JPH0619565Y2 - アークイオンプレーティング装置の電極構造 - Google Patents
アークイオンプレーティング装置の電極構造Info
- Publication number
- JPH0619565Y2 JPH0619565Y2 JP9370189U JP9370189U JPH0619565Y2 JP H0619565 Y2 JPH0619565 Y2 JP H0619565Y2 JP 9370189 U JP9370189 U JP 9370189U JP 9370189 U JP9370189 U JP 9370189U JP H0619565 Y2 JPH0619565 Y2 JP H0619565Y2
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- anode
- ion plating
- arc ion
- electrode structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007733 ion plating Methods 0.000 title claims description 16
- 238000010276 construction Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9370189U JPH0619565Y2 (ja) | 1989-08-08 | 1989-08-08 | アークイオンプレーティング装置の電極構造 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9370189U JPH0619565Y2 (ja) | 1989-08-08 | 1989-08-08 | アークイオンプレーティング装置の電極構造 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0334058U JPH0334058U (enrdf_load_stackoverflow) | 1991-04-03 |
| JPH0619565Y2 true JPH0619565Y2 (ja) | 1994-05-25 |
Family
ID=31643069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9370189U Expired - Lifetime JPH0619565Y2 (ja) | 1989-08-08 | 1989-08-08 | アークイオンプレーティング装置の電極構造 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0619565Y2 (enrdf_load_stackoverflow) |
-
1989
- 1989-08-08 JP JP9370189U patent/JPH0619565Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0334058U (enrdf_load_stackoverflow) | 1991-04-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4006073A (en) | Thin film deposition by electric and magnetic crossed-field diode sputtering | |
| EP0225680B1 (en) | Improved electric arc vapor deposition method | |
| RU2168233C2 (ru) | Катод для распыления или электродугового испарения (варианты) и устройство для покрытия или ионной имплантации подложек | |
| US5656141A (en) | Apparatus for coating substrates | |
| US3669871A (en) | Sputtering apparatus having a concave source cathode | |
| KR102374073B1 (ko) | 웨이퍼 프로세싱 증착 차폐 부품 | |
| JPS6020440A (ja) | イオンビ−ム加工装置 | |
| US6277253B1 (en) | External coating of tungsten or tantalum or other refractory metal on IMP coils | |
| KR100210268B1 (ko) | 전기 전도성 타겟에 의한 기판 코팅장치 | |
| US6761804B2 (en) | Inverted magnetron | |
| US4620081A (en) | Self-contained hot-hollow cathode gun source assembly | |
| JP4901696B2 (ja) | 成膜装置 | |
| JPH0372067A (ja) | 複数の蒸発ルツボを備えたアーク放電型蒸発器 | |
| JPH0619565Y2 (ja) | アークイオンプレーティング装置の電極構造 | |
| KR100326503B1 (ko) | 차폐된보조애노드를이용한전기적절연물질의dc반응성플라즈마기상증착장치및방법 | |
| JPS61221363A (ja) | スパツタ装置 | |
| KR20000038224A (ko) | 고주파 스퍼터링 장치 및 이를 이용한 박막형성방법 | |
| JP2843125B2 (ja) | 薄膜形成装置 | |
| JP3079802B2 (ja) | プラズマ銃 | |
| JP3178658B2 (ja) | イオン・プラズマ型電子銃とその製造方法 | |
| JPH04143267A (ja) | 真空アーク蒸着装置の陽極 | |
| CN215404480U (zh) | 离子源辅助蒸发结构、真空腔体以及真空镀膜机 | |
| JP3431174B2 (ja) | サブストレートのコーティング装置 | |
| JPH0610608Y2 (ja) | イオン流引き出し電極 | |
| JP2023169645A (ja) | 成膜装置 |