JP3173440B2 - Method for producing tin oxide powder - Google Patents

Method for producing tin oxide powder

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Publication number
JP3173440B2
JP3173440B2 JP29145597A JP29145597A JP3173440B2 JP 3173440 B2 JP3173440 B2 JP 3173440B2 JP 29145597 A JP29145597 A JP 29145597A JP 29145597 A JP29145597 A JP 29145597A JP 3173440 B2 JP3173440 B2 JP 3173440B2
Authority
JP
Japan
Prior art keywords
tin oxide
oxide powder
tin
particle size
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP29145597A
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Japanese (ja)
Other versions
JPH11130432A (en
Inventor
裕美 持田
道広 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Priority to JP29145597A priority Critical patent/JP3173440B2/en
Publication of JPH11130432A publication Critical patent/JPH11130432A/en
Application granted granted Critical
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、高密度ITOタ
−ゲット用酸化錫粉末の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing tin oxide powder for high-density ITO targets.

【0002】[0002]

【従来の技術】高密度ITOタ−ゲット用酸化錫粉末と
しては、特開平6ー199523号「酸化スズ粉末の製
造方法」に、まず第1段階として、金属スズを硝酸で溶
解して生じた沈積物(水酸化錫)を、ろ過、洗浄、乾燥
する。次に第2段階として、得られた水酸化錫を仮焼
し、酸化スズ粉末を得、この粉末と酸化インジュウムを
混合し所定の形状に加圧成形後焼結したスパッタリング
タ−ゲットを用いて、スパッタリングによる薄膜の形成
に用いる技術と、錫を陽極として、硝酸アンモニウム水
溶液を電解液として錫の電解を行い、得られた水酸化錫
をか焼することにより酸化錫粉末を得、この粉末を用い
て、上記と同様にして薄膜の形成に用いる技術が記載さ
れている。
2. Description of the Related Art Tin oxide powder for high-density ITO targets is produced by dissolving metallic tin with nitric acid as a first step in Japanese Patent Application Laid-Open No. Hei 6-199523, "Method for producing tin oxide powder". The deposit (tin hydroxide) is filtered, washed and dried. Next, as a second step, the obtained tin hydroxide is calcined to obtain a tin oxide powder, and this powder and indium oxide are mixed, pressed into a predetermined shape, sintered using a sputtering target. A technique used for forming a thin film by sputtering, tin is used as an anode, an aqueous solution of ammonium nitrate is used as an electrolytic solution to perform tin electrolysis, and the obtained tin hydroxide is calcined to obtain a tin oxide powder. A technique used for forming a thin film in the same manner as described above is described.

【0003】[0003]

【発明が解決しようとする課題】しかし、近年増々、高
速スパッタリングの利用がなされ、このスパッタリング
中での安定した放電とこれに伴う良質のITO膜の生成
が必要とされ、そのためには、スパッタリングタ−ゲッ
ト用として使用される焼結体は、高密度が要求される。
そのため、焼結体形成に利用される原料粉末としての酸
化錫粉末は、焼結体の高密度化に必要な特性を有してい
なければならない。 しかし、上述せる従来技術により
得られた中和法による酸化錫粉末は、粒度が不揃で、粒
度分布が広がっているため、焼結体の密度向上が難し
い。また、近年良質のITO膜製造のための酸化インジ
ュウムの製造方法が開発され、これに伴い高特性を有す
る酸化錫粉末が要求されるようになり、本出願人は特願
平9ー58978で高特性を有する酸化錫について出願
し、一次粒子のBET比表面積2〜10m2/g、結晶
粒子径800Å以上であって二次粒子の粒子径3〜30
μm範囲の物が50重量%以上の物性を有する酸化錫と
その製造方法を開示しており、高特性を有する酸化錫の
製造が可能となった。しかしながら更に高品位の酸化錫
粉末を安価、且つ安定して得るための研究を行った結
果、酸化錫粉末物性の改良とその製造方法、及び原料と
なる金属錫の品位も問題となることが判明した。
However, in recent years, the use of high-speed sputtering has been increasingly used, and a stable discharge during this sputtering and the formation of a high-quality ITO film accompanying this are required. -High density is required for the sintered body used for the get.
Therefore, a tin oxide powder as a raw material powder used for forming a sintered body must have characteristics necessary for increasing the density of the sintered body. However, the tin oxide powder obtained by the neutralization method obtained by the above-described conventional technique has irregular particle sizes and a wide particle size distribution, and thus it is difficult to improve the density of the sintered body. Also, in recent years, a method for producing indium oxide for producing a high-quality ITO film has been developed, and accordingly, a tin oxide powder having high characteristics has been required, and the present applicant has filed a patent application No. 9-58978. Application for tin oxide having characteristics, BET specific surface area of primary particles of 2 to 10 m 2 / g, crystal particle diameter of 800 ° or more, and particle diameter of secondary particles of 3 to 30
It discloses a tin oxide having a physical property of 50% by weight or more in a range of μm and a method for producing the same, thereby enabling production of a tin oxide having high characteristics. However, as a result of conducting research to obtain more high-quality tin oxide powder at low cost and in a stable manner, it was found that the improvement of the physical properties of the tin oxide powder, the method for producing the same, and the quality of the metallic tin used as the raw material also become problems. did.

