JPH0612645A - Thin-film magnetic head and its production - Google Patents

Abstract

PURPOSE:To provide the thin-film magnetic head having sable floatability by executing surface polishing and microchamfering with good accuracy and the process for production of this magnetic head. CONSTITUTION:The front surfaces of air bearing surfaces 12 are polished and, simultaneously, the edges over the entire circumference of the air bearing surfaces 12 are chamfered to form edge surfaces 14. The chamfering lengths of the regions IV near ridge parts 131 of central flat surfaces 121 and inflow side tapered surfaces 122 on the edge surfaces 14 at both side ends in the direction perpendicular to the air inflow direction or the regions II just before the boundaries 171 between a slider 1 and a thin-film transducer element 17 are respectively designated as l4, l2. The chamfering length of the edge surfaces 14 (regions V) in the air inflow ends in successive contact with the inflow side tapered surfaces 122 is designated as l5 and the chamfering length of the edge surfaces 14 (regions III) on the side end side in successive contact with the flat surfaces 121 is designated as l3, then (l4-l5)/l5 is regulated to <=0.4 or (l3-l2)/l3 to <=0.2.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film magnetic head and a manufacturing method thereof.

[0002]

2. Description of the Related Art With the increase in information recording capacity and high-speed access, there is a demand for a thin film magnetic head having a higher magnetic permeability than a ferrite head and capable of maintaining a high electromagnetic conversion efficiency even at a high transfer rate. It is rising. Thin film magnetic heads require various ceramic substrate materials for sliders, such as SiC, ZrO ₂ , Al ₂ O ₃ ,
A material such as Al ₂ O ₃ —TiC is used as a slider.

In the slider of the thin film magnetic head, the surface of the air bearing surface of the medium facing surface must be polished in order to obtain stable flying characteristics and good durability running characteristics.
For polishing the air bearing surface of the slider, for example, JP-A-60-185272 and JP-A-63-709.
18, JP-A-2-199614, JP-A-2
A polishing film or a polishing tape is used as disclosed in JP-A-212057, JP-A-2-301014 and the like.

On the other hand, it is preferable to chamfer the edge (ridge line portion) of the entire circumference of the air bearing surface from the viewpoint of improving running durability. This chamfering is usually done at the same time as polishing the air bearing surface. Therefore, the chamfered dimension changes variously depending on the surface polishing conditions. However, the above-mentioned publication makes no mention or mention of the dimensional accuracy of the chamfered surface (edge surface) of the edge.

[0005]

When polishing an air bearing surface of a slider, such as a rail surface, with a polishing film, under normal conditions, the chamfering amount that is simultaneously performed is very small. It turned out to vary. In addition, the conventional slider having a small chamfered dimension cannot satisfy the flying stability. More specifically, it was found that the floating instability in CSS (contact start / stop) was generated, and the variation in the roll angle in the floating posture was large.
It was also found that the levitation performance cannot be ensured when the flying height is further reduced.

[0006] The main object of the present invention is to accurately perform a fine chamfering process simultaneously with surface polishing.
It is an object of the present invention to provide a thin film magnetic head exhibiting a stable flying property and a manufacturing method thereof.

[0007]

Such an object is achieved by the present invention of the following (1) to (15).

(1) A thin film transducer element is provided on the air outflow end side of the slider, and the edges of the entire circumference of the air bearing surface are chamfered to form an edge surface, and the air bearing surface is flat in the central portion. Has an inflow side taper surface on the air inflow side that is connected to the surface, and the air inflow is based on the ridge between the central flat surface and the inflow side taper surface on the edge surfaces at both ends in the direction perpendicular to the air inflow direction. When the chamfered length of the region up to ± 0.1 mm in the direction is l ₄ and the chamfered length of the edge surface of the air inflow end connected to the inflow side tapered surface is l ₅ , (l ₄ −l ₅ ) / l ₅ Thin film magnetic head having a value of 0.4 or less.

(2) The chamfered length of the region from the interface between the slider and the thin film transducer element to 0.2 mm on the edge surfaces at both ends in the direction perpendicular to the air inflow direction to the air inflow side is l ₂ , and the central portion is flat. When the chamfering length of the edge surfaces on both ends connected to the surface is l ₃ , (l ₃ −l
₂ ) / l ₃ is 0.2 or less, the thin film magnetic head of the above (1).

