JP3221955B2 - 3,4'-dideoxydesmycosin - Google Patents

3,4'-dideoxydesmycosin

Info

Publication number
JP3221955B2
JP3221955B2 JP00666093A JP666093A JP3221955B2 JP 3221955 B2 JP3221955 B2 JP 3221955B2 JP 00666093 A JP00666093 A JP 00666093A JP 666093 A JP666093 A JP 666093A JP 3221955 B2 JP3221955 B2 JP 3221955B2
Authority
JP
Japan
Prior art keywords
group
dideoxydesmycosin
acid
compound
added
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP00666093A
Other languages
Japanese (ja)
Other versions
JPH06211887A (en
Inventor
博 田中
嘉一郎 小湊
直樹 松本
武男 吉岡
浩史 西田
六郎 岡本
富雄 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mercian Corp
Original Assignee
Mercian Corp
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Filing date
Publication date
Application filed by Mercian Corp filed Critical Mercian Corp
Priority to JP00666093A priority Critical patent/JP3221955B2/en
Publication of JPH06211887A publication Critical patent/JPH06211887A/en
Application granted granted Critical
Publication of JP3221955B2 publication Critical patent/JP3221955B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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  • Saccharide Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、抗生物質3,4′−ジ
デオキシデスマイコシンに関する。
The present invention relates to the antibiotic 3,4'-dideoxydesmycosin.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】マクロ
ライド系抗生物質として、ジョサマイシンやエリスロマ
イシンが臨床上広く使用されている。しかし、近年、こ
れらのマクロライド系抗生物質に耐性を示すマクロライ
ド耐性菌が増加傾向を示しており、新しい抗生物質の開
発が望まれている。
2. Description of the Related Art As a macrolide antibiotic, josamycin and erythromycin are widely used clinically. However, in recent years, macrolide-resistant bacteria exhibiting resistance to these macrolide antibiotics have been increasing, and development of new antibiotics has been desired.

【0003】デスマイコシンはタイロシンの生合成中間
体(Antimicrobial Agents and Chemotherapy, Mar. 197
7, p455-461)であり、またタイロシンの加水分解( Anti
biotics and Chemotherapy, vol.11, p328-334, 1961)
によって容易に得ることができる。しかし、本物質は十
分な抗菌活性を示さないことから治療薬として応用され
た例はない。本発明者は、デスマイコシンの誘導体を種
々合成してその抗菌作用を検討し、マクロイライド耐性
菌にも強い抗菌力を有する新規抗生物質として3,4′
−ジデオキシデスマイコシンを見出し、本発明を完成す
るに至った。
[0003] Desmycosin is a biosynthetic intermediate of tylosin (Antimicrobial Agents and Chemotherapy, Mar. 197).
7, p455-461) and hydrolysis of tylosin (Anti
biotics and Chemotherapy, vol. 11, p328-334, 1961)
Can be easily obtained by: However, since this substance does not show sufficient antibacterial activity, it has never been applied as a therapeutic agent. The present inventors have synthesized various derivatives of desmycosin and studied the antibacterial activity thereof. As a novel antibiotic having a strong antibacterial activity even against macroylide-resistant bacteria, 3,4 ′.
-Dideoxydesmycosin was found, and the present invention was completed.

【0004】[0004]

【課題を解決するための手段】本発明の3,4′−ジデ
オキシデスマイコシンは、以下の式で示される新規抗生
物質である。
SUMMARY OF THE INVENTION The 3,4'-dideoxydesmycosin of the present invention is a novel antibiotic represented by the following formula.

【0005】[0005]

【化2】 本発明の3,4′−ジデオキシデスマイコシンの製造方
法の一例を、以下の製造スキームに示すが、本発明の
3,4′−ジデオキシデスマイコシンの製造方法は、こ
れらの方法に限定されることはない。スキーム中、Aは
保護されたカルボニル基を示し、Bは保護されたアルデ
ヒド基を示し、protは保護基を示し、Xはハロゲン原子
を示し、R1 は独立にスルホン酸残基を示し、またR2
は低級アルカノイル基を示す。下記スキームの方法によ
れば、容易に入手可能なタイロシンから、本発明の3,
4′−ジデオキシデスマイコシンを効率的かつ収率よく
製造することができる。
Embedded image An example of the method for producing 3,4'-dideoxydesmycosin of the present invention is shown in the following production scheme, but the method for producing 3,4'-dideoxydesmycosin of the present invention is limited to these methods. Never. In the scheme, A represents a protected carbonyl group, B represents a protected aldehyde group, prot represents a protecting group, X represents a halogen atom, R 1 independently represents a sulfonic acid residue, and R 2
Represents a lower alkanoyl group. According to the method of the following scheme, from the readily available tylosin,
4'-dideoxydesmycosin can be efficiently and efficiently produced.

【0006】[0006]

【化3】 Embedded image

【0007】[0007]

【化4】 Embedded image

【0008】[0008]

【化5】 Embedded image

【0009】[0009]

【化6】 Embedded image

【0010】[0010]

【化7】 式(IV)で示されるマイカミノシルタイロノライド誘導
体は、例えばジャーナル・オブ・アンティバイオティク
ス(35, 661, 1982)に記載された方法により、タイロシ
ンを酸無水物で処理して2′−O−アシルタイロシン(I
I)を得、さらに該化合物を保護基で適宜保護して製造す
ることができる。A又はBが表すカルボニル基又はアル
デヒド基の保護基としては当業者に自明なものはいかな
るものを使用してもよいが、例えば、ジメチルアセター
ル(ジメチルケタール)、ジエチルアセタール(ジエチ
ルケタール)、ジエチルチオアセタール(ジエチルチオ
ケタール)、エチレンアセタール(エチレンケター
ル)、プロピレンアセタール(プロピレンケタール)等
のアセタール(又はチオアセタール)又はケタール(又
はチオケタール)等を用いることができる。R2 が示す
低級アルカノイル基としては、例えば、ホルミル基、ア
セチル基、プロピオニル基、ブチリル基、イソブチリル
基、バレリル基、イソバレリル基、ピバロイル基、ヘキ
サノイル基等の炭素数1〜6の直鎖又は分岐状のアルカ
ノイル基を挙げることができる。また、水酸基の保護基
(prot)としては、当業者に自明なものならばいかなるも
のを使用してもよいが、例えばt−ブチルジメチルシリ
ル、ジメチルセキシルシリル、トリメチルシリル、トリ
エチルシリル、トリ(t−ブチル)シリル等のアルキル
シリル基、トリチル基、テトラヒドロピラニル基、テト
ラヒドロフラニル基、アリル基、アセチル基等の低級ア
ルカノイル基、ベンゾイル基、ベンジル基、メトキシメ
チル基、ベンジルオキシカルボニル基等を使用すること
ができる。
Embedded image The mycaminosyltylonolide derivative represented by the formula (IV) can be obtained by treating tylosin with an acid anhydride by treating the tylosin with an acid anhydride, for example, by the method described in Journal of Antibiotics (35, 661, 1982). O-acyltyrosine (I
The compound (I) can be obtained, and the compound can be protected by a suitable protecting group. As the protecting group for the carbonyl group or aldehyde group represented by A or B, those which are obvious to those skilled in the art may be used. For example, dimethyl acetal (dimethyl ketal), diethyl acetal (diethyl ketal), diethyl thiol Acetal (or thioacetal) such as acetal (diethylthioketal), ethylene acetal (ethylene ketal), and propylene acetal (propylene ketal), or ketal (or thioketal) can be used. Examples of the lower alkanoyl group represented by R 2 include a straight-chain or branched group having 1 to 6 carbon atoms such as a formyl group, an acetyl group, a propionyl group, a butyryl group, an isobutyryl group, a valeryl group, an isovaleryl group, a pivaloyl group, and a hexanoyl group. Alkanoyl groups. In addition, protecting groups for hydroxyl groups
As the (prot), any one which is obvious to those skilled in the art may be used. For example, t-butyldimethylsilyl, dimethylsexylsilyl, trimethylsilyl, triethylsilyl, tri (t-butyl) silyl and the like can be used. Alkylsilyl, trityl, tetrahydropyranyl, tetrahydrofuranyl, lower alkanoyl such as allyl, acetyl, benzoyl, benzyl, methoxymethyl, benzyloxycarbonyl and the like can be used.

