JPH06199522A - Production of indium oxide-tin oxide powder - Google Patents
Production of indium oxide-tin oxide powderInfo
- Publication number
- JPH06199522A JPH06199522A JP4360973A JP36097392A JPH06199522A JP H06199522 A JPH06199522 A JP H06199522A JP 4360973 A JP4360973 A JP 4360973A JP 36097392 A JP36097392 A JP 36097392A JP H06199522 A JPH06199522 A JP H06199522A
- Authority
- JP
- Japan
- Prior art keywords
- indium
- ito
- tin
- powder
- precipitate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、ＩＴＯ膜（Indium-T
in Oxide膜）を始めとした酸化インジウム系表示材料等
の製造原料として好適な“酸化インジウム−酸化スズ粉
末（酸化インジウム粉末と酸化スズ粉末との混合粉末
で、 以降はＩＴＯ粉末と記す）”の製造方法に関するも
のである。This invention relates to an ITO film (Indium-T
Indium oxide-tin oxide powder (a mixed powder of indium oxide powder and tin oxide powder, hereinafter referred to as ITO powder), which is suitable as a manufacturing raw material for indium oxide-based display materials such as in oxide film) The present invention relates to a manufacturing method.
【０００２】[0002]
【従来技術とその課題】これまで、亜鉛鉱中に極く微量
含まれていて副産物として回収されていたインジウムの
興味深い特性が次第に明らかになるにつれ、その用途に
関する多くの提案がなされてきたが、近年、インジウム
酸化物、特に“ＩＴＯ”と呼ばれる“Snを含んだインジ
ウム酸化物(In2Ｏ3-SnＯ2)”の薄膜が有する高い導電性
や透明性に注目が集まり、液晶表示装置，薄膜エレクト
ロルミネッセンス表示装置，放射線検出素子，端末機器
の透明タブレット等の多岐にわたる用途が開かれた。2. Description of the Related Art As the interesting characteristics of indium, which was contained in zinc ore in an extremely small amount and was recovered as a by-product, have been gradually revealed, many proposals have been made for its use. In recent years, attention has been focused on the high conductivity and transparency of a thin film of indium oxide, particularly “indium oxide containing Sn (In 2 O 3 —SnO 2 )” called “ITO”. A wide variety of applications such as electroluminescence display devices, radiation detectors, and transparent tablets for terminal equipment were opened.
【０００３】ところで、上述のような装置・機器類の製
造原料として準備される酸化インジウム粉末や酸化スズ
粉末は、従来、図３に示す如きそれぞれの工程に従って
製造されている。By the way, the indium oxide powder and the tin oxide powder prepared as raw materials for manufacturing the above-mentioned devices / equipment are conventionally manufactured according to the respective steps shown in FIG.
【０００４】即ち、酸化インジウム粉末の場合は、まず
第１段階として、金属インジウムを硝酸で溶解し、これ
をアンモニア水で中和して水酸化インジウムとして沈降
させる。そして、この沈積物（水酸化インジウム）をろ
過，洗浄，乾燥する。次に、第２段階として、得られた
水酸化インジウムを焙焼し、酸化インジウム粉末とす
る。That is, in the case of indium oxide powder, as a first step, metallic indium is dissolved with nitric acid, and this is neutralized with aqueous ammonia to precipitate as indium hydroxide. Then, this deposit (indium hydroxide) is filtered, washed and dried. Next, as a second step, the obtained indium hydroxide is roasted to obtain indium oxide powder.
【０００５】また、酸化スズ粉末の場合には、第１段階
として金属スズを硝酸で溶解し、これをメタスズ酸とし
て沈降させる。そして、この沈積物（メタスズ酸）をろ
過，洗浄，乾燥し、第２段階として、得られたメタスズ
酸を焙焼し酸化スズ粉末とする。In the case of tin oxide powder, metallic tin is dissolved in nitric acid and precipitated as metastannic acid in the first step. Then, this deposit (metastanic acid) is filtered, washed and dried, and as a second step, the obtained metastannic acid is roasted to form tin oxide powder.
