JPH06116283A - Production of 3,4'-dideoxymycaminosyltylonolide derivative - Google Patents

Production of 3,4'-dideoxymycaminosyltylonolide derivative

Info

Publication number
JPH06116283A
JPH06116283A JP26885392A JP26885392A JPH06116283A JP H06116283 A JPH06116283 A JP H06116283A JP 26885392 A JP26885392 A JP 26885392A JP 26885392 A JP26885392 A JP 26885392A JP H06116283 A JPH06116283 A JP H06116283A
Authority
JP
Japan
Prior art keywords
group
formula
general formula
compound
compound represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26885392A
Other languages
Japanese (ja)
Inventor
Tomio Takeuchi
富雄 竹内
Sumio Umezawa
純夫 梅沢
Osamu Tsuchiya
修 土屋
Toshiharu Kageyama
俊治 陰山
Toshiaki Miyake
俊昭 三宅
Hiroshi Tanaka
博 田中
Takeo Yoshioka
武男 吉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Microbial Chemistry Research Foundation
Original Assignee
Microbial Chemistry Research Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microbial Chemistry Research Foundation filed Critical Microbial Chemistry Research Foundation
Priority to JP26885392A priority Critical patent/JPH06116283A/en
Priority to EP93901539A priority patent/EP0627443B1/en
Priority to JP51233493A priority patent/JP3264926B2/en
Priority to CA002127259A priority patent/CA2127259A1/en
Priority to AT93901539T priority patent/ATE150757T1/en
Priority to DE69309259T priority patent/DE69309259T2/en
Priority to AU32668/93A priority patent/AU3266893A/en
Priority to ES93901539T priority patent/ES2099941T3/en
Priority to PCT/JP1993/000031 priority patent/WO1993014101A1/en
Priority to TW082100137A priority patent/TW243446B/zh
Priority to US08/256,537 priority patent/US5541303A/en
Priority to DK93901539.2T priority patent/DK0627443T3/en
Priority to CN93100302A priority patent/CN1076452A/en
Publication of JPH06116283A publication Critical patent/JPH06116283A/en
Priority to GR970401178T priority patent/GR3023529T3/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the compound useful as a synthetic intermediate for dideoxymycaminosyltylonolide, an antimicrobial agent, by reducing a specific mycaminosyltylonolide derivative under an alkali condition. CONSTITUTION:A compound of formula I (A is protecting carbonyl; B is protecting aldehyde; R<1> is hydroxyl group which may be protected; R<2> is H or lower alkanoyl; R<3> is sulfonic acid residue; X is halogen) is reduced under an alkali condition to give the objective compound of formula II. To be concrete, the compound of formula II is catalytically reduced in an inert solvent in the presence of a catalyst. In order to make the alkali condition, potassium carbonate is preferably used and Raney nickel is preferable as the catalyst. The raw material compound of formula I is preferably obtained by reacting a mycaminosyltylonolide derivative of formula III prepared from tylosin with a sulfonylating agent such as benzylsulfonic acid and halogenating the reactional product.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、優れた感染防御作用を
有する抗菌性物質である3,4′−ジデオキシマイカミ
ノシルタイロノライド及びその中間体である3,4′−
ジデオキシマイカミノシルタイロノライド誘導体の新規
製造方法、該方法に有用な製造中間体に関する。
FIELD OF THE INVENTION The present invention relates to 3,4'-dideoxymycaminosyl tylonolide, which is an antibacterial substance having an excellent infection-protecting action, and 3,4'-, which is an intermediate thereof.
The present invention relates to a novel method for producing a dideoxymycaminosyl tylonolide derivative and a production intermediate useful for the method.

【0002】[0002]

【従来の技術】3,4′−ジデオキシマイカミノシルタ
イロノライド又はその塩は、グラム陽性及び陰性に属す
る微生物に対して抗菌活性を示す物質であり、特に感染
防御作用に優れた抗菌剤として有用である(特開平2−
275894号公報)。3,4′−ジデオキシマイカミ
ノシルタイロノライドは、タイロシンの酸加水分解物で
あるマイカミノシルタイロノライドの官能基を適宜保護
した後、3位及び4′位の水酸基をデオキシ化し、さら
に適宜脱保護することにより製造することができる。例
えば、3位と4′位の水酸基をスルホニル化した後、ジ
ャーナル・オブ・アンティバイオティックス(J. Antibi
otics 34、1374〜1376頁) 又は特開平2-191295号公報に
記載された方法により4′位の水酸基をハロゲン化し、
更に水素化トリブチル錫を用いてハロゲン原子を還元的
に除去するデオキシ化法が知られている。上記特開平2-
275894号公報に記載された方法も、同様に4′位の水酸
基をデオキシ化する方法である。3位の水酸基について
は、アルカリ条件下でスルホン酸を脱離させて二重結合
を形成させた後、二重結合を接触還元することによりデ
オキシ化を行うことができる。
2. Description of the Related Art 3,4'-dideoxymycaminosyl tylonolide or a salt thereof is a substance showing antibacterial activity against Gram-positive and -negative microorganisms, and particularly as an antibacterial agent excellent in infection-preventing action. Useful (JP-A-2-
275894). 3,4′-dideoxymycaminosyl tylonolide is a compound in which the functional group of mycaminosyl tylonolide, which is an acid hydrolyzate of tylosin, is appropriately protected, and then the hydroxyl groups at the 3 and 4 ′ positions are deoxygenated. It can be produced by appropriate deprotection. For example, after sulfonylating the hydroxyl groups at the 3 and 4'positions, use the Journal of Antibiotics (J. Antibi
otics 34, pp.1374-1376) or halogenating the hydroxyl group at the 4'position by the method described in JP-A No. 2-191295.
Further, a deoxygenation method is known in which a halogen atom is reductively removed by using tributyltin hydride. JP-A-2-
The method described in Japanese Patent No. 275894 is also a method of deoxidizing the hydroxyl group at the 4'position. Regarding the hydroxyl group at the 3-position, deoxidation can be carried out by eliminating the sulfonic acid under alkaline conditions to form a double bond and then catalytically reducing the double bond.

【0003】しかし上記の方法によれば、3位及び4′
位のデオキシ化を行うにあたり、両水酸基をスルホニル
化して4′位をハロゲン化した後、さらに3工程(4′
位の水素化トリブチル錫による還元工程、3位の二重結
合形成工程、及び還元工程)の反応を行う必要があり、
収率が低いという問題があった(約65〜70%)。さら
に、4′位のデオキシ化に使用する水素化トリブチル錫
は悪臭を伴い、反応後の生成物の精製が困難になるの
で、この反応を工業的に応用することには問題があっ
た。
However, according to the above method, the 3rd and 4'th positions are used.
In performing deoxygenation of the 4-position, both hydroxyl groups are sulfonylated to halogenate the 4'-position, and then three steps (4 '
Step, reduction step with tributyltin hydride at position 3, double bond formation step at position 3, and reduction step),
There was a problem of low yield (about 65-70%). Furthermore, tributyltin hydride used for deoxygenation at the 4'-position has a bad odor, and purification of the product after the reaction becomes difficult, so that there is a problem in industrially applying this reaction.

【0004】[0004]

【発明が解決しようとする課題】本発明は、3,4′−
ジデオキシマイカミノシルタイロノライドを製造するた
めの有用な中間体である3,4′−ジデオキシマイカミ
ノシルタイロノライド誘導体を製造するにあたり、上記
の問題点を解決し、工業的に応用可能な新規製造方法を
提供することを目的とする。さらに具体的には、本発明
は、水素化トリブチル錫を用いることなく、3位及び
4′位にそれぞれスルホニル基で保護された水酸基とハ
ロゲン原子とを有するマイカミノシルタイロノライド誘
導体を、1工程で効率的に水素置換して、目的の3,
4′−ジデオキシマイカミノシルタイロノライド誘導体
を製造する方法を提供することを目的とする。また、本
発明は、マイカミノシルタイロノライド誘導体から、効
率的かつ工業的に応用可能な方法で、3位及び4′位の
同時デオキシ化を行う方法を提供することを目的とす
る。
The present invention is based on 3,4'-
In producing a 3,4'-dideoxymycaminosyl tylonolide derivative, which is a useful intermediate for producing dideoxymycaminosyl tylonolide, the above-mentioned problems are solved and industrially applicable. It is intended to provide a new manufacturing method. More specifically, the present invention provides a mycaminosyl tylonolide derivative having a hydroxyl group and a halogen atom protected by a sulfonyl group at the 3 and 4'positions, respectively, without using tributyltin hydride. Efficiently replace hydrogen in the process,
It is an object of the present invention to provide a method for producing a 4'-dideoxymycaminosyl tylonolide derivative. Another object of the present invention is to provide a method for simultaneous deoxygenation of 3-position and 4'-position from a mycaminosyl tylonolide derivative by an efficient and industrially applicable method.

【0005】[0005]

【課題を解決するための手段】本発明は、下記一般式
(II):
The present invention provides the following general formula (II):

【0006】[0006]

【化6】 [Chemical 6]

【0007】(式中、Aは保護されたカルボニル基を表
し、Bは保護されたアルデヒド基を表し、R1 は保護さ
れていてもよい水酸基を表し、R2 は水素原子又は低級
アルカノイル基を表し、R3 はスルホン酸残基を表し、
Xはハロゲン原子を表す)で示される化合物をアルカリ
条件下で還元する工程を含む、下記一般式(I):
(In the formula, A represents a protected carbonyl group, B represents a protected aldehyde group, R 1 represents an optionally protected hydroxyl group, and R 2 represents a hydrogen atom or a lower alkanoyl group. R 3 represents a sulfonic acid residue,
X represents a halogen atom), and a step of reducing the compound represented by the following general formula (I):

【0008】[0008]

【化7】 [Chemical 7]

【0009】(式中、A、B及びR1 はそれぞれ上記と
同様の意味を有する)で示される3,4′−ジデオキシ
マイカミノシルタイロノライド誘導体の製造方法を提供
するものである。本発明によれば、さらに下記一般式
(IV):
The present invention provides a method for producing a 3,4'-dideoxymycaminosyl tylonolide derivative represented by the formula (wherein A, B and R 1 have the same meanings as described above). According to the present invention, the following general formula (IV):

【0010】[0010]

【化8】 [Chemical 8]

【0011】(式中、A、B、R1 及びR2 は、上記の
A、B、R1 及びR2 とそれぞれ同様の意味を有する)
で示されるマイカミノシルタイロノライド誘導体をスル
ホニル化剤と反応させて、下記一般式(III) :
(In the formula, A, B, R 1 and R 2 have the same meanings as the above A, B, R 1 and R 2 , respectively)
By reacting a mycaminosyl tylonolide derivative represented by a sulfonylating agent with the following general formula (III):

【0012】[0012]

【化9】 [Chemical 9]

【0013】(式中、A、B、R1 、R2 及びR3 は、
上記のA、B、R1 、R2 及びR3 とそれぞれ同様の意
味を有する)で示される化合物を製造する工程、該式(I
II) で示される化合物をハロゲン化剤と反応させて上記
の一般式(II)で示される化合物を得る工程、及び該式
(II)で示される化合物をアルカリ条件下で還元する工
程を含む、上記一般式(I)で示される3,4′−ジデ
オキシマイカミノシルタイロノライド誘導体の製造方法
が提供される。
(Where A, B, R 1 , R 2 and R 3 are
A step of producing a compound represented by the above-mentioned A, B, R 1 , R 2 and R 3 )
A step of reacting a compound represented by II) with a halogenating agent to obtain a compound represented by the general formula (II), and a step of reducing the compound represented by the formula (II) under alkaline conditions, Provided is a method for producing a 3,4'-dideoxymycaminosyl tylonolide derivative represented by the above general formula (I).

【0014】さらに、本発明の別の態様によれば、一般
式(II)で示される化合物を還元して一般式(I)で示
される化合物とした後、保護基を除去することを特徴と
する式(VI)で示される化合物の製造方法、並びに上記
製造方法に有用な下記一般式(V):
According to another aspect of the present invention, the compound represented by the general formula (II) is reduced to the compound represented by the general formula (I), and then the protecting group is removed. A method for producing the compound represented by the formula (VI), and the following general formula (V) useful for the above production method:

【0015】[0015]

【化10】 [Chemical 10]

【0016】〔式中、A及びBは上記の通りであり、Y
は水素原子、置換スルホニルオキシ基、又はハロゲン原
子を表し、Wは水素原子又は置換スルホニルオキシ基を
表し、R4 は水素原子又は低級アルカノイル基を表し、
ZはCHOH、CHOR5 (式中、R5は水酸基の保護基を表
す)、又はC=Oを表す〕で示される、一般式(I)で
示される3,4′−ジデオキシマイカミノシルタイロノ
ライド誘導体の製造中間体も提供される。
[Wherein A and B are as described above, and Y
Represents a hydrogen atom, a substituted sulfonyloxy group, or a halogen atom, W represents a hydrogen atom or a substituted sulfonyloxy group, R 4 represents a hydrogen atom or a lower alkanoyl group,
Z is CHOH, CHOR 5 (wherein R 5 represents a hydroxyl-protecting group), or C═O], and 3,4′-dideoxymycaminosyl tai represented by the general formula (I) Intermediates for the production of lonolide derivatives are also provided.

【0017】本発明の式(I)〜(IV)で示される化合
物において、A又はBが表すカルボニル基又はアルデヒ
ド基の保護基としては当業者に自明なものはいかなるも
のを使用してもよいが、例えば、ジメチルアセタール
(ジメチルケタール)、ジエチルアセタール(ジエチル
ケタール)、ジエチルチオアセタール(ジエチルチオケ
タール)、エチレンアセタール(エチレンチオケター
ル)、プロピレンアセタール(プロピレンケタール)等
のアセタール(又はチオアセタール)又はケタール(又
はチオケタール)等を用いることができる。
In the compounds represented by the formulas (I) to (IV) of the present invention, as the protective group for the carbonyl group or aldehyde group represented by A or B, any one obvious to those skilled in the art may be used. However, for example, acetal (or thioacetal) such as dimethyl acetal (dimethyl ketal), diethyl acetal (diethyl ketal), diethyl thioacetal (diethyl thioketal), ethylene acetal (ethylene thioketal), propylene acetal (propylene ketal), or Ketal (or thioketal) or the like can be used.

