JPH06160703A - Focus detector - Google Patents

Focus detector

Info

Publication number
JPH06160703A
JPH06160703A JP4308824A JP30882492A JPH06160703A JP H06160703 A JPH06160703 A JP H06160703A JP 4308824 A JP4308824 A JP 4308824A JP 30882492 A JP30882492 A JP 30882492A JP H06160703 A JPH06160703 A JP H06160703A
Authority
JP
Japan
Prior art keywords
focus detection
optical system
pair
photographing
screen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4308824A
Other languages
Japanese (ja)
Inventor
Yosuke Kusaka
洋介 日下
Takeshi Utagawa
健 歌川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP4308824A priority Critical patent/JPH06160703A/en
Publication of JPH06160703A publication Critical patent/JPH06160703A/en
Pending legal-status Critical Current

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  • Focusing (AREA)
  • Automatic Focus Adjustment (AREA)

Abstract

PURPOSE:To improve the detecting accuracy of a focus by providing an optical element having a light diffusing characteristic near a scheduled focusing surface with respect to a focus detection optical system corresponding to a focus detection area at the peripheral part of a photographic picture. CONSTITUTION:The plural focus detection areas are set at the center and the peripheral part of the photographic picture provided on the scheduled focusing surface of a photographing optical system 3. Every focus detection area, the focus detection optical systems 10b and 30b and a pair of photoelectric conversion means 26 and 36 are provided. Then, a pair of luminous flux passed through the areas of the photographing optical system 3 whose exit pupils are different is guided to a pair of conversion means 26 and 36 and a pair of object images is formed again. Then, the focusing state of the optical system 3 of every focus detection area is detected. Besides, the optical element 350 having the light diffusing characteristic is provided near the scheduled focusing surface of the optical system 3 with respect to the optical system 30b. By the element 350, a pair of focus detection luminous flux made incident on the focus detection area at the peripheral part of the photographic picture from the exit pupil of the optical system 3 is diffused.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はカメラなどの焦点検出装
置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a focus detection device such as a camera.

【0002】[0002]

【従来の技術】撮影光学系の予定焦点面上に設けられた
撮影画面の中央とその周辺部に複数の焦点検出領域を設
定し、各焦点検出領域ごとに撮影光学系の焦点調節状態
を検出する焦点検出装置が知られている。この種の装置
では、各焦点検出領域ごとに焦点検出光学系と一対の光
電変換器を有し、焦点検出光学系により撮影光学系の射
出瞳の異なる領域を通過した一対の光束を一対の光電変
換器上に導いて一対の被写体像を再結像させ、一対の光
電変換器の出力信号により一対の被写体像の相対的な像
ずれ量を検出し、この像ずれ量に基づいて撮影光学系の
焦点調節状態、すなわち撮影光学系の結像面とフィルム
面とのデフォーカス量を検出している。なお、以下では
上記の焦点検出光学系を瞳分割型焦点検出光学系と呼
ぶ。
2. Description of the Related Art A plurality of focus detection areas are set at the center of a photographing screen provided on a planned focal plane of a photographing optical system and its peripheral portion, and the focus adjustment state of the photographing optical system is detected for each focus detection area. There are known focus detection devices. In this type of device, each focus detection area has a focus detection optical system and a pair of photoelectric converters, and a pair of light fluxes that have passed through different areas of the exit pupil of the photographing optical system by the focus detection optical system are converted into a pair of photoelectric converters. The pair of subject images are re-imaged by being guided to the converter, the relative image shift amount of the pair of subject images is detected by the output signals of the pair of photoelectric converters, and the photographing optical system is based on the image shift amount. The focus adjustment state, that is, the defocus amount between the image plane of the photographing optical system and the film surface is detected. In the following, the above focus detection optical system is referred to as a pupil division type focus detection optical system.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、従来の
焦点検出装置では、撮影光学系の開放Fナンバーが大き
い時に、撮影画面の周辺部の焦点検出領域において撮影
光学系による焦点検出光束のケラレが発生し、焦点検出
精度が低下するという問題がある。
However, in the conventional focus detection apparatus, when the open F-number of the photographing optical system is large, vignetting of the focus detection light beam by the photographing optical system occurs in the focus detection area in the peripheral portion of the photographing screen. However, there is a problem in that the focus detection accuracy decreases.

【0004】図22は撮影光学系による焦点検出光束の
ケラレの説明図であり、撮影画面の中央部に画面中心か
ら放射方向に細長く設定された焦点検出領域に対応する
瞳分割型焦点検出光学系の絞りマスク134から撮影光
学系3までを示す。絞りマスク134の一方の開口部1
35は、コンデンサーレンズ133により視野マスク1
31から所定の距離に設定された瞳上の領域45に投影
されており、視野マスク131の開口部132の点A,
B,Cを通る光束はそれぞれ図に示すような光路を通
る。一方、撮影光学系3には絞り137が設けられてお
り、絞り径が小さい、すなわち開放Fナンバーが大きい
と図に示すように点A,B,Cを通る光束の一部が絞り
137により遮光される、すなわちケラレが発生する。
FIG. 22 is an explanatory view of vignetting of a focus detection light beam by the photographing optical system, and a pupil division type focus detection optical system corresponding to a focus detection area which is elongated in the radial direction from the center of the photographing screen in the central portion of the photographing screen. The diaphragm mask 134 to the photographing optical system 3 are shown. One opening 1 of the diaphragm mask 134
35 is a visual field mask 1 due to the condenser lens 133.
31 is projected on the area 45 on the pupil set at a predetermined distance from 31, and the point A of the opening 132 of the visual field mask 131,
The light fluxes passing through B and C respectively pass through the optical paths shown in the figure. On the other hand, the photographic optical system 3 is provided with the diaphragm 137, and if the diaphragm diameter is small, that is, if the open F number is large, a part of the light flux passing through the points A, B and C is blocked by the diaphragm 137 as shown in the figure. That is, vignetting occurs.

【0005】図23は、上記の点A,B,Cを通る光束
がそれぞれ絞り137を通過する領域41,42,43
を示す。図に示すように、点Aを通る光束の領域41が
最もケラレが大きく、点Cに近づくにつれてケラレが少
なくなっている。絞りマスク134のもう一方の開口部
136に対しては、上記の開口部135の場合と対称に
なり、点Cを通る光束の領域43が最もケラレが大き
く、点Aに近づくにつれケラレが少なくなる。
FIG. 23 shows areas 41, 42 and 43 where the light fluxes passing through the points A, B and C pass through the diaphragm 137, respectively.
Indicates. As shown in the figure, the region 41 of the light flux passing through the point A has the largest vignetting, and the vignetting decreases as it approaches the point C. With respect to the other opening 136 of the aperture mask 134, it becomes symmetrical with the case of the above-mentioned opening 135, and the region 43 of the light flux passing through the point C has the largest vignetting, and the vignetting decreases as it approaches the point A. .

【0006】図24は、被写体が一様輝度の場合に、図
22に示す焦点検出光学系によって不図示の一対の光電
変換器上に結像される一対の被写体像の光強度分布を示
し、横軸が光電変換器の複数の受光素子の並び方向を示
し、縦軸が各受光素子により検出された光強度を示す。
図において、実線は絞りマスク134の開口部135を
通る光束による被写体像の光強度分布を示し、破線は開
口部136を通る光束による被写体像の光強度分布を示
す。開口部135を通る光束による被写体像(実線)
は、ケラレの大きな点Aを通る光束の光強度が最も低
く、ケラレの少ない点Cに近づくにつれて光強度が大き
くなる。一方、開口部136を通る光束による被写体像
(破線)は、ケラレの大きな点Cを通る光束の光強度が
最も低く、ケラレの少ない点Aに近づくにつれて光強度
が大きくなる。焦点検出は、開口部135,136を通
る一対の光束による一対の被写体像の光強度分布を検出
し、一対の被写体像の相対的なずれ量に基づいて撮影光
学系3の焦点調節状態を検出するので、一対の被写体像
の光強度分布の一致度が図24に示すように低いと焦点
検出が困難となる。なお、以上の説明は焦点検出領域が
中央に配置された場合であるが、焦点検出領域の位置が
光軸から離れるほど、すなわち周辺部になるほどケラレ
が発生しやすくなる。
FIG. 24 shows a light intensity distribution of a pair of subject images formed on a pair of photoelectric converters (not shown) by the focus detection optical system shown in FIG. 22 when the subject has a uniform luminance. The horizontal axis represents the arrangement direction of the plurality of light receiving elements of the photoelectric converter, and the vertical axis represents the light intensity detected by each light receiving element.
In the figure, the solid line shows the light intensity distribution of the subject image due to the light flux passing through the opening 135 of the aperture mask 134, and the broken line shows the light intensity distribution of the subject image due to the light flux passing through the opening 136. Object image (solid line) by light flux passing through the opening 135
Indicates that the light intensity of the light flux passing through the point A with large vignetting is the lowest, and the light intensity increases toward the point C with less vignetting. On the other hand, in the subject image (broken line) formed by the light flux passing through the opening 136, the light intensity of the light flux passing through the point C with large vignetting is the lowest, and the light intensity increases toward the point A with less vignetting. The focus detection detects the light intensity distribution of the pair of subject images by the pair of light fluxes passing through the openings 135 and 136, and detects the focus adjustment state of the photographing optical system 3 based on the relative shift amount of the pair of subject images. Therefore, if the degree of coincidence of the light intensity distributions of the pair of subject images is low as shown in FIG. 24, focus detection becomes difficult. Although the above description is for the case where the focus detection area is arranged in the center, vignetting is more likely to occur as the position of the focus detection area is farther from the optical axis, that is, closer to the peripheral portion.

