JPH0588558B2 - - Google Patents
Info
- Publication number
- JPH0588558B2 JPH0588558B2 JP16689485A JP16689485A JPH0588558B2 JP H0588558 B2 JPH0588558 B2 JP H0588558B2 JP 16689485 A JP16689485 A JP 16689485A JP 16689485 A JP16689485 A JP 16689485A JP H0588558 B2 JPH0588558 B2 JP H0588558B2
- Authority
- JP
- Japan
- Prior art keywords
- formula
- monomer component
- polymer
- dielectric constant
- dielectric loss
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000178 monomer Substances 0.000 claims description 29
- 229920000642 polymer Polymers 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 11
- 239000005977 Ethylene Substances 0.000 description 11
- -1 polypropylene Polymers 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 239000011889 copper foil Substances 0.000 description 6
- 239000004711 α-olefin Substances 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- OJOWICOBYCXEKR-KRXBUXKQSA-N (5e)-5-ethylidenebicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(=C/C)/CC1C=C2 OJOWICOBYCXEKR-KRXBUXKQSA-N 0.000 description 2
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1-dodecene Chemical compound CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 2
- GQEZCXVZFLOKMC-UHFFFAOYSA-N 1-hexadecene Chemical compound CCCCCCCCCCCCCCC=C GQEZCXVZFLOKMC-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- HFDVRLIODXPAHB-UHFFFAOYSA-N 1-tetradecene Chemical compound CCCCCCCCCCCCC=C HFDVRLIODXPAHB-UHFFFAOYSA-N 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- VAMFXQBUQXONLZ-UHFFFAOYSA-N icos-1-ene Chemical compound CCCCCCCCCCCCCCCCCCC=C VAMFXQBUQXONLZ-UHFFFAOYSA-N 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- POPHMOPNVVKGRW-UHFFFAOYSA-N 1,2,3,4,4a,5,6,7-octahydronaphthalene Chemical compound C1CCC2CCCCC2=C1 POPHMOPNVVKGRW-UHFFFAOYSA-N 0.000 description 1
- YZFOQJOYMTZTRH-UHFFFAOYSA-N 1-(2-methylbutyl)cyclohexene Chemical compound CCC(C)CC1=CCCCC1 YZFOQJOYMTZTRH-UHFFFAOYSA-N 0.000 description 1
- CMAOLVNGLTWICC-UHFFFAOYSA-N 2-fluoro-5-methylbenzonitrile Chemical compound CC1=CC=C(F)C(C#N)=C1 CMAOLVNGLTWICC-UHFFFAOYSA-N 0.000 description 1
- JOVGLRSLWFSVNB-UHFFFAOYSA-N 3,4-dimethylcyclopentene Chemical compound CC1CC=CC1C JOVGLRSLWFSVNB-UHFFFAOYSA-N 0.000 description 1
- YHQXBTXEYZIYOV-UHFFFAOYSA-N 3-methylbut-1-ene Chemical compound CC(C)C=C YHQXBTXEYZIYOV-UHFFFAOYSA-N 0.000 description 1
- UZPWKTCMUADILM-UHFFFAOYSA-N 3-methylcyclohexene Chemical compound CC1CCCC=C1 UZPWKTCMUADILM-UHFFFAOYSA-N 0.000 description 1
- LDTAOIUHUHHCMU-UHFFFAOYSA-N 3-methylpent-1-ene Chemical compound CCC(C)C=C LDTAOIUHUHHCMU-UHFFFAOYSA-N 0.000 description 1
- INYHZQLKOKTDAI-UHFFFAOYSA-N 5-ethenylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C=C)CC1C=C2 INYHZQLKOKTDAI-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 229940069096 dodecene Drugs 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical class Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229940095068 tetradecene Drugs 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
〔産業上の利用分野〕
本発明は、高周波用の電気回路に用いられれる
回路基板に関する。
〔従来の技術〕
近年における電子機器の発展、とくに電気通信
分野の発展には目覚ましいものがある。そしてそ
の発展は、より高い周波数換言すればより短い波
長をひたすら開拓する努力の積み重ねにほかなら
ない。すなわち、電磁波を通信に用いる場合、よ
り高い周波数の波を用いればより広い周波数帯域
がとれ、故により多量の情報を送ることができ
る。また周波数が高くなれば波長がそれに反比例
して短くなり、その結果小型で高性能のアンテナ
を作れるようになるという利点もある。
ところで、このような高周波を対象とする電気
回路の基板には、誘電率及び誘電損失が小さく耐
熱性のある材質が求められる。つまり、高周波に
おいて電気信号の伝播速度は回路基板の誘電率が
小さい程速くなり、電気信号の減衰は回路基板の
誘電損失が小さく耐熱性のある材質が求められ
る。つまり、高周波において電気信号の伝播速度
は回路基板の誘電率が小さい程速くなり、電気信
号の減衰は回路基板の誘電損失が小さい程少なく
なる。したがつて、誘電率及び誘電損失の小さい
材料程、高速化、低SN化が計れる。また、電気
回路の製造過程において、ハンダ浸漬やハンダ付
作業では200℃を超える温度がかかるので、この
ような温度下でも変形しないだけの耐熱性が求め
られる。
このような状況下、現在種々の材料を使用した
基板が提案され、たとえばフツ素樹脂、エポキシ
樹脂、ポリイミド、ポリプロピレン等で作られた
基板が提案されている。しかしフツ素樹脂は導電
層となる金属との接着性が劣つていたり、低剛性
であり更に極めて高価格であるという問題があ
る。エポキシ樹脂あるいはポリイミドは低周波