【0011】式(IV)で示される上記のマイカミノシル
タイロノライド誘導体を、例えば置換スルホン酸又はそ
の反応性誘導体等のスルホニル化剤と反応させることに
より、3位及び4′位の水酸基がスルホニル化された式
(V) の化合物を得ることができる。置換スルホン酸とし
ては、ベンジルスルホン酸や、ベンゼン環に1〜3個の
メチル基、エチル基等の置換基を有するベンジルスルホ
ン酸等を好適に使用することができる。また、置換スル
ホン酸の反応性誘導体としては、塩化物、臭化物等のハ
ロゲン化物や酸無水物を使用すればよい。例えばベンジ
ルスルホニルクロライドを用いて反応させると、効率的
に3位及び4′位をスルホニル化することができる。ス
ルホニル化反応は、通常−40℃〜+50℃の温度下に
有機溶媒中で行えばよく、溶媒として、例えばアセトニ
トリル、アセトン、ジメチルスルホキシド、ジオキサ
ン、トルエン、酢酸エチル等を使用すればよい。ピリジ
ン、4−ジメチルアミノピリジン、トリエチルアミン等
を塩基性触媒及び/又は溶媒としても使用してもよい。
By reacting the above-mentioned mycaminosyltylonolide derivative represented by the formula (IV) with a sulfonylating agent such as a substituted sulfonic acid or a reactive derivative thereof, the hydroxyl groups at the 3-position and the 4'-position are converted. Sulfonylated formula
Compound (V) can be obtained. As the substituted sulfonic acid, benzyl sulfonic acid, benzyl sulfonic acid having 1 to 3 substituents such as methyl group and ethyl group on a benzene ring, and the like can be preferably used. As the reactive derivative of the substituted sulfonic acid, a halide such as chloride or bromide or an acid anhydride may be used. For example, when the reaction is carried out using benzylsulfonyl chloride, the 3- and 4'-positions can be efficiently sulfonylated. The sulfonylation reaction may be usually performed in an organic solvent at a temperature of −40 ° C. to + 50 ° C. As the solvent, for example, acetonitrile, acetone, dimethyl sulfoxide, dioxane, toluene, ethyl acetate and the like may be used. Pyridine, 4-dimethylaminopyridine, triethylamine and the like may be used as the basic catalyst and / or solvent.

【0012】R1 が表すスルホン酸残基としては、例え
ば、メシル基、エタンスルホニル基、プロピルスルホニ
ル基、イソプロピルスルホニル基、ベンゼンスルホニル
基、トシル基、ベンジルスルホニル基等を挙げることが
でき、さらに具体的には、-OR1が-OSO2R3 で示される場
合、R3 は、例えば低級アルキル基、トリフルオロメチ
ル基、2−オキソ−10−ボルナニイル基、置換又は未置
換のアリル基、若しくは置換又は未置換のアラルキル基
を表す。低級アルキル基としては、例えばメチル基、エ
チル基、プロピル基、イソプロピル基、ブチル基、イソ
ブチル基、tert−ブチル基、ペンチル基、1−メチルブ
チル基、2−メチルブチル基、ネオペンチル基などを挙
げることができる。置換または未置換のアリル基として
は、フェニル基、p-メトキシフェニル基、p-ニトロフェ
ニル基、p-フルオロフェニル基、p,o-ジフルオロフェニ
ル基、p-クロロフェニル基、m-クロロフェニル基、o-ク
ロロフェニル基、o,p-ジクロロフェニル基、p-ブロモフ
ェニル基、p-メチルフェニル基、m-メチルフェニル基、
o,p-ジメチルフェニル基、m,p-ジメチルフェニル基、ナ
フチル基等を挙げることができる。置換または未置換の
アラルキル基としては、ベンジル基、p-ニトロベンジル
基、o,p-ジニトロベンジル基、p-クロロベンジル基、m-
クロロベンジル基、p-メチルベンジル基、m-メチルベン
ジル基、o-メチルベンジル基、o,p-ジメチルベンジル
基、p-メトキシベンジル基、p-フルオロベンジル基を挙
げることができる。
The sulfonic acid residue represented by R 1 includes, for example, mesyl, ethanesulfonyl, propylsulfonyl, isopropylsulfonyl, benzenesulfonyl, tosyl, benzylsulfonyl and the like. Specifically, when -OR 1 is represented by -OSO 2 R 3 , R 3 is, for example, a lower alkyl group, a trifluoromethyl group, a 2-oxo-10-bornanyl group, a substituted or unsubstituted allyl group, or Represents a substituted or unsubstituted aralkyl group. Examples of the lower alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a pentyl group, a 1-methylbutyl group, a 2-methylbutyl group, and a neopentyl group. it can. Examples of the substituted or unsubstituted allyl group include a phenyl group, p-methoxyphenyl group, p-nitrophenyl group, p-fluorophenyl group, p, o-difluorophenyl group, p-chlorophenyl group, m-chlorophenyl group, o -Chlorophenyl group, o, p-dichlorophenyl group, p-bromophenyl group, p-methylphenyl group, m-methylphenyl group,
An o, p-dimethylphenyl group, an m, p-dimethylphenyl group, a naphthyl group and the like can be mentioned. As a substituted or unsubstituted aralkyl group, benzyl group, p-nitrobenzyl group, o, p-dinitrobenzyl group, p-chlorobenzyl group, m-
Examples thereof include a chlorobenzyl group, a p-methylbenzyl group, an m-methylbenzyl group, an o-methylbenzyl group, an o, p-dimethylbenzyl group, a p-methoxybenzyl group, and a p-fluorobenzyl group.

