling method for sheet glass, and more particularly to a gradual cooling method for obtaining a high quality sheet glass having high thermal dimensional stability and flatness.
【0002】[0002]
【従来の技術】従来よりフォトマスク、ハードディス
ク、光ディスク、液晶ディスプレイ等の素子に、板ガラ
スを精密加工および表面研磨を施し、要求される寸法と
平坦度の精度を満足させ、ガラス基板として使用に供し
ていた。これら素子の技術分野では、ガラス基板は熱的
寸法の安定性とともに平坦度が高精度で高品質であるこ
とが建築用板ガラス等に較べて一層要求されており、厳
しい規格を定めている。2. Description of the Related Art Conventionally, plate glass has been precision processed and surface-polished for elements such as photomasks, hard disks, optical disks, and liquid crystal displays to satisfy required dimensions and flatness accuracy before being used as a glass substrate. Was there. In the technical field of these elements, the glass substrate is required to have high thermal stability and high flatness and high quality, as compared with flat glass for construction, and strict standards are set.
【0003】通常、ダウンドロー法、フロート法などの
製法で得られた板ガラス素板を所定の寸法に加工後、表
面研磨して厳しい規格の寸法精度と平坦度を満足するガ
ラス基板を得ていた。これらガラス基板は前記素子化の
工程で性能付加のため各種の熱処理が施されるが、熱処
理後に寸法の収縮および平坦度の悪化が起こり、規格を
外れてしまうという問題を生じていた。Usually, a glass plate obtained by a manufacturing method such as a down-draw method or a float method is processed into a predetermined size and then surface-polished to obtain a glass substrate satisfying strict dimensional accuracy and flatness. . These glass substrates are subjected to various heat treatments in order to add performance in the process of forming the element, but after the heat treatment, shrinkage of dimensions and deterioration of flatness occur, which causes a problem of deviating from the standard.
【0004】これら熱収縮の発生と平坦度の悪化は板ガ
ラスの歪に起因する。すなわち板ガラスの歪は製造工程
で溶融状態から板ガラスに成形した後、徐冷・冷却して
いく冷却工程で生じるガラス表面と内部との冷却速度差
によってガラスの密度分布が生じることが主な原因とい
われている。The occurrence of these heat shrinkage and the deterioration of flatness are caused by the distortion of the plate glass. That is, the distortion of the sheet glass is mainly caused by the density distribution of the glass caused by the difference in the cooling rate between the glass surface and the inside which is generated in the cooling step in which the sheet glass is molded from the molten state in the manufacturing process and then gradually cooled and cooled. It is said.
【0005】この問題を解決するため前記素子化の工程
に先立って加熱炉中で所要時間熱処理して応力分布を均
一化させた後、室温迄冷却するなどの方法により徐冷を
行っていたが、徐冷による熱的変形などにより平坦度が
劣化したり、ガラス表面に肌荒れ状凹凸が発生するの
で、徐冷後に表面研磨の研磨量として最低80〜100
μm(片面)が必要となった。これはガラス基板のコス
トを下げる阻害因子となっていた。In order to solve this problem, prior to the step of forming the element, heat treatment was performed in a heating furnace for a required time to make the stress distribution uniform, and then gradually cooled to room temperature. Since the flatness is deteriorated due to thermal deformation due to slow cooling and rough surface irregularities are generated on the glass surface, the polishing amount for surface polishing after slow cooling is at least 80-100.
μm (one side) was required. This has been an obstacle to lowering the cost of the glass substrate.
【0006】また、ディスク基板に供する場合、一般に
円形加工等を行う際に加工機のテーブルに真空吸着する
必要があるが、その際板ガラス表面の肌荒れがあると、
加工機テーブルへの吸着力が弱くなり、加工歩留低下の
原因となる。Further, when it is used as a disk substrate, it is generally necessary to perform vacuum suction on a table of a processing machine when performing circular processing or the like, but at that time, if the surface of the plate glass is rough,
The attraction force to the processing machine table becomes weak, which causes a reduction in processing yield.
