JPH0578929B2 - - Google Patents

Info

Publication number
JPH0578929B2
JPH0578929B2 JP59254242A JP25424284A JPH0578929B2 JP H0578929 B2 JPH0578929 B2 JP H0578929B2 JP 59254242 A JP59254242 A JP 59254242A JP 25424284 A JP25424284 A JP 25424284A JP H0578929 B2 JPH0578929 B2 JP H0578929B2
Authority
JP
Japan
Prior art keywords
diffraction grating
light
gap
diffracted
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59254242A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61133625A (ja
Inventor
Makoto Inoshiro
Atsunobu Une
Nobuyuki Takeuchi
Kimikichi Deguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59254242A priority Critical patent/JPS61133625A/ja
Priority to US06/695,698 priority patent/US4656347A/en
Priority to CA000473187A priority patent/CA1226682A/en
Priority to EP85300622A priority patent/EP0151032B1/en
Priority to DE3587921T priority patent/DE3587921T2/de
Publication of JPS61133625A publication Critical patent/JPS61133625A/ja
Publication of JPH0578929B2 publication Critical patent/JPH0578929B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59254242A 1984-01-30 1984-12-03 回折格子によるギヤツプ制御法およびそれを用いた位置合せ制御法 Granted JPS61133625A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59254242A JPS61133625A (ja) 1984-12-03 1984-12-03 回折格子によるギヤツプ制御法およびそれを用いた位置合せ制御法
US06/695,698 US4656347A (en) 1984-01-30 1985-01-28 Diffraction grating position adjuster using a grating and a reflector
CA000473187A CA1226682A (en) 1984-01-30 1985-01-30 Method of adjusting relative positions of two objects by using diffraction grating and control apparatus
EP85300622A EP0151032B1 (en) 1984-01-30 1985-01-30 Method of adjusting relative positions of two objects by using diffraction grating and control apparatus therefor
DE3587921T DE3587921T2 (de) 1984-01-30 1985-01-30 Verfahren für die gegenseitige Ausrichtung zweier Objekte mittels eines Beugungsgitters, sowie die Steuervorrichtung dafür.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59254242A JPS61133625A (ja) 1984-12-03 1984-12-03 回折格子によるギヤツプ制御法およびそれを用いた位置合せ制御法

Publications (2)

Publication Number Publication Date
JPS61133625A JPS61133625A (ja) 1986-06-20
JPH0578929B2 true JPH0578929B2 (https=) 1993-10-29

Family

ID=17262247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59254242A Granted JPS61133625A (ja) 1984-01-30 1984-12-03 回折格子によるギヤツプ制御法およびそれを用いた位置合せ制御法

Country Status (1)

Country Link
JP (1) JPS61133625A (https=)

Also Published As

Publication number Publication date
JPS61133625A (ja) 1986-06-20

Similar Documents

Publication Publication Date Title
US4656347A (en) Diffraction grating position adjuster using a grating and a reflector
US5004348A (en) Alignment device
EP0534758B1 (en) Method and device for measuring positional deviation between a plurality of diffraction gratings on the same object
JP3364382B2 (ja) 試料面位置測定装置及び測定方法
JPH039403B2 (https=)
CA2078732A1 (en) Displacement measuring device and displacement measuring method
JPH01107102A (ja) 光学式自動位置決め装置
JPH0578929B2 (https=)
JPH09152309A (ja) 位置検出装置および位置検出方法
JP2578742B2 (ja) 位置合わせ方法
JPH0441485B2 (https=)
JPH06105679B2 (ja) 露光装置
JP2691298B2 (ja) 位置合わせ装置およびそれを備えた露光装置
JP2723502B2 (ja) 位置決め方法
JPH0582729B2 (https=)
JP2683409B2 (ja) 位置合わせ装置
JPH0269604A (ja) 位置合わせ方法
JP2554626B2 (ja) 回折格子による位置合わせ方法および位置合わせ装置
JPH0582727B2 (https=)
JPS6355858B2 (https=)
JPH07122565B2 (ja) 露光装置
JPH0451968B2 (https=)
JPH0263288B2 (https=)
JPH0441486B2 (https=)
JPH0441285B2 (https=)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term