【0013】上記式(V) の化合物を、例えばアセトン、
2−ブタノン、ジメチルホルムアミド等の不活性溶媒
中、ヨウ化ナトリウム、ヨウ化カリウム、臭化リチウ
ム、テトラブチルアンモニウムブロマイド、テトラブチ
ルアンモニウムクロライド等のハロゲン化剤と反応させ
ることにより、選択的に4′位がハロゲン化された式(V
I)で示される化合物を得ることができる。Xが示すハロ
ゲン原子としては、例えば、塩素原子、臭素原子、ヨウ
素原子等のいずれでもよい。通常、ハロゲン化反応は前
記スルホニル残基の種類により−30〜 100℃で行えばよ
い。ハロゲン化の条件によっては、2,3位又は3,4
位が二重結合になった化合物が一部生成する場合がある
が、これらの化合物を次工程の原料化合物として用いて
もよい。
The compound of the above formula (V) is, for example, acetone,
By reacting with an halogenating agent such as sodium iodide, potassium iodide, lithium bromide, tetrabutylammonium bromide or tetrabutylammonium chloride in an inert solvent such as 2-butanone or dimethylformamide, 4 'is selectively formed. Halogenated formula (V
The compound represented by I) can be obtained. The halogen atom represented by X may be, for example, any of a chlorine atom, a bromine atom and an iodine atom. Usually, the halogenation reaction may be performed at -30 to 100 ° C depending on the type of the sulfonyl residue. Depending on the halogenation conditions, the 2,3 position or 3,4 position
Some compounds having a double bond at the position may be formed, but these compounds may be used as a starting compound in the next step.

【0014】上記式(VI)で示される化合物をアルカリ条
件下で還元することにより、3位及び4′位を同時に水
素置換して、式(VII) で示される3,4′−ジデオキシ
デスマイコシン誘導体を製造するこができる。該反応
は、例えば、反応に不活性な溶媒中で、触媒存在下に式
(VI)で示される化合物を接触還元することにより行われ
る。アルカリ条件を形成するために用いる塩基として
は、水酸化ナトリウム、炭酸ナトリウム、炭酸水素ナト
リウム、炭酸カリウム、炭酸水素カリウム等、好ましく
は炭酸カリウムを用いることができる。これらの塩基
は、通常、基質となる式(VI)で示される化合物に対して
2〜5モルの割合で使用される。接触還元に使用する触
媒としては、白金、パラジウム、ラネーニッケル等、好
ましくはラネーニッケルを挙げることができる。触媒の
使用量は触媒の種類により異なるが、一般に、基質とな
る式(VI)で示される化合物に対して1/10〜1の割合で使
用すればよい。不活性溶媒としては、メタノール、エタ
ノール、テトラヒドロフラン等の溶媒を挙げることがで
きる。接触還元を行うにあたり、水素の添加圧を、常圧
〜5Kg/cm2、反応温度を、例えば冷却下〜室温、好まし
くは−10〜30℃として反応を行えばよい。これらの条件
は原料化合物や触媒の種類により異なるが、当業者によ
り適宜選択されるものである。
By reducing the compound of the above formula (VI) under alkaline conditions, the 3-position and the 4'-position are simultaneously hydrogen-substituted to give the 3,4'-dideoxydesmycoside of the formula (VII). Syn derivatives can be produced. The reaction is carried out, for example, in a solvent inert to the reaction in the presence of a catalyst in the presence of a catalyst.
It is carried out by catalytically reducing the compound represented by (VI). As the base used for forming the alkaline conditions, sodium hydroxide, sodium carbonate, sodium hydrogen carbonate, potassium carbonate, potassium hydrogen carbonate and the like, preferably potassium carbonate can be used. These bases are generally used in a proportion of 2 to 5 mol based on the compound represented by the formula (VI) as a substrate. Examples of the catalyst used for the catalytic reduction include platinum, palladium, Raney nickel and the like, preferably Raney nickel. The amount of the catalyst to be used varies depending on the type of the catalyst, but generally, it may be used at a ratio of 1/10 to 1 with respect to the compound represented by the formula (VI) as a substrate. Examples of the inert solvent include solvents such as methanol, ethanol, and tetrahydrofuran. In carrying out the catalytic reduction, the reaction may be carried out at a hydrogen addition pressure of normal pressure to 5 kg / cm 2 and a reaction temperature of, for example, under cooling to room temperature, preferably -10 to 30 ° C. These conditions vary depending on the type of the starting compound and the catalyst, but are appropriately selected by those skilled in the art.

【0015】上記の工程により、式(VI)で示される化合
物の3位及び4′位を同時に水素置換することができ、
これにより、式(VI)の化合物から一段階かつ高収率(ほ
ぼ80%程度)で、式(VII) で示される3,4′−ジデ
オキシデスマイコシン誘導体を得ることができる。この
ようにして得られた式(VII) の化合物は、常法に従って
保護基を除去することにより、本発明の3,4′−ジデ
オキシデスマイコシン又はその塩に変換することができ
る。保護基の除去は、通常、水の存在下に塩酸、硫酸等
の鉱酸で処理するか、酢酸、トリフルオロ酢酸、トリク
ロル酢酸等の有機酸で処理することにより行えばよい
が、場合によってはジオキサン、ジメチルホルムアミ
ド、ジメチルスルホキシド、アセトニトリル等の溶媒中
でp−トルエンスルホン酸等のアリールスルホン酸、メ
タンスルホン酸等のアルキルスルホン酸等を用いて、室
温〜加熱下で処理することによっても行うことができ
る。
According to the above process, the 3-position and the 4'-position of the compound represented by the formula (VI) can be simultaneously hydrogen-substituted,
Thus, the 3,4'-dideoxydesmycosin derivative represented by the formula (VII) can be obtained from the compound of the formula (VI) in one step and in a high yield (about 80%). The compound of formula (VII) thus obtained can be converted to 3,4'-dideoxydesmycosin of the present invention or a salt thereof by removing the protecting group according to a conventional method. The removal of the protecting group may be usually performed by treating with a mineral acid such as hydrochloric acid or sulfuric acid in the presence of water, or by treating with an organic acid such as acetic acid, trifluoroacetic acid, or trichloroacetic acid. It is also carried out by using an arylsulfonic acid such as p-toluenesulfonic acid, an alkylsulfonic acid such as methanesulfonic acid, or the like in a solvent such as dioxane, dimethylformamide, dimethylsulfoxide, or acetonitrile, and treating at room temperature to under heating. Can be.

【0016】本発明の方法を用いて得ることができる
3,4′−ジデオキシデスマイコシンは、グラム陽性及
び陰性に属する広範囲の微生物に対して抗菌活性を示す
物質であり、特にエリスロマイシンやジョサマイシンに
耐性のマクロライド耐性菌に対しても優れた抗菌活性を
有するので、抗菌剤として有用である。本発明の3,
4′−ジデオキシデスマイコシンの各種細菌に対する最
小発育素子濃度(MIC) を日本化学療法学会標準法に従っ
て測定した結果を、以下の表1に示す。
[0016] 3,4'-Dideoxydesmycosin obtained by the method of the present invention is a substance having an antibacterial activity against a wide range of microorganisms belonging to Gram-positive and -negative, and particularly, erythromycin and josamycin. It has excellent antibacterial activity against resistant macrolide-resistant bacteria, and is therefore useful as an antibacterial agent. 3 of the present invention
Table 1 below shows the results obtained by measuring the minimum growth element concentration (MIC) of 4'-dideoxydesmycosin against various bacteria according to the standard method of the Japan Society for Chemotherapy.