【0007】[0007]
【発明が解決しようとする課題】従来の精密加工・研磨
用板ガラスには熱的寸法の安定性および平坦度に関して
以下のような問題がある。 (1) 板ガラスの熱的寸法の安定性を良くするため、板ガ
ラスの徐冷点付近での熱処理を行うと、板ガラスの熱的
寸法の安定性は良くなるが平坦度は2〜4倍悪化する
(ガラスをタテ置きしてアニールする場合)。 (2) 板ガラスの平坦度が悪いと研磨量が増加し、研磨コ
ストが高くなる。 (3) 板ガラスの平坦度を良くするためにガラスを水平に
重ねて置き、徐冷点付近で熱処理するとかえって平坦度
が劣化し、熱処理温度をガラスの徐冷点以上にするとガ
ラス同志の融着現象が起こる。 (4) 従来技術の特願平4−163981号では徐冷温度
を徐冷点以上軟化点未満とし板ガラスと板ガラスの間に
グラファイト板を挟むが、この方法によると上記の融着
現象は抑えられるが、板ガラス表面の肌荒れが起こる。 本発明は上記の問題を解決しようとするものである。The conventional precision processing / polishing plate glass has the following problems with respect to thermal dimensional stability and flatness. (1) When heat treatment is performed near the annealing point of the plate glass in order to improve the stability of the plate glass in the thermal dimension, the stability of the plate glass in the thermal dimension improves but the flatness deteriorates by 2 to 4 times. (When the glass is placed vertically and annealed). (2) If the flatness of the plate glass is poor, the amount of polishing increases and the polishing cost increases. (3) When flattening the flat glass, the glasses are placed horizontally and heat treated near the annealing point, rather the flatness deteriorates.If the heat treatment temperature is higher than the annealing point of the glass, the fusion of glass The phenomenon occurs. (4) In Japanese Patent Application No. 4-163981 of the related art, the annealing temperature is set to be not less than the annealing point and less than the softening point and the graphite plate is sandwiched between the plate glasses, but this method suppresses the above-mentioned fusion phenomenon. However, the surface of the plate glass becomes rough. The present invention seeks to solve the above problems.
【0008】[0008]
【課題を解決するための手段】本発明は前述の問題を解
決すべくなされたものであり、板ガラスと板ガラスの間
に紙を挟んで該板ガラスを窒素雰囲気中で徐冷する板ガ
ラスの徐冷法を提供するものである。The present invention has been made to solve the above-mentioned problems, and provides a slow cooling method for flat glass in which a sheet is sandwiched between flat glasses and the flat glass is gradually cooled in a nitrogen atmosphere. To do.
【0009】また本発明は、断熱材の上に高平坦度を有
する高熱伝導体を載置し、該高熱伝導体の上に紙と板ガ
ラスを交互に複数枚積層し、その上に高熱伝導体を載置
し、さらにその上に断熱材を載置した後、最上部に金属
製ブロックの重しを載置してなる集合体を窒素雰囲気中
で板ガラスの徐冷点付近の温度まで昇温し、該温度で所
定時間保持した後徐冷することを特徴とする板ガラスの
徐冷法を提供するものである。Further, according to the present invention, a high thermal conductor having a high flatness is placed on a heat insulating material, and a plurality of papers and plate glasses are alternately laminated on the high thermal conductor, and the high thermal conductor is laminated thereon. On top of it, and then heat insulation on top of it, and then heat the assembly with the weight of the metal block on top to a temperature near the annealing point of the sheet glass in a nitrogen atmosphere. Then, the plate glass is gradually cooled after being kept at the temperature for a predetermined period of time, and then provided.
【0010】上記断熱材としては、例えば粘土質煉瓦を
用いることができるが、その場合厚さが10mm以上の
ものが好ましい。また上記高熱伝導体としては、例えば
SiC板あるいはグラファイト板を用いることができ
る。また、上記板ガラスの徐冷点付近の温度として、徐
冷点より10℃程度低い温度を選ぶことができる。As the heat insulating material, for example, a clay brick can be used, and in this case, a material having a thickness of 10 mm or more is preferable. As the high thermal conductor, for example, a SiC plate or a graphite plate can be used. As the temperature near the annealing point of the plate glass, a temperature lower by about 10 ° C. than the annealing point can be selected.
