JPH06223410A - Optical disk and its production - Google Patents

Optical disk and its production

Info

Publication number
JPH06223410A
JPH06223410A JP5011539A JP1153993A JPH06223410A JP H06223410 A JPH06223410 A JP H06223410A JP 5011539 A JP5011539 A JP 5011539A JP 1153993 A JP1153993 A JP 1153993A JP H06223410 A JPH06223410 A JP H06223410A
Authority
JP
Japan
Prior art keywords
protective layer
active energy
resin
energy ray
curing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5011539A
Other languages
Japanese (ja)
Other versions
JP3229686B2 (en
Inventor
Yuko Suzuki
祐子 鈴木
Shin Aihara
伸 相原
Sumio Hirose
純夫 広瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP01153993A priority Critical patent/JP3229686B2/en
Publication of JPH06223410A publication Critical patent/JPH06223410A/en
Application granted granted Critical
Publication of JP3229686B2 publication Critical patent/JP3229686B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To make it possible to prevent hindrance of curing by oxygen, to improve the hardness and scratching resistance of protective layers to provide the protective layers resistant to flawing and to lessen the deformation of the disk at the time of curing an active energy ray curing resin. CONSTITUTION:The protective layer resin of the optical disk which has the protective layers consisting of the radical polymerizable active energy ray curing resin on one or both surfaces of a substrate and with which one or more of reading out, recording and erasing can be executed is cured by irradiating the resin with the active energy rays under reduced pressure conditions.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光、特にレーザー光に
よって読み出し、記録、消去の1つ以上が出来る光ディ
スクに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical disk which can be read, recorded and erased by light, particularly laser light.

【0002】[0002]

【従来の技術】半導体レーザー技術、媒体技術等の発展
により光ディスクは近年急速に普及した。再生専用ディ
スク、記録可能なディスク、記録消去可能なディスクが
種々の用途に利用されている。上記した光ディスクは通
常、ガラス、又はアクリル樹脂やポリカーボネート樹脂
等の樹脂基板に記録層、反射層等の薄膜を有し、更にこ
れら薄膜を保護するために保護層が設けられている。
又、基板の光入射面の傷防止や帯電防止のために保護層
が設けられている場合もある。そしてこれらの保護層に
は作業性などの点からラジカル重合型の活性エネルギー
線硬化樹脂が用いられている。そして、従来は硬度や擦
傷性の性能上の問題から架橋密度を高い樹脂を用いてい
た。
2. Description of the Related Art Optical discs have become popular rapidly in recent years due to the development of semiconductor laser technology, medium technology and the like. Play-only discs, recordable discs, and recordable / erasable discs are used for various purposes. The above-mentioned optical disc usually has a thin film such as a recording layer and a reflective layer on a glass or a resin substrate such as an acrylic resin or a polycarbonate resin, and a protective layer is provided to protect these thin films.
In addition, a protective layer may be provided in order to prevent scratches on the light incident surface of the substrate and to prevent charging. A radical polymerization type active energy ray curable resin is used for these protective layers from the viewpoint of workability. Then, conventionally, a resin having a high cross-linking density has been used because of problems in hardness and scratch resistance.

【0003】しかしながら、架橋密度の高い樹脂を用い
ると、硬化収縮が大きくディスクの変形が大きくなった
り、残留応力が大きくなったりして好ましくなく、特に
単板型の媒体では変形を小さくするために生産性や歩留
まりを犠牲にしていた。又、コンパクトディスクのよう
に低速で記録や再生する場合は多少変形が大きくても問
題なかったが、高速で記録、消去、再生する場合はサー
ボが変形に追従できず、正しく記録、再生することが難
かった。
However, the use of a resin having a high cross-linking density is not preferable because the curing shrinkage is large, the deformation of the disk is large, and the residual stress is large, and in particular, in the case of a single plate type medium, the deformation is reduced. It sacrificed productivity and yield. Also, when recording or reproducing at a low speed like a compact disc, there was no problem even if the deformation was a little large, but when recording, erasing or reproducing at a high speed, the servo could not follow the deformation and correct recording and reproducing should be performed. Was difficult.