【0017】[0017]

【表1】 試験菌 A EM JM ─────────────────────────────────── バチルス・ズブチリス 0.05 0.05 0.20 Bacillus subtilis ATCC6633 ミクロコッカス・ルテウス < 0.006 < 0.006 0.012 Micrococcus luteus ATCC9341 スタフィロコッカス・アウレウス 0.024 0.024 0.05 Staphylococcus aureus 209P スタフィロコッカス・アウレウス 0.20 0.10 1.56 Staphylococcus aureus Smith スタフィロコッカス・エピデルミディス 0.05 0.05 0.39 Staphylococcus epidermidis ATCC12228 スタフィロコッカス・アウレウス 0.10 100 0.78 Staphylococcus aureus MS8710* スタフィロコッカス・アウレウス 0.05 > 100 0.20 Staphylococcus aureus MS11593 * スタフィロコッカス・アウレウス 0.05 > 100 > 100 Staphylococcus aureus MS11598 * スタフィロコッカス・アウレウス 0.39 > 100 100 Staphylococcus aureus MS11612 * スタフィロコッカス・アウレウス 0.78 > 100 > 100 Staphylococcus aureus KS24 * ─────────────────────────────────── A :3,4′−ジデオキシデスマイコシン; EM:エリスロマイシン; JM:ジョサマイシン *印の試験菌はマクロライド系抗生物質耐性臨床分離株
を示す。 本発明の3,4′−ジデオキシデスマイコシンは、好ま
しくは、有効成分として医薬用組成物に配合され、感染
症の治療剤として患者に投与される。本発明の3,4′
−ジデオキシデスマイコシンを有効成分として含む医薬
組成物は、通常、カプセル剤、錠剤、細粒剤、顆粒剤、
散剤、シロップ剤等の経口投与剤、あるいは注射剤、坐
剤、点眼剤、眼軟膏、点耳剤又は外皮用剤として調製さ
れる。これらの医薬用組成物は常法により製造でき、必
要により崩壊剤、結合剤、滑沢剤、コーティング剤、基
剤、溶解補助剤、等張化剤、安定化剤、pH調節剤等の薬
理学的、製剤学的に許容しうる周知の添加物を加えても
よい。本発明の3,4′−ジデオキシデスマイコシンの
投与量は、投与経路や感染起因菌の種類等により種々変
化させてもよいが、一般に成人の患者に一日当たり50
〜1000mg程度で1回又は数回に分けて投与すればよ
い。
[Table 1] Test bacteria A EM JM ─────────────────────────────────── Bacillus subtilis 0.05 0.05 0.20 Bacillus subtilis ATCC6633 Micrococcus luteus <0.006 <0.006 0.012 Micrococcus luteus ATCC9341 Staphylococcus aureus 0.024 0.024 0.05 Staphylococcus aureus 209P Staphylococcus aureus 0.20 0.10 1.56 Staphylococcus aureus Smith staphylocicus Staphylococcus aureus 0.10 100 0.78 Staphylococcus aureus MS8710 * Staphylococcus aureus 0.05> 100 0.20 Staphylococcus aureus MS11593 * Staphylococcus aureus 0.05>100> 100 Staphylococcus aureus MS11598 * Staphylococcus aureus 0.39> 100 100 Staphylococcus aureus MS11612 * Staphylococca Aureus 0.78>100> 100 Staphylococcus aureus KS24 * ─────────────────────────────────── A: 3, 4'-dideoxydesmycosin; EM: erythromycin; JM: josamycin * Test bacteria indicated by * are macrolide antibiotic resistant clinical isolates. The 3,4'-dideoxydesmycosin of the present invention is preferably incorporated into a pharmaceutical composition as an active ingredient and administered to a patient as a therapeutic agent for infectious diseases. 3, 4 'of the present invention
-Pharmaceutical compositions containing dideoxydesmycosin as an active ingredient are usually capsules, tablets, fine granules, granules,
It is prepared as an oral preparation such as a powder, a syrup, or an injection, a suppository, an eye drop, an eye ointment, an ear drop, or a skin. These pharmaceutical compositions can be manufactured by a conventional method, and if necessary, medicines such as disintegrants, binders, lubricants, coating agents, bases, solubilizing agents, tonicity agents, stabilizers, pH regulators, etc. Well-known additives that are physically and pharmaceutically acceptable may be added. The dose of the 3,4'-dideoxydesmycosin of the present invention may be variously changed depending on the administration route, the type of the bacterium causing the infection, and the like.
It may be administered once or several times at about 1000 mg.

【0018】[0018]

【実施例】以下、本発明を実施例によりさらに具体的に
説明するが、本発明はこれらの実施例に限定されること
はない。 2′−O−アセチルデスマイコシン 9,20−ビス
(エチレンアセタール)の製造
EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples. Production of 2'-O-acetyldesmycosin 9,20-bis (ethylene acetal)

【0019】[0019]

【化8】 2′−O−アセチルタイロシン23.7gをトルエン10
0mlに懸濁、続いてオルト蟻酸エチル12.36g(83.
5mmol)、エチレングリコール12.95g(208.8mm
ol)及びカンファースルホン酸6.30g(27.1mmol)
を加えると均一溶液になった。この溶液を50℃で2時
間攪拌後、反応液を5%重曹水100ml、水100ml、
10%食塩水で洗浄した。有機層は無水硫酸ナトリウム
で乾燥後減圧乾固すると、トルエン/アセトン(1/
1)展開のシリカゲルTLCにてRf値0.49に硫酸呈色
陽性の表題化合物が20.20g得られた。
Embedded image 23.7 g of 2'-O-acetyltylosin was added to toluene 10
0 ml, followed by 12.36 g of ethyl orthoformate (83.
5 mmol), 12.95 g (208.8 mm) of ethylene glycol
ol) and 6.30 g (27.1 mmol) of camphorsulfonic acid
Was added to give a homogeneous solution. After stirring this solution at 50 ° C. for 2 hours, the reaction mixture was mixed with 100 ml of 5% aqueous sodium bicarbonate, 100 ml of water,
Washed with 10% saline. The organic layer was dried over anhydrous sodium sulfate and then dried under reduced pressure to obtain toluene / acetone (1/1).
1) 20.20 g of the title compound positive for sulfuric acid coloring with an Rf value of 0.49 was obtained by silica gel TLC developed.