用、中波用の回路基板として従来から使用されて
いるが、高周波用として使用するには誘電率、誘
電損失が大き過ぎて適さない。ポリプロピレンは
誘電率、誘電損失に優れるものの耐熱性が不足
し、変形を生じ易い。
以上の如く、従来から提案されている高周波用
電気回路基板は一長一短があり、全ての面で優れ
た性能を示すものは知られていなかつた。
〔発明が解決しようとする問題点〕
そこで本発明者は、高周波用として好適なる電
気回路基板を提供せんものと検討した結果、特定
の重合体を基板材料に使用すると目的を達成でき
ることを見い出した。
〔問題点を解決するための手段〕
すなわち本発明は、少なくとも式(1)で示される
モノマー成分を含み重合体中において該モノマー
成分が式(2)で示される構造をとる重合体層に導電
層を積層してなる高周波電気回路基板である。
[Industrial Application Field] The present invention relates to a circuit board used in a high frequency electric circuit. [Background Art] The development of electronic devices in recent years, especially in the field of telecommunications, has been remarkable. And its development is nothing but the accumulation of efforts to develop higher frequencies, or in other words, shorter wavelengths. That is, when electromagnetic waves are used for communication, the use of higher frequency waves allows for a wider frequency band and therefore allows for the transmission of a larger amount of information. Another advantage is that as the frequency increases, the wavelength decreases inversely, making it possible to create smaller, higher-performance antennas. By the way, the substrate of such an electric circuit intended for high frequencies is required to be made of a heat-resistant material with a low dielectric constant and low dielectric loss. In other words, at high frequencies, the propagation speed of an electric signal increases as the dielectric constant of the circuit board decreases, and the attenuation of the electric signal requires a material with low dielectric loss and heat resistance for the circuit board. That is, at high frequencies, the propagation speed of an electrical signal becomes faster as the dielectric constant of the circuit board is smaller, and the attenuation of the electrical signal becomes smaller as the dielectric loss of the circuit board becomes smaller. Therefore, the smaller the dielectric constant and dielectric loss of the material, the higher the speed and the lower the SN. In addition, in the process of manufacturing electrical circuits, temperatures exceeding 200°C are applied during solder dipping and soldering operations, so it is required to have enough heat resistance to prevent deformation even at such temperatures. Under these circumstances, substrates using various materials are currently being proposed, including substrates made of fluororesin, epoxy resin, polyimide, polypropylene, and the like. However, fluororesin has problems in that it has poor adhesion to the metal that forms the conductive layer, has low rigidity, and is extremely expensive. Epoxy resins or polyimides have conventionally been used as circuit boards for low frequencies and medium waves, but their dielectric constant and dielectric loss are too large to be used for high frequencies, making them unsuitable. Although polypropylene has excellent dielectric constant and dielectric loss, it lacks heat resistance and is easily deformed. As described above, the high-frequency electric circuit boards that have been proposed in the past have advantages and disadvantages, and no one is known that exhibits excellent performance in all aspects. [Problems to be Solved by the Invention] Therefore, the present inventor investigated the possibility of providing an electric circuit board suitable for high frequency use, and found that the purpose could be achieved by using a specific polymer as the board material. . [Means for Solving the Problems] That is, the present invention provides a polymer layer containing at least a monomer component represented by formula (1) and having a structure represented by formula (2) in which the monomer component is conductive. This is a high frequency electric circuit board made up of laminated layers.
