JPH0588467B2 - - Google Patents

Info

Publication number
JPH0588467B2
JPH0588467B2 JP8687485A JP8687485A JPH0588467B2 JP H0588467 B2 JPH0588467 B2 JP H0588467B2 JP 8687485 A JP8687485 A JP 8687485A JP 8687485 A JP8687485 A JP 8687485A JP H0588467 B2 JPH0588467 B2 JP H0588467B2
Authority
JP
Japan
Prior art keywords
photosensitive
compound
ring structure
lactone ring
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8687485A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61245154A (ja
Inventor
Suehiro Norota
Takaaki Suwa
Koji Oe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Priority to JP8687485A priority Critical patent/JPS61245154A/ja
Publication of JPS61245154A publication Critical patent/JPS61245154A/ja
Publication of JPH0588467B2 publication Critical patent/JPH0588467B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP8687485A 1985-04-23 1985-04-23 感光性組成物 Granted JPS61245154A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8687485A JPS61245154A (ja) 1985-04-23 1985-04-23 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8687485A JPS61245154A (ja) 1985-04-23 1985-04-23 感光性組成物

Publications (2)

Publication Number Publication Date
JPS61245154A JPS61245154A (ja) 1986-10-31
JPH0588467B2 true JPH0588467B2 (enrdf_load_stackoverflow) 1993-12-22

Family

ID=13898971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8687485A Granted JPS61245154A (ja) 1985-04-23 1985-04-23 感光性組成物

Country Status (1)

Country Link
JP (1) JPS61245154A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5248582A (en) * 1988-09-07 1993-09-28 Fuji Photo Film Co., Ltd. Positive-type photoresist composition
US5221592A (en) * 1992-03-06 1993-06-22 Hoechst Celanese Corporation Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester

Also Published As

Publication number Publication date
JPS61245154A (ja) 1986-10-31

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