JPH06180294A - Defect inspection apparatus - Google Patents

Defect inspection apparatus

Info

Publication number
JPH06180294A
JPH06180294A JP4352368A JP35236892A JPH06180294A JP H06180294 A JPH06180294 A JP H06180294A JP 4352368 A JP4352368 A JP 4352368A JP 35236892 A JP35236892 A JP 35236892A JP H06180294 A JPH06180294 A JP H06180294A
Authority
JP
Japan
Prior art keywords
inspected
irradiation
light
length
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4352368A
Other languages
Japanese (ja)
Inventor
Fumitomo Hayano
史倫 早野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP4352368A priority Critical patent/JPH06180294A/en
Publication of JPH06180294A publication Critical patent/JPH06180294A/en
Pending legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To inspect a defect surfaces of reticles, masks or pellicles having different sizes by one inspection apparatus by providing slits for limiting a length of an incident light in a predetermined section in response to a length of a region to be inspected at a position substantially conjugate with an irradiated position on the surface to be inspected of the matter to be inspected. CONSTITUTION:Slits 22, 23 are provided on shielding plates 20, 21 switchably provided on a flat surface conjugate with a scanning line LR via a light receiving lens 12 in a direction conjugate with the line LR. The plates 20, 21 can be switched by a driver. When a 6-inch reticle 2 is inspected, the plate 20 is interposed between the lens 12 and a detector 13. A length of the slit 22 is so provided at points L', R' that a light from an entire area of the line LR is incident on the detector 13. When a 5-inch reticle 1 is inspected, the plate 21 is interposed between the lens 12 and the detector 13, and a length of the slit 23 is so provided that at points P', Q' are both ends.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は欠陥検査装置に関し、特
に半導体露光工程に用いられるレクチル、マスク(以
下、レクチルと称す)や、ペリクルの表面上に付着した
異物等の欠陥を検出する装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a defect inspection apparatus, and more particularly to an apparatus for detecting defects such as a reticle, a mask (hereinafter referred to as "reticle") used in a semiconductor exposure process, and a foreign substance attached to the surface of a pellicle. It is a thing.

【0002】[0002]

【従来の技術】図5は従来の欠陥検査装置の構成を示す
説明図である。いま、大きさの異なるレクチルとして、
5インチ×5インチ×厚さ0.09インチ(以下、5イ
ンチレチクルと略す)と、6インチ×6インチ×厚さ
0.25インチ(以下、6インチレチクルと略す)とを
考える。
2. Description of the Related Art FIG. 5 is an explanatory diagram showing the structure of a conventional defect inspection apparatus. Now, as a reticle with different sizes,
Consider 5 inches × 5 inches × thickness 0.09 inches (hereinafter abbreviated as 5 inches reticle) and 6 inches × 6 inches × thickness 0.25 inches (hereinafter abbreviated as 6 inches reticle).

【0003】5インチレチクル1と6インチレクチル2
とは、各々検査面1Aと2Aが同じ高さ位置Zになるよ
うにXY平面上にステージ3上に載置されている。ステ
ージ3は駆動軸4を中心に駆動部5によりθ方向に回転
可能で、更に駆動部6によりY方向に移動可能となって
いる。また、ステージ3は駆動部6によりz方向へも移
動可能となっている。
5 inch reticle 1 and 6 inch reticle 2
Is placed on the stage 3 on the XY plane such that the inspection surfaces 1A and 2A are at the same height position Z. The stage 3 can be rotated about the drive shaft 4 in the θ direction by the drive unit 5, and can be moved in the Y direction by the drive unit 6. The stage 3 can also be moved in the z direction by the drive unit 6.

【0004】レーザ等の光源1から発せられた光ビーム
はポリゴンスキャナーやガルバリスキャナー等のスキャ
ナー8により偏向走査され、走査レンズ9により、検査
面2A又は1A上に収束したスポット10を形成すると
共に点Lから点Rまでを走査する(直線LRを走査線と
呼ぶ)。また、スキャナー8の偏向角を検出する偏向角
検出手段(不図示)が設けられており、この偏向角検出
手段からの信号に基づいて異物の付着位置が検出でき
る。
A light beam emitted from a light source 1 such as a laser is deflected and scanned by a scanner 8 such as a polygon scanner or a galvanic scanner, and a scanning lens 9 forms a focused spot 10 on the inspection surface 2A or 1A. The point L to the point R is scanned (the straight line LR is called a scanning line). Further, a deflection angle detecting means (not shown) for detecting the deflection angle of the scanner 8 is provided, and the adhesion position of the foreign matter can be detected based on the signal from the deflection angle detecting means.