【0004】[0004]

【課題を解決するための手段】そこで、本発明者等は、
上記問題点を解決すべく鋭意研究開発に努めた結果、加
熱した硝酸アンモニウム溶液に、金属錫粉末を加え、該
溶液に硝酸を添加して、pH2以下の強酸領域中でメタ
錫酸を沈降させ、この沈降メタ錫酸を仮焼する方法によ
り得られる酸化錫粉末は、粒度分布がシャ−プで、結晶
子の大きい前記酸化錫と同様に高特性を有する粉末とな
り、上記問題点を解決するとの知見を得たのである。
Means for Solving the Problems Accordingly, the present inventors have
As a result of intensive research and development to solve the above problems, to a heated ammonium nitrate solution, add metal tin powder, add nitric acid to the solution, and precipitate metastannic acid in a strong acid region of pH 2 or less, The tin oxide powder obtained by the method of calcining the precipitated metastannic acid is a powder having sharp characteristics and high characteristics similar to the tin oxide having a large crystallite, which solves the above problem. He gained the knowledge.

【0005】本発明は、上記知見に基づいてなされたも
のであって、(1)加熱した硝酸アンモニウム溶液に、
金属錫粉末を加え、該溶液に硝酸を添加して、メタ錫酸
を沈降させ、この沈降メタ錫酸を仮焼して得る酸化錫粉
末の製造方法、(2)上記金属錫の平均粒度が3mm以
下であることを特徴とする(1)記載の酸化錫粉末の製
造方法、(3)上記酸化錫粉末の、ピーク粒径と平均粒
径の比が0.8〜2.0であることを特徴とする(1)
及び(2)に記載の酸化錫粉末の製造方法、に特徴を有
するものである。(4) 上記(1)記載のメタ錫酸の
生成沈降をpH2以下の強酸領域で行う上記(1)乃至
(3)に記載の酸化錫粉末の製造方法。
[0005] The present invention has been made based on the above findings, and (1) a heated ammonium nitrate solution
Metal tin powder is added, nitric acid is added to the solution to precipitate metastannic acid, and the precipitated metastannic acid is calcined to produce a tin oxide powder, (2) the average particle size of the metal tin is (1) The method for producing tin oxide powder according to (1), wherein the ratio between the peak particle diameter and the average particle diameter of the tin oxide powder is 0.8 to 2.0. (1)
And a method for producing a tin oxide powder according to (2). (4) The method for producing tin oxide powder according to any one of (1) to (3), wherein the formation and precipitation of metastannic acid according to (1) is performed in a strong acid region having a pH of 2 or less.

【0006】[0006]

【発明の実施の形態】以下、本発明の実施の形態につい
て、説明する。金属錫に硝酸を作用せしめると、直接酸
化して次式に示す反応により、 Sn+2HNO3=H2SnO3+NO+NO2 メタ錫酸(H2SnO3)が生成する。まず、金属錫粉末
を用意し、緩衝液として硝酸アンモニウム(NH4
3)(1〜4mol/l)溶液を用意する。緩衝液を
50℃以上に加熱後、金属錫粉末を加えて撹拌する。こ
の様にして準備した溶液に、所定量のHNO3を除々に
ゆっくりと添加する(4時間以上掛けて)。すると、上
記反応がゆっくりと進行し、除々に白色のメタ錫酸が生
成する。緩衝剤があるため、メタ錫酸は沈降性の良いも
のが出来る。次いで、メタ錫酸を500〜1100℃で
仮焼すると、粒度分布の揃った酸化錫(SnO2)粉末
が得られる。得られるSnO2粉末は、2次粒子が小さ
く、分布が従来よりシャ−プで、結晶子が大きい特徴を
有しており、このSnO2粉末を用いて、スパッタリン
グタ−ゲット用焼結体を構成すると、高密度焼結体が得
られ、高速スパッタリングにおいても、放電は安定して
おり、形成される膜も良質のものが得られる。
Embodiments of the present invention will be described below. When nitric acid is applied to metal tin, it is directly oxidized to generate Sn + 2HNO 3 = H 2 SnO 3 + NO + NO 2 metastannic acid (H 2 SnO 3 ) by the reaction shown in the following formula. First, a metal tin powder is prepared, and ammonium nitrate (NH 4 N) is used as a buffer.
An O 3 ) (1 to 4 mol / l) solution is prepared. After heating the buffer to 50 ° C. or higher, metal tin powder is added and stirred. A predetermined amount of HNO 3 is slowly added slowly (over 4 hours) to the solution thus prepared. Then, the above reaction proceeds slowly, and gradually white metastannic acid is generated. Due to the presence of the buffer, metastannic acid can be formed with good sedimentation. Next, when metastannic acid is calcined at 500 to 1100 ° C., tin oxide (SnO 2 ) powder having a uniform particle size distribution is obtained. The obtained SnO 2 powder has the characteristics that secondary particles are small, the distribution is sharper than before, and the crystallite is large. Using this SnO 2 powder, a sintered body for a sputtering target is obtained. With this configuration, a high-density sintered body can be obtained, the discharge is stable even in high-speed sputtering, and a high quality film can be obtained.