【0020】UV(MeOH)λmax;235nm IR(KBr) νmax;3470,2975,2938,2882,1746,1236,1169,1
084,961 cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.78(3H,bs,H-18), 0.93(3H,t,J=7.3Hz,H-17),1.01
(3H,d,J=6.6Hz,H-21), 1.26(3H,d,J=6.2Hz,H-6″),1.32
(3H,d,J=6.2Hz, H-6′), 1.70(3H,s,H-22),2.01(3H,s,O
COCH3-2′), 2.39[6H,s,N(CH3)2-3′],3.05(1H,t,J=9.5
Hz, H-4′), 3.18(1H,bd,J=7.0Hz, H-4″),3.49(3H,s,O
CH3-2″),3.62(3H,s,OCH3-3″),4.55(1H,d,J=8.1Hz,H-1
″),4.64(1H,br,H-1′), 4.96(1H,m,H-20), 4.96(1H,
m,H-15),5.03(1H,dd,J=10.6&7.7Hz, H-2′), 5.42(1H,
d,J=10.6Hz,H-13),5.64(1H,d,J=15.8Hz,H-10), 6.37(1
H,d,J=15.8Hz,H-11) FAB-MS;902(M+H)+ 2′−O−アセチル−4″−O−トリメチルシリルデス
マイコシン 9,20−ビス(エチレンアセタール)の
製造
UV (MeOH) λmax; 235 nm IR (KBr) νmax; 3470, 2975, 2938, 2882, 1746, 1236, 1169, 1
084,961 cm -1 NMR (CDCl 3 ); representing only the main peak δ; 0.78 (3H, bs, H-18), 0.93 (3H, t, J = 7.3 Hz, H-17), 1.01
(3H, d, J = 6.6Hz, H-21), 1.26 (3H, d, J = 6.2Hz, H-6 ″), 1.32
(3H, d, J = 6.2Hz, H-6 '), 1.70 (3H, s, H-22), 2.01 (3H, s, O
COCH 3 -2 '), 2.39 [6H, s, N (CH 3 ) 2 -3'], 3.05 (1H, t, J = 9.5
Hz, H-4 '), 3.18 (1H, bd, J = 7.0Hz, H-4''), 3.49 (3H, s, O
CH 3 -2 ″), 3.62 (3H, s, OCH 3 -3 ″), 4.55 (1H, d, J = 8.1Hz, H-1
″), 4.64 (1H, br, H-1 ′), 4.96 (1H, m, H-20), 4.96 (1H,
m, H-15), 5.03 (1H, dd, J = 10.6 & 7.7Hz, H-2 '), 5.42 (1H,
d, J = 10.6Hz, H-13), 5.64 (1H, d, J = 15.8Hz, H-10), 6.37 (1
H, d, J = 15.8Hz, H-11) FAB-MS; Production of 902 (M + H) + 2'-O-acetyl-4 "-O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal)

【0021】[0021]

【化9】 2′−O−アセチルデスマイコシン 9,20−ビス
(エチレンアセタール)18.9g(20.9mmol)をトル
エン94mlに溶解後ピリジン2.52ml(31.2mmol)を
加え、−5℃に冷却した。この溶液に塩化トリメチルシ
ラン3.42ml(27mmol)を滴下し、同温度で80分間
反応させた。反応液を5%重曹水150ml、10%食塩
水150mlで洗浄後無水硫酸ナトリウムで乾燥した。有
機層を減圧濃縮すると、トルエン/アセトン(1/1)
展開のシリカゲルTLCにてRf値0.57に硫酸呈色陽性
の表題化合物が20.64g得られた。
Embedded image 18.9 g (20.9 mmol) of 2'-O-acetyldesmycosin 9,20-bis (ethylene acetal) was dissolved in 94 ml of toluene, 2.52 ml (31.2 mmol) of pyridine was added, and the mixture was cooled to -5 ° C. . To this solution, 3.42 ml (27 mmol) of trimethylsilane chloride was added dropwise, and reacted at the same temperature for 80 minutes. The reaction solution was washed with 150 ml of 5% aqueous sodium bicarbonate solution and 150 ml of 10% saline solution and dried over anhydrous sodium sulfate. When the organic layer is concentrated under reduced pressure, toluene / acetone (1/1)
20.64 g of the title compound having a sulfuric acid coloration positive at an Rf value of 0.57 was obtained by silica gel TLC using an eluant.

【0022】UV(MeOH)λmax;235nm IR(KBr) νmax;3520,2973,2884,1748,1713,1373,1236,1
171,1100,966,882,841cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.17[9H,s,Si(CH3)3], 0.77(3H,bs,H-18), 0.91(3H,
t,J=7.3Hz,H-17),1.01(3H,d,J=6.6Hz,H-21), 1.18(3H,
d,J=6.2Hz,H-6″),1.32(3H,d,J=5.9Hz, H-6′), 1.69(3
H,d,J=0.7Hz,H-22),2.01(3H,s,OCOCH3-2′), 2.38[6H,
s,N(CH3)2-3′],2.59(1H,t,J=10.3Hz, H-3 ′), 3.05(1
H,t,J=9.9Hz, H-4 ′),3.28(1H,dd,J=9.2&2.6Hz,H-
4″), 3.49(3H,s,OCH3-2″),3.60(3H,s,OCH3-3″), 4.
59(1H,d,J=7.7Hz,H-1″),4.64(1H,br,H-1′), 4.95(1H,
m,H-20), 4.96(1H,m,H-15),5.03(1H,dd,J=10.6&7.7Hz,
H-2′), 5.42(1H,d,J=10.6Hz,H-13),5.62(1H,d,J=15.8H
z,H-10), 6.36(1H,d,J=15.8Hz,H-11) FAB-MS;974(M+H)+ 2′−O−アセチル−3,4′−ジ−O−メタンスルホ
ニル−4″−O−トリメチルシリル−デスマイコシン
9,20−ビス(エチレンアセタール)の製造
UV (MeOH) λmax; 235 nm IR (KBr) νmax; 3520,2973,2884,1748,1713,1373,1236,1
171,1100,966,882,841cm -1 NMR (CDCl 3 ); representing only the main peak δ; 0.17 [9H, s, Si (CH 3 ) 3 ], 0.77 (3H, bs, H-18), 0.91 (3H,
t, J = 7.3Hz, H-17), 1.01 (3H, d, J = 6.6Hz, H-21), 1.18 (3H,
d, J = 6.2Hz, H-6 ″), 1.32 (3H, d, J = 5.9Hz, H-6 ′), 1.69 (3
H, d, J = 0.7Hz, H-22), 2.01 (3H, s, OCOCH 3 -2 '), 2.38 [6H,
s, N (CH 3 ) 2 -3 '], 2.59 (1H, t, J = 10.3Hz, H-3'), 3.05 (1
H, t, J = 9.9Hz, H-4 '), 3.28 (1H, dd, J = 9.2 & 2.6Hz, H-
4 ″), 3.49 (3H, s, OCH 3 -2 ″), 3.60 (3H, s, OCH 3 -3 ″), 4.
59 (1H, d, J = 7.7Hz, H-1 ″), 4.64 (1H, br, H-1 ′), 4.95 (1H,
m, H-20), 4.96 (1H, m, H-15), 5.03 (1H, dd, J = 10.6 & 7.7Hz,
H-2 '), 5.42 (1H, d, J = 10.6Hz, H-13), 5.62 (1H, d, J = 15.8H
z, H-10), 6.36 (1H, d, J = 15.8Hz, H-11) FAB-MS; 974 (M + H) + 2'-O-acetyl-3,4'-di-O-methanesulfonyl- 4 "-O-trimethylsilyl-desmycosin
Production of 9,20-bis (ethylene acetal)

【0023】[0023]

【化10】 2′−O−アセチル−4″−O−トリメチルシリルデス
マイコシン 9,20−ビス(エチレンアセタール)1
0.07g(10.3mmol)をトルエン50mlに溶解後トリ
エチルアミン7.20ml(51.7mmol)を加え−15℃に
冷却した。この溶液にメタンスルホニルクロリド2.8ml
(36.2mmol)を加え、−10℃にて1時間反応させ
た。反応液にトルエン40mlを加え、有機層を水80m
l、5%重曹水40ml、10%食塩水40mlで洗浄後無
水硫酸ナトリウムにて乾燥した。有機層を減圧乾固する
と、トルエン/アセトン(3/1)展開のシリカゲルT
LCにてRf値0.55に硫酸呈色陽性の表題化合物が12.
94g得られた。この化合物は不安定なため即座に次の
反応に供した。
Embedded image 2'-O-acetyl-4 "-O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal) 1
After dissolving 0.07 g (10.3 mmol) in 50 ml of toluene, 7.20 ml (51.7 mmol) of triethylamine was added and the mixture was cooled to -15 ° C. 2.8 ml of methanesulfonyl chloride was added to this solution.
(36.2 mmol) was added and reacted at -10 ° C for 1 hour. 40 ml of toluene was added to the reaction solution, and the organic layer was washed with 80 m of water.
After washing with 40 ml of 5% aqueous sodium bicarbonate and 40 ml of 10% saline, the mixture was dried over anhydrous sodium sulfate. The organic layer was dried under reduced pressure to obtain silica gel T developed with toluene / acetone (3/1).
The title compound positive for sulfuric acid coloring with an Rf value of 0.55 was determined by LC.
94 g were obtained. Since this compound was unstable, it was immediately subjected to the next reaction.