【０００６】なお、このようにして製造された酸化イン
ジウム粉末並びに酸化スズ粉末は、両者を混合してスパ
ッタリングタ−ゲット等に成形した上で、薄膜を形成す
るためにスパッタリング等の成膜素材として用いられる
ことが多い。The indium oxide powder and the tin oxide powder thus produced are mixed as a sputtering target or the like to form a thin film after they are mixed to form a sputtering target or the like. Often used.
【０００７】しかしながら、酸化インジウム粉末や酸化
スズ粉末の製造に係る上記方法には次のような問題が指
摘された。 a) 得られる酸化物粉末は諸特性（平均粒径，見掛密度
等）のバラツキが大きく、これがＩＴＯ系の表示材料等
の“品質バラツキの低減”或いは“高品質化”の阻害要
因となっている。 b) 製造条件（液温，反応速度等）を一定に制御するこ
とが必ずしも容易でなく、これを安定させるために設備
コストが上昇する。 c) 従来とは特性の異なる粉末を要求された場合に、こ
の要求への柔軟な対応ができない。 d) 製造装置が比較的大掛かりとなり、そのため製造条
件を一定に制御しようとするとかなりの労力を要する
上、増産への対応が必ずしも容易とは言えない。 e) 溶解廃液（例えば硝酸アンモニウム）がその都度発
生するのでその処理が必要であり、これがランニングコ
ストを高める。However, the following problems have been pointed out in the above-mentioned method for producing indium oxide powder and tin oxide powder. a) The obtained oxide powder has a large variation in various characteristics (average particle size, apparent density, etc.), which is an obstacle to “reduction of quality variation” or “high quality” of ITO display materials. ing. b) It is not always easy to control manufacturing conditions (liquid temperature, reaction rate, etc.) at a constant level, and equipment costs increase to stabilize these conditions. c) When powders with different characteristics from the conventional ones are requested, we cannot flexibly respond to this request. d) Since the manufacturing equipment is relatively large, it takes considerable effort to control the manufacturing conditions to a constant level, and it is not always easy to deal with the increase in production. e) Dissolved waste liquid (for example, ammonium nitrate) is generated each time and needs to be treated, which increases running costs.
【０００８】このようなことから、本発明が目的とした
のは、上記諸問題を解消し、表示材料の原料等としても
十分に満足できる優れた特性を備えた酸化インジウム粉
末，酸化スズ粉末を、製造性良く安定に、かつコスト安
く提供できる手立てを確立することであった。Therefore, the object of the present invention is to solve the above problems and to provide an indium oxide powder and a tin oxide powder having excellent characteristics which are sufficiently satisfactory as a raw material of a display material. The goal was to establish a method that can be provided with good productivity, stability, and low cost.
【０００９】[0009]
【課題を解決するための手段】そこで、本発明者等は上
記目的を達成すべく様々な観点から研究を行ったとこ
ろ、次のような知見を得ることができた。Therefore, the inventors of the present invention have conducted the research from various viewpoints in order to achieve the above object, and have been able to obtain the following findings.
【００１０】インジウムやスズの酸化物粉末を製造する
に当って、その第１段階として従来の如き「溶解沈澱
法」ではなく「電解法」を採用し、しかもその際にイン
ジウムとスズを別個の陽極として同時に電解処理する
と、比較的低い設備費やランニングコストの下で安定し
た条件にて“水酸化インジウム”と“メタスズ酸”の混
合沈積物を一工程で製造することが可能となる上、この
混合沈積物をか焼することによって非常に幅広い領域の
諸特性（平均粒径，見掛密度等）を有したＩＴＯ粉末
（酸化インジウム粉末と酸化スズ粉末との混合粉末）を
安定して得ることができ、しかも電解条件の選択によっ
てこれら諸特性をきめ細かくコントロ−ルすることも可
能である。In the production of indium or tin oxide powder, the "electrolysis method" is adopted as the first step, instead of the conventional "dissolution precipitation method", and at the same time, indium and tin are separated. Simultaneous electrolytic treatment as the anode makes it possible to produce a mixed deposit of "indium hydroxide" and "metasunic acid" in one step under stable conditions under relatively low equipment costs and running costs. By calcining this mixed deposit, ITO powder (mixed powder of indium oxide powder and tin oxide powder) having various characteristics (average particle size, apparent density, etc.) in a very wide range can be stably obtained. Moreover, it is possible to finely control these various characteristics by selecting the electrolysis conditions.