【0018】上記式中、R1 は保護されていてもよい水
酸基を表し、水酸基の保護基としては当業者に自明なも
のならばいかなるものを用いてもよいが、例えばt−ブ
チルジメチルシリル、ジメチルセキシルシリル、トリメ
チルシリル、トリエチルシリル、トリ(t−ブチル)シ
リル等のアルキルシリル基、トリチル基、テトラヒドロ
ピラニル基、テトラヒドロフラニル基、アリル(allyl
)基、アセチル基等の低級アルカノイル基、ベンゾイ
ル基、ベンジル基、メトキシメチル基、ベンジルオキシ
カルボニル基等を使用することができる。また、水酸基
の保護基としてマイシノシル基を使用してもよく、マイ
シノシル基の水酸基は上記の水酸基の保護基で保護され
ていてもよい R2 は水素原子又は低級アルカノイル基を表し、低級ア
ルカノイル基として炭素数1〜6の直鎖又は分岐状のア
ルカノイル基を挙げることができる。低級アルカノイル
基としては、例えば、ホルミル基、アセチル基、プロピ
オニル基、ブチリル基、イソブチリル基、バレリル基、
イソバレリル基、ピバロイル基、ヘキサノイル基等を用
いることができる。R3 はスルホン酸残基を示し、例え
ば、メシル基、エタンスルホニル基、プロピルスルホニ
ル基、イソプロピルスルホニル基ベンゼンスルホニル
基、トシル基、ベンジルスルホニル基等を用いることが
できる。Xはハロゲン原子を表し、例えば、塩素原子、
臭素原子、ヨウ素原子等のいずれでもよい。
In the above formula, R 1 represents a hydroxyl group which may be protected, and any protective group for the hydroxyl group may be used as long as it is obvious to those skilled in the art. For example, t-butyldimethylsilyl, Alkylsilyl groups such as dimethylthexylsilyl, trimethylsilyl, triethylsilyl, tri (t-butyl) silyl, trityl group, tetrahydropyranyl group, tetrahydrofuranyl group, allyl
) Group, lower alkanoyl group such as acetyl group, benzoyl group, benzyl group, methoxymethyl group, benzyloxycarbonyl group and the like can be used. Further, a mycinosyl group may be used as the hydroxyl-protecting group, and the hydroxyl group of the mycinosyl group may be protected by the above-mentioned hydroxyl-protecting group R 2 represents a hydrogen atom or a lower alkanoyl group, and as a lower alkanoyl group, A straight-chain or branched alkanoyl group having 1 to 6 carbon atoms can be mentioned. The lower alkanoyl group, for example, formyl group, acetyl group, propionyl group, butyryl group, isobutyryl group, valeryl group,
An isovaleryl group, a pivaloyl group, a hexanoyl group or the like can be used. R 3 represents a sulfonic acid residue, and for example, a mesyl group, an ethanesulfonyl group, a propylsulfonyl group, an isopropylsulfonyl group, a benzenesulfonyl group, a tosyl group, a benzylsulfonyl group or the like can be used. X represents a halogen atom, for example, a chlorine atom,
It may be a bromine atom, an iodine atom or the like.

【0019】一般式(V)の化合物において、A及びB
は上記の定義の通りであり、例えば上記に例示したもの
を使用することができる。Yは水素原子、置換スルホニ
ルオキシ基、又はハロゲン原子を表すが、Yがハロゲン
原子を示す場合には、例えば塩素原子、臭素原子、又は
ヨウ素原子等のいずれでもよい。Wは水素原子又は置換
スルホニルオキシ基を表し、R4 は水素原子又は低級ア
ルカノイル基を表すが、低級アルカノイル基としては、
上記に例示されたものを使用することができる。ZはCH
OH、CHOR5 又はC=Oを示すが、R5 は水酸基の保護基
を示し、例えばマイシノシル基を除く前記の水酸基の保
護基を用いることができる。
In the compound of the general formula (V), A and B
Is as defined above, and for example, those exemplified above can be used. Y represents a hydrogen atom, a substituted sulfonyloxy group, or a halogen atom. When Y represents a halogen atom, it may be, for example, a chlorine atom, a bromine atom, an iodine atom or the like. W represents a hydrogen atom or a substituted sulfonyloxy group, R 4 represents a hydrogen atom or a lower alkanoyl group, and as the lower alkanoyl group,
The ones exemplified above can be used. Z is CH
OH, CHOR 5 or C═O is shown, but R 5 is a hydroxyl-protecting group, and for example, the above-mentioned hydroxyl-protecting groups other than the mycinosyl group can be used.

【0020】上記のW及びYにおいて置換スルホニルオ
キシ基は-OSO2R6 で示され、R6 は、例えば低級アルキ
ル基、トリフルオロメチル基、2−オキソ−10−ボルナ
ニイル基、置換又は未置換のアリル基、若しくは置換又
は未置換のアラルキル基を表す。低級アルキル基として
は、例えばメチル基、エチル基、プロピル基、イソプロ
ピル基、ブチル基、イソブチル基、tert−ブチル基、ペ
ンチル基、1−メチルブチル基、2−メチルブチル基、
ネオペンチル基などを挙げることができる。置換または
未置換のアリル基としては、フェニル基、p-メトキシフ
ェニル基、p-ニトロフェニル基、p-フルオロフェニル
基、o,p-ジフルオロフェニル基、p-クロロフェニル基、
m-クロロフェニル基、o-クロロフェニル基、o,p-ジクロ
ロフェニル基、p-ブロモフェニル基、p-メチルフェニル
基、m-メチルフェニル基、o,p-ジメチルフェニル基、m,
p-ジメチルフェニル基、ナフチル基等を挙げることがで
きる。置換または未置換のアラルキル基としては、ベン
ジル基、p-ニトロベンジル基、o,p-ジニトロベンジル
基、p-クロロベンジル基、m-クロロベンジル基、p-メチ
ルベンジル基、m-メチルベンジル基、o-メチルベンジル
基、o,p-ジメチルベンジル基、p-メトキシベンジル基、
p-フルオロベンジル基を挙げることができる。
In W and Y above, the substituted sulfonyloxy group is represented by -OSO 2 R 6 , and R 6 is, for example, a lower alkyl group, a trifluoromethyl group, a 2-oxo-10-bornanyl group, a substituted or unsubstituted group. Represents an allyl group or a substituted or unsubstituted aralkyl group. As the lower alkyl group, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, tert-butyl group, pentyl group, 1-methylbutyl group, 2-methylbutyl group,
Examples thereof include neopentyl group. The substituted or unsubstituted allyl group is a phenyl group, p-methoxyphenyl group, p-nitrophenyl group, p-fluorophenyl group, o, p-difluorophenyl group, p-chlorophenyl group,
m-chlorophenyl group, o-chlorophenyl group, o, p-dichlorophenyl group, p-bromophenyl group, p-methylphenyl group, m-methylphenyl group, o, p-dimethylphenyl group, m,
Examples thereof include p-dimethylphenyl group and naphthyl group. The substituted or unsubstituted aralkyl group includes benzyl group, p-nitrobenzyl group, o, p-dinitrobenzyl group, p-chlorobenzyl group, m-chlorobenzyl group, p-methylbenzyl group, m-methylbenzyl group. , O-methylbenzyl group, o, p-dimethylbenzyl group, p-methoxybenzyl group,
Mention may be made of p-fluorobenzyl groups.

【0021】本発明の方法によれば、容易に入手可能な
タイロシンから、3,4′−ジデオキシマイカミノシル
タイロノライドを効率的に、かつ収率よく製造すること
ができる。前記式(IV)で示されるマイカミノシルタイ
ロノライド誘導体は、タイロシンを酸加水分解して得た
マイカミノシルタイロノライドの水酸基、アルデヒド
基、及びカルボニル基を、上記の保護基を用いて常法に
より適宜保護することにより製造することができる。あ
るいは、例えばジャーナル・オブ・アンティバイオティ
クス(35、661 、(1982)) に記載された方法により、
タイロシンを酸無水物で処理して2′−O−アシルタイ
ロシンを得、さらに該化合物を保護基で適宜保護してマ
イノシル基を有する式(IV)のマイカミノシルタイロノ
ライド誘導体を製造してもよい。
According to the method of the present invention, 3,4'-dideoxymycaminosyl tylonolide can be efficiently and efficiently produced from easily available tylosin. The mycaminosyl tylonolide derivative represented by the formula (IV) is a hydroxyl group, an aldehyde group, and a carbonyl group of mycaminosyl tylonolide obtained by acid hydrolysis of tylosin, using the above protecting group. It can be produced by appropriate protection according to a conventional method. Alternatively, for example, by the method described in Journal of Antibiotics ( 35 , 661, (1982)),
Tylosin is treated with an acid anhydride to obtain 2'-O-acyl tylosin, and the compound is appropriately protected with a protecting group to produce a mycaminosyl tyronolide derivative of the formula (IV) having a myosyl group. Good.

【0022】式(IV)で示される上記のマイカミノシル
タイロノライド誘導体を、例えばベンジルスルホン酸又
はその反応性誘導体等のスルホニル化剤と反応させるこ
とにより、3位及び4′位の水酸基をスルホニル化させ
て、前記式(III) の化合物を得ることができる。ベンジ
ルスルホン酸は、ベンゼン環に1〜3個のメチル基、エ
チル基等の置換基を有するものを使用することができ
る。また、ベンジルスルホン酸の反応性誘導体として
は、塩化物、臭化物等のハロゲン化物や酸無水物を使用
すればよい。R2 が水素原子を表す場合には、ベンジル
スルホニルクロライドを用いて反応させると、3位及び
4′位を選択的にスルホニル化することができる。スル
ホニル化反応は、通常−40℃〜+50℃の温度下に有
機溶媒中で行えばよく、溶媒として、例えばアセトニト
リル、アセトン、ジメチルスルホキシド、ジオキサン等
を使用すればよい。ピリジン、4−ジメチルアミノピリ
ジン、トリエチルアミン等を塩基性触媒及び/又は溶媒
としても使用してもよい。
By reacting the above-mentioned mycaminosyl tylonolide derivative represented by the formula (IV) with a sulfonylating agent such as benzylsulfonic acid or its reactive derivative, the hydroxyl groups at the 3-position and the 4'-position are removed. The compound of formula (III) can be obtained by sulfonylation. As the benzyl sulfonic acid, one having 1 to 3 substituents such as a methyl group and an ethyl group on the benzene ring can be used. As the reactive derivative of benzylsulfonic acid, halides such as chloride and bromide and acid anhydrides may be used. When R 2 represents a hydrogen atom, reaction with benzylsulfonyl chloride can selectively sulfonylate the 3-position and the 4′-position. The sulfonylation reaction may be carried out usually in an organic solvent at a temperature of −40 ° C. to + 50 ° C. As the solvent, acetonitrile, acetone, dimethyl sulfoxide, dioxane or the like may be used. Pyridine, 4-dimethylaminopyridine, triethylamine and the like may also be used as the basic catalyst and / or solvent.

【0023】上記該式(III) の化合物を、例えばアセト
ン、2−ブタノン、ジメチルホルムアミド等の不活性溶
媒中、ヨウ化ナトリウム、ヨウ化カリウム、臭化リチウ
ム、テトラブチルアンモニウムブロマイド、テトラブチ
ルアンモニウムクロライド等のハロゲン化剤と反応させ
ることにより、選択的に4′位がハロゲン化された前記
式(II)で示される化合物を得ることができる。通常、
ハロゲン化反応は前記スルホニル残基の種類により−30
〜 100℃で行えばよい。ハロゲン化の条件によっては、
2,3位又は3,4位が二重結合になった化合物が一部
生成する場合があるが、これらの化合物を次工程の原料
化合物として用いてもよい。
The compound of the formula (III) is treated with sodium iodide, potassium iodide, lithium bromide, tetrabutylammonium bromide, tetrabutylammonium chloride in an inert solvent such as acetone, 2-butanone and dimethylformamide. It is possible to obtain the compound represented by the above formula (II) in which the 4'-position is selectively halogenated by reacting with a halogenating agent such as. Normal,
The halogenation reaction is -30 depending on the kind of the sulfonyl residue.
It may be performed at ~ 100 ° C. Depending on the halogenation conditions,
Some compounds may have a double bond at the 2,3 position or the 3,4 position, but these compounds may be used as raw material compounds in the next step.

【0024】上記式(II)で示される化合物をアルカリ
条件下で還元することにより、3位及び4′位を同時に
水素置換して、式(I)で示される3,4′−ジデオキ
シ誘導体を製造するこができる。該反応は、例えば、反
応に不活性な溶媒中で、触媒存在下に式(II)で示され
る化合物を接触還元することにより行われる。アルカリ
条件を形成するために用いる塩基としては、水酸化ナト
リウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸カ
リウム、炭酸水素カリウム等、好ましくは炭酸カリウム
を用いることができる。これらの塩基は、通常、基質と
なる式(II)で示される化合物に対して2〜5モルの割
合で使用される。接触還元に使用する触媒としては、白
金、パラジウム、ラネーニッケル等、好ましくはラネー
ニッケルを挙げることができる。触媒の使用量は触媒の
種類により異なるが、一般に、基質となる式(II)で示
される化合物に対して1/10〜1の割合で使用すればよ
い。不活性溶媒としては、ベンゼン、トルエン、エーテ
ル、ジメチルホルムアミド、ジメチルスルホキシド、メ
タノール、エタノール、テトラヒドロフラン等の溶媒を
挙げることができる。接触還元を行うにあたり、水素の
添加圧を、常圧〜5Kg/cm2、反応温度を、例えば冷却下
〜室温、好ましくは−10〜30℃として反応を行えばよ
い。これらの条件は原料化合物や触媒の種類により異な
るが、当業者により適宜選択されるものである。
The 3,4'-dideoxy derivative represented by the formula (I) is obtained by reducing the compound represented by the above formula (II) under alkaline conditions to simultaneously substitute hydrogen at the 3 and 4'positions. It can be manufactured. The reaction is carried out, for example, by catalytically reducing the compound represented by the formula (II) in the presence of a catalyst in a solvent inert to the reaction. As the base used to form the alkaline condition, sodium hydroxide, sodium carbonate, sodium hydrogen carbonate, potassium carbonate, potassium hydrogen carbonate, etc., preferably potassium carbonate can be used. These bases are usually used in a proportion of 2 to 5 mol with respect to the compound represented by the formula (II) serving as a substrate. Examples of the catalyst used for catalytic reduction include platinum, palladium, Raney nickel and the like, preferably Raney nickel. The amount of the catalyst used varies depending on the type of the catalyst, but in general, it may be used in a ratio of 1/10 to 1 with respect to the compound represented by the formula (II) serving as a substrate. Examples of the inert solvent include solvents such as benzene, toluene, ether, dimethylformamide, dimethylsulfoxide, methanol, ethanol and tetrahydrofuran. In carrying out the catalytic reduction, the addition pressure of hydrogen may be atmospheric pressure to 5 kg / cm 2 , and the reaction temperature may be, for example, under cooling to room temperature, preferably at -10 to 30 ° C. These conditions are appropriately selected by those skilled in the art, though they vary depending on the types of raw material compounds and catalysts.