【0024】NMR(CDCl3); 主要ピークのみを表す δ;0.16[9H,s,Si(CH3)3], 0.88(3H,d,J=7.3Hz,H-18),0.
92(3H,t,J=7.3Hz,H-17), 1.02(3H,d,J=6.6Hz,H-21),1.1
8(3H,d,J=6.2Hz, H-6″), 1.35(3H,d,J=5.9Hz,H-6′),
1.69(3H,d,J=0.7Hz, H-22), 2.04(3H,s,OCOCH3-2′),2.
39[6H,s,N(CH3)2-3 ′],2.93(1H,t,J=10.3Hz,H-3′),3.
10(3H,s,OMs),3.14(3H,s,OMs), 3.28(1H,dd,J=9.5&2.6H
z,H-4″),3.47(3H,s,OCH3-2″),3.59(3H,s,OCH3-3″),
4.22(1H,t,J=9.9Hz,H-4′),4.57(1H,d,J=7.7Hz,H-1
″), 4.60(1H,br,H-1 ′), 4.75(1H,br,H-3),4.93(1H,
m,H-15), 4.96(1H,m,H-20), 5.03(1H,dd,J=10.3&8.0Hz,
H-2 ′),5.47(1H,d,J=11.0Hz,H-13), 5.54(1H,d,J=15.8
Hz,H-10),6.34(1H,d,J=15.8Hz,H-11) FAB-MS; 1130(M+H)+ 2′−O−アセチル−4′−デオキシ−4′−ヨード−
3−O−メタンスルホニル−4″−O−トリメチルシリ
ルデスマイコシン 9,20−ビス(エチレンアセター
ル)の製造
NMR (CDCl 3 ); representing only the main peak δ; 0.16 [9H, s, Si (CH 3 ) 3 ], 0.88 (3H, d, J = 7.3 Hz, H-18), 0.
92 (3H, t, J = 7.3Hz, H-17), 1.02 (3H, d, J = 6.6Hz, H-21), 1.1
8 (3H, d, J = 6.2Hz, H-6 ″), 1.35 (3H, d, J = 5.9Hz, H-6 ′),
1.69 (3H, d, J = 0.7Hz, H-22), 2.04 (3H, s, OCOCH 3 -2 '), 2.
39 [6H, s, N ( CH 3) 2 -3 '], 2.93 (1H, t, J = 10.3Hz, H-3'), 3.
10 (3H, s, OMs), 3.14 (3H, s, OMs), 3.28 (1H, dd, J = 9.5 & 2.6H
z, H-4 ″), 3.47 (3H, s, OCH 3 -2 ″), 3.59 (3H, s, OCH 3 -3 ″),
4.22 (1H, t, J = 9.9Hz, H-4 '), 4.57 (1H, d, J = 7.7Hz, H-1
″), 4.60 (1H, br, H-1 ′), 4.75 (1H, br, H-3), 4.93 (1H,
m, H-15), 4.96 (1H, m, H-20), 5.03 (1H, dd, J = 10.3 & 8.0Hz,
H-2 '), 5.47 (1H, d, J = 11.0Hz, H-13), 5.54 (1H, d, J = 15.8
Hz, H-10), 6.34 (1H, d, J = 15.8 Hz, H-11) FAB-MS; 1130 (M + H) + 2'-O-acetyl-4'-deoxy-4'-iodo-
Production of 3-O-methanesulfonyl-4 "-O-trimethylsilyldesmycosin 9,20-bis (ethylene acetal)

【0025】[0025]

【化11】 2′−O−アセチル−3,4 ′−ジ−O−メタンスルホ
ニル−4″−O−トリメチルシリルデスマイコシン
9,20−ビス(エチレンアセタール)12.94g(1
1.5mmol)をメチルエチルケトン60mlに溶解し、ヨウ
化ナトリウム2.58g(17.2mmol)を加えて暗所で8
5℃、1時間反応させた。反応液を室温に冷却後析出物
を濾別し、沈殿物をトルエン5mlで洗浄した。洗浄液と
母液とを合わせ減圧濃縮後トルエン60ml及び水60ml
を加えて分液した。有機層を10%チオ硫酸ナトリウム
40ml、水40mlで洗浄後、無水硫酸ナトリウムで乾
燥、減圧濃縮乾固すると、トルエン/アセトン(4/
1)展開のシリカゲルTLCにてRf値0.51に硫酸呈色
陽性の表題化合物が10.73g得られた。
Embedded image 2'-O-acetyl-3,4'-di-O-methanesulfonyl-4 "-O-trimethylsilyldesmycosin
12.20 g of 9,20-bis (ethylene acetal) (1
1.5 mmol) was dissolved in 60 ml of methyl ethyl ketone, and 2.58 g (17.2 mmol) of sodium iodide was added thereto.
The reaction was performed at 5 ° C. for 1 hour. After cooling the reaction solution to room temperature, the precipitate was separated by filtration and the precipitate was washed with 5 ml of toluene. The washing solution and the mother liquor are combined, concentrated under reduced pressure, and toluene 60 ml and water 60 ml.
Was added and liquid separation was performed. The organic layer was washed with 10% sodium thiosulfate (40 ml) and water (40 ml), dried over anhydrous sodium sulfate and concentrated to dryness under reduced pressure.
1) By silica gel TLC developed, 10.73 g of the title compound positive for sulfuric acid coloring with an Rf value of 0.51 was obtained.