【0007】得られる酸化錫粉末としては、その粒度分
布が粉末の流動性の良否及び焼結体の密度の大小に影響
する作用をするので、比較的粒度分布範囲の狭い粒径が
揃った粉末が高性能のスパッタリング用焼結体用の粉と
しては優れており、従って、粒度分布において、各粒径
毎の分布量の最大量を示す粒径であるピーク粒径と各粒
径毎の分布量を総計し、その算術平均値である平均粒径
との比が0.8〜2.0の範囲内とすることが望まし
く、このい範囲外であると、粉末の流動性は悪く、得ら
れる焼結体の密度は、あまり大きくならない。
As the obtained tin oxide powder, the particle size distribution has an effect on the quality of the fluidity of the powder and the density of the sintered body. Is excellent as a powder for a high-performance sintered body for sputtering, and therefore, in the particle size distribution, the peak particle size, which is the particle size indicating the maximum amount of the distribution amount for each particle size, and the distribution for each particle size It is desirable that the total amount is in the range of 0.8 to 2.0 with respect to the arithmetic mean value of the average particle diameter. If the ratio is outside this range, the fluidity of the powder is poor, and The density of the sintered body obtained does not increase so much.

【0008】緩衝剤NH4NO3の濃度は、メタ錫酸の生
成に関与するが、その値が、1mol/l以下では、生
成するメタ錫酸の粒度が不揃いで粗大化し、一方その値
が、4mol/l以上では、経済的に不利なため、その
値は、1mol/l〜 4mol/lが望ましい。
The concentration of the buffer NH 4 NO 3 is involved in the formation of metastannic acid. If the value is 1 mol / l or less, the generated metastannic acid has an irregular particle size and coarsens. If it is 4 mol / l or more, it is economically disadvantageous, so its value is desirably 1 mol / l to 4 mol / l.

【0009】また、緩衝液の加熱温度が低いと反応が遅
く、生成したメタ錫酸が熟成せず沈降性の悪い粉末とな
り、その加熱温度が50℃以下では反応しないので、加
熱温度は50℃以上が望ましく、上限温度は特に限定さ
れないが70℃以上では使用すると容器等のスペックが
厳しくなり不経済となるので、温度の上限を70℃程度
とするのが望ましく、更に実用的には、60〜70℃が
望ましい。
If the heating temperature of the buffer solution is low, the reaction is slow, and the formed metastannic acid does not age and becomes a powder with poor sedimentation. If the heating temperature is lower than 50 ° C., the reaction does not proceed. The above is desirable, and the upper limit temperature is not particularly limited, but if it is used at 70 ° C. or more, the specifications of the container and the like become severe and uneconomical. Therefore, it is desirable to set the upper limit of the temperature to about 70 ° C. ~ 70 ° C is desirable.

【0010】使用する金属錫の粒度は、小さければ添加
する硝酸との接触面積が大きくなり、反応は早く進行
し、大きくなると反応の進行が遅くなり、生成物の粒度
等に影響を与えるため、平均粒度を3mmφ以下とする
が、粒度を小さくし過ぎると効果の割りに使用する金属
錫のコストが上昇し不経済となる。従って、下限値は硝
酸の添加速度と経済性を考慮して決めればよい。硝酸の
添加速度は、最終的に得られるSnO2粉末の粒度を決
める作用をするが、その値が速いと反応が速く、粉末粒
子が細かくなりすぎ、一方あまり長い時間を掛けること
は、不経済となるので、4〜10時間が望ましい。
If the particle size of the metal tin used is small, the contact area with the added nitric acid increases, and the reaction proceeds quickly. If the particle size increases, the progress of the reaction slows down, which affects the particle size of the product. The average particle size is 3 mmφ or less, but if the particle size is too small, the cost of metallic tin used for the effect increases, which is uneconomical. Therefore, the lower limit may be determined in consideration of the rate of addition of nitric acid and economy. The rate of addition of nitric acid has an effect of determining the particle size of the finally obtained SnO 2 powder, but if the value is high, the reaction is fast and the powder particles become too fine, while taking too long time is uneconomical. Therefore, 4 to 10 hours are desirable.

