JPH0567063B2 - - Google Patents
Info
- Publication number
- JPH0567063B2 JPH0567063B2 JP16955986A JP16955986A JPH0567063B2 JP H0567063 B2 JPH0567063 B2 JP H0567063B2 JP 16955986 A JP16955986 A JP 16955986A JP 16955986 A JP16955986 A JP 16955986A JP H0567063 B2 JPH0567063 B2 JP H0567063B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- etching
- support plate
- electrode
- measuring device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 58
- 238000005530 etching Methods 0.000 claims description 36
- 238000005259 measurement Methods 0.000 claims description 28
- 239000012535 impurity Substances 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 description 10
- 238000000866 electrolytic etching Methods 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 229920001342 Bakelite® Polymers 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 239000004637 bakelite Substances 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Weting (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16955986A JPS6327031A (ja) | 1986-07-18 | 1986-07-18 | 半導体の特性測定装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16955986A JPS6327031A (ja) | 1986-07-18 | 1986-07-18 | 半導体の特性測定装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6327031A JPS6327031A (ja) | 1988-02-04 |
| JPH0567063B2 true JPH0567063B2 (enrdf_load_stackoverflow) | 1993-09-24 |
Family
ID=15888708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16955986A Granted JPS6327031A (ja) | 1986-07-18 | 1986-07-18 | 半導体の特性測定装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6327031A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2907059B2 (ja) * | 1995-04-27 | 1999-06-21 | 日本電気株式会社 | 不純物拡散プロファイル測定方法 |
| JP4556698B2 (ja) * | 2005-02-14 | 2010-10-06 | ソニー株式会社 | プローブピンユニット |
| JP4826882B2 (ja) * | 2005-05-18 | 2011-11-30 | 株式会社 アイアイエスマテリアル | スクラップシリコンの選別及び分析方法 |
-
1986
- 1986-07-18 JP JP16955986A patent/JPS6327031A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6327031A (ja) | 1988-02-04 |
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