JPH0597594A - Synthesis of group iii-v compound semiconductor composition - Google Patents

Synthesis of group iii-v compound semiconductor composition

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Publication number
JPH0597594A
JPH0597594A JP25666291A JP25666291A JPH0597594A JP H0597594 A JPH0597594 A JP H0597594A JP 25666291 A JP25666291 A JP 25666291A JP 25666291 A JP25666291 A JP 25666291A JP H0597594 A JPH0597594 A JP H0597594A
Authority
JP
Japan
Prior art keywords
gaas
boat
compound semiconductor
composition
iii
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25666291A
Other languages
Japanese (ja)
Other versions
JP2887978B2 (en
Inventor
Tomoki Inada
知己 稲田
Seiji Mizuniwa
清治 水庭
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Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
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  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To obtain the subject composition (crystal) economically and safely by suppressing the deformation of an ampule due to the rapid As gas shortage in a boat during the synthesis. CONSTITUTION:Arbenic 2 as a raw material for the final GaAs composition and Ga 1 in a quartz boat 3 are put into a quartz ampule 5. The Ga 1 is incorporated, in advance, with a specified proportion of GaAs polycrystal. Its amount is such as to be 5-95wt.% of the amount off a GaAs melt to be produced. In case of <5wt.%, the synthetic reaction will proceed vigorously; for >95%, the final GaAs crystal of stoichiometric composition can hardly be obtained, or the synthetic reaction will hardly proceed, leading to time consuming. In this way, preaddition of a specified amount of the GaAs polycrystal to the Ga 1 in the boat 3 does not cause the synthetic reaction rapidly, suppressing the deformation of the ampule 5 due to the rapid As gas shortage in the boat 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は横形ボート法によるGa
As等のIII −V族化合物半導体組成物の合成方法に係
り、特に合成反応時に伴う密閉容器の破壊を防止したも
の関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to Ga by the horizontal boat method.
The present invention relates to a method for synthesizing a III-V group compound semiconductor composition such as As, and more particularly, to a method in which destruction of a closed container due to a synthesis reaction is prevented.

【0002】[0002]

【従来の技術】III −V族化合物半導体結晶、特にGa
Asは工業的に重要な半導体材料であり、発光素子、高
周波素子、集積回路素子等の用途に広く用いられてい
る。その製法の最も一般的な方法は横形ボート法と呼ば
れるものである。これは、ボートの中に収容したGaA
s融液を、その一端から固化することによって単結晶を
成長させる。成長時にはGaAs融液(融点1238
℃)からのAsの解離が生じる。このため、その揮散を
防ぐ必要があり、通常、密閉容器を構成するアンプルの
中にAsを封じ込め、気化したAsガスの分圧により解
離を防いでいる。
2. Description of the Related Art III-V compound semiconductor crystals, especially Ga
As is an industrially important semiconductor material and is widely used for applications such as a light emitting element, a high frequency element, and an integrated circuit element. The most common method of manufacturing the so-called horizontal boat method. This is GaA housed in a boat
A single crystal is grown by solidifying the melt from one end. During growth, GaAs melt (melting point 1238
Dissociation of As from (.degree. C.) occurs. Therefore, it is necessary to prevent the volatilization thereof, and normally, As is contained in an ampoule constituting a closed container, and dissociation is prevented by the partial pressure of vaporized As gas.

【0003】横形ボート法においてGaAs融液を得る
には、従来次の2つの方法が広く用いられている。
In order to obtain a GaAs melt by the horizontal boat method, the following two methods have been widely used.

【0004】(1)ボート法及びその他の方法(縦型結
晶育成法など)で合成した多結晶を原料としてボートに
収容し、それを融解する方法。
(1) A method in which a polycrystal synthesized by the boat method and other methods (vertical crystal growth method, etc.) is housed in a boat as a raw material and melted.

【0005】(2)ボートに収容した原料Gaと、昇華
しガス化した原料Asを反応させることによりボート内
でGaAsを合成して、融液を作る方法。
(2) A method in which GaAs is synthesized in the boat by reacting the raw material Ga housed in the boat with the sublimated and gasified raw material As to form a melt.

【0006】(1)の方法の中には(2)の方法で合成
する場合が含まれていることから、基本的には(2)の
方法でGaAsは合成される場合が多い。従って、ここ
では(2)の方法により単結晶を成長させる結晶製造装
置の例を模式的に図1に示す。
Since the method of (1) includes the case of synthesizing by the method of (2), basically GaAs is often synthesized by the method of (2). Therefore, here, an example of a crystal manufacturing apparatus for growing a single crystal by the method (2) is schematically shown in FIG.

