JPH0570922B2 - - Google Patents
Info
- Publication number
- JPH0570922B2 JPH0570922B2 JP58033973A JP3397383A JPH0570922B2 JP H0570922 B2 JPH0570922 B2 JP H0570922B2 JP 58033973 A JP58033973 A JP 58033973A JP 3397383 A JP3397383 A JP 3397383A JP H0570922 B2 JPH0570922 B2 JP H0570922B2
- Authority
- JP
- Japan
- Prior art keywords
- magneto
- coercive force
- composition
- recording medium
- oersted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/16—Layers for recording by changing the magnetic properties, e.g. for Curie-point-writing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
- G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
- G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
- G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
- G11B11/10586—Record carriers characterised by the selection of the material or by the structure or form characterised by the selection of the material
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3397383A JPS59159510A (ja) | 1983-03-01 | 1983-03-01 | 磁気光学記録媒体 |
DE19833309483 DE3309483C3 (de) | 1982-03-17 | 1983-03-16 | Magnetooptisches Aufzeichnungsmaterial und dessen Verwendung |
DE3348424A DE3348424C2 (de) | 1982-03-17 | 1983-03-16 | Verfahren zur Herstellung eines magnetooptischen Aufzeichnungsmaterials |
US06/783,052 US4670353A (en) | 1982-03-17 | 1985-10-01 | Magnetooptical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3397383A JPS59159510A (ja) | 1983-03-01 | 1983-03-01 | 磁気光学記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59159510A JPS59159510A (ja) | 1984-09-10 |
JPH0570922B2 true JPH0570922B2 (enrdf_load_stackoverflow) | 1993-10-06 |
Family
ID=12401424
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3397383A Granted JPS59159510A (ja) | 1982-03-17 | 1983-03-01 | 磁気光学記録媒体 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59159510A (enrdf_load_stackoverflow) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7137353B2 (en) | 2002-09-30 | 2006-11-21 | Tokyo Electron Limited | Method and apparatus for an improved deposition shield in a plasma processing system |
US7147749B2 (en) | 2002-09-30 | 2006-12-12 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
US7163585B2 (en) | 2002-09-30 | 2007-01-16 | Tokyo Electron Limited | Method and apparatus for an improved optical window deposition shield in a plasma processing system |
US7166200B2 (en) | 2002-09-30 | 2007-01-23 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate in a plasma processing system |
US7166166B2 (en) | 2002-09-30 | 2007-01-23 | Tokyo Electron Limited | Method and apparatus for an improved baffle plate in a plasma processing system |
US7204912B2 (en) | 2002-09-30 | 2007-04-17 | Tokyo Electron Limited | Method and apparatus for an improved bellows shield in a plasma processing system |
US7282112B2 (en) | 2002-09-30 | 2007-10-16 | Tokyo Electron Limited | Method and apparatus for an improved baffle plate in a plasma processing system |
US7291566B2 (en) | 2003-03-31 | 2007-11-06 | Tokyo Electron Limited | Barrier layer for a processing element and a method of forming the same |
US7552521B2 (en) | 2004-12-08 | 2009-06-30 | Tokyo Electron Limited | Method and apparatus for improved baffle plate |
US7560376B2 (en) | 2003-03-31 | 2009-07-14 | Tokyo Electron Limited | Method for adjoining adjacent coatings on a processing element |
US7601242B2 (en) | 2005-01-11 | 2009-10-13 | Tokyo Electron Limited | Plasma processing system and baffle assembly for use in plasma processing system |
US8877002B2 (en) | 2002-11-28 | 2014-11-04 | Tokyo Electron Limited | Internal member of a plasma processing vessel |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60189208A (ja) * | 1984-03-09 | 1985-09-26 | Nippon Hoso Kyokai <Nhk> | 光磁気記録媒体 |
JPS6184004A (ja) * | 1984-10-01 | 1986-04-28 | Sumitomo Metal Mining Co Ltd | 光磁気記録媒体 |
JPH0772946B2 (ja) * | 1984-10-11 | 1995-08-02 | 株式会社日立製作所 | 光磁気記録媒体 |
DE3536210A1 (de) * | 1984-10-11 | 1986-04-17 | Hitachi, Ltd., Tokio/Tokyo | Magnetooptisches aufzeichnungsmedium |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5231703A (en) * | 1975-09-05 | 1977-03-10 | Kokusai Denshin Denwa Co Ltd <Kdd> | Magnetic thin film recording medium |
JPS5873746A (ja) * | 1981-10-27 | 1983-05-04 | Kokusai Denshin Denwa Co Ltd <Kdd> | 光磁気記録媒体 |
JPS58159252A (ja) * | 1982-03-17 | 1983-09-21 | Canon Inc | 磁気光学記録媒体 |
JPS595450A (ja) * | 1982-07-02 | 1984-01-12 | Ricoh Co Ltd | 光磁気記録媒体 |
JPS5988808A (ja) * | 1982-11-15 | 1984-05-22 | Ricoh Co Ltd | 磁気記録媒体 |
-
1983
- 1983-03-01 JP JP3397383A patent/JPS59159510A/ja active Granted
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7282112B2 (en) | 2002-09-30 | 2007-10-16 | Tokyo Electron Limited | Method and apparatus for an improved baffle plate in a plasma processing system |
US7566368B2 (en) | 2002-09-30 | 2009-07-28 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate in a plasma processing system |
US7163585B2 (en) | 2002-09-30 | 2007-01-16 | Tokyo Electron Limited | Method and apparatus for an improved optical window deposition shield in a plasma processing system |
US7166200B2 (en) | 2002-09-30 | 2007-01-23 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate in a plasma processing system |
US7166166B2 (en) | 2002-09-30 | 2007-01-23 | Tokyo Electron Limited | Method and apparatus for an improved baffle plate in a plasma processing system |
US7204912B2 (en) | 2002-09-30 | 2007-04-17 | Tokyo Electron Limited | Method and apparatus for an improved bellows shield in a plasma processing system |
US7566379B2 (en) | 2002-09-30 | 2009-07-28 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
US7137353B2 (en) | 2002-09-30 | 2006-11-21 | Tokyo Electron Limited | Method and apparatus for an improved deposition shield in a plasma processing system |
US7147749B2 (en) | 2002-09-30 | 2006-12-12 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
US8877002B2 (en) | 2002-11-28 | 2014-11-04 | Tokyo Electron Limited | Internal member of a plasma processing vessel |
US7560376B2 (en) | 2003-03-31 | 2009-07-14 | Tokyo Electron Limited | Method for adjoining adjacent coatings on a processing element |
US7291566B2 (en) | 2003-03-31 | 2007-11-06 | Tokyo Electron Limited | Barrier layer for a processing element and a method of forming the same |
US7552521B2 (en) | 2004-12-08 | 2009-06-30 | Tokyo Electron Limited | Method and apparatus for improved baffle plate |
US7601242B2 (en) | 2005-01-11 | 2009-10-13 | Tokyo Electron Limited | Plasma processing system and baffle assembly for use in plasma processing system |
Also Published As
Publication number | Publication date |
---|---|
JPS59159510A (ja) | 1984-09-10 |
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