(3) A thin film transducer element is provided on the air outflow end side of the slider, and the edge of the entire circumference of the air bearing surface is chamfered to form an edge surface. The air bearing surface is flat in the central portion. Has a taper surface on the air inflow side that is connected to the surface, and extends from the interface between the slider and the thin film transducer element on the edge surfaces at both ends in the direction perpendicular to the air inflow direction to 0.2 mm on the air inflow end side. The chamfered length of the area of 1 is l ₂ , and the chamfered length of the edge surfaces at both ends connected to the central flat surface is l ₃
And (l ₃ −l ₂ ) / l ₃ is 0.2 or less.

(4) Chamfer length l of the edge surface of the air outflow end
The thin film magnetic head according to any one of (1) to (3) above, wherein ₁ is 4 to 20 μm.

(5) The chamfering length of all the edge surfaces is 4 to 20.
The thin film magnetic head according to any one of (1) to (4) above, wherein the thickness is μm.

(6) Chamfer length range R for all edge surfaces
The thin film magnetic head according to any one of (1) to (5) above, wherein (JIS Z81081) is 5 μm or less.

(7) The thin film transducer element is provided on the slider on the air outflow end side, and the edge of the entire circumference of the air bearing surface is chamfered to form an edge surface. ~ 20 μm,
This chamfer length range R (JIS Z81081) is 5μ
Thin film magnetic head that is less than or equal to m.

(8) The air bearing surface is formed on a pair of rails provided at both ends of the surface of the magnetic recording medium facing surface perpendicular to the air inflow direction and parallel to the air inflow direction. The thin film magnetic head according to any one of 1) to 7).

(9) The air bearing surface occupies substantially the entire area of the magnetic recording medium facing surface, and the air bearing surface (1) to (7).
One of the thin film magnetic heads.

(10) The above-mentioned (1) in which the magnetic recording medium is levitated by the contact start / stop method.
A thin film magnetic head according to any one of (1) to (9).

(11) Vickers hardness H of the slider
The thin film magnetic head according to any one of (1) to (10) above, wherein V (500 g) is 1100 or more.

(12) A method of manufacturing a thin film magnetic head, wherein the air bearing surface of the thin film magnetic head is ground and chamfered at the same time to form the edge surface to obtain the thin film magnetic head of the above (1) to (11).

(13) The method for manufacturing a thin film magnetic head according to the above (12), wherein the polishing is performed with a diamond polishing film using fine diamond particles.

(14) The method for manufacturing a thin film magnetic head according to the above (13), wherein the average particle size of the diamond fine particles is 1.0 μm or less.

(15) The diamond polishing film has a thickness of 10 μm or less (13) or (14)
Of manufacturing a thin film magnetic head of.

[0023]

In the present invention, preferably, the surface of the air bearing surface is polished by using a predetermined diamond polishing film to make the chamfered length of the edge surface of the entire circumference of the air bearing surface extremely uniform. More specifically, on the air bearing surface of the slider, a taper surface is formed on the air inflow side so as to be connected to the flat surface of the central portion,
Also, a thin film transducer element is formed on the air inflow end side, but the ridge between these tapered surfaces and flat surfaces,
In particular, the chamfered dimension greatly changes at the interface between the thin film transducer element and the slider. This is preferably controlled by using a predetermined diamond polishing film so that the amount of change is minimized. As a result, there is an unexpected effect that the floating stability is remarkably improved, for example, the fluctuation of the roll angle in the floating posture is reduced.