【0004】架橋密度の小さい樹脂を用いると媒体の変
形が小さく抑えられるが、架橋密度の小さい活性エネル
ギー線硬化樹脂を空気中で硬化した場合、本発明者らの
検討によると、得られる保護層の硬度、摺傷性等が劣り
十分な保護機能を有しなかった。その理由は活性エネル
ギー線硬化樹脂は硬化に際して酸素による硬化妨害を受
けやすく、空気と接触する樹脂表面が酸素により硬化阻
害をうけ架橋密度が低下するためである。この酸素によ
る硬化妨害を防ぐ方法として窒素などの不活性ガス雰囲
気下で硬化する方法も提案されているが、経済性や安全
性の面で問題があり実用化されていない。
When a resin having a low crosslink density is used, the deformation of the medium can be suppressed to a small level. However, when an active energy ray-curable resin having a low crosslink density is cured in air, the inventors of the present invention have found that the resulting protective layer is The hardness and scratch resistance were poor, and it did not have a sufficient protective function. The reason is that the active energy ray-curable resin is susceptible to curing inhibition by oxygen during curing, and the resin surface in contact with air is impeded by curing due to oxygen, and the crosslink density decreases. A method of curing in an atmosphere of an inert gas such as nitrogen has been proposed as a method of preventing the curing inhibition by oxygen, but it has not been put into practical use because of problems in terms of economy and safety.

【0005】[0005]

【発明が解決しようとする課題】本発明者らは、前記し
た光ディスクの保護層の問題点を解決すべく鋭意検討を
重ねた結果、活性エネルギー線硬化樹脂を硬化する最に
酸素による硬化阻害を防止するために、減圧条件下で行
えばよいことを見いだした。しかしながら、一方、減圧
にするほど樹脂中の溶存ガスの脱ガスによる樹脂の発泡
の問題が生じるが、発泡しない減圧条件が樹脂粘度に依
存することを見い出し、保護層樹脂が硬化時に発泡せ
ず、且つ保護膜の硬度、擦傷性等に優れる条件を見出
し、本発明に至ったものである。
DISCLOSURE OF THE INVENTION As a result of intensive studies to solve the above-mentioned problems of the protective layer of the optical disc, the present inventors have found that the curing inhibition of oxygen by the curing of the active energy ray-curable resin is prevented. In order to prevent this, they have found that it can be performed under reduced pressure conditions. On the other hand, on the other hand, as the pressure is reduced, the problem of foaming of the resin due to the degassing of the dissolved gas in the resin occurs, but it is found that the depressurizing condition of not foaming depends on the resin viscosity, and the protective layer resin does not foam during curing, Further, the inventors have found the conditions in which the hardness and scratch resistance of the protective film are excellent, and arrived at the present invention.

【0006】[0006]

【課題を解決するための手段】すなわち、本発明は、基
板の両面又は片面にラジカル重合型活性エネルギー線硬
化樹脂よりなる保護層を有し、読み出し、記録、消去の
うち1つ以上できる光ディスクであって、該保護層が減
圧条件下で活性エネルギー線によって硬化されたことを
特徴とする光ディスク、およびその製造方法であり、よ
り好ましくは、保護層樹脂を硬化するに際し、活性エネ
ルギー線の照射直前の保護層樹脂の粘度をη(センチポ
イズ)とし、照射雰囲気の真空度をP(mmHg)とした
時、P≦120、且つη1/2 ×P≧120なる条件によって活
性エネルギー線によって保護層樹脂が硬化されたもので
あり、また、P≦80、且つη1/2 ×P≧180なる条件に
よって活性エネルギー線によって保護層樹脂が硬化され
るものであり、また保護層に用いられる活性エネルギー
線硬化樹脂の粘度ηが50センチポイズ以上であるもので
ある。
That is, the present invention provides an optical disc having a protective layer made of a radical polymerization type active energy ray curable resin on both sides or one side of a substrate and capable of performing one or more of reading, recording and erasing. There is an optical disc characterized in that the protective layer is cured by active energy rays under a reduced pressure condition, and a method for producing the same. More preferably, when the protective layer resin is cured, immediately before irradiation with active energy rays. When the viscosity of the protective layer resin is η (centipoise) and the degree of vacuum of the irradiation atmosphere is P (mmHg), the protective layer resin is activated by the active energy ray under the condition of P ≦ 120 and η 1/2 × P ≧ 120. use but is intended cured, it is intended protective layer resin is cured by active energy ray by P ≦ 80, and η 1/2 × P ≧ 180 becomes conditions and the protective layer The viscosity of the active energy ray curable resin η for is not lower than 50 centipoises.

