JPH0614260B2 - Board inspection method - Google Patents
Board inspection methodInfo
- Publication number
- JPH0614260B2 JPH0614260B2 JP13460987A JP13460987A JPH0614260B2 JP H0614260 B2 JPH0614260 B2 JP H0614260B2 JP 13460987 A JP13460987 A JP 13460987A JP 13460987 A JP13460987 A JP 13460987A JP H0614260 B2 JPH0614260 B2 JP H0614260B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- vibrating body
- measured
- pixel
- inspection method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、基板検査方法に係り、特に液晶基板等の多数
の画素電極を有する基板の検査に好適な基板検査方法に
関する。The present invention relates to a substrate inspecting method, and more particularly to a substrate inspecting method suitable for inspecting a substrate having a large number of pixel electrodes such as a liquid crystal substrate. .
(従来の技術) 近年、例えば液晶表示装置等は、画素の高集積化が進
み、20万〜30万画素を有する液晶表示装置も開発されて
いる。(Prior Art) In recent years, for example, liquid crystal display devices and the like have been highly integrated in pixels, and liquid crystal display devices having 200,000 to 300,000 pixels have also been developed.
このような液晶表示装置では、ガラス基板等の基板上に
各画素(ピクセル)毎にパッシベイト膜、配向膜等を備
えた透明電極が形成されており、アクティブマトリクス
方式の液晶表示装置では、これらのピクセルにそれぞれ
能動素子例えばMOS 形TFT 等が配置されている。In such a liquid crystal display device, a transparent electrode having a passivate film, an alignment film, etc. is formed for each pixel on a substrate such as a glass substrate. An active element such as a MOS TFT is arranged in each pixel.
そして、同様に、各画素(ピクセル)毎にパッシベイト
膜、配向膜等を備えた透明電極が形成された基板が、上
記基板に近接対向して配置され、これらの基板間に液晶
が封入される。Similarly, a substrate on which a transparent electrode having a passivation film, an alignment film and the like is formed for each pixel is arranged in close proximity to the substrate, and a liquid crystal is sealed between these substrates. .
このような液晶表示装置用基板を検査する場合、各ピク
セル毎に、例えばMOS 形TFT の動作の良否、断線の有無
等を測定する必要がある。また、透明電極に直接電気的
な接続端子等を接触させることは、好ましくない。この
ため、組み立てが終了した液晶表示装置の表示画像を目
視し、チェックを行うという方法により、検査を行って
いる。When inspecting such a liquid crystal display device substrate, it is necessary to measure, for each pixel, for example, whether the operation of the MOS TFT is good or not, and whether or not there is a disconnection. Further, it is not preferable to directly contact the transparent electrode with an electrical connection terminal or the like. Therefore, the inspection is performed by visually checking the display image of the assembled liquid crystal display device and making a check.
(発明が解決しようとする問題点) しかしながら、上記説明の従来の検査方法では、最終組
み立てを行った後でなければ検査を行うことができず、
例えば不良の基板が組み立て工程へ送られる等、生産性
が悪化するという問題がある。(Problems to be Solved by the Invention) However, in the conventional inspection method described above, the inspection can be performed only after the final assembly,
For example, there is a problem that productivity is deteriorated, for example, a defective substrate is sent to an assembly process.
本発明は、かかる従来の事情に対処してなされたもの
で、組み立て前の基板の検査を容易に行うことができ、
生産性の向上を図ることのできる基板検査方法を提供し
ようとするものである。The present invention has been made in consideration of such conventional circumstances, and can easily inspect a board before assembly.
An object of the present invention is to provide a substrate inspection method capable of improving productivity.
[発明の構成] (問題点を解決するための手段) すなわち本発明の基板検査方法は、被測定基板上に形成
された電極に近接対向させて導体層を有する振動体を配
置し、この振動体と前記電極との間に交流電圧を印加し
て、前記振動体に生じる振動を検出することにより前記
被測定基板の検査を行うことを特徴とする。[Structure of the Invention] (Means for Solving Problems) That is, according to the substrate inspection method of the present invention, a vibrating body having a conductor layer is arranged in close proximity to an electrode formed on a substrate to be measured, and the vibration is generated. An alternating voltage is applied between the body and the electrode, and the vibration generated in the vibrating body is detected to inspect the substrate to be measured.
(作 用) 本発明の基板検査方法では、被測定基板上に形成された
電極に近接対向させて導体層を有する振動体を配置し、
この振動体と電極との間に交流電圧を引火して、振動体
に生じる振動を検出することにより、例えば組み立て前
の状態で、液晶表示装置用基板等の被測定基板の検査を
行う。(Operation) In the substrate inspection method of the present invention, the vibrating body having the conductor layer is arranged in close proximity to the electrodes formed on the substrate to be measured,
An AC voltage is ignited between the vibrating body and the electrodes to detect the vibration generated in the vibrating body, so that the substrate to be measured such as the liquid crystal display substrate is inspected before assembly.