【0005】点Lから点Rまでの距離をdとする。スポ
ット10の走査により異物11からは散乱光が発生し、
受光レンズ12を介して、フォトマル等の検出器13に
より検出される。検出器13は光電変換された出力14
を出力する。走査線LRとほぼ共役な位置には遮光板1
5が設けられ、走査線LRと共役な方向にほぼ矩形のス
リット16が設けられている。
The distance from the point L to the point R is d. By the scanning of the spot 10, scattered light is generated from the foreign matter 11,
It is detected by a photomultiplier or the like 13 via the light receiving lens 12. The detector 13 has a photoelectrically converted output 14
Is output. The light shield plate 1 is provided at a position almost conjugate with the scanning line LR.
5 is provided, and a substantially rectangular slit 16 is provided in a direction conjugate with the scanning line LR.

【0006】走査線LR上からの散乱,回折光は、スリ
ット16を透過して検出器13に達するが、走査線LR
以外の場所で発生したゴースト、フレアー等の迷光は遮
光板15により、遮光され、検出器13には達しない。
The scattered and diffracted light from the scanning line LR passes through the slit 16 and reaches the detector 13, but the scanning line LR
Stray light such as ghosts and flares generated in other locations is shielded by the light shielding plate 15 and does not reach the detector 13.

【0007】もし検出器13が異物11からの散乱光を
受光すると、そのときのスキャナー8の偏向角を検出す
る不図示の偏向角検出手段からの信号より異物11のX
方向の付着位置が解るし、また、駆動部6に設けられた
不図示のロータリーエンコーダ等の測長器の信号から異
物11のY方向の付着位置を知ることができるので、異
物11のXY座標とまた出力14の信号強度の大小から
異物11のサイズの大小を知ることができる。
If the detector 13 receives the scattered light from the foreign substance 11, the X of the foreign substance 11 is detected from the signal from the deflection angle detecting means (not shown) for detecting the deflection angle of the scanner 8 at that time.
The attachment position in the Y direction can be known from the signal of the length measuring device such as a rotary encoder (not shown) provided in the drive unit 6, and the XY coordinates of the foreign substance 11 can be known. Moreover, the size of the foreign matter 11 can be known from the size of the signal intensity of the output 14.

【0008】図5は6インチレチクル2を検査している
状態を示しているが、6インチレチクル2を検査した後
は、駆動部5により、ステージ3を180度回転して今
度は5インチレチクル1を検査することによって、5イ
ンチレチクル1、6インチレチクル2の両方を検査する
ことができる。
FIG. 5 shows a state in which the 6-inch reticle 2 is inspected. After inspecting the 6-inch reticle 2, the drive unit 5 rotates the stage 3 180 degrees to turn the 5-inch reticle. By inspecting 1, both the 5-inch reticle 1 and the 6-inch reticle 2 can be inspected.

【0009】[0009]

【発明が解決しようとする課題】上記のごとき従来の技
術においては、走査線LRの長さdは5インチレチクル
1を検査するときと、6インチレチクル2を検査すると
きとで同じであり、更に、長さdは 5インチ<d<6インチ の関係であるため、6インチレチクルの検査領域に合わ
せて走査線LRの長さdを定めた場合、5インチレチク
ル1を検査するとき、5インチレチクル1の端面1Bに
スポット10が当たったときに強い迷光を発して、検出
出力14のS/Nが著しく低下するという問題があっ
た。
In the prior art as described above, the length d of the scanning line LR is the same when inspecting the 5-inch reticle 1 and when inspecting the 6-inch reticle 2. Furthermore, since the length d has a relationship of 5 inches <d <6 inches, when the length d of the scanning line LR is determined in accordance with the inspection area of the 6 inch reticle, when the 5 inch reticle 1 is inspected, 5 When the spot 10 hits the end surface 1B of the inch reticle 1, strong stray light is emitted, and the S / N of the detection output 14 is significantly reduced.

【0010】また、図6は5インチレチクル側面部の光
ビームの多重反射光を示す模式図である。図に示す通
り、5インチレチクル1を検査するとき、光ビーム17
が5インチレチクル1の表裏面で多重反射し、この多重
反射光が点Aに達したとき、レチクル端面1Bの側面が
光ってしまうという問題点があった。
FIG. 6 is a schematic diagram showing multiple reflected light of the light beam on the side surface of the 5-inch reticle. As shown in the figure, when inspecting the 5-inch reticle 1, the light beam 17
However, there is a problem in that the side surface of the reticle end surface 1B shines when the multiple-reflected light reaches the point A.