【0007】本発明の目的は、撮影光学系による焦点検
出光束のケラレの影響を軽減して撮影画面の周辺部の焦
点検出領域における焦点検出精度を向上させた焦点検出
装置を提供することにある。
It is an object of the present invention to provide a focus detecting device which reduces the influence of vignetting of the focus detecting light beam by the photographing optical system and improves the focus detecting accuracy in the focus detecting area in the peripheral portion of the photographing screen. .

【0008】[0008]

【課題を解決するための手段】第1の実施例を示す図1
2に対応づけて本発明を説明すると、請求項1の発明
は、撮影光学系3の予定焦点面上に設けられた撮影画面
の中央とその周辺部に複数の焦点検出領域を設定し、各
焦点検出領域ごとに焦点検出光学系20b,30bと一
対の光電変換手段26,36を有し、焦点検出光学系2
0b,30bにより撮影光学系3の射出瞳の異なる領域
を通過した一対の光束を一対の光電変換手段26,36
上に導いて一対の被写体像を再結像させ、各焦点検出領
域ごとの撮影光学系3の焦点調節状態を検出する焦点検
出装置に適用される。そして、撮影画面の周辺部の焦点
検出領域に対応する焦点検出光学系30bに対して、撮
影光学系3の予定焦点面近傍に光拡散特性を有する光学
要素350を設けることにより、上記目的を達成する。
請求項2の焦点検出装置の撮影画面周辺部の焦点検出領
域は、撮影画面の中心から放射方向に延びる帯状の領域
である。
FIG. 1 showing a first embodiment.
The present invention will be described in association with No. 2. In the invention of claim 1, a plurality of focus detection areas are set in the center of the photographing screen provided on the planned focal plane of the photographing optical system 3 and its peripheral portion. The focus detection optical system 20b, 30b and the pair of photoelectric conversion means 26, 36 are provided for each focus detection area, and the focus detection optical system 2 is provided.
A pair of light fluxes that have passed through different regions of the exit pupil of the photographic optical system 3 by 0b and 30b, a pair of photoelectric conversion means 26 and 36.
The present invention is applied to a focus detection device that guides the image upward to re-image a pair of subject images and detects the focus adjustment state of the photographing optical system 3 for each focus detection area. The above object is achieved by providing the optical element 350 having the light diffusion characteristic in the vicinity of the planned focal plane of the photographing optical system 3 with respect to the focus detection optical system 30b corresponding to the focus detection area in the peripheral portion of the photographing screen. To do.
The focus detection area in the peripheral part of the photographing screen of the focus detecting device according to the second aspect is a strip-shaped area extending in the radial direction from the center of the photographing screen.

【0009】[0009]

【作用】光学要素350は、撮影光学系3の射出瞳から
撮影画面周辺部の焦点検出領域へ入射する一対の焦点検
出用光束を拡散させる。すなわち、射出瞳上の焦点検出
用光束の通過領域を拡大して撮影光学系によるケラレや
収差の影響を軽減する。
The optical element 350 diffuses a pair of focus detection light fluxes which are incident from the exit pupil of the photographing optical system 3 to the focus detection area in the peripheral portion of the photographing screen. That is, the passing area of the focus detection light beam on the exit pupil is enlarged to reduce the influence of vignetting and aberration by the photographing optical system.

【0010】なお、本発明の構成を説明する上記課題を
解決するための手段および作用の項では、本発明を分り
やすくするために実施例の図を用いたが、これにより本
発明が実施例に限定されるものではない。
Incidentally, in the section of means and action for solving the above problems for explaining the constitution of the present invention, the drawings of the embodiments are used for the purpose of making the present invention easy to understand. It is not limited to.

【0011】[0011]

【実施例】【Example】

−第1の実施例− 図1は、第1の実施例の焦点検出装置を備えたカメラの
撮影光学系の光軸に沿った断面図である。カメラボディ
1には交換可能なレンズ鏡筒2が装着され、レンズ鏡筒
2内には撮影光学系3が設けられる。被写体からの光束
は、撮影光学系3を通過してハーフミラーから成るメイ
ンミラー4へ導かれ、一部がメインミラー4を透過して
サブミラー5へ到達し、一部がメインミラー4に反射さ
れてスクリーン6、ペンタプリズム7、接眼レンズ8な
どから構成されるファインダー9へ導かれる。サブミラ
ー5に到達した光束は、シャッター10の方向からさら
にボディ底方向に偏向され、撮影光学系3の予定焦点面
に設置される複数の瞳分割型再結像方式の焦点検出モジ
ュール20,30,40へ導かれる。なお、焦点検出モ
ジュール30,40はカメラの正面から見て焦点検出モ
ジュール20の左右に配置(図1では、紙面の上下)さ
れ、図2に示すように撮影光学系3の予定焦点面近傍に
拡散板350,450をそれぞれ備えている。
First Embodiment FIG. 1 is a sectional view taken along the optical axis of a photographing optical system of a camera equipped with the focus detection device of the first embodiment. A replaceable lens barrel 2 is attached to the camera body 1, and a photographing optical system 3 is provided in the lens barrel 2. The light flux from the subject passes through the photographing optical system 3 and is guided to the main mirror 4 which is a half mirror. Part of the light flux passes through the main mirror 4, reaches the sub-mirror 5, and part of the light is reflected by the main mirror 4. Is guided to a finder 9 including a screen 6, a pentaprism 7, an eyepiece lens 8 and the like. The light flux that has reached the sub-mirror 5 is further deflected from the direction of the shutter 10 toward the bottom of the body, and the plurality of pupil division type re-imaging type focus detection modules 20, 30, which are installed on the planned focal plane of the photographing optical system 3. You are led to 40. The focus detection modules 30 and 40 are arranged on the left and right of the focus detection module 20 when viewed from the front of the camera (in FIG. 1, above and below the plane of the drawing), and near the planned focal plane of the photographing optical system 3 as shown in FIG. The diffuser plates 350 and 450 are provided, respectively.

【0012】図3は、各焦点検出モジュール20,3
0,40の焦点検出領域を示す。撮影光学系3の予定焦
点面上に設けられた撮影画面Mの中央とその周辺部に、
3個の十字型の焦点検出領域20a,30a,40aを
設定する。焦点検出モジュール20は中央の焦点検出領
域20aに対応し、周辺部の焦点検出領域30a,40
aはそれぞれ焦点検出モジュール30,40に対応す
る。周辺部の焦点検出領域30a,40aは、撮影画面
Mの中心から放射方向に延びる帯状の領域301,40
1(以下では、放射方向の領域と呼ぶ)と、撮影画面M
の中心を円の中心とする同心円の接線方向に延びる帯状
の領域302,402(以下では、接線方向の領域と呼
ぶ)とを有する。
FIG. 3 shows each focus detection module 20, 3
The focus detection areas of 0 and 40 are shown. In the center of the photographing screen M provided on the planned focal plane of the photographing optical system 3 and its peripheral portion,
Three cross-shaped focus detection areas 20a, 30a, 40a are set. The focus detection module 20 corresponds to the central focus detection area 20a, and the peripheral focus detection areas 30a and 40a.
a corresponds to the focus detection modules 30 and 40, respectively. The focus detection areas 30a and 40a in the peripheral portions are band-shaped areas 301 and 40 extending in the radial direction from the center of the photographing screen M.
1 (hereinafter, referred to as a radial area), the shooting screen M
Band-shaped regions 302 and 402 (hereinafter, referred to as tangential direction regions) extending in the tangential direction of a concentric circle having the center of the circle as the center of the circle.