【0011】上記の紙としては、和紙、洋紙のなかから
本願発明の目的にかなったものを選ぶことができる。例
えば板ガラス業界で2枚以上の板ガラスを重ねる場合に
板ガラスの間に通常挟んで使用される合紙と呼ばれる紙
が好適に用いられる。As the above-mentioned paper, one that meets the object of the present invention can be selected from Japanese paper and foreign paper. For example, when stacking two or more sheet glasses in the sheet glass industry, paper called interleaving paper, which is usually sandwiched between sheet glasses, is preferably used.
【0012】本発明において紙として上記の合紙を板ガ
ラスの間に挟み上記集合体全体を窒素雰囲気中で徐冷す
る方法を採用することにより、熱的寸法の安定性および
平坦度の良いガラス基板を生産性良く得られることが確
認できた。本発明の徐冷法により徐冷された板ガラスは
表面の肌荒れが少ない。したがって該板ガラスを研磨し
て基板ガラスを得ようとする場合、研磨加工前の板ガラ
スの表面の肌荒れが少ないので、これまで無理とされて
いた片面40μm前後の研磨量で充分な品質が得られる
ことを確認した。In the present invention, by adopting a method of sandwiching the above-mentioned interleaving paper as a paper between plate glass and gradually cooling the whole assembly in a nitrogen atmosphere, a glass substrate having good thermal stability and flatness. It was confirmed that could be obtained with high productivity. The plate glass annealed by the annealing method of the present invention has less surface roughness. Therefore, when trying to obtain the substrate glass by polishing the plate glass, since the surface of the plate glass before polishing is less rough, sufficient quality can be obtained with a polishing amount of about 40 μm on one side, which has been impossible until now. It was confirmed.
【0013】以下、本発明を実施例にしたがって説明す
る。図1に示すように、上下方向の断熱を目的とした厚
さ65mm、寸法115mm×115mmの粘土質煉瓦
1の上に熱伝導率40kcal/m・h・℃以上で高平
坦度(10μm以下)を有す厚さ5mm、寸法115m
m×115mmのSiC板2を1枚載置し、その上に厚
さ0.05mm、寸法115mm×115mmに切断し
た合紙3を置き、あらかじめ合紙と同じ寸法に切断され
た板ガラス4とを順次交互に20枚積層する。積層され
た合紙の上に前記同様SiC板2を載置し、その上に粘
土質煉瓦を置き、最上部に5kgのステンレス製の重し
5を載せ、集合体6を構成する。この集合体を熱処理炉
の大きさに合わせ、図2にあるステンレス製のボックス
7内に所要数の集合体を仕込む。ステンレス製ボックス
内は合紙の炭化防止として窒素ガスをパイプ8により
0.5Nm3 /hr程度封入し、ボックス内の酸素濃度
を0.3%以下、好ましくは0.1%以下に保ちながら
熱処理を行う。使用に供した熱処理炉は温度パターンの
制御できる電気炉を用いることとし、バッチ式あるいは
連続式の電気炉により熱処理を行う。熱処理は図3に示
すような温度パターンで、昇温、温度保持、徐冷、冷却
を行うものである。The present invention will be described below with reference to examples. As shown in FIG. 1, a high flatness (10 μm or less) with a thermal conductivity of 40 kcal / m · h · ° C. or higher on a clay brick 1 having a thickness of 65 mm and dimensions of 115 mm × 115 mm for the purpose of vertical heat insulation. With a thickness of 5 mm and dimensions of 115 m
One m × 115 mm SiC plate 2 is placed, and a slip sheet 3 cut to a thickness of 0.05 mm and a size of 115 mm × 115 mm is placed on it, and a plate glass 4 cut in advance to the same size as the slip sheet is placed. Twenty sheets are laminated alternately in sequence. The SiC plate 2 is placed on the laminated interleaving paper in the same manner as above, the clay brick is placed thereon, and the weight 5 made of stainless steel of 5 kg is placed on the uppermost part to form the aggregate 6. According to the size of the heat treatment furnace, this assembly is charged with a required number of assemblies in the stainless box 7 shown in FIG. Nitrogen gas was sealed in the stainless box by pipe 8 to prevent carbonization of the interleaving paper by about 0.5 Nm 3 / hr, and heat treatment was performed while keeping the oxygen concentration in the box at 0.3% or less, preferably 0.1% or less. I do. The heat treatment furnace used is an electric furnace whose temperature pattern can be controlled, and heat treatment is performed by a batch type or continuous type electric furnace. The heat treatment is performed by raising the temperature, maintaining the temperature, gradually cooling, and cooling in a temperature pattern as shown in FIG.