【0011】本発明で得られるメタ錫酸は、500〜1
100℃で仮焼することにより、粒度分布の揃った酸化
錫粉末が得られるが、より安定した良質の粉末を得るた
めには、850〜1050℃が望ましい。
The metastannic acid obtained in the present invention is 500 to 1
By calcining at 100 ° C., tin oxide powder having a uniform particle size distribution can be obtained, but in order to obtain more stable and high quality powder, 850 to 1050 ° C. is desirable.

【0012】なお、本発明では、メタ錫酸生成反応後の
液性は、pH2以下の強酸性領域とすることにより、S
n以外は液中に残留し、不純物が効率良く除去出来る。
従って、使用する金属錫の純度を低くすることが可能と
なる。例えば、4NのSnO 2を得るためには、従来は
4Nのメタル錫を使用しなければならなかったが、本発
明の方法を用いると3N程度のメタル錫を使用すること
ができる。また、pH2以上であると未反応のSnが残
留する可能性が大であり、好ましくはpH1.5以下の
範囲である。
In the present invention, after the metastannic acid formation reaction,
The liquid property is S by adjusting the pH to a strongly acidic region of 2 or less.
Those other than n remain in the liquid, and impurities can be removed efficiently.
Therefore, it is possible to reduce the purity of the metallic tin used.
Become. For example, 4N SnO TwoIn order to obtain
4N metal tin had to be used.
Use of 3N metal tin when using the method of Ming
Can be. If the pH is 2 or more, unreacted Sn remains.
With high possibility to distill, preferably at pH 1.5 or less
Range.

【0013】[0013]

【実施例】以下、本発明の実施例について、具体的に説
明する。 (実施例1)まず、平均粒径3mmの錫メタルを25g
用意し、これをNH4NO3粉末:80g、H2O:50
0mlで調整したNH4NO3溶液に投入し、60℃に昇
温保持した状態で、これに濃HNO:62mlを攪拌し
ながら、分液ロ−トから10分毎に1.7mlずつ4時
間以上かけて添加した。その後も60℃に保持した状態
で、攪拌を続け、沈殿物が生成し、溶液の白濁状態が変
わらなくなるまで行った。この間の所要時間は4hrで
あった。この後溶液を室温まで自然冷却し、濾過(1.
0mvのPTEE使用)し、水濾過洗浄を3回(約10
0cc)行い、残渣物を、105℃で乾燥し、これを軽
く粉砕した後、2分割し、1つを900℃、4hr.焼
成し、本発明の酸化錫粉末1を得た。また他の1つを1
000℃、4hr.焼成し、本発明の酸化錫粉末2を得
た。尚、硝酸添加後の攪拌時の溶液のpHは0.5であ
った。
EXAMPLES Examples of the present invention will be specifically described below. (Example 1) First, 25 g of tin metal having an average particle size of 3 mm was used.
Prepare and mix this with NH 4 NO 3 powder: 80 g, H 2 O: 50
The solution was poured into a NH 4 NO 3 solution adjusted to 0 ml, and while maintaining the temperature at 60 ° C., 62 ml of concentrated HNO was stirred and 1.7 ml every 10 minutes from the separating funnel for 4 hours. It was added over time. After that, stirring was continued while maintaining the temperature at 60 ° C. until the precipitate was formed and the cloudy state of the solution was not changed. The time required during this time was 4 hours. Thereafter, the solution was naturally cooled to room temperature, and filtered (1.
0 mv of PTEE), and water filtration and washing 3 times (about 10 times).
0 cc), and the residue was dried at 105 ° C., crushed lightly and then divided into two portions, one of which was 900 ° C., 4 hr. It was calcined to obtain tin oxide powder 1 of the present invention. And the other one
000 ° C., 4 hr. It was calcined to obtain tin oxide powder 2 of the present invention. The pH of the solution during stirring after the addition of nitric acid was 0.5.