【0007】以下、本発明を詳細に説明する。本発明の
光ディスクは、基板に記録層、反射層等の薄膜を1層以
上設け、更にこれらの薄膜を保護するために保護層が設
けられていたり、又は記録層や反射層が設けられている
面の反対の面(光入射面)に基板の表面を保護するため
に保護層が設けられている。
The present invention will be described in detail below. In the optical disc of the present invention, one or more thin films such as a recording layer and a reflective layer are provided on the substrate, and a protective layer is provided to protect these thin films, or a recording layer and a reflective layer are provided. A protective layer is provided on the opposite surface (light incident surface) to protect the surface of the substrate.

【0008】上記基板の材質としては、半導体レーザー
の光を実質的に透過し、通常の光記録媒体に用いられる
材料ならばいかなるものも使用できる。たとえば、ガラ
スやポリカーボネート樹脂、アクリル樹脂、ポリスチレ
ン樹脂、塩化ビニル樹脂、エポキシ樹脂、ポリエステル
樹脂、アモルファスポリオレフィンなどの樹脂を利用で
きる。該基板は予めピットやグルーブを有していても良
い。
As the material of the substrate, any material can be used as long as it is a material that substantially transmits the light of the semiconductor laser and is used for a general optical recording medium. For example, resins such as glass, polycarbonate resin, acrylic resin, polystyrene resin, vinyl chloride resin, epoxy resin, polyester resin and amorphous polyolefin can be used. The substrate may have pits or grooves in advance.

【0009】本発明に於て基板に記録層や反射層などの
薄膜が成膜されているが、これら記録層や反射層に用い
られる材料は特に限定はない。記録層は記録用の光を吸
収する層であり、記録層に用いられる材料としては例え
ば、ライトワンスディスクに用いられるTe等の金属を
含む合金やシアニン系色素、フタロシアニン系色素、ナ
フタロシアニン色素、ナフトキノン系色素等の有機色
素、光磁気ディスクに用いられるTbFeCo合金、相
変化ディスクに用いられるSn、Sb、Se等の金属を
含む合金等が挙げられる。又再生専用ディスクの場合の
ように記録層が設けられていないディスクであってもよ
い。
In the present invention, thin films such as a recording layer and a reflective layer are formed on the substrate, but the materials used for these recording layer and reflective layer are not particularly limited. The recording layer is a layer that absorbs light for recording, and examples of materials used for the recording layer include alloys containing a metal such as Te used in write-once discs, cyanine dyes, phthalocyanine dyes, and naphthalocyanine dyes. Examples thereof include organic dyes such as naphthoquinone dyes, TbFeCo alloys used for magneto-optical discs, alloys containing metals such as Sn, Sb and Se used for phase change discs. Further, it may be a disc having no recording layer as in the case of a read-only disc.

【0010】反射層としては、アルミニウム、金、銅、
白金、銀、錫等の金属又はこれらの金属を含む合金や誘
電体の多層膜等が代表的である。もちろん反射層を有し
ないディスクであってもよい。更に前記記録層や反射層
以外に誘電体層、断熱層、熱拡散層、反射防止層等が設
けられていてもよい。又、光入射面には帯電防止用の導
電体層などを有していても良い。これらの層は単層でも
複層でもよく、又設けられる順序は特に限定はない。
As the reflective layer, aluminum, gold, copper,
Typical examples are metals such as platinum, silver, tin, alloys containing these metals, and dielectric multilayer films. Of course, a disc having no reflective layer may be used. Further, in addition to the recording layer and the reflection layer, a dielectric layer, a heat insulation layer, a heat diffusion layer, an antireflection layer, etc. may be provided. Further, the light incident surface may have a conductor layer for preventing charging. These layers may be a single layer or multiple layers, and the order in which they are provided is not particularly limited.