本発明の回路基板を構成する重合体は、前述し
た式(1)で示されるモノマー成分を含むものであつ
て、重合体中においては該モノマー成分が主とし
て式(2)で示される構造をとつている。かかる重合
体として好ましい態様は、式(1)のモノマー成分と
共にα−オレフイン及び/又は式(1)以外の環状オ
レフインとからなる共重合体が例示でき、取り分
けて好適なものとして重合体の必須成分として式
(1)のモノマー及びエチレンを含むものを挙げるこ
とができる。
重合体中、式(1)のモノマー成分は少なくとも2
モル%以上含むべきであるが、エチレンを共存さ
せる場合にはエチレン/式(1)のモノマー成分のモ
ル比が5/95〜95/5、とくに40/60〜90/10の
範囲が好ましく、更にエチレン以外のα−オレフ
インや鎖状ジエンあるいは式(1)以外の環状オレフ
インや環状ジエン例えばエチリデンノルボルネ
ン、ジシクロペンタジエン等を共存させる場合に
はこれらのモノマー合計量/式(1)のモノマー成分
のモル比が5/95〜95/5、とくに30/70〜90/
10の範囲が好ましい。また本発明においては式(1)
のモノマー成分は単品のみならず、式(1)で示され
る複数の成分が混合していてもよいことは勿論で
ある。
式(1)で示されるモノマー成分の具体例を示すと
以下のものを挙げることができるが、ここで示さ
れる例は極めて限定されたものであつて、式(1)で
示されるものであれば如何なるものも本発明のモ
ノマー成分になり得る。
The polymer constituting the circuit board of the present invention contains a monomer component represented by the above-mentioned formula (1), and in the polymer, the monomer component mainly has a structure represented by formula (2). It's on. A preferred embodiment of such a polymer is a copolymer comprising the monomer component of formula (1) and an α-olefin and/or a cyclic olefin other than formula (1). formula as a component
Examples include those containing the monomer (1) and ethylene. In the polymer, the monomer component of formula (1) is at least 2
It should contain mol% or more, but when ethylene is coexisting, the molar ratio of ethylene/monomer component of formula (1) is preferably in the range of 5/95 to 95/5, particularly 40/60 to 90/10, Furthermore, when α-olefins or chain dienes other than ethylene, or cyclic olefins or cyclic dienes other than formula (1) such as ethylidene norbornene, dicyclopentadiene, etc. are present, the total amount of these monomers/monomer component of formula (1) molar ratio of 5/95 to 95/5, especially 30/70 to 90/
A range of 10 is preferred. In addition, in the present invention, formula (1)
Of course, the monomer component may not only be used alone, but also a mixture of a plurality of components represented by formula (1) may be used. Specific examples of the monomer component represented by formula (1) include the following; however, the examples shown here are extremely limited; Anything can be a monomer component of the present invention.
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】
これらの中では式(1)においてn=1のもの、す
なわち式(3)、[Formula] Among these, n=1 in formula (1), that is, formula (3),
【化】
で示されるモノマー成分が、モノマーの入手し易
さあるいはモノマー合成のし易の面で好ましい。
上述のモノマー成分を製造するには、たとえば
米国特許3557072号公報(特公昭46−14910号公
報)や特開昭57−154133号公報の方法を適用する
ことができる。たとえば式(3)のモノマー成分を製
造するには、下記式にあるようにノルボルネンに
対してシクロペンタジエンを縮合する。Monomer components represented by the following formula are preferred in terms of ease of monomer availability or monomer synthesis. In order to produce the above-mentioned monomer components, it is possible to apply, for example, the method disclosed in US Pat. For example, to produce the monomer component of formula (3), cyclopentadiene is condensed with norbornene as shown in the following formula.