【0025】上記の工程により、式(II)で示される化
合物の3位及び4′位を同時に水素置換することがで
き、これにより、式(II)の化合物から一段階かつ高収
率(ほぼ80%程度)で、前記式(I)で示される3,
4′−ジデオキシ誘導体を得ることができる。このよう
にして得られた式(I)の化合物は、常法に従って保護
基を除去することにより、抗菌剤として有用な下記一般
式(VI)で表される3,4′−ジデオキシマイカミノシ
ルタイロノライド又はその塩に変換することができる。
According to the above process, the 3-position and the 4'-position of the compound represented by the formula (II) can be simultaneously hydrogen-substituted, whereby the compound of the formula (II) can be produced in one step and in a high yield (approximately). At about 80%),
A 4'-dideoxy derivative can be obtained. The compound of formula (I) thus obtained has the 3,4'-dideoxymycaminosyl represented by the following general formula (VI) useful as an antibacterial agent, by removing the protecting group according to a conventional method. It can be converted to tylonolide or a salt thereof.

【0026】[0026]

【化11】 [Chemical 11]

【0027】保護基の除去は、通常、水の存在下に塩
酸、硫酸等の鉱酸で処理するか、酢酸、トリフルオロ酢
酸、トリクロル酢酸等の有機酸で処理することにより行
えばよいが、場合によってはジオキサン、ジメチルホル
ムアミド、ジメチルスルホキシド、アセトニトリル等の
溶媒中でp−トルエンスルホン酸等のアリールスルホン
酸、メタンスルホン酸等のアルキルスルホン酸等を用い
て、室温〜加熱下で処理することによっても行うことが
できる。一方、マイシノシル基を用いた場合には、マイ
シノシル基を酸化して対応するケトン体とした後に、酸
または塩基を用いた処理により除去してもよい。
The removal of the protecting group is usually carried out by treatment with a mineral acid such as hydrochloric acid or sulfuric acid in the presence of water or an organic acid such as acetic acid, trifluoroacetic acid or trichloroacetic acid. Depending on the case, by treatment with arylsulfonic acid such as p-toluenesulfonic acid or alkylsulfonic acid such as methanesulfonic acid in a solvent such as dioxane, dimethylformamide, dimethylsulfoxide or acetonitrile, at room temperature to under heating. Can also be done. On the other hand, when a mycinosyl group is used, the mycinosyl group may be oxidized to a corresponding ketone body and then removed by treatment with an acid or a base.

【0028】本発明の方法を用いて得ることができる式
(VI)の3,4′−ジデオキシマイカミノシルタイロノ
ライドは、特開平2-275894号公報に記載されたように、
グラム陽性及び陰性に属する広範囲の微生物に対して抗
菌活性を示す物質であり、特に感染防御作用に優れてい
るので、抗菌剤として有用である。
The 3,4'-dideoxymycaminosyltylonolide of the formula (VI) obtainable by using the method of the present invention is as described in JP-A-2-275894.
It is a substance that exhibits antibacterial activity against a wide range of Gram-positive and -negative microorganisms, and is particularly useful as an antibacterial agent because it has an excellent action of preventing infection.

【0029】[0029]

【実施例】以下、本発明を実施例によりさらに具体的に
説明するが、本発明はこれらの実施例に限定されること
はない。 a)23−O−t−ブチルジメチルシリル−3,4′−ジ
−O−ベンジルスルホニル−マイカミノシルタイロノラ
イド 9,20−ビス(エチレンアセタール)の合成
EXAMPLES The present invention will now be described in more detail with reference to examples, but the present invention is not limited to these examples. a) Synthesis of 23-Ot-butyldimethylsilyl-3,4'-di-O-benzylsulfonyl-mycaminosyltylonolide 9,20-bis (ethylene acetal)

【0030】[0030]

【化12】 [Chemical 12]

【0031】23−O−t−ブチルジメチルシリル−マ
イカミノシルタイロノライド 9,20−ビス(エチレ
ンアセタール)1.00g(1.25mmol)を無水ピリジン
20mlに溶解し、−40℃に冷却し、攪拌下塩化ベンジ
ルスルホニル0.67g(3.51mmol)を加え、−20℃
で3時間反応した。TLCで反応を確認し、水0.67ml
を加え、反応を停止し、室温に戻した。水を加えて1時
間後、反応液をポンプで濃縮し、クロロホルムで抽出
し、クロロホルム層を飽和重そう水、飽和食塩水で順次
洗浄し、硫酸マグネシウムで脱水、濾過後、濾液を濃縮
し、未精製の23−O−t−ブチルジメチルシリル−
3,4′−ジ−O−ベンジルスルホニル−マイカミノシ
ルタイロノライド 9,20−ビス(エチレンアセター
ル)を淡黄色泡状固体として1.38g(定量的)を得
た。 b)3−O−ベンジルスルホニル−23−O−t−ブチル
ジメチルシリル−4′−デオキシ−4′−ヨード−マイ
カミノシルタイロノライド 9,20−ビス(エチレン
アセタール)の合成
23-Ot-Butyldimethylsilyl-mycaminosyltylonolide 9,20-bis (ethylene acetal) 1.00 g (1.25 mmol) was dissolved in 20 ml of anhydrous pyridine and cooled to -40 ° C. , 0.67 g (3.51 mmol) of benzylsulfonyl chloride was added with stirring, and the temperature was -20 ° C.
And reacted for 3 hours. Confirm the reaction by TLC, 0.67 ml of water
Was added to stop the reaction, and the temperature was returned to room temperature. After 1 hour from the addition of water, the reaction solution was concentrated with a pump and extracted with chloroform. The chloroform layer was washed successively with saturated sodium bicarbonate water and saturated saline, dehydrated with magnesium sulfate, filtered, and the filtrate was concentrated. Crude 23-Ot-butyldimethylsilyl-
1.38 g (quantitative) of 3,4'-di-O-benzylsulfonyl-mycaminosyl tylonolide 9,20-bis (ethylene acetal) was obtained as a pale yellow foamy solid. b) Synthesis of 3-O-benzylsulfonyl-23-O-t-butyldimethylsilyl-4'-deoxy-4'-iodo-mycaminosyltylonolide 9,20-bis (ethylene acetal)

【0032】[0032]

【化13】 [Chemical 13]

【0033】上記a)で得た未精製の化合物415mg(0.
375mmol)を無水メチルエチルケトン6.2mlに溶解
し、窒素置換後、ヨウ化ナトリウム84mg(0.560mm
ol)を加え、80℃に加熱攪拌し、30分後反応液を室
温に戻し、濾過し、アセトンで濾物を洗浄し、濾液と洗
液を合わせて濃縮した。濃縮残渣をクロロホルムで抽出
し、飽和重そう水、10%チオ硫酸ナトリウム、飽和食
塩水で順次洗浄し、硫酸マグネシウムで脱水、濾過後、
濾液を濃縮し、淡黄色シロップ410mgを得た。得られ
たシロップをシリカゲルカラムクロマトグラフィーにて
精製し、3−O−ベンジルスルホニル−23−O−t−
ブチルジメチルシリル−4′−デオキシ−4′−ヨード
−マイカミノシルタイロノライド 9,20−ビス(エ
チレンアセタール)を無色固体として300mg(収率7
5%)を得た。(理化学的性状) 比施光度 〔α〕27 D −70°(c l 、CHCl3 Mass(F.A.B.) m/z 1064 (M+H)+ c)23−O−t−ブチルジメチルシリル−3,4′−ジ
デオキシマイカミノシルタイロノライド 9,20−ビ
ス(エチレンアセタール)の合成
415 mg (0.1%) of the crude compound obtained in a) above.
375 mmol) was dissolved in 6.2 ml of anhydrous methyl ethyl ketone and, after purging with nitrogen, 84 mg of sodium iodide (0.560 mm)
ol) was added and the mixture was heated and stirred at 80 ° C., and after 30 minutes, the reaction solution was returned to room temperature, filtered, and the filtered material was washed with acetone, and the filtrate and the washing solution were combined and concentrated. The concentrated residue was extracted with chloroform, washed successively with saturated sodium bicarbonate solution, 10% sodium thiosulfate and saturated saline, dried over magnesium sulfate and filtered.
The filtrate was concentrated to give 410 mg of pale yellow syrup. The obtained syrup was purified by silica gel column chromatography to give 3-O-benzylsulfonyl-23-Ot-.
Butyldimethylsilyl-4'-deoxy-4'-iodo-mycaminosyl tylonolide 9,20-bis (ethylene acetal) as a colorless solid 300 mg (yield 7
5%) was obtained. (Physical and chemical properties) Specific light intensity [α] 27 D −70 ° (cl, CHCl 3 ) Mass (FAB) m / z 1064 (M + H) + c) 23-Ot-butyldimethylsilyl-3,4'-dideoxymycaminosyl tylonolide 9,20-Bis (ethylene acetal) synthesis

【0034】[0034]

【化14】 [Chemical 14]

【0035】上記b)で得た化合物296mg(0.278mm
ol)をメタノール6mlに溶解し、ラネーニッケル0.5ml
を加え、アルゴン置換後、炭酸カリウム116mg(0.8
35mmol)を加え、水素を3時間吹き込んだ。HPLC
で反応終了を確認し、反応液を濾過後、濾液を濃縮し、
クロロホルムで抽出し、1M炭酸カリウム水溶液、飽和
食塩水で順次洗浄し、硫酸マグネシウムで脱水し、濾過
後、濾液を濃縮し、無色泡状固体の粗化合物204mg
(95%)を得た。得られた固体をシリカゲルカラムク
ロマトグラフィーにて精製し、23−O−t−ブチルジ
メチルシリル−3,4′−ジデオキシマイカミノシルタ
イロノライド 9,20−ビス(エチレンアセタール)
を無色泡状固体として186mg得た(収率87%)。
296 mg (0.278 mm) of the compound obtained in b) above
ol) was dissolved in 6 ml of methanol and Raney nickel 0.5 ml was added.
Was added and the atmosphere was replaced with argon, and then 116 mg of potassium carbonate (0.8
35 mmol) was added and hydrogen was bubbled in for 3 hours. HPLC
Confirm the end of the reaction with, filter the reaction solution, then concentrate the filtrate,
Extracted with chloroform, washed successively with 1M aqueous potassium carbonate solution and saturated brine, dried over magnesium sulfate, filtered, and concentrated to give a colorless foamy solid crude compound 204 mg.
(95%) was obtained. The obtained solid was purified by silica gel column chromatography, and 23-O-t-butyldimethylsilyl-3,4'-dideoxymycaminosyltylonolide 9,20-bis (ethylene acetal) was obtained.
Was obtained as a colorless foamy solid (186 mg, yield 87%).

【0036】本品は、以前別ルートにより合成した標品
1H−nmr 、Massで一致した。 (理化学的性状) Mass(F.A.B.) m/z =768 (M+H)+ 1 H−nmr (CDCl3 、TMS内部標準) δ0.88(9H, s, t−ブチルジメチルシリルのt−ブチ
ル)、1.02(3H, d, CH3−21)、1.24(3H, d, CH3−6
′)、1.74(3H, s, CH3−22)、2.29(6H, s, N(CH3)
2−3 ′)、4.28(1H, d, H−1 ′)、5.37(1H, d, H
−13)、5.61(1H, d,H−10)、6.39(1H, d, H−11) d)2′−O−アセチルデスマイコシン 9,20−ビス
(エチレンアセタール)の製造
This product was identical with the standard product previously synthesized by another route in 1 H-nmr and Mass. (Physical and chemical properties) Mass (FAB) m / z = 768 (M + H) + 1 H-nmr (CDCl 3 , TMS internal standard) δ 0.88 (t-butyl of 9H, s, t-butyldimethylsilyl), 1.02 (3H, d, CH 3 −21), 1.24 (3H, d, CH 3 −6
′), 1.74 (3H, s, CH 3 −22), 2.29 (6H, s, N (CH 3 )
2-3 '), 4.28 (1H, d, H-1'), 5.37 (1H, d, H
-13), 5.61 (1H, d, H-10), 6.39 (1H, d, H-11) d) 2'-O-acetyldesmycosin 9,20-bis (ethylene acetal)

【0037】[0037]

【化15】 [Chemical 15]

【0038】2′−O−アセチルタイロシン23.7gを
トルエン100mlに懸濁、続いてオルト蟻酸エチル12.
36g(83.5mol )、エチレングリコール12.95g
(208.8mmol)及びカンファースルホン酸6.30g
(27.1mmol)を加えると均一溶液になった。この溶液
を50℃で2時間攪拌後、反応液を5%重曹水100m
l、水100ml、10%食塩水で洗浄した。有機層は無
水硫酸ナトリウムで乾燥後減圧乾固すると、トルエン/
アセトン(1/1)展開のシリカゲルTLCにてRf値0.
49に硫酸呈色陽性の表題化合物が20.20g得られ
た。
23.7 g of 2'-O-acetyltylosin was suspended in 100 ml of toluene, followed by ethyl orthoformate 12.
36 g (83.5 mol), ethylene glycol 12.95 g
(208.8 mmol) and camphorsulfonic acid 6.30 g
(27.1 mmol) was added to form a homogeneous solution. After stirring this solution at 50 ° C. for 2 hours, the reaction solution was added with 5% aqueous sodium hydrogen carbonate (100 m).
l, washed with 100 ml of water and 10% saline. The organic layer was dried over anhydrous sodium sulfate and dried under reduced pressure to give toluene /
Silica gel TLC developed with acetone (1/1) gave an Rf value of 0.
As a result, 20.20 g of the title compound positive for sulfuric acid coloration was obtained in 49.