【0011】本発明のディスクに於いてはこれらの記録
層や反射層の上にこれらの層を保護するために保護層が
設けられる。又、この記録層や反射層が設けられている
面と反対の面(光入射面)の傷も記録や読み出しに影響
を与えるので、この面も保護層を設けることもある。
In the disc of the present invention, a protective layer is provided on these recording layer and reflective layer in order to protect these layers. Further, a scratch on the surface (light incident surface) opposite to the surface on which the recording layer or the reflective layer is provided also affects recording and reading, so that a protective layer may be provided on this surface as well.

【0012】この際保護層には種々の物質を用いること
が出来るが、本発明に於いては、生産性、作業性などの
点からラジカル重合型の活性エネルギー線硬化樹脂が好
ましい。ラジカル重合型の活性エネルギー線硬化樹脂の
具体例としては、(メタ)アクリロイル基を有する樹
脂、ポリエン−チオール系樹脂等が挙げられる。これら
の樹脂は通常一分子中のアクリロイル基等の反応性二重
結合の数を増加すると、硬化樹脂の硬度は硬くなるが、
硬化収縮が大きくなる。又、樹脂の平均分子量を大きく
すると樹脂の粘度は大きくなる。更に、これらの樹脂に
は熱可塑性樹脂、帯電防止剤、レベリング剤、スリック
剤、消泡剤、カップリング剤、無機及び有機フィラー等
を添加して用いることもできる。
At this time, various substances can be used for the protective layer, but in the present invention, a radical polymerization type active energy ray curable resin is preferable from the viewpoint of productivity, workability and the like. Specific examples of the radical polymerization type active energy ray curable resin include a resin having a (meth) acryloyl group and a polyene-thiol resin. These resins usually increase the hardness of the cured resin when the number of reactive double bonds such as acryloyl groups in one molecule increases, but
Hardening shrinkage increases. In addition, the viscosity of the resin increases as the average molecular weight of the resin increases. Further, a thermoplastic resin, an antistatic agent, a leveling agent, a slick agent, a defoaming agent, a coupling agent, an inorganic or organic filler, etc. may be added to these resins.

【0013】本発明に於いては、前記活性エネルギー線
硬化樹脂を、記録層や反射層等の設けられた面及び/又
は基板の光入射面に塗布する。塗布する方法は特に制限
はなく、例えばスピンコート法、スクリーン印刷法、浸
漬法などが挙げられる。保護層の成膜の容易さ及び膜の
均一性などの点からはスピンコート法が好ましい。この
際樹脂の粘度が高い場合は溶剤で希釈して用いることも
できる。溶剤を用いた場合は硬化する以前に乾燥し溶剤
を除去する方が好ましい。又、保護層は記録層や反射層
を越えて成膜する方が好ましい。
In the present invention, the active energy ray-curable resin is applied to the surface on which the recording layer, the reflective layer and the like are provided and / or the light incident surface of the substrate. The coating method is not particularly limited, and examples thereof include spin coating, screen printing, and dipping. The spin coating method is preferable from the viewpoints of ease of forming the protective layer and uniformity of the film. At this time, when the viscosity of the resin is high, it may be diluted with a solvent before use. When a solvent is used, it is preferable to dry it and remove the solvent before curing. Further, it is preferable that the protective layer is formed beyond the recording layer and the reflective layer.