【0007】アンプル5はヒータ6、7で加熱されるよ
うになっている。アンプル5の一端のGaAs合成部は
融液保持温度を与える高温用ヒータ6により、他端のA
s供給部は蒸気圧温度を与える低温用ヒータ7により加
熱される。GaAs合成部にボート3に原料Ga1を収
容し、As供給部に原料As2を収容する。そして、ボ
ート3に収容したGaを高温用ヒータ6によりGaAs
の融点まで加熱する。その後、低温用ヒータ7により原
料As2の温度を上げ、610℃前後の昇華点で制御す
ることにより、Asのガス化を生ぜしめ、拡散障壁4を
通して輸送されたAsガスと、ボート内のGaとの反応
によりGaAsを合成する。
The ampoule 5 is heated by heaters 6 and 7. The GaAs synthesis part at one end of the ampoule 5 is heated by the high temperature heater 6 which gives the melt holding temperature,
The s supply section is heated by a low temperature heater 7 which gives a vapor pressure temperature. The raw material Ga1 is stored in the boat 3 in the GaAs synthesis section, and the raw material As2 is stored in the As supply section. Then, the Ga stored in the boat 3 is changed to GaAs by the high temperature heater 6.
Heat to the melting point of. Then, the temperature of the raw material As2 is raised by the low-temperature heater 7 and controlled at a sublimation point of around 610 ° C. to cause gasification of As, and As gas transported through the diffusion barrier 4 and Ga in the boat GaAs is synthesized by the reaction of.

【0008】この装置に用いられる部材のうちボート材
料としては、石英ガラスが最も広く用いられている。そ
の他、GaAsと不活性なBNやAlN、あるいは高温
に耐えるSiCやSi3 4 なども成長用部材として用
いられることがある。アンプルは上記したようにAsガ
スを封じ込める必要があり、通常石英が用いられてい
る。また、拡散障壁4も石英である。
Among the members used in this apparatus, quartz glass is the most widely used as a boat material. In addition, BN or AlN which is inactive with GaAs, or SiC or Si 3 N 4 which can withstand high temperature may be used as a growth member. The ampoule must contain As gas as described above, and quartz is usually used. The diffusion barrier 4 is also made of quartz.

【0009】[0009]

【発明が解決しようとする課題】ところで、前述した横
形ボート法によるGaAs合成方法では、アンプル内外
の圧力差を小さくする必要がある。石英アンプルは大き
な圧力に耐えないため圧力差が大きいと破裂しやすい上
に、GaAsの融点付近の高温では軟化しやすく、変形
から破壊へ致りやすいためである。そのための工夫とし
て、As供給部の温度を制御する方法が一般的に行われ
る。すなわち、610℃で昇華したAsの圧力はほぼ1
気圧に等しく、これを制御することでアンプル5の破壊
を防いでいる。
By the way, in the GaAs synthesis method by the lateral boat method described above, it is necessary to reduce the pressure difference between the inside and outside of the ampoule. This is because the quartz ampoule does not withstand a large pressure and thus easily breaks when the pressure difference is large, and at the high temperature near the melting point of GaAs, it easily softens and easily breaks from deformation. As a device for that purpose, a method of controlling the temperature of the As supply unit is generally performed. That is, the pressure of As sublimated at 610 ° C. is almost 1
It is equal to the atmospheric pressure, and by controlling this, the destruction of the ampoule 5 is prevented.

【0010】しかし、合成反応においては一気に反応が
進行するため、一瞬As分圧が低下しアンプルが変形し
て破壊することが多い。これを防ぐためにAs供給部の
温度を上げてAsの供給を急激に増やす必要があるが、
実際は追いつかない。それは、反応の開始を制御できな
いため、As供給部温度を上げるタイミングの設定が難
しいこと、及び反応速度が大きいため、減圧するAs分
圧を一定にするためのAsのガス化が追いつかないため
である。アンプルが破壊すると、ボートなど他の部材も
破壊するばかりでなく、高純度、高価なGaやAsが使
用不可となり経済的ダメージが大きいばかりでなく、ア
ンプルから有毒なAsガスやAs酸化物のガスが漏れ出
るため、安全上重大な問題となる。従来、このような問
題を有効に解決する手段はなかった。なお、この問題
は、GaAsのみならず、他のIII−V族化合物半導体
にも共通する。
However, in the synthetic reaction, the reaction proceeds all at once, so the As partial pressure is momentarily lowered and the ampoule is often deformed and destroyed. In order to prevent this, it is necessary to raise the temperature of the As supply section to rapidly increase the supply of As.
I can't really catch up. This is because it is difficult to control the start of the reaction, so it is difficult to set the timing for raising the temperature of the As supply part, and because the reaction rate is high, the gasification of As to keep the As partial pressure for depressurization constant cannot keep up. is there. When the ampoule is destroyed, not only other components such as boats are destroyed, but also high purity and expensive Ga and As become unusable, which causes great economic damage, and also poisonous As gas and As oxide gas from the ampoule. Is a serious safety issue. Conventionally, there has been no means for effectively solving such a problem. This problem is common not only to GaAs but also to other III-V group compound semiconductors.