【0013】図4は、焦点検出モジュール20と撮影光
学系3の射出瞳12との位置関係を展開して示した斜視
図である。焦点検出モジュール20は、撮影光学系3の
光軸上に配置され、焦点検出光学系20bとCCDなど
のセンサー26を有する。焦点検出光学系20bは、十
字型の開口部211を有する視野マスク21、コンデン
サーレンズ22、二対の絞り開口部241,242、2
43,244を有する絞りマスク24、二対の再結像レ
ンズ251,252、253,254などから構成さ
れ、センサー26は二対の受光部261,262、26
3,264を有する。なお、センサー26の受光部26
1〜264はそれぞれ複数の画素から構成される。ま
た、視野マスク21の開口部211の中心は予定焦点面
近傍の光軸上に設置されており、これにより撮影画面M
の中央に焦点検出位置が設定される。
FIG. 4 is an exploded perspective view showing the positional relationship between the focus detection module 20 and the exit pupil 12 of the photographing optical system 3. The focus detection module 20 is arranged on the optical axis of the photographing optical system 3, and has a focus detection optical system 20b and a sensor 26 such as a CCD. The focus detection optical system 20b includes a field mask 21 having a cross-shaped opening 211, a condenser lens 22, and two pairs of aperture openings 241, 242, and 2.
The sensor 26 is composed of a diaphragm mask 24 having 43, 244, two pairs of re-imaging lenses 251, 252, 253, 254, etc.
3,264. The light receiving portion 26 of the sensor 26
Each of 1 to 264 is composed of a plurality of pixels. Further, the center of the opening 211 of the field mask 21 is installed on the optical axis near the planned focal plane, whereby the photographing screen M is displayed.
The focus detection position is set at the center of.

【0014】図5は、絞り24の二対の絞り開口部24
1,242、243,244を正面から見た図である。
これらの二対の絞り開口部241,242、243,2
44は、コンデンサーレンズ22によって図6に示すよ
うに撮影光学系3の射出瞳12の光軸に対して対称な二
対の領域121,122、123,124に投影され
る。撮影光学系3は、これらの領域121〜124を通
る光束により予定焦点面近傍の光軸上、すなわち視野マ
スク21の近傍に被写体の一次像を形成する。視野マス
ク21の開口部211に形成された一次像は、コンデン
サーレンズ22と二対の絞り開口部241,242、2
43,244を通り、二対の再結像レンズ251,25
2、253,254によりセンサー26の二対の受光部
261,262、263,264上に二対の二次像とし
て再結像される。
FIG. 5 shows two pairs of diaphragm openings 24 of the diaphragm 24.
It is the figure which looked at 1,242,243,244 from the front.
These two pairs of aperture openings 241, 242, 243, 2
The condenser lens 44 is projected by the condenser lens 22 onto two pairs of regions 121, 122, 123 and 124 which are symmetrical with respect to the optical axis of the exit pupil 12 of the photographing optical system 3, as shown in FIG. The photographing optical system 3 forms a primary image of the subject on the optical axis near the planned focal plane, that is, near the field mask 21 by the light flux passing through these areas 121 to 124. The primary image formed in the opening 211 of the visual field mask 21 is formed by the condenser lens 22 and the two pairs of aperture openings 241, 242, 2 and 2.
43, 244 and two pairs of re-imaging lenses 251, 25
2, 253, 254 re-images as two pairs of secondary images on the two pairs of light receiving portions 261, 262, 263, 264 of the sensor 26.

【0015】二対の受光部261,262、263,2
64上に結像された二対の二次像は、それぞれの受光部
で光強度分布に応じて光電変換され、電気的な被写体像
信号が生成される。周知のように、この被写体像信号に
基づいてセンサー26上で対になった二次像の受光部対
並び方向の相対的位置関係を検出することにより、撮影
光学系3の焦点調節状態、すなわち結像面と予定焦点面
とのデフォーカス量を検出することができる。このよう
に、焦点検出モジュール20は撮影画面Mの中央に設定
された十字型の焦点検出領域におけるデフォーカス量を
正確に検出する。
Two pairs of light receiving parts 261, 262, 263, 2
The two pairs of secondary images formed on 64 are photoelectrically converted by the respective light receiving portions according to the light intensity distribution, and an electrical subject image signal is generated. As is well known, the focus adjustment state of the photographing optical system 3, that is, the focus adjustment state of the photographing optical system 3 The defocus amount between the image plane and the planned focal plane can be detected. In this way, the focus detection module 20 accurately detects the defocus amount in the cross-shaped focus detection area set in the center of the shooting screen M.

【0016】図7は、焦点検出モジュール30と撮影光
学系3の射出瞳12との位置関係を展開して示した斜視
図である。焦点検出モジュール30は、撮影光学系3の
光軸外に配置され、焦点検出光学系30bとCCDなど
のセンサー36を有する。焦点検出光学系30bは、拡
散板350、十字型の開口部311を有する視野マスク
31、コンデンサーレンズ32、二対の絞り開口部34
1,342、343,344を有する絞りマスク34、
二対の再結像レンズ351,352、353,354な
どから構成され、センサー36は二対の受光部361,
362、363,364を有する。拡散板350は、視
野マスク31の近傍、すなわち撮影光学系3の予定焦点
面近傍に配置されており、図8に示す拡散特性を備えて
いる。なお、センサー36の受光部361〜364はそ
れぞれ複数の画素から構成される。また、視野マスクの
開口部311は予定焦点面近傍の光軸外に設置されてお
り、これにより撮影画面Mの周辺部に焦点検出位置が設
定される。
FIG. 7 is an exploded perspective view showing the positional relationship between the focus detection module 30 and the exit pupil 12 of the photographing optical system 3. The focus detection module 30 is arranged outside the optical axis of the photographing optical system 3, and has a focus detection optical system 30b and a sensor 36 such as a CCD. The focus detection optical system 30b includes a diffusion plate 350, a field mask 31 having a cross-shaped opening 311, a condenser lens 32, and two pairs of aperture openings 34.
A diaphragm mask 34 having 1,342, 343, 344,
The sensor 36 is composed of two pairs of re-imaging lenses 351, 352, 353, 354, etc.
362, 363, 364. The diffusion plate 350 is arranged near the field mask 31, that is, near the planned focal plane of the photographing optical system 3, and has the diffusion characteristics shown in FIG. The light receiving units 361 to 364 of the sensor 36 are each composed of a plurality of pixels. Further, the opening 311 of the visual field mask is provided outside the optical axis in the vicinity of the planned focal plane, whereby the focus detection position is set in the peripheral portion of the photographing screen M.

【0017】二対の絞り開口部341,342、34
3,344は、コンデンサーレンズ32および拡散板3
50により撮影光学系3の射出瞳12の光軸に対して対
称な二対の領域125,126、127,128に投影
される。これら領域125,126、127,128
は、図9に示すように、拡散板350の拡散作用により
拡散板350のない場合の領域121,122、12
3,124より大きい。なお、コンデンサーレンズ32
と二対の絞り開口部341,342、343,344の
配置は、拡散板350がない場合に、二対の絞り開口部
341,342、343,344がコンデンサーレンズ
32により焦点検出モジュール20と同じ領域121,
122、123,124に投影されるように決定する。
Two pairs of aperture openings 341, 342, 34
3, 344 are the condenser lens 32 and the diffusion plate 3
The image is projected onto two pairs of regions 125, 126, 127, 128 which are symmetric with respect to the optical axis of the exit pupil 12 of the photographing optical system 3 by 50. These areas 125, 126, 127, 128
As shown in FIG. 9, due to the diffusion action of the diffusion plate 350, the regions 121, 122, 12 without the diffusion plate 350 are formed.
Greater than 3,124. The condenser lens 32
The arrangement of the two pairs of aperture openings 341, 342, 343, 344 is the same as that of the focus detection module 20 due to the condenser lens 32 in the two pairs of aperture openings 341, 342, 343, 344 when the diffusion plate 350 is not provided. Area 121,
It is determined that the images are projected on 122, 123, and 124.