【0014】次に活性エネルギー線を照射して樹脂を硬
化するが、本発明に於ける活性エネルギー線とは、例え
ば紫外線、電子線等が挙げられる。この活性エネルギー
線を照射する際に、照射雰囲気を減圧下にしなければな
らない。減圧にする際の真空度は硬化性の点からは出来
るだけ減圧にした方が好ましい。しかしながら、減圧し
過ぎると樹脂が発泡し好ましくない。この樹脂の発泡の
問題は活性エネルギー線を照射する直前の樹脂の粘度に
依存し、照射雰囲気の真空度をP(mmHg)とし、活性エ
ネルギー線を照射する直前の樹脂の粘度をη(センチポ
イズ)としたとき、η1/2 ×P≧120の条件が好まし
く、η1/2 ×P≧180が更に好ましいことを見いだし
た。又、保護層樹脂の酸素による硬化妨害による保護膜
の硬度、擦傷性等低下の点からは、Pは120以下が好ま
しく、80以下が更に好ましい。又、硬化収縮による媒体
の変形の点からは、活性エネルギー線照射直前の樹脂の
粘度は50センチポイズ以上が好ましい。その理由は真空
度を上げることが出来るだけでなく、前記したように、
該樹脂は一般に粘度が大きい程硬化収縮が小さいからで
ある。又、前記した活性エネルギー線を照射する直前の
樹脂の粘度とは、樹脂の脱ガスによる発泡は減圧時に発
生する。一方、前記したように樹脂を塗布する際、樹脂
の粘度があまり高い場合は溶剤で希釈して使用すること
もできる。溶剤を使用した時は活性エネルギー線を照射
する前に溶剤を除去するのが好ましく、この際の樹脂の
粘度は溶剤を除去した後の粘度を言う。本発明に於いて
は、保護層樹脂を活性エネルギー線で硬化する際に加熱
しても良いし、又、硬化した後に加熱しても良い。更
に、保護層の上に印刷をしても良い。
Next, the resin is cured by irradiation with active energy rays. Examples of the active energy rays in the present invention include ultraviolet rays and electron beams. When irradiating with this active energy ray, the irradiation atmosphere must be under reduced pressure. The degree of vacuum when the pressure is reduced is preferably as low as possible from the viewpoint of curability. However, if the pressure is reduced too much, the resin foams, which is not preferable. The problem of foaming of this resin depends on the viscosity of the resin immediately before irradiating the active energy ray, and the degree of vacuum of the irradiation atmosphere is P (mmHg), and the viscosity of the resin immediately before irradiating the active energy ray is η (centipoise). Then, it was found that the condition of η 1/2 × P ≧ 120 is preferable, and the condition of η 1/2 × P ≧ 180 is more preferable. Further, P is preferably 120 or less, and more preferably 80 or less from the viewpoint of deterioration of hardness, scratch resistance and the like of the protective film due to curing inhibition of the protective layer resin by oxygen. From the viewpoint of medium deformation due to curing shrinkage, the viscosity of the resin immediately before irradiation with active energy rays is preferably 50 centipoise or more. The reason is not only that the degree of vacuum can be increased, but as described above,
This is because the higher the viscosity of the resin is, the smaller the curing shrinkage is. In addition, the viscosity of the resin immediately before irradiation with the active energy ray means that foaming due to degassing of the resin occurs during depressurization. On the other hand, as described above, when the resin is applied, if the viscosity of the resin is too high, the resin may be diluted with a solvent before use. When a solvent is used, it is preferable to remove the solvent before irradiating with active energy rays, and the viscosity of the resin at this time means the viscosity after removing the solvent. In the present invention, the protective layer resin may be heated when it is cured with an active energy ray, or may be heated after being cured. Furthermore, you may print on a protective layer.

【0015】[0015]

【実施例】以下、実施例により本発明を具体的に説明す
る。但し、本発明の実施の態様はこれにより限定される
ものではない。
EXAMPLES The present invention will be specifically described below with reference to examples. However, the embodiment of the present invention is not limited to this.

【0016】実施例1 厚さ1.2mm、直径120mmのスパイラル状のグル
ーブ(深さ120nm、巾0.5μm、ピッチ1.6μ
m)を有する射出成形ポリカーボネート樹脂基板上に、
Pd−テトラー(1,2−ジメチルプロポキシ)−フタ
ロシアニンのブロム(平均3.8個/1分子)化色素の
3重量%のn−オクタン溶液を滴下したのち、この樹脂
基板を1100rpmの速度で20秒間回転した。記録
層を成膜した。
Example 1 A spiral groove having a thickness of 1.2 mm and a diameter of 120 mm (depth 120 nm, width 0.5 μm, pitch 1.6 μ)
m) on an injection molded polycarbonate resin substrate having
A 3 wt% n-octane solution of a Pd-tetra- (1,2-dimethylpropoxy) -phthalocyanine brominated (average of 3.8 / molecule) n-octane solution was added dropwise, and the resin substrate was applied at a speed of 1100 rpm for 20 minutes. It spun for a second. The recording layer was formed.

