JPH06171946A - Production of high purity diarsenic trioxide - Google Patents

Production of high purity diarsenic trioxide

Info

Publication number
JPH06171946A
JPH06171946A JP34516592A JP34516592A JPH06171946A JP H06171946 A JPH06171946 A JP H06171946A JP 34516592 A JP34516592 A JP 34516592A JP 34516592 A JP34516592 A JP 34516592A JP H06171946 A JPH06171946 A JP H06171946A
Authority
JP
Japan
Prior art keywords
trioxide
diarsenic
soln
arsenic
diarsenic trioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34516592A
Other languages
Japanese (ja)
Inventor
Kenji Yokozawa
健二 横沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YOKOZAWA KINZOKU KOGYO KK
Original Assignee
YOKOZAWA KINZOKU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YOKOZAWA KINZOKU KOGYO KK filed Critical YOKOZAWA KINZOKU KOGYO KK
Priority to JP34516592A priority Critical patent/JPH06171946A/en
Publication of JPH06171946A publication Critical patent/JPH06171946A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G28/00Compounds of arsenic
    • C01G28/005Oxides; Hydroxides; Oxyacids
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

PURPOSE:To produce high purity diarsenic trioxide suitable for use as a reference substance by a wet process using a material contg. highly diarsenic trioxide as a starting material and simple appliances and facilities. CONSTITUTION:A satd. aq. soln. of a material contg. highly diarsenic trioxide and impurities such as diarsenic pentoxide is prepd., a reducing agent is added to the soln. and this soln. is heated to reduce pentavalent arsenic to trivalent arsenic. At the same time, the soln. is concd. by evaporation to prepare a satd. aq. soln. of diarsenic trioxide again. This soln. is rapidly added to cooling water or ethanol under vigorous stirring to deposit fine diarsenic trioxide crystals and these crystals are separated by filtration, washed with cooled pure water and satisfactorily dried until sticking water is removed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本明細書中、「高純度三酸化二ひ
素」とはAS23 含量が99.95wt%以上のもの
を言う。また、「高含有率三酸化二ひ素」とはAS2
3 含量が98.0wt%〜99.0wt%のものを言
う。本発明は、不純物を含む三酸化二ひ素から高純度の
三酸化二ひ素を製造する方法、特に標準物質用として好
適な高純度三酸化二ひ素を製造する方法に関する。
INDUSTRIAL APPLICABILITY In the present specification, "high-purity diarsenic trioxide" means an AS 2 O 3 content of 99.95 wt% or more. Also, "high content diarsenic trioxide" means AS 2 O
3 It means that the content is 98.0 wt% to 99.0 wt%. TECHNICAL FIELD The present invention relates to a method for producing high-purity diarsenic trioxide from arsenic trioxide containing impurities, and particularly to a method for producing high-purity diarsenic trioxide suitable as a standard substance.

【0002】[0002]

【従来技術とその問題点】三酸化二ひ素(AS23
は、金属ひ素又はひ素化合物を空気中で燃焼させて得ら
れる。工業的には、リュウヒテツ鉱のバイ焼、ひ素を含
む銅鉱の製錬時の副産物等として多量に産出される。し
かし、このようにして得られた三酸化二ひ素は一般に多
量の不純物を含んでおりそのままでは使用できず、三酸
化二ひ素の含有率を高める必要がある。
[Prior Art and Problems] Diarsenic trioxide (AS 2 O 3 )
Is obtained by burning metal arsenic or an arsenic compound in air. Industrially, a large amount is produced as a by-product at the time of baking of Ryuhitetsu ore and smelting of copper ore containing arsenic. However, the arsenic trioxide thus obtained generally contains a large amount of impurities and cannot be used as it is, and it is necessary to increase the content ratio of arsenic trioxide.

【0003】三酸化二ひ素の含有率を高める方法として
は、下記の方法が知られている。不純物を含む、三酸化
二ひ素を塩酸に溶解し、生成した三酸化二ひ素を含む溶
液を蒸留して得られた溶液に多量の水を加え、加水分解
して三酸化二ひ素を分離する。更に品位を高くするには
三酸化二ひ素を昇華して精製する。三酸化二ひ素溶液の
再蒸留、三酸化二ひ素の昇華精製を繰り返して高含有率
三酸化二ひ素を製造する。得られた高含有率三酸化二ひ
素は6〜9Nine純度の高純度金属ひ素の原料として
いる。この方法で得られる三酸化二ひ素は不純物として
は表1に示す通り非常に少ないが、三酸化二ひ素の含有
率は98%〜99%程度で標準物質用の高純度三酸化二
ひ素としては使用できない。
The following methods are known as methods for increasing the content of arsenic trioxide. Diarsenic trioxide containing impurities is dissolved in hydrochloric acid, and the resulting solution containing diarsenic trioxide is distilled to add a large amount of water to the solution, which is hydrolyzed to separate diarsenic trioxide. To further enhance the quality, sublimate diarsenic trioxide for purification. Redistributed arsenic trioxide solution and sublimation purification of arsenic trioxide are repeated to produce high content arsenic trioxide. The obtained high-content diarsenic trioxide is used as a raw material for high-purity metal arsenic having a purity of 6 to 9 Nine. The arsenic trioxide obtained by this method is very small as an impurity as shown in Table 1. However, the content of arsenic trioxide is about 98% to 99%, and as a high-purity diarsenic trioxide for a standard substance, I can not use it.