【0018】図10は、撮影光学系3の射出瞳12に投
影される絞りマスク34の開口部343,344の領域
を示す焦点検出光学系30bの断面図である。拡散板3
50の拡散作用によって、拡散板350がない場合の射
出瞳12上の領域123,124よりも大きな領域12
7,128を通過した光束が、絞りマスク開口部34
3,344へ入射する。また、図示を省略するが、拡散
板350の拡散作用によって、拡散板350がない場合
の射出瞳12上の領域121,122よりも大きな領域
125,126を通過した光束が、絞りマスク開口部3
41,342へ入射する。つまり、拡散板350の拡散
作用によって、射出瞳12上の領域121〜124の輪
郭部がぼけて拡大し、領域125〜128の形状にな
る。
FIG. 10 is a sectional view of the focus detection optical system 30b showing the areas of the openings 343 and 344 of the aperture mask 34 projected on the exit pupil 12 of the photographing optical system 3. Diffuser 3
Due to the diffusing action of 50, a region 12 larger than the regions 123 and 124 on the exit pupil 12 in the absence of the diffuser plate 350.
The light flux that has passed through 7,128 is the aperture mask opening 34
It is incident on 3,344. Further, although not shown in the drawing, due to the diffusing action of the diffusing plate 350, the light flux that has passed through the regions 125 and 126 larger than the regions 121 and 122 on the exit pupil 12 in the case where the diffusing plate 350 is not provided is used as the aperture mask opening 3.
It is incident on 41 and 342. That is, due to the diffusing action of the diffusing plate 350, the contours of the regions 121 to 124 on the exit pupil 12 are blurred and enlarged, and the shapes of the regions 125 to 128 are formed.

【0019】撮影光学系3は、射出瞳12上の領域12
5〜128を通る光束により予定焦点面近傍の光軸外、
すなわち視野マスク31の近傍に被写体の一次像を形成
する。視野マスク31の開口部311に形成された一次
像は、コンデンサーレンズ32と二対の絞り開口部34
1,342、343,344を通り、二対の再結像レン
ズ351,352、353,354によりセンサー36
の二対の受光部361,362、363,364上に二
対の二次像として再結像される。
The photographing optical system 3 includes an area 12 on the exit pupil 12.
Off the optical axis near the planned focal plane due to the light flux passing through 5 to 128,
That is, a primary image of the subject is formed near the field mask 31. The primary image formed in the opening 311 of the visual field mask 31 includes a condenser lens 32 and two pairs of aperture openings 34.
1, 342, 343, 344, and two pairs of re-imaging lenses 351, 352, 353, 354 for sensor 36.
Are re-imaged as two pairs of secondary images on the two pairs of light receiving portions 361, 362, 363, 364.

【0020】二対の受光部361,362、363,3
64上に結像された二対の二次像は、それぞれの受光部
で光強度分布に応じて光電変換され、電気的な被写体像
信号が生成される。この被写体像信号に基づいてセンサ
ー36上で対になった二次像の受光部対並び方向の相対
的位置関係を検出することにより、撮影光学系3のデフ
ォーカス量を検出する。このように、焦点検出モジュー
ル30は撮影画面Mの周辺に設定された十字型の焦点検
出領域30aにおけるデフォーカス量を正確に検出す
る。なお、焦点検出モジュール40は上記焦点検出モジ
ュール30と光軸に対して対称な位置に配置されるだけ
で、その構成および作用は焦点検出モジュール30と同
様であるので説明を省略する。
Two pairs of light receiving parts 361, 362, 363, 3
The two pairs of secondary images formed on 64 are photoelectrically converted by the respective light receiving portions according to the light intensity distribution, and an electrical subject image signal is generated. The defocus amount of the photographing optical system 3 is detected by detecting the relative positional relationship between the pair of secondary images on the sensor 36 in the alignment direction of the light receiving units based on the subject image signal. In this way, the focus detection module 30 accurately detects the defocus amount in the cross-shaped focus detection area 30a set around the shooting screen M. Note that the focus detection module 40 is arranged at a position symmetrical to the focus detection module 30 with respect to the optical axis, and the configuration and operation thereof are the same as those of the focus detection module 30, so description thereof will be omitted.

【0021】図11は撮影光学系3と焦点検出モジュー
ル20,30との位置関係を示す斜視図であり、図12
はその断面図を示している。図に示すように、撮影光学
系3の光軸11上には拡散板を備えていない焦点検出モ
ジュール20が配置され、光軸から離れた位置に拡散板
350を備えた焦点検出モジュール30が配置される。
この図では焦点検出モジュール40を図示していない
が、光軸11に対して焦点検出モジュール30と対称な
位置に配置される。
FIG. 11 is a perspective view showing the positional relationship between the photographing optical system 3 and the focus detection modules 20 and 30, and FIG.
Shows the sectional view. As shown in the figure, the focus detection module 20 having no diffusion plate is arranged on the optical axis 11 of the photographing optical system 3, and the focus detection module 30 having the diffusion plate 350 is arranged at a position apart from the optical axis. To be done.
Although the focus detection module 40 is not shown in this figure, it is arranged at a position symmetrical to the focus detection module 30 with respect to the optical axis 11.

【0022】撮影画面Mの周辺部の焦点検出領域に対応
する焦点検出光学系に対して、撮影光学系3の予定焦点
面近傍の光軸外に拡散板を設けると、図22,23に示
す点A,B,Cを通る光束が絞り137を通過する領域
41,42,43は、拡散板の拡散作用によってそれぞ
れ図25に示す領域51,52,53に拡大する。これ
によって、点Aまたは点Cを通過する光束のケラレの程
度が少なくなり、一対の被写体像の光強度分布は図26
に示すようになり、図24に示す拡散板を用いない場合
に較べて一致度が改善される。図26に示す一対の被写
体像の光強度分布はハイパスフィルタなどで低周波成分
の不一致を除去することによりさらに一致度が高くな
り、十分、焦点検出が可能となる。
22 and 23, when a diffusion plate is provided outside the optical axis in the vicinity of the planned focal plane of the photographing optical system 3 with respect to the focus detection optical system corresponding to the focus detection area in the peripheral portion of the photographing screen M, it is shown in FIGS. Areas 41, 42, 43 where the light flux passing through the points A, B, C pass through the diaphragm 137 are expanded to areas 51, 52, 53 shown in FIG. 25 by the diffusion action of the diffusion plate. As a result, the degree of vignetting of the light flux passing through the point A or the point C is reduced, and the light intensity distribution of the pair of subject images is shown in FIG.
24, the degree of coincidence is improved as compared with the case where the diffuser plate shown in FIG. 24 is not used. In the light intensity distributions of the pair of subject images shown in FIG. 26, the degree of coincidence is further increased by removing the inconsistency of low frequency components with a high pass filter or the like, and focus detection can be sufficiently performed.

【0023】次に、このような焦点検出光束のケラレの
問題が実施例の焦点検出装置によってどのように解決さ
れるかをさらに詳しく説明する。焦点検出モジュール3
0,40は、撮影画面Mの周辺部に、画面中心に対して
放射方向の領域301,401と接線方向の領域30
2,402を有する十字型の焦点検出領域30a,40
aを有している。画面周辺で焦点検出を行う場合には、
上述した焦点検出光束のケラレの問題の他に、撮影光学
系3の収差による撮影像面と焦点検出像面との不一致の
問題がある。これらの問題は、接線方向の焦点検出領域
よりも放射方向の焦点検出領域において顕著に現れる。
Next, how the problem of the vignetting of the focus detecting light flux is solved by the focus detecting apparatus of the embodiment will be described in more detail. Focus detection module 3
0 and 40 are areas 301 and 401 in the radial direction and an area 30 in the tangential direction with respect to the center of the screen, in the peripheral portion of the photographing screen M.
Cross-shaped focus detection areas 30a and 40 having 2,402
a. When performing focus detection around the screen,
In addition to the problem of vignetting of the focus detection light flux described above, there is a problem of mismatch between the photographic image plane and the focus detection image plane due to the aberration of the photographic optical system 3. These problems are more prominent in the radial focus detection area than in the tangential focus detection area.

