JPH0620931Y2 - 滑り制限差動装置 - Google Patents
滑り制限差動装置Info
- Publication number
- JPH0620931Y2 JPH0620931Y2 JP3506589U JP3506589U JPH0620931Y2 JP H0620931 Y2 JPH0620931 Y2 JP H0620931Y2 JP 3506589 U JP3506589 U JP 3506589U JP 3506589 U JP3506589 U JP 3506589U JP H0620931 Y2 JPH0620931 Y2 JP H0620931Y2
- Authority
- JP
- Japan
- Prior art keywords
- gear
- clutch plate
- cam portion
- drive gear
- drive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000000694 effects Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 1
Landscapes
- Retarders (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP3506589U JPH0620931Y2 (ja) | 1989-03-28 | 1989-03-28 | 滑り制限差動装置 | 
| DE69013037T DE69013037T2 (de) | 1989-03-28 | 1990-03-26 | Schlupfbegrenztes Differential. | 
| US07/498,844 US5037362A (en) | 1989-03-28 | 1990-03-26 | Limited slip differential | 
| EP90303197A EP0390466B1 (en) | 1989-03-28 | 1990-03-26 | Limited slip deferential | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP3506589U JPH0620931Y2 (ja) | 1989-03-28 | 1989-03-28 | 滑り制限差動装置 | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPH02125236U JPH02125236U (cs) | 1990-10-16 | 
| JPH0620931Y2 true JPH0620931Y2 (ja) | 1994-06-01 | 
Family
ID=31540099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP3506589U Expired - Lifetime JPH0620931Y2 (ja) | 1989-03-28 | 1989-03-28 | 滑り制限差動装置 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPH0620931Y2 (cs) | 
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US8916315B2 (en) | 2009-08-26 | 2014-12-23 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography | 
| US9164372B2 (en) | 2009-08-26 | 2015-10-20 | D2S, Inc. | Method and system for forming non-manhattan patterns using variable shaped beam lithography | 
| US9268214B2 (en) | 2008-09-01 | 2016-02-23 | D2S, Inc. | Method for forming circular patterns on a surface | 
| US9274412B2 (en) | 2008-09-01 | 2016-03-01 | D2S, Inc. | Method and system for design of a reticle to be manufactured using variable shaped beam lithography | 
| US9323140B2 (en) | 2008-09-01 | 2016-04-26 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography | 
| US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography | 
| US9372391B2 (en) | 2008-09-01 | 2016-06-21 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage | 
| US9400857B2 (en) | 2011-09-19 | 2016-07-26 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography | 
| US9448473B2 (en) | 2009-08-26 | 2016-09-20 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography | 
| US9465297B2 (en) | 2011-06-25 | 2016-10-11 | D2S, Inc. | Method and system for forming patterns with charged particle beam lithography | 
- 
        1989
        - 1989-03-28 JP JP3506589U patent/JPH0620931Y2/ja not_active Expired - Lifetime
 
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US9268214B2 (en) | 2008-09-01 | 2016-02-23 | D2S, Inc. | Method for forming circular patterns on a surface | 
| US9274412B2 (en) | 2008-09-01 | 2016-03-01 | D2S, Inc. | Method and system for design of a reticle to be manufactured using variable shaped beam lithography | 
| US9323140B2 (en) | 2008-09-01 | 2016-04-26 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography | 
| US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography | 
| US9372391B2 (en) | 2008-09-01 | 2016-06-21 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage | 
| US8916315B2 (en) | 2009-08-26 | 2014-12-23 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography | 
| US9164372B2 (en) | 2009-08-26 | 2015-10-20 | D2S, Inc. | Method and system for forming non-manhattan patterns using variable shaped beam lithography | 
| US9448473B2 (en) | 2009-08-26 | 2016-09-20 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography | 
| US9465297B2 (en) | 2011-06-25 | 2016-10-11 | D2S, Inc. | Method and system for forming patterns with charged particle beam lithography | 
| US9400857B2 (en) | 2011-09-19 | 2016-07-26 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography | 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPH02125236U (cs) | 1990-10-16 | 
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