【0011】なぜならば、5インチレチクル1は通常、
端面1Bがスリガラス状になっているため、点Aでは光
がレチクル1の内部にも散乱し、側面両端の端面1Bも
光るからである。
Because the 5 inch reticle 1 is usually
This is because the end surface 1B has a ground glass shape, so that at point A, light is also scattered inside the reticle 1, and the end surfaces 1B at both ends of the side surface also shine.

【0012】これに対し、6インチレチクル2では、通
常端面2Bはスリガラス状ではなく、光学研磨されてい
るため、多重反射光がたとえレチクル端面に当たって
も、そのまま屈折するだけで、端面2Bの側面が光るよ
うなこと等はない。
On the other hand, in the 6-inch reticle 2, since the end face 2B is not normally ground glass and is optically polished, even if the multiple reflected light strikes the reticle end face, it is simply refracted and the side face of the end face 2B is changed. There is nothing that shines.

【0013】本発明は、一つの欠陥検査装置で、相違す
る大きさのレチクル,マスク或いはペリクルの表面上の
欠陥を検査することのできる欠陥検査装置を得ることを
目的とする。
It is an object of the present invention to provide a defect inspection apparatus capable of inspecting defects on the surface of a reticle, a mask or a pellicle having different sizes with a single defect inspection apparatus.

【0014】[0014]

【課題を解決するための手段】本請求項1に記載の発明
に係る欠陥検査装置では、感光基板への微細パターンの
露光転写に使用されるレチクル又はマスク等の転写原版
の表面又はパターン面或は前記転写原版に装着されるペ
リクルの表面等の被検査物の被検査面を光学的に検査す
る欠陥検査装置であって、前記被検査物の被検査面上に
光を照射する照射手段と、大きさの相違する複数の前記
被検査物の表面を前記照射手段の光学走査線上に供給す
る供給手段と、前記被検査物の被検査面からの光を受光
する検出手段とを備えた装置において、前記検査物の被
検査面上の照射位置とほぼ共役な位置に設けられ、前記
複数の被検査物の被検査領域の長さに応じて、前記検出
手段の受光部への入射光の所定断面での長さを制限する
受光部制限手段を備えたものである。
In the defect inspection apparatus according to the invention described in claim 1, the surface or pattern surface of a transfer original plate such as a reticle or mask used for exposure transfer of a fine pattern onto a photosensitive substrate, or Is a defect inspection device for optically inspecting an inspected surface of an inspected object such as a surface of a pellicle mounted on the transfer original plate, and an irradiation means for irradiating the inspected surface of the inspected object with light. An apparatus comprising: a supply unit that supplies a plurality of surfaces of the object to be inspected having different sizes onto an optical scanning line of the irradiation unit; and a detection unit that receives light from the surface to be inspected of the object to be inspected. In the above, the position of the incident light on the light receiving part of the detection means is provided at a position substantially conjugate with the irradiation position on the surface to be inspected of the inspection object, and according to the length of the inspection area of the plurality of inspection objects. A light-receiving part limiting device that limits the length of a given cross section Those were example.

【0015】本請求項2に記載の発明の係る欠陥検査装
置では、感光基板への微細パターンの露光転写に使用さ
れるレチクル又はマスク等の転写原版の表面又はパター
ン面或は前記転写原版に装着されるペリクルの表面等の
被検査物の被検査面を光学的に検査する欠陥検査装置で
あって、前記被検査物の被検査面上に光を照射する照射
手段と、大きさの相違する複数の前記被検査物の表面を
前記照射手段の光学走査線上に供給する供給手段と、前
記被検査物の被検査面からの光を受光する検出手段とを
備えた装置において、前記複数の被検査物の被検査領域
の長さに応じて、前記照射手段の光学走査線の所定断面
での長さを制限する照射部制限手段を備えたものであ
る。
In the defect inspection apparatus according to the second aspect of the present invention, the surface or pattern surface of a transfer original plate such as a reticle or mask used for exposure transfer of a fine pattern onto a photosensitive substrate or the transfer original plate is mounted. A defect inspection apparatus for optically inspecting an inspected surface of an inspected object such as a surface of a pellicle, the size of which is different from that of an irradiation unit for irradiating the inspected surface of the inspected object with light. An apparatus comprising: a supply unit that supplies a plurality of surfaces of the object to be inspected onto an optical scanning line of the irradiation unit; and a detection unit that receives light from the surface to be inspected of the object to be inspected. The irradiation unit limiting unit limits the length of the optical scanning line of the irradiation unit in a predetermined cross section according to the length of the inspection area of the inspection object.