【0024】図13は、撮影画面Mの周辺部の焦点検出
領域30aの焦点検出光学系30bに拡散板350を設
置しない場合に、射出瞳12の領域123,124から
放射方向の焦点検出領域301へ入射する一対の焦点検
出用光束を示す放射方向の断面図である。また、図14
は、撮影画面Mの周辺部の焦点検出領域30aの焦点検
出光学系30bに拡散板350を設置しない場合に、射
出瞳12の領域121,122から接線方向の焦点検出
領域302へ入射する一対の焦点検出用光束を示す接線
方向の断面図である。これらの図から明らかなように、
放射方向の焦点検出領域301へ入射する光束は、撮影
光学系3を通過する時にその光軸11に対して非対称な
部分を通過する。この結果、一対の焦点検出用光束はそ
れぞれ異なる撮影光学系3の収差の影響を受ける。一
方、接線方向の焦点検出領域302へ入射する光束は、
撮影光学系3を通過する時にその光軸11に対して対称
な部分を通過し、一対の焦点検出用光束はそれぞれほぼ
同じ撮影光学系3の収差の影響を受ける。
FIG. 13 shows a case where the diffuser plate 350 is not installed in the focus detection optical system 30b of the focus detection area 30a in the peripheral portion of the photographing screen M, and the focus detection area 301 in the radial direction from the areas 123 and 124 of the exit pupil 12. FIG. 6 is a cross-sectional view in the radiation direction showing a pair of focus detection light beams incident on In addition, FIG.
When a diffuser plate 350 is not installed in the focus detection optical system 30b of the focus detection area 30a in the peripheral part of the photographic screen M, a pair of incident light enters the focus detection area 302 in the tangential direction from the areas 121 and 122 of the exit pupil 12. FIG. 4 is a tangential sectional view showing a light beam for focus detection. As you can see from these figures,
A light beam incident on the focus detection area 301 in the radial direction passes through a portion that is asymmetric with respect to the optical axis 11 when passing through the photographing optical system 3. As a result, the pair of focus detection light beams are affected by different aberrations of the photographing optical system 3. On the other hand, the light flux incident on the focus detection area 302 in the tangential direction is
When passing through the photographic optical system 3, the pair of focus detection light beams pass through a portion symmetrical with respect to the optical axis 11, and are affected by aberrations of the photographic optical system 3 that are substantially the same.

【0025】すなわち、撮影画面Mの周辺部に画面中心
から放射方向に沿って帯状に設定された焦点検出領域は
撮影光学系の収差の影響を受けやすく、反対に接線方向
に沿って帯状に設定された焦点検出領域は撮影光学系の
収差の影響を受けにくい。そこで、上述した実施例に示
すように、撮影画面Mの周辺部の焦点検出領域に対し
て、その焦点検出光学系の撮影光学系の予定焦点面近傍
に拡散板を設置する。それによって、焦点検出領域へ入
射する一対の光束の瞳領域の形状が拡大し、2つ領域を
通る一対の焦点検出用光束の一致度が高くなって収差の
影響が緩和され、画面周辺部でも正確な焦点検出が可能
となる。特に、撮影画面の周辺部に撮影画面の中心から
放射方向に設定される帯状の焦点検出領域に対して有効
である。
That is, the focus detection area, which is set in a band shape along the radial direction from the center of the screen on the peripheral portion of the shooting screen M, is easily affected by the aberration of the shooting optical system, and conversely is set in a band shape along the tangential direction. The formed focus detection area is not easily affected by the aberration of the photographing optical system. Therefore, as shown in the above-described embodiment, a diffuser plate is installed in the focus detection area in the peripheral portion of the shooting screen M in the vicinity of the planned focal plane of the shooting optical system of the focus detection optical system. As a result, the shape of the pupil region of the pair of light beams incident on the focus detection region is expanded, the degree of coincidence of the pair of focus detection light beams passing through the two regions is increased, and the influence of aberration is mitigated. Accurate focus detection is possible. In particular, it is effective for a strip-shaped focus detection area that is set in the radial direction from the center of the photographing screen in the peripheral portion of the photographing screen.

【0026】図15は、撮影画面Mの周辺部の焦点検出
領域30aの焦点検出光学系30bに拡散板350を設
置しない場合に、撮影画面Mの焦点検出領域30aから
見た撮影光学系3の射出瞳220と、その射出瞳220
を通過する焦点検出用光束の通過領域121〜124と
の関係を示す図である。撮影画面Mの周辺部から見た撮
影光学系3の射出瞳220の形状は、放射方向の焦点検
出領域301に対応する瞳領域123,124の並び方
向の幅が接線方向の焦点検出領域302に対応する瞳領
域121,122の並び方向の幅よりも狭く、さらに、
撮影光学系3の絞り以外にも、絞りの前後に配置される
レンズ自体の径によって射出瞳220の形状が規制され
るので、図に示すように領域123,124の並び方向
に対しては非対称となる。
FIG. 15 shows the photographic optical system 3 viewed from the focus detection area 30a of the photographic screen M when the diffuser plate 350 is not installed in the focus detection optical system 30b of the focus detection area 30a in the peripheral portion of the photographic screen M. Exit pupil 220 and the exit pupil 220
It is a figure which shows the relationship with the passage areas 121-124 of the light beam for focus detection which passes through. The shape of the exit pupil 220 of the photographing optical system 3 viewed from the peripheral portion of the photographing screen M is such that the width in the arrangement direction of the pupil regions 123 and 124 corresponding to the focus detection region 301 in the radial direction is the focus detection region 302 in the tangential direction. Narrower than the width of the corresponding pupil regions 121 and 122 in the arrangement direction,
In addition to the diaphragm of the photographing optical system 3, the shape of the exit pupil 220 is regulated by the diameter of the lens itself arranged before and after the diaphragm, so that as shown in the figure, it is asymmetric with respect to the arrangement direction of the regions 123 and 124. Becomes

【0027】図16は、撮影光学系3の開放Fナンバー
が図15の状態より大きい場合の状態を示す。この状態
では、瞳領域123にケラレが発生している。このよう
に、撮影画面Mの周辺部に画面中心から放射方向に沿っ
て帯状に設定された焦点検出領域に対応する射出瞳上の
領域はケラレやすく、反対に接線方向に沿って帯状に設
定された焦点検出領域に対応する射出瞳上の領域はケラ
レ難い。そこで、上述した実施例に示すように、撮影画
面Mの周辺部の焦点検出領域に対して、その焦点検出光
学系の撮影光学系の予定焦点面近傍に拡散板を設置す
る。それによって、焦点検出領域へ入射する一対の光束
の瞳領域の形状が拡大し、一対の焦点検出用光束のケラ
レによる光量の差が減少してケラレの影響が緩和され、
画面周辺部でも正確な焦点検出が可能となる。特に、撮
影画面の周辺部に撮影画面の中心から放射方向に設定さ
れる帯状の焦点検出領域に対して有効である。
FIG. 16 shows a state in which the open F number of the photographing optical system 3 is larger than the state shown in FIG. In this state, vignetting has occurred in the pupil area 123. As described above, the area on the exit pupil corresponding to the focus detection area that is set in a strip shape along the radial direction from the center of the screen in the peripheral portion of the photographing screen M is easily vignetted, and conversely is set in a strip shape along the tangential direction. The area on the exit pupil corresponding to the focus detection area is hard to be vignetted. Therefore, as shown in the above-described embodiment, a diffuser plate is installed in the focus detection area in the peripheral portion of the shooting screen M in the vicinity of the planned focal plane of the shooting optical system of the focus detection optical system. Thereby, the shape of the pupil region of the pair of light beams incident on the focus detection region is enlarged, the difference in the light amount due to vignetting of the pair of focus detection light beams is reduced, and the effect of vignetting is mitigated.
Accurate focus detection is possible even in the peripheral area of the screen. In particular, it is effective for a strip-shaped focus detection area that is set in the radial direction from the center of the photographing screen in the peripheral portion of the photographing screen.