【0017】この記録層の上に反射層として厚さ120
nmの全薄膜をスパッタにより成膜した後、保護層とし
て120センチポイズのラジカル重合型の紫外線硬化樹
脂をスピンコート法(4500rpm)により成膜した。次に3
0mmHgの真空下で紫外線を照射して該樹脂を硬化した
(η1/2 ×P=329)。
A thickness of 120 is formed as a reflective layer on the recording layer.
After forming a thin film having a thickness of nm by sputtering, a 120-cmpoise radical polymerization type ultraviolet curable resin was formed as a protective layer by spin coating (4500 rpm). Then 3
The resin was cured by irradiating ultraviolet rays under a vacuum of 0 mmHg (η 1/2 × P = 329).

【0018】このようにして作製した光ディスクの保護
層は発泡は全く観察されず、ディスクの反り、チルト及
び面振れ等の変形は小さかった。又,保護層の硬度は鉛
筆硬度で4H、且つ、径4.5mm、先端の尖ったダイヤモ
ンド製の針に100gの加重を加えながら保護層を20mm/s
の速度で走らせ擦傷性の試験を行ったが保護層には微か
に傷が付いたが、記録・再生には全く問題無かった。
No bubbling was observed in the protective layer of the optical disc manufactured in this manner, and deformation such as warp, tilt and surface wobbling of the disc was small. The hardness of the protective layer is 4H in pencil hardness, the diameter is 4.5 mm, and the protective layer is 20 mm / s while applying a weight of 100 g to a sharp diamond needle.
The scratch resistance test was carried out at the speed of No. 1, but the protective layer was slightly scratched, but there was no problem in recording and reproducing.

【0019】比較例1 実施例1において、真空度を10mmHgで紫外線を照射(η
1/2 ×P=110)したところ、保護層の全面が発泡し
た。又、真空度を130mmHgにして照射したところ、保護
層の鉛筆硬度はFと低下し、実施例1と同じ方法で擦傷
性の試験を行ったところが深い傷がつき、記録・再生が
不能となった。
Comparative Example 1 In Example 1, ultraviolet rays were irradiated at a vacuum degree of 10 mmHg (η
1/2 × P = 110), the entire surface of the protective layer foamed. Further, when irradiated with a vacuum degree of 130 mmHg, the pencil hardness of the protective layer was lowered to F, and a scratch resistance test was conducted in the same manner as in Example 1, but deep scratches were formed, making recording / reproduction impossible. It was

【0020】実施例2 厚さ1.2mm、直径90mmのスパイラル状のグルー
ブ(深さ120nm、巾0.5μm、ピッチ1.6μ
m)を有する射出成形ポリカーボネート樹脂基板上に、
SiN膜、TbFeCo膜、SiN、Al膜を積層した
後、150センチポイズのラジカル重合型の紫外線硬化
樹脂をスピンコート法(6000rpm)で塗布し、20mmHgの
真空下で紫外線を照射し硬化し(η1/2 ×P=245)保
護層を成膜した。保護層の硬度は3H、ディスクの変形
も小さかった。又、実施例1と同じ方法で擦傷性の試験
を行ったが微かに傷は付いたが、記録・再生には全く問
題無かった。
Example 2 A spiral groove having a thickness of 1.2 mm and a diameter of 90 mm (depth: 120 nm, width: 0.5 μm, pitch: 1.6 μ)
m) on an injection molded polycarbonate resin substrate having
After stacking SiN film, TbFeCo film, SiN, and Al film, 150 centipoise radical polymerization type UV curable resin is applied by spin coating method (6000 rpm), and is cured by irradiating UV ray under vacuum of 20 mmHg (η 1 / 2 x P = 245) A protective layer was formed. The hardness of the protective layer was 3H and the deformation of the disc was small. A scratch resistance test was carried out in the same manner as in Example 1, and there were slight scratches, but there was no problem in recording / reproduction.

