JPH061233Y2 - プラズマ粉体処理装置 - Google Patents

プラズマ粉体処理装置

Info

Publication number
JPH061233Y2
JPH061233Y2 JP1989065413U JP6541389U JPH061233Y2 JP H061233 Y2 JPH061233 Y2 JP H061233Y2 JP 1989065413 U JP1989065413 U JP 1989065413U JP 6541389 U JP6541389 U JP 6541389U JP H061233 Y2 JPH061233 Y2 JP H061233Y2
Authority
JP
Japan
Prior art keywords
powder
reaction gas
plasma
reactor
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989065413U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0257143U (enExample
Inventor
健二 寺井
則道 嶺村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP1989065413U priority Critical patent/JPH061233Y2/ja
Publication of JPH0257143U publication Critical patent/JPH0257143U/ja
Application granted granted Critical
Publication of JPH061233Y2 publication Critical patent/JPH061233Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Powder Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
JP1989065413U 1988-06-24 1989-06-06 プラズマ粉体処理装置 Expired - Lifetime JPH061233Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989065413U JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8290888 1988-06-24
JP63-82908 1988-06-24
JP1989065413U JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Publications (2)

Publication Number Publication Date
JPH0257143U JPH0257143U (enExample) 1990-04-25
JPH061233Y2 true JPH061233Y2 (ja) 1994-01-12

Family

ID=31718320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989065413U Expired - Lifetime JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Country Status (1)

Country Link
JP (1) JPH061233Y2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003280787A1 (en) * 2003-06-20 2005-01-04 Hosokawa Powder Technology Research Institute Powder treatment method, powder treatment device, and method of manufacturing porous granulated matter
CN113122821B (zh) * 2020-01-15 2023-05-30 株洲弗拉德科技有限公司 一种搅拌式粉体真空气相沉积炉

Also Published As

Publication number Publication date
JPH0257143U (enExample) 1990-04-25

Similar Documents

Publication Publication Date Title
US5834371A (en) Method and apparatus for preparing and metallizing high aspect ratio silicon semiconductor device contacts to reduce the resistivity thereof
US3926147A (en) Glow discharge-tumbling vapor deposition apparatus
EP0254424A2 (en) Powder treating method and apparatus
US4080281A (en) Apparatus for making metal films
JPH09202973A (ja) 成膜処理装置の排気システム構造
US4633812A (en) Vacuum plasma treatment apparatus
CN106658934A (zh) 一种微波等离子体粉体处理装置
JP2656349B2 (ja) プラズマ粉体処理装置
JPH0526536B2 (enExample)
JPH10302998A (ja) ワークのプラズマ処理装置およびプラズマ処理方法
KR20080084140A (ko) 진공 처리 장치 및 이를 이용한 분체의 진공 처리 방법
JP3326973B2 (ja) セラミック原料熱処理装置
JPH11131238A (ja) 誘電体薄膜形成装置及び誘電体薄膜形成方法
CN217303445U (zh) 一种金属瓶盖烘干机
CA2050306C (en) Device for transporting bulk materials comprising a vibrator conveyor which dips into a liquid
CN114836735B (zh) 基于icp的等离子体镀膜装置及其方法
CN220892767U (zh) 一种锂电池负极材料烘干装置
US2454188A (en) Paddle means for spraying
JPS6151629B2 (enExample)
JPH0237717A (ja) 処理装置
CN219597172U (zh) 一种旋涂机
JPS62294180A (ja) プラズマｃｖｄ法による堆積膜形成装置
JPS641959Y2 (enExample)
JPS5855561A (ja) 浸炭装置
JPH06252063A (ja) プラズマｃｖｄ装置