【0028】一方、撮影画面Mの中央の焦点検出領域2
0aに対しては、焦点検出モジュール20が撮影光学系
3の光軸上に設けられるので、焦点検出領域の方向が放
射方向であっても接線方向であっても、焦点検出領域2
0aへ入射する光束は撮影光学系3を通過する時にその
光軸11に対して対称な部分を通過する。従って、撮影
画面Mの中央の焦点検出領域20aでは、上述した収差
による影響はなく、開放Fナンバーが大きくても周辺部
の焦点検出領域に比べてケラレの発生が少ない。
On the other hand, the focus detection area 2 at the center of the photographing screen M
0a, since the focus detection module 20 is provided on the optical axis of the photographing optical system 3, whether the focus detection area is radial or tangential, the focus detection area 2
When passing through the photographic optical system 3, the light beam incident on 0a passes through a portion symmetrical with respect to its optical axis 11. Therefore, the focus detection area 20a at the center of the photographic screen M is not affected by the above-mentioned aberration, and vignetting is less likely to occur than the focus detection area in the peripheral portion even if the open F number is large.

【0029】ところで、焦点検出光学系に拡散板を設け
ると、上述した収差の影響やケラレの問題を解決できる
反面、次のような問題がある。図17〜19は、焦点検
出光学系によってセンサー上に結像された被写体の2次
像の受光素子の並び方向の光強度分布を示す図である。
図17は合焦状態の光強度分布を示し、拡散板の有無に
関わらずコントラストが高く、正確な焦点検出が可能で
ある。図18は、拡散板を設置しない場合で、合焦状態
からデフォーカスした状態の光強度分布を示す。この状
態では、コントラストは低下しているが、十分焦点検出
が可能である。図19は、拡散板を設置した場合で、合
焦状態から図18と同じ量だけデフォーカスした状態を
示す。拡散板の拡散作用により図18の光強度分布より
さらにコントラストが低下し、このような光強度分布で
は焦点検出ができない。
By providing a diffusing plate in the focus detection optical system, the above-mentioned problems of aberration and vignetting can be solved, but there are the following problems. 17 to 19 are diagrams showing the light intensity distribution in the direction in which the light receiving elements are arranged for the secondary image of the subject formed on the sensor by the focus detection optical system.
FIG. 17 shows a light intensity distribution in a focused state, which has a high contrast regardless of the presence or absence of a diffusion plate, and enables accurate focus detection. FIG. 18 shows the light intensity distribution in the defocused state from the in-focus state when the diffuser plate is not installed. In this state, the contrast is lowered but the focus can be detected sufficiently. FIG. 19 shows a case where the diffuser plate is installed, and a state in which the same amount as in FIG. 18 is defocused from the focused state. Due to the diffusing action of the diffusing plate, the contrast is lower than that of the light intensity distribution shown in FIG. 18, and focus detection cannot be performed with such a light intensity distribution.

【0030】このように、焦点検出光学系に拡散板を設
置すると、設置しない場合に比べて焦点検出可能な最大
デフォーカス量が低下するデメリットがあり、収差やケ
ラレの問題のない画面中央の焦点検出領域に対しては拡
散板を設置しない。
As described above, when the diffuser plate is installed in the focus detecting optical system, there is a demerit that the maximum defocus amount that can be detected by the focus is reduced as compared with the case where the diffuser plate is not installed, and the focus at the center of the screen without problems of aberration and vignetting. No diffuser plate is installed in the detection area.

【0031】−第2の実施例− 次に、撮影画面の周辺部において画面中心から放射方向
に延びる帯状の焦点検出領域のみで焦点検出を行う第2
の実施例を説明する。図20は、撮影画面に設定された
焦点検出領域を示す図である。撮影画面Mの中央には上
述した十字型の焦点検出領域20を設定し、周辺部には
放射方向の焦点検出領域50a,60aを設定する。中
央の焦点検出領域20aに対しては、上述したように図
4に示す焦点検出モジュール20を撮影光学系3の予定
焦点面近傍の光軸上に設置する。一方、周辺部の焦点検
出領域50aに対しては、図21に示す焦点検出モジュ
ール50を撮影光学系3の予定焦点面近傍の光軸外に設
置する。また、周辺部の焦点検出領域60aに対して
は、図21に示す焦点検出モジュール50と同様な構成
の焦点検出モジュール60を撮影光学系3の予定焦点面
近傍の光軸外で、焦点検出モジュール50と光軸に対し
て対称位置に設置する。
Second Embodiment Next, in the peripheral portion of the photographing screen, focus detection is performed only in the strip-shaped focus detection area extending from the center of the screen in the radial direction.
An example will be described. FIG. 20 is a diagram showing the focus detection area set on the shooting screen. The above-described cross-shaped focus detection area 20 is set in the center of the photographing screen M, and radial focus detection areas 50a and 60a are set in the peripheral portion. For the central focus detection area 20a, as described above, the focus detection module 20 shown in FIG. 4 is installed on the optical axis near the planned focal plane of the photographing optical system 3. On the other hand, for the focus detection area 50a in the peripheral portion, the focus detection module 50 shown in FIG. 21 is installed outside the optical axis in the vicinity of the planned focal plane of the photographing optical system 3. Further, for the focus detection area 60a in the peripheral portion, a focus detection module 60 having the same configuration as the focus detection module 50 shown in FIG. 21 is provided outside the optical axis near the planned focal plane of the photographing optical system 3 to detect the focus. 50 and the optical axis are installed symmetrically.

【0032】図21において、焦点検出モジュール50
は、撮影光学系3の光軸外に配置され、焦点検出光学系
50bとCCDなどのセンサー56を有する。焦点検出
光学系50bは、拡散板550、一次元の開口部511
を有する視野マスク51、コンデンサーレンズ52、一
対の絞り開口部543,544を有する絞りマスク5
4、一対の再結像レンズ553,554などから構成さ
れ、センサー56は一対の受光部563,564を有す
る。拡散板550は、視野マスク51の近傍、すなわち
撮影光学系3の予定焦点面近傍に配置されており、図8
に示す拡散特性を備えている。なお、センサー56の受
光部563,564はそれぞれ複数の画素から構成され
る。また、視野マスク51の開口部511は予定焦点面
近傍の光軸外に設置されており、これにより撮影画面M
の周辺部に焦点検出位置が設定される。
In FIG. 21, the focus detection module 50
Is arranged outside the optical axis of the photographing optical system 3, and has a focus detection optical system 50b and a sensor 56 such as a CCD. The focus detection optical system 50b includes a diffusion plate 550 and a one-dimensional opening 511.
A field mask 51 having an aperture, a condenser lens 52, and an aperture mask 5 having a pair of aperture openings 543 and 544.
4, a pair of re-imaging lenses 553, 554, etc., and the sensor 56 has a pair of light receiving portions 563, 564. The diffusing plate 550 is arranged in the vicinity of the field mask 51, that is, in the vicinity of the planned focal plane of the photographing optical system 3, as shown in FIG.
It has the diffusion characteristics shown in. The light receiving portions 563 and 564 of the sensor 56 each include a plurality of pixels. Further, the opening 511 of the field mask 51 is installed outside the optical axis near the planned focal plane, whereby the photographing screen M is displayed.
The focus detection position is set in the peripheral portion of the.

【0033】一対の絞り開口部543,544は、コン
デンサーレンズ52および拡散板550により撮影光学
系3の射出瞳12の光軸に対して対称な一対の領域12
7,128に投影される。これら領域127,128
は、上述したように拡散板550の拡散作用により拡散
板550のない場合の領域123,124より大きい。
なお、コンデンサーレンズ52と一対の絞り開口部54
3,544の配置は、拡散板550がない場合に、一対
の絞り開口部543,544がコンデンサーレンズ52
により焦点検出モジュール20と同じ領域123,12
4に投影されるように決定する。
The pair of aperture openings 543 and 544 are formed by the condenser lens 52 and the diffusion plate 550 and are symmetrical with respect to the optical axis of the exit pupil 12 of the photographing optical system 3.
Projected on 7,128. These areas 127 and 128
Is larger than the regions 123 and 124 when the diffusion plate 550 is not provided due to the diffusion action of the diffusion plate 550 as described above.
The condenser lens 52 and the pair of aperture openings 54
When the diffuser plate 550 is not provided, the pair of aperture openings 543 and 544 are arranged so that the condenser lens 52 is not disposed.
The same areas 123, 12 as the focus detection module 20
4 so that it is projected.