【0004】[0004]

【表1】 [Table 1]

【0005】また、昭和初期より10数年間、大阪工業
試験所(現工業技術院大阪工業技術試験所)において、
高純度三酸化二ひ素を、容量分析標準試薬として製造し
たが、その方法は下記の通りのものであった。即ち、局
方亜ひ酸三酸化二ひ素を水酸化ナトリウム溶液に溶解し
た後、二酸化炭素ガスを通じて三酸化二ひ素を析出させ
る。この操作を繰り返して精製する。ついで精製した三
酸化二ひ素を塩酸に溶解する。水を加え加水分解して三
酸化二ひ素を析出、この操作も繰り返して精製する。更
に昇華精製操作を繰り返し行い、三酸化二ひ素含有率を
よう素滴定法により決定し、三酸化二ひ素の含有率9
9.98%以上を保証した製品を得ていた。
Also, at the Osaka Industrial Testing Laboratory (currently the Osaka Institute of Industrial Technology), for more than 10 years since the early Showa period,
High purity diarsenic trioxide was prepared as a volumetric standard reagent and the method was as follows. That is, after the pharmacopoeia diarsenic trioxide is dissolved in a sodium hydroxide solution, carbon dioxide gas is passed to precipitate the diarsenic trioxide. This operation is repeated for purification. The purified arsenic trioxide is then dissolved in hydrochloric acid. Add water to hydrolyze to precipitate arsenic trioxide, and repeat this procedure for purification. Further, the sublimation purification operation was repeated, and the arsenic trioxide content was determined by an iodine titration method.
The product which guarantees 9.98% or more was obtained.

【0006】なお、現在使用されている日本標準規格
(JISK8005−1992)容量分析用標準物質で
は、三酸化二ひ素の品質を下記のように規定している。 純度 99.95%以上 アンモニア水溶液 試験適合試料1gにアンモニア水
(2+3)10mlを加え加熱溶解し冷却後、水で液量
を20mlとした後澄明であること 強熱残分(硫酸塩) 0.01%以下 塩化物(Cl) 0.001%以下 硫化物(S) 0.001%以下 銅(Cu) 5ppm以下 鉛(Pb) 5ppm以下 アンチモン(Sb) 0.001%以下 鉄(Fe) 5ppm以下
Incidentally, in the currently used Japanese standard (JIS K8005-1992) standard material for volumetric analysis, the quality of arsenic trioxide is specified as follows. Purity 99.95% or more Aqueous ammonia solution 10 g of ammonia water (2 + 3) was added to 1 g of the test-compatible sample, dissolved by heating, cooled, and adjusted to 20 ml with water to be clear. Ignition residue (sulfate) 01% or less Chloride (Cl) 0.001% or less Sulfide (S) 0.001% or less Copper (Cu) 5 ppm or less Lead (Pb) 5 ppm or less Antimony (Sb) 0.001% or less Iron (Fe) 5 ppm or less

【0007】上記に説明した通り、高純度金属の原料と
して生産される三酸化二ひ素は目的が異なり、標準物質
用高純度三酸化二ひ素としては利用できない欠点があ
り、又旧大阪工業試験所の精製法は工程が著しく長く、
現在生産される高含有率三酸化二ひ素を原料とする場合
には実用的でない。そして、日本標準規格中には標準物
質としての三酸化二ひ素の品質の規定はあるが、国産品
は全く製造されておらず、すべて輸入品にたよっている
のが現状である。ちなみに通商産業省通商産業検査所の
発表によれば、国内においてここ10数年間容量分析用
標準物質として保証した三酸化二ひ素は生産されていな
い。
As explained above, arsenic trioxide produced as a raw material for high-purity metal has a different purpose, and has the drawback that it cannot be used as high-purity diarsenic trioxide for standard substances. The purification method is extremely long,
It is not practical when the currently produced high content diarsenic trioxide is used as a raw material. And although there is a regulation on the quality of arsenic trioxide as a standard substance in the Japanese standard, the current situation is that domestic products are not manufactured at all and all are imported. Incidentally, according to the announcement by the Trade and Industry Inspection Office of the Ministry of International Trade and Industry, diarsenic trioxide, which has been guaranteed as a standard substance for volumetric analysis in the past 10 years, has not been produced.