【0026】UV(MeOH)λmax;235nm IR(KBr) νmax;3443,2973,2940,2886,1746,1360,1233,1
173,1101,1049,966,909,882,843 cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.16[9H,s,Si(CH3)3], 0.89(3H,d,J=7.3Hz,H-18),0.
92(3H,t,J=7.3Hz,H-17), 1.02(3H,d,J=7.0Hz,H-21),1.1
8(3H,d,J=6.2Hz,H-6 ″), 1.51(3H,d,J=5.9Hz, H-6
′),1.69(3H,d,J=0.7Hz,H-22), 2.02(3H,s,OCOCH3-2
′),2.42[6H,s,N(CH3)2-3 ′], 3.12(3H,s,OMs-3), 3.
47(3H,s,OCH3-2 ″),3.59(3H,s,OCH3-3″), 4.57(1H,d,
J=8.1Hz,H-1″),4.57(1H,br,H-1′),4.77(1H,br,H-3),
4.91(1H,dd,J=9.9&7.3Hz, H-2′), 4.93(1H,m,H-15),4.
98(1H,br,H-20), 5.47(1H,d,J=10.6Hz,H-13),5.54(1H,
d,J=15.8Hz,H-10), 6.34(1H,d,J=15.8Hz,H-11) FAB-MS; 1162(M+H)+ 2′−O−アセチル−3,4′−ジデオキシデスマイコ
シン 9,20−ビス(エチレンアセタール)の製造
UV (MeOH) λmax; 235 nm IR (KBr) νmax; 3443,2973,2940,2886,1746,1360,1233,1
173,1101,1049,966,909,882,843 cm -1 NMR (CDCl 3 ); representing only the main peak δ; 0.16 [9H, s, Si (CH 3 ) 3 ], 0.89 (3H, d, J = 7.3 Hz, H- 18), 0.
92 (3H, t, J = 7.3Hz, H-17), 1.02 (3H, d, J = 7.0Hz, H-21), 1.1
8 (3H, d, J = 6.2Hz, H-6 ″), 1.51 (3H, d, J = 5.9Hz, H-6
'), 1.69 (3H, d, J = 0.7Hz, H-22), 2.02 (3H, s, OCOCH 3 -2
'), 2.42 [6H, s , N (CH 3) 2 -3'], 3.12 (3H, s, OMs-3), 3.
47 (3H, s, OCH 3 -2 ″), 3.59 (3H, s, OCH 3 -3 ″), 4.57 (1H, d,
J = 8.1Hz, H-1 ″), 4.57 (1H, br, H-1 ′), 4.77 (1H, br, H-3),
4.91 (1H, dd, J = 9.9 & 7.3Hz, H-2 '), 4.93 (1H, m, H-15), 4.
98 (1H, br, H-20), 5.47 (1H, d, J = 10.6Hz, H-13), 5.54 (1H,
d, J = 15.8Hz, H-10), 6.34 (1H, d, J = 15.8Hz, H-11) FAB-MS; 1162 (M + H) + 2'-O-acetyl-3,4'-dideoxydes Production of mycosin 9,20-bis (ethylene acetal)

【0027】[0027]

【化12】 2′−O−アセチル−4′−デオキシ−4′−ヨード−
3−O−メタンスルホニル−4″−O−トリメチルシリ
ルデスマイコシン 9,20−ビス(エチレンアセター
ル)10.70g(9.2mmol)をメタノール50mlに溶解
し、炭酸カリウム3.82g(27.6mmol)、続いてラネ
ーニッケル(川研ファインケミカル株NDT−65)湿
重量6.4g(5ml)のメタノール8ml懸濁液を加え、水
素圧3Kg/cm2 にて2時間接触還元を行なった。触媒を
セライトにて濾別後母液を減圧濃縮した。残査に酢酸エ
チル100ml、水100mlを加え、分液した。有機層は
20%食塩水100mlで洗浄後減圧濃縮した。濃縮液に
無水酢酸0.86mlを加え室温で1.5時間反応させた後5
%重曹水30ml、20%食塩水30mlで洗浄した。有機
層は無水硫酸ナトリウムで乾燥後減圧乾固すると、クロ
ロホルム/メタノール(10/1)展開のシリカゲルT
LCにてRf値0.44に硫酸呈色陽性の表題化合物が7.4
6gが得られた。
Embedded image 2'-O-acetyl-4'-deoxy-4'-iodo-
3-O-methanesulfonyl-4 ″ -O-trimethylsilyldesmycosin 9.70 g (9.2 mmol) of 9,20-bis (ethylene acetal) was dissolved in 50 ml of methanol, and 3.82 g (27.6 mmol) of potassium carbonate was dissolved. Subsequently, a suspension of Raney nickel (Kawaken Fine Chemicals NDT-65, wet weight: 6.4 g (5 ml)) in 8 ml of methanol was added, and catalytic reduction was carried out at a hydrogen pressure of 3 kg / cm 2 for 2 hours. After filtration, the mother liquor was concentrated under reduced pressure, 100 ml of ethyl acetate and 100 ml of water were added to the residue, and the organic layer was washed with 100 ml of 20% saline and concentrated under reduced pressure. After adding 1.5 hours at room temperature,
The mixture was washed with 30 ml of a 20% aqueous sodium bicarbonate solution and 30 ml of a 20% saline solution. The organic layer was dried over anhydrous sodium sulfate and then dried under reduced pressure to obtain silica gel T developed with chloroform / methanol (10/1).
The title compound positive for sulfuric acid coloration with an Rf value of 0.44 by LC was 7.4.
6 g were obtained.

【0028】UV(MeOH)λmax;235nm IR(KBr) νmax;3476,2973,2938,2882,1744,1373,1238,1
167,1061,961cm-1 NMR(CDCl3); 主要ピークのみを表す δ;0.82(3H,bd,J=5.5Hz,H-18), 0.92(3H,t,J=7.3Hz,H-1
7),1.00(3H,d,J=6.6Hz,H-21), 1.23(3H,d,J=6.2Hz,H-
6′),1.26(3H,d,J=6.2Hz,H-6 ″), 1.35(1H,m,H-4′a),
1.71(1H,m,H-4 ′b),1.73(3H,d,J=1.1Hz,H-22), 2.04
(3H,s,OCOCH3-2 ′),2.26[6H,s,N(CH3)2-3 ′], 2.68(1
H,ddd,J=12.3&10.4&4.4Hz,H-3′),3.18(1H,br,H-4″),
3.48(3H,s,OCH3-2 ″), 3.61(3H,s,OCH3-3 ″),4.31(1
H,d,J=7.7Hz,H-1 ″), 4.55(1H,d,J=7.7Hz,H-1″),4.80
(1H,dd,J=10.4&7.7Hz,H-2 ′), 4.90(1H,m,H-15),4.95
(1H,bt,J=5.1Hz,H-20), 5.42(1H,d,J=10.6Hz,H-13),5.6
2(1H,d,J=15.8Hz,H-10), 6.36(1H,d,J=15.8Hz,H-11) FAB-MS;870(M+H)+ 3,4′−ジデオキシデスマイコシンの製造 2′−O−アセチル−3,4′−ジデオキシデスマイコ
シン 9,20−ビス(エチレンアセタール)211mg
をアセトン0.5mlに溶解後、0.1N塩酸2.5mlを加えて
50℃で4時間反応させた。クロロホルム5mlを加えて
有機層を5%重曹水3ml、10%食塩水5mlで洗浄し
た。有機層を無水硫酸ナトリウムで乾燥した後に減圧乾
固し、脱アセタール体177mgを得た。この化合物をメ
タノール1.77mlに溶解し、60℃で1.5時間反応させ
た後、室温で16時間放置した。反応液を減圧乾固した
後、残渣を少量のクロロホルムに溶解し、シリカゲル
(12g)のカラムに吸着させ、クロロホルム、クロロ
ホルム/メタノール(10/1)で溶出した。クロロホルム
/メタノール(5/1)展開のシリカゲルTLCでRf値0.
36に硫酸呈色を示す画分を集めて減圧固化し、表題化
合物70mgを得た。
UV (MeOH) λmax; 235 nm IR (KBr) νmax; 3476,2973,2938,2882,1744,1373,1238,1
167, 1061, 961 cm -1 NMR (CDCl 3 ); representing only the main peak δ; 0.82 (3H, bd, J = 5.5 Hz, H-18), 0.92 (3H, t, J = 7.3 Hz, H-1
7), 1.00 (3H, d, J = 6.6Hz, H-21), 1.23 (3H, d, J = 6.2Hz, H-
6 ′), 1.26 (3H, d, J = 6.2Hz, H-6 ″), 1.35 (1H, m, H-4′a),
1.71 (1H, m, H-4′b), 1.73 (3H, d, J = 1.1Hz, H-22), 2.04
(3H, s, OCOCH 3 -2 '), 2.26 [6H, s, N (CH 3) 2 -3'], 2.68 (1
H, ddd, J = 12.3 & 10.4 & 4.4Hz, H-3 ′), 3.18 (1H, br, H-4 ″),
3.48 (3H, s, OCH 3 -2 ″), 3.61 (3H, s, OCH 3 -3 ″), 4.31 (1
H, d, J = 7.7Hz, H-1 ″), 4.55 (1H, d, J = 7.7Hz, H-1 ″), 4.80
(1H, dd, J = 10.4 & 7.7Hz, H-2 '), 4.90 (1H, m, H-15), 4.95
(1H, bt, J = 5.1Hz, H-20), 5.42 (1H, d, J = 10.6Hz, H-13), 5.6
2 (1H, d, J = 15.8Hz, H-10), 6.36 (1H, d, J = 15.8Hz, H-11) FAB-MS; 870 (M + H) + 3,4'-dideoxydesmycosin Production 2'-O-acetyl-3,4'-dideoxydesmycosin 9,20-bis (ethylene acetal) 211 mg
Was dissolved in 0.5 ml of acetone, 2.5 ml of 0.1N hydrochloric acid was added, and the mixture was reacted at 50 ° C. for 4 hours. 5 ml of chloroform was added, and the organic layer was washed with 3 ml of 5% aqueous sodium bicarbonate and 5 ml of 10% saline. The organic layer was dried over anhydrous sodium sulfate and then dried under reduced pressure to obtain 177 mg of a deacetalized product. This compound was dissolved in 1.77 ml of methanol, reacted at 60 ° C. for 1.5 hours, and left at room temperature for 16 hours. After the reaction solution was evaporated to dryness under reduced pressure, the residue was dissolved in a small amount of chloroform, adsorbed on a silica gel (12 g) column, and eluted with chloroform and chloroform / methanol (10/1). An Rf value of 0 was determined by silica gel TLC developed with chloroform / methanol (5/1).
The fractions exhibiting sulfuric acid coloration in 36 were collected and solidified under reduced pressure to obtain 70 mg of the title compound.