【0034】撮影光学系3は、射出瞳12上の領域12
7,128を通る光束により予定焦点面近傍の光軸外、
すなわち視野マスク51の近傍に被写体の一次像を形成
する。視野マスク51の開口部511に形成された一次
像は、コンデンサーレンズ52と一対の絞り開口部54
3,544を通り、一対の再結像レンズ553,554
によりセンサー56の一対の受光部563,564上に
一対の二次像として再結像される。
The photographing optical system 3 includes an area 12 on the exit pupil 12.
By the light flux passing through 7,128, off the optical axis near the planned focal plane,
That is, a primary image of the subject is formed near the field mask 51. The primary image formed in the opening 511 of the visual field mask 51 has a condenser lens 52 and a pair of aperture openings 54.
Through a pair of re-imaging lenses 553,554
Thus, a pair of secondary images are re-imaged on the pair of light receiving portions 563 and 564 of the sensor 56.

【0035】一対の受光部563,564上に結像され
た一対の二次像は、それぞれの受光部で光強度分布に応
じて光電変換され、電気的な被写体像信号が生成され
る。この被写体像信号に基づいてセンサー56上で対に
なった二次像の受光部対並び方向の相対的位置関係を検
出することにより、撮影光学系3のデフォーカス量を検
出する。このように、焦点検出モジュール50は撮影画
面Mの周辺部の放射方向に設定された一次元の焦点検出
領域50aにおけるデフォーカス量を正確に検出する。
なお、焦点検出モジュール60は上記焦点検出モジュー
ル50と光軸に対して対称な位置に配置されるだけで、
その構成および作用は焦点検出モジュール50と同様で
あるので説明を省略する。
The pair of secondary images formed on the pair of light receiving portions 563 and 564 are photoelectrically converted by the respective light receiving portions in accordance with the light intensity distribution to generate an electrical object image signal. The defocus amount of the photographing optical system 3 is detected by detecting the relative positional relationship between the pair of secondary images on the sensor 56 in the arrangement direction of the light receiving units based on the subject image signal. In this way, the focus detection module 50 accurately detects the defocus amount in the one-dimensional focus detection area 50a set in the radial direction of the peripheral portion of the photographing screen M.
It should be noted that the focus detection module 60 is simply arranged at a position symmetrical to the focus detection module 50 with respect to the optical axis,
The structure and operation are the same as those of the focus detection module 50, and thus the description thereof will be omitted.

【0036】このように、撮影画面の中央で焦点検出を
行う瞳分割型再結像方式の焦点検出モジュールを撮影光
学系の予定焦点面近傍の光軸上に配置し、撮影画面の周
辺部において少なくとも画面中心から放射方向に延びる
帯状の領域で焦点検出を行う瞳分割型再結像方式の焦点
検出モジュールを予定焦点面近傍の光軸外に配置し、後
者の画面周辺部の焦点検出モジュールに対して撮影光学
系の予定焦点面近傍に拡散板を設置するようにしたの
で、画面中央では従来と同様に大きなデフォーカス量ま
で焦点検出が可能であり、画面周辺部では撮影光学系の
収差やケラレの影響が軽減されて焦点検出精度を向上さ
せることができる。
As described above, the focus detection module of the pupil division type re-imaging method for performing focus detection in the center of the photographing screen is arranged on the optical axis near the planned focal plane of the photographing optical system, and the peripheral portion of the photographing screen is provided. A focus detection module of the pupil division type re-imaging method that performs focus detection at least in a band-shaped area extending in the radial direction from the center of the screen is arranged outside the optical axis in the vicinity of the planned focal plane, and the latter focus detection module in the peripheral area of the screen On the other hand, since a diffuser plate is installed near the planned focal plane of the shooting optical system, focus detection can be performed up to a large defocus amount in the center of the screen as in the conventional case, and aberrations of the shooting optical system in the peripheral part of the screen The effect of vignetting is reduced and focus detection accuracy can be improved.

【0037】なお、拡散板は、その拡散特性が焦点検出
像のコントラストを極端に低下させるものでなければ、
液晶、位相型焦点板、砂ずり型スクリーンなどを用いる
ことができる。
If the diffusion characteristic of the diffuser plate does not extremely reduce the contrast of the focus detection image,
A liquid crystal, a phase type focusing screen, a sand screen, etc. can be used.

【0038】以上の実施例の構成において、焦点検出光
学系20bおよびセンサー26が撮影画面の中央の焦点
検出領域に対応する焦点検出光学系および光電変換手段
を、焦点検出光学系30b,50bおよびセンサー3
6,56が撮影画面の周辺部の焦点検出領域に対応する
焦点検出光学系および光電変換手段を、拡散板350,
450,550が光学要素をそれぞれ構成する。
In the structure of the above embodiment, the focus detection optical system 20b and the sensor 26 correspond to the center focus detection area of the photographic screen and the photoelectric conversion means, and the focus detection optical systems 30b and 50b and the sensor. Three
Reference numerals 6 and 56 denote a focus detection optical system and a photoelectric conversion unit corresponding to a focus detection area in the peripheral portion of the photographing screen, a diffusion plate 350,
450 and 550 form optical elements, respectively.

【0039】[0039]

【発明の効果】以上説明したように本発明によれば、撮
影画面の周辺部の焦点検出領域に対応する焦点検出光学
系だけに、撮影光学系の予定焦点面近傍に光拡散特性を
有する光学要素を設けるようにしたので、画面中央では
従来と同様に大きなデフォーカス量まで焦点検出が可能
であり、画面周辺部では撮影光学系の収差やケラレの影
響が軽減されて焦点検出精度を向上させることができ、
システム全体として焦点検出精度とデフォーカス検出能
力を最適にバランスさせることができる。
As described above, according to the present invention, only in the focus detection optical system corresponding to the focus detection area in the peripheral portion of the photographing screen, the optical system having the light diffusion characteristic near the planned focal plane of the photographing optical system. Since elements are provided, focus detection can be performed up to a large defocus amount in the center of the screen as in the conventional case, and the effects of aberration and vignetting of the imaging optical system are reduced in the peripheral part of the screen to improve focus detection accuracy. It is possible,
The focus detection accuracy and the defocus detection ability can be optimally balanced in the entire system.

【図面の簡単な説明】[Brief description of drawings]

【図1】第1の実施例の焦点検出装置を備えたカメラの
撮影光学系の光軸に沿った断面図。
FIG. 1 is a cross-sectional view taken along the optical axis of a photographing optical system of a camera including a focus detection device according to a first embodiment.

【図2】撮影画面の周辺部に設定された焦点検出領域の
焦点検出モジュールを示す図。
FIG. 2 is a diagram showing a focus detection module of a focus detection area set in a peripheral portion of a shooting screen.

【図3】撮影画面内に設定された第1の実施例の焦点検
出領域を示す図。
FIG. 3 is a diagram showing a focus detection area of the first embodiment set within a shooting screen.

【図4】撮影画面中央の焦点検出領域の焦点検出モジュ
ールを示す図。
FIG. 4 is a diagram showing a focus detection module in a focus detection area in the center of a shooting screen.

【図5】二対の絞り開口部を示す絞りの正面図。FIG. 5 is a front view of a diaphragm showing two pairs of diaphragm openings.

【図6】撮影光学系の射出瞳上を焦点検出光束が通過す
る領域を示す図。
FIG. 6 is a diagram showing a region where a focus detection light beam passes on an exit pupil of a photographing optical system.

【図7】撮影画面周辺部の焦点検出領域の焦点検出モジ
ュールを示す図。
FIG. 7 is a diagram showing a focus detection module in a focus detection area in the peripheral portion of a shooting screen.

【図8】拡散板の拡散特性を示す図。FIG. 8 is a diagram showing diffusion characteristics of a diffusion plate.

【図9】射出瞳上の焦点検出光束の通過する領域が拡散
板の拡散作用によって拡大した状態を説明する図。
FIG. 9 is a diagram illustrating a state in which a region on the exit pupil where a focus detection light flux passes is enlarged by a diffusion action of a diffusion plate.

【図10】絞りマスクの開口部と撮影光学系の射出瞳上
の領域との関係を示す図。
FIG. 10 is a diagram showing a relationship between an aperture of a diaphragm mask and a region on an exit pupil of a photographing optical system.

【図11】撮影画面中央の焦点検出領域に対応する焦点
検出モジュールと、撮影画面周辺部の焦点検出領域に対
応する焦点検出モジュールとの位置関係を示す図。
FIG. 11 is a diagram showing a positional relationship between a focus detection module corresponding to a focus detection area at the center of a shooting screen and a focus detection module corresponding to a focus detection area at a peripheral portion of the shooting screen.

【図12】画面中央と周辺部の焦点検出モジュールの配
置図。
FIG. 12 is a layout view of the focus detection modules at the center and the periphery of the screen.