【化】
式(3)以外の式(1)で示されるモノマー成分も基本
的には上記の縮合反応の応用であり、ただ出発原
料の違いだけである。
式(1)のモノマー成分と共重合され得るα−オレ
フインとしては、炭素原子数2〜20、好適には2
〜10のα−オレフインであつて、たとえばエチレ
ン、プロピレン、1−ブテン、3−メチル−1−
ブテン、1−ペンテン、3−メチル−1−ペンテ
ン、4−メチル−1−ペンテン、1−ヘキセン、
1−オクテン、1−デセン、1−ドデセン、1−
テトラデセン、1−ヘキサデセン、1−イコセン
などを例示できる。これらの中ではとくにエチレ
ンが共重合性の面から好ましく、他のα−オレフ
ィン(炭素原子数3以上)あるいは後述する環状
オレフインや環状ジエンを式(1)のモノマー成分と
共重合させる場合にも、エチレンが存在したほう
が共重合性は良好である。
式(1)のモノマー成分と共重合することのできる
別の成分である式(1)以外の環状オレフイン及び環
状ジエンたとえばシクロペンテン、シクロヘキセ
ン、3,4−ジメチルシクロペンテン、3−メチ
ルシクロヘキセン、2−(2−メチルブチル)−1
−シクロヘキセン、スチレン、α−メチルスチレ
ン、3a、5、6、7a−テトラヒドロ−4、7−
メタノ−1H−インデン、ジシクロペンタジエン、
エチリデンノルボルネン、ビニルノルボルネンな
どを例示できる。
更に以上述べてきたモノマー成分のほかに、他
の共重合可能なモノマー成分を本発明の目的を損
わない範囲内で、重合体中に少量含んでいてもよ
い。
重合体は、以上詳説してきた式(1)のモノマー成
分あるいは式(1)のモノマー成分及びα−オレフイ
ン及び/又は環状オレフイン等を、周知のチーグ
ラー触媒とくにバナジウム系のチーグラー触媒を
使用して重合することにより製造される。より詳
しくは、出願人による先行特許出願(たとえば特
願昭59−16995号)に開示されている。重合体の
特徴は、式(1)のモノマー成分が重合体中において
主として式(2)で示される構造をとつていることで
あり、これにより重合体の沃素価は通常5以下、
多くが1以下である。またこの構造をとることは
13C−NMRによつても裏付けられる。[Chemical formula] The monomer components shown by formula (1) other than formula (3) are basically applications of the above condensation reaction, and the only difference is in the starting materials. The α-olefin that can be copolymerized with the monomer component of formula (1) has 2 to 20 carbon atoms, preferably 2
~10 α-olefins, such as ethylene, propylene, 1-butene, 3-methyl-1-
Butene, 1-pentene, 3-methyl-1-pentene, 4-methyl-1-pentene, 1-hexene,
1-octene, 1-decene, 1-dodecene, 1-
Examples include tetradecene, 1-hexadecene, and 1-icosene. Among these, ethylene is particularly preferred from the viewpoint of copolymerizability, and can also be used when copolymerizing other α-olefins (having 3 or more carbon atoms) or cyclic olefins or cyclic dienes described below with the monomer component of formula (1). , copolymerizability is better in the presence of ethylene. Cyclic olefins and cyclic dienes other than formula (1) which are other components that can be copolymerized with the monomer component of formula (1), such as cyclopentene, cyclohexene, 3,4-dimethylcyclopentene, 3-methylcyclohexene, 2-( 2-methylbutyl)-1
-Cyclohexene, styrene, α-methylstyrene, 3a,5,6,7a-tetrahydro-4,7-
Methanol-1H-indene, dicyclopentadiene,
Examples include ethylidenenorbornene and vinylnorbornene. Furthermore, in addition to the monomer components described above, the polymer may contain a small amount of other copolymerizable monomer components within a range that does not impair the object of the present invention. The polymer is produced by polymerizing the monomer component of formula (1) or the monomer component of formula (1) and α-olefin and/or cyclic olefin, etc., which have been explained in detail above, using a well-known Ziegler catalyst, particularly a vanadium-based Ziegler catalyst. Manufactured by More details are disclosed in the applicant's prior patent application (for example, Japanese Patent Application No. 16995/1982). A feature of the polymer is that the monomer component of formula (1) mainly has the structure shown by formula (2) in the polymer, and as a result, the iodine value of the polymer is usually 5 or less.
Many are 1 or less. Also, taking this structure
This is also supported by 13 C-NMR.