[0024]

Specific Structure Hereinafter, a specific structure of the present invention will be described with reference to the accompanying drawings. First, the thin film magnetic head obtained by the present invention will be described. 1 and 2, FIG. 3 and FIG. 4, and FIG. 5 and FIG. 6 are a perspective view and a plan view, respectively, showing an example of a thin film magnetic head, but the subject of the size regulation of the present invention becomes clear. As you can see, it is drawn more exaggerated than it actually is. In these figures, the slider 1 has a flat air bearing surface 12 on the medium facing surface 11, and an arrow a indicates an air inflow direction when combined with a magnetic disk. In FIGS. 1 and 2, two rails 16 and 16 are formed on both ends of the medium facing surface 11 in the air inflow direction a through the groove 19 in the central portion, and on the rails 16 and 16. The medium facing surface constitutes the air bearing surfaces 12, 12. The rail 16,
16 may be three or more. Further, in FIG. 3, FIG. 4, FIG. 5, and FIG. 6, almost the entire area of the medium facing surface 11 constitutes the air bearing surface 12. A thin film transducer element 17 having a total thickness of about 30 to 60 μm is formed at the air outflow end of the slider 1 by a thin film laminating technique. Also, the size of the medium facing surface is (0.2 to 4 m
m) × (0.2 to 3.2 mm).

When used as a magnetic disk device,
A surface 115 of the slider 1 opposite to the medium facing surface 11 is head-stacked on a gimbal assay, and the so-called contact. start. It is driven by a stop (hereinafter referred to as CSS) method. When the magnetic disk is stationary, the air bearing surface 12 is pressed against the surface of the magnetic disk by the spring pressure of the head supporting device, but when the magnetic disk rotates, a lift dynamic pressure is applied to the air bearing surface 12 of the slider 1. Occurs, and the levitation amount operates in balance with this dynamic pressure and the spring pressure of the head support device. Note that the CSS effectively realizes the roll angle fluctuation suppressing effect particularly in the flying posture, but in addition to this, so-called dynamic loading can also be used.

As shown in FIGS. 1, 2 and 3 and 4, the air bearing surface 12 is a flat surface 121 in the center.
And a taper surface 122 on the inflow side that is connected to the air inflow side and inclines at a slight angle with respect to the flat surface 121. The formation 122 of the tapered surface is performed prior to the polishing step of polishing the air bearing surface and simultaneously performing chamfering. 5 and 6 are examples in which the inflow-side tapered surface 122 is not provided.

The entire circumference of such an air bearing surface 12 is chamfered to form an edge surface 14. The chamfer length of the edge surface 14 is regulated extremely uniformly over the entire circumference, and the ridge 131 between the tapered surface 122 and the flat surface 121 where the chamfer length is most variable, the thin film transducer element 17, and the slider 1. Interface 1
Even at 71, the fluctuation is small.

More specifically, when the inflow side taper surface 122 is provided, the ridge 131 of the flat surface 121 and the taper surface 122 on the edge surfaces 14 at both ends in the direction perpendicular to the air inflow direction (width direction). Is the base point and ±
The chamfering length of IV in the region of 0.1 mm is set to l _4, and the region V that is connected to the inflow side tapered surface 122 of the air bearing surface 12 of the edge surface 14 (note that the tapered surface 121 in FIGS. 5 and 6 is not provided. When the chamfer length of the area V is the area which is connected to the flat surface 121) is l ₅ , (l ₄ −l
₅ ) / l ₅ can be regulated to 0.4 or less, more preferably 0.35 or less, particularly 0 to 0.3, and further 0.05 to 0.3. In this case, chamfer length means air bearing surface 1
2 is the vertical distance between the side end surface of the head facing the medium (for example, the side surface of the rail 16) and the boundary line of the air bearing surface 12 when the two flat surfaces 121 are laid flat. It is calculated by measuring the interference fringe generation area by a two-beam interference method with a light beam microscope.
In the two-beam interferometry method, the beams are split into two beams having the same intensity, one of which is incident on a reference mirror (glass reference plate) and the other is incident on a sample, and the optical path difference between both reflected lights is measured. At this time, in the two-beam microscope, for example, a green (546 nm) light source using a multilayer interference filter is used, and the inter-fringe width of the interference fringes generated by the wedge of air formed between the reference mirror and the subject surface, that is, for example, half wavelength (27 nm).
A contour line every 3 nm) can be drawn on the object to be inspected, and the chamfer length and the chamfer depth are measured from the contour line generation region and the contour line, respectively. Then, the regions III and III ′ described later
Then, about 3 points may be sampled at substantially equal intervals, and about 2 points may be sampled at almost equal intervals in the other regions, and the measured values may be averaged. A region V, and a region I to be described later, are regions in which straight portions in the width direction (direction perpendicular to the air inflow direction) are formed at the inflow and outflow ends of the air bearing surface 12.

