JPH061233Y2 - プラズマ粉体処理装置 - Google Patents

プラズマ粉体処理装置

Info

Publication number
JPH061233Y2
JPH061233Y2 JP1989065413U JP6541389U JPH061233Y2 JP H061233 Y2 JPH061233 Y2 JP H061233Y2 JP 1989065413 U JP1989065413 U JP 1989065413U JP 6541389 U JP6541389 U JP 6541389U JP H061233 Y2 JPH061233 Y2 JP H061233Y2
Authority
JP
Japan
Prior art keywords
powder
reaction gas
plasma
reactor
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989065413U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0257143U (enExample
Inventor
健二 寺井
則道 嶺村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP1989065413U priority Critical patent/JPH061233Y2/ja
Publication of JPH0257143U publication Critical patent/JPH0257143U/ja
Application granted granted Critical
Publication of JPH061233Y2 publication Critical patent/JPH061233Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Powder Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
JP1989065413U 1988-06-24 1989-06-06 プラズマ粉体処理装置 Expired - Lifetime JPH061233Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989065413U JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8290888 1988-06-24
JP63-82908 1988-06-24
JP1989065413U JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Publications (2)

Publication Number Publication Date
JPH0257143U JPH0257143U (enExample) 1990-04-25
JPH061233Y2 true JPH061233Y2 (ja) 1994-01-12

Family

ID=31718320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989065413U Expired - Lifetime JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Country Status (1)

Country Link
JP (1) JPH061233Y2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4580339B2 (ja) * 2003-06-20 2010-11-10 ホソカワミクロン株式会社 粉体処理方法、及び、粉体処理装置
CN113122821B (zh) * 2020-01-15 2023-05-30 株洲弗拉德科技有限公司 一种搅拌式粉体真空气相沉积炉

Also Published As

Publication number Publication date
JPH0257143U (enExample) 1990-04-25

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