【0021】実施例3、比較例2 実施例2の光ディスクの光入射面に帯電防止ハードコー
ト層を成膜するために、紫外線硬化樹脂(粘度70センチ
ポイズ)をスピンコート法(4000rpm)で塗布し、70mmH
gの真空度で硬化し(η1/2 ×P=586)、光入射面に帯
電防止保護層を成膜した。保護層の鉛筆硬度は3H、デ
ィスクの変形は殆ど無かった。又、実施例1と同じ方法
で擦傷性の試験を行った。保護層に微かに傷が付いた
が、記録再生には些かの問題も無かった。
Example 3, Comparative Example 2 In order to form an antistatic hard coat layer on the light incident surface of the optical disk of Example 2, an ultraviolet curable resin (viscosity 70 centipoise) was applied by spin coating (4000 rpm). , 70mmH
It was cured at a vacuum degree of g (η 1/2 × P = 586), and an antistatic protective layer was formed on the light incident surface. The pencil hardness of the protective layer was 3H, and the disc was hardly deformed. A scratch resistance test was conducted in the same manner as in Example 1. The protective layer was slightly scratched, but there was no problem in recording and reproducing.

【0022】一方、真空度を14mmHgで硬化すると(η
1/2 ×P=117)、保護層の全面に発泡が生じた。又、1
30mmHgで硬化した場合は鉛筆硬度がFと低下し、実施例
1と同じ方法で擦傷試験を行ったが、深い傷が付き記録
・再生が出来なくなった。
On the other hand, when the degree of vacuum is hardened at 14 mmHg (η
1/2 × P = 117), and foaming occurred on the entire surface of the protective layer. Also 1
When cured at 30 mmHg, the pencil hardness decreased to F, and a scratch test was conducted in the same manner as in Example 1, but deep scratches were made and recording / reproduction was impossible.

【0023】[0023]

【発明の効果】本発明の基板の片側又は両側にラジカル
重合型の活性エネルギー線硬化樹脂よりなる保護層を有
する読み出し可能な光ディスクに於て、該樹脂を硬化す
る際、樹脂の粘度をη(センチポイズ)、硬化雰囲気の
真空度をP(mmHg)とした時、P≦120、P×η1/2 ≧1
20なる条件で活性エネルギー線を照射し硬化することに
より、発泡による欠陥がなく、保護層の硬度を高く、且
つ傷つき難くできると共に、ディスクの変形を小さくす
ることが出来る。
INDUSTRIAL APPLICABILITY In a readable optical disk having a protective layer made of a radical polymerization type active energy ray curable resin on one side or both sides of the substrate of the present invention, when the resin is cured, the viscosity of the resin is η ( Centipoise), and P (mmHg) as the degree of vacuum in the curing atmosphere, P ≦ 120, P × η 1/2 ≧ 1
By irradiating and curing with active energy rays under the condition of 20, there is no defect due to foaming, the hardness of the protective layer is high, and it is possible to make the scratch resistant and to reduce the deformation of the disk.