【００１１】本発明は、上記知見事項等に基づいてなさ
れたものであり、「インジウムとスズを別個の陽極とし
て同時に電解し、 これによって得た水酸化インジウムと
メタスズ酸の混合沈積物をか焼することによって、 平均
粒径や見掛密度等の特性バラツキの小さいＩＴＯ粉末を
安定かつ低コストで、 しかも特性コントロ−ル容易に製
造し得るようにした点」に大きな特徴を有している。The present invention has been made on the basis of the above findings and the like. "The indium and tin are simultaneously electrolyzed as separate anodes, and the mixed deposit of indium hydroxide and metastannic acid thus obtained is calcined. By doing so, it is possible to stably manufacture ITO powder having a small variation in characteristics such as average particle diameter and apparent density, at low cost, and to easily manufacture a characteristic control.
【００１２】ところで、上述したように、本発明に係る
ＩＴＯ粉末の製造方法では、従来とは異なって、まず電
解液中で金属インジウム及び金属スズを陽極として電解
することにより水酸化インジウムとメタスズ酸を同時に
析出させ、次いでこの混合沈積物をか焼（焙焼）すると
いう工程が採られるが、これらの金属を陽極電解する際
に適用される電解液については特に指定されるものでは
なく、硝酸アンモニウム，硫酸アンモニウム，その他の
電解質等の何れを用いても良いものの、コストや製品の
純度維持の面から硝酸アンモニウム水溶液が好ましいと
言える。By the way, as described above, in the method for producing ITO powder according to the present invention, unlike the conventional method, first, indium hydroxide and metastannic acid are electrolyzed in the electrolytic solution by using metal indium and metal tin as anodes. Is simultaneously deposited, and then the mixed deposit is calcined (roasted), but the electrolytic solution applied when anodic electrolyzing these metals is not specified, and ammonium nitrate is not specified. Although ammonium sulfate or other electrolytes may be used, it can be said that the ammonium nitrate aqueous solution is preferable from the viewpoint of cost and product purity.
【００１３】なお、水酸化インジウムとメタスズ酸を同
時に析出させるための“電解法”としては、通常のいわ
ゆる平波による電解法，周期的反転電流による電解法
（ＰＲ電解法）の何れを採用しても良い。そして、水酸
化インジウムとメタスズ酸を析出させる際の電解条件を
選択することで、これをか焼して得られるＩＴＯ粉末の
平均粒径，比表面積又は見掛密度等の制御が可能であ
り、これらの調整は、ＩＴＯ系の表示材料等の原料とし
て用いた場合における製品品質の著しい改善に結びつ
く。As the "electrolysis method" for simultaneously depositing indium hydroxide and metastannic acid, either of the ordinary so-called flat wave electrolysis method and the periodic reversal current electrolysis method (PR electrolysis method) is adopted. May be. Then, by selecting the electrolysis conditions for precipitating indium hydroxide and metastannic acid, it is possible to control the average particle size, specific surface area or apparent density of the ITO powder obtained by calcining this. These adjustments lead to a marked improvement in product quality when used as a raw material for an ITO-based display material or the like.