以上述べた構成による本発明の高周波用電気回
路基板は、
誘電率が小さいので高周波電気信号の伝播速
度が速くなり、また誘電損失が小さいので電気
信号の減衰が小さくなるので、情報伝達の高速
化が実現でき、微弱信号の高感度受信も実現で
きる。
耐熱性に富むので、回路基板製造における加
熱加圧工程において軟化、溶触が発生せず変形
することがない。したがつて回路基板の厚みを
正確にコントロールすることができる。
耐ハンダ性に優れている。
吸水性が小さく、優れた電気的性質を長期間
に亘り安定して発揮できる。
寸法安定性に優れる。
といつた特長を有している。
したがつて各種回路基板、フラツトアンテナ、
筐体一体型基板、フレキシブル基板などに利用で
きる。
〔実施例〕
以下本発明の実施例を好適な例でもつて示す
が、本発明の内容はとくにことわりのない限り、
何らこれらの例に制限されるものではない。
実施例 1
攪拌翼を備えた2ガラス製重合器を用いて、
連続的にエチレンと2−メチル−1,4,5,8
−ジメタノ−1,2,3,4,4a、5,8、8a
−オクタヒドロナフタレン(以下M−DMONと
略)の共重合反応を行つた。すなわち、重合器上
部から重合器内でのM−DMON濃度が60g/と
なるようにM−DMONのトルエン溶液を毎時0.9
、重合器内でのバナジウム濃度が、0.5mmol/
となるようにVO(OC2H5)Clのトルエン溶液
を毎時0.7、重合器内でのアルミニウム濃度が
3mmol/となるようにエチルアルミニウムセ
スキクロリド(Al(C2H5)1.5Cl1.5)のトルエン溶
液を毎時0.4の速度で、各重合器中に連続的に
供給した。一方重合器下部から、重合器中に重合
液が常に1になるように連続的に抜き出す。ま
た、重合器上部からエチレンを毎時23、窒素を
毎時80の速度で供給する。共重合反応は、冷媒
を用いることにより、10℃にコントロールして行
つた。重合器下部から抜き出したポリマー重合液
にメタノールを少量添加して重合反応を停止さ
せ、大量のインプロピルアルコール中に投入して
生成共重合体を析出させ、イソプロピルアルコー
ルで洗浄した。この時共重合体は毎時30gの速度
で得られた。130℃で一昼夜減圧乾燥した後、安
定剤として、イルガノツクス
1010を0.1wt%、
ステアリン酸亜鉛を0.07wt%添加し、サーモプラ
スチツク社製20mmφ押出機で260℃で造粒した。
13C−NMR分析による共重合体のエチレン組
成は53モル%、135℃デカリン中で測定した極限
粘度〔η〕は1.05dl/g、デユポン社製Dynamic
Mechanical Analyser(DMA)によるガラス転
移温度(Tg)が145℃、誘電率と誘電正接(1M
Hz)が各2.1及び1.1×10-4であり、熱分解温度
(Td)が380℃であつた。密度が1.032g/cm3であ
つた。
このようにして得られた樹脂を、サーモプラス
チツク製30mmφ、Tダイ成形機により樹脂温度
280℃で厚さ1.5mm、巾20cmのシートを作製した。
このシート(10cm×10cm)に、三井金属鉱業社
製電解銅箔(35μm厚さ)を両面にはりつけ、260
℃でプレス成形機より融着させた。
両面銅張板での誘電率、誘電損失は、それぞれ
2.1、1.2×10-4であり剥離強度は1.0Kg/cmであつ
た。この銅張板に、フオトレジスト(富士合成化
学研究所 No.200)をコートし、アルカリ現像液
及びエツチング処理(塩化第2鉄飽和溶液)に微
細パターンを形成した。その結果、1μ以下の微
細パターンが形成できた。
実施例 2
実施例1の重合におけるM−DMONの代わり
に1,4,5,8−ジメタノ−1.2.3.4.4a、5,
8,8a−オクタヒドロナフタレン
The high-frequency electric circuit board of the present invention having the above-described structure has a small dielectric constant, which increases the propagation speed of high-frequency electric signals, and a small dielectric loss, which reduces the attenuation of electric signals, thereby increasing the speed of information transmission. can be achieved, and high-sensitivity reception of weak signals can also be achieved. Because it has high heat resistance, it does not soften, melt, or deform during the heating and pressing process in circuit board manufacturing. Therefore, the thickness of the circuit board can be accurately controlled. Excellent solder resistance. It has low water absorption and can stably exhibit excellent electrical properties over a long period of time. Excellent dimensional stability. It has the following characteristics. Therefore, various circuit boards, flat antennas,
Can be used for housing-integrated boards, flexible boards, etc. [Example] Examples of the present invention will be shown below, including preferred examples, but unless otherwise specified, the content of the present invention will be as follows.
The invention is not limited to these examples in any way. Example 1 Using a two-glass polymerization vessel equipped with stirring blades,
Continuously ethylene and 2-methyl-1,4,5,8
-dimethano-1,2,3,4,4a,5,8,8a
- A copolymerization reaction of octahydronaphthalene (hereinafter abbreviated as M-DMON) was carried out. That is, a toluene solution of M-DMON is added at 0.9 g/hour so that the concentration of M-DMON in the polymerization vessel is 60 g/hour from the top of the polymerization vessel.