【0016】具体的な照射部制限手段としては、前記照
射手段の照射角度を前記複数の被検査物の被検査領域の
長さに応じた角度に照射する照射角度切換え手段と、前
記複数の被検査物の被検査領域の長さに応じた角度以外
の前記照射手段の光学走査線領域を遮光する照射光遮光
手段とを開示する。
The specific irradiation unit limiting means includes an irradiation angle switching means for irradiating the irradiation angle of the irradiation means to an angle according to the length of the region to be inspected of the plurality of inspection objects, and the plurality of irradiation targets. An irradiation light shielding means for shielding the optical scanning line area of the irradiation means other than an angle corresponding to the length of the inspection area of the inspection object is disclosed.

【0017】[0017]

【作用】本発明においては、検査物の被検査面上の照射
位置と共役な位置に設けられ、複数の被検査物の被検査
領域の長さに応じて、検出手段の受光部への入射光の所
定断面での長さを制限する受光部制限手段を備えたもの
であるため、レチクル,マスク或いはペリクル等の被検
査物の大きさに無関係に被検査物の被検査領域を走査
し、受光部の入射光の所定断面での長さを選択して、一
定のS/N比で異物等の欠陥を検出することができる。
In the present invention, it is provided at a position conjugate with the irradiation position on the surface to be inspected of the inspection object, and it is incident on the light receiving portion of the detecting means according to the length of the inspection area of the plurality of inspection objects. Since it is provided with a light receiving unit limiting means for limiting the length of light in a predetermined cross section, the inspection area of the inspection object is scanned regardless of the size of the inspection object such as a reticle, a mask, or a pellicle. By selecting the length of the incident light of the light receiving portion in a predetermined cross section, it is possible to detect a defect such as a foreign substance with a constant S / N ratio.

【0018】具体的には、前記受光部制限手段として
は、検査物の被検査面上の照射位置と共役な位置に設け
られ、被検査物の被検査面の長さに応じたスリット長を
備えた幾つかのスリットを切換えて選択するものであ
る。
Specifically, the light-receiving section limiting means is provided at a position conjugate with the irradiation position on the surface to be inspected of the inspection object, and has a slit length corresponding to the length of the surface to be inspected of the inspection object. The number of slits provided is switched and selected.

【0019】被検査物の被検査面の長さに応じたスリッ
ト長を備えた幾つかのスリットを切換えて選択すること
により、例えば5インチレチクルでは、端面1Bの散乱
光(迷光)が遮光されるようにしたので、レチクルサイ
ズによらず一定のS/Nで異物等の欠陥を検出すること
ができる。
By switching and selecting some slits having slit lengths corresponding to the length of the surface to be inspected of the object to be inspected, scattered light (stray light) from the end facet 1B is blocked in a 5-inch reticle, for example. Therefore, it is possible to detect a defect such as a foreign matter with a constant S / N regardless of the reticle size.

【0020】更に、本発明では、複数の被検査物の被検
査面の長さに応じて、前記照射手段の光学走査線幅を制
限する照射部制限手段を備えたものであるため、レチク
ルのサイズに応じて走査線LRの長さdを選択して、レ
チクル,マスク或いはペリクル等の被検査物の大きさに
無関係に一定のS/N比で異物等の欠陥を検出すること
ができる。
Further, according to the present invention, since the reticle of the reticle is provided with the irradiation section limiting means for limiting the optical scanning line width of the irradiation means according to the length of the surface to be inspected of a plurality of objects to be inspected. By selecting the length d of the scanning line LR according to the size, it is possible to detect a defect such as a foreign substance with a constant S / N ratio regardless of the size of an object to be inspected such as a reticle, a mask or a pellicle.

【0021】具体的な照射部制限手段としては、照射手
段の照射角度を複数の被検査物の被検査面の長さに応じ
た角度に照射する照射角度切換え手段と、複数の被検査
物の被検査面の長さに応じた角度以外の照射手段の光学
走査線領域を遮光する照射光遮光手段とがある。
Specific irradiation unit limiting means include irradiation angle switching means for irradiating the irradiation angle of the irradiation means to an angle according to the lengths of the surfaces to be inspected of a plurality of inspection objects, and a plurality of inspection objects. There is an irradiation light shielding unit that shields the optical scanning line region of the irradiation unit other than the angle corresponding to the length of the surface to be inspected.