【0029】UV(MeOH)λmax;283nm IR(KBr) νmax;3457,2969,2936,2880,1726,1678,1593,1
456,1381,1314,1167,1078,986cm -1 NMR(CDCl3); 主要ピークのみを表す δ;0.93(3H,t,J=7.3Hz,H-17), 1.03(3H,d,J=6.6Hz,H-1
8),1.20(3H,d,J=6.2Hz,H-6'),1.21(3H,d,J=6.6Hz,H-2
1),1.25(1H,m,H-4'a),1.26(1H,d,J=6.2Hz,H-6 ″), 1.3
0(1H,m,H-3a), 1.41(1H,m,H-3b),1.71(1H,m,H-4'b), 1.
81(3H,d,J=1.1Hz,H-22),2.32[6H,s,N(CH3)2-3 ′], 3.4
8(3H,s,OCH3-2 ″),3.61(3H,s,OCH3-3″), 4.19(1H,d,J
=7.3Hz,H-1'),4.56(1H,d,J=7.7Hz,H-1 ″), 4.91(1H,m,
H-15),5.89(1H,d,J=10.3Hz,H-13), 6.32(1H,d,J=15.2H
z,H-10),7.31(1H,d,J=15.2Hz,H-11), 9.69(1H,s,H-20) FAB-MS;740(M+H)+
UV (MeOH) λmax; 283 nm IR (KBr) νmax; 3457, 2969, 2936, 2880, 1726, 1678, 1593, 1
456,1381,1314,1167,1078,986cm -1 NMR (CDCl 3 ); representing only the main peak δ; 0.93 (3H, t, J = 7.3 Hz, H-17), 1.03 (3H, d, J = 6.6Hz, H-1
8), 1.20 (3H, d, J = 6.2Hz, H-6 '), 1.21 (3H, d, J = 6.6Hz, H-2
1), 1.25 (1H, m, H-4'a), 1.26 (1H, d, J = 6.2Hz, H-6 ″), 1.3
0 (1H, m, H-3a), 1.41 (1H, m, H-3b), 1.71 (1H, m, H-4'b), 1.
81 (3H, d, J = 1.1Hz, H-22), 2.32 [6H, s, N (CH 3) 2 -3 '], 3.4
8 (3H, s, OCH 3 -2 ″), 3.61 (3H, s, OCH 3 -3 ″), 4.19 (1H, d, J
= 7.3Hz, H-1 '), 4.56 (1H, d, J = 7.7Hz, H-1''), 4.91 (1H, m,
H-15), 5.89 (1H, d, J = 10.3Hz, H-13), 6.32 (1H, d, J = 15.2H
z, H-10), 7.31 (1H, d, J = 15.2Hz, H-11), 9.69 (1H, s, H-20) FAB-MS; 740 (M + H) +

【0030】[0030]

【発明の効果】本発明によれば、抗菌剤として有用な
3,4′−ジデオキデスマイコシンが提供される。該化
合物は、エリスロマイシンやジョサマイシン等に耐性の
マクロライド系抗生物質耐性菌に対して強い抗菌作用を
示すので、感染症治療剤として有用である。
According to the present invention, 3,4'-dideoxydesmycosin useful as an antibacterial agent is provided. Since the compound has a strong antibacterial action against macrolide antibiotic-resistant bacteria resistant to erythromycin, josamycin and the like, it is useful as a therapeutic agent for infectious diseases.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 西田 浩史 神奈川県横須賀市津久井568 グリーン ハイツ11−3−503 (72)発明者 岡本 六郎 神奈川県藤沢市花の木2−18 (72)発明者 竹内 富雄 東京都品川区東五反田5−1−11 701 −A (56)参考文献 特開 昭57−42698(JP,A) (58)調査した分野(Int.Cl.7,DB名) C07H 17/00 - 17/08 CA(STN) CAOLD(STN) REGISTRY(STN)──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor Hiroshi Nishida 568, Tsukui, Yukusuka City, Kanagawa Prefecture Green Heights 11-3-503 (72) Inventor Rokuro Okamoto 2-18 Hanagi, Fujisawa City, Kanagawa Prefecture (72) Inventor Tomio Takeuchi Tokyo 5-1-11 701-A, Higashi-Gotanda, Shinagawa-ku (56) References JP-A-57-42698 (JP, A) (58) Fields studied (Int. Cl. 7 , DB name) C07H 17/00- 17/08 CA (STN) CAOLD (STN) REGISTRY (STN)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 下記式: 【化1】 で示される3,4′−ジデオキシデスマイコシン。1. The following formula: 3,4'-dideoxydesmycosin represented by
JP00666093A 1993-01-19 1993-01-19 3,4'-dideoxydesmycosin Expired - Fee Related JP3221955B2 (en)

Priority Applications (1)

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JP3221955B2 true JP3221955B2 (en) 2001-10-22

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