【0014】(実施例2)平均粒径0.5mmの錫メタ
ル12gを、濃度1mol/lに調整したNH4NO3
液500mlに投入し、液温50℃に昇温維持した状態
で、濃HNO3:25 mlを分液ロートから10分毎
に0.5mlづつ添加した。その後も50℃に保持した
状態で攪拌を続け、沈殿物が生成し、溶液の白濁状態が
変わらなくなるまで行った。この間の所要時間は5hr
であった。この後溶液を室温まで自然冷却し、濾過
(1.0mvのPTEE使用)し、水濾過洗浄を3回
(約100cc)行い、残渣物を、105℃で乾燥し、
これを軽く粉砕した後、900℃、4hr.焼成し、本
発明の酸化錫粉末3を得た。なお、硝酸添加後の攪拌時
の溶液のpHは1.2であった。
(Example 2) 12 g of tin metal having an average particle size of 0.5 mm was put into 500 ml of an NH 4 NO 3 solution adjusted to a concentration of 1 mol / l, and while the temperature was maintained at 50 ° C., the concentration was increased. HNO 3 : 25 ml was added from the separatory funnel every 10 minutes in 0.5 ml portions. Thereafter, stirring was continued while maintaining the temperature at 50 ° C., and the process was continued until a precipitate was formed and the cloudy state of the solution did not change. The time required during this time is 5 hours
Met. Thereafter, the solution was naturally cooled to room temperature, filtered (using 1.0 mv of PTEE), washed with water filtration three times (about 100 cc), and the residue was dried at 105 ° C.
After crushing this lightly, 900 ° C, 4 hr. By firing, a tin oxide powder 3 of the present invention was obtained. The pH of the solution at the time of stirring after the addition of nitric acid was 1.2.

【0015】(実施例3)NH4NO3溶液の温度を80
℃以外は、実施例1と同一条件でメタ錫酸を生成させ同
じく同一条件で濾過乾燥させた後、温度900℃で4時
間焼成し本発明酸化錫粉末4を得た。
Example 3 The temperature of the NH 4 NO 3 solution was set to 80
Except for ° C, metastannic acid was formed under the same conditions as in Example 1, filtered and dried under the same conditions, and calcined at a temperature of 900 ° C for 4 hours to obtain tin oxide powder 4 of the present invention.

【0016】(比較例1)平均粒径3mmの錫メタルを
12g用意し、これをNH4NO3:80g、H2O:5
00mlで調整したNH4NO3溶液に投入し、30℃に
昇温保持した状態で、これに濃HNO3:25mlを攪
拌しながら、分液ロ−トから10分毎に0.8mlずつ
添加した。その後も30℃に保持した状態で、攪拌を続
けたが、10時間を経過しても未反応の錫メタルの残存
が確認された。
(Comparative Example 1) 12 g of tin metal having an average particle size of 3 mm was prepared, and this was 80 g of NH 4 NO 3 and 5 of H 2 O.
The solution was poured into a NH 4 NO 3 solution adjusted to 00 ml, and while maintaining the temperature at 30 ° C., 25 ml of concentrated HNO 3 was added to the solution and stirred at a rate of 0.8 ml every 10 minutes from a separating funnel. did. After that, stirring was continued while maintaining the temperature at 30 ° C., but it was confirmed that unreacted tin metal remained even after 10 hours.

【0017】(比較例2)平均粒径3mmの錫メタルを
12g用意し、これをNH4NO3:80g、H2O:5
00mlで調整したNH4NO3溶液に投入し、60℃に
昇温保持した状態で、これに濃HNO3:25mlを攪
拌しながら、分液ロ−トから5分毎に0.8mlずつ添
加した。その後も60℃に保持した状態で、攪拌を続
け、沈殿物が生成し、溶液の白濁状態が変わらなくなる
まで行った。この間の所要時間は5hrであった。この
後溶液を室温まで自然冷却し、濾過(1.0mvのPT
EE使用)し、水濾過洗浄を3回(約100cc)行
い、残渣物を、105℃で乾燥した。これを軽く粉砕し
た後、温度900℃、4hr.焼成し、比較酸化錫粉末
2を得た。
(Comparative Example 2) 12 g of tin metal having an average particle size of 3 mm was prepared, and this was 80 g of NH 4 NO 3 and 5 of H 2 O.
The solution was poured into an NH 4 NO 3 solution adjusted to 00 ml, and while keeping the temperature at 60 ° C., 25 ml of concentrated HNO 3 was added thereto, and 0.8 ml was added every 5 minutes from a separating funnel while stirring. did. After that, stirring was continued while maintaining the temperature at 60 ° C. until the precipitate was formed and the cloudy state of the solution was not changed. The required time during this period was 5 hours. Thereafter, the solution was naturally cooled to room temperature, and filtered (1.0 mv PT
EE) and water filtration washing three times (about 100 cc), and the residue was dried at 105 ° C. After crushing this lightly, the temperature was 900 ° C., 4 hr. By calcining, comparative tin oxide powder 2 was obtained.