【0022】照射角度切換え手段としては、例えば、扇
状の光学走査線を発するスキャナーの偏向角度範囲を、
例えば6インチレチクルの幅と、5インチレチクルの幅
とに各々符合させるように選択する。
As the irradiation angle switching means, for example, a deflection angle range of a scanner which emits a fan-shaped optical scanning line is set as follows.
For example, the width of the 6-inch reticle and the width of the 5-inch reticle are selected to match each other.

【0023】また、照射光遮光手段としては、例えば、
光源とスキャナーの間の光路中に光スイッチング素子を
設けて、所定範囲外のときにスイッチング素子により光
源からの光をオン・オフし、スキャナーの光学走査領域
を調整する。
Further, as the irradiation light shielding means, for example,
An optical switching element is provided in the optical path between the light source and the scanner, and the light from the light source is turned on / off by the switching element when outside the predetermined range, and the optical scanning area of the scanner is adjusted.

【0024】尚、大きさの相違する複数の被検査物の表
面を照射手段の光学走査線上に供給する供給手段として
は、後述する実施例のように、被検査面高さを揃えた回
転板上に個々のレチクル等を載置させたもの以外にも、
一定の被検査面高さを有して順次供給される被検査物で
あればよく、他にもベルトコンベア式に供給される手段
をも含む。
As the supply means for supplying the surfaces of a plurality of objects to be inspected having different sizes onto the optical scanning line of the irradiation means, a rotary plate having a uniform height of the surface to be inspected as in the embodiment described later. In addition to those with individual reticles placed on top,
It may be an object to be inspected that has a constant height of the surface to be inspected and is sequentially supplied, and it also includes means for supplying the material in a belt conveyor type.

【0025】[0025]

【実施例】図1は本発明の第1の実施例の要部を示す説
明図であり、本発明の実施例の基本構成は図5と同じで
あり、同様の部材には同じ符合を付してある。図5の受
光系即ち受光レンズ12、遮光板15、スリット16、
検出器13、出力14で構成される部分の構成である。
FIG. 1 is an explanatory view showing a main part of a first embodiment of the present invention. The basic structure of the embodiment of the present invention is the same as that of FIG. 5, and the same members are designated by the same reference numerals. I am doing it. The light receiving system of FIG. 5, that is, the light receiving lens 12, the light shielding plate 15, the slit 16,
This is a configuration of a portion including a detector 13 and an output 14.

【0026】受光レンズ12を介して、走査線LRと共
役な平面上に切り換え可能な2つの遮光板20,21が
設けられている。遮光板20,21には各々走査線LR
と共役な方向(走査線LRと共役な平面上での走査線L
Rの長さ方向)にスリット22,23が設けられ、遮光
板20,21には各々走査線LRと共役な方向にスリッ
ト22,23が設けられ、遮光板20,21は不図示の
駆動部により矢印24の方向に動くことにより切り換え
可能である。
Through the light receiving lens 12, two switchable light shield plates 20 and 21 are provided on a plane conjugate with the scanning line LR. The scanning lines LR are provided on the light shielding plates 20 and 21, respectively.
Direction (scan line L on a plane conjugate with scan line LR)
Slits 22 and 23 are provided in the length direction of R), and the light shielding plates 20 and 21 are provided with slits 22 and 23 in a direction conjugate with the scanning line LR, respectively. Can be switched by moving in the direction of arrow 24.

【0027】遮光板20,21のいずれも光路25中に
挿入された状態においては走査線LR上の光情報(即
ち、異物からの散乱光)のみが検出器13に入るように
なっている。
When both the light blocking plates 20 and 21 are inserted in the optical path 25, only the light information on the scanning line LR (that is, the scattered light from the foreign matter) enters the detector 13.

【0028】図2は6インチレチクル2を検査する状態
を示す説明図である。受光レンズ12と検出器13の間
には、遮光板20が入る。スリット22の長さは走査線
LRの全域からの光が検出器13に入射するように点L
と共役な点L’と、点Rと共役な点R’を両端とするよ
うになっている。
FIG. 2 is an explanatory view showing a state of inspecting the 6-inch reticle 2. A light shielding plate 20 is inserted between the light receiving lens 12 and the detector 13. The length of the slit 22 is a point L so that light from the entire scanning line LR enters the detector 13.
A point L'which is conjugate with and a point R'which is conjugate with the point R are defined as both ends.