【0014】[0014]
【作用】本発明において上下に粘土質煉瓦を用いること
と、板ガラスと板ガラスの間に合紙を挟み、板ガラスの
徐冷点付近の温度まで昇温し徐冷することにより、以下
のような作用がある。In the present invention, by using clay bricks on the upper and lower sides, sandwiching interleaving paper between plate glass, and raising the temperature to a temperature near the annealing point of the plate glass and gradually cooling, the following effects There is.
【0015】(1) 断熱性の高い粘土質煉瓦と熱伝導性の
高いSiCなどの板を上下に載置することで、積層され
た板ガラスの歪点付近での上面および下面の温度差を
0.02℃以下に抑えられ、上面および下面の温度差に
よる反りを0.4μm以下にすることができる。 (2) 板ガラスと板ガラスの間に合紙を挟み、窒素雰囲気
中で徐冷することにより合紙は炭化し、板ガラスと板ガ
ラスの間に炭化した合紙が創出されるため、もともと平
坦度が悪いか、昇温過程で反りが生じた板ガラスは自由
に滑り、重しの効果との相乗作用により、反りが矯正さ
れ板ガラスの平坦度を100mm径当り10μm以下に
することができる。 (3) 加熱温度を板ガラスの徐冷点付近までしか昇温しな
いため、板ガラスのミクロな表面は徐冷前とほとんど変
わらない表面状態を維持できる。 (4) この方法により徐冷された板ガラスを加工および表
面研磨を行った後、性能付加のための熱処理を行った結
果、熱処理の前後で板ガラスの熱収縮率は100ppm
で従来品175ppmに較べて小さくなった。また、熱
処理前後での平坦度の変化もほどんど見られないことが
確認できた。(1) By placing a clay brick having a high heat insulating property and a plate having a high heat conductivity such as SiC on the upper and lower sides, the temperature difference between the upper surface and the lower surface near the strain point of the laminated glass sheets is reduced to 0. It can be suppressed to 0.02 ° C. or less, and the warp due to the temperature difference between the upper surface and the lower surface can be 0.4 μm or less. (2) The interleaf paper is sandwiched between plate glass and gradually cooled in a nitrogen atmosphere, the interleaf paper is carbonized, and carbonized interleaf paper is created between the plate glass, so the flatness is originally poor. In addition, the plate glass that is warped during the temperature rising process freely slides, and by the synergistic effect of the effect of the weight, the warp is corrected and the flatness of the plate glass can be reduced to 10 μm or less per 100 mm diameter. (3) Since the heating temperature is raised only up to near the annealing point of the plate glass, the microscopic surface of the plate glass can maintain a surface state almost the same as that before the annealing. (4) After the plate glass annealed by this method is processed and surface-polished, the heat treatment for adding performance shows that the heat shrinkage of the plate glass is 100 ppm before and after the heat treatment.
Was smaller than the conventional product of 175 ppm. It was also confirmed that the change in flatness before and after the heat treatment was hardly seen.
【0016】これらの作用により熱的寸法の安定性を良
くするのと同時に板ガラスの平坦度も良好で、表面の肌
荒れもなく、片面研磨が可能となり、高平坦度ガラス基
板を低コストで作製することができた。By these actions, the stability of the thermal dimension is improved, at the same time the flatness of the plate glass is good, the surface is not roughened, and one-side polishing is possible, and a high flatness glass substrate is manufactured at low cost. I was able to.