【0018】(比較例3)平均粒径5mmの錫メタルを
12g用意し、これをNH4NO3:80g、H2O:5
00mlで調整したNH4NO3溶液に投入し、60℃に
昇温保持した状態で、これに濃HNO3:25mlを攪
拌しながら、分液ロ−トから10分毎に0.8mlずつ
添加した。その後も60℃に保持した状態で、攪拌を続
け、沈殿物が生成し、溶液の白濁状態が変わらなくなる
まで行った。この間の所要時間は6hrであった。この
後溶液を室温まで自然冷却し、濾過(1.0mvのPT
EE使用)し、水濾過洗浄を3回(約100cc)行
い、残渣物を、105℃で乾燥した。これを軽く粉砕し
た後、温度900℃、4hr.焼成し、比較粉末酸化錫
粉末3を得た。
(Comparative Example 3) 12 g of tin metal having an average particle diameter of 5 mm was prepared, and this was 80 g of NH 4 NO 3 and 5 of H 2 O.
The solution was poured into the NH 4 NO 3 solution adjusted to 00 ml, and while maintaining the temperature at 60 ° C., 25 ml of concentrated HNO 3 was added thereto, and 0.8 ml was added every 10 minutes from the separating funnel while stirring. did. After that, stirring was continued while maintaining the temperature at 60 ° C. until the precipitate was formed and the cloudy state of the solution was not changed. The required time during this period was 6 hours. Thereafter, the solution was naturally cooled to room temperature, and filtered (1.0 mv PT
EE), and water filtration and washing were performed three times (about 100 cc), and the residue was dried at 105 ° C. After crushing this lightly, the temperature was 900 ° C., 4 hr. By calcining, comparative tin oxide powder 3 was obtained.

【0019】(従来例1)ショット状の錫メタルを12
g用意し、これにHNO3:25mlを加えて溶解し、
メタ錫を生成した。この溶解沈殿作用で生じた沈積物
(メタ錫酸)を、濾過させ、105℃で乾燥後、900
℃、4hr.焼成し、従来酸化錫粉末1を得た。
(Conventional Example 1) Shot-shaped tin metal is
g of HNO 3 : 25 ml was added thereto and dissolved.
Meta tin was produced. The deposit (metastannous acid) generated by this dissolution precipitation action was filtered, dried at 105 ° C.
° C, 4 hr. It was calcined to obtain conventional tin oxide powder 1.

【0020】(従来例2)また、錫メタルを陽極とし
て、濃度2mol/lの硝酸アンモニウム水溶液を電解液と
して、電解槽の浴温を20℃、電流密度600A/m2
錫の電解を行い、得られたメタ錫酸を105℃で乾燥
後、900℃、4hr.焼成し、従来酸化錫粉末2を得
た。
(Conventional example 2) Tin electrolysis was performed using tin metal as an anode, an aqueous solution of ammonium nitrate having a concentration of 2 mol / l as an electrolytic solution, a bath temperature of an electrolytic cell at 20 ° C, and a current density of 600 A / m 2 . The obtained metastannic acid was dried at 105 ° C, and then dried at 900 ° C for 4 hours. It was calcined to obtain conventional tin oxide powder 2.

【0021】上記の様にして得られた、本発明の酸化錫
粉末1、2、3および4、従来酸化錫粉末1および2を
用いて、夫々レ−ザ−マイクロトラック法により、粒度
分布を測定した。結果は、図1〜図6に示す。
Using the tin oxide powders 1, 2, 3 and 4 of the present invention and the conventional tin oxide powders 1 and 2 obtained as described above, the particle size distribution was determined by a laser microtrack method. It was measured. The results are shown in FIGS.

【0022】本発明の酸化錫粉末では、いずれも分布す
る粒径範囲が、比較的狭く、1山の分布となっている一
方、従来酸化錫粉末では、いずれも分布する粒径範囲
が、比較的広がっており2山の分布となっている。
In the tin oxide powder of the present invention, the distribution of the particle size range is relatively narrow, and the distribution is one peak, whereas in the conventional tin oxide powder, the distribution of the particle size is comparatively small. It is spread and has a two-mountain distribution.

【0023】次いで、本発明の酸化錫粉末1及び3、並
びに従来酸化錫粉末1および2を用いて、夫々化学分析
により、不純物純度を調べたところ、次の表1の結果を
得た。
Next, the purity of impurities was examined by chemical analysis using the tin oxide powders 1 and 3 of the present invention and the tin oxide powders 1 and 2 of the prior art, and the results shown in the following Table 1 were obtained.