【0039】UV(MeOH)λmax;235nm IR(KBr) νmax;3470,2975,2938,2882,1746,1236,1169,1
084,961 cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.78(3H,bs,H-18), 0.93(3H,t,J=7.3Hz,H-17),1.01
(3H,d,J=6.6Hz,H-21), 1.26(3H,d,J=6.2Hz,H-6″),1.32
(3H,d,J=6.2Hz, H-6′), 1.70(3H,s,H-22),2.01(3H,s,O
COCH3-2′), 2.39(6H,s,N(CH3)2-3′),3.05(1H,t,J=9.5
Hz, H-4′), 3.18(1H,bd,J=7.0Hz, H-4″),3.49(3H,s,O
CH3-2″),3.62(3H,s,OCH3-3″),4.55(1H,d,J=8.1Hz,H-1
″),4.64(1H,br,H-1′), 4.96(1H,m,H-20), 4.96(1H,
m,H-15),5.03(1H,dd,J=10.6&7.7Hz, H-2′), 5.42(1H,
d,J=10.6Hz,H-13),5.64(1H,d,J=15.8Hz,H-10), 6.37(1
H,d,J=15.8Hz,H-11) FAB-MS;902(M+H)+ 2′−O−アセチル−4″−O−トリメチルシリルデス
マイコシン 9,20−ビス(エチレンアセタール)の
製造
UV (MeOH) λmax; 235 nm IR (KBr) νmax; 3470,2975,2938,2882,1746,1236,1169,1
084,961 cm -1 NMR (CDCl 3 ); representing only the main peak δ; 0.78 (3H, bs, H-18), 0.93 (3H, t, J = 7.3Hz, H-17), 1.01
(3H, d, J = 6.6Hz, H-21), 1.26 (3H, d, J = 6.2Hz, H-6 ″), 1.32
(3H, d, J = 6.2Hz, H-6 ′), 1.70 (3H, s, H-22), 2.01 (3H, s, O
COCH 3 -2 '), 2.39 (6H, s, N (CH 3 ) 2 -3'), 3.05 (1H, t, J = 9.5
Hz, H-4 ′), 3.18 (1H, bd, J = 7.0Hz, H-4 ″), 3.49 (3H, s, O
CH 3 -2 ″), 3.62 (3H, s, OCH 3 -3 ″), 4.55 (1H, d, J = 8.1Hz, H-1
″), 4.64 (1H, br, H-1 ′), 4.96 (1H, m, H-20), 4.96 (1H,
m, H-15), 5.03 (1H, dd, J = 10.6 & 7.7Hz, H-2 '), 5.42 (1H,
d, J = 10.6Hz, H-13), 5.64 (1H, d, J = 15.8Hz, H-10), 6.37 (1
H, d, J = 15.8Hz, H-11) FAB-MS; 902 (M + H) + 2′-O-acetyl-4 ″ -O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal)

【0040】[0040]

【化16】 [Chemical 16]

【0041】2′−O−アセチルデスマイコシン 9,
20−ビス(エチレンアセタール)18.9g(20.9mm
ol)をトルエン94mlに溶解後ピリジン2.52ml(31.
2mmol)を加え、−5℃に冷却した。この溶液に塩化ト
リメチルシラン3.42ml(27mmol)を滴下し、同温度
で80分間反応させた。反応液を5%重曹水150ml、
10%食塩水150mlで洗浄後無水硫酸ナトリウムで乾
燥した。有機層を減圧濃縮すると、トルエン/アセトン
(1/1)展開のシリカゲルTLCにてRf値0.57に硫
酸呈色陽性の表題化合物が20.64g得られた。
2'-O-acetyldesmycosin 9,
20-bis (ethylene acetal) 18.9g (20.9mm
ol) was dissolved in 94 ml of toluene and 2.52 ml of pyridine (31.
2 mmol) was added and the mixture was cooled to -5 ° C. 3.42 ml (27 mmol) of trimethylsilane chloride was added dropwise to this solution, and the mixture was reacted at the same temperature for 80 minutes. 150 ml of 5% sodium hydrogen carbonate solution,
The extract was washed with 150 ml of 10% saline and dried over anhydrous sodium sulfate. The organic layer was concentrated under reduced pressure to give 20.64 g of a sulfuric acid color-positive title compound having an Rf value of 0.57 by silica gel TLC developed with toluene / acetone (1/1).

【0042】UV(MeOH)λmax;235nm IR(KBr) νmax;3520,2973,2884,1748,1713,1373,1236,1
171,1100,966,882,841cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.17(9H,s,Si(CH3)3), 0.77(3H,bs,H-18), 0.91(3H,
t,J=7.3Hz,H-17),1.01(3H,d,J=6.6Hz,H-21), 1.18(3H,
d,J=6.2Hz,H-6″),1.32(3H,d,J=5.9Hz, H-6′), 1.69(3
H,d,J=0.7Hz,H-22),2.01(3H,s,OCOCH3-2′), 2.38(6H,
s,N(CH3)2-3′),2.59(1H,t,J=10.3Hz, H-3 ′), 3.05(1
H,t,J=9.9Hz, H-4 ′),3.28(1H,dd,J=9.2&2.6Hz,H-
4″), 3.49(3H,s,OCH3-2″),3.60(3H,s,OCH3-3″), 4.
59(1H,d,J=7.7Hz,H-1″),4.64(1H,br,H-1′), 4.95(1H,
m,H-20), 4.96(1H,m,H-15),5.03(1H,dd,J=10.6&7.7Hz,
H-2′), 5.42(1H,d,J=10.6Hz,H-13),5.62(1H,d,J=15.8H
z,H-10), 6.36(1H,d,J=15.8Hz,H-11) FAB-MS;974(M+H)+ 2′,4″−ジ−O−アセチル−デスマイコシン 9,
20−ビス(エチレンアセタール)の製造
UV (MeOH) λ max; 235 nm IR (KBr) ν max; 3520,2973,2884,1748,1713,1373,1236,1
171,1100,966,882,841cm -1 NMR (CDCl 3 ); showing only the main peak δ; 0.17 (9H, s, Si (CH 3 ) 3 ), 0.77 (3H, bs, H-18), 0.91 (3H,
t, J = 7.3Hz, H-17), 1.01 (3H, d, J = 6.6Hz, H-21), 1.18 (3H,
d, J = 6.2Hz, H-6 ″), 1.32 (3H, d, J = 5.9Hz, H-6 ′), 1.69 (3
H, d, J = 0.7Hz, H-22), 2.01 (3H, s, OCOCH 3 -2 '), 2.38 (6H,
s, N (CH 3 ) 2 -3 ′), 2.59 (1H, t, J = 10.3Hz, H-3 ′), 3.05 (1
H, t, J = 9.9Hz, H-4 ′), 3.28 (1H, dd, J = 9.2 & 2.6Hz, H-
4 ″), 3.49 (3H, s, OCH 3 -2 ″), 3.60 (3H, s, OCH 3 -3 ″), 4.
59 (1H, d, J = 7.7Hz, H-1 ″), 4.64 (1H, br, H-1 ′), 4.95 (1H,
m, H-20), 4.96 (1H, m, H-15), 5.03 (1H, dd, J = 10.6 & 7.7Hz,
H-2 ′), 5.42 (1H, d, J = 10.6Hz, H-13), 5.62 (1H, d, J = 15.8H
z, H-10), 6.36 (1H, d, J = 15.8Hz, H-11) FAB-MS; 974 (M + H) + 2 ′, 4 ″ -di-O-acetyl-desmycosin 9,
Production of 20-bis (ethylene acetal)

【0043】[0043]

【化17】 [Chemical 17]

【0044】2′−O−アセチル−デスマイコシン
9,20−ビス(エチレンアセタール)200mg(0.2
22mmol)を塩化メチレン2mlに溶解し、ピリジン35.
7μl(0.444mmol)を加え、氷冷下、塩化アセチル
23.6μl (0.333mmol)を加え、同温度で1時間反
応させた。反応液に塩化メチレン20mlを加え、5%重
曹水20ml、飽和食塩水20mlで洗浄後、無水硫酸ナト
リウムで乾燥した。有機層を減圧濃縮して得られた残渣
244mgをシリカゲルクロマトグラフィー(10g)に
て、トルエン/アセトン(5/1)で溶出し、トルエン
/アセトン(2/1)展開のシリカゲルTLCにてRf値
0.45に硫酸呈色陽性を示すフラクションを分取する
と、64%の収率で表題化合物の無色アモルファス状固
体が133mg得られた。
2'-O-acetyl-desmycosin
200 mg (0.2) of 9,20-bis (ethylene acetal)
22 mmol) in 2 ml of methylene chloride and pyridine 35.
7 μl (0.444 mmol) was added, 23.6 μl (0.333 mmol) of acetyl chloride was added under ice cooling, and the mixture was reacted at the same temperature for 1 hour. Methylene chloride (20 ml) was added to the reaction solution, which was washed with 5% aqueous sodium hydrogen carbonate solution (20 ml) and saturated brine (20 ml) and dried over anhydrous sodium sulfate. 244 mg of the residue obtained by concentrating the organic layer under reduced pressure was eluted with toluene / acetone (5/1) by silica gel chromatography (10 g), and Rf value was measured by silica gel TLC developed with toluene / acetone (2/1).
Fractions showing positive sulfuric acid coloration at 0.45 were collected to obtain 133 mg of a colorless amorphous solid of the title compound in a yield of 64%.

【0045】UV(MeOH)λmax;235nm IR(KBr) νmax;3524,1745,1236,1088,1049cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.77(3H,bs,H-18), 0.92(3H,t,J=7.3Hz,H-17),1.00
(3H,d,J=6.6Hz,H-21), 1.17(3H,d,J=6.6Hz,H-6″),1.32
(3H,d,J=5.9Hz, H-6′), 1.70(3H,s,H-22), 2.01(3H,s,
OCOCH3),2.11(3H,s,OCOCH3), 2.39(6H,s,N(CH3)2-3'),
2.59(1H,t,J=10.3Hz,H-3'),2.89(1H,m,H-14), 3.31(1H,
m,H-5′), 3.48(3H,s,OCH3-2 ″),3.52(3H,s,OCH3-
3″), 4.44(1H,dd,J=2.9&9.5Hz,H-4 ″),4.61(1H,d,J=
8.1Hz,H-1 ″), 5.03(1H,dd,J=10.3&7.3Hz,H-2′),5.40
(1H,d,J=10.3Hz,H-13), 5.63(1H,d,J=15.4Hz,H-10),6.3
6(1H,d,J=15.4Hz,H-11) FAB-MS;944(M+H)+ 2′−O−アセチル−3,4′−ジ−O−メタンスルホ
ニル−4″−O−トリメチルシリル−デスマイコシン
9,20−ビス(エチレンアセタール)の製造
UV (MeOH) λmax; 235 nm IR (KBr) ν max; 3524, 1745, 1236, 1088, 1049 cm -1 NMR (CDCl 3 ); showing only the main peak δ; 0.77 (3H, bs, H-18) , 0.92 (3H, t, J = 7.3Hz, H-17), 1.00
(3H, d, J = 6.6Hz, H-21), 1.17 (3H, d, J = 6.6Hz, H-6 ″), 1.32
(3H, d, J = 5.9Hz, H-6 ′), 1.70 (3H, s, H-22), 2.01 (3H, s,
OCOCH 3 ), 2.11 (3H, s, OCOCH 3 ), 2.39 (6H, s, N (CH 3 ) 2 -3 '),
2.59 (1H, t, J = 10.3Hz, H-3 '), 2.89 (1H, m, H-14), 3.31 (1H,
m, H-5 ′), 3.48 (3H, s, OCH 3 -2 ″), 3.52 (3H, s, OCH 3-
3 ″), 4.44 (1H, dd, J = 2.9 & 9.5Hz, H-4 ″), 4.61 (1H, d, J =
8.1Hz, H-1 ″), 5.03 (1H, dd, J = 10.3 & 7.3Hz, H-2 ′), 5.40
(1H, d, J = 10.3Hz, H-13), 5.63 (1H, d, J = 15.4Hz, H-10), 6.3
6 (1H, d, J = 15.4Hz, H-11) FAB-MS; 944 (M + H) + 2'-O-acetyl-3,4'-di-O-methanesulfonyl-4 "-O-trimethylsilyl- Desmycocin
Production of 9,20-bis (ethylene acetal)

【0046】[0046]

【化18】 [Chemical 18]

【0047】2′−O−アセチル−4″−O−トリメチ
ルシリルデスマイコシン 9,20−ビス(エチレンア
セタール)10.07g(10.3mmol)をトルエン50ml
に溶解後トリエチルアミン7.20ml(51.7mmol)を加
え−15℃に冷却した。この溶液にメタンスルホニルク
ロリド2.8ml(36.2mmol)を加え、−10℃にて1時
間反応させた。反応液にトルエン40mlを加え、有機層
を水80ml、5%重曹水40ml、10%食塩水40mlで
洗浄後無水硫酸ナトリウムにて乾燥した。有機層を減圧
乾固すると、トルエン/アセトン(3/1)展開のシリ
カゲルTLCにてRf値0.55に硫酸呈色陽性の表題化合
物が12.94g得られた。この化合物は不安定なため即
座に次の反応に供した。
2'-O-Acetyl-4 "-O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal) 10.07 g (10.3 mmol) was added to 50 ml of toluene.
After being dissolved in the solution, triethylamine (7.20 ml, 51.7 mmol) was added and the mixture was cooled to -15 ° C. To this solution was added methanesulfonyl chloride (2.8 ml, 36.2 mmol), and the mixture was reacted at -10 ° C for 1 hour. Toluene (40 ml) was added to the reaction solution, and the organic layer was washed with water (80 ml), 5% sodium hydrogen carbonate solution (40 ml) and 10% saline solution (40 ml) and dried over anhydrous sodium sulfate. The organic layer was evaporated to dryness under reduced pressure to obtain 12.94 g of the title compound having a sulfuric acid coloration positive with an Rf value of 0.55 by silica gel TLC developed with toluene / acetone (3/1). Since this compound was unstable, it was immediately subjected to the next reaction.