【発明が解決しようとする課題】[Problems to be Solved by the Invention]

【0008】本発明は上記の問題点を解決するもので、
本発明の目的は高含有率三酸化二ひ素を出発原料とし、
簡単な器具・設備を用いた湿式法により、99.99%
以上の含有率をもつ高純度三酸化二ひ素を製造するにあ
る。
The present invention solves the above problems.
The object of the present invention is to use a high content of arsenic trioxide as a starting material,
99.99% by the wet method using simple equipment and facilities
The purpose is to produce high-purity diarsenic trioxide having the above content.

【課題を解決するための手段】[Means for Solving the Problems]

【0009】本発明は、高含有率三酸化二ひ素の一定量
を水と共に加熱溶解し三酸化二ひ素の熱飽和溶液とな
し、これに飽和亜硫酸水等の還元剤の一定量を加え、引
き続き加熱し、5価のひ素を3価のひ素に還元し、これ
を急冷又は冷エタノール溶液中に攪拌しつつ加え、三酸
化二ひ素を析出させる簡単な操作の湿式法によって高純
度三酸化二ひ素(含有率99.99%以上)を得たもの
である。
In the present invention, a certain amount of arsenic trioxide with a high content is dissolved by heating with water to form a thermally saturated solution of arsenic trioxide, to which a certain amount of a reducing agent such as saturated aqueous solution of sulfite is added. High-purity diarsenic trioxide is obtained by heating and reducing pentavalent arsenic to trivalent arsenic, and then adding this to a quenching or cold ethanol solution with stirring to precipitate diarsenic trioxide by a simple wet process. (The content rate is 99.99% or more).

【0010】還元剤としては、亜硫酸水、ヒドラジン溶
液等の通常のものを使用できる。使用還元剤の量は、原
料三酸化二ひ素中に含まれる五酸化二ひ素の量によって
変り、5価のひ素を3価のひ素に還元するに十分な量使
用する。
As the reducing agent, conventional ones such as aqueous sulfite and hydrazine solution can be used. The amount of the reducing agent used varies depending on the amount of diarsenic pentoxide contained in the raw material arsenic trioxide, and is used in an amount sufficient to reduce pentavalent arsenic to trivalent arsenic.

【0011】次に実施例によって、本発明を説明する。The present invention will be described below with reference to examples.

【実施例1】高含有率三酸化二ひ素(98.0%)90
gに純水1000mlを加え、溶解するまで静かに掻き
混ぜながら加熱して溶解させた。ついで飽和亜硫酸水1
00mlを掻き混ぜながら加えた後、引き続き加熱して
蒸発し三酸化二ひ素の結晶が析出する直前まで濃縮し
た。この溶液を激しく掻き混ぜながら氷冷水中に入れ急
速に冷却し、できるだけ低温に保持した。次に、ガラス
濾過器を用い吸引ろ別した。冷却した純水100mlを
濾過器に加え吸引し結晶を洗浄した。この洗浄操作を2
〜3回繰り返した。結晶は容器に移し入れ約100℃で
不着水がなくなるまで乾燥した後、清浄な酸化アルミニ
ウム乳鉢を用いて軽く磨りつぶし、再び約150〜20
0℃で乾燥した。尚、よう素滴定法により三酸化二ひ素
含有率99.95%を標準として製品を数回滴定した結
果いずれも99.99%の含有率であった。高純度三酸
化二ひ素の収率は数回の実験では約70%であった。
Example 1 High content diarsenic trioxide (98.0%) 90
1000 ml of pure water was added to g and dissolved by heating while gently stirring until dissolved. Then saturated saturated sulfite water 1
After adding 00 ml with stirring, the mixture was continuously heated and evaporated to concentrate until just before arsenic trioxide crystals were precipitated. The solution was placed in ice-cold water with vigorous stirring to cool rapidly and kept as cold as possible. Next, suction filtration was performed using a glass filter. 100 ml of cooled pure water was added to the filter and suctioned to wash the crystals. This cleaning operation 2
Repeated ~ 3 times. The crystals were transferred to a container, dried at about 100 ° C. until there was no non-adhered water, then lightly ground in a clean aluminum oxide mortar, and again about 150 to 20.
It was dried at 0 ° C. The product was titrated several times by the iodine titration method with the arsenic trioxide content of 99.95% as the standard, and the results were 99.99% in all cases. The yield of high purity diarsenic trioxide was about 70% in several experiments.