【0017】[0017]
【実施例】厚さ0.72mmまたは0.53mm、寸法
115mm×115mmのアルミノシリケートガラス
(徐冷点571℃)を図1に示すように、板ガラスと板
ガラスの間に合紙を挟み20層からなる集合体を形成し
ステンレス製ボックス内にセットした後、バッチ式電気
炉を用い、窒素雰囲気中で図3に示す温度パターンで徐
冷を行った結果、表1に示す通り徐冷後の平坦度は10
0mm径当り10μm以下が95%以上で、470℃×
8hrの熱処理を更に行っても熱収縮率は100ppm
で従来品に比べ小さく、熱処理後の平坦度の悪化はほと
んど見られない。また、研磨量についても徐冷後の板ガ
ラス表面が良好なため、片面40μm研磨が達成でき
た。このようなガラス基板はハードディスク用ガラス基
板として好適なガラス基板である。[Example] As shown in FIG. 1, an aluminosilicate glass (annealing point 571 ° C.) having a thickness of 0.72 mm or 0.53 mm and dimensions of 115 mm × 115 mm is sandwiched between plate glass and 20 layers. After forming the following aggregate and setting it in a stainless steel box, it was gradually cooled in a nitrogen atmosphere in a nitrogen atmosphere in the temperature pattern shown in FIG. 10 degrees
95% or more at 10 μm or less per 0 mm diameter, 470 ° C. ×
Thermal shrinkage is 100ppm even after further heat treatment for 8 hours
Is smaller than the conventional product, and the flatness after heat treatment is hardly deteriorated. As for the amount of polishing, since the surface of the plate glass after the slow cooling was good, polishing of 40 μm on one side could be achieved. Such a glass substrate is a glass substrate suitable as a glass substrate for a hard disk.
【0018】[0018]
【表1】 [Table 1]
【0019】[0019]
【発明の効果】本発明の徐冷法により徐冷された板ガラ
スは以下に示す特徴を有する。 (1) 熱処理を施したときその前後での寸法変化が極めて
小さい。 (2) 平坦度10μm以下を95%以上にできる。 (3) 高平坦度であるため研磨量を減少させ研磨コストを
下げることができる。 (4) 表面状態が良好のため、研磨量を更に減少させるこ
とができ、研磨コストの低減に効果があり、すなわち片
面研磨が可能等の効果が顕著である。 (5) ガラス表面に形成される炭素被膜は容易に洗浄・除
去できるが、この被膜がガラスのヤケ防止、汚れの付着
防止に役立つ。 (6) グラファイトセッターを使用しないため1バッチの
投入枚数が増やせるし、セッターのコストもかからず、
コストダウンが可能である。 したがって、本発明の徐冷法により徐冷された板ガラス
は、前記フォトマスク、ハードディスク等のガラス基板
として好適に使用できる。The plate glass annealed by the annealing method of the present invention has the following characteristics. (1) The dimensional change before and after heat treatment is extremely small. (2) The flatness of 10 μm or less can be increased to 95% or more. (3) Since the flatness is high, the polishing amount can be reduced and the polishing cost can be reduced. (4) Since the surface condition is good, the amount of polishing can be further reduced, which is effective in reducing the polishing cost, that is, the effect that one-side polishing is possible is remarkable. (5) The carbon coating formed on the glass surface can be easily washed and removed, but this coating helps prevent the glass from being burnt and stains. (6) Since the graphite setter is not used, the number of sheets to be put in one batch can be increased and the cost of the setter can be reduced.
Cost reduction is possible. Therefore, the plate glass annealed by the annealed cooling method of the present invention can be suitably used as a glass substrate for the photomask, hard disk, or the like.
【図1】本発明の実施例における積層集合体の斜視図FIG. 1 is a perspective view of a laminated assembly according to an embodiment of the present invention.
【図2】本発明の実施例における積層集合体を装入した
ボックスの斜視図FIG. 2 is a perspective view of a box into which a stacked assembly is loaded according to an embodiment of the present invention.
【図3】本発明の実施例における徐冷温度パターンのグ
ラフFIG. 3 is a graph of a slow cooling temperature pattern in an example of the present invention.
1:粘土質煉瓦 2:SiC板 3:合紙 4:板ガラス 5:重し 6:積層集合体 1: Clay brick 2: SiC plate 3: Interleaf paper 4: Sheet glass 5: Weight 6: Laminated assembly
Claims (4)
ガラスを窒素雰囲気中で徐冷する板ガラスの徐冷法。1. A method of gradually cooling a plate glass, in which a sheet of paper is sandwiched between the plate glasses and the plate glass is gradually cooled in a nitrogen atmosphere.