【0048】NMR(CDCl3); 主要ピークのみを表す δ;0.16[9H,s,Si(CH3)3], 0.88(3H,d,J=7.3Hz,H-18),0.
92(3H,t,J=7.3Hz,H-17), 1.02(3H,d,J=6.6Hz,H-21),1.1
8(3H,d,J=6.2Hz, H-6″), 1.35(3H,d,J=5.9Hz,H-6′),
1.69(3H,d,J=0.7Hz, H-22), 2.04(3H,s,OCOCH3-2′),2.
39(6H,s,N(CH3)2-3 ′),2.93(1H,t,J=10.3Hz,H-3′),3.
10(3H,s,OMs),3.14(3H,s,OMs), 3.28(1H,dd,J=9.5&2.6H
z,H-4″),3.47(3H,s,OCH3-2″),3.59(3H,s,OCH3-3″),
4.22(1H,t,J=9.9Hz,H-4′),4.57(1H,d,J=7.7Hz,H-1
″), 4.60(1H,br,H-1 ′), 4.75(1H,br,H-3),4.93(1H,
m,H-15), 4.96(1H,m,H-20), 5.03(1H,dd,J=10.3&8.0Hz,
H-2 ′),5.47(1H,d,J=11.0Hz,H-13), 5.54(1H,d,J=15.8
Hz,H-10),6.34(1H,d,J=15.8Hz,H-11) FAB-MS; 1130(M+H)+ 2′,4″−ジ−O−アセチル−3,4′−ジ−O−メ
タンスルホニルデスマイコシン 9,20−ビス(エチ
レンアセタール)の製造
NMR (CDCl 3 ); representing only the main peak δ; 0.16 [9H, s, Si (CH 3 ) 3 ], 0.88 (3H, d, J = 7.3Hz, H-18), 0.
92 (3H, t, J = 7.3Hz, H-17), 1.02 (3H, d, J = 6.6Hz, H-21), 1.1
8 (3H, d, J = 6.2Hz, H-6 ″), 1.35 (3H, d, J = 5.9Hz, H-6 ′),
1.69 (3H, d, J = 0.7Hz, H-22), 2.04 (3H, s, OCOCH 3 -2 '), 2.
39 (6H, s, N (CH 3 ) 2 -3 '), 2.93 (1H, t, J = 10.3Hz, H-3'), 3.
10 (3H, s, OMs), 3.14 (3H, s, OMs), 3.28 (1H, dd, J = 9.5 & 2.6H
z, H-4 ″), 3.47 (3H, s, OCH 3 -2 ″), 3.59 (3H, s, OCH 3 -3 ″),
4.22 (1H, t, J = 9.9Hz, H-4 ′), 4.57 (1H, d, J = 7.7Hz, H-1
″), 4.60 (1H, br, H-1 ′), 4.75 (1H, br, H-3), 4.93 (1H,
m, H-15), 4.96 (1H, m, H-20), 5.03 (1H, dd, J = 10.3 & 8.0Hz,
H-2 ′), 5.47 (1H, d, J = 11.0Hz, H-13), 5.54 (1H, d, J = 15.8
Hz, H-10), 6.34 (1H, d, J = 15.8Hz, H-11) FAB-MS; 1130 (M + H) + 2 ', 4 "-di-O-acetyl-3,4'-di- Production of O-methanesulfonyldesmycosin 9,20-bis (ethylene acetal)

【0049】[0049]

【化19】 [Chemical 19]

【0050】2′,4″−ジ−O−アセチルデスマイコ
シン 9,20−ビス(エチレンアセタール)109mg
(0.115mmol)をトルエン0.5mlに溶解し、トリエチ
ルアミン80.2ml(0.575mmol)を加えた後、氷冷
下、塩化メタンスルホニル31.2ml(0.403mmol)を
加え、同温度で1.5時間反応させた。反応液に酢酸エチ
ル10mlを加え、5%重曹水10ml、飽和食塩水10ml
で洗浄後、無水硫酸ナトリウムで乾燥した。有機層を減
圧濃縮乾固すると、トルエン/アセトン(2/1)展開
のシリカゲルTLCにてRf値0.64に硫酸呈色陽性の表
題化合物が134mg得られた。この化合物は不安定なた
め即座に次の反応に供した。
2 ', 4 "-di-O-acetyldesmycosin 9,20-bis (ethylene acetal) 109 mg
(0.115 mmol) was dissolved in 0.5 ml of toluene, 80.2 ml (0.575 mmol) of triethylamine was added, and then 31.2 ml (0.403 mmol) of methanesulfonyl chloride was added under ice-cooling, and 1 at the same temperature. Allowed to react for 5 hours. 10 ml of ethyl acetate was added to the reaction solution, 10 ml of 5% sodium hydrogen carbonate solution and 10 ml of saturated saline solution.
After washing with, it was dried over anhydrous sodium sulfate. The organic layer was concentrated to dryness under reduced pressure to give 134 mg of the title compound positive for sulfuric acid coloration with an Rf value of 0.64 on silica gel TLC developed with toluene / acetone (2/1). Since this compound was unstable, it was immediately subjected to the next reaction.

【0051】NMR(CDCl3); 主要ピークのみを表す δ;0.88(3H,d,J=7.3Hz,H-18), 0.93(3H,t,J=7.3Hz,H-1
7),1.03(3H,d,J=6.6Hz,H-21), 1.17(3H,d,J=6.2Hz, H-6
″),1.36(3H,d,J=5.9Hz,H-6 ′), 1.70(3H,s,H-22),
2.04(3H,s,OCOCH3),2.11(3H,s,OCOCH3), 2.40[6H,s,N(C
H3)2-3′], 2.84(1H,m,H-14),2.94(1H,t,J=10.3Hz, H-3
′), 3.04(1H,dd,J=2.9&8.1Hz,H-2 ″),3.10(3H,s,OM
s), 3.12(3H,s,OMs), 3.46(3H,s,OCH3-2″),3.52(3H,s,
OCH3-3″), 4.22(1H,t,J=9.9Hz,H-4′),4.45(1H,dd,J=
2.6&9.9Hz,H-4″), 4.60(1H,d,J=8.1Hz,H-1″),5.03(1
H,dd,J=10.3&7.7Hz,H-2 ′), 5.46(1H,d,J=10.6Hz,H-1
3),5.55(1H,d,J=15.6Hz,H-10), 6.35(1H,d,J=15.6Hz,H-
11) FAB-MS; 1100(M+H)+ 2′−O−アセチル−3,4′−ジ−O−ベンジルスル
ホニル−4″−O−トリメチルシリル−デスマイコシン
9,20−ビス(エチレンアセタール)の製造
NMR (CDCl 3 ); showing only main peaks δ; 0.88 (3H, d, J = 7.3Hz, H-18), 0.93 (3H, t, J = 7.3Hz, H-1)
7), 1.03 (3H, d, J = 6.6Hz, H-21), 1.17 (3H, d, J = 6.2Hz, H-6
″), 1.36 (3H, d, J = 5.9Hz, H-6 ′), 1.70 (3H, s, H-22),
2.04 (3H, s, OCOCH 3 ), 2.11 (3H, s, OCOCH 3 ), 2.40 [6H, s, N (C
H 3) 2 -3 '], 2.84 (1H, m, H-14), 2.94 (1H, t, J = 10.3Hz, H-3
′), 3.04 (1H, dd, J = 2.9 & 8.1Hz, H-2 ″), 3.10 (3H, s, OM
s), 3.12 (3H, s, OMs), 3.46 (3H, s, OCH 3 -2 ″), 3.52 (3H, s,
OCH 3 -3 ″), 4.22 (1H, t, J = 9.9Hz, H-4 ′), 4.45 (1H, dd, J =
2.6 & 9.9Hz, H-4 ″), 4.60 (1H, d, J = 8.1Hz, H-1 ″), 5.03 (1
H, dd, J = 10.3 & 7.7Hz, H-2 ′), 5.46 (1H, d, J = 10.6Hz, H-1
3), 5.55 (1H, d, J = 15.6Hz, H-10), 6.35 (1H, d, J = 15.6Hz, H-
11) FAB-MS; 1100 (M + H) + 2'-O-acetyl-3,4'-di-O-benzylsulfonyl-4 "-O-trimethylsilyl-desmycosin 9,20-bis (ethylene acetal)

【0052】[0052]

【化20】 [Chemical 20]

【0053】2′−O−アセチル−4 ″−O−トリメチ
ルシリルデスマイコシン 9,20−ビス(エチレンア
セタール)1.0g(1.03mmol)をトルエン10mlに溶
解後トリエチルアミン0.46ml(3.4mmol)を加え−1
5℃に冷却した。この溶液にベンジルスルホニルクロリ
ド430mg(2.3mmol)を加え、−10℃にて1.5時間
反応させた。反応液にトルエン40mlを加え、有機層を
水50ml、5%重曹水50ml、10%食塩水50mlで洗
浄後無水硫酸ナトリウムにて乾燥した。有機層を減圧乾
固すると、トルエン/アセトン(4/1)展開のシリカ
ゲルTLCにてRf値0.57に硫酸呈色陽性の表題化合物
が1.34g得られた。この化合物は不安定なため即座に
次の反応に供した。
1.0 g (1.03 mmol) of 2'-O-acetyl-4 "-O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal) was dissolved in 10 ml of toluene, and then 0.46 ml (3.4 mmol) of triethylamine. ) Is added -1
Cooled to 5 ° C. To this solution was added benzylsulfonyl chloride (430 mg, 2.3 mmol), and the mixture was reacted at -10 ° C for 1.5 hours. Toluene (40 ml) was added to the reaction solution, and the organic layer was washed with water (50 ml), 5% sodium hydrogen carbonate solution (50 ml) and 10% brine (50 ml), and dried over anhydrous sodium sulfate. When the organic layer was evaporated to dryness under reduced pressure, 1.34 g of the title compound positive with sulfuric acid coloration was obtained by silica gel TLC developed with toluene / acetone (4/1) and an Rf value of 0.57. Since this compound was unstable, it was immediately subjected to the next reaction.

【0054】NMR(CDCl3); 主要ピークのみを表す δ;0.16(9H,s,Si(CH3)3), 0.81(3H,d,J=7.3Hz,H-18),0.
94(3H,t,J=7.3Hz,H-17), 1.01(3H,d,J=6.6Hz,H-21),1.1
8(3H,d,J=6.2Hz, H-6″), 1.31(3H,d,J=6.2Hz,H-6′),
1.69(3H,d,J=0.7Hz, H-22), 1.99(3H,s,OCOCH3-2′),2.
47(6H,s,N(CH3)2-3 ′),2.94(1H,t,J=10.3Hz,H-3′),3.
29(1H,dd,J=9.2&2.6Hz,H-4″),3.47(3H,s,OCH3-2″),3.
59(3H,s,OCH3-3″), 4.33(1H,t,J=9.9Hz,H-4′),4.40(1
H,brd,J=15.0Hz,OSO2CHph), 4.51(1H,m,H-1 ′),4.53
(2H,m,OSO2CH2ph), 4.57(1H,m,SO2CHph),4.58(1H,d,J
=8.1Hz,H-1 ″), 4.87(1H,br,H-3),4.97(1H,m,H-15),
5.03(1H,dd,J=10.3&7.7Hz,H-2′),5.50(1H,d,J=10.6Hz,
H-13), 5.55(1H,d,J=15.8Hz,H-10),6.36(1H,d,J=15.8H
z,H-11), 7.36-7.42(10H,m,ph x2) FAB-MS; 1282(M+H)+ 2′−O−アセチル−4′−デオキシ−4′−ヨード−
3−O−メタンスルホニル−4″−O−トリメチルシリ
ルデスマイコシン 9,20−ビス(エチレンアセター
ル)の製造
NMR (CDCl 3 ); representing only the main peak δ; 0.16 (9H, s, Si (CH 3 ) 3 ), 0.81 (3H, d, J = 7.3Hz, H-18), 0.
94 (3H, t, J = 7.3Hz, H-17), 1.01 (3H, d, J = 6.6Hz, H-21), 1.1
8 (3H, d, J = 6.2Hz, H-6 ″), 1.31 (3H, d, J = 6.2Hz, H-6 ′),
1.69 (3H, d, J = 0.7Hz, H-22), 1.99 (3H, s, OCOCH 3 -2 '), 2.
47 (6H, s, N ( CH 3) 2 -3 '), 2.94 (1H, t, J = 10.3Hz, H-3'), 3.
29 (1H, dd, J = 9.2 & 2.6Hz, H-4 ″), 3.47 (3H, s, OCH 3 -2 ″), 3.
59 (3H, s, OCH 3 -3 ″), 4.33 (1H, t, J = 9.9Hz, H-4 ′), 4.40 (1
H, brd, J = 15.0Hz, OSO 2 C H Hph), 4.51 (1H, m, H-1 ′), 4.53
(2H, m, OSO 2 CH 2 ph), 4.57 (1H, m, SO 2 CH H ph), 4.58 (1H, d, J
= 8.1Hz, H-1 ″), 4.87 (1H, br, H-3), 4.97 (1H, m, H-15),
5.03 (1H, dd, J = 10.3 & 7.7Hz, H-2 ′), 5.50 (1H, d, J = 10.6Hz,
H-13), 5.55 (1H, d, J = 15.8Hz, H-10), 6.36 (1H, d, J = 15.8H
z, H-11), 7.36-7.42 (10H, m, ph x2) FAB-MS; 1282 (M + H) + 2'-O-acetyl-4'-deoxy-4'-iodo-
Production of 3-O-methanesulfonyl-4 ″ -O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal)

【0055】[0055]

【化21】 [Chemical 21]

【0056】2′−O−アセチル−3,4 ′−ジ−O−
メタンスルホニル−4″−O−トリメチルシリルデスマ
イコシン 9,20−ビス(エチレンアセタール)12.
94g(11.5mmol)をメチルエチルケトン60mlに溶
解し、ヨウ化ナトリウム2.58g(17.2mmol)を加え
て暗所で85℃、1時間反応させた。反応液を室温に冷
却後析出物を濾別した。沈殿物をトルエン5mlで洗浄し
た。洗浄液と母液とを合わせ減圧濃縮後トルエン60ml
及び水60mlを加えて分液した。有機層を10%チオ硫
酸ナトリウム40ml、水40mlで洗浄後、無水硫酸ナト
リウムで乾燥、減圧濃縮乾固すると、トルエン/アセト
ン(4/1)展開のシリカゲルTLCにてRf値0.51に
硫酸呈色陽性の表題化合物が10.73g得られた。
2'-O-acetyl-3,4'-di-O-
Methanesulfonyl-4 ″ -O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal) 12.
94 g (11.5 mmol) was dissolved in 60 ml of methyl ethyl ketone, 2.58 g (17.2 mmol) of sodium iodide was added, and the mixture was reacted in the dark at 85 ° C. for 1 hour. After cooling the reaction solution to room temperature, the precipitate was filtered off. The precipitate was washed with 5 ml of toluene. Wash solution and mother liquor are combined and concentrated under reduced pressure. Toluene 60 ml
And 60 ml of water were added for liquid separation. The organic layer was washed with 40 ml of 10% sodium thiosulfate and 40 ml of water, dried over anhydrous sodium sulfate and concentrated to dryness under reduced pressure. 10.73 g of a color-positive title compound was obtained.