【００１４】図１は、この電解法を取り入れた本発明に
係る“ＩＴＯ粉末の製造工程例”を示している。ここ
で、図１に例示される工程でＩＴＯ粉末をより安定に製
造するには、好ましくはか焼に供する“水酸化インジウ
ムとメタスズ酸の混合沈積物”を得るための“電解”
を、ＮＨ4 ＮＯ3 濃度が 0.2〜５mol/L(リットル) 、ｐＨが
４〜9.5 、そして浴温が０〜５０℃の硝酸アンモニウム
水溶液中で実施し、その時の電流密度を１００〜１８０
０Ａ／ｍ2 の範囲に制御するのが良い。FIG. 1 shows an "ITO powder manufacturing process example" according to the present invention, which incorporates this electrolysis method. Here, in order to produce the ITO powder more stably in the process illustrated in FIG. 1, preferably, "electrolysis" for obtaining "a mixed deposit of indium hydroxide and metastannic acid" to be subjected to calcination.
Was carried out in an ammonium nitrate aqueous solution having a NH 4 NO 3 concentration of 0.2 to 5 mol / L (liter), a pH of 4 to 9.5, and a bath temperature of 0 to 50 ° C., and the current density at that time was 100 to 180.
It is better to control in the range of 0 A / m 2 .
【００１５】つまり、電解浴（硝酸アンモニウム水溶
液）のＮＨ4 ＮＯ3 濃度が 0.2mol/Lを下回ると電流効
率低下又は電力原単位上昇を招く恐れがあり、また５mo
l/L を超えると薬品消費量の増大が無視できなくなる。
そして、浴のｐＨが４を下回ると沈積物が微細化して固
液分離困難となり、一方、9.5 を上回る浴の取扱いは安
全上もしくは環境防災上好ましくないので、これを避け
るのが通例である。That is, if the concentration of NH 4 NO 3 in the electrolytic bath (aqueous solution of ammonium nitrate) is lower than 0.2 mol / L, the current efficiency may be lowered or the power consumption may be increased.
If it exceeds l / L, the increase in chemical consumption cannot be ignored.
When the pH of the bath is lower than 4, the precipitate becomes finer and solid-liquid separation becomes difficult. On the other hand, handling the bath above 9.5 is not preferable for safety or environmental disaster prevention, so it is customary to avoid this.
【００１６】浴温については、０℃未満に調整すること
は冷却コストの点で不利となり、一方、５０℃を超える
温度に維持しようとするとそのための加熱コストが無視
できなくなる上、特にＮＨ4 ＮＯ3 の場合にはアンモニ
ア蒸気発生に対応した環境対策が必要となる。更に、電
流密度については、１００Ａ／ｍ2 を下回ると生産性が
悪くなり、一方、１８００Ａ／ｍ2 を上回る場合には槽
電圧の上昇が著しくなって経済的に不利になる。Regarding the bath temperature, adjusting it to less than 0 ° C. is disadvantageous in terms of cooling cost. On the other hand, if it is attempted to maintain the temperature above 50 ° C., the heating cost therefor cannot be ignored, and especially NH 4 NO. In the case of 3 , environmental measures corresponding to the generation of ammonia vapor are required. Further, with respect to the current density, if the current density is less than 100 A / m 2 , the productivity becomes poor, while if it exceeds 1800 A / m 2 , the cell voltage rises significantly, which is economically disadvantageous.