すなわち、液晶表示装置用基板の透明電極と、振動体と
の間に容量結合を形成し、交流電界の作用により発生す
る振動体の微小な振動を検出する。したがつて、例えば
透明電極等に直接電気的な接続端子等を接触させる必要
もなく、簡単に、基板の検査を行うことができる。That is, capacitive coupling is formed between the transparent electrode of the substrate for a liquid crystal display device and the vibrating body, and minute vibration of the vibrating body generated by the action of the AC electric field is detected. Therefore, it is not necessary to directly contact the transparent electrode or the like with the electrical connection terminal or the like, and the substrate can be easily inspected.
(実施例) 以下本発明の基板検査方法を図面に参照して実施例につ
いて説明する。(Examples) Examples of the substrate inspection method of the present invention will be described below with reference to the drawings.
第1図および第2図に示すアクティブマトリクス方式の
液晶表示装置のガラス基板1には、透明電極、パッシベ
イト膜、配向膜等を備えた多数のピクセル2が形成され
ている。これらのピクセル2には、それぞれMOS 形TFT
3が配置されており、このMOS 形TFT 3のゲートは、そ
れぞれゲート信号線4に、ソースは、それぞれソース信
号線5に接続されている。また、MOS 形TFT 3のドレイ
ンは、それぞれにピクセル2内の透明電極に接続されて
いる。On a glass substrate 1 of the active matrix type liquid crystal display device shown in FIGS. 1 and 2, a large number of pixels 2 having transparent electrodes, passivate films, alignment films and the like are formed. Each of these pixels 2 has a MOS type TFT.
3 are arranged, and the gate of the MOS TFT 3 is connected to the gate signal line 4 and the source is connected to the source signal line 5, respectively. The drains of the MOS TFTs 3 are connected to the transparent electrodes in the pixels 2, respectively.
また、上記ゲート信号線4およびソース信号線5は、そ
れぞれガラス基板1の端部に配置されたリード電極6お
よびリード電極7に接続されている。The gate signal line 4 and the source signal line 5 are connected to the lead electrode 6 and the lead electrode 7 arranged at the ends of the glass substrate 1, respectively.
この実施例方法では、まず、ガラス基板1に対向、すな
わち被測定ピクセル2aの透明電極に対向するように振
動体8を配置する。この振動体8は、例えば厚さ数ミク
ロン程度のプラスチックシート8aと、このプラスチッ
クシート8aの対向面裏側に例えばスパッタリング等に
より形成され厚さ例えば0.1〜1μm程度なアルミニ
ウム等の導体層8bと、ピクセル2に対応して格子状に
形成されプラスチックシート8aを保持するアルミニウ
ム等からなるフレーム8cとから構成されている。In the method of this embodiment, first, the vibrating body 8 is arranged so as to face the glass substrate 1, that is, face the transparent electrode of the pixel 2a to be measured. The vibrating body 8 includes, for example, a plastic sheet 8a having a thickness of about several microns, and a conductor layer 8b made of, for example, sputtering on the opposite side of the plastic sheet 8a and made of aluminum and having a thickness of, for example, about 0.1 to 1 μm. , A frame 8c made of aluminum or the like, which is formed in a grid pattern corresponding to the pixels 2 and holds the plastic sheet 8a.
次に、被測定ピクセル2aが接続されたソース信号線5
端部のリード電極7を介して、被測定ピクセス2aの透
明電極と振動体8との間に交流電圧を印加する。また、
被測定ピクセル2aが接続されたゲート信号線4端部の
リード電極6を介して、MOS 形TFT 3のゲートに例えば
パルス状のON信号を印加する。Next, the source signal line 5 to which the measured pixel 2a is connected
An AC voltage is applied between the transparent electrode of the measured pixel 2 a and the vibrating body 8 via the lead electrode 7 at the end. Also,
A pulsed ON signal, for example, is applied to the gate of the MOS TFT 3 via the lead electrode 6 at the end of the gate signal line 4 to which the measured pixel 2a is connected.
そして、この時の被測定ピクセル2aの透明電極に対す
る振動体8のプラスチックシート8aに生じる振動を、
例えば導体層8b表面にレーザ光を照射するレーザ光源
9と、導体層8bからの反射光を検出するテレビカメラ
10で、例えば導体層8b表面の干渉縞の変化を観測す
ること等により検出する。Then, the vibration generated in the plastic sheet 8a of the vibrating body 8 with respect to the transparent electrode of the measured pixel 2a at this time is
For example, the laser light source 9 that irradiates the surface of the conductor layer 8b with a laser beam and the television camera 10 that detects the reflected light from the conductor layer 8b are detected by, for example, observing a change in interference fringes on the surface of the conductor layer 8b.
すなわち、この時、被測定ピクセル2aが接続されたゲ
ート信号線4およびソース信号線5等に断線がなく、MO
S 形TFT 3が正常に作動し、被測定ピクセル2aの透明
電極に異常がなければ、被測定ピクセル2aの透明電極
と、振動体8との間には、交流電界が作用し、振動体8
のプラスチックシート8aに振動が生じる。したがっ
て、テレビカメラ10で振動が検出されればその被測定
ピクセル2aは正常であると判定することができる。That is, at this time, there is no disconnection in the gate signal line 4 and the source signal line 5 to which the measured pixel 2a is connected, and the MO
If the S-type TFT 3 operates normally and there is no abnormality in the transparent electrode of the measured pixel 2a, an AC electric field acts between the transparent electrode of the measured pixel 2a and the vibrating body 8 to cause the vibrating body 8 to move.