, the vanadium concentration in the polymerization vessel is 0.5 mmol/
A toluene solution of VO(OC 2 H 5 )Cl is added at a rate of 0.7 per hour so that the aluminum concentration in the polymerization vessel is
A toluene solution of ethylaluminum sesquichloride (Al(C 2 H 5 ) 1.5 Cl 1.5 ) was continuously fed into each polymerization vessel at a rate of 0.4 mmol/hour. On the other hand, the polymer solution is continuously drawn out from the lower part of the polymerization vessel so that the polymerization liquid is always at 1 level in the polymerization vessel. Additionally, ethylene is supplied from the top of the polymerization reactor at a rate of 23 mph and nitrogen at a rate of 80 mph. The copolymerization reaction was carried out at a controlled temperature of 10°C using a refrigerant. A small amount of methanol was added to the polymer polymerization liquid taken out from the bottom of the polymerization vessel to stop the polymerization reaction, and the resulting copolymer was poured into a large amount of inpropyl alcohol to precipitate the resulting copolymer, which was washed with isopropyl alcohol. At this time, the copolymer was obtained at a rate of 30 g/hour. After drying under reduced pressure at 130℃ overnight, 0.1wt% of Irganox 1010 was added as a stabilizer.
Zinc stearate was added at 0.07wt% and granulated at 260°C using a 20mmφ extruder manufactured by Thermoplastics. The ethylene composition of the copolymer according to 13 C-NMR analysis was 53 mol%, and the intrinsic viscosity [η] measured in decalin at 135°C was 1.05 dl/g.
Glass transition temperature (Tg) measured by mechanical analyzer (DMA) is 145℃, dielectric constant and dielectric loss tangent (1M
Hz) were 2.1 and 1.1×10 -4 , respectively, and the thermal decomposition temperature (Td) was 380°C. The density was 1.032g/cm 3 . The resin obtained in this way was heated to
A sheet with a thickness of 1.5 mm and a width of 20 cm was produced at 280°C. Electrolytic copper foil (35 μm thick) manufactured by Mitsui Kinzoku Mining Co., Ltd. was pasted on both sides of this sheet (10 cm x 10 cm).
It was fused using a press molding machine at ℃. The dielectric constant and dielectric loss of double-sided copper clad plate are respectively
2.1, 1.2×10 -4 and the peel strength was 1.0 Kg/cm. This copper-clad plate was coated with a photoresist (Fuji Gosei Kagaku Kenkyusho No. 200), and a fine pattern was formed in an alkaline developer and etching treatment (saturated ferric chloride solution). As a result, a fine pattern of 1 μm or less could be formed. Example 2 1,4,5,8-dimethano-1.2.3.4.4a,5, instead of M-DMON in the polymerization of Example 1
8,8a-octahydronaphthalene
【式】
DMON)を用いる他は同様に行つた。
その結果エチレン組成55モル%、〔η〕0.95
dl/g、Tg140℃、誘電率、2.1、誘電正接1.0×
10-4、Td370℃、密度1.048g/cm3であつた。また
両面銅張板の剥離強度は0.9Kg/cm、誘電率2.1、
誘電正接は1.1×10-4であつた。
実施例 3
実施例1の重合におけるM−DMONの代わり
に6−エチルビシクロ〔2,2,1〕ヘプト−2
−エン([Formula] DMON) was used in the same manner. As a result, the ethylene composition was 55 mol%, [η] 0.95
dl/g, Tg140℃, dielectric constant, 2.1, dielectric loss tangent 1.0×
10 -4 , Td 370°C, and density 1.048 g/cm 3 . In addition, the peel strength of the double-sided copper clad board is 0.9Kg/cm, the dielectric constant is 2.1,
The dielectric loss tangent was 1.1×10 -4 . Example 3 6-ethylbicyclo[2,2,1]hept-2 instead of M-DMON in the polymerization of Example 1
−en (
【式】EBH)を用いる他には同様
にした。その結果、エチレン60モル%、〔η〕1.3
dl/g、Tg102℃、密度1.021g/cm3であつた。誘
電率、誘電正接は、それぞれ2.1、1.2×10-4であ
りTdは390℃であつた。
また両面銅張板の剥離強度は0.9Kg/cm、誘電
率は2.1、誘電正接は1.3×10-4であつた。