Further, on the edge surfaces 14 at both ends (both outer ends) in the direction perpendicular to the air inflow direction (width direction), the slider 1 and the thin film transducer element 17 at the rear end of the flat surface 121 of the air bearing surface 12 are provided. From the boundary 171 at the boundary of the air inlet to the air inflow end side.
Chamfer length l ₂ of area II up to 2 mm, edge surface 14
Connected to the flat surface 121 of the flat surface 121 of the region II to the air outflow side end of the region IV (when the inflow side tapered surface 122 of FIGS. 5 and 6 is not provided, the air inflow end of the flat surface 121). When the chamfering length of the region III on both side ends (both outside ends) to the position of 0.1 mm before the ridge) is l ₃ ,
(L ₃ −l ₂ ) / l ₃ is 0.2 or less, more preferably 0
It is preferable to regulate to 0.15. This (l ₃ -l
₂ ) / l ₃ is 0.3 or more in ordinary polishing. Further, the above (l ₄ −l ₅ ) / l ₅ is also 0.
It will be 5 or more. Therefore, these tapered surfaces 122
Chamfering lengths l ₄ , l near the ridge 131 between the flat surface 121 and the flat surface 121 and before the interface 171 with the element 17 of the slider 1.
By regulating the relationship between ₂ and the chamfered lengths l ₅ and l ₃ on the inflow side or the flat surface side part, the fluctuation of the roll angle particularly in the floating posture is critically reduced.

When a plurality of rails 16 and 16 are provided, a region IV 'in the vicinity of the ridge between the tapered surface 122 and the flat surface 121 on the inner (inner side) edge surface 14 of the rails 16 and 16 and the thin film. Transducer element 17
The area II ′ before the interface 171 between the slider 1 and the slider 1, the side area III ′ of the flat surface 121, and the like are the outer edge surface 1 on the outer side.
It is preferable to regulate in exactly the same manner as in No. 4. Further, when the chamfer length of the edge surface 14 at the air outflow end is l ₁ , the chamfers of the areas III and III ′ on the side of the flat surface 121 of the edge surface 14 and the areas VI and VI ′ on the side of the tapered surface 122. Length is the area
It is preferable to limit the chamfer lengths l ₂ , l ₄ , l _5, etc. of II, II ', IV, IV', V to within 120% of the chamfer length l ₁ of the region I. By making the chamfered length of the edge surface 14 of the entire circumference uniform in this way, the floating property is further improved.

Further, it is preferable that the chamfered length of the edge surface 14 on the entire circumference is restricted to 4 to 20 μm, particularly 8 to 20 μm. Particularly, the thin film transducer element 17 is provided on the air outflow side, and the chamfering amount l _{1 of} this region I is set.
When it is 25 μm or more, scratches may be generated on the element, so it is preferable to suppress it within 20 μm. On the other hand, if it is less than 4 μm, chamfering becomes unstable and the element may be scratched during durable running. Area I
The chamfer length is regulated to 4 to 20 μm. When the chamfer length l ₁ of the region I on the element side is set in the range of ₄ to 20 μm, if the relations of l ₄ and l ₅ , l ₃ and l ₂ etc. are regulated according to the present invention, the other regions will naturally have 4 ~ 20μ
It will be possible to regulate in the range of m. The preferable chamfer length is 4 to 20 μm in the region I, more preferably 8 to 2
It is 0 μm, and for other regions it is 4 to 20 μm, more preferably 5 to 15 μm.

Further, it is preferable that the chamfering length in all regions of the edge surface 14 is 4 to 20 μm.
It is preferable to limit the range R (difference between the maximum value and the minimum value) of this chamfered length defined in JIS Z81081 to 5 μm or less. As a result, the floating stability is further improved.