【0029】図3は5インチレチクル1を検査する状態
を示す説明図である。受光レンズ12と検出器13の間
には、遮光板21が入る。走査線LRに対し、実際に必
要な走査線幅PQの長さR’の範囲だけ検出器13に入
るようにスリット23の長さは点Pと共役な点P’と点
Qと共役な点Q’を両端とするようになっている。
FIG. 3 is an explanatory view showing a state of inspecting the 5-inch reticle 1. A light shielding plate 21 is inserted between the light receiving lens 12 and the detector 13. With respect to the scanning line LR, the length of the slit 23 is a point conjugate with the point P'and a point conjugate with the point Q so that the slit 13 enters only the range of the length R'of the scanning line width PQ actually required. Both ends are Q '.

【0030】そのため、5インチレチクル1の端面1L
や1Rからの光は遮光板21により遮光されるため、既
述したように、5インチレチクル1の端面が全周に亙っ
て光っても端面ILやIRからの光は検出器13には、
入らない。即ち、走査線LRと共役な平面を受光レンズ
12への入射光の断面とし、この断面内で入射光の長さ
を遮光板21により制限した。
Therefore, the end face 1L of the 5-inch reticle 1
Since the light from 1R and 1R is blocked by the light blocking plate 21, as described above, even if the end surface of the 5-inch reticle 1 shines over the entire circumference, the light from the end surface IL or IR does not reach the detector 13. ,
Do not fit. That is, a plane conjugate with the scanning line LR is used as the cross section of the incident light to the light receiving lens 12, and the length of the incident light is limited by the light shielding plate 21 within this cross section.

【0031】遮光板20,21の切り換えは図5の駆動
部5の180度回転駆動に同期して行ってもよいし、キ
ーボードやスイッチ等の入力手段から5インチサイズか
6インチサイズかを入力したときに、駆動部5も駆動
し、且つ遮光板20,21も切り換えるようにしてもよ
い。
The switching of the shading plates 20 and 21 may be performed in synchronization with the 180 ° rotational drive of the drive unit 5 of FIG. 5, or the input of 5 inch size or 6 inch size is input from an input means such as a keyboard or a switch. At this time, the drive unit 5 may be driven and the light blocking plates 20 and 21 may be switched.

【0032】次に、本発明の第2の実施例を説明する。
本実施例ではスキャナー8の偏向角度範囲をレチクルサ
イズに応じて6インチレチクル2を走査するときは、点
Lから点Rまで走査するようにし、5インチレチクル1
の時は点Pから点Qまで走査するように切り換える。
Next, a second embodiment of the present invention will be described.
In this embodiment, when scanning the 6-inch reticle 2 in the deflection angle range of the scanner 8 according to the reticle size, the scan is performed from the point L to the point R so that the 5-inch reticle 1 can be scanned.
In case of, switching is performed so that scanning is performed from point P to point Q.

【0033】更に、図4は本発明の第3の実施例の構成
を示す説明図である。図のように、光源7とスキャナー
8との間にAOM(音響光学変調器)等の光学スイッチ
ング素子30を設けることにより、AOM透過光31を
on/offするシャッター機能を持たせ、スキャナー
8の偏向に応じ、透過光31をon/offし、レチク
ル上の走査線長さをDからD’に切り換えるようにして
もよい。
Further, FIG. 4 is an explanatory view showing the constitution of the third embodiment of the present invention. As shown in the figure, by providing an optical switching element 30 such as an AOM (acousto-optic modulator) between the light source 7 and the scanner 8, a shutter function for turning on / off the AOM transmitted light 31 is provided, and the scanner 8 The transmitted light 31 may be turned on / off according to the deflection, and the scanning line length on the reticle may be switched from D to D ′.

【0034】尚、図4は図5の構成と異なる部分のみ示
している。図4の実施例においては、遮光板15のスリ
ット16の長さは走査線LRを望む長さだけ確保してあ
ればよい。また、遮光板15の切換えと走査線LRの長
さ調整との両方を行うようにしてもよい。
Incidentally, FIG. 4 shows only a part different from the structure of FIG. In the embodiment of FIG. 4, the length of the slit 16 of the light shielding plate 15 may be the desired length of the scanning line LR. Further, both the switching of the light shielding plate 15 and the adjustment of the length of the scanning line LR may be performed.

【0035】[0035]

【発明の効果】本発明は以上説明したとおり、検査物の
被検査面上の照射位置と共役な位置に設けられ、複数の
被検査物の被検査領域の長さに応じて、検出手段の受光
部への入射光の所定断面での長さを制限する受光部制限
手段を備えたものである。
As described above, the present invention is provided at a position conjugate with the irradiation position on the surface to be inspected of the inspection object, and the detection means of the detection means is provided in accordance with the length of the inspection area of the plurality of inspection objects. The light receiving unit limiting means is provided for limiting the length of the incident light on the light receiving unit in a predetermined cross section.