【0024】[0024]

【 表1】 次いで、本発明の酸化錫粉末1、2、3及び4、比較酸
化錫粉末2及び3、並びに従来酸化錫粉末1及び2を用
いて、夫々ピーク粒径及び平均粒径並びに比表面積を測
定した。表2にその結果を示した。
[Table 1] Next, using the tin oxide powders 1, 2, 3 and 4, the comparative tin oxide powders 2 and 3, and the conventional tin oxide powders 1 and 2, the peak particle diameter, the average particle diameter, and the specific surface area were measured, respectively. . Table 2 shows the results.

【0025】[0025]

【表2】 図1〜6および表2より明らかな様に、本発明の酸化錫
粉末1、2、3および4は、比較酸化錫粉末2、3およ
び4並びに従来酸化錫粉末に較べ、粒度分布がシャ−プ
で、粒度のバラツキが小さく、2次粒子は比較的小さ
く、結晶子は大きく、純度が高いことが判る。
[Table 2] As is clear from FIGS. 1 to 6 and Table 2, the tin oxide powders 1, 2, 3 and 4 of the present invention have a sharp particle size distribution as compared with the comparative tin oxide powders 2, 3 and 4 and the conventional tin oxide powder. It can be seen that the variation in particle size is small, the secondary particles are relatively small, the crystallite is large, and the purity is high.

【0026】上記本発明の酸化錫粉末1、2、3および
4、夫々10gを用い、比表面積2.5m2/g、2次
粒子の平均粒径が10.5μmの酸化インジウム粉末9
0gに夫々混合して、均一に攪拌したものを夫々型に入
れ、1.5t/cm2の加圧下で板状に成形し、更に1
600℃の温度下で2時間500kg/cm2の静水圧
を加えて、熱間プレス焼成を行って、夫々タ−ゲット材
1、2、3及び4を得た。このタ−ゲット材焼結体の密
度は、表2に示すように夫々理論密度の99.5〜9
8.8%であった。
Using the tin oxide powders 1, 2, 3 and 4 of the present invention, 10 g each, an indium oxide powder 9 having a specific surface area of 2.5 m 2 / g and an average secondary particle diameter of 10.5 μm
The mixture was mixed into 0 g each, uniformly stirred, put into molds, and formed into a plate under a pressure of 1.5 t / cm 2.
At a temperature of 600 ° C., a hydrostatic pressure of 500 kg / cm 2 was applied for 2 hours and hot press firing was performed to obtain target materials 1, 2, 3, and 4, respectively. As shown in Table 2, the density of this target material sintered body was 99.5 to 9 of the theoretical density.
It was 8.8%.

【0027】また、比較として、上記比較及び従来酸化
錫粉末を用い、上記同様にして、比較及び従来タ−ゲッ
ト材を得た。このタ−ゲット材焼結体の密度は、同じく
表2に示すごとくとなった。
For comparison, a comparative and conventional target material was obtained in the same manner as described above, using the comparative and conventional tin oxide powders. The density of this target material sintered body was also as shown in Table 2.

【0028】上記の様にして得られた本発明の酸化錫を
用いたタ−ゲット材、比較のタ−ゲット材および従来タ
ーゲット材を用いて、下記の高速スパッタリング条件下
でスパッタリング試験を行った。 高速スパッタリング条件 基板温度:200℃ 酸素分圧:3×10ー5Torr その結果、本発明のスパッタリングタ−ゲット1〜4を
用いた場合は、放電は安定しており、形成された膜も均
一で良質なものであった。(得られた膜の比抵抗は、
1.7×10ー4Ωと低かった)、しかし一方、比較及び
従来のスパッタリングタ−ゲットを用いた場合は、放電
が時々不安定で、得られた膜は膜質のムラが一部に見ら
れ良質の膜とは、認め難かった。得られた膜の比抵抗
は、4.5×10〜2.5×10Ω程度であった。
A sputtering test was conducted under the following high-speed sputtering conditions using the target material using the tin oxide of the present invention obtained as described above, a comparative target material and a conventional target material. . High-speed sputtering conditions Substrate temperature: 200 ° C. Oxygen partial pressure: 3 × 10 −5 Torr As a result, when the sputtering targets 1 to 4 of the present invention were used, the discharge was stable and the formed film was uniform. It was of good quality. (The specific resistance of the obtained film is
As low as 1.7 × 10 over 4 Omega), but on the other hand, comparison and conventional sputtering data - when using the target discharge is sometimes unstable, resulting membranes found in some unevenness of film quality It was hard to recognize it as a good quality film. The specific resistance of the obtained film was about 4.5 × 10 to 2.5 × 10Ω.