【0012】[0012]

【実施例2】実施例1と全く同一操作を行い、得られた
飽和三酸化二ひ素溶液を少量ずつ冷却、攪拌するエタノ
ール(98%)中に加え、加水分解させ微細な結晶の三
酸化二ひ素を析出させた。次いでガラス濾過器を用い吸
引ろ別した。冷却した純水100mlを濾過器に加え吸
引し結晶を洗浄した。この洗浄操作を2〜3回繰り返し
た。結晶は容器に移し入れ乾燥器中で徐々に温度を上昇
させ約70℃で約1時間乾燥した。引き続き温度を約1
00℃に上昇させ乾燥した。以下実施例1と同操作で乾
燥した。得られた結晶の三酸化二ひ素含有率は99.9
9%で、収率は約80%以上であった。
Example 2 The same operation as in Example 1 was carried out, and the obtained saturated diarsenic trioxide solution was added little by little to ethanol (98%) which was cooled and stirred, and hydrolyzed to give fine crystal dioxide trioxide. Arsenic was deposited. Then, suction filtration was performed using a glass filter. 100 ml of cooled pure water was added to the filter and suctioned to wash the crystals. This washing operation was repeated 2-3 times. The crystals were transferred to a container and gradually heated in a dryer to be dried at about 70 ° C. for about 1 hour. Continue to increase the temperature to about 1
The temperature was raised to 00 ° C and dried. Then, the same operation as in Example 1 was performed. The content of arsenic trioxide in the obtained crystals was 99.9.
At 9%, the yield was about 80% or higher.

【0013】[0013]

【発明の効果】本発明によれば、簡単な操作の湿式法に
よって標準物質として充分使用できる高純度の三酸化二
ひ素を製造できる。
According to the present invention, a high-purity diarsenic trioxide that can be sufficiently used as a standard substance can be produced by a wet method with a simple operation.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 五酸化二ひ素などの不純物を含む高含有
率三酸化二ひ素の飽和水溶液を作り、次いでこの溶液に
還元剤を加え加熱して五価ひ素を三価ひ素に還元すると
共にこの溶液を蒸発濃縮して再び三酸化二ひ素の飽和溶
液とし、次いでこの飽和溶液を激しく攪拌しながら、急
速に冷却又はエタノール中に加えて微細な三酸化二ひ素
の結晶を析出させ、次いでこの結晶を濾別し、冷却純水
で洗浄した後、付着水がなくなるまで十分乾燥すること
を特徴とする高純度三酸化二ひ素の製造法。
1. A saturated aqueous solution of diarsenic trioxide with a high content containing impurities such as diarsenic pentoxide is prepared, and a reducing agent is added to this solution and heated to reduce the pentavalent arsenic to trivalent arsenic. The solution is concentrated by evaporation again to a saturated solution of arsenic trioxide, and then the saturated solution is rapidly cooled or added to ethanol with vigorous stirring to precipitate fine crystals of arsenic trioxide. Is filtered, washed with cold pure water, and then dried sufficiently until there is no attached water. A method for producing high-purity diarsenic trioxide.
JP34516592A 1992-12-02 1992-12-02 Production of high purity diarsenic trioxide Pending JPH06171946A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34516592A JPH06171946A (en) 1992-12-02 1992-12-02 Production of high purity diarsenic trioxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34516592A JPH06171946A (en) 1992-12-02 1992-12-02 Production of high purity diarsenic trioxide

Publications (1)

Publication Number Publication Date
JPH06171946A true JPH06171946A (en) 1994-06-21

Family

ID=18374730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34516592A Pending JPH06171946A (en) 1992-12-02 1992-12-02 Production of high purity diarsenic trioxide

Country Status (1)

Country Link
JP (1) JPH06171946A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7232554B2 (en) * 2000-12-14 2007-06-19 Barrick Gold Corporation Process for recovering arsenic from acidic aqueous solution

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5040499A (en) * 1973-02-14 1975-04-14 Boliden Ab
JPS5527011A (en) * 1978-08-14 1980-02-26 Hitachi Ltd Adsorbent for iodine

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5040499A (en) * 1973-02-14 1975-04-14 Boliden Ab
JPS5527011A (en) * 1978-08-14 1980-02-26 Hitachi Ltd Adsorbent for iodine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7232554B2 (en) * 2000-12-14 2007-06-19 Barrick Gold Corporation Process for recovering arsenic from acidic aqueous solution

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