【0036】具体的には、検査物の被検査面上の照射位
置と共役な位置に設けられ、被検査物の被検査面の長さ
に応じたスリット長を備えた幾つかのスリットを切換え
て選択するものであるため、レチクル,マスク或いはペ
リクル等の被検査物の大きさに無関係に被検査物の被検
査面を走査し、受光部の入射光の長さ(被検査面と共役
な面上での長さ)を選択して、一定のS/N比で異物等
の欠陥を検出することができる。
Specifically, some slits are provided at a position conjugate with the irradiation position on the surface to be inspected of the inspection object, and the slits having a slit length corresponding to the length of the surface to be inspected of the inspection object are switched. Therefore, the surface to be inspected of the object to be inspected is scanned irrespective of the size of the object to be inspected such as a reticle, a mask, or a pellicle, and the length of the incident light of the light receiving part (the surface to be inspected is not conjugate) It is possible to detect defects such as foreign matter with a constant S / N ratio by selecting (length on the surface).

【0037】更に、本発明では、複数の被検査物の被検
査面の幅に応じて、前記照射手段の光学走査線長を制限
する照射部制限手段を備えたものである。
Further, according to the present invention, there is provided an irradiating section limiting means for limiting the optical scanning line length of the irradiating means according to the widths of the inspected surfaces of a plurality of inspected objects.

【0038】具体的には、照射手段の照射角度を複数の
被検査物の被検査面の長さに応じた角度に照射する照射
角度切換え手段や、複数の被検査物の被検査面の長さに
応じた角度以外の照射手段の光学走査線領域を遮光する
照射光遮光手段等のような照射部制限手段を備えたもの
であるため、レチクルのサイズに応じて走査線LRの長
さdを選択して、レチクル,マスク或いはペリクル等の
被検査物の大きさに無関係に一定のS/N比で異物等の
欠陥を検出することができる。
Specifically, the irradiation angle switching means for irradiating the irradiation angle of the irradiation means to an angle according to the length of the surface to be inspected of a plurality of inspection objects, and the length of the inspection surface of a plurality of inspection objects. Since the irradiation unit limiting means such as the irradiation light blocking means for blocking the optical scanning line region of the irradiation means other than the angle corresponding to the angle is provided, the length d of the scanning line LR depends on the size of the reticle. Can be selected to detect defects such as foreign matter with a constant S / N ratio regardless of the size of the object to be inspected such as the reticle, mask or pellicle.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例の要部を示す説明図であ
る。
FIG. 1 is an explanatory diagram showing a main part of a first embodiment of the present invention.

【図2】6インチレチクルを検査する状態を示す説明図
である。
FIG. 2 is an explanatory diagram showing a state of inspecting a 6-inch reticle.

【図3】5インチレチクルを検査する状態を示す説明図
である。
FIG. 3 is an explanatory diagram showing a state of inspecting a 5-inch reticle.

【図4】本発明の第3の実施例の構成を示す説明図であ
る。
FIG. 4 is an explanatory diagram showing a configuration of a third exemplary embodiment of the present invention.

【図5】従来の欠陥検査装置の構成を示す説明図であ
る。
FIG. 5 is an explanatory diagram showing a configuration of a conventional defect inspection apparatus.

【図6】5インチレチクル側面部の光ビームの多重反射
光を示す模式図である。
FIG. 6 is a schematic diagram showing multiple reflected light of a light beam on a side surface of a 5-inch reticle.

【符号の説明】[Explanation of symbols]

20,21…遮光板、 22,23…スリット、 8…スキャナー 30…光学スイッチング素子 20, 21 ... Shading plate, 22, 23 ... Slit, 8 ... Scanner 30 ... Optical switching element