【0029】[0029]

【発明の効果】本発明の酸化錫粉末は、比較及び従来の
酸化錫粉末に較べ、粒度分布がシャ−プで、粒度のバラ
ツキが小さく、2次粒子は比較的小さく、結晶子大き
く、純度が高いので、この本発明の酸化錫粉末を適当な
酸化インジウム粉末と混合し、プレス成形した場合、プ
レス密度は高く、これを焼成した場合、得られるITO
焼結体は、高速スパッタリング用タ−ゲット材として利
用された場合、安定した放電が得られ、良質のITOス
パッタリング薄膜を得ることが出来、関連分野において
大いに貢献するものである。
The tin oxide powder of the present invention has a sharp particle size distribution, a small variation in particle size, relatively small secondary particles, a large crystallite, and a high purity, as compared with the comparative and conventional tin oxide powders. Therefore, when the tin oxide powder of the present invention is mixed with an appropriate indium oxide powder and press-molded, the press density is high.
When the sintered body is used as a target material for high-speed sputtering, a stable discharge can be obtained, and a high-quality ITO sputtering thin film can be obtained, which greatly contributes to a related field.

【図面の簡単な説明】[Brief description of the drawings]

【 図1】 本発明の酸化錫粉末1の粒度分布。FIG. 1 shows the particle size distribution of tin oxide powder 1 of the present invention.

【 図2】 本発明の酸化錫粉末2の粒度分布。FIG. 2 shows the particle size distribution of tin oxide powder 2 of the present invention.

【 図3】 本発明の酸化錫粉末3の粒度分布。FIG. 3 shows the particle size distribution of the tin oxide powder 3 of the present invention.

【 図4】 本発明の酸化錫粉末4の粒度分布。FIG. 4 shows the particle size distribution of the tin oxide powder 4 of the present invention.

【 図5】 従来酸化錫粉末1の粒度分布。FIG. 5 shows the particle size distribution of conventional tin oxide powder 1.

【図6】 従来酸化錫粉末2の粒度分布。FIG. 6 shows the particle size distribution of conventional tin oxide powder 2.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C01G 19/02 C04B 35/00 C23C 14/34 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) C01G 19/02 C04B 35/00 C23C 14/34

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 加熱した硝酸アンモニウム溶液に、金属
錫を加え、該溶液に硝酸を添加して、メタ錫酸を沈降さ
せ、この沈降メタ錫酸を仮焼して得ることを特徴とする
酸化錫粉末の製造方法。
1. A tin oxide obtained by adding metallic tin to a heated ammonium nitrate solution, adding nitric acid to the solution to precipitate metastannic acid, and calcining the precipitated metastannic acid. Powder manufacturing method.
【請求項2】 上記金属錫の平均粒度が3mm以下であ
ることを特徴とする請求項1記載の酸化錫粉末の製造方
法。
2. The method for producing tin oxide powder according to claim 1, wherein the average particle size of the metal tin is 3 mm or less.
【請求項3】 上記酸化錫粉末の、ピーク粒径と平均粒
径の比が0.8〜2.0であることを特徴とする請求項
1及び請求項2に記載の酸化錫粉末の製造方法。
3. The production of tin oxide powder according to claim 1, wherein the ratio of the peak particle diameter to the average particle diameter of the tin oxide powder is 0.8 to 2.0. Method.
【請求項4】 請求項1記載のメタ錫酸の沈降を強酸性
領域で行うことを特徴とする請求項1乃至請求項3記載
の酸化錫の製造方法。
4. The method for producing tin oxide according to claim 1, wherein the precipitation of metastannic acid according to claim 1 is performed in a strongly acidic region.
JP29145597A 1997-10-24 1997-10-24 Method for producing tin oxide powder Expired - Lifetime JP3173440B2 (en)

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JP3173440B2 true JP3173440B2 (en) 2001-06-04

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JP4701480B2 (en) * 2000-07-17 2011-06-15 住友化学株式会社 Tin oxide powder and method for producing tin oxide powder
KR100474845B1 (en) * 2002-03-22 2005-03-09 삼성코닝 주식회사 Tin oxide powder, manufacturing method thereof, and manufacturing method of high density indium tin oxide target using the same
JP4747286B2 (en) * 2004-08-05 2011-08-17 三菱マテリアル株式会社 Fine tin oxide powder and its production method and use
CN1318306C (en) * 2004-12-08 2007-05-30 云南锡业集团有限责任公司研究设计院 Method for preparing H2SnO3 (tin dioxide) powder
JP5035509B2 (en) * 2006-08-30 2012-09-26 三菱マテリアル株式会社 Tin oxide powder and method for producing the same
KR101305902B1 (en) * 2006-12-06 2013-09-09 삼성코닝정밀소재 주식회사 Tin oxide powder and manufacturing method of producing the same
KR101583148B1 (en) * 2014-07-31 2016-01-07 한국세라믹기술원 Method for preparing tin oxide powder and tin oxide powder prepared the same

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