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 基板の両面又は片面にラジカル重合型活
性エネルギー線硬化樹脂よりなる保護層を有し、読み出
し、記録、消去のうち1つ以上できる光ディスクであっ
て、該保護層が減圧条件下で活性エネルギー線によって
硬化されたことを特徴とする光ディスク。
1. An optical disc having a protective layer made of a radical polymerization type active energy ray-curable resin on both sides or one side of a substrate and capable of performing one or more of reading, recording and erasing, wherein the protective layer is under a reduced pressure condition. An optical disk characterized by being hardened by active energy rays in.
【請求項2】 保護層樹脂を硬化するに際し、活性エネ
ルギー線の照射直前の保護層樹脂の粘度をη(センチポ
イズ)とし、照射雰囲気の真空度をP(mmHg)とした
時、P≦120 、且つη1/2 ×P≧120なる条件によって
活性エネルギー線によって保護層樹脂が硬化されたもの
である請求項1記載の光ディスク。
2. When curing the protective layer resin, when the viscosity of the protective layer resin immediately before irradiation with active energy rays is η (centipoise) and the degree of vacuum of the irradiation atmosphere is P (mmHg), P ≦ 120, The optical disc according to claim 1, wherein the protective layer resin is cured by an active energy ray under the condition of η 1/2 × P ≧ 120.
【請求項3】 P≦80、且つη1/2 ×P≧180なる条件
によって活性エネルギー線によって保護層樹脂が硬化さ
れたものである請求項2記載の光ディスク。
3. The optical disc according to claim 2, wherein the protective layer resin is cured by active energy rays under the condition of P ≦ 80 and η 1/2 × P ≧ 180.
【請求項4】 保護層に用いられる活性エネルギー線硬
化樹脂の粘度ηが50センチポイズ以上である請求項2ま
たは3記載の光ディスク。
4. The optical disk according to claim 2, wherein the active energy ray-curable resin used for the protective layer has a viscosity η of 50 centipoise or more.
【請求項5】 基板の両面又は片面にラジカル重合型活
性エネルギー線硬化樹脂よりなる保護層を有し、読み出
し、記録、消去のうち1つ以上できる光ディスクの製造
方法であって、該保護層を減圧条件下で活性エネルギー
線によって硬化することを特徴とする光ディスクの製造
方法。
5. A method for producing an optical disc, comprising a protective layer made of a radical polymerization type active energy ray-curable resin on both sides or one side of a substrate and capable of performing one or more of reading, recording and erasing. A method for manufacturing an optical disk, which comprises curing with active energy rays under a reduced pressure condition.
【請求項6】 保護層樹脂を硬化するに際し、活性エネ
ルギー線の照射直前の保護層樹脂の粘度をη(センチポ
イズ)とし、照射雰囲気の真空度をP(mmHg)とした
時、P≦120 、且つη1/2 ×P≧120なる条件によって
活性エネルギー線によって保護層樹脂を硬化する請求項
5記載の光ディスクの製造方法。
6. When curing the protective layer resin, when the viscosity of the protective layer resin immediately before irradiation with active energy rays is η (centipoise) and the degree of vacuum of the irradiation atmosphere is P (mmHg), P ≦ 120, The method for producing an optical disk according to claim 5, wherein the protective layer resin is cured with an active energy ray under the condition of η 1/2 × P ≧ 120.
【請求項7】 P≦80、且つη1/2 ×P≧180なる条件
によって活性エネルギー線によって保護層樹脂を硬化す
る請求項6記載の光ディスクの製造方法。
7. The method of manufacturing an optical disk according to claim 6, wherein the protective layer resin is cured by active energy rays under the condition of P ≦ 80 and η 1/2 × P ≧ 180.
【請求項8】 保護層に用いられる活性エネルギー線硬
化樹脂の粘度ηが50センチポイズ以上である請求項6ま
たは7記載の光ディスクの製造方法。
8. The method for producing an optical disc according to claim 6, wherein the active energy ray-curable resin used for the protective layer has a viscosity η of 50 centipoise or more.
JP01153993A 1993-01-27 1993-01-27 Optical disc manufacturing method Expired - Fee Related JP3229686B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01153993A JP3229686B2 (en) 1993-01-27 1993-01-27 Optical disc manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01153993A JP3229686B2 (en) 1993-01-27 1993-01-27 Optical disc manufacturing method

Publications (2)

Publication Number Publication Date
JPH06223410A true JPH06223410A (en) 1994-08-12
JP3229686B2 JP3229686B2 (en) 2001-11-19

Family

ID=11780773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01153993A Expired - Fee Related JP3229686B2 (en) 1993-01-27 1993-01-27 Optical disc manufacturing method

Country Status (1)

Country Link
JP (1) JP3229686B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010069012A (en) * 2000-01-11 2001-07-23 구자홍 optical disk and method for protecting scratch of the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010069012A (en) * 2000-01-11 2001-07-23 구자홍 optical disk and method for protecting scratch of the same

Also Published As

Publication number Publication date
JP3229686B2 (en) 2001-11-19

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