【００１７】さて、本発明に係る「ＩＴＯ粉末の製造方
法」によると次のような利点を享受することができ、従
ってその産業上の寄与は極めて大きいと言える。 1) 得られるＩＴＯ粉末の“諸特性（平均粒径，見掛密
度等）の幅”が広く、これらを電解条件の選択によって
コントロ−ルできる。 2) か焼に供する中間原料たる水酸化インジウムとメタ
スズ酸の混合沈積物の製造が電解法にて同時に行われる
ので連続方式が採用でき、バッチ方式の従来法に比べて
品質管理が容易で、品質そのものも安定する。 3) 電解条件の選択により最終的に得られるＩＴＯ粉末
の諸特性を微妙にコントロ−ルできるため、これを使用
するＩＴＯ系の表示材料等の高品質化や品質バラツキの
低減が達成できる。 4) 個別に得た酸化物（酸化インジウム，酸化スズ）同
士を混合してＩＴＯ粉末とする従来法に比べ、共電解法
で得た混合沈積物をか焼して実質的な混合工程無しにＩ
ＴＯ粉末とする本発明法では、酸化物の混合がより均一
となって得られるＩＴＯ粉末は非常に均質である。 5) いわゆる“クロ−ズドシステム”化ができるので、
中和の都度に硝酸の廃液が発生していた従来法に比べて
ランニングコストの大幅な低減が達成される。 6) 製造装置がコンパクトであるので、イニシャルコス
ト（建設費）も安価となり増産への対応がしやすい。By the way, according to the "method for producing ITO powder" of the present invention, the following advantages can be enjoyed, and it can be said that its industrial contribution is extremely large. 1) The obtained ITO powder has a wide range of "characteristics (average particle size, apparent density, etc.)", and these can be controlled by selecting the electrolysis conditions. 2) Since a mixed deposit of indium hydroxide and metastannic acid, which is an intermediate raw material to be subjected to calcination, is simultaneously produced by an electrolytic method, a continuous method can be adopted, and quality control is easier than in a batch method, which is a conventional method. The quality itself is stable. 3) Since various properties of the finally obtained ITO powder can be delicately controlled by selecting the electrolysis conditions, it is possible to improve the quality of the ITO-based display material using the same and reduce the quality variation. 4) Compared to the conventional method in which individually obtained oxides (indium oxide, tin oxide) are mixed together to form ITO powder, the mixed deposit obtained by the co-electrolysis method is calcined without a substantial mixing step. I
In the method of the present invention in which TO powder is used, the ITO powder obtained by mixing the oxides more uniformly is obtained. 5) Since a so-called "closed system" can be created,
A significant reduction in running cost is achieved compared to the conventional method in which a nitric acid waste liquid is generated each time neutralization is performed. 6) Since the manufacturing equipment is compact, the initial cost (construction cost) is low and it is easy to deal with increased production.
【００１８】なお、本発明に係るＩＴＯ粉末は、これを
前述したＩＴＯスパッタリングタ−ゲットに成形してＩ
ＴＯ膜の形成に用いた場合に特に優れた結果を得ること
ができるが、ＩＴＯ粉末からＩＴＯタ−ゲットを製造す
るには一般に図２で示した工程が採られる。The ITO powder according to the present invention is molded into the ITO sputtering target described above and
Particularly excellent results can be obtained when it is used for forming a TO film, but the process shown in FIG. 2 is generally used to manufacture an ITO target from an ITO powder.
【００１９】続いて、本発明を実施例によって更に具体
的に説明する。Next, the present invention will be described more specifically by way of examples.
〈実施例１〉１０℃の硝酸アンモニウム水溶液（ＮＨ4
ＮＯ3 濃度：0.5mol/L，ｐＨ：８）中において、それぞ
れ表面積の異なる金属インジウムと金属スズとを陽極と
し、陰極電流密度を何れも６００Ａ／ｍ2 として、ＰＲ
式のパルス通電により同時に電解を行った。そして、電
解槽底の沈積物をろ過，洗浄及び乾燥し、水酸化インジ
ウムとメタスズ酸の混合沈積物を得た。次に、これを１
１００℃で焙焼し、平均粒径２０μｍ，見掛密度1.7g/c
m3のＩＴＯ粉末を得た。<Example 1> Ammonium nitrate aqueous solution (NH 4
In a NO 3 concentration: 0.5 mol / L, pH: 8), metal indium and metal tin having different surface areas were used as anodes, and the cathode current density was 600 A / m 2 for PR.
Electrolysis was carried out at the same time by pulsed current application. Then, the deposit on the bottom of the electrolytic cell was filtered, washed and dried to obtain a mixed deposit of indium hydroxide and metastannic acid. Then this one
Roasted at 100 ℃, average particle size 20μm, apparent density 1.7g / c
m 3 of ITO powder was obtained.
【００２０】次いで、得られた上記ＩＴＯ粉末を原料と
し、コ−ルドプレス大気焼結法によりSnＯ2 含有割合が
１０wt％のＩＴＯスパッタリングタ−ゲットを製造した
ところ、焼結体の密度は6.70ｇ/cm3であった。Then, using the obtained ITO powder as a raw material, an ITO sputtering target having a SnO 2 content of 10 wt% was produced by a cold press air sintering method. The density of the sintered body was 6.70 g / It was cm 3 .