Further, in such a case, in order to improve the floating stability, the chamfering depth when the flat surface 121 of the air bearing surface 12 is vertically left stationary and observed is the edge surface of the entire circumference. It is preferable to regulate the thickness to about 0.05 to 0.06 μm. This chamfer depth can be calculated by measuring the interference fringe generation region with a two-beam microscope as described above, or can be obtained from contour lines when measuring the chamfer length. Further, when measuring the chamfering depth when the air bearing surface 12 is left stationary, the chamfering length can be obtained from the contour lines. The chamfering length and chamfering depth at each part of the edge surface of the entire circumference can be regulated to a variation coefficient CV of 10% or less, particularly 9% or less when 100 heads are manufactured. The floatability of can also be stabilized.

The slider material has a Vickers hardness (J
IS Z 2244 test load 500g) HV (500
g) It is set to be in the range of 1100 or more, particularly 1100 to 3000. In this case, the lower limit is preferably 1300 or more, more preferably 1500.
As described above, it is more preferably 1800 or more, and at this time, the effect of the present invention is further improved.

As such a ceramic material, A
l ₂ O ₃ —TiO ₂ [HV (500) 1150 or so],
Mg O-NiO-ZrO ₂ (about 1200), ZrO
₂ (about 1200 to 1600), ZrO ₂ -Al ₂ O ₃
(About 1400 to 1600), Al ₂ O ₃ -Tic-
AlN (1700 to 2000), SiC (1800 to 2)
000 _{about), Al 2 O 3 -TiC (} 2000~230
0) is suitable. Further, these may contain Mg, Y, ZrO ₂ , TiO ₂ or the like as an additive. Among these, the ceramics containing Al ₂ O ₃ —TiC as a main component are particularly preferable for the present invention in terms of workability.

Edge surface 14 by such chamfering processing
Are formed at the same time as surface polishing of the air bearing surface. FIG. 5 shows a case where the magnetic head slider 1 shown in FIGS. 1 and 2 is polished by using the elastic sheet 91, the polishing film 92, the processing table 93, and the jig 94. In this case, the slider may have any of the above structures. The elastic sheet 91 acts as a support for the polishing film 92.

As shown in FIG. 6, the polishing film 92 has an abrasive layer 921 formed on a flexible film 922 as a support. Abrasive layer 921
Can be prepared by preferably using diamond fine particles such as synthetic diamond abrasive grains, using a binder resin such as polyurethane resin, using a diluting solvent such as MEK / toluene / cyclohexanone mixed system, and drying. This paste, using various coating machines,
It is evenly coated on the support to form a layer. As the flexible film 922 serving as a support, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyamide, polyimide or the like can be used.

The average particle diameter of the diamond particles preferably used is preferably 1.0 μm or less, particularly 0.1 to 1.0 μm, further 0.1 to 0.9 μm, and most preferably 0.1. It is preferably 0.5 μm. The weight ratio of the diamond particles to the binder is about 1: 1/7 to 1. Also, the abrasive layer 921
The thickness is preferably 1 to 8 μm (the following is better).

The magnetic head slider 1 is attached to a jig 94 by means such as adhesion, and the medium facing surface 11 side of the slider 1 of the thin film magnetic head is supported by an elastic sheet 91 while applying a load to the jig 94. Abrasive film 9
The slider 1 is brought into contact with the surface of No. 2 and the slider 1 is moved relative to the polishing film 92 for polishing. At this time,
As shown in, the stiffness ET ^3, which is an index of flexibility of the polishing film defined by Young's modulus as E, is 0.8 to 3.0 × 10 so that the diamond polishing film is pressed in a suitable state. ⁵ (μm) ³ kg / mm ² , preferably 0.8 to 1.6 × 10 ⁵ (μm) ³ kg / mm ² , particularly preferably 0.8 to 1.2 × 10 ⁵ (μm) ³ kg / mm ²
It is desirable to set so that Since the flexible film as the support is made of the above-mentioned materials and its Young's modulus is within a predetermined range, the diamond abrasive film's stiffness largely depends on its total thickness. Therefore, if the thickness of the polishing film is too thick or too thin, the adhesion will deteriorate and the polishing or chamfering of the polished surface or the edge surface will not be uniform. Therefore, the thickness of the film should be 10 μm or less, especially 2 to 10 μm.
It is preferable to set the stiffness of the diamond polishing film within the above range. As a result, variations in the chamfering amount of the edge surface are suppressed, and stable floating property can be obtained.