【0011】本発明の目的は、上述した従来技術の欠点
を解消して、合成反応時にボート内の急激なV族元素ガ
ス不足によるアンプルの変形を抑え、経済的かつ安全に
結晶を製造できるIII −V族化合物半導体組成物の合成
方法を提供することにある。
The object of the present invention is to solve the above-mentioned drawbacks of the prior art, suppress the deformation of the ampoule due to a sudden shortage of the group V element gas in the boat during the synthesis reaction, and manufacture the crystal economically and safely III (EN) A method for synthesizing a -V compound semiconductor composition.

【0012】[0012]

【課題を解決するための手段】本発明は、密閉容器内に
III −V族化合物半導体組成物、例えばGaAs組成物
の原料となるAsと、ボート内に入れたGaとを収容
し、加熱後気化したAsガスと液状のGaとの反応によ
りGaAs融液を合成し、この融液からGaAs組成物
を得るIII −V族化合物半導体組成物の合成方法におい
て、ボートに収容したGaの中に、一定割合のGaAs
多結晶を予め加えておくようにしたものである。Gaの
中には、生成させるGaAs融液量の5%以上、95%
以下のGaAs多結晶を入れることが好ましい。5%よ
り少ない量では、合成反応が激しく生じるため問題解消
とならない。95%以上ではストイキオメトリ組成のG
aAsとなりにくいか、あるいは合成反応が進行しづら
く、時間がかかってしまう。ストイキオメトリとはGa
とAsの1:1組成のことである。通常、急激な反応が
生じているときは、連鎖反応的にAsが取り込まれ、G
aAsが生成することによりストイキオメトリ組成とな
るが、95%以上では反応性が悪いためストイキオメト
リとなりにくい。また、ストイキオメトリにするために
かかる時間が長くなってしまう。
DISCLOSURE OF THE INVENTION The present invention is provided in a closed container.
A GaAs melt was synthesized by accommodating As, which is a raw material for a III-V group compound semiconductor composition, for example, a GaAs composition, and Ga put in a boat, and reacting As gas vaporized after heating with liquid Ga. Then, in the method for synthesizing a III-V group compound semiconductor composition for obtaining a GaAs composition from this melt, a fixed ratio of GaAs is contained in Ga contained in the boat.
A polycrystal is added in advance. In Ga, 5% or more, 95% or more of the amount of GaAs melt to be generated
The following GaAs polycrystals are preferably added. If the amount is less than 5%, the synthesis reaction will occur violently and the problem cannot be solved. A stoichiometric composition of G at 95% or more
It does not easily become aAs, or the synthesis reaction is difficult to proceed, which takes time. What is stoichiometry is Ga
And As is a 1: 1 composition. Usually, when a rapid reaction occurs, As is taken in by a chain reaction and G
The formation of aAs results in a stoichiometry composition, but at 95% or more, the reactivity is poor and stoichiometry is less likely to occur. In addition, it takes a long time to make stoichiometry.

【0013】上記したGaAs組成物とは、GaAs単
結晶及びGaAs多結晶を意味し、GaAs単結晶製造
のみならず、GaAs多結晶合成にも適用できる。ま
た、本発明を適用できるIII −V族化合物半導体として
は、GaAsの他に、As系化合物半導体(例えばIn
As)がある。さらに、InP、GaPでもアンプル内
外の圧力バランスを保ちながら合成することも可能であ
るから、これらにも適用できる。
The above-mentioned GaAs composition means GaAs single crystal and GaAs polycrystal, and can be applied not only to GaAs single crystal production but also to GaAs polycrystal synthesis. Further, as the III-V group compound semiconductor to which the present invention can be applied, In addition to GaAs, an As-based compound semiconductor (for example, In
There is As). Furthermore, since InP and GaP can be synthesized while maintaining the pressure balance inside and outside the ampoule, they can also be applied to these.

【0014】なお、密閉容器には通常アンプルが用いら
れるが、AsなどのV族元素雰囲気を構成できれば、ア
ンプルとする必要はない。
Although an ampoule is usually used as the closed container, it is not necessary to use an ampoule as long as a group V element atmosphere such as As can be formed.