【0057】UV(MeOH)λmax;235nm IR(KBr) νmax;3443,2973,2940,2886,1746,1360,1233,1
173,1101,1049,966,909,882,843 cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.16(9H,s,Si(CH3)3), 0.89(3H,d,J=7.3Hz,H-18),0.
92(3H,t,J=7.3Hz,H-17), 1.02(3H,d,J=7.0Hz,H-21),1.1
8(3H,d,J=6.2Hz,H-6 ″), 1.51(3H,d,J=5.9Hz, H-6
′),1.69(3H,d,J=0.7Hz,H-22), 2.02(3H,s,OCOCH3-2
′),2.42(6H,s,N(CH3)2-3 ′), 3.12(3H,s,OMs-3), 3.
47(3H,s,OCH3-2 ″),3.59(3H,s,OCH3-3″), 4.57(1H,d,
J=8.1Hz,H-1″),4.57(1H,br,H-1′),4.77(1H,br,H-3),
4.91(1H,dd,J=9.9&7.3Hz, H-2′), 4.93(1H,m,H-15),4.
98(1H,br,H-20), 5.47(1H,d,J=10.6Hz,H-13),5.54(1H,
d,J=15.8Hz,H-10), 6.34(1H,d,J=15.8Hz,H-11) FAB-MS; 1162(M+H)+ 2′,4″−ジ−O−アセチル−4′−デオキシ−4′
−ヨード−3−O−メタンスルホニルデスマイコシン
9,20−ビス(エチレンアセタール)の製造
UV (MeOH) λmax; 235nm IR (KBr) νmax; 3443,2973,2940,2886,1746,1360,1233,1
173,1101,1049,966,909,882,843 cm -1 NMR (CDCl 3 ); represents only the main peak δ; 0.16 (9H, s, Si (CH 3 ) 3 ), 0.89 (3H, d, J = 7.3Hz, H- 18), 0.
92 (3H, t, J = 7.3Hz, H-17), 1.02 (3H, d, J = 7.0Hz, H-21), 1.1
8 (3H, d, J = 6.2Hz, H-6 ″), 1.51 (3H, d, J = 5.9Hz, H-6
′), 1.69 (3H, d, J = 0.7Hz, H-22), 2.02 (3H, s, OCOCH 3 -2
′), 2.42 (6H, s, N (CH 3 ) 2 -3 ′), 3.12 (3H, s, OMs-3), 3.
47 (3H, s, OCH 3 -2 ″), 3.59 (3H, s, OCH 3 −3 ″), 4.57 (1H, d,
J = 8.1Hz, H-1 ″), 4.57 (1H, br, H-1 ′), 4.77 (1H, br, H-3),
4.91 (1H, dd, J = 9.9 & 7.3Hz, H-2 ′), 4.93 (1H, m, H-15), 4.
98 (1H, br, H-20), 5.47 (1H, d, J = 10.6Hz, H-13), 5.54 (1H,
d, J = 15.8Hz, H-10), 6.34 (1H, d, J = 15.8Hz, H-11) FAB-MS; 1162 (M + H) + 2 ', 4 "-di-O-acetyl-4' -Deoxy-4 '
-Iodo-3-O-methanesulfonyl desmycosin
Production of 9,20-bis (ethylene acetal)

【0058】[0058]

【化22】 [Chemical formula 22]

【0059】2′,4″−ジ−O−アセチル−3,4′
−ジ−O−メタンスルホニルデスマイコシン 9,20
−ビス(エチレンアセタール)134mg(0.115mmo
l)をメチルエチルケトン1mlに溶解し、ヨウ化ナトリ
ウム25.7mg(0.173mmol)を加え、30分間加熱還
流した。反応液に酢酸エチル10mlを加え、5%重曹水
10ml、飽和食塩水10mlで洗浄後、無水硫酸ナトリウ
ムで乾燥した。有機層を減圧濃縮して得られた残渣12
8mgを、トルエン/アセトン(3/1)展開の分取用シ
リカゲルTLCで精製すると同展開TLCにてRf値0.6
1に硫酸呈色陽性の表題化合物が2′,4″−ジ−O−
アセチル−3,4′−ジ−O−メタンスルホニルデスマ
イコシン 9,20−ビス(エチレンアセタール)より
2工程72%の収率で134mg得られた。
2 ', 4 "-di-O-acetyl-3,4'
-Di-O-methanesulfonyl desmycosin 9,20
-Bis (ethylene acetal) 134mg (0.115mmo
l) was dissolved in 1 ml of methyl ethyl ketone, 25.7 mg (0.173 mmol) of sodium iodide was added, and the mixture was heated under reflux for 30 minutes. Ethyl acetate (10 ml) was added to the reaction mixture, which was washed with 5% aqueous sodium hydrogen carbonate solution (10 ml) and saturated brine (10 ml), and dried over anhydrous sodium sulfate. Residue 12 obtained by concentrating the organic layer under reduced pressure
When 8 mg was purified by preparative silica gel TLC developed with toluene / acetone (3/1), the Rf value was 0.6 on the same developed TLC.
Sulfate color-positive title compound was 2 ', 4 "-di-O- in 1
From acetyl-3,4'-di-O-methanesulfonyldesmycosin 9,20-bis (ethylene acetal), 134 mg was obtained in a yield of 72% in 2 steps.

【0060】UV(MeOH)λmax;234nm IR(KBr) νmax;2975,2938,2884,1740,1377,1233,1171,1
088,1049,963,909cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.89(3H,d,J=7.3Hz,H-18), 0.92(3H,t,J=7.3Hz,H-1
7),1.02(3H,d,J=6.6Hz,H-21), 1.17(3H,d,J=5.9Hz,H-
6″),1.51(3H,d,J=5.9Hz, H-6′), 1.70(3H,s,H-22),2.
02(3H,s,OCOCH3), 2.11(3H,s,OCOCH3),2.42(6H,s,N(C
H3)2-3 ′), 3.04(1H,dd,J=2.9&8.1Hz,H-2 ″),3.12(3
H,s,OMs-3), 3.46(3H,s,OCH3-2″),3.52(3H,s,OCH3-
3″), 4.47(1H,dd,J=2.9&11.7Hz,H-4″),4.60(1H,d,J=
8.1Hz,H-1 ″), 5.46(1H,d,J=11.0Hz,H-13),5.55(1H,d,
J=15.4Hz,H-10), 6.35(1H,d,J=15.4Hz,H-11) FAB-MS; 1134(M+H)+ 2′−O−アセチル−3−O−ベンジルスルホニル−
4′−デオキシ−4′−ヨード−4″−O−トリメチル
シリル−デスマイコシン 9,20−ビス(エチレンア
セタール)の製造
UV (MeOH) λmax; 234nm IR (KBr) νmax; 2975,2938,2884,1740,1377,1233,1171,1
088,1049,963,909cm -1 NMR (CDCl 3 ); showing only the main peak δ; 0.89 (3H, d, J = 7.3Hz, H-18), 0.92 (3H, t, J = 7.3Hz, H- 1
7), 1.02 (3H, d, J = 6.6Hz, H-21), 1.17 (3H, d, J = 5.9Hz, H-
6 ″), 1.51 (3H, d, J = 5.9Hz, H-6 ′), 1.70 (3H, s, H-22), 2.
02 (3H, s, OCOCH 3 ), 2.11 (3H, s, OCOCH 3 ), 2.42 (6H, s, N (C
H 3 ) 2 -3 ′), 3.04 (1H, dd, J = 2.9 & 8.1Hz, H-2 ″), 3.12 (3
H, s, OMs-3), 3.46 (3H, s, OCH 3 -2 ″), 3.52 (3H, s, OCH 3-
3 ″), 4.47 (1H, dd, J = 2.9 & 11.7Hz, H-4 ″), 4.60 (1H, d, J =
8.1Hz, H-1 ″), 5.46 (1H, d, J = 11.0Hz, H-13), 5.55 (1H, d,
J = 15.4Hz, H-10), 6.35 (1H, d, J = 15.4Hz, H-11) FAB-MS; 1134 (M + H) + 2'-O-acetyl-3-O-benzylsulfonyl-
Production of 4'-deoxy-4'-iodo-4 "-O-trimethylsilyl-desmycosin 9,20-bis (ethylene acetal)

【0061】[0061]

【化23】 [Chemical formula 23]

【0062】2′−O−アセチル−3,4′−ジ−O−
ベンジルスルホニル−4″−O−トリメチルシリルデス
マイコシン 9,20−ビス(エチレンアセタール)1.
23g(0.96mmol)をメチルエチルケトン10mlに溶
解し、ヨウ化ナトリウム216mg(1.4mmol)を加えて
暗所で85℃、30分反応させた。反応液を室温に冷却
後析出物を濾別した。沈殿物をトルエン5mlで洗浄し
た。洗浄液と母液とを合わせ減圧濃縮後トルエン30ml
及び水30mlを加えて分液した。有機層を飽和重曹水3
0ml、10%食塩水30mlで洗浄後、無水硫酸ナトリウ
ムで乾燥、減圧濃縮乾固すると、トルエン/アセトン
(4/1)展開のシリカゲルTLCにてRf値0.51に硫
酸呈色陽性の表題化合物が1.22g得られた。
2'-O-acetyl-3,4'-di-O-
Benzylsulfonyl-4 ″ -O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal) 1.
23 g (0.96 mmol) was dissolved in 10 ml of methyl ethyl ketone, 216 mg (1.4 mmol) of sodium iodide was added, and the mixture was reacted at 85 ° C. for 30 minutes in the dark. After cooling the reaction solution to room temperature, the precipitate was filtered off. The precipitate was washed with 5 ml of toluene. Wash solution and mother liquor are combined and concentrated under reduced pressure. Toluene 30 ml
And 30 ml of water were added for liquid separation. The organic layer is saturated sodium bicarbonate water 3
After washing with 0 ml and 10% brine 30 ml, drying over anhydrous sodium sulfate and concentrating to dryness under reduced pressure, silica gel TLC developed with toluene / acetone (4/1) gave an Rf value of 0.51 and the title compound was a sulfuric acid color-positive compound. 1.22 g was obtained.

【0063】UV(MeOH)λmax;235nm IR(KBr) νmax;3488,2938,2886,1748,1456,1373,1233,1
171,1101,1049,968,882 cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.17(9H,s,Si(CH3)3), 0.81(3H,d,J=7.3Hz,H-18),0.
93(3H,t,J=7.3Hz,H-17), 1.01(3H,d,J=6.6Hz,H-21),1.1
8(3H,d,J=6.2Hz,H-6 ″), 1.49(3H,d,J=5.5Hz,H-6′),
1.68(3H,s,H-22), 1.97(3H,s,OCOCH3-2 ′), 2.41(6H,
s,N(CH3)2-3′),2.78(1H,t,J=10.3Hz,H-3′), 3.48(3H,
s,OCH3-2 ″),3.59(3H,s,OCH3-3″), 4.40(1H,m,H-
1′), 4.40(1H,m,OSO2CHph),4.58(1H,d,J=8.1Hz,H-1
″), 4.58(1H,m,OSO2CHph),4.87(1H,dd,J=9.9&7.7H
z,H-2′), 4.96(1H,m,H-15),5.51(1H,d,J=11.4Hz,H-1
3), 5.54(1H,d,J=15.8Hz,H-10),6.36(1H,d,J=15.8Hz,H-
11), 7.40(5z,s,ph) FAB-MS; 1238(M+H) 2′−O−アセチル−3,4′−ジデオキシデスマイコ
シン 9,20−ビス(エチレンアセタール)の製造
UV (MeOH) λmax; 235 nm IR (KBr) νmax; 3488,2938,2886,1748,1456,1373,1233,1
171,1101,1049,968,882 cm -1 NMR (CDCl 3 ); represents only the main peak δ; 0.17 (9H, s, Si (CH 3 ) 3 ), 0.81 (3H, d, J = 7.3Hz, H- 18), 0.
93 (3H, t, J = 7.3Hz, H-17), 1.01 (3H, d, J = 6.6Hz, H-21), 1.1
8 (3H, d, J = 6.2Hz, H-6 ″), 1.49 (3H, d, J = 5.5Hz, H-6 ′),
1.68 (3H, s, H-22), 1.97 (3H, s, OCOCH 3 -2 ′), 2.41 (6H,
s, N (CH 3) 2 -3 '), 2.78 (1H, t, J = 10.3Hz, H-3'), 3.48 (3H,
s, OCH 3 -2 ″), 3.59 (3H, s, OCH 3 -3 ″), 4.40 (1H, m, H-
1 '), 4.40 (1H, m, OSO 2 C H Hph), 4.58 (1H, d, J = 8.1Hz, H-1
″), 4.58 (1H, m, OSO 2 CH H ph), 4.87 (1H, dd, J = 9.9 & 7.7H
z, H-2 ′), 4.96 (1H, m, H-15), 5.51 (1H, d, J = 11.4Hz, H-1
3), 5.54 (1H, d, J = 15.8Hz, H-10), 6.36 (1H, d, J = 15.8Hz, H-
11), 7.40 (5z, s, ph) FAB-MS; 1238 (M + H) 2'-O-acetyl-3,4'-dideoxydesmycosin 9,20-bis (ethylene acetal)