【図13】撮影画面周辺部の放射方向の焦点検出領域へ
入射する焦点検出用光束を示す図。
FIG. 13 is a diagram showing a light beam for focus detection that is incident on a focus detection region in the radial direction on the periphery of the image capturing screen.

【図14】撮影画面周辺部の接線方向の焦点検出領域へ
入射する焦点検出用光束を示す図。
FIG. 14 is a diagram showing a light beam for focus detection incident on a focus detection region in the tangential direction in the peripheral portion of the shooting screen.

【図15】撮影画面周辺部の焦点検出領域から見た撮影
光学系の射出瞳と、その射出瞳上の焦点検出用光束の通
過領域を示す図。
FIG. 15 is a diagram showing an exit pupil of a photographic optical system viewed from a focus detection area in the periphery of a photographic screen and a focus detection light flux passing area on the exit pupil.

【図16】図15に示す状態から撮影光学系の絞りを絞
り込んだ状態における射出瞳と焦点検出用光束の通過領
域を示す図。
16 is a diagram showing an exit pupil and a focus detection light flux passing region in a state where the diaphragm of the photographing optical system is narrowed down from the state shown in FIG.

【図17】合焦時の受光素子の並び方向に対する被写体
の二次像の光強度分布を示す図。
FIG. 17 is a diagram showing a light intensity distribution of a secondary image of a subject in the alignment direction of light receiving elements when focusing.

【図18】合焦状態からデフォーカスした時の受光素子
の並び方向に対する被写体の二次像の光強度分布を示す
図。
FIG. 18 is a diagram showing a light intensity distribution of a secondary image of a subject in a direction in which light receiving elements are arranged when defocused from a focused state.

【図19】焦点検出光学系に拡散板を設けた状態で図1
8と同じ量だけ合焦状態からデフォーカスした時の、受
光素子の並び方向に対する被写体の二次像の光強度分布
を示す図。
FIG. 19 shows a state in which a diffusion plate is provided in the focus detection optical system.
8 is a diagram showing a light intensity distribution of a secondary image of a subject in a direction in which light receiving elements are arranged when defocused from the focused state by the same amount as 8. FIG.

【図20】撮影画面内に設定された第2の実施例の焦点
検出領域を示す図。
FIG. 20 is a diagram showing a focus detection area of the second embodiment set within a shooting screen.

【図21】第2の実施例の画面周辺部の放射方向の焦点
検出領域に対して設けられる焦点検出モジュールを示す
図。
FIG. 21 is a diagram showing a focus detection module provided in a radial focus detection region in the peripheral portion of the screen according to the second embodiment.

【図22】撮影光学系による焦点検出光束のケラレを説
明する図。
FIG. 22 is a diagram illustrating vignetting of a focus detection light beam by a photographing optical system.

【図23】焦点検出光学系の視野マスクの開口を通る光
束が撮影光学系の絞りを通過する領域を示す図。
FIG. 23 is a diagram showing a region in which a light flux passing through an opening of a field mask of a focus detection optical system passes through a diaphragm of a photographing optical system.

【図24】図22に示す焦点検出光学系によって一対の
光電変換器上に結像される一対の被写体像の光強度分布
を示す図。
24 is a diagram showing the light intensity distributions of a pair of subject images formed on a pair of photoelectric converters by the focus detection optical system shown in FIG.

【図25】図22に示す焦点検出光学系に拡散板を設け
た場合の、焦点検出光学系の視野マスクの開口を通る光
束が撮影光学系の絞りを通過する領域を示す図。
25 is a diagram showing a region where a light beam passing through an opening of a field mask of the focus detection optical system passes through a diaphragm of the photographing optical system in the case where the focus detection optical system shown in FIG. 22 is provided with a diffusion plate.

【図26】図22に示す焦点検出光学系に拡散板を設け
た場合の、一対の光電変換器上に結像される一対の被写
体像の光強度分布を示す図。
FIG. 26 is a diagram showing a light intensity distribution of a pair of subject images formed on a pair of photoelectric converters when a diffuser plate is provided in the focus detection optical system shown in FIG. 22.

【符号の説明】[Explanation of symbols]

1 カメラボディ 2 レンズ鏡筒 3 撮影光学系 4 メインミラー 5 サブミラー 6 スクリーン 7 ペンタプリズム 8 接眼レンズ 9 ファインダー 10 シャッター 11 光軸 12,220 射出瞳 20,30,40,50 焦点検出モジュール 20a,30a,40a,50a,60a,301,3
02,401,402焦点検出領域 20b,30b 焦点検出光学系 21,31,51,131 視野マスク 22,32,52,133 コンデンサーレンズ 24,34,54,134 絞りマスク 26,36,56 センサー 41〜43,45,51〜53,121〜124,12
5〜128 領域 132,135,136,211,241〜244,3
11,341〜344 ,511,543,544 開口部 137 絞り 251〜254,351〜354,553,554 再
結像レンズ 261〜264,361〜364,563,564 受
光部 350,450,550 拡散板
1 camera body 2 lens barrel 3 photographing optical system 4 main mirror 5 sub-mirror 6 screen 7 pentaprism 8 eyepiece 9 viewfinder 10 shutter 11 optical axis 12,220 exit pupil 20, 30, 40, 50 focus detection module 20a, 30a, 40a, 50a, 60a, 301, 3
02, 401, 402 Focus detection area 20b, 30b Focus detection optical system 21, 31, 51, 131 Field-of-view mask 22, 32, 52, 133 Condenser lens 24, 34, 54, 134 Aperture mask 26, 36, 56 Sensor 41 to 41 43, 45, 51-53, 121-124, 12
5 to 128 regions 132, 135, 136, 211, 241-244, 3
11, 341 to 344, 511, 543, 544 Aperture 137 Aperture 251 to 254, 351 to 354, 553, 554 Re-imaging lens 261 to 264, 361 to 364, 563, 564 Light receiving part 350, 450, 550 Diffusion plate

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 撮影光学系の予定焦点面上に設けられた
撮影画面の中央とその周辺部に複数の焦点検出領域を設
定し、各焦点検出領域ごとに焦点検出光学系と一対の光
電変換手段を有し、前記焦点検出光学系により前記撮影
光学系の射出瞳の異なる領域を通過した一対の光束を前
記一対の光電変換手段上に導いて一対の被写体像を再結
像させ、前記各焦点検出領域ごとの前記撮影光学系の焦
点調節状態を検出する焦点検出装置において、 前記撮影画面の周辺部の焦点検出領域に対応する焦点検
出光学系に対して、前記撮影光学系の予定焦点面近傍に
光拡散特性を有する光学要素を設けたことを特徴とする
焦点検出装置。
1. A plurality of focus detection areas are set at the center and its periphery of a shooting screen provided on a planned focal plane of the shooting optical system, and each focus detection area has a focus detection optical system and a pair of photoelectric conversion regions. A pair of light fluxes that have passed through different areas of the exit pupil of the photographing optical system by the focus detection optical system and are directed onto the pair of photoelectric conversion means to re-image a pair of subject images. In a focus detection device for detecting a focus adjustment state of the photographing optical system for each focus detection region, a planned focal plane of the photographing optical system with respect to a focus detection optical system corresponding to a focus detection region in a peripheral portion of the photographing screen. A focus detection device characterized in that an optical element having a light diffusion characteristic is provided in the vicinity thereof.
【請求項2】 請求項1に記載の焦点検出装置におい
て、前記撮影画面の周辺部の焦点検出領域は、前記撮影
画面の中心から放射方向に延びる帯状の領域であること
を特徴とする焦点検出装置。
2. The focus detection device according to claim 1, wherein the focus detection area in the peripheral portion of the photographing screen is a strip-shaped area extending in the radial direction from the center of the photographing screen. apparatus.
JP4308824A 1992-11-18 1992-11-18 Focus detector Pending JPH06160703A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4308824A JPH06160703A (en) 1992-11-18 1992-11-18 Focus detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4308824A JPH06160703A (en) 1992-11-18 1992-11-18 Focus detector

Publications (1)

Publication Number Publication Date
JPH06160703A true JPH06160703A (en) 1994-06-07

Family

ID=17985750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4308824A Pending JPH06160703A (en) 1992-11-18 1992-11-18 Focus detector

Country Status (1)

Country Link
JP (1) JPH06160703A (en)

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