【0015】[0015]

【作用】ボートに収容したIII 族元素、例えばGaの中
に、一定割合のIII −V族化合物半導体多結晶、例えば
GaAs多結晶を予め加えておくと、GaとAsの反応
時の大きな反応熱がGaAsの熱容量により吸収され、
また全量に対するGaとAsの量を希薄にすることで、
反応熱全体を低減できるため、合成反応が急激に起こら
ない。このため、合成反応時にボート内の急激なAsガ
ス不足によるアンプルの変形が抑えられる。
When a certain proportion of a group III-V compound semiconductor polycrystal, for example, GaAs polycrystal, is added in advance to a group III element, for example, Ga, accommodated in a boat, a large reaction heat during the reaction between Ga and As occurs. Is absorbed by the heat capacity of GaAs,
Also, by diluting the amount of Ga and As with respect to the total amount,
Since the total heat of reaction can be reduced, the synthetic reaction does not occur rapidly. Therefore, the deformation of the ampoule due to the sudden shortage of As gas in the boat during the synthesis reaction can be suppressed.

【0016】[0016]

【実施例】以下、GaAsに適用した本発明の実施例を
比較例と共に、表1を用いて説明する。実施例1〜2及
び比較例1〜3の条件は次の通りである。
EXAMPLES Examples of the present invention applied to GaAs will be described below together with comparative examples using Table 1. The conditions of Examples 1-2 and Comparative Examples 1-3 are as follows.

【0017】実施例1 結晶成長装置は図1と同じものを使った。内径170m
m長さ1000mmの石英アンプルを用いてGaAsを
合成した。幅110mm、深さ60mmの石英ボート
に、目的とする10,373gのGaAsの約24%に
当る2,500gのGaAs多結晶と、3,795のG
aとをボートにチャージし、アンプルの合成部端部に近
い方に配した。供給部の端にAsを4,095gチャー
ジし、アンプルを10-4torrの真空に排気した後、溶接
により封じた。
Example 1 The same crystal growth apparatus as in FIG. 1 was used. 170m inside diameter
GaAs was synthesized using a quartz ampoule having a length of 1000 mm. In a quartz boat with a width of 110 mm and a depth of 60 mm, 2,500 g of GaAs polycrystal, which is about 24% of the target 10,373 g of GaAs, and G of 3,795.
A and a were charged in a boat and placed near the end of the synthesis part of the ampoule. The end of the supply part was charged with 4,095 g of As, and the ampoule was evacuated to a vacuum of 10 −4 torr and then sealed by welding.

【0018】ボートの温度を1238℃に上げた後に徐
々にAs部の温度を610℃まで上昇した。昇温終了後
一定時間経ったところで、反応熱による閃光を発しなが
らGaAsの合成反応が生じ、融液が形成された。
After raising the temperature of the boat to 1238 ° C., the temperature of the As portion was gradually raised to 610 ° C. After a lapse of a certain time after completion of the temperature rise, a GaAs synthesis reaction occurred while emitting a flash of light due to reaction heat, and a melt was formed.

【0019】実施例2 原料のチャージ量(表1)以外は実施例1と同一であ
る。目的とする10,367gのGaAsの約82%に
当る8,500gのGaAs多結晶を加えた。
Example 2 The same as Example 1 except for the charge amount of the raw material (Table 1). Approximately 82% of the target 10,367 g of GaAs, that is, 8,500 g of GaAs polycrystal was added.

【0020】比較例1 実施例1と同じ方法で、原料のチャージ量のみを変え
た。石英ボートに5,000gのGaのみをチャージ
し、多結晶GaAsはゼロである。Asを5,390g
チャージして封入してGaAsを合成し、融液を形成し
た。形成した融液を徐冷することにより固めて取りだ
し、チャージしたGaと、合成したGaAsの比から組
成を見積もった。1:1組成の場合、GaAsは10,
373gとなる。
Comparative Example 1 In the same manner as in Example 1, only the charge amount of the raw material was changed. The quartz boat is charged with only 5,000 g of Ga, and the polycrystalline GaAs is zero. 5,390g of As
After charging and sealing, GaAs was synthesized to form a melt. The formed melt was gradually cooled and solidified, and the composition was estimated from the ratio of the charged Ga and the synthesized GaAs. In the case of 1: 1 composition, GaAs is 10,
It becomes 373 g.