【0064】[0064]

【化24】 [Chemical formula 24]

【0065】2′−O−アセチル−4′−デオキシ−
4′−ヨード−3−O−メタンスルホニル−4″−O−
トリメチルシリルデスマイコシン 9,20−ビス(エ
チレンアセタール)10.70g(9.2mmol)をメタノー
ル50mlに溶解し、炭酸カリウム3.82g(27.6mmo
l)、続いてラネーニッケル(川研ファインケミカル株
NDT−65)湿重量6.4g(5ml)のメタノール8ml
懸濁液を加え、水素圧3Kg/cm2 にて2時間接触還元を
行なった。触媒をセライトにて濾別後母液を減圧濃縮し
た。残査に酢酸エチル100ml、水100mlを加え、分
液した。有機層は20%食塩水100mlで洗浄後減圧濃
縮した。濃縮液に無水酢酸0.86mlを加え室温で1.5時
間反応させた後5%重曹水30ml、20%食塩水30ml
で洗浄した。有機層は無水硫酸ナトリウムで乾燥後減圧
乾固すると、クロロホルム/メタノール(10/1)展
開のシリカゲルTLCにてRf値0.44に硫酸呈色陽性の
表題化合物が7.46gが得られた。
2'-O-acetyl-4'-deoxy-
4'-iodo-3-O-methanesulfonyl-4 "-O-
Trimethylsilyldesmycosin 9,20-bis (ethylene acetal) 10.70 g (9.2 mmol) was dissolved in 50 ml of methanol to obtain potassium carbonate 3.82 g (27.6 mmo).
l), followed by Raney Nickel (Kawaken Fine Chemicals Co. NDT-65) wet weight 6.4 g (5 ml) methanol 8 ml
The suspension was added, and catalytic reduction was carried out at a hydrogen pressure of 3 kg / cm 2 for 2 hours. The catalyst was filtered off through Celite and the mother liquor was concentrated under reduced pressure. 100 ml of ethyl acetate and 100 ml of water were added to the residue and the layers were separated. The organic layer was washed with 100 ml of 20% saline and then concentrated under reduced pressure. 0.86 ml of acetic anhydride was added to the concentrate and reacted at room temperature for 1.5 hours, then 30 ml of 5% sodium hydrogen carbonate solution and 30 ml of 20% saline solution.
Washed with. The organic layer was dried over anhydrous sodium sulfate and then dried under reduced pressure to give 7.46 g of the title compound having a sulfuric acid coloration positive with an Rf value of 0.44 by silica gel TLC developed with chloroform / methanol (10/1).

【0066】UV(MeOH)λmax;235nm IR(KBr) νmax;3476,2973,2938,2882,1744,1373,1238,1
167,1061,961cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.82(3H,bd,J=5.5Hz,H-18), 0.92(3H,t,J=7.3Hz,H-1
7),1.00(3H,d,J=6.6Hz,H-21), 1.23(3H,d,J=6.2Hz,H-
6′),1.26(3H,d,J=6.2Hz,H-6 ″), 1.35(1H,m,H-4′a),
1.71(1H,m,H-4 ′b),1.73(3H,d,J=1.1Hz,H-22), 2.04
(3H,s,OCOCH3-2 ′),2.26(6H,s,N(CH3)2-3 ′), 2.68(1
H,ddd,J=12.3&10.4&4.4Hz,H-3′),3.18(1H,br,H-4″),
3.48(3H,s,OCH3-2 ″), 3.61(3H,s,OCH3-3 ″),4.31(1
H,d,J=7.7Hz,H-1 ″), 4.55(1H,d,J=7.7Hz,H-1″),4.80
(1H,dd,J=10.4&7.7Hz,H-2 ′), 4.90(1H,m,H-15),4.95
(1H,bt,J=5.1Hz,H-20), 5.42(1H,d,J=10.6Hz,H-13),5.6
2(1H,d,J=15.8Hz,H-10), 6.36(1H,d,J=15.8Hz,H-11) FAB-MS;870(M+H)+ 2′−O−アセチル−3,4′−ジデオキシ−4″−オ
キソデスマイコシン 9,20−ビス(エチレンアセタ
ール)の製造
UV (MeOH) λmax; 235nm IR (KBr) νmax; 3476,2973,2938,2882,1744,1373,1238,1
167,1061,961 cm -1 NMR (CDCl 3 ); represents only the main peak δ; 0.82 (3H, bd, J = 5.5Hz, H-18), 0.92 (3H, t, J = 7.3Hz, H-1
7), 1.00 (3H, d, J = 6.6Hz, H-21), 1.23 (3H, d, J = 6.2Hz, H-
6 ′), 1.26 (3H, d, J = 6.2Hz, H-6 ″), 1.35 (1H, m, H-4′a),
1.71 (1H, m, H-4′b), 1.73 (3H, d, J = 1.1Hz, H-22), 2.04
(3H, s, OCOCH 3 -2 '), 2.26 (6H, s, N (CH 3 ) 2 -3'), 2.68 (1
H, ddd, J = 12.3 & 10.4 & 4.4Hz, H-3 ′), 3.18 (1H, br, H-4 ″),
3.48 (3H, s, OCH 3 -2 ″), 3.61 (3H, s, OCH 3 −3 ″), 4.31 (1
H, d, J = 7.7Hz, H-1 ″), 4.55 (1H, d, J = 7.7Hz, H-1 ″), 4.80
(1H, dd, J = 10.4 & 7.7Hz, H-2 ′), 4.90 (1H, m, H-15), 4.95
(1H, bt, J = 5.1Hz, H-20), 5.42 (1H, d, J = 10.6Hz, H-13), 5.6
2 (1H, d, J = 15.8Hz, H-10), 6.36 (1H, d, J = 15.8Hz, H-11) FAB-MS; 870 (M + H) + 2'-O-acetyl-3,4 Production of ′ -dideoxy-4 ″ -oxodesmycosin 9,20-bis (ethylene acetal)

【0067】[0067]

【化25】 [Chemical 25]

【0068】トルエン8mlにN−クロロコハクサンイミ
ド491mg(3.68mmol)を懸濁させ、0℃に冷却後ジ
メチルスルフィド0.4ml(5.5mmol)を加えて同温度に
て20分攪拌した。この溶液を−20℃に冷却後、2′
−O−アセチル−3,4′−ジデオキシデスマイコシン
9,20−ビス(エチレンアセタール)800mg(0.
92mmol)のトルエン溶液4mlを加え、同温度で1.5時
間反応させた。この反応液にトリエチルアミン0.64ml
(4.6mmol)を加え更に20分反応させた。反応液は1
0%食塩水15mlで2回洗浄後無水硫酸ナトリウムで乾
燥、減圧乾固すると、クロロホルム/メタノール(5/
1)展開のシリカゲルTLCにてRf値0.65に硫酸呈色
陽性の表題化合物が755mg得られた。
491 mg (3.68 mmol) of N-chlorosuccinimide was suspended in 8 ml of toluene, cooled to 0 ° C., 0.4 ml (5.5 mmol) of dimethyl sulfide was added, and the mixture was stirred at the same temperature for 20 minutes. After cooling the solution to -20 ° C, 2 '
-O-Acetyl-3,4'-dideoxydesmycosin 9,20-bis (ethylene acetal) 800 mg (0.
(92 mmol) of toluene solution (4 ml) was added, and the mixture was reacted at the same temperature for 1.5 hours. 0.64 ml of triethylamine was added to this reaction solution.
(4.6 mmol) was added and the reaction was further continued for 20 minutes. The reaction solution is 1
After washing twice with 15 ml of 0% saline solution, drying over anhydrous sodium sulfate, and drying under reduced pressure, chloroform / methanol (5 /
1) By developing silica gel TLC, 755 mg of the title compound having a sulfuric acid coloration positive value was obtained with an Rf value of 0.65.

【0069】UV(MeOH)λmax;235nm IR(KBr) νmax;3441,2971,2938,2882,1744,1373,1240,1
169,1117,1057,974 cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.83(3H,d,J=5.9Hz,H-18), 0.94(3H,t,J=7.3Hz,H-1
7),1.00(3H,d,J=6.6Hz,H-21), 1.24(3H,d,J=5.9Hz,H-
6′),1.35(3H,d,J=7.0Hz,H-6 ″), 1.38(1H,m,H-4′a),
1.73(1H,m,H-4 ′b),1.76(3H,d,J=1.1Hz,H-22), 2.04
(3H,s,OCOCH3-2 ′),2.26(6H,s,N(CH3)2-3 ′),3.46(3
H,s,OCH3-2″),3.50(3H,s,OCH3-3″),3.74(1H,t,J=3.3H
z,H-2 ″), 4.17(1H,q,J=7.0Hz,H-5″),4.26(1H,d,J=3.
7Hz,H-3 ″), 4.32(1H,d,J=7.7Hz,H-1″),4.81(1H,dd,J
=10.6&7.7Hz,H-2 ′), 4.83(1H,d,J=2.9Hz,H-1″),4.92
(1H,m,H-15), 4.95(1H,bt,J=5.1Hz,H-20),5.39(1H,d,J=
10.3Hz,H-13), 5.67(1H,d,J=15.8Hz,H-10),6.37(1H,d,J
=15.8Hz,H-11) FAB-MS;868(M+H)+ 3,4′−ジデオキシマイカミノシルタイロノライド
9,20−ビス(エチレンアセタール)の製造
UV (MeOH) λmax; 235nm IR (KBr) νmax; 3441,2971,2938,2882,1744,1373,1240,1
169,1117,1057,974 cm -1 NMR (CDCl 3 ); showing only the main peak δ; 0.83 (3H, d, J = 5.9Hz, H-18), 0.94 (3H, t, J = 7.3Hz, H-1
7), 1.00 (3H, d, J = 6.6Hz, H-21), 1.24 (3H, d, J = 5.9Hz, H-
6 ′), 1.35 (3H, d, J = 7.0Hz, H-6 ″), 1.38 (1H, m, H-4′a),
1.73 (1H, m, H-4′b), 1.76 (3H, d, J = 1.1Hz, H-22), 2.04
(3H, s, OCOCH 3 -2 '), 2.26 (6H, s, N (CH 3 ) 2 -3'), 3.46 (3
H, s, OCH 3 -2 ″), 3.50 (3H, s, OCH 3 -3 ″), 3.74 (1H, t, J = 3.3H
z, H-2 ″), 4.17 (1H, q, J = 7.0Hz, H-5 ″), 4.26 (1H, d, J = 3.
7Hz, H-3 ″), 4.32 (1H, d, J = 7.7Hz, H-1 ″), 4.81 (1H, dd, J
= 10.6 & 7.7Hz, H-2 ′), 4.83 (1H, d, J = 2.9Hz, H-1 ″), 4.92
(1H, m, H-15), 4.95 (1H, bt, J = 5.1Hz, H-20), 5.39 (1H, d, J =
10.3Hz, H-13), 5.67 (1H, d, J = 15.8Hz, H-10), 6.37 (1H, d, J
= 15.8Hz, H-11) FAB-MS; 868 (M + H) + 3,4'-dideoxymycaminosyl tylonolide
Production of 9,20-bis (ethylene acetal)

【0070】[0070]

【化26】 [Chemical formula 26]

【0071】2′−O−アセチル−3,4′−ジデオキ
シ−4″−オキソデイマイコシン9,20−ビス(エチ
レンアセタール)100mg(0.115mmol)をメタノー
ル1mlに溶解後0℃にて1N-NaOH 0.115mlを加え同
温度で1時間反応させた。更に、濃アンモニア水40μ
l を加えて昇温し、60℃2時間反応させた。反応液に
クロロホルム5mlを加え、有機層は10%食塩水5mlで
4回洗浄した。この有機層を減圧乾固すると、クロロホ
ルム/メタノール(5/1)展開のシリカゲルTLCに
てRf値0.31に硫酸呈色陽性の表題化合物が74mg得ら
れた。
100 mg (0.115 mmol) of 2'-O-acetyl-3,4'-dideoxy-4 "-oxodemycocin 9,20-bis (ethylene acetal) was dissolved in 1 ml of methanol and then 1N was added at 0 ° C. -0.115 ml of NaOH was added and the reaction was carried out at the same temperature for 1 hour.
l was added and the temperature was raised, and the mixture was reacted at 60 ° C. for 2 hours. Chloroform (5 ml) was added to the reaction solution, and the organic layer was washed 4 times with 10% saline (5 ml). The organic layer was evaporated to dryness under reduced pressure to give 74 mg of a sulfuric acid color-positive title compound having an Rf value of 0.31 by silica gel TLC developed with chloroform / methanol (5/1).