実施例 4
実施例1の重合体に無水マレイン酸をグラフト
共重合し、無水マレイン酸含量1.5wt%の変性物
を得た。このポリマーを実施例1の重合体に、
10wt%混合し、シート成形して、両面銅箔を融
着した。両面銅張板の誘電率は2.2、誘電正接は
4.4×10-4であつた。また、剥離強度は1.3Kg/cm
であつた。
実施例 5
実施例4の変性物を銅箔の裏面(凹凸面)に
10μ厚にコートした(コートは、シクロヘキサン
溶液で行つた)。この銅箔を実施例1のシートに
プレス成形機で融着させた。両面銅箔板の誘電率
は2.1、誘電正接は、1.8×10-4であつた。また剥
離強度は2.1Kg/cmであつた。
実施例 6
実施例1の重合体をシクロヘキサンに溶解し、
プリント基板用ガラスクロスに含浸させ、乾燥さ
せた。ポリマー含浸ガラスクロスを6枚重ね、
260℃でプレス圧着し、厚さ1.5mmでヤング率8×
1010dyne/cm2の高剛性体を得た。その後、実施例
5に記載のように処理した銅箔を積層体両面に誘
着させた。その結果、両面銅張板の誘電率は2.8、
誘電正接は5.3×10-4、剥離強度は2.1Kg/cmであ
つた。
実施例 7
実施例1のシートを用い、藤倉化成製導電塗料
(ドータイト
FA−705)によりスクリーン印刷
法でもつて回路形成を行い、130℃1時間で硬化
させた。接着性は十分に高かつた。
実施例 8
実施例1の重合体をアレイン酸グラフトし
(2.0wt%)、銅粉(約400メツシユ)と酸化防止剤
及び粘度調整剤とともにシクロヘキサン/トルエ
ン=50/50Vol%溶液に溶解し、塗料とした。こ
の塗料をスクリーン印刷法により、実施例1のシ
ート上に印刷した(20μ厚)。乾燥した後、剥離
強度を測定したところ、十分な強度を有してい
た。
実施例 9
実施例8で形成した回路基板を用い、無電解メ
ツキ法で、塗料上にさらに銅層を2μ厚形成した。
メツキ液は奥野製薬製の銅メツキ用液を用い、50
℃20分行つた。この場合、誘電率、誘電正接を測
定したところ、2.2、1.6×10-4であつた。[Formula] EBH) was used in the same manner. As a result, ethylene 60 mol%, [η] 1.3
dl/g, Tg 102°C, and density 1.021 g/cm 3 . The dielectric constant and dielectric loss tangent were 2.1 and 1.2×10 -4 , respectively, and Td was 390°C. The peel strength of the double-sided copper clad plate was 0.9 Kg/cm, the dielectric constant was 2.1, and the dielectric loss tangent was 1.3×10 -4 . Example 4 Maleic anhydride was graft copolymerized to the polymer of Example 1 to obtain a modified product having a maleic anhydride content of 1.5 wt%. This polymer was replaced with the polymer of Example 1,
It was mixed at 10wt%, formed into a sheet, and fused with copper foil on both sides. The dielectric constant of double-sided copper clad plate is 2.2, and the dielectric loss tangent is
It was 4.4×10 -4 . In addition, the peel strength is 1.3Kg/cm
It was hot. Example 5 The modified product of Example 4 was applied to the back surface (uneven surface) of copper foil.
It was coated to a thickness of 10 μm (coating was done with a cyclohexane solution). This copper foil was fused to the sheet of Example 1 using a press molding machine. The dielectric constant of the double-sided copper foil plate was 2.1, and the dielectric loss tangent was 1.8×10 -4 . Moreover, the peel strength was 2.1 kg/cm. Example 6 The polymer of Example 1 was dissolved in cyclohexane,
Glass cloth for printed circuit boards was impregnated and dried. 6 layers of polymer-impregnated glass cloth,
Press bonded at 260℃, Young's modulus is 8x at thickness 1.5mm
A highly rigid body of 10 10 dyne/cm 2 was obtained. Thereafter, copper foil treated as described in Example 5 was adhered to both sides of the laminate. As a result, the dielectric constant of double-sided copper clad plate is 2.8,
The dielectric loss tangent was 5.3×10 −4 and the peel strength was 2.1 Kg/cm. Example 7 Using the sheet of Example 1, a circuit was formed by screen printing using a conductive paint (Dotite FA-705) manufactured by Fujikura Kasei Co., Ltd., and cured at 130° C. for 1 hour. Adhesion was sufficiently high. Example 8 The polymer of Example 1 was grafted with aleic acid (2.0 wt%), dissolved in a cyclohexane/toluene = 50/50 Vol% solution with copper powder (approximately 400 mesh), an antioxidant, and a viscosity modifier to form a paint. And so. This paint was printed on the sheet of Example 1 (20μ thick) by screen printing. After drying, the peel strength was measured and found to have sufficient strength. Example 9 Using the circuit board formed in Example 8, a 2 μ thick copper layer was further formed on the paint by electroless plating.