【００２１】更に、このＩＴＯタ−ゲットをスパッタし
て得られた透明導電膜のシ−ト抵抗や透過率等の諸特性
を調査したところ、ＬＣＤ（液晶）用としても十分に使
用可能な満足できる結果を示すことが確認された。Further, various characteristics such as sheet resistance and transmittance of a transparent conductive film obtained by sputtering this ITO target were investigated, and it was found that it was satisfactory enough for LCD (liquid crystal) use. It was confirmed to show the possible results.
【００２２】〈実施例２〉電解浴として浴温：５０℃，
ＮＨ4 ＮＯ3 濃度：1.0mol/L，ｐＨ：６の硝酸アンモニ
ウム水溶液を使用した以外は、実施例１の場合と同一条
件でＰＲ方式のパルス電解を行い、電解槽底の沈積物を
ろ過，洗浄及び乾燥して水酸化インジウムとメタスズ酸
の混合沈積物を得た。次に、これを１１００℃で焙焼し
たところ、粒径が揃った見掛密度の高いＩＴＯ粉末が得
られた。<Embodiment 2> Bath temperature: 50 ° C. as an electrolytic bath,
PR method pulse electrolysis was performed under the same conditions as in Example 1 except that an ammonium nitrate aqueous solution having an NH 4 NO 3 concentration of 1.0 mol / L and a pH of 6 was used, and the deposit on the bottom of the electrolytic cell was filtered and washed. And dried to obtain a mixed deposit of indium hydroxide and metastannic acid. Next, when this was roasted at 1100 ° C., ITO powder having a uniform apparent particle size and high apparent density was obtained.
【００２３】次いで、得られたＩＴＯ粉末を使用し、実
施例１におけると同様にSnＯ2 含有割合が１０wt％のＩ
ＴＯスパッタリングタ−ゲットを製造したところ、焼結
体の密度は4.78ｇ/cm3であった。Then, using the obtained ITO powder, as in Example 1, the SnO 2 content was 10 wt% I.
When a TO sputtering target was manufactured, the density of the sintered body was 4.78 g / cm 3 .
【００２４】このＩＴＯタ−ゲットをスパッタし、得ら
れた透明導電膜のシ−ト抵抗や透過率等の諸特性を調査
したところ、ＬＣＤ用としても十分に使用可能な満足で
きる結果を示すことが確認された。When this ITO target was sputtered and various characteristics such as sheet resistance and transmittance of the obtained transparent conductive film were investigated, it was shown that it can be used satisfactorily for LCD. Was confirmed.
【００２５】[0025]
【効果の総括】以上に説明した如く、この発明によれ
ば、例えばＩＴＯ膜形成用スパッタリングタ−ゲットの
原材料等としても十分に満足できるＩＴＯ粉末を、要求
特性に幅広く的確に対応しつつ低コストで提供すること
が可能となるなど、産業上有用な効果がもたらされる。[Summary of Effects] As described above, according to the present invention, for example, ITO powder, which can be sufficiently satisfied as a raw material of a sputtering target for forming an ITO film, can be produced at a low cost while widely meeting the required characteristics. It will be possible to provide in the industry, which brings useful effects in industry.
【図１】本発明に係る“ＩＴＯ粉末の製造工程”の概要
説明図である。FIG. 1 is a schematic explanatory diagram of “a manufacturing process of ITO powder” according to the present invention.
【図２】ＩＴＯ粉末からＩＴＯスパッタリングタ−ゲッ
トを製造する工程の説明図である。FIG. 2 is an explanatory diagram of a process of manufacturing an ITO sputtering target from ITO powder.
【図３】従来の酸化インジウム粉末及び酸化スズ粉末の
製造工程に関する概要説明図である。FIG. 3 is a schematic explanatory diagram related to a conventional manufacturing process of indium oxide powder and tin oxide powder.