【0021】比較例2 原料のチャージ量(表1)以外は実施例1と同一であ
る。目的とする10,373gのGaAsの約4%に当
る415gのGaAs多結晶を加えた。
Comparative Example 2 The same as Example 1 except the charge amount of the raw material (Table 1). 415 g of GaAs polycrystal, which is about 4% of the targeted 10,373 g of GaAs, was added.

【0022】比較例3 原料のチャージ量(表1)以外は実施例1と同一であ
る。目的とする10,374gのGaAsの約96%に
当る9,970gのGaAs多結晶を加えた。
Comparative Example 3 The same as Example 1 except the charge amount of the raw material (Table 1). 9,970 g of GaAs polycrystal, which is about 96% of the target 10,374 g of GaAs, was added.

【0023】[0023]

【表1】 [Table 1]

【0024】表1からわかるように、実施例1、2では
ストイキオメトリ組成のGaAsがアンプルの変形、破
壊なしに合成できた。従来法の比較例1ではアンプル破
裂が多く、GaAs多結晶が4%と少ない比較例1で
も、アンプル破裂が多かった。また、GaAs多結晶が
96.1%と多い比較例3ではストイキオメトリ組成が
得られにくく、平均するとGaが過剰であった。
As can be seen from Table 1, in Examples 1 and 2, GaAs having a stoichiometric composition could be synthesized without deformation or destruction of the ampoule. In comparative example 1 of the conventional method, ampoule rupture was large, and in comparative example 1 in which the GaAs polycrystal was as small as 4%, ampoule rupture was large. Further, in Comparative Example 3 in which the GaAs polycrystal was as large as 96.1%, it was difficult to obtain a stoichiometry composition, and Ga was excessive on average.

【0025】[0025]

【発明の効果】本発明によれば、ボートに収容する原料
III 族元素に一定割合のIII −V族化合物半導体多結晶
を加えるようにしたので、合成反応時のボート内の急激
なV族元素sガス不足による密閉容器の変形を抑え、経
済的かつ安全に結晶製造できる。
According to the present invention, the raw material to be accommodated in the boat
Since a certain proportion of the group III-V compound semiconductor polycrystal is added to the group III element, deformation of the closed container due to a sudden gas shortage of the group V element s in the boat during the synthesis reaction is suppressed, which is economical and safe. Crystals can be produced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例によるボート法による結晶成長
装置の概略断面図。
FIG. 1 is a schematic sectional view of a crystal growth apparatus by a boat method according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 Ga 2 As 3 石英ボート 4 拡散障壁 5 石英アンプル 6 高温用ヒータ 7 低温用ヒータ 1 Ga 2 As 3 Quartz Boat 4 Diffusion Barrier 5 Quartz Ampoule 6 High Temperature Heater 7 Low Temperature Heater

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】密閉容器内にIII −V族化合物半導体組成
物の原料となるV族元素と、ボート内に入れたIII 族元
素とを収容し、加熱後気化したV族元素ガスと液状のII
I 族元素との反応によりIII −V族化合物半導体融液を
合成し、この融液からIII −V族化合物半導体組成物を
得るIII −V族化合物半導体組成物の合成方法におい
て、所望するIII −V族化合物半導体組成物量の5%以
上95%以下のIII −V族化合物半導体多結晶を前記ボ
ート内に原料として加えることを特徴とするIII−V族
化合物半導体組成物の合成方法。
1. A closed vessel containing a group V element, which is a raw material for a III-V group compound semiconductor composition, and a group III element placed in a boat, and a group V element gas which is vaporized after heating and is in a liquid state. II
In a method for synthesizing a III-V group compound semiconductor composition, a III-V group compound semiconductor melt is synthesized by a reaction with a group I element, and a III-V group compound semiconductor composition is obtained from the melt. A method for synthesizing a III-V compound semiconductor composition, comprising adding 5% to 95% of a III-V compound semiconductor polycrystal of the V compound semiconductor composition to the boat as a raw material.
JP25666291A 1991-10-03 1991-10-03 Method for synthesizing III-V compound semiconductor composition Expired - Lifetime JP2887978B2 (en)

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JP25666291A JP2887978B2 (en) 1991-10-03 1991-10-03 Method for synthesizing III-V compound semiconductor composition

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JPH0597594A true JPH0597594A (en) 1993-04-20
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2722420A2 (en) 2012-10-22 2014-04-23 Hitachi Metals, Ltd. Equipment and method for producing a compound polycrystal, and method for growing a compound single crystal

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2722420A2 (en) 2012-10-22 2014-04-23 Hitachi Metals, Ltd. Equipment and method for producing a compound polycrystal, and method for growing a compound single crystal

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JP2887978B2 (en) 1999-05-10

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