For the plating liquid, use the copper plating liquid manufactured by Okuno Pharmaceutical Co., Ltd.
℃ for 20 minutes. In this case, when the dielectric constant and dielectric loss tangent were measured, they were 2.2 and 1.6×10 −4 .
Claims (1)
み重合体中において該モノマー成分が式(2)で示さ
れる構造をとる重合体層に導電層を積層してなる
高周波電気回路基板。 【式】 【式】 (式中R1〜R12は水素、アルキル基又はハロゲ
ンであつて各同一又は異なつていてもよく、更に
R9又はR10とR11又はR12とは互に環を形成しても
よい。nは0又は1以上の正数であり、R5〜R8
が複数回繰り返される場合にはこれらは各同一又
は異なつていてもよい。)[Scope of Claims] 1. A high-frequency electric device comprising a conductive layer laminated on a polymer layer containing at least a monomer component represented by formula (1) and in which the monomer component has a structure represented by formula (2). circuit board. [Formula] [Formula] (In the formula, R 1 to R 12 are hydrogen, an alkyl group, or a halogen, and each may be the same or different, and
R 9 or R 10 and R 11 or R 12 may mutually form a ring. n is 0 or a positive number of 1 or more, and R 5 to R 8
When repeated multiple times, these may be the same or different. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16689485A JPS6229191A (en) | 1985-07-30 | 1985-07-30 | High frequency electric circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16689485A JPS6229191A (en) | 1985-07-30 | 1985-07-30 | High frequency electric circuit board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6229191A JPS6229191A (en) | 1987-02-07 |
JPH0588558B2 true JPH0588558B2 (en) | 1993-12-22 |
Family
ID=15839596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16689485A Granted JPS6229191A (en) | 1985-07-30 | 1985-07-30 | High frequency electric circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6229191A (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63242634A (en) * | 1987-03-31 | 1988-10-07 | 日本ゼオン株式会社 | Conductive molded form and manufacture thereof |
US5229473A (en) * | 1989-07-07 | 1993-07-20 | Daikin Industries Ltd. | Fluorine-containing copolymer and method of preparing the same |
EP0437619B1 (en) * | 1989-07-07 | 1995-08-30 | Daikin Industries, Limited | Fluorinated copolymer and method of producing the same |
KR100480548B1 (en) | 1997-06-06 | 2005-04-07 | 제온 코포레이션 | Resin-coated matal foils containing cycloolefinic polymers, laminated boards and multilayer laminated boards using the same, and process for producing multilayer laminated boards |
JP2001071416A (en) * | 1999-09-03 | 2001-03-21 | Hitachi Chem Co Ltd | Production of copper-clad laminated board |
JP2004167687A (en) * | 2002-11-15 | 2004-06-17 | Polyplastics Co | Method for compounding metal on surface of cycloolefinic resin molded product and metal-compounded cycloolefinic resin molded product |
JP2004169049A (en) * | 2002-11-15 | 2004-06-17 | Polyplastics Co | Method for compounding metal to surface of cyclic olefine-based resin molding, and metal-compounded cyclic olefine-based resin molding |
JP4363145B2 (en) * | 2003-09-30 | 2009-11-11 | Jsr株式会社 | LAMINATE AND METHOD FOR PRODUCING LAMINATE |
CN101133118B (en) | 2005-03-07 | 2011-03-02 | 三井化学株式会社 | Cyclic olefin resin composition, and substrate provided from said resin composition |
JP2006247849A (en) * | 2005-03-08 | 2006-09-21 | Jsr Corp | Laminate, its manufacturing method and flexible printed board using laminate |
JP2007297430A (en) * | 2006-04-28 | 2007-11-15 | Mitsui Chemicals Inc | Resin composition and laminate plate for high-frequency circuit using it |
-
1985
- 1985-07-30 JP JP16689485A patent/JPS6229191A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6229191A (en) | 1987-02-07 |
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