を載置し、該高熱伝導体の上に紙と板ガラスを交互に複
数枚積層し、その上に高熱伝導体を載置し、さらにその
上に断熱材を載置した後、最上部に金属製ブロックの重
しを載置してなる集合体を窒素雰囲気中で板ガラスの徐
冷点付近の温度まで昇温し、該温度で所定時間保持した
後徐冷することを特徴とする板ガラスの徐冷法。2. A high thermal conductor having high flatness is placed on a heat insulating material, a plurality of papers and plate glasses are alternately laminated on the high thermal conductor, and the high thermal conductor is placed on it. Then, after further placing a heat insulating material on it, the aggregate formed by placing the weight of the metal block on the top is heated to a temperature near the annealing point of the plate glass in a nitrogen atmosphere, A gradual cooling method for plate glass, which comprises holding at a temperature for a predetermined time and then gradually cooling.
とする請求項2記載の板ガラスの徐冷法。3. The method for gradually cooling plate glass according to claim 2, wherein the heat insulating material is a clay brick.
イトからなることを特徴とする請求項2記載の板ガラス
の徐冷法。4. The method for gradually cooling plate glass according to claim 2, wherein the high thermal conductor is made of SiC or graphite.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5515093A JPH06247730A (en) | 1993-02-19 | 1993-02-19 | Method for slowly cooling sheet glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5515093A JPH06247730A (en) | 1993-02-19 | 1993-02-19 | Method for slowly cooling sheet glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06247730A true JPH06247730A (en) | 1994-09-06 |
Family
ID=12990734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5515093A Pending JPH06247730A (en) | 1993-02-19 | 1993-02-19 | Method for slowly cooling sheet glass |
Country Status (1)
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JP (1) | JPH06247730A (en) |
Cited By (7)
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---|---|---|---|---|
JP2001139005A (en) * | 1999-11-12 | 2001-05-22 | Dainippon Printing Co Ltd | Flatness keeping method for thin plate and laminate using the method |
JP2005305692A (en) * | 2004-04-19 | 2005-11-04 | Tama Tlo Kk | Fiber reinforced plastic preform, fiber reinforced plastic material and roll |
US8281618B2 (en) | 2005-12-16 | 2012-10-09 | Nippon Electric Glass Co., Ltd. | Alkali-free glass substrate and process for producing the same |
JP2015214482A (en) * | 2010-08-30 | 2015-12-03 | コーニング インコーポレイテッド | Apparatus and method for heat treatment of glass substrate |
JP2016011231A (en) * | 2014-06-30 | 2016-01-21 | AvanStrate株式会社 | Manufacturing method of glass substrate |
JP2016124758A (en) * | 2015-01-05 | 2016-07-11 | 日本電気硝子株式会社 | Support glass substrate and method for manufacturing the same |
JP2019524618A (en) * | 2016-06-30 | 2019-09-05 | コーニング インコーポレイテッド | Glass-based article having manipulated stress distribution and method for producing the same |
-
1993
- 1993-02-19 JP JP5515093A patent/JPH06247730A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001139005A (en) * | 1999-11-12 | 2001-05-22 | Dainippon Printing Co Ltd | Flatness keeping method for thin plate and laminate using the method |
JP2005305692A (en) * | 2004-04-19 | 2005-11-04 | Tama Tlo Kk | Fiber reinforced plastic preform, fiber reinforced plastic material and roll |
JP4672280B2 (en) * | 2004-04-19 | 2011-04-20 | 敏夫 谷本 | roll |
US8281618B2 (en) | 2005-12-16 | 2012-10-09 | Nippon Electric Glass Co., Ltd. | Alkali-free glass substrate and process for producing the same |
JP2015214482A (en) * | 2010-08-30 | 2015-12-03 | コーニング インコーポレイテッド | Apparatus and method for heat treatment of glass substrate |
JP2016011231A (en) * | 2014-06-30 | 2016-01-21 | AvanStrate株式会社 | Manufacturing method of glass substrate |
JP2016124758A (en) * | 2015-01-05 | 2016-07-11 | 日本電気硝子株式会社 | Support glass substrate and method for manufacturing the same |
JP2019524618A (en) * | 2016-06-30 | 2019-09-05 | コーニング インコーポレイテッド | Glass-based article having manipulated stress distribution and method for producing the same |
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