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 感光基板への微細パターンの露光転写に
使用されるレチクル又はマスク等の転写原版の表面又は
パターン面或は前記転写原版に装着されるペリクルの表
面等の被検査物の被検査面を光学的に検査する欠陥検査
装置であって、 前記被検査物の被検査面上に光を照射する照射手段と、
大きさの相違する複数の前記被検査物の表面を前記照射
手段の光学走査線上に供給する供給手段と、前記被検査
物の被検査面からの光を受光する検出手段とを備えた装
置において、 前記検査物の被検査面上の照射位置とほぼ共役な位置に
設けられ、前記複数の被検査物の被検査領域の長さに応
じて、前記検出手段の受光部への入射光の所定断面での
長さを制限する受光部制限手段を備えたことを特徴とす
る欠陥検査装置。
1. An inspection object for an object to be inspected, such as a surface or a pattern surface of a transfer original plate such as a reticle or a mask used for exposure transfer of a fine pattern onto a photosensitive substrate or a surface of a pellicle mounted on the transfer original plate. A defect inspection apparatus for optically inspecting a surface, comprising: an irradiation unit that irradiates the surface to be inspected with light.
An apparatus comprising: a supply unit that supplies a plurality of surfaces of the object to be inspected having different sizes onto an optical scanning line of the irradiation unit; and a detection unit that receives light from the surface to be inspected of the object to be inspected. Provided at a position substantially conjugate with the irradiation position on the surface to be inspected of the inspection object, and predetermined for incident light to the light receiving unit of the detection means according to the length of the inspection area of the plurality of inspection objects. A defect inspection apparatus comprising a light-receiving section limiting means for limiting the length in cross section.
【請求項2】 感光基板への微細パターンの露光転写に
使用されるレチクル又はマスク等の転写原版の表面又は
パターン面或は前記転写原版に装着されるペリクルの表
面等の被検査物の被検査面を光学的に検査する欠陥検査
装置であって、 前記被検査物の被検査面上に光を照射する照射手段と、
大きさの相違する複数の前記被検査物の表面を前記照射
手段の光学走査線上に供給する供給手段と、前記被検査
物の被検査面からの光を受光する検出手段とを備えた装
置において、 前記複数の被検査物の被検査領域の長さに応じて、前記
照射手段の光学走査線の所定断面での長さを制限する照
射部制限手段を備えたことを特徴とする欠陥検査装置。
2. An object to be inspected such as a surface or a pattern surface of a transfer original plate such as a reticle or a mask used for exposure transfer of a fine pattern onto a photosensitive substrate or a surface of a pellicle mounted on the transfer original plate. A defect inspection apparatus for optically inspecting a surface, comprising: an irradiation unit that irradiates the surface to be inspected with light.
An apparatus comprising: a supply unit that supplies a plurality of surfaces of the object to be inspected having different sizes onto an optical scanning line of the irradiation unit; and a detection unit that receives light from the surface to be inspected of the object to be inspected. A defect inspection apparatus comprising: an irradiation unit limiting unit that limits a length of an optical scanning line of the irradiation unit in a predetermined section according to a length of an inspection region of the plurality of inspection objects. .
【請求項3】 前記請求項2に記載の欠陥検査装置にお
いて、 前記照射部制限手段が、前記照射手段の照射角度を、前
記複数の被検査物の被検査領域の長さに応じた角度に照
射する照射角度切換え手段であることを特徴とする欠陥
検査装置。
3. The defect inspection apparatus according to claim 2, wherein the irradiation section limiting unit sets an irradiation angle of the irradiation unit to an angle according to a length of an inspection area of the plurality of inspection objects. A defect inspection apparatus characterized in that it is irradiation angle switching means for irradiation.
【請求項4】 前記請求項2に記載の欠陥検査装置にお
いて、 前記照射部制限手段が、前記複数の被検査物の被検査領
域の長さに応じた角度以外の前記照射手段の光学走査線
領域を遮光する照射光遮光手段であることを特徴とする
欠陥検査装置。
4. The defect inspection apparatus according to claim 2, wherein the irradiation unit limiting means has an optical scanning line of the irradiation means other than an angle corresponding to a length of an inspection region of the plurality of inspection objects. A defect inspection apparatus, which is irradiation light blocking means for blocking an area.
JP4352368A 1992-12-11 1992-12-11 Defect inspection apparatus Pending JPH06180294A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4352368A JPH06180294A (en) 1992-12-11 1992-12-11 Defect inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4352368A JPH06180294A (en) 1992-12-11 1992-12-11 Defect inspection apparatus

Publications (1)

Publication Number Publication Date
JPH06180294A true JPH06180294A (en) 1994-06-28

Family

ID=18423588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4352368A Pending JPH06180294A (en) 1992-12-11 1992-12-11 Defect inspection apparatus

Country Status (1)

Country Link
JP (1) JPH06180294A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008026306A (en) * 2006-06-20 2008-02-07 Hoya Corp Pattern defect inspecting method, pattern defect inspecting apparatus, method for manufacturing photomask product and method for manufacturing substrate for display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008026306A (en) * 2006-06-20 2008-02-07 Hoya Corp Pattern defect inspecting method, pattern defect inspecting apparatus, method for manufacturing photomask product and method for manufacturing substrate for display device

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