JPH0582731B2 - - Google Patents

Info

Publication number
JPH0582731B2
JPH0582731B2 JP59063173A JP6317384A JPH0582731B2 JP H0582731 B2 JPH0582731 B2 JP H0582731B2 JP 59063173 A JP59063173 A JP 59063173A JP 6317384 A JP6317384 A JP 6317384A JP H0582731 B2 JPH0582731 B2 JP H0582731B2
Authority
JP
Japan
Prior art keywords
mask
wafer
position detection
lens barrel
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59063173A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60208829A (ja
Inventor
Takuo Karya
Susumu Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59063173A priority Critical patent/JPS60208829A/ja
Publication of JPS60208829A publication Critical patent/JPS60208829A/ja
Publication of JPH0582731B2 publication Critical patent/JPH0582731B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59063173A 1984-04-02 1984-04-02 位置検出装置 Granted JPS60208829A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59063173A JPS60208829A (ja) 1984-04-02 1984-04-02 位置検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59063173A JPS60208829A (ja) 1984-04-02 1984-04-02 位置検出装置

Publications (2)

Publication Number Publication Date
JPS60208829A JPS60208829A (ja) 1985-10-21
JPH0582731B2 true JPH0582731B2 (enrdf_load_stackoverflow) 1993-11-22

Family

ID=13221601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59063173A Granted JPS60208829A (ja) 1984-04-02 1984-04-02 位置検出装置

Country Status (1)

Country Link
JP (1) JPS60208829A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6420619A (en) * 1987-07-15 1989-01-24 Toshiba Corp Electron beam aligner
JP5843610B2 (ja) * 2011-12-28 2016-01-13 キヤノン株式会社 描画装置及び物品の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2555636A1 (de) * 1975-12-08 1977-06-23 Siemens Ag Geraet zur erzeugung eines bestrahlungsmusters auf einem praeparat

Also Published As

Publication number Publication date
JPS60208829A (ja) 1985-10-21

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