The relative movement during polishing may be achieved by moving either the slider 1 or the polishing film 92.
Alternatively, the polishing film may be formed in a circular shape, and the polishing film may be rotated around the center of the circle to perform polishing in the manner of a so-called buff. Alternatively, a combination of a long-length polishing film and an elastic sheet may be used as an endless tape by forming a ring with the polishing film on the outside, and polishing may be performed by running this. The load is in the range of 5 to 200 g per magnetic head. Further, the polishing time is generally about 10 to 300 seconds, though it depends on the hardness of the slider 1, the particle size of diamond particles, the size of the load, and the like.

[0041]

EXAMPLES Next, examples of the present invention will be shown to explain the present invention in more detail. Example 1 As an abrasive, diamond having an average particle size shown in Table 1 below was used, and the paste was compounded at the following compounding ratio of the paste,
This was laminated on a predetermined elastic sheet to prepare a diamond polishing film whose total thickness was changed as shown in Table 1.

Diamond abrasive grains 100.0 parts by weight Polyurethane resin 20.0 parts by weight Diluting solvent 100.0 parts by weight

Using this polishing film, under the conditions of constant load and polishing time, the structure of FIGS. 1 and 2 is 2.8 × 2.24 mm.
The slider having the medium facing surface of 1 was polished. The head slider is made of Al ₂ O ₃ —TiO ₂ and has a Hv (50
0 g) is a thin film magnetic head having 2000 sliders. The results are shown in Table 1. Table 1 shows the average values of l ₄ and l ₅ of the regions IV and V in 100 samples, and (l ₄ −
The maximum value of l ₅ ) / l ₅ is shown. An interference objective lens manufactured by Nikon Corporation was used for the two-beam microscope.

As the head floating stability after polishing,
The levitating posture was measured. That is, a glass disk is rotated at a disk rotation speed of 3600 rpm with a levitation measuring material,
The measurement slider is levitated, and the interference light from white light causes
The roll tilt stability was measured. The evaluation is the following five-level evaluation, and 3 or more is an OK level. The results are also shown in Table 1.

Evaluation Roll angle inclination of 100 heads 5 0.01 μm or less 4 0.02 μm or less 3 0.03 μm or less 2 0.04 μm or less 1 Over 0.05 μm

[0046]

[Table 1]

From the measurement results of 100 pieces, when the difference between l ₄ and l ₅ is within 40% of l ₅ , the roll inclination in the floating posture is small and stable, and when it exceeds 40%, 100 is obtained.
It can be seen that even among the individual pieces, variations occur and the instability of the roll inclination increases. Sample No. 1-4
CV of l ₄ and l ₅ of 9% or less, comparative sample No.
CV of l ₄ and l ₅ of 5-9 was 10 percent. Further, the range R of the chamfering amount of all the edge surfaces was 5 μm or less in all the 100 heads.

Example 2 Next, the average value of 100 samples of l ₂ and l _{3 in} the regions II and III and the maximum value of (l ₃ −l ₂ ) / l ₃ were measured in the same manner as in Example 1. . The results are shown in Table 2.

[0049]

[Table 2]

From the results shown in Table 2, the effect of controlling the relationship between l ₂ and l ₃ is clear. In addition, CV of l ₂ and l ₃ of sample Nos. 11 to 13 is 9% or less,
Comparison CV of l ₂ and l ₃ samples No. 14, 15 was 10 percent. In addition, sample Nos. 1 to 4 and 11 to 11
The chamfering amount l of the area I for all 100 heads out of 13
_{If 1} is set to ₄ to 20 μm, the chamfering amount of all other edge surfaces will also be 4 to 20 μm, and at that time the chamfering amount range R will be 5 μm or less, and the chamfering amount of all edge surfaces will be uniform. Was confirmed.

[Brief description of drawings]

FIG. 1 is a perspective view showing an example of a thin film magnetic head of the present invention.

FIG. 2 is a plan view of FIG.

FIG. 3 is a perspective view showing another example of the thin film magnetic head of the present invention.