【0072】UV(MeOH)λmax;235nm IR(KBr) νmax;3449,2938,2880,1730,1642,1458,1381,1
169,1111,1049,974 cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.93(3H,t,J=7.3Hz,H-17), 0.99(3H,d,J=6.6Hz,H-1
8),1.02(3H,d,J=7.0Hz,H-21), 1.24(3H,d,J=5.9Hz,H-
6′),1.78(3H,d,J=1.1Hz,H-22), 2.35(6H,s,N(CH3)2-
3′),3.30(1H,dd,J=10.3&7.3Hz,H-2 ′), 4.29(1H,d,J=
7.0Hz,H-1′),4.84(1H,m,H-15), 5.01(1H,bt,J=5.1Hz,H
-20),5.34(1H,d,J=9.9Hz,H-13), 5.66(1H,d,J=15.8Hz,H
-10),6.42(1H,d,J=15.8Hz,H-11) FAB-MS;654(M+H)+ 、676(M+Na)+ 3,4′−ジデオキシマイカミノシル タイロノライド
の製造
UV (MeOH) λmax; 235nm IR (KBr) νmax; 3449,2938,2880,1730,1642,1458,1381,1
169,1111,1049,974 cm -1 NMR (CDCl 3 ); represents only the main peak δ; 0.93 (3H, t, J = 7.3Hz, H-17), 0.99 (3H, d, J = 6.6Hz, H-1
8), 1.02 (3H, d, J = 7.0Hz, H-21), 1.24 (3H, d, J = 5.9Hz, H-
6 ′), 1.78 (3H, d, J = 1.1Hz, H-22), 2.35 (6H, s, N (CH 3 ) 2-
3 '), 3.30 (1H, dd, J = 10.3 & 7.3Hz, H-2'), 4.29 (1H, d, J =
7.0Hz, H-1 ′), 4.84 (1H, m, H-15), 5.01 (1H, bt, J = 5.1Hz, H
-20), 5.34 (1H, d, J = 9.9Hz, H-13), 5.66 (1H, d, J = 15.8Hz, H
-10), 6.42 (1H, d, J = 15.8Hz, H-11) FAB-MS; 654 (M + H) + , 676 (M + Na) + 3,4'-dideoxymycaminosyl tylonolide

【0073】[0073]

【化27】 [Chemical 27]

【0074】3,4′−ジデオキシマイカミノシル タ
イロノライド 9,20−ビス(エチレンアセタール)
26mg(0.05mmol)をテトラヒドロフラン0.2mlに溶
解後1N塩酸0.2mlを加え、室温で1.5時間反応させ
た。反応液を水で希釈後クロロホルム3mlを加えた。有
機層は5%重曹水2ml、10%食塩水2mlで洗浄後無水
硫酸ナトリウムにて乾燥した。この有機層を減圧乾固す
ると、クロロホルム/メタノール(5/1)展開のシリ
カゲルTLCにてRf値0.25に硫酸呈色陽性のが20mg
得られた。
3,4'-dideoxymycaminosyl tylonolide 9,20-bis (ethylene acetal)
26 mg (0.05 mmol) was dissolved in 0.2 ml of tetrahydrofuran, 0.2 ml of 1N hydrochloric acid was added, and the mixture was reacted at room temperature for 1.5 hours. After the reaction solution was diluted with water, 3 ml of chloroform was added. The organic layer was washed with 2 ml of 5% sodium hydrogen carbonate solution and 2 ml of 10% saline solution and dried over anhydrous sodium sulfate. When this organic layer was evaporated to dryness under reduced pressure, 20 mg of sulfuric acid color-positive was found to have an Rf value of 0.25 on silica gel TLC developed with chloroform / methanol (5/1).
Was obtained.

【0075】UV(MeOH)λmax;283nm IR(KBr) νmax;3436,2967,2878,1725,1676,1591,1458,1
383,1316,1167,1071,984 cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.94(3H,t,J=7.3Hz,H-17), 1.04(3H,d,J=6.6Hz,H-1
8),1.20(3H,d,J=6.2Hz,H-6 ′), 1.21(3H,d,J=6.6Hz,H-
21),1.85(3H,d,J=1.1Hz,H-22),2.29(6H,s,N(CH3)2-3
′),2.90(1H,m,H-14),3.20(1H,dd,J=7.3&10.3Hz,H-2
′), 4.19(1H,d,J=7.3Hz,H-1′),4.88(1H,m,H-15),5.8
4(1H,d,J=10.6Hz,H-13),6.35(1H,d,J=15.6Hz,H-10),7.3
0(1H,d,J=15.6Hz,H-11), 9.69(1H,s,H-20) FAB-MS;566(M+H)+
UV (MeOH) λmax; 283 nm IR (KBr) νmax; 3436,2967,2878,1725,1676,1591,1458,1
383,1316,1167,1071,984 cm -1 NMR (CDCl 3 ); represents only the main peak δ; 0.94 (3H, t, J = 7.3Hz, H-17), 1.04 (3H, d, J = 6.6 Hz, H-1
8), 1.20 (3H, d, J = 6.2Hz, H-6 ′), 1.21 (3H, d, J = 6.6Hz, H-
21), 1.85 (3H, d, J = 1.1Hz, H-22), 2.29 (6H, s, N (CH 3 ) 2 -3
′), 2.90 (1H, m, H-14), 3.20 (1H, dd, J = 7.3 & 10.3Hz, H-2
′), 4.19 (1H, d, J = 7.3Hz, H-1 ′), 4.88 (1H, m, H-15), 5.8
4 (1H, d, J = 10.6Hz, H-13), 6.35 (1H, d, J = 15.6Hz, H-10), 7.3
0 (1H, d, J = 15.6Hz, H-11), 9.69 (1H, s, H-20) FAB-MS; 566 (M + H) +

【0076】[0076]

【発明の効果】本発明によれば、抗菌剤として有用な
3,4′−ジデオキシマイカミノシルタイロノライド又
はその塩を製造するための有用な中間体である3,4′
−ジデオキシマイカミノシルタイロノライド誘導体を、
容易に入手できるタイロシン及びタイロシン類縁体(マ
イカミノシルタイロノライド誘導体やデマイシノシルタ
イロノライド誘導体等)から、極めて高収率且つ効率よ
く製造することができるので、3,4′−ジデオキシマ
イカミノシルタイロノライド又はその塩の工業的製法と
して極めて有用である。更に、本発明によれば、水素化
トリブチル錫を用いることなく4′−位のデオキシ化を
行うことができるので、工業的にも有用である。
According to the present invention, 3,4 'which is a useful intermediate for producing 3,4'-dideoxymycaminosyl tylonolide or a salt thereof useful as an antibacterial agent.
-A dideoxymycaminosyl tylonolide derivative,
3,4'-dideoxy mye, which can be efficiently produced from easily available tylosin and tylosin analogues (mycaminosyl tylonolide derivative, demycinosyl tylonolide derivative, etc.). It is extremely useful as an industrial method for producing caminosyl tylonolide or a salt thereof. Furthermore, according to the present invention, deoxygenation at the 4'-position can be carried out without using tributyltin hydride, which is industrially useful.

【0077】尚、上記一般式(V)で示される化合物
は、いずれも新規物である。
The compounds represented by the above general formula (V) are all novel.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 陰山 俊治 茨城県つくば市春日2−35−2 エトワー ル春日306 (72)発明者 三宅 俊昭 神奈川県横浜市港北区下田町3丁目5−1 日吉ハイツ207 (72)発明者 田中 博 神奈川県茅ヶ崎市小和田3−16−26−306 (72)発明者 吉岡 武男 神奈川県綾瀬市上土棚1959 グリーンハイ ツ3−3102 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Shunji Kageyama 2-35-2 Kasuga, Tsukuba, Ibaraki Prefecture Etoile Kasuga 306 (72) Inventor, Toshiaki Miyake 3-5-1 Shimoda-cho, Kohoku-ku, Yokohama, Kanagawa Hiyoshi Heights 207 (72) Inventor Hiroshi Tanaka 3-16-26-306 Owada, Chigasaki City, Kanagawa Prefecture (72) Inventor Takeo Yoshioka 1959, Kamishitatan, Ayase City, Kanagawa Prefecture 3-3102 Green Heights

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式(II): 【化1】 (式中、Aは保護されたカルボニル基を表し、Bは保護
されたアルデヒド基を表し、R1 は保護されていてもよ
い水酸基を表し、R2 は水素原子又は低級アルカノイル
基を表し、R3 はスルホン酸残基を表し、Xはハロゲン
原子を表す)で示される化合物をアルカリ条件下で還元
する工程を含む、下記一般式(I): 【化2】 (式中、A、B及びR1 はそれぞれ上記と同様の意味を
有する)で示される3,4′−ジデオキシマイカミノシ
ルタイロノライド誘導体の製造方法。
1. The following general formula (II): (In the formula, A represents a protected carbonyl group, B represents a protected aldehyde group, R 1 represents an optionally protected hydroxyl group, R 2 represents a hydrogen atom or a lower alkanoyl group, and R 2 3 represents a sulfonic acid residue and X represents a halogen atom), and includes a step of reducing the compound represented by the following general formula (I): (Wherein A, B and R 1 have the same meanings as described above), and a method for producing a 3,4′-dideoxymycaminosyl tylonolide derivative.
【請求項2】 下記一般式(IV): 【化3】 (式中、Aは保護されたカルボニル基を表し、Bは保護
されたアルデヒド基を表し、R1 は保護されていてもよ
い水酸基を表し、R2 は水素原子又は低級アルカノイル
基を表す)で示されるマイカミノシルタイロノライド誘
導体をスルホニル化剤と反応させて、下記一般式(III)
: 【化4】 (式中、A、B、R1 、R2 は前記と同様の意味を有
し、R3 はスルホン酸残基を表す)で示される化合物を
製造する工程;該式(III) で示される化合物をハロゲン
化剤と反応させて請求項1記載の一般式(II)で示され
る化合物を得る工程;及び該式(II)で示される化合物
をアルカリ条件下で還元する工程を含む、請求項1記載
の一般式(I)で示される3,4′−ジデオキシマイカ
ミノシルタイロノライド誘導体の製造方法。
2. The following general formula (IV): (Wherein A represents a protected carbonyl group, B represents a protected aldehyde group, R 1 represents an optionally protected hydroxyl group, and R 2 represents a hydrogen atom or a lower alkanoyl group). By reacting the indicated mycaminosyl tylonolide derivative with a sulfonylating agent, the following general formula (III)
: [Chemical 4] (In the formula, A, B, R 1 and R 2 have the same meanings as described above, and R 3 represents a sulfonic acid residue); a process of producing the compound represented by the formula (III) A method comprising reacting a compound with a halogenating agent to obtain a compound represented by the general formula (II) according to claim 1; and reducing the compound represented by the formula (II) under alkaline conditions. 1. A method for producing a 3,4′-dideoxymycaminosyltylonolide derivative represented by the general formula (I) according to 1.
【請求項3】 請求項1記載の一般式(II)で示される
化合物を還元して請求項1記載の一般式(I)で示され
る化合物としたのち、保護基を除去することを特徴とす
る請求項2記載の一般式(VI)で示される化合物の製造
方法。
3. A compound represented by the general formula (II) according to claim 1 is reduced to a compound represented by the general formula (I) according to claim 1, and the protecting group is removed. The method for producing the compound represented by the general formula (VI) according to claim 2.
【請求項4】 【化5】 下記一般式(V):〔式中、Aは保護されたカルボニル
基を表し、Bは保護されたアルデヒド基を示し、Yは水
素原子、置換スルホニルオキシ基、又はハロゲン原子を
表し、Wは水素原子又は置換スルホニルオキシ基を表
し、R4 は水素原子又は低級アルカノイル基を表し、Z
はCHOH、CHOR5 (式中、R5 は水酸基の保護基を表
す)、又はC=Oを表す〕で示される、請求項1記載の
一般式(I)で示される3,4′−ジデオキシマイカミ
ノシルタイロノライド誘導体の製造中間体。
4. A compound represented by the formula: General formula (V): [wherein A represents a protected carbonyl group, B represents a protected aldehyde group, Y represents a hydrogen atom, a substituted sulfonyloxy group, or a halogen atom, and W represents hydrogen. An atom or a substituted sulfonyloxy group, R 4 represents a hydrogen atom or a lower alkanoyl group, Z
Is CHOH, CHOR 5 (wherein R 5 represents a hydroxyl-protecting group), or C═O], and 3,4′-dideoxy represented by the general formula (I) according to claim 1. Production intermediate of mycaminosyl tylonolide derivative.
JP26885392A 1992-01-14 1992-10-07 Production of 3,4'-dideoxymycaminosyltylonolide derivative Pending JPH06116283A (en)

Priority Applications (14)

Application Number Priority Date Filing Date Title
JP26885392A JPH06116283A (en) 1992-10-07 1992-10-07 Production of 3,4'-dideoxymycaminosyltylonolide derivative
ES93901539T ES2099941T3 (en) 1992-01-14 1993-01-12 DERIVED FROM 3,4'-DIDESOXI-MICAMINOSILTILONOLIDO AND ITS PRODUCTION.
PCT/JP1993/000031 WO1993014101A1 (en) 1992-01-14 1993-01-12 3,4'-dideoxymycaminosyltylonolide derivative and production thereof
CA002127259A CA2127259A1 (en) 1992-01-14 1993-01-12 3,4', dideoxymycaminosyltylonolide derivative and process for producing the same
AT93901539T ATE150757T1 (en) 1992-01-14 1993-01-12 3,4'-DIDESOXYMYCAMINOSYLTYLONOLIDE DERIVATIVES AND PRODUCTION THEREOF
DE69309259T DE69309259T2 (en) 1992-01-14 1993-01-12 3,4'-DIDESOXYMYCAMINOSYLTYLONOLIDE DERIVATIVES AND PRODUCTION THEREOF
AU32668/93A AU3266893A (en) 1992-01-14 1993-01-12 3,4'-dideoxymycaminosyltylonolide derivative and production thereof
EP93901539A EP0627443B1 (en) 1992-01-14 1993-01-12 3,4'-dideoxymycaminosyltylonolide derivative and production thereof
JP51233493A JP3264926B2 (en) 1992-01-14 1993-01-12 3,4'-dideoxymycaminosyltylonolide derivative and method for producing the same
TW082100137A TW243446B (en) 1992-01-14 1993-01-12
US08/256,537 US5541303A (en) 1992-01-14 1993-01-12 3,4'-dideoxymycaminosltylonolide derivative and process for producing the same
DK93901539.2T DK0627443T3 (en) 1992-01-14 1993-01-12 3,4-dideoxymycaminosyltylonolide derivative and preparation thereof
CN93100302A CN1076452A (en) 1992-01-14 1993-01-13 3,4 '-dideoxy mycaminose base tylosin cyclic lactone derivatives and manufacture method thereof
GR970401178T GR3023529T3 (en) 1992-01-14 1997-05-23 3,4'-dideoxymycaminosyltylonolide derivative and production thereof.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26885392A JPH06116283A (en) 1992-10-07 1992-10-07 Production of 3,4'-dideoxymycaminosyltylonolide derivative

Publications (1)

Publication Number Publication Date
JPH06116283A true JPH06116283A (en) 1994-04-26

Family

ID=17464179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26885392A Pending JPH06116283A (en) 1992-01-14 1992-10-07 Production of 3,4'-dideoxymycaminosyltylonolide derivative

Country Status (1)

Country Link
JP (1) JPH06116283A (en)

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