Claims (2)
時に電解し、これによって得た水酸化インジウムとメタ
スズ酸の混合沈積物をか焼することを特徴とする、酸化
インジウム−酸化スズ粉末の製造方法。1. A method for producing an indium oxide-tin oxide powder, which comprises simultaneously electrolyzing indium and tin as separate anodes and calcining a mixed deposit of indium hydroxide and metastannic acid obtained thereby. .
インジウムとスズの電解を行うことを特徴とする、請求
項１に記載の酸化インジウム−酸化スズ粉末の製造方
法。2. The method for producing indium oxide-tin oxide powder according to claim 1, wherein electrolysis of indium and tin is performed using an aqueous ammonium nitrate solution as an electrolytic solution.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4360973A JP2736492B2 (en) | 1992-12-28 | 1992-12-28 | Method for producing indium oxide-tin oxide powder |
| US08/164,125 US5417816A (en) | 1992-12-09 | 1993-12-07 | Process for preparation of indium oxide-tin oxide powder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4360973A JP2736492B2 (en) | 1992-12-28 | 1992-12-28 | Method for producing indium oxide-tin oxide powder |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06199522A true JPH06199522A (en) | 1994-07-19 |
| JP2736492B2 JP2736492B2 (en) | 1998-04-02 |
Family
ID=18471665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4360973A Expired - Lifetime JP2736492B2 (en) | 1992-12-09 | 1992-12-28 | Method for producing indium oxide-tin oxide powder |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2736492B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102634816A (en) * | 2011-02-14 | 2012-08-15 | 李小毛 | Preparation method of nanometer tin indium oxide powder |
| KR101324130B1 (en) * | 2007-01-10 | 2013-11-01 | 삼성코닝정밀소재 주식회사 | Indium tin oxide powder and manufacturing method of producing the same |
| CN105264119A (en) * | 2013-05-27 | 2016-01-20 | 住友金属矿山株式会社 | Method for producing indium hydroxide powder, method for producing indium oxide powder, and sputtering target |
| CN105926022A (en) * | 2011-07-26 | 2016-09-07 | 吉坤日矿日石金属株式会社 | Electrolysis producing device and method of indium hydroxide or compound containing indium hydroxide |
| CN109536982A (en) * | 2018-12-27 | 2019-03-29 | 广东先导稀材股份有限公司 | Preparation method of nano tin dioxide |
-
1992
- 1992-12-28 JP JP4360973A patent/JP2736492B2/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101324130B1 (en) * | 2007-01-10 | 2013-11-01 | 삼성코닝정밀소재 주식회사 | Indium tin oxide powder and manufacturing method of producing the same |
| CN102634816A (en) * | 2011-02-14 | 2012-08-15 | 李小毛 | Preparation method of nanometer tin indium oxide powder |
| CN105926022A (en) * | 2011-07-26 | 2016-09-07 | 吉坤日矿日石金属株式会社 | Electrolysis producing device and method of indium hydroxide or compound containing indium hydroxide |
| CN105926022B (en) * | 2011-07-26 | 2018-03-23 | 吉坤日矿日石金属株式会社 | The electrolysis manufacture device and manufacture method of indium hydroxide or compound containing indium hydroxide |
| CN105264119A (en) * | 2013-05-27 | 2016-01-20 | 住友金属矿山株式会社 | Method for producing indium hydroxide powder, method for producing indium oxide powder, and sputtering target |
| CN105264119B (en) * | 2013-05-27 | 2017-07-04 | 住友金属矿山株式会社 | The manufacture method of indium hydroxide powder and the manufacture method of indium oxide powder and sputtering target material |
| CN109536982A (en) * | 2018-12-27 | 2019-03-29 | 广东先导稀材股份有限公司 | Preparation method of nano tin dioxide |
| CN109536982B (en) * | 2018-12-27 | 2021-04-13 | 广东先导稀材股份有限公司 | Preparation method of nano tin dioxide |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2736492B2 (en) | 1998-04-02 |
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