FIG. 4 is a plan view of FIG.

FIG. 5 is a perspective view showing another example of the thin film magnetic head of the present invention.

FIG. 6 is a plan view of FIG.

FIG. 7 is a front view for explaining a method of polishing and chamfering an air bearing surface of a slider of a thin film magnetic head.

FIG. 8 is a cross-sectional view showing an example of an abrasive film used for polishing and chamfering.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 slider 11 medium facing surface 12 air bearing surface 121 flat surface 122 taper surface 14 edge surface 16 rail 17 thin film transducer element 92 polishing film 921 polishing material layer 922 flexible film

Claims (15)

[Claims] 1. A slider has a thin film transducer element on an air outflow end side, and an edge surface of the air bearing surface is chamfered to form an edge surface. The air bearing surface is a central flat surface. Has a taper surface on the air inflow side that is connected to the air inflow direction, and the air inflow direction is based on the ridge between the central flat surface and the inflow side taper surface on the edge surfaces at both ends in the direction perpendicular to the air inflow direction. The chamfer length of the area up to ± 0.1 mm
_4. A thin film magnetic head in which (l ₄ −l ₅ ) / l ₅ is 0.4 or less when the chamfer length of the edge surface of the air inflow end connected to the inflow side tapered surface is l ₅ . 2. A chamfered length of l _{2 in} a region from the interface between the slider and the thin film transducer element to 0.2 mm from the interface between the slider and the thin film transducer element on the edge surfaces at both ends in the direction perpendicular to the air inflow direction, the central flat surface. when the chamfer length of the edge surface of the side end which connects to the l _{3 in, (l 3 -l 2) /} l 3 thin film magnetic head according to claim 1 is 0.2 or less. 3. A slider has a thin film transducer element on the air outflow end side, and the edge of the entire circumference of the air bearing surface is chamfered to form an edge surface, and the air bearing surface is a central flat surface. Has a taper surface on the air inflow side that is connected to the air inflow side, and extends from the interface between the slider and the thin film transducer element on the edge surfaces on both ends in the direction perpendicular to the air inflow direction to 0.2 mm on the air inflow end side. Area chamfer length is l
_2, when a chamfer length of edge surface of the side end which connects to the central portion flat surface was _{l 3, (l 3 -l 2} ) / l 3 thin film magnetic head is 0.2 or less. 4. The thin-film magnetic head according to claim ₁ , wherein the edge surface at the air outflow end has a chamfered length l _{1 of 4} to 20 μm. 5. The chamfer length of all edge surfaces is 4 to 20 μm.
5. The thin film magnetic head according to claim 1. 6. A range of chamfer lengths R (JI
The thin film magnetic head according to claim 1, wherein S Z81081) is 5 μm or less. 7. A thin film transducer element is provided on the slider on the air outflow end side, and the edge of the entire circumference of the air bearing surface is chamfered to form an edge surface. 20 μm, and the range R of this chamfer length (JIS Z81081) is 5 μm.
Thin film magnetic head that is less than or equal to m. 8. The air bearing surface is formed on a pair of rails provided in parallel to the air inflow direction at both ends of a surface of the magnetic recording medium facing surface perpendicular to the air inflow direction. 7 to a thin film magnetic head. 9. The thin film magnetic head according to claim 1, wherein the air bearing surface occupies substantially the entire area of the magnetic recording medium facing surface. 10. The thin film magnetic head according to claim 1, which floats and runs on a magnetic recording medium by a contact start / stop method. 11. The Vickers hardness HV of the slider
(500 g) is 1100 or more.
0 thin film magnetic head. 12. A method of manufacturing a thin film magnetic head according to claim 1, wherein the air bearing surface of the thin film magnetic head is ground and simultaneously chamfered to form the edge surface. 13. The polishing is performed by a diamond polishing film using diamond fine particles.
Of manufacturing a thin film magnetic head of. 14. The method of manufacturing a thin film magnetic head according to claim 13, wherein the average particle diameter of the diamond fine particles is 1.0 μm or less. 15. The method of manufacturing a thin film magnetic head according to claim 13, wherein the diamond polishing film has a thickness of 10 μm or less.