JPH0580099B2 - - Google Patents
Info
- Publication number
- JPH0580099B2 JPH0580099B2 JP58158951A JP15895183A JPH0580099B2 JP H0580099 B2 JPH0580099 B2 JP H0580099B2 JP 58158951 A JP58158951 A JP 58158951A JP 15895183 A JP15895183 A JP 15895183A JP H0580099 B2 JPH0580099 B2 JP H0580099B2
- Authority
- JP
- Japan
- Prior art keywords
- container
- ion source
- sample
- heating furnace
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Tubes For Measurement (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58158951A JPS6054150A (ja) | 1983-09-01 | 1983-09-01 | イオン源 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58158951A JPS6054150A (ja) | 1983-09-01 | 1983-09-01 | イオン源 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6054150A JPS6054150A (ja) | 1985-03-28 |
JPH0580099B2 true JPH0580099B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-11-05 |
Family
ID=15682898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58158951A Granted JPS6054150A (ja) | 1983-09-01 | 1983-09-01 | イオン源 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6054150A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4855604A (en) * | 1985-05-17 | 1989-08-08 | Air Products And Chemicals, Inc. | Ion Beam implant system |
JPH0616385B2 (ja) * | 1986-04-09 | 1994-03-02 | エアー・プロダクツ・アンド・ケミカルズ・インコーポレーテッド | エバポレータ |
JP2563012Y2 (ja) * | 1990-03-26 | 1998-02-18 | 株式会社リコー | 現像装置 |
US7655932B2 (en) * | 2007-01-11 | 2010-02-02 | Varian Semiconductor Equipment Associates, Inc. | Techniques for providing ion source feed materials |
US10774419B2 (en) * | 2016-06-21 | 2020-09-15 | Axcelis Technologies, Inc | Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products |
US10676370B2 (en) * | 2017-06-05 | 2020-06-09 | Axcelis Technologies, Inc. | Hydrogen co-gas when using aluminum iodide as an ion source material |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2882410A (en) * | 1946-06-14 | 1959-04-14 | William M Brobeck | Ion source |
-
1983
- 1983-09-01 JP JP58158951A patent/JPS6054150A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6054150A (ja) | 1985-03-28 |
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