Vibration occurs in the plastic sheet 8a. Therefore, if the vibration is detected by the television camera 10, the measured pixel 2a can be determined to be normal.
なお、振動の検出は、レーザ光源9およびテレビカメラ
10の位置制御を行って、各ピクセル毎または数個のピ
クセル毎に移動させながら行っても、振動体8全体にレ
ーザ光を照射し、振動体8全体を撮像可能なテレビカメ
ラ10を用いて行ってもよい。Even if the vibration is detected by performing position control of the laser light source 9 and the television camera 10 and moving each pixel or every several pixels, the entire vibrating body 8 is irradiated with the laser light and vibrates. You may perform using the television camera 10 which can image the whole body 8.
また、被測定ピクトル2a透明電極と振動体8と間の電
気容量C(pF)は、εは比誘電率、Aを電極の面積、dを
間隔として、次式によって求めることができる。Further, the electric capacitance C (pF) between the transparent electrode of the measured pictol 2a and the vibrating body 8 can be obtained by the following equation, where ε is the relative permittivity, A is the electrode area, and d is the interval.
C(pF)=0.225εA/d したがって、被測定ピクセル2aの透明電極と振動体8
との間に印加する電圧は、透明電極の面積、透明電極と
振動体8との間隔等によって適宜選択する。C (pF) = 0.225εA / d Therefore, the transparent electrode of the measured pixel 2a and the vibrating body 8
The voltage applied between and is appropriately selected depending on the area of the transparent electrode, the distance between the transparent electrode and the vibrating body 8, and the like.
すなわち、この実施例方法では、被測定ピクセル2aの
透明電極に対向させて導体層8bを有する振動体8を配
置し、容量結合を形成して交流電圧を印加する。そし
て、MOS 形TFT 3のゲートにON信号を印加して被測定ピ
クセル2aの検査を行う。したがって、例えば透明電極
に直接電気的な接続端子等を接触させる必要もなく、簡
単に、検査を行うことができる。That is, in this example method, the vibrating body 8 having the conductor layer 8b is arranged so as to face the transparent electrode of the pixel 2a to be measured, and capacitive coupling is formed to apply an AC voltage. Then, an ON signal is applied to the gate of the MOS TFT 3 to inspect the measured pixel 2a. Therefore, for example, it is not necessary to directly contact the transparent electrode with an electrical connection terminal or the like, and the inspection can be easily performed.
[発明の効果] 上述のように、本発明の基板検査方法では、組み立て前
の基板の検査を容易に行うことができ、従来に比べて大
幅に生産性の向上を図ることができる。[Advantages of the Invention] As described above, according to the board inspection method of the present invention, it is possible to easily inspect the board before assembly, and it is possible to significantly improve the productivity as compared with the related art.
第1図は本発明の一実施例の基板検査方法を説明するた
めの液晶表示装置用基板の斜視図、第2図は第1図は上
面図である。 1……ガラス基板、2……ピクセル、8……振動体、8
a……プラスチックシート、8b……導体層、8c……
フレーム。FIG. 1 is a perspective view of a liquid crystal display device substrate for explaining a substrate inspection method according to an embodiment of the present invention, and FIG. 2 is a top view. 1 ... Glass substrate, 2 ... Pixel, 8 ... Vibrator, 8
a: plastic sheet, 8b: conductor layer, 8c ...
flame.
Claims (2)
させて導体層を有する振動体を配置し、この振動体と前
記電極との間に交流電圧を印加して、前記振動体に生じ
る振動を検出することにより前記被測定基板の検査を行
うことを特徴とする基板検査方法。1. A vibrating body having a conductor layer is arranged in close proximity to an electrode formed on a substrate to be measured, and an AC voltage is applied between the vibrating body and the electrode to apply the AC voltage to the vibrating body. A substrate inspection method, which comprises inspecting the substrate to be measured by detecting the generated vibration.
表示装置用基板である特許請求の範囲第1項記載の基板
検査方法。2. The substrate inspection method according to claim 1, wherein the substrate to be measured is a substrate for a liquid crystal display device having an active element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13460987A JPH0614260B2 (en) | 1987-05-29 | 1987-05-29 | Board inspection method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13460987A JPH0614260B2 (en) | 1987-05-29 | 1987-05-29 | Board inspection method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63298386A JPS63298386A (en) | 1988-12-06 |
JPH0614260B2 true JPH0614260B2 (en) | 1994-02-23 |
Family
ID=15132401
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13460987A Expired - Lifetime JPH0614260B2 (en) | 1987-05-29 | 1987-05-29 | Board inspection method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0614260B2 (en) |
-
1987
- 1987-05-29 JP JP13460987A patent/JPH0614260B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS63298386A (en) | 1988-12-06 |
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